Photovoltaic cell photoetching equipment with leveling mechanism

Abstract

The utility model provides photovoltaic cell photoetching equipment with a leveling mechanism, which comprises a light source, a mask plate fixing mechanism, a mask plate, a cell piece, an exposure table top, a table top moving module, a correction module, a light source bracket, a swing table and a marble table top, and the swing table is fixedly arranged at the top of the marble table top corresponding to the mask plate; a correction module is mounted at the top of the marble through a bolt; the correction module is used for detecting the parallelism between the mask plate and the exposure table top, and the mask plate is parallel to the exposure table top through swinging of the swinging table, so that leveling is realized; according to the utility model, the mask plate is leveled to be relatively parallel to the exposure table surface, so that the plane of the mask plate is parallel to but not in contact with the surface of the battery piece, and damage caused by contact between the mask plate and the surface of the battery piece is avoided; especially, when the photovoltaic cells are produced in large quantities, the production capacity is large, and the rhythm is fast.

Description

Technical Field

[0001] The utility model relates to the field of photovoltaic cell photolithography equipment, in particular to photovoltaic cell photolithography equipment with a leveling mechanism. Background Art

[0002] Currently, photovoltaic cells are all screen-printed, where silver paste is transferred to the cell in a graphic manner, and then sintered at high or low temperatures to form silver electrodes that serve as conductors. This method is simple to use and is currently the most widely used cell metallization method for mass-produced photovoltaic cells. In recent years, the width and aspect ratio of silver electrodes in the screen-printing process have reached their development limits. However, the silver paste used in this process is expensive, which has prevented further reductions in photovoltaic cell production costs. To reduce the cost of photovoltaic cells and improve their efficiency, a patterning and electroplating metallization method has emerged to produce cell metal electrodes. This patterning and electroplating metallization method can use cheaper copper metal instead of silver, which not only reduces costs but also allows for thinner conductors, thereby improving the power generation efficiency of the cells.

[0003] Photolithography, as a process in the patterning process, is one of the most critical steps in patterning and determines the line width, line height, and morphology of the pattern subsequently electroplated. There are multiple methods for implementing photolithography, and the present application relates to an exposure photolithography process. Exposure involves the use of a parallel ultraviolet light source to illuminate a mask, where the mask has translucent and opaque areas according to the customized pattern. After passing through the translucent areas of the mask, the parallel light is irradiated onto the cell, causing a glue chain reaction in the photoresist in the irradiated area of ​​the cell. Then, through subsequent development, the pattern can be transferred to the cell, achieving the purpose of patterning.

[0004] There are three exposure methods: contact exposure, proximity exposure, and projection exposure. Contact exposure refers to the direct contact and bonding of the mask and the cell surface. The currently widely used contact exposure method is widely researched and used because of its simplicity and directness. It is widely used in industries such as PCB, and has lower overall equipment and process costs.

[0005] In proximity exposure, there is a tiny gap between the bottom surface of the mask and the surface of the cell, which prevents the mask from contacting the cell surface. However, the gaps between the two surfaces must be equal or within an allowable range, which requires the parallelism between the two surfaces to be within an allowable range. In actual use, the position of the mask will change each time the mask is replaced, and after each cell is placed on the exposure table and adsorbed, the cell itself is different and moves with the exposure table, so the bottom surface of the mask and the surface of the cell will change. Therefore, in proximity exposure, how to level the parallelism between the mask and the exposure table to ensure that the parallelism between the bottom surface of the mask and the surface of the cell is within the allowable range is one of the key processes for realizing proximity exposure lithography.

[0006] The existing technology uses contact exposure, which controls the mask or exposure table to ensure contact and fit between them, minimizing light diffraction and other issues, allowing the mask pattern to be directly transferred to the cell in a 1:1 ratio. However, the major drawback of this existing technology is that the contact between the mask and the cell surface can damage the pattern on the mask, wear the mask, and contaminate the photoresist on the cell surface. In the mass production of photovoltaic cells, at the latest production rates of less than 1 second per cell, the mask needs to frequently contact the cell surface at intervals of seconds, greatly accelerating mask damage, making the mask a high-consumable material and significantly increasing consumable costs. Furthermore, the contact between the cell surface and the mask can damage the adhesive surface of the cell surface, and the mask may also be contaminated with adhesive particles, thereby contaminating the next cell. Alternatively, contaminated particles may block the light-transmitting area, resulting in distorted patterns after exposure. Utility Model Content

[0007] In order to solve the problem in the prior art that the mask and the cell surface are not parallel and contact each other, which may cause damage to the pattern on the mask and wear of the mask, the utility model provides a photovoltaic cell lithography device with a leveling mechanism;

[0008] The utility model provides a photovoltaic cell lithography device with a leveling mechanism adopts the following technical solutions:

[0009] A photovoltaic cell photoetching equipment with leveling mechanism, comprising a light source, a mask plate fixing mechanism, a mask plate, a cell piece, an exposure table top, a table top moving module, a correction module, a light source support, a swing table and a marble table top, the top of the marble table top is provided with the light source through the light source support; the top of the marble table top is also provided with the table top moving module through bolts; the top of the table top moving module is sequentially provided with the exposure table top, the cell piece, the mask plate and the mask plate fixing mechanism; the top of the marble table top is provided with the swing table correspondingly; the top of the marble is provided with the correction module through bolts; the correction module is used for detecting the parallelism between the mask plate and the exposure table top, the mask plate is parallel to the exposure table top through the swing of the swing table, so that leveling is realized;

[0010] Further, the swing table is driven by a motor, and the swing table can swing around the X axis and the Y axis to realize multi-direction leveling of the mask plate;

[0011] Further, the correction module selects a laser collimator, which detects the plane inclination of the bottom surface of the mask plate by emitting parallel light beams, and sends the detection result to the main control unit of the equipment, and the main control unit calculates the radian data of the swing table required to swing around the X axis and the Y axis according to the detection result, controls the swing table to adjust, so that the mask plate is parallel to the exposure table top;

[0012] Further, the light source is installed on the light source support and located directly above the mask plate, the light emitted by the light source is parallel light and irradiates downward, and the uniformity of light intensity in the exposure process is ensured;

[0013] Further, the table top moving module selects a driving structure of a motor lead screw and is used for moving the exposure table top to accurately align the cell piece with the mask plate;

[0014] Further, the correction module selects a laser ranging sensor, three groups of the correction module are arranged to measure three points of the mask plate respectively, the plane inclination of the mask plate is obtained through the three-point determination of a plane, then the swing table is controlled to reach the equal displacement distance of the three points, so that leveling is realized;

[0015] Further, the exposure table top is provided with a light transmission hole;

[0016] Further, a micro adjustment mechanism is installed between the correction module and the marble table top and is used for adjusting the light emission angle of the laser collimator probe.

[0017] In summary, the photovoltaic cell photoetching equipment with leveling mechanism has the following beneficial effects:

[0018] The utility model adjusts the mask to be relatively parallel to the exposure table so that the mask plane is parallel to the surface of the cell but does not contact it, thereby avoiding damage caused by contact between the mask and the cell surface; especially when photovoltaic cells are mass-produced, due to the large production capacity and fast beat, the technical solution of the utility model can bring greater value than the contact exposure method, which is mainly reflected in the following aspects: first, saving a large amount of consumables costs; second, improving the production line yield. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 This is a schematic diagram of the overall structure of the utility model;

[0020] Figure 2 For this utility model Figure 1 Enlarged schematic diagram of part A.

[0021] As shown in the figure: 1-light source, 2-mask fixing mechanism, 3-mask, 4-cell, 5-exposure table, 6-table moving module, 7-correction module, 8-light source bracket, 9-swinging table, 10-marble table, 11-light hole. DETAILED DESCRIPTION

[0022] The following is combined with Figure 1-2 The utility model is further described in detail:

[0023] The embodiment of the utility model discloses a photovoltaic cell lithography device with a leveling mechanism, such as Figure 1 、 2 As shown, a photovoltaic cell lithography device with a leveling mechanism includes a light source 1, a mask fixing mechanism 2, a mask 3, a cell 4, an exposure table 5, a table moving module 6, a correction module 7, a light source bracket 8, a swinging table 9, and a marble table 10. The light source 1 is mounted on the top of the marble table 10 via the light source bracket 8; the table moving module 6 is also mounted on the top of the marble table 10 via bolts; the exposure table 5, the cell 4, the mask, and the mask fixing mechanism 2 are sequentially arranged on the top of the table moving module 6; the swinging table 9 is fixedly mounted on the top of the marble table 10 corresponding to the mask; the correction module 7 is mounted on the top of the marble via bolts; the correction module 7 is used to detect the parallelism between the mask 3 and the exposure table 5. The mask 3 is parallel to the exposure table 5 through the swing of the swinging table 9, thereby achieving leveling;

[0024] like Figure 1 、 2 As shown, the swing table 9 is driven by a motor, and the swing table 9 can swing around the X-axis and the Y-axis to achieve multi-directional leveling of the mask 3;

[0025] like Figure 1 、 2As shown, the correction module 7 uses a laser collimator, which detects the plane inclination of the bottom surface of the mask 3 by emitting a parallel light beam and sends the detection result to the main control unit of the device. The main control unit calculates the arc data of the swing stage 9 that needs to be swung around the X-axis and Y-axis based on the detection result, and controls the swing stage 9 to adjust so that the mask 3 is parallel to the exposure table 5;

[0026] like Figure 1 、 2 As shown, the light source 1 is mounted on the light source bracket 8 and is located directly above the mask 3. The light emitted by the light source 1 is parallel light and irradiates downward to ensure uniform light intensity during the exposure process;

[0027] like Figure 1 、 2 As shown, the table moving module 6 uses a motor screw drive structure to move the exposure table 5 so that the cell 4 is accurately aligned with the mask 3;

[0028] like Figure 1 、 2 As shown, the correction module 7 uses a laser ranging sensor. The correction module 7 is provided with three groups to measure three points of the mask respectively. The plane inclination of the mask is obtained by determining one side by three points, and then the swing stage 9 is controlled to achieve equal displacement distances of the three points, thereby achieving leveling;

[0029] like Figure 1 、 2 As shown, a light-transmitting hole 11 is provided inside the exposure table 5;

[0030] like Figure 1 、 2 As shown, a micro-adjustment mechanism is installed between the correction module 7 and the marble table 10 to adjust the light angle of the laser collimator probe;

[0031] Based on the above embodiment, a leveling method for photovoltaic cell lithography equipment is developed. To make two planes parallel, one of the planes can be first adjusted and fixed, and then the other plane (movable plane) can be adjusted to be parallel to the fixed plane. The exposure table 5 is first adjusted during equipment installation and commissioning. During the subsequent use of the equipment, the exposure table 5 only moves horizontally and vertically in space without any tilting, and is considered a fixed surface. Then, during use of the equipment, the reticle 3 needs to be newly installed or replaced, and its position will change each time, so it is considered a moving surface. The entire leveling method and process are mainly carried out in the following steps:

[0032] sp1: photovoltaic cell 4 is placed on the exposure table 5 by an automatic mechanism, the table is vacuum adsorbed to open and adsorb the cell 4; based on the small thickness change of the qualified cell 4, the surface of the cell 4 is parallel to the back, and the back of the cell 4 is attached to the exposure table 5, which can be regarded as the bottom surface of the mask 3 is parallel to the exposure table 5, and the bottom surface of the mask 3 is also parallel to the surface of the cell 4; during installation, the exposure table 5 is installed in a similar way to the marble table 10 reference, and the exposure table 5 is adjusted to be horizontal by means of a level meter, etc., to ensure that the exposure table 5 and the marble table 10 base are in the same horizontal plane; after the equipment is operated for a period of time, if the table deviates from the horizontal, the same mechanical adjustment method is used to adjust the table to be horizontal;

[0033] sp2: the laser collimator probe is installed on a micro adjustment mechanism to form a complete set of laser collimator, which is installed on the marble table 10, and the probe exit light angle can be adjusted by adjusting the micro adjustment mechanism; during initial installation of the laser collimator, the exposure table 5 with the cell 4 adsorbed is moved to the top of the laser collimator probe, and the laser collimator exit light hits the back of the cell 4 (contacting the surface of the exposure table 5), and the probe exit light is made perpendicular to the back of the cell 4 by adjusting the micro adjustment mechanism, which is the origin calibration; after successful origin calibration, the laser emitted by the laser collimator probe is perpendicular to the surface of the exposure table 5, and the inclination A of the surface of the exposure table 5 is zero.

[0034] sp3: the exposure table 5 is moved horizontally or the cell 4 is directly removed from the exposure table 5; the cell 4 adsorption needs to be released first, and then the mask 3 is adsorbed and fixed on the mask fixing mechanism 2, at this time the mask 3 is exposed to the detection of the laser collimator, the probe exit light directly hits the bottom surface of the mask 3, the reflected incident light of the bottom surface of the mask 3 is received by the laser collimator probe, the laser collimator controller analyzes and calculates the plane inclination B1 of the bottom surface of the mask 3, and sends the data to the equipment main control unit; after receiving the related data of the plane inclination B1, the equipment main control unit analyzes and calculates the difference between the plane inclination A, calculates the radian data of the swing table 9 which needs to swing around the XY axis, and then sends the command to control the swing table 9 adjustment; after adjustment, the laser collimator measures the plane inclination B2 of the bottom surface of the mask 3 again, and the detection control is recycled again, so that the plane inclination B of the bottom surface of the mask 3 is equal to or approximately equal to the plane inclination A within the allowable error range, so that the surface of the exposure table 5 is parallel to the bottom surface of the mask 3, and the purpose of adjusting the mask 3 is achieved;

[0035] Wherein the above process sp3 can be replaced by the following process:

[0036] Three laser distance measuring sensors are used to measure three points. The three points determine one surface. First, the three distance measuring sensors are calibrated with one surface and used as a fixed surface. By measuring the displacement distance of the other moving surface, the plane inclination of the moving surface is obtained. Then, the moving surface is controlled to swing until the displacement distance of the three points is equal, thereby achieving leveling of the two surfaces.

[0037] In addition, the angle adjustment based on the micro-adjustment mechanism can be one of the angle adjustment forms such as the angle adjustment plate and the slide, the groove and the protrusion, the gear and the clamping strip, etc., but is not limited to these.

[0038] The above shows and describes the basic principles, main features and advantages of the present invention. The various components mentioned in the present invention are common technologies in the existing field. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The above embodiments and descriptions are merely illustrative of the principles of the present invention. Various changes and improvements may be made to the present invention without departing from the spirit and scope of the present invention. Such changes and improvements fall within the scope of the present invention. The scope of protection claimed in this utility model is defined by the appended claims and their equivalents.

Claims

1. A photovoltaic cell lithography device with a leveling mechanism, comprising a light source (1), a mask fixing mechanism (2), a mask (3), a cell (4), an exposure table (5), a table moving module (6), a correction module (7), a light source bracket (8), an oscillating table (9) and a marble table (10), wherein the light source (1) is mounted on the top of the marble table (10) via the light source bracket (8); the table moving module (6) is also mounted on the top of the marble table (10) via bolts; the exposure table (5), the cell (4), the mask (3) and the mask fixing mechanism (2) are sequentially arranged on the top of the marble table (10); the oscillating table (9) is fixedly mounted on the top of the marble table (10) corresponding to the mask (3); and the device is characterized in that: A correction module (7) is installed on the top of the marble via bolts; the correction module (7) is used to detect the parallelism between the mask (3) and the exposure table (5); the mask (3) is parallel to the exposure table (5) through the swing of the swing table (9), thereby achieving leveling.

2. The photovoltaic cell lithography apparatus according to claim 1, wherein: The swing table (9) is driven by a motor, and the swing table (9) can swing around an X-axis and a Y-axis to achieve multi-directional leveling of the mask (3).

3. The photovoltaic cell lithography apparatus according to claim 2, wherein: The correction module (7) uses a laser collimator to detect the plane inclination of the bottom surface of the mask (3) by emitting a parallel light beam, and sends the detection result to the main control unit of the device. The main control unit calculates the arc data of the swing table (9) that needs to swing around the X axis and the Y axis based on the detection result, and controls the swing table (9) to adjust so that the mask (3) is parallel to the exposure table (5).

4. The photovoltaic cell lithography apparatus according to claim 1, wherein: The light source (1) is mounted on a light source bracket (8) and is located directly above the mask (3). The light emitted by the light source (1) is parallel light and irradiates downward, ensuring uniform light intensity during the exposure process.

5. The photovoltaic cell lithography apparatus according to claim 1, wherein: The table moving module (6) uses a motor screw drive structure for moving the exposure table (5) so that the battery sheet (4) is accurately aligned with the mask (3).

6. The photovoltaic cell lithography apparatus according to claim 2, wherein: The correction module (7) uses a laser distance measuring sensor. The correction module (7) is provided with three groups to respectively measure three points of the mask (3). The plane inclination of the mask (3) is obtained by determining one side by three points. Then, the swing table (9) is controlled to achieve equal displacement distances of the three points, thereby achieving leveling.

7. The photovoltaic cell lithography apparatus according to any one of claims 2 or 6, characterized in that: A light-transmitting hole (11) is provided inside the exposure table (5).

8. The photovoltaic cell lithography apparatus according to claim 3, wherein: A micro-adjustment mechanism is installed between the correction module (7) and the marble table (10) for adjusting the light angle of the laser collimator probe.

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