Rotary target material outer wall polishing device

By designing a rotating target outer wall polishing device and using a guide mechanism and polishing assembly to optimize the polishing process, the problems of low polishing efficiency and uneven effect in the existing technology are solved, and efficient and uniform target polishing and sputtering effects are achieved.

CN223353924UActive Publication Date: 2025-09-19WUHAN FENGKE JINGSHENG ELECTRONIC MATERIALS CO LTD
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Patent Information

Application Number
CN202421821050.1
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-07-30
Publication Date
2025-09-19
Estimated Expiration
2034-07-30

AI Technical Summary

Technical Problem

The existing target polishing process is inefficient and has uneven polishing effects, resulting in poor sputtering effects and prone to abnormal discharge and spattering.

Method used

A device for polishing the outer wall of a rotating target is designed. A guide mechanism is used to drive the polishing body to move along the length direction of the rotating target. The polishing body is matched with the outer wall of the target and polished by a polishing component such as sandpaper or scouring pad. The polishing interval is adjusted in combination with a jumping meter component to improve the polishing uniformity.

Benefits of technology

The target polishing efficiency and surface roughness uniformity and stability are improved, the sputtering effect is improved, and discharge abnormalities and splashing are avoided.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model provides a rotary target material outer wall polishing device which comprises a machine frame, a polishing body and a guide mechanism, the guide mechanism is arranged on the machine frame, the guide mechanism is in transmission connection with the polishing body, the polishing body is provided with an arc-shaped polishing end face, and a polishing assembly is arranged on the polishing end face. The target material polishing device improves the target material polishing efficiency and enables the surface roughness of the target material to be uniform.
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Description

Technical Field

[0001] The utility model belongs to the technical field of target material polishing and relates to a rotating target material outer wall polishing device. Background Art

[0002] The target material consists of a flange section, a sputtering part and a cap port. During the sputtering process, a magnet needs to be placed inside the rotating target material on the sputtering machine to drive the magnet to move in a specific trajectory, and water is introduced for cooling. One side of the rotating target material flange section is installed in the rotating base of the sputtering machine, thereby driving the rotating target material to rotate over and over again. The rotating base and the flange section are threadedly locked to form a rigid connection (one target material corresponds to one rotating base), and a sealing ring is provided between the flange section and the rotating base to prevent the cooling water from overflowing and causing the vacuum degree in the cavity to drop. The sputtering part is the middle part of the target material and has a length of 2692mm. The cap end is generally used for hoisting the target material, that is, it is hoisted from the target box to the rotating base corresponding to the sputtering machine through the head pulley, so that the flange end faces downward, and then the corresponding bolts are screwed into the threaded holes of the flange port and fixed to the threaded holes on the rotating base. After the target material is installed in place, there is an anode rod on the side of the target material. The target material is the negative electrode. A voltage is connected between the anode rod and the target material. Ar+ plasma is formed by ionizing the argon gas inside the sputtering machine. Ar+ is then used to bombard the target material. The atoms on the target material are bombarded and leave the target material, and are deposited on the glass substrate opposite to form a thin film.

[0003] The sputtering effect of the target is closely related to its surface roughness. If the roughness is uneven, it is easy to cause arc failure or abnormal discharge leading to spattering, which seriously affects the quality of the target and thus makes the sputtering effect fail to meet the requirements. Therefore, the target needs to be polished.

[0004] Currently, the target polishing process involves placing the target on a machine tool, rotating the target using a drive, and then placing a grinding wheel next to the target. Each rotation of the target is matched by the grinding wheel, which polishes the target through contact with the target's outer wall. The grinding wheel gradually moves along the target's length until the entire target's outer wall is polished. However, existing target polishing processes are time-consuming and inefficient. Furthermore, due to fluctuations in the target's straightness, the required tightness between the grinding wheel and the target's outer wall varies, resulting in fluctuating polishing results.

[0005] Therefore, it is necessary to provide a new polishing device to improve the polishing process of the target material, thereby improving the sputtering effect of the target material. Utility Model Content

[0006] In view of the shortcomings of the prior art, the purpose of the present invention is to provide a rotating target outer wall polishing device, which improves the target polishing efficiency and makes the target surface roughness uniform.

[0007] To achieve this purpose, the present invention adopts the following technical solutions:

[0008] The utility model provides a rotating target outer wall polishing device, which includes a frame, a polishing body and a guide mechanism. The guide mechanism is arranged on the frame, and the guide mechanism is transmission-connected to the polishing body. The polishing body has an arc-shaped polishing end face, and a polishing component is arranged on the polishing end face.

[0009] In the present invention, a rotating target is capable of continuous rotation on a frame, and a guide mechanism is used to drive the movement of a polishing body. The polishing body extends along the length of the rotating target, and the polishing end face matches the shape of the rotating target, at least partially covering the rotating target, so that the arc surface coincides with the outer wall of the rotating target. When polishing, the polishing body is driven toward the rotating target until the polishing end face contacts the outer wall of the rotating target, and polishing is achieved based on the rotation of the rotating target on the frame. After polishing is completed, the polishing body is driven away from the rotating target to reset, and the rotating target is removed.

[0010] As an optimal technical solution of the present invention, the polishing body is an integrated structure, the guide mechanism includes a driving motor, a guide screw and a movable base, the two ends of the guide screw are respectively connected to the driving motor and the movable base, used to drive the movable base to move, and the polishing body is fixedly connected to the movable base.

[0011] As a preferred technical solution of the present invention, at least two support rods are provided at the bottom of the polishing body, and one end of the support rod away from the polishing body is fixedly connected to the movable base.

[0012] As a preferred technical solution of the present invention, the polishing end surface of the polishing body can be detachably provided with a beat-marking assembly, and the beat-marking assembly is used to capture the circumferential beat of the rotating target material.

[0013] The utility model provides a beating meter component on the polishing body to capture the circumferential beating of the target material before polishing, thereby providing data support for the guide mechanism to adjust the distance between the polishing body and the outer wall of the target material, which is beneficial to improving the uniformity of the polishing effect.

[0014] As a preferred technical solution of the present invention, the polishing assembly is detachably connected to the polishing body.

[0015] As a preferred technical solution of the present invention, the polishing component includes sandpaper or scouring pad.

[0016] As a preferred technical solution of the present invention, the polishing body is composed of a plurality of polishing support bodies, and the plurality of polishing support bodies are sequentially butted end to end along the length direction of the polishing body.

[0017] As an optimal technical solution of the present invention, the guide mechanism includes a driving component and several screw components, and the several screw components are independently connected to the driving component. The several screw components are arranged at intervals along the length direction of the polishing body. The screw components correspond one-to-one to the polishing support body, and the end of the screw component away from the driving component is connected to the polishing support body.

[0018] The utility model divides the polishing body into sections along its length direction so as to independently adjust the distance between each polishing support body and the outer wall of the target material, which is beneficial to improving the stability of polishing and avoiding the influence of straightness on the polishing effect.

[0019] As a preferred technical solution of the present invention, the polishing body is formed by splicing a plurality of arc-shaped connectors, the arc-shaped connectors extend along the length direction of the polishing body, and the plurality of arc-shaped connectors are connected in sequence along the radial direction.

[0020] As an optimal technical solution of the present invention, the guide mechanism includes a driving component, a guide cross bar and a plurality of supporting links. The driving component is transmission-connected to the guide cross bar. The plurality of supporting links are uprightly fixed on the guide cross bar. The supporting links correspond one-to-one to the arc-shaped connector. The end of the supporting link away from the guide cross bar is connected to the arc-shaped connector, and the heights of the plurality of supporting links are different.

[0021] The utility model divides the polishing body into sections along its radial direction so as to independently adjust the distance between each arc-shaped connector and the outer wall of the target material, which is beneficial to improving the stability of polishing.

[0022] Compared with the prior art, the beneficial effects of the present invention are:

[0023] The utility model provides a device for polishing the outer wall of a rotating target material, which polishes the target material based on its rotation. The polishing body is matched with the outer wall of the rotating target material, thereby improving the stability of the polishing. The distance between the polishing body and the rotating target material can be adjusted, thereby improving the polishing efficiency of the target material and making the surface roughness of the target material uniform. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 A schematic structural diagram of a rotating target outer wall polishing device provided in Example 1 of the present utility model;

[0025] Figure 2 A schematic structural diagram of the polishing end surface of the rotating target outer wall polishing device provided in Example 2 of the present utility model;

[0026] Figure 3 This is a structural schematic diagram of the polishing end face of the rotating target outer wall polishing device provided in Example 3 of the present utility model.

[0027] Among them, 1-polishing body; 2-rotating target; 3-polishing end face; 4-driving motor; 5-guide screw; 6-moving base plate; 7-support rod; 8-polishing support body; 9-arc connector. DETAILED DESCRIPTION

[0028] It should be understood that in the description of the present invention, the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "back," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like, indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings and are intended solely to facilitate the description of the present invention and simplify the description. They do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limiting the present invention. In the description of the present invention, unless otherwise specified, "plurality" means two or more.

[0029] It should be noted that, in the description of this utility model, unless otherwise expressly specified or limited, the terms "disposed," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections, electrical connections; direct connections, indirect connections through an intermediate medium, and internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on specific circumstances.

[0030] The technical solution of the present invention will be further described below with reference to the accompanying drawings and through specific implementation methods.

[0031] In one specific embodiment, the present invention provides a device for polishing the outer wall of a rotating target, comprising a frame, a polishing body, and a guide mechanism. The guide mechanism is disposed on the frame and is in transmission connection with the polishing body. The polishing body has an arc-shaped polishing end face, and a polishing assembly is disposed on the polishing end face. The frame adopts a frame structure commonly used in the art for supporting rotating targets, and the rotating target is driven to continuously rotate on the frame by a drive device well known to those skilled in the art. The guide mechanism is used to drive the polishing body to move toward or away from the rotating target. The polishing body extends along the length of the rotating target, and the polishing end face on the side close to the rotating target is arc-shaped, conforming to the circular outer wall of the rotating target, thereby partially covering the rotating target for polishing. The present invention does not specifically limit the coverage area of ​​the polishing body, and those skilled in the art can adjust it according to actual polishing conditions, the size of the rotating target, etc. For example, the polishing body can cover 1 / 2 to 1 / 3 of the circumference of the rotating target along the radial direction for polishing.

[0032] In some embodiments, the polishing body is an integrated structure, and the guide mechanism includes a drive motor, a guide screw and a movable base plate, the two ends of the guide screw are respectively connected to the drive motor and the movable base plate, for driving the movable base plate to move, and the polishing body is fixedly connected to the movable base plate. Specifically, at least two support rods are provided at the bottom of the polishing body, and one end of the support rod away from the polishing body is fixedly connected to the movable base plate. During application, the drive motor is turned on to drive the guide screw to push the movable base plate to move toward the rotating target, thereby driving the polishing body to approach the rotating target, until the polishing body is close to the rotating target and then polishing is performed. After the polishing process is completed, the drive motor is turned on again to drive the guide screw to pull the movable base plate to move away from the rotating target, thereby driving the polishing body to reset away from the rotating target, and then the rotating target with uniform surface roughness is removed.

[0033] In some embodiments, the polishing end face of the polishing body can also be detachably provided with a beating meter assembly, and the beating meter assembly is used to capture the circumferential runout of the rotating target before polishing. Before starting the polishing process, the beating meter assembly is installed on the polishing end face to capture the circumferential runout of the rotating target, thereby providing data support for the guide mechanism to adjust the distance between the polishing body and the outer wall of the target; when preparing for the polishing process, the beating meter assembly is removed to avoid obstructing the polishing process, and then the distance between the polishing body and the outer wall of the target is adjusted, and the polishing process is carried out after preparation is completed. The beating meter assembly in the present invention can adopt any beating meter instrument commonly used in the field, and the present invention does not make specific limitations on this.

[0034] In some embodiments, the polishing assembly is detachably connected to the polishing body. The present invention does not specifically limit the detachable connection method, and any method commonly used in the art can be used, such as gluing or bolting.

[0035] Specifically, the polishing component includes sandpaper or scouring pad. Preferably, the mesh number of the sandpaper is 300-800 mesh, including but not limited to silicon carbide sandpaper, aluminum oxide sandpaper or diamond sandpaper. The model of the scouring pad includes but is not limited to 500# scouring pad, 800# scouring pad or 2000# scouring pad,

[0036] In some embodiments, the polishing body is composed of a plurality of polishing supports, which are sequentially butted end to end along the length of the polishing body. Furthermore, the guide mechanism includes a drive component and a plurality of lead screw components, each of which is independently connected to the drive component through a transmission mechanism. The lead screw components are spaced apart along the length of the polishing body, each corresponding to each polishing support. The end of each lead screw component remote from the drive component is connected to the polishing support. The drive component is used to drive the lead screw component to move, thereby driving the polishing support to move along the surface of the frame toward or away from the rotating target.

[0037] In some embodiments, the polishing body is formed by splicing together a number of arc-shaped connectors, the arc-shaped connectors extend along the length direction of the polishing body, and a number of the arc-shaped connectors are connected in sequence along the radial direction. Furthermore, the guide mechanism includes a driving component, a guide cross bar and a number of support links. The driving component is connected to the guide cross bar in a transmission manner, and a number of the support links are upright and fixed on the guide cross bar. The support links correspond to the arc-shaped connectors one by one, and the end of the support link away from the guide cross bar is connected to the arc-shaped connector. The heights of the several support links are different from each other to correspond to different arc-shaped connectors, and the driving component is used to drive the guide cross bar to move along the surface of the frame toward or away from the rotating target material, thereby driving the support links and the arc-shaped connector to move.

[0038] Example 1

[0039] This embodiment provides a device for polishing the outer wall of a rotating target 2, comprising a frame, a polishing body 1 and a guide mechanism. The frame is used to support the rotating target 2, and the rotating target 2 can rotate on the frame. Figure 1As shown, the polishing body 1 is an integrated structure extending along the length direction of the rotating target 2. The side close to the rotating target 2 has an arc-shaped polishing end face 3, and sandpaper is pasted on the polishing end face 3. The polishing end face 3 can also be detachably provided with a runout meter component for capturing the circumferential runout of the rotating target 2 before polishing. The guide mechanism includes a drive motor 4, a guide screw 5 and a movable base plate 6. The drive motor 4 is fixed to the frame, and the two ends of the guide screw 5 are respectively connected to the drive motor 4 and the movable base. The drive motor 4 drives the movable base plate 6 to move along the surface of the frame through the guide screw 5. At least two support rods 7 are provided at the bottom of the polishing body 1. The end of the support rod 7 away from the polishing body 1 is fixedly connected to the movable base, so that the polishing body 1 moves toward or away from the rotating target 2 as the movable base moves.

[0040] Example 2

[0041] This embodiment provides a device for polishing the outer wall of a rotating target 2, comprising a frame, a polishing body 1 and a guide mechanism. The frame is used to support the rotating target 2, and the rotating target 2 can rotate on the frame. Figure 2 As shown, the polishing body 1 extends in the direction of the rotating target 2 and is composed of seven polishing supports 8, and the seven polishing supports 8 are connected end to end in sequence along the length direction of the polishing body 1. The polishing support 8 has an arc-shaped polishing end face 3 on the side close to the rotating target 2, and a scouring pad is pasted on the polishing end face 3. The polishing end face 3 is also removably provided with a beating meter assembly for capturing the circumferential beating of the rotating target 2 before polishing. The guide mechanism includes a driving component and seven screw components, and the seven screw components are independently connected to the driving component. The seven screw components are arranged at intervals along the length direction of the polishing body 1 and correspond one to one to the polishing supports 8. The end of the screw component away from the driving component is connected to the polishing support 8, and the driving component is used to drive the screw component to move along the surface of the frame, thereby driving the seven polishing supports 8 to move simultaneously in the direction of approaching or away from the rotating target 2.

[0042] Example 3

[0043] This embodiment provides a device for polishing the outer wall of a rotating target 2, comprising a frame, a polishing body 1 and a guide mechanism. The frame is used to support the rotating target 2, and the rotating target 2 can rotate on the frame. Figure 3As shown, the polishing body 1 extends along the rotating target 2 and is formed by three arcuate connectors 9. The arcuate connectors 9 extend along the length of the polishing body 1 and are radially aligned with each other to align with the outer wall of the rotating target 2. The arcuate connector 9 has a curved polishing end face 3 on the side closest to the rotating target 2, with sandpaper attached to the polishing end face 3. The polishing end face 3 is also removably provided with a runout meter assembly to measure the circumferential runout of the rotating target 2 before polishing. The guide mechanism includes a drive component, a guide crossbar, and three supporting links of varying heights. The drive component is connected to the guide crossbar, and the three supporting links are vertically fixed to the guide crossbar and correspond to the three arcuate connectors 9. The ends of the supporting links facing away from the guide crossbar are connected to the arcuate connectors 9. The drive component drives the guide crossbar to move along the surface of the frame, thereby driving the supporting links and the arcuate connectors 9 to move simultaneously toward or away from the rotating target 2.

[0044] The applicant declares that the above is only a specific implementation method of the present invention, but the protection scope of the present invention is not limited thereto. Technicians in the relevant technical field should understand that any changes or substitutions that can be easily thought of by technicians in the relevant technical field within the technical scope disclosed in the present invention fall within the protection scope and disclosure scope of the present invention.

Claims

1. A rotating target outer wall polishing device, characterized in that: The rotating target outer wall polishing device includes a frame, a polishing body and a guide mechanism, wherein the guide mechanism is arranged on the frame and is transmission-connected to the polishing body, the polishing body has an arc-shaped polishing end face, and a polishing assembly is arranged on the polishing end face; The guide mechanism includes a driving motor, a guide screw and a movable base plate, the two ends of the guide screw are respectively connected to the driving motor and the movable base, and are used to drive the movable base plate to move, and the polishing body is fixedly connected to the movable base plate; The polishing end surface of the polishing body can also be detachably provided with a beat-marking assembly, and the beat-marking assembly is used to capture the circumferential beat of the rotating target material.

2. The rotating target outer wall polishing device according to claim 1, characterized in that: The polishing body is an integrated structure.

3. The rotating target outer wall polishing device according to claim 2, characterized in that: At least two support rods are provided at the bottom of the polishing body, and one end of the support rod away from the polishing body is fixedly connected to the movable base.

4. The rotating target outer wall polishing device according to claim 1, characterized in that: The polishing assembly is detachably connected to the polishing body.

5. The rotating target outer wall polishing device according to claim 1, characterized in that: The polishing component includes sandpaper or scouring pad.

6. The rotating target outer wall polishing device according to claim 1, characterized in that: The polishing body is composed of a plurality of polishing support bodies, and the plurality of polishing support bodies are connected end to end in sequence along the length direction of the polishing body.

7. The rotating target outer wall polishing device according to claim 6, characterized in that: The guide mechanism includes a driving component and several screw components, which are independently connected to the driving component. The several screw components are arranged at intervals along the length direction of the polishing body. The screw components correspond one-to-one to the polishing support body, and the end of the screw component away from the driving component is connected to the polishing support body.

8. The rotating target outer wall polishing device according to claim 6, characterized in that: The polishing body is formed by splicing a plurality of arc-shaped connectors, the arc-shaped connectors extend along the length direction of the polishing body, and the plurality of arc-shaped connectors are connected in sequence along the radial direction.

9. The rotating target outer wall polishing device according to claim 6, characterized in that: The guide mechanism includes a driving component, a guide cross bar and a plurality of supporting links. The driving component is connected to the guide cross bar in a transmission manner. The plurality of supporting links are uprightly fixed on the guide cross bar. The supporting links correspond one-to-one to the arc-shaped connectors. The end of the supporting link away from the guide cross bar is connected to the arc-shaped connector. The heights of the plurality of supporting links are different.