Feeding device and continuous Czochralski crystal growing furnace

Abstract

The utility model provides a feeding device and a continuous czochralski single crystal furnace, and relates to the technical field of silicon single crystal manufacture, the feeding device comprises a first feeding cylinder, a second feeding cylinder and a feeding pipe, one end of the feeding pipe is used for stretching into a single crystal furnace, the other end of the feeding pipe is provided with a feeding port, and the feeding port is provided with a feeding port. A discharging port of the first feeding cylinder and a discharging port of the second feeding cylinder are arranged corresponding to the feeding port respectively, a first valve is arranged at the discharging port of the first feeding cylinder, the opening degree of the first valve is adjustable, a second valve is arranged at the discharging port of the second feeding cylinder, and the opening degree of the second valve is adjustable. Compared with the prior art, the feeding device disclosed by the utility model not only can regulate and control the discharge amount of the silicon material and the mother alloy according to the set weight ratio of the silicon material to the mother alloy, but also can avoid the phenomenon that the concentration of the mother alloy is graded in a silicon solution, and improves the distribution uniformity of the resistivity of the monocrystalline silicon crystal and the stability of the battery efficiency.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon single crystal manufacturing, in particular to a feeding device and a continuous vertical single crystal pulling furnace. Background Art

[0002] The feeding device for a continuous Czochralski single crystal furnace refers to a device that can continuously feed the continuous Czochralski single crystal furnace during the process of continuously pulling silicon rods without opening the furnace, allowing the continuous Czochralski single crystal furnace to pull silicon rods while melting the material, thereby improving production efficiency, crucible utilization and resistivity stability of silicon rods.

[0003] However, in the current feeding process of the existing continuous vertical single crystal pulling furnace feeding device, the mother alloy, which is much lighter than the granular silicon, will be concentrated into the silicon solution, resulting in the appearance of areas with graded mother alloy concentration in the silicon solution. If the mother alloy in this area is not diffused in time, the crystal rod will be pulled into uneven distribution of crystal rod resistivity and unstable battery efficiency. Utility Model Content

[0004] The problem to be solved by the utility model is: how to avoid the phenomenon of concentration grading of the master alloy in the silicon solution.

[0005] The utility model provides a feeding device, comprising: a first feeding barrel, a second feeding barrel and a feeding pipe, one end of the feeding pipe is used to extend into a single crystal furnace, and the other end of the feeding pipe is provided with a feeding port, the discharge port of the first feeding barrel and the discharge port of the second feeding barrel are respectively arranged corresponding to the feeding port, the discharge port of the first feeding barrel is provided with a first valve, and the opening of the first valve is adjustable to adjust the discharge amount of the first feeding barrel, and the discharge port of the second feeding barrel is provided with a second valve, and the opening of the second valve is adjustable to adjust the discharge amount of the second feeding barrel.

[0006] Compared with the prior art, the feeding device provided by the present invention has the following beneficial effects, but is not limited to:

[0007] The feeding device of the present invention can discharge silicon material into the feeding pipe through a first feeding tube, and discharge master alloy into the feeding pipe through a second feeding tube. Since the discharge port of the first feeding tube and the discharge port of the second feeding tube are respectively arranged corresponding to the feed port, the silicon material and master alloy can be mixed at the feed port of the feeding pipe and fed into the single crystal furnace through the feeding pipe together. Moreover, by providing a first valve at the discharge port of the first feeding tube and a second valve at the discharge port of the second feeding tube, the first valve and the second valve can be opened to uniformly feed the silicon material into the crucible according to the set weight ratio of silicon material to master alloy, thereby ensuring that the master alloy is uniformly mixed in the silicon solution and avoiding the phenomenon of concentration gradation of the master alloy in the silicon solution. Compared with the prior art, the feeding device of the present invention not only can the discharge amount of silicon material and master alloy be controlled according to the set silicon material / master alloy weight ratio, but also can avoid the phenomenon of concentration gradation of the master alloy in the silicon solution, thereby improving the resistivity distribution uniformity of single crystal silicon crystals and the stability of cell efficiency.

[0008] Optionally, a conveyor belt is provided in the feed tube, one end of the conveyor belt is aligned with the feed inlet, and the other end of the conveyor belt is aligned with the end of the feed tube extending into the single crystal furnace.

[0009] Optionally, the first feeding cylinder includes a first outer cylinder, a first hopper and a first weighing mechanism, the first hopper and the first weighing mechanism are both arranged in the first outer cylinder, and the first weighing mechanism is supported on the first hopper to detect the weight of the first hopper; the discharge port of the first outer cylinder is connected to the feed port, and the first valve is installed at the discharge port of the first hopper.

[0010] Optionally, the first weighing mechanism includes a first supporting structure and a first weighing sensor, the first supporting structure is arranged in a ring shape on the inner wall of the first outer cylinder and is sleeved on the outer wall of the first hopper, and the first weighing sensor is arranged on the first supporting structure and abuts against the outer wall of the first hopper.

[0011] Optionally, the second feeding cylinder includes a second outer cylinder, a second hopper and a second weighing mechanism, the second hopper and the second weighing mechanism are both arranged in the second outer cylinder, and the second weighing mechanism is supported on the second hopper to detect the weight of the second hopper; the second valve is installed at the discharge port of the second hopper.

[0012] Optionally, the second weighing mechanism includes a second supporting structure and a second weighing sensor, the second supporting structure is arranged in a ring shape on the inner wall of the second outer cylinder and is sleeved on the outer wall of the second hopper, and the second weighing sensor is arranged on the second supporting structure and abuts against the outer wall of the second hopper.

[0013] Optionally, the second feeding barrel further includes a guide tube, one end of which is connected to the discharge port of the second outer barrel, and the other end of which is connected to the feed port.

[0014] Optionally, the first valve and / or the second valve includes a first panel, a second panel and blades, the first panel is connected to the discharge port of the first feeding barrel and / or the second feeding barrel, the center positions of the first panel and the second panel are respectively coaxially opened with through holes, the multiple blades are respectively fitted between the first panel and the second panel, and a center hole is formed between the multiple blades.

[0015] In addition, the present invention also provides a continuous Czochralski single crystal furnace, comprising a furnace body, a crucible and the aforementioned feeding device.

[0016] Since the technical improvements and technical effects achieved by the continuous Czochralski single crystal furnace are the same as those of the feeding device, the technical effects of the continuous Czochralski single crystal furnace will not be described in detail.

[0017] Optionally, the crucible includes an inner pot body and an outer pot body, the inner pot body is provided with a through hole communicating with the inner pot body and the outer pot body, and a gap for adding material is left between the inner pot body and the outer pot body. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 A perspective view of a feeding device according to an embodiment of the present invention;

[0019] Figure 2 A cross-sectional view of a feeding device according to an embodiment of the present utility model;

[0020] Figure 3 for Figure 2 A partial enlarged view of the middle part;

[0021] Figure 4 This is a schematic diagram of the structure of the first valve of the embodiment of the utility model Figure 1 ;

[0022] Figure 5 This is a schematic structural diagram of a plurality of blades installed on a second panel according to an embodiment of the present utility model;

[0023] Figure 6 This is a structural diagram of the first panel of an embodiment of the present utility model.

[0024] Description of reference numerals:

[0025] 1. First feeding cylinder; 12. First outer cylinder; 13. First hopper; 14. First supporting structure; 2. Second feeding cylinder; 22. Second outer cylinder; 23. Second hopper; 24. Draft tube; 3. Feeding pipe; 31. First tube structure; 32. Second tube structure; 321. Feed inlet; 33. Conveyor belt; 4. Furnace body; 5. Crucible; 51. Inner pot body; 52. Outer pot body; 6. Support rod; 7. Furnace body valve; 8. First valve; 81. First panel; 811. First chute; 82. Second panel; 821. Second chute; 83. Blade; 831. First slider; 832. Second slider; 84. Center hole; 9. Second valve. DETAILED DESCRIPTION

[0026] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, specific embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0027] In the description of the present invention, the directions or positional relationships indicated by “up”, “down”, “left”, “right”, “top”, “bottom”, “front”, “back”, “inside” and “outside” are based on the directions or positional relationships shown in the accompanying drawings and are only used to facilitate the description of the present invention. They do not indicate or imply that the device referred to must have a specific direction, be constructed and operated in a specific direction. Therefore, they cannot be understood as limiting the scope of protection of the present invention.

[0028] In the description of this utility model, it should be noted that, unless otherwise expressly specified or limited, the terms "disposed," "installed," "connected," and "connected" should be understood in a broad sense. For example, they may refer to fixed connections, detachable connections, or integral connections; they may refer to mechanical connections; they may refer to direct connections, indirect connections through an intermediate medium, or internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on the specific circumstances.

[0029] Throughout this specification, references to terms such as "an embodiment," "one embodiment," and "an implementation" indicate that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or implementation are included in at least one embodiment or implementation of the present invention. In this specification, schematic representations of these terms do not necessarily refer to the same embodiment or implementation. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or implementations.

[0030] Moreover, the Z-axis in the accompanying drawings represents the vertical direction, that is, the up and down position, and the positive direction of the Z-axis (that is, the direction of the arrow of the Z-axis) represents the top, and the negative direction of the Z-axis (that is, the direction opposite to the positive direction of the Z-axis) represents the bottom; the X-axis in the accompanying drawings represents the horizontal direction, that is, the left and right position, and the positive direction of the X-axis (that is, the direction of the arrow of the X-axis) represents the left, and the negative direction of the X-axis (that is, the direction opposite to the positive direction of the X-axis) represents the right.

[0031] It should also be noted that the aforementioned Z-axis and X-axis are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it cannot be understood as a limitation on the present invention.

[0032] like Figures 1 to 3 As shown, the feeding device of an embodiment of the utility model includes: a first feeding barrel 1, a second feeding barrel 2 and a feeding pipe 3, one end of the feeding pipe 3 is used to extend into the single crystal furnace, and the other end of the feeding pipe 3 is provided with an inlet 321, the discharge port of the first feeding barrel 1 and the discharge port of the second feeding barrel 2 are respectively arranged corresponding to the inlet 321, the discharge port of the first feeding barrel 1 is provided with a first valve 8, and the opening of the first valve 8 is adjustable to adjust the discharge amount of the first feeding barrel 1, the discharge port of the second feeding barrel 2 is provided with a second valve 9, and the opening of the second valve 9 is adjustable to adjust the discharge amount of the second feeding barrel 2.

[0033] In this embodiment, combined with the Figures 1 to 3 As shown, silicon material (granular silicon) can be discharged into the feeding pipe 3 through the first feeding barrel 1, and the master alloy can be discharged into the feeding pipe 3 through the second feeding barrel 2. Since the discharge port of the first feeding barrel 1 and the discharge port of the second feeding barrel 2 are respectively arranged corresponding to the inlet 321, the silicon material and the master alloy can be mixed at the inlet 321 of the feeding pipe 3 and fed into the single crystal furnace together through the feeding pipe 3. In addition, by setting a first valve 11 at the discharge port of the first feeding barrel 1 and a second valve 21 at the discharge port of the second feeding barrel 2, the silicon material and the master alloy can be synchronously and evenly fed into the crucible 5 according to the set weight ratio through the opening of the first valve 11 and the second valve 21, thereby ensuring that the master alloy is evenly mixed in the silicon solution and avoiding the phenomenon of concentration grading of the master alloy in the silicon solution. Compared with the prior art, the feeding device of the present invention can not only adjust the discharge amount of silicon material and master alloy according to the set silicon material / master alloy weight ratio, but also avoid the concentration gradation of the master alloy in the silicon solution, thereby improving the uniformity of the resistivity distribution of the single crystal silicon crystal and the stability of the battery efficiency.

[0034] It should be noted that the first feeding cylinder 1 and the second feeding cylinder 2 can be arranged outside the furnace body 4 through a structure such as a bracket, and the first feeding cylinder 1 and the second feeding cylinder 2 can be arranged in a vertical direction (attached Figure 1 or attached Figure 2 The first and second valves 11 and 21 are arranged so that when the first and second valves 11 and 21 are opened, the silicon material in the first feeding barrel 1 and the master alloy in the second feeding barrel 2 can flow out of the discharge ports of the first and second feeding barrels 1 and 2, respectively, under the action of gravity. The first and second feeding barrels 1 and 2 can be controlled to discharge the silicon material and the master alloy simultaneously into the inlet 321 of the feeding pipe 3. In this way, the silicon material and the master alloy collide with each other during the process of falling into the feeding pipe 3, which can cause the two to mix to a certain extent. Moreover, after the silicon material and the master alloy simultaneously fall on the inner wall of the feeding pipe 3, they will continue to mix to a certain extent.

[0035] Optionally, a conveyor belt 33 is provided in the feeding tube 3 , one end of the conveyor belt 33 is aligned with the feeding port 321 , and the other end of the conveyor belt 33 is aligned with the end of the feeding tube 3 extending into the single crystal furnace.

[0036] Specifically, in conjunction with Figure 2 As shown, the feeding tube 3 can be divided into two parts, namely a first tube structure 31 and a second tube structure 32. A channel is provided on the upper side of the furnace body 4 for the first tube structure 31 to pass through and extend into the furnace body 4, wherein the intersection position of the first tube structure 31 and the second tube structure 32 can be fixed at the channel, one end of the second tube structure 32 is connected to the first tube structure 31, and the second tube structure 32 is located outside the furnace body 4, and the feed port 321 is opened on the second tube structure 32. The material can pass through the feed port 321, the second tube structure 32 and the first tube structure 31 in sequence and finally fall into the crucible 5.

[0037] In this embodiment, combined with the Figure 3 As shown, the feeding pipe 3 includes a first pipe structure 31 and a second pipe structure 32 that are interconnected. The first pipe structure 31 is used to extend into the furnace body 4, and the feed port 321 is opened on the second pipe structure 32. The first pipe structure 31 can be a round pipe structure for convenient feeding, and the second pipe structure 32 can be a square pipe structure for easy installation of the conveyor belt 33, wherein the second pipe structure 32 is placed horizontally (see FIG. Figure 2 The first tube structure 31 is tilted (in the X-axis direction), and the discharge port of the first tube structure 31 is located directly above the crucible 5. The conveyor belt 33 located in the second tube structure 32 can transport the material falling into the second tube structure 32 from the feed port 321 to the first tube structure 31, and finally into the crucible 5.

[0038] In other embodiments, a furnace body valve 7 may be installed at the channel on the furnace body 4 , and the furnace body valve 7 is used to block the transmission of gas and heat between the inside and outside of the furnace.

[0039] Optionally, the first feeding cylinder 1 includes a first outer cylinder 12, a first hopper 13 and a first weighing mechanism, the first hopper 13 and the first weighing mechanism are both arranged in the first outer cylinder 12, and the first weighing mechanism is supported on the first hopper 13 to detect the weight of the first hopper 13; the discharge port of the first outer cylinder 12 is connected to the feed port 321, and the first valve 8 is installed at the discharge port of the first hopper 13.

[0040] In this embodiment, combined with the Figure 2 and attached Figure 3 As shown, the first feeding barrel 1 has a double-layer structure, with a first outer barrel 12 as the outer portion. A first hopper 13 is located within the first outer barrel 12. A first weighing mechanism is mounted on the inner wall of the first outer barrel 12 to support the first hopper 13. The first weighing mechanism is used to weigh the first hopper 13 and the silicon material within the first hopper 13. The discharge port of the first outer barrel 12 can extend into and connect to the inlet 321 of the feed pipe 3. The first valve 11 is mounted at the discharge port of the first hopper 13. The discharge ports of the first outer barrel 12 and the first hopper 13 are coaxially arranged, allowing the silicon material within the first hopper 13 to fall into the feed pipe 3 under the action of gravity.

[0041] It should be noted that the shapes of the first outer cylinder 12 and the first hopper 13 can match each other, and both include a cylindrical portion and a conical portion connected to each other, with the conical portion located below the cylindrical portion and having a gradually decreasing cross-sectional size from top to bottom. A top cover is detachably connected to the top of the first outer cylinder 12, and opening the cover allows material to be fed into the first hopper 13.

[0042] Optionally, the first weighing mechanism includes a first supporting structure 14 and a first weighing sensor. The first supporting structure 14 is annularly arranged on the inner wall of the first outer cylinder 12 and is sleeved on the outer wall of the first hopper 13. The first weighing sensor is arranged on the first supporting structure 14 and abuts against the outer wall of the first hopper 13.

[0043] In this embodiment, combined with the Figure 3As shown, the first weighing mechanism includes a first supporting structure 14 and a first weighing sensor, wherein the first supporting structure 14 can be a circular ring structure with a triangular cross-section, so that it can be connected to the inner wall of the first outer cylinder 12 by welding or bolting, and the outer wall of the first hopper 13 can be connected with a protrusion structure by welding or bolting, and the protrusion structure is used to abut against the first weighing sensor on the first supporting structure 14, so that the entire weight of the first hopper 13 can be supported by the first supporting structure 14, and the first weighing sensor installed on the first supporting structure 14 can feedback the real-time weight of the first hopper 13.

[0044] In other embodiments, the first support structure 14 may also be several separate support structures, which are arranged at intervals along the inner wall of the first outer cylinder 12 and are respectively used to abut against the protrusion structures on the outer wall of the first hopper 13 to play a supporting role.

[0045] Optionally, the second feeding cylinder 2 includes a second outer cylinder 22, a second hopper 23 and a second weighing mechanism, the second hopper 23 and the second weighing mechanism are both arranged in the second outer cylinder 22, and the second weighing mechanism is supported on the second hopper 23 to detect the weight of the second hopper 23; the second valve 9 is installed at the discharge port of the second hopper 23.

[0046] In this embodiment, combined with the Figure 3 As shown, the second feeding barrel 2 has a double-layer structure, with a second outer barrel 22 as its outer portion. A second hopper 23 is located within the second outer barrel 22. A second weighing mechanism is mounted on the inner wall of the second outer barrel 22 to support the second hopper 23. The second weighing mechanism is used to weigh the second hopper 23 and the master alloy within the second hopper 23. The discharge port of the second hopper 23 can extend into and connect to the feed port 321 of the feed pipe 3. The second valve 21 is mounted at the discharge port of the second hopper 23. The discharge port of the second outer barrel 22 and the discharge port of the second hopper 23 are coaxially arranged. In this way, the silicon material in the second hopper 23 can fall into the feed pipe 3 under the action of gravity.

[0047] Optionally, the second weighing mechanism includes a second supporting structure and a second weighing sensor, the second supporting structure is arranged in a ring shape on the inner wall of the second outer cylinder 22 and is sleeved on the outer wall of the second hopper 23, and the second weighing sensor is arranged on the second supporting structure and abuts against the outer wall of the second hopper 23.

[0048] In this embodiment, combined with the Figure 3As shown, the second weighing mechanism has the same structure as the first weighing mechanism, and the only difference is the size. The second weighing mechanism includes a second supporting structure and a second weighing sensor, wherein the second supporting structure can be a circular ring structure with a triangular cross-section, so that it can be connected to the inner wall of the second outer cylinder 22 by welding or bolting. The outer wall of the second hopper 23 can be connected with a protrusion structure by welding or bolting. The protrusion structure is used to abut against the second weighing sensor on the second supporting structure, so that the entire weight of the second hopper 23 can be supported by the second supporting structure, and the second weighing sensor installed on the second supporting structure can feedback the real-time weight of the second hopper 23.

[0049] In other embodiments, the second supporting structure may also be several separate supporting structures, which are arranged at intervals along the inner wall of the second outer cylinder 22 and are respectively used to abut against the protrusion structures on the outer wall of the second hopper 23 to play a supporting role.

[0050] Optionally, the second feeding barrel 2 further includes a guide tube 24 , one end of which is connected to the discharge port of the second outer barrel 22 , and the other end of which is connected to the feed port 321 .

[0051] In this embodiment, combined with the Figure 3 As shown, a guide tube 24 is installed at the discharge port of the second outer cylinder 22, wherein the guide tube 24 can be connected to the inlet 321 of the feed pipe 3, wherein the guide tube 24 is tilted, and the master alloy can flow into the feed pipe 3 along the tilt direction of the guide tube 24.

[0052] In other embodiments, if the discharge port of the first outer cylinder 12 extends into the feed port 321 of the feed pipe 3 and completely blocks the feed port 321, the guide tube 24 can also be connected to the first outer cylinder 12 and close to its discharge port, that is, the mother alloy first flows into the first outer cylinder 12 through the guide tube 24, and the first outer cylinder 12 then guides the mother alloy to the feed pipe 3 through the conical inner wall thereon.

[0053] Optionally, the first valve 8 and / or the second valve 9 includes a first panel 81, a second panel 82 and a blade 83, the first panel 81 is connected to the discharge port of the first feeding barrel 1 and / or the second feeding barrel 2, and the center positions of the first panel 81 and the second panel 82 are coaxially opened with through holes, and the multiple blades 83 are respectively fitted between the first panel 81 and the second panel 82, and a center hole 84 is formed between the multiple blades 83.

[0054] Specifically, the first valve 8 and the second valve 9 can have the same structure. The following description will be made using the first valve 8 as an example. Specifically, the first valve 8 includes a first panel 81, a second panel 82, and a vane 83. The first panel 81 is connected to the discharge port of the first feeding barrel 1. The center positions of the first panel 81 and the second panel 82 are coaxially provided with through holes. A plurality of vanes 83 are respectively arranged between the first panel 81 and the second panel 82, and a center hole 84 is formed between the plurality of vanes 83. A first chute 811 is provided on the first panel 81. A first slider 831 is provided on the end surface of the vane 83 facing the first panel 81. The first slider 831 is slidably connected to the first chute 811. A second chute 821 is provided on the second panel 82. A second slider 832 is provided on the end surface of the vane 83 facing the second panel 82. The second slider 832 is slidably connected to the second chute 821. The second panel 82 is used to rotate relative to the first panel 81 to open and close the center hole 84.

[0055] In this embodiment, combined with the Figures 4 to 6 As shown, the first panel 81 and the second panel 82 can be circular plate structures of the same size, and the blade 83 can be a triangular plate structure. The multiple blades 83 fit together, and each blade 83 slides relative to the first panel 81 through the first slider 831 thereon and the first slide groove 811 on the first panel 81, and each blade 83 slides relative to the second panel 82 through the second slide groove 821 thereon and the second slide groove 821 on the second panel 82. By rotating the second panel 82 relative to the first panel 81, the multiple blades 83 can be made to move relative to each other at the same time to adjust the opening and closing of the center hole 84 enclosed by the multiple blades 83, and the opening of the center hole 84 can also be adjusted, so that the discharge amount of silicon material and master alloy can be controlled according to the set silicon material / master alloy weight ratio.

[0056] It should be noted that the second valve 9 and the first valve 8 may also adopt other iris mechanisms to achieve quantitative control of materials.

[0057] In addition, the present invention also provides a continuous Czochralski single crystal furnace, comprising a furnace body 4, a crucible 5 and the aforementioned feeding device.

[0058] In this embodiment, combined with the Figure 2 As shown, the crucible 5 can be set inside the furnace body 4 through the support rod 6, wherein the support rod 6 is used to install the crucible 5 and control the rotation speed and lifting of the crucible 5. The feeding pipe 3 of the feeding device partially extends into the furnace body 4, and the discharge port of the feeding pipe 3 is located directly above the crucible 5, which is used to feed silicon material and master alloy into the crucible 5.

[0059] Since the technical improvements and technical effects achieved by the continuous Czochralski single crystal furnace are the same as those of the feeding device, the technical effects of the continuous Czochralski single crystal furnace will not be described in detail.

[0060] Optionally, the crucible 5 includes an inner pot body 51 and an outer pot body 52 , the inner pot body 51 is provided with a through hole connecting the inner pot body 51 and the outer pot body 52 , and a gap for adding materials is left between the inner pot body 51 and the outer pot body 52 .

[0061] In this embodiment, combined with the Figure 2 As shown, crucible 5 can be made of quartz and includes an inner pot body 51 and an outer pot body 52. ​​A through hole is provided in inner pot body 51, connecting the inner and outer pot bodies 51 and 52. A feeding gap is left between the inner and outer pot bodies 51 and 52. Silicon material can be added to the outer pot body 52 through this feeding gap. Once dissolved, the silicon material can flow steadily into the inner pot body 51 through the through hole between the inner and outer pot bodies 51 and 52, avoiding disturbance of the silicon liquid interface. If crucible 5 is a single crucible, adding material directly to the single crucible (which can be understood as the inner pot body 51 of the crucible 5) can cause fluctuations in the crystal liquid level, affecting the quality of the pulled crystal ingot.

[0062] The terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the features.

[0063] Although the present invention is disclosed as above, the protection scope of the present invention is not limited thereto. Those skilled in the art may make various changes and modifications without departing from the spirit and scope of the present invention, and these changes and modifications will fall within the protection scope of the present invention.

Claims

1. A feeding device, characterized in that: include: A first feeding barrel (1), a second feeding barrel (2) and a feeding pipe (3), one end of the feeding pipe (3) is used to extend into the single crystal furnace, the other end of the feeding pipe (3) is provided with an inlet (321), the discharge port of the first feeding barrel (1) and the discharge port of the second feeding barrel (2) are respectively provided corresponding to the inlet (321), the discharge port of the first feeding barrel (1) is provided with a first valve (8), and the opening of the first valve (8) is adjustable to adjust the discharge volume of the first feeding barrel (1), and the discharge port of the second feeding barrel (2) is provided with a second valve (9), and the opening of the second valve (9) is adjustable to adjust the discharge volume of the second feeding barrel (2).

2. The feeding device according to claim 1, characterized in that A conveyor belt (33) is provided in the feeding tube (3), one end of the conveyor belt (33) is aligned with the feeding port (321), and the other end of the conveyor belt (33) is aligned with the end of the feeding tube (3) extending into the single crystal furnace.

3. The feeding device according to claim 1, characterized in that The first feeding cylinder (1) includes a first outer cylinder (12), a first hopper (13) and a first weighing mechanism. The first hopper (13) and the first weighing mechanism are both arranged in the first outer cylinder (12), and the first weighing mechanism is supported on the first hopper (13) to detect the weight of the first hopper (13); the discharge port of the first outer cylinder (12) is connected to the feed port (321), and the first valve (8) is installed at the discharge port of the first hopper (13).

4. The feeding device according to claim 3, characterized in that The first weighing mechanism comprises a first supporting structure (14) and a first weighing sensor. The first supporting structure (14) is arranged in an annular shape on the inner wall of the first outer cylinder (12) and is sleeved on the outer wall of the first hopper (13). The first weighing sensor is arranged on the first supporting structure (14) and abuts against the outer wall of the first hopper (13).

5. The feeding device according to claim 1, characterized in that The second feeding cylinder (2) includes a second outer cylinder (22), a second hopper (23) and a second weighing mechanism. The second hopper (23) and the second weighing mechanism are both arranged in the second outer cylinder (22), and the second weighing mechanism is supported on the second hopper (23) to detect the weight of the second hopper (23); the second valve (9) is installed at the discharge port of the second hopper (23).

6. The feeding device according to claim 5, characterized in that The second weighing mechanism comprises a second supporting structure and a second weighing sensor. The second supporting structure is arranged in an annular shape on the inner wall of the second outer cylinder (22) and is sleeved on the outer wall of the second hopper (23). The second weighing sensor is arranged on the second supporting structure and abuts against the outer wall of the second hopper (23).

7. The feeding device according to claim 5, characterized in that The second feeding cylinder (2) further comprises a flow guide tube (24), one end of which is connected to the discharge port of the second outer cylinder (22), and the other end of which is connected to the feed port (321).

8. The feeding device according to claim 1, characterized in that The first valve (8) and / or the second valve (9) comprises a first panel (81), a second panel (82) and blades (83), wherein the first panel (81) is connected to the discharge port of the first feeding barrel (1) and / or the second feeding barrel (2), and the first panel (81) and the second panel (82) are coaxially provided with through holes at their center positions, and the plurality of blades (83) are respectively fitted between the first panel (81) and the second panel (82), and a center hole (84) is formed between the plurality of blades (83).

9. A continuous Czochralski single crystal furnace, characterized in that: It comprises a furnace body (4), a crucible (5), and a feeding device according to any one of claims 1 to 8.

10. The continuous Czochralski single crystal pulling furnace according to claim 9, characterized in that: The crucible (5) comprises an inner pot body (51) and an outer pot body (52); a through hole connecting the inner pot body (51) and the outer pot body (52) is provided on the inner pot body (51); and a gap for adding material is left between the inner pot body (51) and the outer pot body (52).

Images