Evaporation equipment

Abstract

The utility model discloses evaporation equipment, and relates to the technical field of evaporation. The evaporation equipment comprises an equipment body, a source housing, a flow guide plate, an evaporation source and an adjusting mechanism, the equipment body is provided with an evaporation cavity, and an evaporation substrate is arranged in the evaporation cavity; the flow guide plate and the source housing are connected and jointly define a mixing cavity, the evaporation source is located in the mixing cavity, the flow guide plate and the evaporation substrate are oppositely arranged, and flow guide holes communicating the mixing cavity with the evaporation cavity are formed in the flow guide plate in a penetrating mode. The adjusting mechanism is in transmission connection with the flow guide plate and used for driving the flow guide plate to move in the direction close to or away from the evaporation substrate. The evaporation effect of the evaporation equipment is controllable, and different evaporation requirements can be met.

Description

Technical Field

[0001] The utility model relates to the technical field of evaporation, in particular to an evaporation device. Background Art

[0002] Evaporation equipment is widely used in coating processes. It heats the evaporation source to cause the evaporation material in the evaporation source to evaporate or sublime to form a vaporized substance. After the vaporized substance is released by the evaporation source, it moves to the surface of the evaporation substrate in the vacuum evaporation chamber and completes the deposition to form a film layer.

[0003] At present, the evaporation equipment on the market has uncontrollable evaporation effects, including deposition efficiency and deposition uniformity, due to the diffuse distribution of vaporized substances released by the evaporation source in the evaporation chamber. In addition, the evaporation effect is basically fixed, making it difficult to meet different evaporation needs. Utility Model Content

[0004] The purpose of the utility model is to provide an evaporation device, the evaporation effect of which is controllable and can adapt to different evaporation requirements.

[0005] The embodiment of the present utility model provides a technical solution:

[0006] An evaporation device comprises an equipment body, a source cover, a guide plate, an evaporation source and an adjustment mechanism, wherein the equipment body has an evaporation chamber, and an evaporation substrate is arranged in the evaporation chamber;

[0007] The guide plate is connected to the source cover and together they form a mixing chamber, the evaporation source is located in the mixing chamber, the guide plate is arranged opposite to the evaporation substrate, and a guide hole is provided through the guide plate, and the mixing chamber is connected to the evaporation chamber through the guide hole;

[0008] The adjusting mechanism is in transmission connection with the guide plate and is used for driving the guide plate to move so as to adjust the distance between the guide plate and the evaporation substrate.

[0009] The evaporation device provided by the embodiment of the present invention has an evaporation source in a mixing chamber, an evaporation substrate in the evaporation chamber, and the mixing chamber is connected to the evaporation chamber through the guide holes on the guide plate. The vaporized substances released by the evaporation source are mixed in the mixing chamber and can diffuse in the mixing chamber, making the distribution more uniform. The vaporized substances can further diffuse through the guide holes of the guide plate, making the distribution more uniform when the evaporation material flows to the evaporation substrate. Moreover, under the guidance of the guide holes, the evaporation material flows to the evaporation substrate in a controllable flow direction, which can improve the evaporation efficiency and uniformity. In addition, by adjusting the distance between the guide plate and the evaporation substrate by the adjustment mechanism, the range of the deposition area on the evaporation substrate and the magnitude of the deposition rate can be changed, and the deposition uniformity and the coating thickness can be improved, thereby achieving the purpose of changing the evaporation effect to adapt to different evaporation requirements and improving the material utilization rate. Therefore, the evaporation effect of the evaporation device provided by the embodiment of the present invention is controllable and can adapt to different evaporation requirements. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] To more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the embodiments. It should be understood that the following drawings only illustrate certain embodiments of the present invention and should not be considered as limiting the scope of the present invention. Those skilled in the art can also derive other relevant drawings based on these drawings without inventive effort.

[0011] Figure 1 A schematic diagram of the structure of the evaporation device provided in an embodiment of the present utility model in actual application;

[0012] Figure 2 for Figure 1 A magnified schematic diagram of area A in the middle;

[0013] Figure 3 Schematic diagram of the structure of the guide plate;

[0014] Figure 4 This is a cross-sectional view of part of the area on the guide plate.

[0015] Icons: 100-evaporation equipment; 110-equipment body; 111-evaporation chamber; 112-installation part; 113-shielding plate; 114-adjustment bracket; 120-source cover; 121-base; 1211-limiting side wall; 122-middle frame; 123-sealing gasket; 130-guide plate; 131-guide hole; 140-evaporation source; 150-adjustment mechanism; 160-mixing chamber; 170-nitrogen nozzle; 180-temperature detection device; 190-pressure difference detection device; 200-evaporation substrate. DETAILED DESCRIPTION

[0016] To make the objectives, technical solutions, and advantages of the embodiments of the present invention more apparent, the technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the accompanying drawings of the embodiments of the present invention. It should be understood that the described embodiments are only a portion of the embodiments of the present invention, not all of them. Generally, the components of the embodiments of the present invention described and illustrated in the drawings herein may be arranged and designed in a variety of different configurations.

[0017] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but rather merely represents selected embodiments of the present invention. All other embodiments derived by persons of ordinary skill in the art based on the embodiments of the present invention without creative effort are also within the scope of protection of the present invention.

[0018] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, it does not need to be further defined or explained in subsequent drawings.

[0019] In the description of the present utility model, it should be understood that the terms "upper", "lower", "inside", "outside", "left", "right", etc. indicate directions or positional relationships based on the directions or positional relationships shown in the accompanying drawings, or are directions or positional relationships in which the utility model product is usually placed when in use, or are directions or positional relationships commonly understood by those skilled in the art. These directions or positional relationships are only for the convenience of describing the present utility model and simplifying the description, and do not indicate or imply that the device or component referred to must have a specific direction, be constructed and operated in a specific direction, and therefore should not be understood as a limitation on the present utility model.

[0020] Furthermore, the terms “first”, “second”, etc. are merely used for distinguishing descriptions and should not be understood as indicating or implying relative importance.

[0021] It should also be noted that, in the description of this utility model, unless otherwise expressly specified or limited, terms such as "disposed" and "connected" should be understood in a broad sense. For example, "connected" can mean a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be the internal communication between two components. For those skilled in the art, the specific meanings of the above terms in this utility model can be understood according to specific circumstances.

[0022] The specific implementation of the present invention is described in detail below with reference to the accompanying drawings.

[0023] Example

[0024] See also Figure 1, Figure 1 FIG. 1 is a schematic structural diagram of the evaporation device 100 provided in this embodiment in actual application.

[0025] The evaporation device 100 provided in this embodiment includes a device body 110, a source housing 120, a guide plate 130, an evaporation source 140, and an adjustment mechanism 150. The device body 110 has an evaporation chamber 111, in which an evaporation substrate 200 is disposed. That is, the evaporation substrate 200 can be installed in the evaporation chamber 111 for film evaporation. The guide plate 130 is connected to the source housing 120 and together they form a mixing chamber 160. The evaporation source 140 is located in the mixing chamber 160. The guide plate 130 and the evaporation substrate 200 are arranged opposite each other. That is, the guide plate 130 and the evaporation substrate 200 are arranged at opposite installation positions. When the evaporation substrate 200 is installed in the evaporation chamber 111, the guide plate 130 and the evaporation substrate 200 are positioned opposite each other. In addition, a guide hole 131 is provided through the guide plate 130 to connect the mixing chamber 160 with the evaporation chamber 111. The adjustment mechanism 150 is in transmission connection with the guide plate 130 and is used to drive the guide plate 130 to move closer to or away from the evaporation substrate 200 to a plurality of positions.

[0026] Optionally, a mounting portion 112 may be provided in the evaporation chamber 111, and the evaporation substrate 200 is mounted on the mounting portion 112 to be installed in the evaporation chamber 111, wherein the evaporation substrate 200 can be fixed on the surface of the mounting portion 112, for example, the evaporation substrate 200 can be attached to the mounting portion 112, or the evaporation substrate 200 can be mounted on the mounting portion 112 or clamped on the mounting portion 112, as long as the mounting portion 112 can play the role of fixing the evaporation substrate 200.

[0027] In actual application, after the evaporation substrate 200 is mounted on the mounting portion 112 , the evaporation source 140 is heated to evaporate or sublime the evaporation material inside the evaporation source into a vaporized substance. The vaporized substance is released by the evaporation source 140 and enters the mixing chamber 160 .

[0028] Since the mixing chamber 160 is connected to the evaporation chamber 111 through the guide holes 131 on the guide plate 130, the vaporized material in the mixing chamber 160 flows toward the evaporation substrate 200 in a controllable flow direction under the guidance of the guide holes 131, thereby improving the evaporation efficiency and uniformity.

[0029] In addition, the guide plate 130 is driven to move to different positions relative to the evaporation substrate 200 through the adjustment mechanism 150, so as to adjust the distance between the guide plate 130 and the evaporation substrate 200, thereby changing the range of the deposition area on the evaporation substrate 200 and the size of the deposition rate, etc., thereby achieving the purpose of changing the evaporation effect to adapt to different evaporation requirements.

[0030] In fact, there are multiple guide holes 131 on the guide plate 130. When the guide plate 130 is at different distances from the evaporation substrate 200, the deposition areas of each guide hole 131 on the evaporation substrate 200 are different, making the deposition more uniform, thereby achieving different evaporation effects.

[0031] For example, when the adjustment mechanism 150 drives the guide plate 130 to move to a position closer to the evaporation substrate 200, the vaporized material flowing out through the guide hole 131 reaches the surface of the evaporation substrate 200 more concentratedly, reducing the diffusion amount in the evaporation chamber 111, so that the evaporation efficiency is further improved.

[0032] It can be seen that the evaporation effect of the evaporation device 100 provided in this embodiment is controllable and can adapt to different evaporation requirements.

[0033] In this embodiment, the evaporation source 140 can be a point source or a line source. There are multiple evaporation sources 140 , and the evaporation materials of the multiple evaporation sources 140 can be the same or different, which can be adjusted according to actual application conditions.

[0034] In this embodiment, to enhance the integrity and compactness of the structure, both the source housing 120 and the guide plate 130 are housed within the evaporation chamber 111. In other embodiments, the structure formed by the source housing 120 and the guide plate 130 may only partially extend into the evaporation chamber 111. For example, only the portion of the source housing 120 connected to the guide plate 130 and the guide plate 130 may extend into the evaporation chamber 111.

[0035] In this embodiment, the adjustment mechanism 150 is connected to the source housing 120 and is in transmission connection with the guide plate 130 through the source housing 120. In actual application, the adjustment mechanism 150 drives the source housing 120 to move, thereby driving the guide plate 130 to move closer to or away from the evaporation substrate 200, thereby adjusting the distance between the guide plate 130 and the evaporation substrate 200.

[0036] In another embodiment, the adjustment mechanism 150 can also be directly connected to the guide plate 130, and the guide plate 130 and the source cover 120 are slidably matched. The adjustment mechanism 150 directly drives the guide plate 130 to slide relative to the source cover 120 to adjust the distance between the guide plate 130 and the evaporation substrate 200.

[0037] Please refer to Figure 2 , Figure 2 Shown Figure 1 A magnified schematic diagram of area A in the middle.

[0038] The source housing 120 in this embodiment includes a base 121 and a middle frame 122. The base 121 is disposed on the bottom wall of the evaporation chamber 111. The middle frame 122 is covered on the base 121 and has an open top. The adjustment mechanism 150 is connected to the middle frame 122 and is used to drive the middle frame 122 to move up and down on the base 121, that is, to drive the middle frame 122 to move toward or away from the evaporation substrate 200. The guide plate 130 is connected to the middle frame 122 and covers the top of the middle frame 122. After the evaporation substrate 200 is installed on the mounting portion 112, it is located above the guide plate 130 and opposite to the guide plate 130. Optionally, the adjustment mechanism 150 can be a linear motor.

[0039] It is understood that the volumes of the mixing chamber 160 and the evaporation chamber 111 change as the adjustment mechanism 150 drives the middle frame 122 to rise and fall. When the adjustment mechanism 150 drives the middle frame 122 to move the guide plate 130 toward the evaporation substrate 200, the volume of the mixing chamber 160 increases, while the volume of the evaporation chamber 111 decreases. When the adjustment mechanism 150 drives the middle frame 122 to move the guide plate 130 away from the evaporation substrate 200, the volume of the mixing chamber 160 decreases, while the volume of the evaporation chamber 111 increases.

[0040] By driving the middle frame 122 to move through the adjustment mechanism 150, the diffusion degree of the evaporation material in the mixing chamber 160 and the diffusion amount in the evaporation chamber 111 can be controlled to further control the evaporation effect. For example, if the mixing chamber 160 is enlarged and the evaporation chamber 111 is reduced, the diffusion amount of the evaporation chamber 111 can be reduced, so that the evaporation material diffuses more evenly in the mixing chamber 160, so that it can flow evenly to the guide plate 130, which is beneficial to improving the uniformity of evaporation; if the evaporation chamber 111 is enlarged, the evaporation material can also diffuse in the evaporation chamber 111, improving the uniformity, so that by adjusting the volume of the evaporation chamber 111 and the mixing chamber 160, it can also be beneficial to achieve a better evaporation effect.

[0041] The base 121 has a limiting side wall 1211 extending in the vertical direction, and the bottom end cover of the middle frame 122 is arranged on the outside of the limiting side wall 1211. The limiting side wall 1211 is used to guide the lifting and lowering movement of the middle frame 122, that is, the limiting side wall 1211 can limit the movement of the middle frame 122 in the vertical direction, so that the guide plate 130 connected to the middle frame 130 can move in the direction of approaching and away from the evaporation substrate 200, preventing movement deviation and ensuring the stability of the movement process.

[0042] It is understood that the limiting sidewall 1211 forms a circular trajectory in the horizontal direction. For example, the limiting sidewall 1211 can extend along the circumference of the middle frame 1211. The limiting sidewall 1211 corresponds circumferentially to the inner sidewall of the bottom end of the middle frame 122, ensuring structural stability while also ensuring the sealing of the mixing chamber 160. When the adjustment mechanism 150 drives the middle frame 122 to rise to its maximum stroke, the bottom end of the middle frame 122 still does not separate from the limiting sidewall 1211 of the base 121, ensuring that the matching structure between the two is always effective.

[0043] In order to prevent the vaporized material in the mixing chamber 160 from entering the evaporation chamber 111 through any path other than the guide hole 131, it is necessary to seal the gap between the limiting side wall 1211 of the base 121 and the inner side wall of the middle frame 122. In this embodiment, a sealing gasket 123 is provided on the limiting side wall 1211 to improve the sealing effect.

[0044] It can be understood that when the adjustment mechanism 150 drives the middle frame 122 to rise and fall relative to the base 121, the inner wall of the bottom end of the middle frame 122 always remains in contact with the outer wall of the sealing gasket 123, that is, the gap between the middle frame 122 and the base 121 is always sealed.

[0045] Please refer to Figure 3 and Figure 4 , Figure 3 FIG. 1 is a schematic structural diagram of the guide plate 130. Figure 4 The figure shows a cross-sectional view of a partial area of ​​the guide plate 130 having the guide holes 131 .

[0046] To improve deposition uniformity, in this embodiment, the guide hole 131 has a trumpet-shaped structure, that is, the cross-sectional area of ​​the guide hole 131 gradually increases from the end connected to the mixing chamber 160 to the end connected to the evaporation chamber 111 .

[0047] Figure 4 The angle θ in φ is the inclination angle of the hole wall of the guide hole 131 , which refers to the angle between the hole wall and the center line of the guide hole 131 in the plane where the center line of the guide hole 131 is located.

[0048] In practical applications, the vaporized material in the mixing chamber 160 gradually diffuses under the guidance of the guide holes 131 during the process of flowing through the guide holes 131 , thereby covering a larger area on the evaporation substrate 200 and improving the uniformity of evaporation.

[0049] Please continue reading Figure 1 The evaporation device 100 provided in this embodiment further includes a nitrogen nozzle 170 . The nitrogen nozzle 170 is disposed in the mixing chamber 160 . The nitrogen nozzle 170 is used to introduce external nitrogen into the mixing chamber 160 .

[0050] In actual application, during the evaporation process, the nitrogen nozzle 170 sprays a certain amount of nitrogen into the mixing chamber 160 as a protective gas, which can prevent the film layer on the surface of the evaporation substrate 200 from being oxidized or otherwise contaminated, thereby ensuring the purity and stability of the film layer.

[0051] Furthermore, the nitrogen nozzle 170 sprays external nitrogen into the mixing chamber 160 , which can quickly disperse the vaporized substances released by the evaporation sources 140 , making the airflow in the mixing chamber 160 disordered, thereby ensuring that the vaporized substances released by multiple evaporation sources 140 are mixed more evenly.

[0052] The nitrogen nozzle 170 can also control the amount of nitrogen sprayed into the mixing chamber 160 to form a pressure difference between the mixing chamber 160 and the evaporation chamber 111, ensuring that the vaporized material in the mixing chamber 160 can be quickly and evenly deposited onto the evaporation substrate 200 under the influence of the pressure difference, further improving the deposition efficiency and uniformity.

[0053] Optionally, the nitrogen nozzle 170 may be configured as follows: Figure 1 As shown, the nitrogen nozzle 170 can be arranged between the evaporation sources 140, which is conducive to the blowing of the vaporized material. Furthermore, the direction of the nitrogen nozzle 170 can be adjusted, that is, the jet direction of the nitrogen nozzle 170 can be controlled. This not only facilitates the diffusion of the vaporized material and makes the vaporized material more evenly dispersed, but also controls the diffusion direction of the vaporized material according to the evaporation requirements. For example, the vaporized material can be blown to an area where the evaporation effect is not easy to achieve, so as to improve the uniformity of the evaporation and achieve a better evaporation height effect.

[0054] In practice, to enhance the controllability of the evaporation effect, in this embodiment, the source housing 120 is equipped with a heating module capable of heating the mixing chamber 160. In practice, the heating module controls the thermal field within the mixing chamber 160, thereby adjusting the mixing uniformity of the vaporized materials within the mixing chamber 160 and controlling the gas flow rate within the mixing chamber 160.

[0055] In order to achieve precise control of the temperature of the mixing chamber 160 and precise control of the pressure difference between the mixing chamber 160 and the evaporation chamber 111, the evaporation equipment 100 provided in this embodiment also includes a temperature detection device 180 and a pressure difference detection device 190. The temperature detection device 180 and the pressure difference detection device 190 are both arranged on the source cover 120. The temperature detection device 180 is used to detect the temperature in the mixing chamber 160, and the pressure difference detection device 190 is used to detect the pressure difference between the mixing chamber 160 and the evaporation chamber 111. The pressure and heating of the mixing chamber 160 can be controlled according to the detection results of the pressure difference detection device 190 and the temperature detection device 180. For example, the heating effect of the heating module and the jet amount of the nitrogen nozzle 170 or the evaporation amount of the evaporation source 140 can be controlled.

[0056] In addition, a baffle plate 113 and an adjustment bracket 114 are provided in the evaporation chamber 111. The baffle plate 113 is connected to the top cavity wall of the evaporation chamber 111 through the adjustment bracket 114. The mounting portion 112 is provided on the baffle plate 113. The adjustment bracket 114 is used to drive the baffle plate 113 to move close to or away from the guide plate 130 to multiple positions.

[0057] It is understandable that the distance between the guide plate 130 and the evaporation substrate 200 can be adjusted not only by driving the guide plate 130 to move by the adjustment mechanism 150 , but also by driving the shielding plate 113 to move in the vertical direction by adjusting the bracket 114 .

[0058] In practice, in order to accommodate different evaporation sources 140 and meet different evaporation requirements, the guide plate 130 in this embodiment is detachably connected to the source cover 120. In actual applications, the distance between the guide plate 130 and the evaporation substrate 200 can be adjusted, the guide plate 130 can be replaced, or the layout and structure of the multiple guide holes 131 on the guide plate 130 can be adjusted according to different evaporation sources 140 and different evaporation requirements.

[0059] In actual applications, the evaporation device 100 provided in this embodiment installs the evaporation substrate 200 on the installation portion 112, and then adjusts the distance between the guide plate 130 and the evaporation substrate 200 to an ideal position through the adjustment mechanism 150 and the adjustment bracket 114 according to the type of the evaporation source 140 and the actual evaporation requirements.

[0060] The evaporation chamber 111 is then evacuated to maintain an appropriate vacuum level in both the evaporation chamber 111 and the mixing chamber 160. During this stage, the evaporation substrate 200 and the evaporation material are pre-treated. The evaporation substrate 200 is heated to remove moisture and enhance film adhesion, and the evaporation material in the evaporation source 140 is pre-melted. During subsequent evaporation, the evaporation material is rapidly heated until it vaporizes.

[0061] During this process, the nitrogen nozzle 170 is controlled to open and a certain amount of nitrogen is introduced into the mixing chamber 160, so that the pressure in the mixing chamber 160 is slightly greater than the pressure in the evaporation chamber 111, forming a certain pressure difference between the two, and the injected nitrogen quickly blows away the vaporized material released by the evaporation source 140, so that the airflow in the mixing chamber 160 is quickly mixed, ensuring that the vaporized material is evenly mixed and improving the quality of the film layer.

[0062] During the process of introducing nitrogen, the source cover 120 and the guide plate 130 are heated. Under the action of the thermal field and the pressure difference, the vaporized material in the mixing chamber 160 quickly passes through the multiple guide holes 131 on the guide plate 130, and reaches the surface of the evaporation substrate 200 quickly and evenly under the guidance of the multiple guide holes 131.

[0063] In summary, the evaporation device 100 provided in this embodiment has a controllable evaporation effect, can adapt to different evaporation requirements, and has the characteristics of faster evaporation rate and better film quality.

[0064] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Those skilled in the art will readily appreciate that the present invention is susceptible to various modifications and variations. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present invention shall be included within the scope of protection of the present invention.

Claims

1. A vapor deposition device, characterized in that: The device comprises a device body (110), a source cover (120), a guide plate (130), an evaporation source (140), and an adjustment mechanism (150); the device body (110) has an evaporation chamber (111), and an evaporation substrate (200) is arranged in the evaporation chamber (111); The guide plate (130) is connected to the source cover (120) and together forms a mixing chamber (160); the evaporation source (140) is located in the mixing chamber (160); the guide plate (130) and the evaporation substrate (200) are arranged opposite to each other, and a guide hole (131) is provided through the guide plate (130) for connecting the mixing chamber (160) with the evaporation chamber (111); The regulating mechanism (150) is in transmission connection with the guide plate (130) and is used to drive the guide plate (130) to move in a direction approaching or away from the evaporation substrate (200).

2. The evaporation device according to claim 1, characterized in that The source cover (120) comprises a base (121) and a middle frame (122), the middle frame (122) is covered on the base (121) and has an open top, and the guide plate (130) is connected to the middle frame (122) and covers the top of the middle frame (122); The evaporation substrate (200) is located above the guide plate (130), and the adjustment mechanism (150) is connected to the middle frame (122) and is used to drive the middle frame (122) to move in a vertical direction, thereby driving the guide plate (130) to move in a direction close to or away from the evaporation substrate (200).

3. The evaporation device according to claim 2, characterized in that The base (121) has a limiting side wall (1211) extending in the vertical direction, the middle frame (122) is covered on the outside of the limiting side wall (1211), and the limiting side wall (1211) is used to guide the middle frame (122) to move in the vertical direction.

4. The evaporation equipment according to claim 3, characterized in that A sealing gasket (123) is provided between the limiting side wall (1211) and the middle frame, for sealing the gap between the limiting side wall (1211) and the inner surface of the middle frame (122).

5. The evaporation equipment according to claim 1, characterized in that A shielding plate (113) and an adjusting bracket (114) are provided in the evaporation chamber (111); the shielding plate (113) is connected to the evaporation chamber (111) via the adjusting bracket (114); the evaporation substrate (200) is mounted on a mounting portion (112); the mounting portion (112) is provided on the shielding plate (113); and the adjusting bracket (114) is used to drive the shielding plate (113) to move in a direction approaching or away from the guide plate (130).

6. The evaporation equipment according to claim 1, characterized in that The cross-sectional area of ​​the guide hole (131) gradually increases from the end communicating with the mixing chamber (160) to the end communicating with the evaporation chamber (111).

7. The evaporation equipment according to claim 1, characterized in that The evaporation device (100) further comprises a nitrogen nozzle (170), wherein the nitrogen nozzle (170) is arranged in the mixing chamber (160), and the nitrogen nozzle (170) is used to introduce nitrogen into the mixing chamber (160).

8. The evaporation equipment according to claim 1, characterized in that The evaporation device (100) further comprises a temperature detection device (180), wherein the temperature detection device (180) is arranged on the source cover (120) and is used to detect the temperature in the mixing chamber (160).

9. The evaporation equipment according to claim 1, characterized in that The evaporation device (100) further comprises a pressure difference detection device (190), wherein the pressure difference detection device (190) is arranged on the source housing (120) and is used to detect the pressure difference between the mixing chamber (160) and the evaporation chamber (111).

10. The evaporation equipment according to claim 1, characterized in that The source cover (120) and the guide plate (130) are both accommodated in the evaporation chamber (111).

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