Silicon wafer cleaning device for photovoltaic panel production

Abstract

The utility model discloses a silicon wafer cleaning device for photovoltaic panel production, which relates to the technical field of silicon wafer cleaning and comprises a cleaning seat, a cleaning tank is arranged at the top end of the cleaning seat, a placing frame is arranged in an inner cavity of the cleaning tank, a connecting frame is fixedly connected to the top end of the placing frame, and the placing frame is used for storing silicon wafers. And the silicon wafer is driven to rotate by a rotating mechanism. By arranging the rotating mechanism, the placing frame is placed in the cleaning tank and moves into the inner cavity of the positioning frame, the motor is started to drive the rotating seat to rotate, the rotating seat drives the fluted disc to rotate, the fluted disc rotates to drive the straight gear to rotate, and the straight gear rotates to drive the rotating shaft to rotate; the rotating shaft rotates to drive the rotating wheel to rotate, and the rotating wheel rotates to drive the silicon wafer to rotate in the placing groove, so that when the silicon wafer is cleaned, the silicon wafer is driven to rotate in the cleaning groove, and the silicon wafer is in full contact with the cleaning liquid.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer cleaning, in particular to a silicon wafer cleaning device for photovoltaic panel production. Background Art

[0002] A photovoltaic panel assembly is a power generation device that generates direct current when exposed to sunlight. It is composed of thin, solid photovoltaic cells made almost entirely of semiconductor materials (such as silicon). Since it has no moving parts, it can operate for long periods of time without any loss. Simple photovoltaic cells can provide energy for watches and computers, while more complex photovoltaic systems can provide lighting for houses and power the grid. Photovoltaic panel assemblies can be made into different shapes and the assemblies can be connected to generate more electricity. Photovoltaic panel assemblies are used on rooftops and building surfaces, and are even used as part of windows, skylights or shading devices. These photovoltaic facilities are often referred to as building-attached photovoltaic systems.

[0003] During the production process of photovoltaic panels, silicon wafers need to be cleaned to remove cutting fluid, mortar, silicon carbide, etc. on the surface of the silicon wafers. Usually, the silicon wafers are placed in a silicon wafer cleaning tank and cleaned with a silicon wafer cleaning agent. However, when cleaning the silicon wafers, multiple silicon wafers are placed in a placement frame, and the frame is placed in the cleaning tank for cleaning. This may easily cause the contact position between the silicon wafer and the placement frame to not fully contact with the cleaning liquid, affecting the cleaning effect of the silicon wafer. In order to achieve the purpose of sufficient contact between the silicon wafer and the cleaning liquid, a silicon wafer cleaning device for photovoltaic panel production is provided. Utility Model Content

[0004] The purpose of the utility model is to provide a silicon wafer cleaning device for photovoltaic panel production in order to achieve the purpose of ensuring that the silicon wafer is fully in contact with the cleaning liquid.

[0005] To achieve the above-mentioned object, the present invention provides the following technical solution: a silicon wafer cleaning device for photovoltaic panel production, comprising a cleaning seat, a cleaning tank being formed at the top of the cleaning seat, a placement frame being provided in the inner cavity of the cleaning tank, a connecting frame being fixedly connected to the top of the placement frame, the placement frame being used to store silicon wafers, and the silicon wafers being driven to rotate by a rotating mechanism;

[0006] The top end face of the lifting gear is fixedly provided with a toothed wheel, and the bottom end face of the toothed wheel is fixedly provided with a toothed wheel, and the toothed wheel is in contact with the toothed wheel.

[0007] As a further solution of the present invention: the inner wall of the positioning frame is in contact with the outer wall of the placement frame, and the rotating seat is located below the gear disc.

[0008] As a further solution of the present invention: the first clamping block is engaged with the second clamping block.

[0009] As a further solution of the present invention: a tooth groove is formed on the outer wall of the toothed disc, and the tooth groove is engaged with the spur gear.

[0010] As a further solution of the present invention: the worm wheel is matched with the worm.

[0011] As a further solution of the present invention: a side plate is fixedly connected to one side of the bottom end of the cleaning seat, the motor is installed on the outer wall of the side plate, the output end of the motor is connected to a connecting shaft, and one end of the connecting shaft is fixedly connected to a first bevel gear.

[0012] As a further solution of the present invention: the bottom end of the rotating seat is fixedly connected to a mounting shaft, the bottom end of the mounting shaft is fixedly connected to a second bevel gear, and the first bevel gear is meshed with the second bevel gear.

[0013] Compared with the prior art, the beneficial effects of the present invention are:

[0014] By setting up a rotating mechanism, the placement frame is placed into the cleaning tank, the placement frame moves into the inner cavity of the positioning frame, and the motor is started to drive the rotating seat to rotate. The rotating seat drives the gear disc to rotate, and the rotation of the gear disc drives the spur gear to rotate. The rotation of the spur gear drives the rotating shaft to rotate, and the rotation of the rotating shaft drives the rotating wheel to rotate. The rotation of the rotating wheel drives the silicon wafer to rotate in the placement tank, so that when the silicon wafer is cleaned, the silicon wafer is driven to rotate in the cleaning tank, so that the silicon wafer is fully in contact with the cleaning liquid. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a structural diagram of the utility model;

[0016] Figure 2 This is a schematic diagram of the installation of the placement frame of the utility model;

[0017] Figure 3 It is a cross-sectional view of the placement frame of the utility model;

[0018] Figure 4 This is a schematic structural diagram of the toothed disc of the present invention;

[0019] Figure 5 It is a cross-sectional view of the cleaning seat of the present utility model.

[0020] In the figure: 1. Cleaning seat; 2. Cleaning tank; 3. Placement frame; 4. Connecting frame; 5. Silicon wafer; 6. Rotating mechanism; 601. Positioning frame; 602. Placement tank; 603. Rotating wheel; 604. Rotating shaft; 605. Worm gear; 606. Worm; 607. Spur gear; 608. Toothed plate; 609. First clamping block; 610. Rotating seat; 611. Second clamping block; 612. Motor; 7. Side plate; 8. Connecting shaft; 9. First bevel gear; 10. Second bevel gear; 11. Mounting shaft. DETAILED DESCRIPTION

[0021] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0022] See also Figures 1 to 5In an embodiment of the present invention, a silicon wafer cleaning device for photovoltaic panel production includes a cleaning seat 1, a cleaning tank 2 is provided at the top of the cleaning seat 1, a placement frame 3 is provided in the inner cavity of the cleaning tank 2, a connecting frame 4 is fixedly connected to the top of the placement frame 3, the placement frame 3 is used to store silicon wafers 5, and the silicon wafer 5 is driven to rotate by a rotating mechanism 6; the rotating mechanism 6 includes a positioning frame 601, the positioning frame 601 is fixedly connected to the bottom end of the inner wall of the cleaning tank 2, the placement frame 3 is placed in the inner cavity of the positioning frame 601, a placement groove 602 is provided on the inner wall of the placement frame 3, the silicon wafer 5 is slidably connected to the placement groove 602, and the interior of the placement frame 3 is rotatably connected to a rotating wheel 603 extending to the inner cavity of the placement groove 602, and the rotating wheel on the same side 603 are all fixedly connected through a rotating shaft 604, and a worm gear 605 is fixedly connected to the outer wall of a rotating shaft 604, and a worm 606 is provided on the outer wall of the worm gear 605, and the bottom end of the worm 606 is fixedly connected to a spur gear 607, and the spur gear 607 is rotatably connected to the inside of the placement frame 3, and the bottom end of the placement frame 3 is rotatably connected to a toothed disc 608, and the toothed disc 608 is in contact with the spur gear 607, and the bottom end of the toothed disc 608 is fixedly connected to a first clamping block 609, and the bottom end of the inner wall of the cleaning seat 1 is located at the bottom end of the positioning frame 601 and is rotatably connected to a rotating seat 610, and the top of the rotating seat 610 is fixedly connected to a second clamping block 611, and the bottom end of the cleaning seat 1 is installed with a motor 612 for driving the rotating seat 610 to rotate.

[0023] In this embodiment, when cleaning the silicon wafer 5, the silicon wafer 5 is placed in the placement tank 602, and then the placement frame 3 is placed in the cleaning tank 2. The placement frame 3 moves into the inner cavity of the positioning frame 601. At this time, the toothed disc 608 is aligned with the rotating seat 610, and the second clamping block 611 is engaged with the first clamping block 609. Then, the motor 612 is started to drive the rotating seat 610 to rotate. The rotating seat 610 drives the toothed disc 608 to rotate through the first clamping block 609 and the second clamping block 611. 8 rotates to drive the spur gear 607 to rotate, the spur gear 607 rotates to drive the worm 606 to rotate, the worm 606 rotates to drive the worm wheel 605 to rotate, the worm wheel 605 rotates to drive the rotating shaft 604 to rotate, the rotating shaft 604 rotates to drive the rotating wheel 603 to rotate, the rotating wheel 603 drives the silicon wafer 5 to rotate in the placement tank 602, so that when the silicon wafer 5 is cleaned, it drives the silicon wafer 5 to rotate in the cleaning tank 2, so that the silicon wafer 5 is fully in contact with the cleaning liquid.

[0024] Please refer to Figures 2 to 5 The inner wall of the positioning frame 601 is in contact with the outer wall of the placement frame 3 , and the rotating seat 610 is located below the gear disc 608 .

[0025] In this embodiment, the placement frame 3 is placed into the cleaning tank 2 , and the placement frame 3 moves into the inner cavity of the positioning frame 601 . At this time, the toothed disc 608 is aligned with the rotating base 610 .

[0026] Please refer to Figures 4-5 , the first card block 609 is engaged with the second card block 611.

[0027] In this embodiment, the starting motor 612 drives the rotating base 610 to rotate, and the rotating base 610 drives the gear plate 608 to rotate through the first clamping block 609 and the second clamping block 611 .

[0028] Please refer to Figures 3-4 The outer wall of the toothed disc 608 is provided with tooth grooves, which mesh with the spur gear 607 , and the worm wheel 605 matches the worm 606 .

[0029] In this embodiment, the gear plate 608 rotates to drive the spur gear 607 to rotate, the spur gear 607 rotates to drive the worm 606 to rotate, the worm 606 rotates to drive the worm wheel 605 to rotate, the worm wheel 605 rotates to drive the rotating shaft 604 to rotate, and the rotating shaft 604 rotates to drive the rotating wheel 603 to rotate.

[0030] Please refer to Figure 5 The bottom end of the cleaning seat 1 is fixedly connected to the side plate 7, the motor 612 is installed on the outer wall of the side plate 7, the output end of the motor 612 is connected to the connecting shaft 8, one end of the connecting shaft 8 is fixedly connected to the first bevel gear 9, the bottom end of the rotating seat 610 is fixedly connected to the mounting shaft 11, the bottom end of the mounting shaft 11 is fixedly connected to the second bevel gear 10, and the first bevel gear 9 is meshed with the second bevel gear 10.

[0031] In this embodiment: when driving the rotating seat 610 to rotate, the motor 612 is started, and the motor 612 drives the connecting shaft 8 to rotate, the connecting shaft 8 rotates to drive the first bevel gear 9 to rotate, the first bevel gear 9 rotates to drive the second bevel gear 10 to rotate, the second bevel gear 10 rotates to drive the installation shaft 11 to rotate, and the installation shaft 11 rotates to drive the rotating seat 610 to rotate.

[0032] The above is only a preferred specific implementation method of the present invention, but the protection scope of the present invention is not limited to this. Any technician familiar with the technical field within the technical scope disclosed by the present invention can make equivalent replacements or changes based on the technical solution and utility model concept of the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A silicon wafer cleaning device for photovoltaic panel production, comprising a cleaning seat (1), a cleaning tank (2) is provided at the top of the cleaning seat (1), a placement frame (3) is provided in the inner cavity of the cleaning tank (2), a connecting frame (4) is fixedly connected to the top of the placement frame (3), and the placement frame (3) is used to store silicon wafers (5), characterized in that: The silicon wafer (5) is driven to rotate by a rotating mechanism (6); The rotating mechanism (6) includes a positioning frame (601), the positioning frame (601) is fixedly connected to the bottom end of the inner wall of the cleaning tank (2), the placement frame (3) is placed in the inner cavity of the positioning frame (601), the inner wall of the placement frame (3) is provided with a placement groove (602), the silicon wafer (5) is slidably connected in the placement groove (602), the internal rotation of the placement frame (3) is connected to a rotating wheel (603) extending to the inner cavity of the placement groove (602), the rotating wheels (603) on the same side are fixedly connected through a rotating shaft (604), the outer wall of one of the rotating shafts (604) is fixedly connected to a worm wheel (605), and the outer wall of the worm wheel (605) is provided with a worm (606) ), the bottom end of the worm (606) is fixedly connected to a spur gear (607), the spur gear (607) is rotatably connected to the inside of the placement frame (3), the bottom end of the placement frame (3) is rotatably connected to a toothed disc (608), the toothed disc (608) is in contact with the spur gear (607), the bottom end of the toothed disc (608) is fixedly connected to a first clamping block (609), the bottom end of the inner wall of the cleaning seat (1) is located at the bottom end of the positioning frame (601) and is rotatably connected to a rotating seat (610), the top end of the rotating seat (610) is fixedly connected to a second clamping block (611), and the bottom end of the cleaning seat (1) is installed with a motor (612) for driving the rotating seat (610) to rotate.

2. A silicon wafer cleaning device for photovoltaic panel production according to claim 1, characterized in that: The inner wall of the positioning frame (601) is in contact with the outer wall of the placement frame (3), and the rotating seat (610) is located below the toothed disc (608).

3. The silicon wafer cleaning device for photovoltaic panel production according to claim 1, characterized in that: The first clamping block (609) is engaged with the second clamping block (611).

4. The silicon wafer cleaning device for photovoltaic panel production according to claim 1, characterized in that: The outer wall of the toothed disc (608) is provided with a tooth groove, and the tooth groove is engaged with the spur gear (607).

5. The silicon wafer cleaning device for photovoltaic panel production according to claim 1, characterized in that: The worm wheel (605) matches the worm (606).

6. The silicon wafer cleaning device for photovoltaic panel production according to claim 1, characterized in that: A side plate (7) is fixedly connected to one side of the bottom end of the cleaning seat (1), the motor (612) is mounted on the outer wall of the side plate (7), the output end of the motor (612) is connected to a connecting shaft (8), and one end of the connecting shaft (8) is fixedly connected to a first bevel gear (9).

7. The silicon wafer cleaning device for photovoltaic panel production according to claim 6, characterized in that: The bottom end of the rotating seat (610) is fixedly connected to a mounting shaft (11), the bottom end of the mounting shaft (11) is fixedly connected to a second bevel gear (10), and the first bevel gear (9) is meshed with the second bevel gear (10).

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