Mask cleaning device

Abstract

The utility model discloses a mask plate cleaning device, which relates to the field of cleaning equipment, and comprises a cleaning box body used for accommodating a mask plate and cleaning liquid; the spraying system is arranged facing the accommodating cavity of the cleaning box body and is used for introducing cleaning liquid into the cleaning box body; the bubble assembly is arranged in the cleaning box body and can generate bubbles in a cleaning liquid environment and push the bubbles to the side of the mask; the bubble assembly is arranged to generate and push bubbles to instantly explode on the surface of the mask plate to generate impact force, so that dirt is separated from the mask plate. According to the mask cleaning device, the bubble assembly is arranged in the cleaning box body, bubbles are generated and pushed to explode instantly on the surface of the mask, impact force is generated, dirt and the mask are separated, and the purpose of thoroughly removing tiny dirt on the mask is achieved.

Description

Technical Field

[0001] The utility model relates to the field of cleaning equipment, in particular to a mask cleaning device. Background Art

[0002] RCA cleaning technology is a wet cleaning process widely used in semiconductor manufacturing. It consists of two main steps: first, cleaning with an SC-1 solution, a mixture of ammonium hydroxide (NH₄OH), hydrogen peroxide (H₂O₂), and deionized water (DI H₂O), to remove organic contaminants and some metallic impurities from the silicon wafer surface; second, cleaning with an SC-2 solution, a mixture of hydrochloric acid (HCl), hydrogen peroxide, and deionized water, to remove metal ions and other residues from the silicon wafer surface. Both treatments leave a thin hydrophilic oxide layer on the silicon surface after rinsing, providing additional protection. RCA cleaning technology also plays a vital role in mask cleaning. Masks are a critical tool for pattern transfer in the photolithography process, and their surface cleanliness directly impacts the accuracy and yield of the lithography process. RCA cleaning technology effectively removes photoresist residue, metal ions, and other organic and inorganic contaminants from the mask, ensuring the mask's light transmittance and pattern transfer quality. This cleaning process significantly improves the lifespan of the mask and the stability of the photolithography process.

[0003] However, even with the RCA cleaning technology, tiny dirt smaller than 1 μm may still remain on the mask surface.

[0004] In view of this, this application is hereby filed. Utility Model Content

[0005] The purpose of the utility model is to provide a mask cleaning device, which, by arranging a bubble component in a cleaning box, generates and pushes bubbles to instantly explode on the surface of the mask, generating an impact force to separate dirt from the mask, thereby solving the problem of incomplete cleaning of tiny dirt on the mask in the prior art.

[0006] The present invention is implemented through the following technical solutions: The present invention provides a mask cleaning device, comprising:

[0007] A cleaning box, used to contain the mask and cleaning fluid;

[0008] A spray system is provided facing the receiving cavity of the cleaning box and is used to pass the cleaning liquid into the cleaning box;

[0009] The bubble assembly is arranged in the cleaning box and can generate bubbles in the cleaning liquid environment and push the bubbles to the side of the mask;

[0010] The bubble assembly is configured to generate and push bubbles to instantly explode on the mask surface, generating an impact force to separate dirt from the mask.

[0011] Preferably, a stage is provided inside the cleaning box, and the stage is used to support the mask. When the mask is placed on the stage, there is a gap between the mask and the top wall of the cleaning box.

[0012] Preferably, the stage is arranged perpendicular to the bottom wall of the cleaning box. When the mask is placed on the stage, there is a gap between the mask and the bottom wall of the cleaning box, and the mask is parallel to the bottom wall of the cleaning box.

[0013] Preferably, the bubble assembly is arranged on the bottom wall of the cleaning box, and when the mask is placed on the stage, the vertical projection of the bubble assembly falls into the mask.

[0014] Preferably, the bubble assembly includes a plurality of air nozzles arranged in an array.

[0015] Preferably, when the mask is placed on the stage, the spray system is arranged above the mask, and the spray system includes a plurality of liquid spray nozzles arranged facing the mask.

[0016] Preferably, a liquid extraction pipeline is provided at the bottom of the cleaning box, and the liquid extraction pipeline is connected to the internal chamber of the cleaning box for discharging the cleaning liquid in the internal chamber.

[0017] Preferably, the spray system is connected to a DI water pipeline system and a plurality of cleaning liquid pipeline systems.

[0018] Preferably, two stages are provided, one for supporting two sides of the mask respectively.

[0019] Preferably, the top of each stage is a "convex" structure, and the mask can be placed on the step surface of the "convex" structure.

[0020] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0021] 1. The mask cleaning device provided by the embodiment of the present invention arranges a bubble component in a cleaning box, places the mask in the cleaning box, and cooperates with a spray system. When the spray system passes the cleaning liquid into the cleaning box, the cleaning liquid can not only flush the mask, but also accumulate in the cleaning box, so that the mask is submerged in the cleaning liquid. At this time, under the action of the bubble component, bubbles can be released in the cleaning liquid in the cleaning box. Under the action of pressure, the bubbles are pushed to the surface of the mask and explode on the surface of the mask. During the explosion process, the bubbles generate impact force to separate the dirt from the mask, and at the same time, the cleaning liquid is kept flowing to prevent the dirt falling off the mask surface from aggregating in the cleaning liquid, thereby achieving the purpose of removing tiny dirt.

[0022] 2. The embodiment of the present invention is provided with a stage to support the mask, ensure the exposed surface of the mask, and improve the comprehensiveness of the mask cleaning. At the same time, the spray system is arranged above the mask, and the bubble component is arranged below the mask, which increases the spray system's flushing area of ​​the mask and increases the probability of bubbles generated by the bubble component instantly bursting on the mask surface, further improving the cleaning efficiency.

[0023] 3. The liquid extraction pipeline provided in the embodiment of the present invention cooperates with multiple cleaning liquid pipeline systems, and multiple cleaning liquids can be switched and recycled to improve cleaning efficiency.

[0024] In general, the mask cleaning device provided by the embodiment of the present invention sets a bubble component in the cleaning box to generate and push bubbles to instantly explode on the mask surface, generating an impact force to separate dirt from the mask, thereby achieving the purpose of completely removing tiny dirt on the mask. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following is a brief introduction to the drawings required for use in the embodiments. It should be understood that the following drawings only illustrate certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying any creative work.

[0026] Figure 1 A schematic structural diagram of a mask cleaning device provided in an embodiment of the present invention;

[0027] Figure 2 This is a schematic structural diagram of a mask cleaning device provided in an embodiment of the present invention.

[0028] Markings and corresponding parts names in the accompanying drawings:

[0029] 1-cleaning box, 2-mask, 3-spray system, 4-bubble assembly, 5-dirt, 6-stage, 7-air nozzle, 8-liquid nozzle, 9-liquid extraction pipeline, 10-DI water pipeline system, 11-cleaning liquid pipeline system, 12-step surface, 13-microbubbles, 14-cleaning liquid surface. DETAILED DESCRIPTION

[0030] To make the purpose, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions of the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Generally, the components of the embodiments of the present invention described and shown in the drawings herein can be arranged and designed in various different configurations.

[0031] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but rather merely represents selected embodiments of the present invention. All other embodiments derived by persons of ordinary skill in the art based on the embodiments of the present invention without creative effort are also within the scope of protection of the present invention.

[0032] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, it does not need to be further defined or explained in subsequent drawings.

[0033] In the description of the present invention, it should be noted that the terms "first", "second", "third", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0034] Example

[0035] like Figure 1 As shown, an embodiment of the present invention provides a mask cleaning device, comprising:

[0036] The cleaning chamber 1 is used to accommodate the mask 2 and the cleaning liquid, ensuring that the cleaning liquid can fully contact the mask 2 while protecting the cleaning process from contamination from the external environment. The spray system 3 is arranged facing the receiving cavity of the cleaning chamber 1 and is used to pass the cleaning liquid into the cleaning chamber 1. That is, the spray system 3 is responsible for spraying the cleaning liquid onto the mask 2. The bubble component 4 is arranged in the cleaning chamber 1 and can generate bubbles in the cleaning liquid environment and push the bubbles to the side of the mask 2. The bubble component 4 is configured to generate and push bubbles to instantly explode on the surface of the mask 2, generating an impact force to separate dirt 5 from the mask 2, achieving a deep cleaning effect. Therefore, the cleaning device provided by the embodiment of the utility model can effectively remove tiny dirt 5 below 1 μm, which is usually difficult to completely remove using traditional RCA cleaning technology. The device uses a high-energy frequency vibration effect combined with the chemical reaction of the cleaning agent.

[0037] In order to improve the comprehensiveness of cleaning the mask 2, a stage 6 can be provided inside the cleaning box 1. The stage 6 is used to support the mask 2. When the mask 2 is placed on the stage 6, there is a gap between the mask 2 and the top wall of the cleaning box 1. Specifically, the stage 6 is a platform installed inside the cleaning box 1. Its function is to fix and support the mask 2 to ensure that the mask 2 is stably placed during the cleaning process. The mask 2 is placed on the stage 6 before cleaning. When the mask 2 is placed on the stage 6, there is a certain gap between the mask 2 and the top wall of the cleaning box 1. This gap allows the cleaning liquid sprayed from above by the spray system 3 to flow smoothly over the surface of the mask 2, and at the same time provides space for the impact force generated by the bubble explosion, so that the impact force can effectively act on the surface of the mask 2, help remove contaminants, and prevent the cleaning liquid from overflowing or accumulating between the mask 2 and the top wall of the box, thereby maintaining a smooth cleaning process. Spray system 3 utilizes this gap to evenly spray cleaning fluid onto reticle 2 from above or the side, ensuring that the cleaning fluid covers all areas of reticle 2. Bubble assembly 4 generates bubbles in the cleaning fluid, which rise through the gap and adhere to the surface of reticle 2. When the bubbles burst, the resulting impact force helps remove contaminants. Of course, in other embodiments, the presence of the gap allows for dynamic operation during the cleaning process. For example, by adjusting the height or tilt angle of stage 6, the flow direction of the cleaning fluid and the point of impact force can be changed, further optimizing the cleaning effect.

[0038] As a preferred embodiment of the present invention, the stage 6 can be positioned perpendicular to the bottom wall of the cleaning chamber 1. When the reticle 2 is placed on the stage 6, a gap exists between the reticle 2 and the bottom wall of the cleaning chamber 1, and the reticle 2 is parallel to the bottom wall of the cleaning chamber 1. Specifically, this structure allows the cleaning liquid to flow freely under the reticle 2, facilitating even distribution of the cleaning liquid and ensuring that the entire surface of the reticle 2 is exposed to the cleaning liquid. At the same time, bubbles generated during the cleaning process can be smoothly discharged through the gap between the reticle 2 and the bottom wall of the cleaning chamber 1, preventing bubbles from accumulating under the reticle 2 and affecting the cleaning effect. This allows the spray system 3 to more effectively spray the cleaning liquid onto the back of the reticle 2, achieving double-sided cleaning. The parallel arrangement of the reticle 2 and the bottom wall of the cleaning chamber 1 can improve the installation stability of the reticle 2 within the cleaning chamber 1. More preferably, the bubble assembly 4 is positioned on the bottom wall of the cleaning chamber 1. When the reticle 2 is placed on the stage 6, the vertical projection of the bubble assembly 4 falls into the reticle 2. In this way, the bubbles generated by the bubble component 4 can form a microscopic cleaning force on the surface of the mask plate 2, which helps the cleaning liquid to better penetrate into the surface and microstructure of the mask plate 2, thereby improving the cleaning efficiency. The bubbles can be evenly distributed on the surface of the mask plate 2, which helps to achieve comprehensive cleaning and ensure that the entire surface of the mask plate 2 can be effectively cleaned. Since the projection of the bubble component 4 falls into the mask plate 2, the ineffective ejection of bubbles can be reduced, ensuring that the cleaning device is used more efficiently and reduces waste.

[0039] Furthermore, if Figure 2 As shown, the bubble assembly 4 includes a plurality of air nozzles 7 arranged in an array to ensure that the entire surface of the mask 2 can be effectively covered and cleaned. The specific distance between adjacent air nozzles 7, the angle between the air nozzle 7 and the surface of the mask 2, the injection pressure and flow rate of the air nozzle 7, the number and size of the air nozzles 7 are not limited here, and can be set according to actual needs, as long as the bubbles generated by the gas injected by the air nozzle 7 in the cleaning liquid can fully reach every corner of the mask 2 and achieve the purpose of comprehensive cleaning. Of course, the spray system 3 can also be set above the mask 2. The spray system 3 also includes a plurality of liquid spray nozzles 8 arranged facing the mask 2. This structure enables the cleaning liquid to be sprayed directly and evenly on the surface of the mask 2 to achieve efficient cleaning. The array arrangement design of the liquid spray nozzles 8 ensures that the entire surface of the mask 2, including the edges and corners, can be fully covered.

[0040] To further improve cleaning efficiency, a liquid extraction line 9 can be provided at the bottom of the cleaning box 1. The liquid extraction line 9 connects to the internal chamber of the cleaning box 1 and is used to drain the cleaning liquid from the internal chamber. The liquid extraction line 9 is responsible for draining the liquid remaining in the internal chamber of the cleaning box 1 after cleaning. The liquid extraction line 9 is preferably located at the bottom of the cleaning box 1 and connected to the internal chamber. The liquid extraction line 9 can be used to drain the used cleaning liquid through the suction action of the liquid extraction pump. It can also prevent the cleaning liquid from being retained in the chamber for too long, causing contaminants to re-attach to the mask 2. While the spray system 3 is spraying liquid, the liquid extraction line 9 can be activated at the appropriate time to achieve dynamic liquid management and control, further optimizing the cleaning process.

[0041] Furthermore, the spray system 3 can be connected to multiple cleaning liquid pipeline systems 11 (including a DI water pipeline system 10, an ammonium hydroxide solution pipeline system, a hydrogen peroxide solution pipeline system, etc.) to meet different cleaning requirements. The DI water pipeline system 10 provides deionized water for the rinsing step in the cleaning process to remove impurities and residues on the mask 2. The ammonium hydroxide solution pipeline system is used to provide an alkaline solution, which helps to remove organic matter and photoresist residues on the mask 2. The hydrogen peroxide solution pipeline system provides an oxidizing cleaning liquid that can effectively remove stubborn contaminants on the mask 2. The multi-pipeline system spray system 3 is designed to cooperate with the liquid extraction pipeline 9, so that the cleaning process can flexibly switch to use different cleaning liquids according to the specific cleaning requirements of the mask 2, thereby improving cleaning efficiency and quality. At the same time, the system also facilitates the automated control of the cleaning process. The automated system can realize automatic switching and supply of cleaning liquids, reduce manual operations, and improve the stability and consistency of the cleaning process.

[0042] In order to further improve the stability of the cleaning process of the mask plate 2, two stages 6 are provided in the embodiment of the utility model, which are used to support the two sides of the mask plate 2 respectively, and the top of each stage 6 is a "convex" structure. The mask plate 2 can be placed on the step surface 12 of the "convex" structure. The "convex" structure provides a restrictive space, which helps to stabilize the position of the mask plate 2 and reduce the displacement or vibration that may occur during the cleaning process. The step surface 12 can be designed to precisely match the edge of the mask plate 2 to ensure the positioning accuracy of the mask plate 2 during the cleaning process.

[0043] For example, Figure 1-2As shown, the mask cleaning apparatus includes a stage 6 for supporting the mask 2 while also keeping the mask 2 suspended in the air to prevent it from contacting the inner wall of the receiving chamber and causing contamination. A bubble assembly 4 is used to generate microbubbles 13 in the cleaning solution. The impact force generated by the instantaneous collapse of the microbubbles 13 on the surface of the mask 2 breaks the adhesion between the dirt 5 and the mask 2, and maintains the flow of the cleaning solution to prevent the dirt 5 that has fallen off the mask 2 from aggregating in the cleaning solution. A spray system 3 injects cleaning solutions of various specific pH values ​​into the receiving chamber and rinses the mask 2 with DI water. The repeated pH changes reduce the absolute zeta potential of the surfaces of the mask 2 and the dirt 5. This reduces the adhesion between the dirt 5 and the mask 2, making it easier for the dirt 5 to separate from the mask 2. The absolute zeta potential of the dirt 5 in the solution is also reduced, causing the dirt 5 to aggregate and be more easily removed by the flowing cleaning solution.

[0044] Specifically, the mask 2 with dirt 5 on the surface is placed on the stage 6 of the cleaning device, and the bubble component 4 generates microbubbles 13 with a diameter of less than 10um. Since the bubble diameter is controlled below 10um, the cleaning effect is best and the removal rate of the dirt 5 can be guaranteed; a cleaning liquid with a pH value of 4-6 and a temperature of 70 degrees Celsius or above is injected into the spray system 3. The spray system 3 sprays the cleaning liquid into the cleaning box 1. After the mask 2 is immersed (the height of the cleaning liquid level 14 is shown in the figure), the microbubble 13 generator starts working and lasts for 30-40 seconds; the liquid extraction pipeline 9 drains the cleaning liquid in the cavity and uses DI water to rinse the mask 2. A cleaning solution with a pH of 10-12 and a temperature of 70°C or higher is injected into the chamber. After the mask 2 is immersed, the bubble assembly 4 begins operating for 30-40 seconds. A liquid extraction line 9 drains the cleaning solution from the chamber, and the mask 2 is rinsed with DI water. This step can be repeated four or more times. Generally, a higher number of repetitions results in a higher dirt removal rate. Testing has shown that a cleaning efficiency of 90% or higher can be achieved by repeating this step four times.

[0045] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Those skilled in the art will readily appreciate that various modifications and variations of the present invention are possible. Any modifications, equivalent substitutions, improvements, and the like made within the spirit and principles of the present invention are intended to be included within the scope of protection of the present invention. It should be noted that the structures and components illustrated in the accompanying drawings are not necessarily drawn to scale, and that descriptions of known components, processing techniques, and processes are omitted to avoid unnecessarily limiting the present invention.

Claims

1. A mask cleaning device, characterized in that: include: A cleaning box (1) is used to accommodate the mask (2) and cleaning liquid; A spray system (3) is arranged facing the accommodating cavity of the cleaning box (1) and is used to pass cleaning liquid into the cleaning box (1); A bubble assembly (4) is arranged in the cleaning box (1) and is capable of generating bubbles in a cleaning liquid environment and pushing the bubbles to the side of the mask (2); The bubble assembly (4) is configured to generate and push bubbles in the cleaning fluid to instantly explode on the surface of the mask (2) to generate an impact force to separate the dirt (5) from the mask (2).

2. The mask cleaning device according to claim 1, characterized in that: A stage (6) is provided inside the cleaning box (1), and the stage (6) is used to support the mask (2). When the mask (2) is placed on the stage (6), a gap exists between the mask (2) and the top wall of the cleaning box (1).

3. The mask cleaning device according to claim 2, characterized in that: The stage (6) is arranged perpendicular to the bottom wall of the cleaning box (1); when the mask (2) is placed on the stage (6), a gap exists between the mask (2) and the bottom wall of the cleaning box (1), and the mask (2) is parallel to the bottom wall of the cleaning box (1).

4. The mask cleaning device according to claim 3, characterized in that: The bubble assembly (4) is arranged on the bottom wall of the cleaning box (1); when the mask (2) is placed on the stage (6), the vertical projection of the bubble assembly (4) falls into the mask (2).

5. The mask cleaning device according to claim 4, characterized in that: The bubble assembly (4) comprises a plurality of air nozzles (7) arranged in an array.

6. The mask cleaning device according to claim 3, characterized in that: When the mask (2) is placed on the stage (6), the spray system (3) is arranged above the mask (2), and the spray system (3) includes a plurality of liquid spray nozzles (8) arranged facing the mask (2).

7. The mask cleaning device according to claim 3, characterized in that: A liquid extraction pipeline (9) is provided at the bottom of the cleaning box (1), and the liquid extraction pipeline (9) is connected to the internal chamber of the cleaning box (1) and is used to discharge the cleaning liquid in the internal chamber.

8. The mask cleaning device according to claim 7, characterized in that: The spray system (3) is connected to a DI water pipeline system (10) and a plurality of cleaning liquid pipeline systems (11).

9. The mask cleaning device according to claim 3, characterized in that: Two loading platforms (6) are provided, respectively used to support two sides of the mask plate (2).

10. The mask cleaning device according to claim 9, characterized in that: The top of each of the loading platforms (6) is a "convex" structure, and the mask (2) can be placed on the step surface (12) of the "convex" structure.

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