Roller structure and system

Abstract

The utility model provides a roller structure and a system. The roller structure comprises a roller body and a transmission part, the transmission part is wound on the outer side wall of the roller body, and the transmission part is an S-shaped thread transmission part or M annular transmission parts; wherein M is a natural number greater than 1; the thread height of the S-shaped thread transmission part or the ring height of each annular transmission part is set to be 4-8 mm; the screw pitch of the S-shaped thread transmission part or the distance between every two adjacent annular transmission parts is set to be 20 mm-60 mm. The roller design is beneficial to quick removal of bubbles generated during reaction of the alkaline solution and the monocrystalline silicon wafer, the retention time of the bubbles on the surface of the monocrystalline silicon wafer can be shortened, the exchange speed of the alkaline solution is increased, and roller marks are reduced. And the lines on the S-shaped thread transmission part or each annular transmission part are trapezoidal sawtooth lines, so that the contact area between the roller structure and the surface of the monocrystalline silicon wafer can be reduced, and the generation of roller marks is reduced.

Description

Technical Field

[0001] The utility model relates to the field of crystalline silicon solar cell manufacturing, in particular to a roller structure and system. Background Art

[0002] In the photovoltaic industry, alkaline wet processes for monocrystalline silicon wafers, whether for alkaline texturing or alkaline polishing, typically utilize trough-type equipment. During this process, the monocrystalline silicon wafer is first inserted vertically into a basket, which is then immersed in an alkaline solution. Unless differentiated treatment is performed on the front and back sides of the wafer, the trough-type equipment processes both sides simultaneously.

[0003] In order to improve the back passivation effect of monocrystalline silicon wafers, increase the back internal reflection, and improve the cell conversion efficiency, both sides of the final finished cell are required to have a special structure of "textured on one side and polished on the other side" for both P-type PERC cells (passivated emitter and back cell) and N-type TOPCon cells (tunneling oxide passivated cell). In the existing technology, the texturizing and polishing of one side of PERC cells and TOPCon cells need to be completed in two steps using two trough-type equipment, but this will increase the production process steps of the cell and make the process cumbersome and complicated. Chain equipment can use roller transmission technology to flexibly switch between "immersion transmission" and "floating transmission" to achieve "double-sided processing" or "single-sided processing" of monocrystalline silicon wafers, thereby simplifying the production process of the cell and helping to improve production efficiency.

[0004] However, the single crystal silicon wafers of the chain equipment are placed horizontally on the rollers, and the reaction between the lower surface of the single crystal silicon wafer and the alkaline solution is greatly affected by the roller structure. Figure 1 As shown, the threaded roller 1 in the process groove of the chain equipment mainly includes a roller 10, a thread ring 11 and a mounting buckle 12. Figure 2 As shown, the pitch L1 of the thread ring 11 and the thread height H1 of the thread ring 11 are both between 1 mm and 4 mm. Such a setting of the thread ring 11 and the thread height H1 can easily cause the contact area between the threaded roller 1 and the single crystal silicon wafer to be too large, which will not only affect the reaction uniformity between the alkaline solution and the single crystal silicon wafer, but also lead to poor bubble removal effect, so that a large number of roller marks will be left on the surface of the silicon wafer. Figure 3 The single crystal silicon wafer 2 shown after being processed using the existing chain technology has a large number of roller marks 21 on its lower surface. The distance L2 between two adjacent roller marks 21 is consistent with the pitch L1 of the thread ring 11, which affects both the appearance of the single crystal silicon wafer and the electrical performance of the battery cell.

[0005] Therefore, it is necessary to further study and improve the roller structure in chain equipment.

[0006] It should be noted that the above technical background is merely for the purpose of providing a clear and complete description of the technical solutions of the present invention and to facilitate understanding by those skilled in the art. It should not be assumed that the above technical solutions are well known to those skilled in the art simply because they are described in the background technology section of the present invention. Utility Model Content

[0007] In view of the shortcomings of the prior art described above, the purpose of the present utility model is to provide a roller structure and system for solving the problem in the prior art that "the thread pitch of the threaded roller is small and the thread groove depth is shallow", which will cause "the contact area between the roller and the single crystal silicon wafer is too large, and the removal effect of the bubbles generated by the reaction between the alkaline solution and the single crystal silicon wafer is poor, resulting in a large number of roller marks on the lower surface of the single crystal silicon wafer after the reaction, thereby affecting the appearance and electrical performance of the battery cell".

[0008] In order to solve the above problems, the utility model provides a roller structure, which includes: a roller body and a transmission component;

[0009] The transmission component is wound around the outer wall of the roller body; the transmission component is set as an S-shaped thread transmission component or M annular transmission components, where M is a natural number greater than 1; the thread height of the S-shaped thread transmission component or the ring height of each annular transmission component is set to 4mm~8mm.

[0010] Optionally, the pitch of the S-shaped thread transmission component or the spacing between adjacent annular transmission components is set to 20 mm to 60 mm.

[0011] Optionally, the lines on the S-shaped thread transmission component or the lines on the annular transmission component are configured as trapezoidal serration lines.

[0012] Optionally, the trapezoidal serration pattern includes N trapezoidal serrations, and the top of each trapezoidal serration is configured to be arc-shaped or straight-line-shaped; wherein N is a natural number greater than 1.

[0013] Optionally, the top width of each trapezoidal sawtooth is set to 0.2 mm to 0.4 mm.

[0014] Optionally, the tooth angle of each trapezoidal saw tooth is set to 20° to 60°.

[0015] Optionally, the height of each trapezoidal sawtooth is set to 2 mm to 4 mm.

[0016] Optionally, the distance between the tops of the trapezoidal saw teeth is set to 4 mm to 16 mm.

[0017] The utility model also provides a roller system, which comprises at least: X roller structures mentioned above; the roller structures are arranged in parallel; wherein X is a natural number greater than 1.

[0018] As described above, the present invention provides a roller structure and system, which has the following beneficial effects:

[0019] 1. The thread height of the S-shaped thread transmission component or the ring height of each annular transmission component in the roller structure of the present invention is set to 4mm to 8mm, which is conducive to the rapid removal of bubbles generated when the alkaline solution and the single crystal silicon wafer react, and can reduce the residence time of bubbles on the surface of the single crystal silicon wafer, accelerate the exchange rate of the alkaline solution, improve the reaction between the alkaline solution and the surface of the single crystal silicon wafer, make the reaction between the two more uniform, and thus can reduce the generation of roller marks.

[0020] 2. The pitch of the S-shaped thread transmission component of the utility model or the spacing between adjacent annular transmission components is set to 20mm to 60mm, and the texture on the S-shaped thread transmission component or the texture on the annular transmission component is set to a trapezoidal serration texture. This not only minimizes the contact area between the roller structure and the single crystal silicon wafer, but also enables staggered contact between the roller structure and the single crystal silicon wafer, preventing the single crystal silicon wafer and the roller structure from always contacting at the same position during the transmission process, thereby further reducing the generation of roller marks.

[0021] 3. The top of the trapezoidal serration pattern of the present invention is set to an arc shape or a straight line shape, which can prevent the single crystal silicon wafer from being scratched and damaged due to point contact during the transmission process on the roller structure, thereby protecting the single crystal silicon wafer and reducing the chance of damage to the single crystal silicon wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 Shown is a structural schematic diagram of a threaded roller in the prior art.

[0023] Figure 2 Shown is an enlarged schematic diagram of a thread turn in the prior art.

[0024] Figure 3 Shown is a schematic diagram of the structure of a single crystal silicon wafer after alkali texturing or alkali polishing using existing chain technology.

[0025] Figure 4 Shown is a structural schematic diagram of an exemplary roller structure of the present invention.

[0026] Figure 5 The diagram shows a structure in which the top of the trapezoidal saw teeth of the present invention is in a straight line shape.

[0027] Figure 6The diagram shows a structure in which the top of the trapezoidal sawtooth of the present invention is in an arc shape.

[0028] Figure 7 Shown is a structural schematic diagram of a roller structure of another example of the present invention.

[0029] Figure 8 Shown is a structural schematic diagram of a roller system of the present invention.

[0030] Component number description

[0031] 1 threaded roller

[0032] 10 Scroll Wheel

[0033] 11 thread turns

[0034] L1 pitch

[0035] H1 thread height

[0036] 12 Mounting buckle

[0037] 2 Monocrystalline silicon wafers processed by existing chain technology

[0038] 20 monocrystalline silicon wafers

[0039] 21 Roller Print

[0040] L2 spacing

[0041] 3 Roller structure

[0042] 30 Roller body

[0043] 31 Transmission parts

[0044] 310 S-thread transmission parts

[0045] H2 thread height

[0046] L3 pitch

[0047] 310a Trapezoidal serrations

[0048] 310a' top of the trapezoidal serrations

[0049] L4 top width

[0050] 310b' trapezoidal sawtooth waist

[0051] α tooth angle

[0052] H3 Height of trapezoidal teeth

[0053] Spacing between L5 tops

[0054] 311 Ring transmission parts

[0055] 311a sparse tooth ring transmission component

[0056] 311b dense tooth ring transmission parts

[0057] L6 Distance between adjacent sparse-tooth annular transmission components and dense-tooth annular transmission components

[0058] H4 Ring height of the ring transmission component

[0059] 32 Installing Parts

[0060] 4 roller system

[0061] 41 First roller

[0062] 42 Second roller

[0063] 43 Third roller

[0064] 44 Fourth roller DETAILED DESCRIPTION

[0065] The following describes the implementation of the present invention through specific examples. People familiar with this technology can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

[0066] See also Figures 4 to 8 . It should be noted that the structures, proportions, sizes, etc. illustrated in the drawings of this specification are only used to match the contents disclosed in the specification for people familiar with this technology to understand and read, and are not used to limit the limiting conditions for the implementation of this utility model. Therefore, they have no substantial technical significance. Any structural decoration, change in proportional relationship or adjustment of size should still fall within the scope of the technical content disclosed by this utility model without affecting the efficacy and purpose that can be achieved by this utility model. At the same time, the terms such as "upper", "lower", "left", "right", "middle" and "one" quoted in this specification are only for the convenience of description, and are not used to limit the scope of the implementation of this utility model. Changes or adjustments in their relative relationships should also be regarded as the scope of the implementation of this utility model without substantially changing the technical content.

[0067] like Figure 4 As shown, this embodiment provides a roller structure 3 including a roller body 30 and a transmission component 31 .

[0068] Among them, the transmission component 31 is wound around the outer wall of the roller body 30, and the transmission component 31 is set as an S-shaped thread transmission component 310 or M annular transmission components 311, where M is a natural number greater than 1; the thread height H2 of the S-shaped thread transmission component 310 or the ring height of each annular transmission component 311 is set to 4mm~8mm.

[0069] As an example, when the transmission component 31 is configured as an S-shaped thread transmission component 310 and is wound around the outer wall of the roller body 30, the roller body 30 is configured as a cylindrical roller that facilitates smooth rolling. In actual use, the shape of the roller body can be arbitrarily set as needed and is not limited to this embodiment. The thread height H2 of the S-shaped thread transmission component 310 is set to 4mm to 8mm, such as 4.5mm, 5mm, 5.5mm, 6mm, 6.5mm, 7mm, and 7.6mm. In actual use, the thread height H2 of the S-shaped thread transmission component can be arbitrarily set as needed and is not described in detail here. By setting the thread height H2 of the S-shaped thread transmission component 310 in this way, when the alkaline solution reacts with the surface of the single crystal silicon wafer, the bubbles generated can be quickly detached, reducing the time the bubbles stay on the surface of the single crystal silicon wafer, accelerating the exchange of the alkaline solution, improving the reaction between the alkaline solution and the surface of the single crystal silicon wafer, making the reaction between the two more uniform, thereby reducing the generation of roller marks. The pitch L3 of the S-shaped thread transmission component 310 is set to 20mm to 60mm, for example, 23mm, 25mm, 30mm, 40mm, 45mm, 50mm, and 57mm. In actual use, the pitch can be set arbitrarily as needed, and the details are not detailed here. By increasing the pitch L3 of the S-shaped thread transmission component 310, the contact area between the roller structure 3 and the single crystal silicon wafer can be reduced, further reducing the occurrence of roller marks.

[0070] More specifically, in this embodiment, if Figure 5 and Figure 6As shown, the pattern on the S-shaped thread transmission component 310 is set as a trapezoidal sawtooth pattern, and the trapezoidal sawtooth pattern includes N trapezoidal sawteeth 310a; wherein N is a natural number greater than 1. Among them, the number of trapezoidal sawteeth can be 3, 4, or 5. In actual use, the number of trapezoidal sawteeth can be arbitrarily set according to needs, and will not be described in detail here. The top 310a' of each trapezoidal sawtooth 310a is set in an arc shape or a straight line shape, which can prevent the single crystal silicon wafer from being scratched and damaged due to point contact during the transmission process on the roller structure 3, thereby protecting the single crystal silicon wafer and reducing the probability of damage to the single crystal silicon wafer. In actual use, any shape that can protect the single crystal silicon wafer is suitable for the top of the trapezoidal sawtooth of the utility model, and will not be described in detail here. The width L4 of the top 310a' of the trapezoidal sawtooth 310a is set to 0.2mm-0.4mm, such as 0.23mm, 0.25mm, 0.27mm, 0.34mm, 0.37mm, and 0.39mm. In actual use, the width of the top of the trapezoidal sawtooth can be arbitrarily set as needed, which is not detailed here. The tooth angle α of the trapezoidal sawtooth 310a is set to 20°-60° (i.e., the angle between the waist 310b' and the top 310a' of the trapezoidal sawtooth 310a is set to 100°-120°), such as 23°, 28°, 34°, 40°, 46°, 50°, and 55°. In actual use, the tooth angle of the trapezoidal sawtooth can be arbitrarily set as needed, which is not detailed here. The height H3 of each trapezoidal sawtooth 310a is set to 2 mm to 4 mm, such as 2.4 mm, 2.8 mm, 3.2 mm, 3.6 mm, and 3.9 mm. In actual use, the height of the trapezoidal sawtooth can be set as needed, and the details are not detailed here. Meanwhile, the spacing L5 between the tops 310a' of each trapezoidal sawtooth 310a is set to 4 mm to 16 mm, such as 5 mm, 7 mm, 9 mm, 11 mm, 12.6 mm, and 15 mm. In actual use, the spacing between each trapezoidal sawtooth can be set as needed, and the details are not detailed here. By arranging a plurality of trapezoidal serrations 310a on the trapezoidal serration pattern, and improving the tooth angle α, height H3, spacing L5 between the tops, top shape and width L4 of the trapezoidal serrations 310a, and combining the pitch L3 of the wide S-shaped thread transmission component 310, not only can the contact area between the roller structure 3 and the surface of the single crystal silicon wafer be reduced, but also the staggered contact between the roller structure 3 and the surface of the single crystal silicon wafer can be achieved, so that the single crystal silicon wafer and the roller structure 3 are not always in contact at the same position, thereby further reducing the generation of roller marks.

[0071] As Example 2, the difference from Example 1 is that, Figure 7As shown, the transmission component 31 is configured as M annular transmission components 311 wound around the outer wall of the roller body 30. Specifically, the number of annular transmission components 311 includes, but is not limited to, 3, 6, 9, or 11. In actual use, the number of annular transmission components can be arbitrarily set as needed, and a detailed description thereof is omitted here. The ring height H4 of each annular transmission component 311 is set to 4 mm to 8 mm, such as 4.5 mm, 5 mm, 5.5 mm, 6 mm, 6.5 mm, 7 mm, or 7.6 mm. In actual use, the ring height of each annular transmission component 311 can be arbitrarily set as needed, and a detailed description thereof is omitted here. By setting the ring height H4 of the annular transmission components 311 in this manner, bubbles generated when the alkaline solution reacts with the surface of the single-crystalline silicon wafer can be quickly disengaged, reducing the time bubbles remain on the surface of the single-crystalline silicon wafer, accelerating the exchange of the alkaline solution, and improving the reaction between the alkaline solution and the surface of the single-crystalline silicon wafer, making the reaction between the two more uniform, thereby reducing the occurrence of roller marks. The spacing L6 between adjacent annular transmission components 311 is set to 20 mm to 60 mm, such as 23 mm, 25 mm, 30 mm, 40 mm, 45 mm, 50 mm, or 57 mm. In actual use, the spacing between adjacent annular transmission components can be set as needed, and the details are not described here. The pattern on each annular transmission component 311 is set to a trapezoidal sawtooth pattern. The arrangement of the trapezoidal sawtooth pattern is the same as that of Example 1. Please refer to Example 1 for details and will not be repeated here.

[0072] like Figure 8 As shown, the present invention further provides a roller system 4, which includes X roller structures 3, and each roller structure is arranged in parallel; wherein X is a natural number greater than 1.

[0073] Specifically, in this embodiment, when the transmission component 31 of the roller structure 3 is an annular transmission component 311, the roller system 4 includes four roller structures 3, namely a first roller structure 41, a second roller structure 42, a third roller structure 43, and a fourth roller structure 44. The trapezoidal serrations on each annular transmission component 311 of the roller structure 3 are divided into coarse teeth and dense teeth. That is, each annular transmission component 311 of the roller structure 3 is divided into a coarse-tooth annular transmission component 311a and a dense-tooth annular transmission component 311b according to the spacing of the trapezoidal serrations. The spacing between the tops of the sparse-tooth annular transmission component 311a is set to 4 to 8 mm, such as 4.1 mm, 4.7 mm, 5.3 mm, 5.9 mm, 6.8 mm, and 7.6 mm; the spacing between the tops of the sparse-tooth annular transmission component 311b is set to 8 to 16 mm, such as 8.1 mm, 9.9 mm, 10.7 mm, 11.9 mm, 13.1 mm, and 15.7 mm; in actual use, the spacing between the sparse-tooth annular transmission component and the spacing between the sparse-tooth annular transmission component and the dense-tooth annular transmission component can be set arbitrarily according to needs, and will not be elaborated here. The annular transmission components 311 on the first roller structure 41 and the fourth roller structure 44 are arranged in sequence from left to right in the order of sparse-tooth annular transmission component 311a, dense-tooth annular transmission component 311b, sparse-tooth annular transmission component 311a, dense-tooth annular transmission component 311b, sparse-tooth annular transmission component 311a, dense-tooth annular transmission component 311b, sparse-tooth annular transmission component 311a, dense-tooth annular transmission component 311b, etc.; and the annular components 311 on the first roller structure 41 and the fourth roller structure 44 are arranged in an alternating manner. The annular transmission components 311 on the second roller structure 42 and the third roller structure 43 are arranged from left to right in the order of dense-toothed annular transmission component 311b, coarse-toothed annular transmission component 311a, dense-toothed annular transmission component 311b, coarse-toothed annular transmission component 311a, dense-toothed annular transmission component 311b, coarse-toothed annular transmission component 311a, dense-toothed annular transmission component 311b, coarse-toothed annular transmission component 311a, dense-toothed annular transmission component 311b, and coarse-toothed annular transmission component 311a. Furthermore, the annular transmission components 311 on the second roller structure 42 and the third roller structure 44 are arranged in an alternating pattern. Furthermore, the annular transmission components 311 on the first roller structure 41 and the third roller structure 43 correspond to each other in a straight line, and the annular transmission components 311 on the second roller structure 42 and the fourth roller structure 44 correspond to each other in a straight line. In actual use, the positions of the coarse-toothed and dense-toothed annular transmission components on the roller structures can be arbitrarily set as needed and are not limited to this embodiment.By arranging the annular transmission components 311 on each roller structure in a corresponding manner, the contact positions between the single-crystal silicon wafer and two adjacent roller structures are staggered. Furthermore, the contact between the same position of the single-crystal silicon wafer and the alternate roller structure is also staggered in a "close-tooth-sparse-tooth" pattern. This roller structure arrangement maximizes staggered contact between the single-crystal silicon wafer and the roller structures, further improving the uniformity of the alkaline solution's reaction across the entire surface of the single-crystal silicon wafer and reducing the occurrence of roller marks. In actual use, the arrangement of the roller structures in the roller system can be arbitrarily configured as needed and is not detailed here.

[0074] As another implementation of the present invention, the roller structure 3 further includes two mounting components 32 , which are respectively located at both ends of the cylindrical roller body 30 to fix the roller structure 3 and further facilitate the process operation.

[0075] In summary, the present invention provides a roller structure and system, wherein the roller structure includes: a roller body and a transmission component; the transmission component is wound around the outer wall of the roller body, and the transmission component is configured as an S-shaped thread transmission component or M annular transmission components; wherein M is a natural number greater than 1; the thread height of the S-shaped thread transmission component or the ring height of each annular transmission component is set to 4 mm to 8 mm, which is conducive to the rapid removal of bubbles generated during the reaction between the alkaline solution and the single crystal silicon wafer, can reduce the residence time of the bubbles on the surface of the single crystal silicon wafer, accelerate the exchange speed of the alkaline solution, improve the reaction between the alkaline solution and the surface of the single crystal silicon wafer, make the reaction between the two more uniform, thereby reducing the generation of roller marks. The pitch of the S-shaped thread transmission component or the spacing between adjacent annular transmission components is set to 20mm to 60mm, and the texture on the S-shaped thread transmission component or each annular transmission component is set to a trapezoidal sawtooth texture. This not only minimizes the contact area between the threaded roller and the surface of the single-crystalline silicon wafer, but also achieves staggered contact between the roller structure and the surface of the single-crystalline silicon wafer, preventing the single-crystalline silicon wafer and the roller structure from always contacting the same position, thereby further reducing the generation of roller marks. The top of the trapezoidal sawtooth texture is set to an arc shape or a straight line to prevent the single-crystalline silicon wafer from being scratched due to point contact during transmission on the roller structure, thereby protecting the single-crystalline silicon wafer. Therefore, the utility model effectively overcomes the various shortcomings of the existing technology and has high industrial utilization value.

[0076] The above embodiments are merely illustrative of the principles and effects of the present invention and are not intended to limit the present invention. Anyone skilled in the art may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by one of ordinary skill in the art without departing from the spirit and technical principles disclosed in the present invention are intended to be covered by the claims of the present invention.

Claims

1. A roller structure, characterized in that: The roller structure includes: a roller body and a transmission component; The transmission component is wound around the outer wall of the roller body; the transmission component is set as an S-shaped thread transmission component or M annular transmission components, where M is a natural number greater than 1; the thread height of the S-shaped thread transmission component or the ring height of each annular transmission component is set to 4mm~8mm.

2. The roller structure according to claim 1, characterized in that: The pitch of the S-shaped thread transmission component or the spacing between adjacent annular transmission components is set to 20mm to 60mm.

3. The roller structure according to claim 1, characterized in that: The lines on the S-shaped thread transmission component or the lines on each annular transmission component are arranged as trapezoidal serration lines.

4. The roller structure according to claim 3, characterized in that: The trapezoidal sawtooth pattern includes N trapezoidal sawtooths, and the top of each trapezoidal sawtooth is configured to be in an arc shape or a straight line shape; wherein N is a natural number greater than 1.

5. The roller structure according to claim 4, characterized in that: The top width of each trapezoidal sawtooth is set to 0.2 mm to 0.4 mm.

6. The roller structure according to claim 4, characterized in that: The tooth profile angle of each trapezoidal saw tooth is set to 20° to 60°.

7. The roller structure according to claim 4, characterized in that: The height of each trapezoidal sawtooth is set to 2 mm to 4 mm.

8. The roller structure according to claim 4, characterized in that: The distance between the tops of the trapezoidal saw teeth is set to 4 mm to 16 mm.

9. A roller system, characterized in that: The roller system comprises: X roller structures according to any one of claims 1 to 8; the roller structures are arranged in parallel; wherein X is a natural number greater than 1.

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