Clamping plug for photoetching exposure

Abstract

The clamping plug for photoetching exposure provided by the utility model comprises a first side plate and a second side plate, a connecting plate is arranged between the first side plate and the second side plate, the first side plate, the second side plate and the connecting plate define an installation space for accommodating a film source, a cover plate is arranged above the installation space, and the cover plate is connected with the first side plate and the second side plate. And the cover plate is connected with the first side plate and the second side plate and completely covers the mounting space. The clamping plug for photoetching exposure provided by the utility model can solve the problem that a film source to be exposed and after exposure is repeatedly exposed.

Description

Technical Field

[0001] The utility model relates to the technical field of photolithography exposure, in particular to a plug for photolithography exposure. Background Art

[0002] Photolithography exposure equipment is a key piece of equipment in chip manufacturing, used to transfer designed circuit patterns onto silicon wafers. Depending on the exposure wavelength and application area, photolithography exposure equipment can be divided into various types, including contact exposure, proximity exposure, and projection exposure. During the photolithography exposure process, the film source needs to be fixed in a card. The existing exposure card's original structure is shown in Figure 2. The space above the film source is a U-shaped opening. During exposure, it is placed vertically with the U-shaped opening facing upward. This design is flawed, causing the film source to be illuminated by scattered light before and after exposure, resulting in double exposure and ultimately abnormal product development. Utility Model Content

[0003] The technical problem to be solved by the present invention is to provide a photolithography exposure plug, which can solve the problem of repeated exposure of a film source before and after exposure.

[0004] In order to solve the above problems, the utility model provides a plug for photolithography exposure, including a first side plate and a second side plate, a connecting plate is provided between the first side plate and the second side plate, the first side plate, the second side plate and the connecting plate form an installation space for accommodating a film source, and a cover plate is provided above the installation space, the cover plate is connected to the first side plate and the second side plate and completely covers the installation space.

[0005] In one embodiment, the cover plate is detachably connected to the first side plate and the second side plate.

[0006] In one embodiment, the cover plate is detachably connected to the first side plate and the second side plate via threaded connections.

[0007] In one embodiment, the cover plate is detachably connected to the first side plate and the second side plate via a snap connection.

[0008] In one embodiment, the first side panel and the second side panel are provided with protrusions, the cover plate is provided with fixing holes, and the setting position and size of the protrusions match the fixing holes.

[0009] In one embodiment, fixing holes are provided on the first side plate and the second side plate, and protrusions are provided on the cover plate, and the location and size of the protrusions match the fixing holes.

[0010] In one embodiment, the connecting plate is in a perpendicular relationship to the first side plate and the second side plate.

[0011] In one embodiment, the first side panel and the second side panel have the same size.

[0012] In one embodiment, the connection plate is disposed at a midpoint of the width of the first side plate or the second side plate.

[0013] In one embodiment, the size of the installation space matches the size of the film source.

[0014] The utility model has the following beneficial effects:

[0015] The utility model proposes a plug for photolithography exposure, comprising a first side plate and a second side plate, a connecting plate being provided between the first side plate and the second side plate, the first side plate, the second side plate and the connecting plate forming an installation space for accommodating a film source, a cover plate being provided above the installation space, the cover plate being connected to the first side plate and the second side plate and completely covering the installation space.

[0016] Compared to existing plugs, the present invention features a cover plate above the mounting space. This cover plate is connected to the first and second side panels and completely covers the mounting space. This completely enclosed mounting space prevents exposure light from reaching the film source at the exposure and exposed positions, thus preventing secondary exposure of the film source and achieving a stable product appearance and dimensions. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a structural schematic diagram of a photolithography exposure plug of the utility model;

[0018] Figure 2 It is a structural schematic diagram of an existing photolithography exposure plug in the utility model. DETAILED DESCRIPTION

[0019] In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention will be described in further detail below with reference to the accompanying drawings.

[0020] In view of the above problems, the present invention provides a photolithography exposure plug, such as Figure 1 As shown, it includes a first side panel 1 and a second side panel 2, a connecting plate 3 is provided between the first side panel 1 and the second side panel 2, the first side panel 1, the second side panel 2 and the connecting plate 3 form an installation space for accommodating the film source, and a cover plate 4 is provided above the installation space, the cover plate 4 is connected to the first side panel 1 and the second side panel 2 and completely covers the installation space.

[0021] Unlike the prior art, the present invention features a cover plate 4 above the mounting space. This cover plate 4 is connected to the first side panel 1 and the second side panel 2 and completely covers the mounting space. This completely enclosed mounting space prevents exposure light from reaching the film source to be exposed or already exposed, thus preventing secondary exposure of the film source and achieving a stable product appearance and dimensions.

[0022] Specifically, in one embodiment, the cover plate 4 is detachably connected to the first side plate 1 and the second side plate 2. Compared with a fixed connection, a detachable connection has the advantages of convenient disassembly, easy maintenance, cost saving, and high flexibility.

[0023] In one embodiment, the cover plate 4 is detachably connected to the first side plate 1 and the second side plate 2 via a threaded connection. Threaded connection is a widely used detachable fixed connection with advantages such as simple structure, reliable connection, and easy assembly and disassembly.

[0024] In another embodiment, the cover plate 4 is detachably connected to the first side panel 1 and the second side panel 2 via a snap-fit ​​connection. Furthermore, to achieve the snap-fit ​​connection, in one embodiment, the first side panel 1 and the second side panel 2 are provided with protrusions, and the cover plate 4 is provided with fixing holes, with the protrusions positioned and sized to match the fixing holes. In another embodiment, the first side panel 1 and the second side panel 2 are provided with fixing holes, and the cover plate 4 is provided with protrusions, with the protrusions positioned and sized to match the fixing holes. The fixing holes guide the clips to the installation position smoothly, correctly, and quickly during installation, and the protrusions lock the clips in the fixing holes, ensuring that they do not fall off during use.

[0025] In one embodiment, the connecting plate 3 is perpendicular to the first side panel 1 and the second side panel 2. This design enhances stability, simplifies the structure, improves space utilization, facilitates maintenance, and reduces manufacturing costs. Preferably, the connecting plate 3 is positioned at the midpoint of the width of the first side panel 1 or the second side panel 2. This design ensures structural balance, uniform force distribution, simplifies the design, facilitates installation, and improves stability.

[0026] Furthermore, in one embodiment, the first side panel 1 and the second side panel 2 have the same size, which can simplify the production process, improve assembly accuracy, facilitate maintenance and replacement, improve the stability of the plug, and reduce material costs.

[0027] In one embodiment, the size of the installation space matches the size of the film source, so as to fully utilize the space, improve installation accuracy, reduce interference and friction, and ensure that the film source is optimally fixed in the jammer.

[0028] In summary, a plug for photolithography exposure is proposed, comprising a first side plate 1 and a second side plate 2, a connecting plate 3 being provided between the first side plate 1 and the second side plate 2, the first side plate 1, the second side plate 2 and the connecting plate 3 forming an installation space for accommodating a film source, a cover plate 4 being provided above the installation space, the cover plate 4 being connected to the first side plate 1 and the second side plate 2 and completely covering the installation space. Compared with existing plugs, the present invention provides a cover plate 4 above the installation space, the cover plate 4 being connected to the first side plate 1 and the second side plate 2 and completely covering the installation space. The installation space being completely enclosed above can block light during exposure from irradiating the film source to be exposed and the exposed position, thereby avoiding secondary exposure of the film source and obtaining a stable product development appearance and size.

[0029] The above disclosure is only a preferred embodiment of the present invention and certainly cannot be used to limit the scope of rights of the present invention. Therefore, equivalent changes made according to the claims of the present invention are still within the scope covered by the present invention.

Claims

1. A photolithography exposure plug, characterized in that: The device comprises a first side panel and a second side panel, wherein a connecting panel is provided between the first side panel and the second side panel, and the first side panel, the second side panel and the connecting panel form an installation space for accommodating a film source, and a cover panel is provided above the installation space, the cover panel being connected to the first side panel and the second side panel and completely covering the installation space; The cover plate is detachably connected to the first side plate and the second side plate via a snap connection; The first side plate and the second side plate are provided with fixing holes, and the cover plate is provided with a protrusion, and the setting position and size of the protrusion match the fixing hole.

2. The photolithography exposure plug according to claim 1, wherein: The cover plate is detachably connected to the first side plate and the second side plate through threaded connections.

3. The photolithography exposure plug according to claim 1, wherein: The first side plate and the second side plate are provided with protrusions, and the cover plate is provided with fixing holes. The setting position and size of the protrusions match the fixing holes.

4. The photolithography exposure plug according to claim 1, wherein: The connecting plate is in a perpendicular relationship to the first side plate and the second side plate.

5. The photolithography exposure plug according to claim 1, wherein: The first side panel and the second side panel have the same size.

6. The photolithography exposure plug according to claim 5, characterized in that: The connection plate is located at a midpoint of the width of the first side plate or the second side plate.

7. The photolithography exposure plug according to claim 1, characterized in that: The size of the installation space matches the size of the film source.

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