Manipulator cleaning device

Abstract

The utility model belongs to the field of semiconductor production equipment, and relates to a manipulator cleaning device which comprises a cleaning assembly and a drying assembly. The cleaning assembly comprises an inner cleaning pool, an ultrasonic generator and an outer cleaning pool; the inner cleaning pool is of a box structure with an opening in the upper portion, cleaning liquid is contained in the inner cleaning pool, and the ultrasonic generator is located in the inner cleaning pool and used for cleaning the mechanical arm. The outer cleaning pool is of a box body structure with a hole in the middle, the outer cleaning pool is arranged on the periphery of the inner cleaning pool in a sleeving mode, and the outer cleaning pool is used for receiving cleaning liquid overflowing out of the inner cleaning pool; the bottom of the outer cleaning pool is communicated with the bottom of the inner cleaning pool through a pipeline, a filter is arranged on the pipeline, and cleaning liquid in the outer cleaning pool flows into the inner cleaning pool through the pipeline after being filtered by the filter, so that the cleaning liquid in the inner cleaning pool can be filtered. The drying assembly comprises an air blowing part, the air blowing part is provided with a plurality of air blowing holes, and the air blowing holes are used for blowing hot air to the cleaned mechanical arm to dry the mechanical arm.

Description

TECHNICAL FIELD

[0001] The application belongs to the field of semiconductor production equipment, and particularly relates to a mechanical hand cleaning device. BACKGROUND

[0002] A wafer is a silicon wafer used for manufacturing semiconductor integrated circuits. In order to prevent the wafer from being damaged or having defects in the transportation and manufacturing process, a film is usually attached to the surface of the wafer. The film needs to be removed by a film tearing machine in the subsequent production and manufacturing process. After the film is torn, the wafer is picked up by a mechanical hand. The mechanical hand moves to a centering workbench along a guide rail and places the wafer on the centering workbench. When the mechanical hand moves back and forth between the film tearing workbench and the centering workbench, the tiny particles (mainly silicon powder) remaining on the wafer after polishing will gradually adhere to the mechanical hand. Once the particles adhering to the mechanical hand increase, not only will the negative pressure pipeline of the mechanical hand be blocked, but also the machine will be contaminated, causing defects on the surface of the wafer, and in severe cases, the machine will be shut down. Therefore, the mechanical hand needs to be cleaned in time. At present, manual cleaning is used to check the machine and wipe the mechanical hand, which increases the shutdown rate and seriously affects the production efficiency. CONTENT OF THE UTILITY MODEL

[0003] One of the purposes of the application is to provide a mechanical hand cleaning device which can reduce the shutdown rate and improve the production efficiency.

[0004] To achieve the above-mentioned purposes and other related purposes, the application provides a mechanical hand cleaning device which comprises a cleaning assembly and a drying assembly.

[0005] The cleaning assembly comprises an inner cleaning pool, an ultrasonic generator and an outer cleaning pool.

[0006] The inner cleaning pool is a box structure with an open top, and contains cleaning liquid inside. The ultrasonic generator is located inside the inner cleaning pool and is used for cleaning the mechanical hand.

[0007] The outer cleaning pool is a box structure with a hole in the middle. The outer cleaning pool is sleeved on the outer periphery of the inner cleaning pool. The outer cleaning pool is used to receive the cleaning liquid overflowing from the inner cleaning pool.

[0008] A filter is arranged on the pipeline. The cleaning liquid in the outer cleaning pool is filtered through the filter and then flows into the inner cleaning pool through the pipeline.

[0009] The drying assembly comprises a gas blowing part. The gas blowing part is provided with a plurality of gas blowing holes. The gas blowing holes are used to blow hot air to the cleaned mechanical hand to dry the mechanical hand.

[0010] Optionally, the bottom of the outer cleaning pool is inclined. One end of the pipeline connected to the outer cleaning pool is arranged at the lowest part of the outer cleaning pool.

[0011] Optionally, the outer cleaning tank is further provided with a water inlet pipe and a water outlet pipe, and the water inlet pipe comprises a pure water inlet pipe and a cleaning liquid inlet pipe.

[0012] Optionally, the blowing part is in the shape of a swimming ring, and a through hole is formed in the middle of the blowing part, the blowing part is installed below the guide rail along which the mechanical arm moves, the mechanical arm passes through the through hole of the blowing part and enters the inner cleaning tank for cleaning, and after cleaning, the mechanical arm passes through the through hole of the blowing part again and leaves the mechanical arm cleaning device.

[0013] Optionally, the drying assembly further comprises an air inlet pipe, the blowing part is internally provided with an air flow channel, the air flow channel is in communication with the plurality of blowing holes and the air inlet pipe, and clean dry air is introduced into the blowing part from the air inlet pipe and then blown out from the blowing holes.

[0014] Optionally, the drying assembly comprises a heat exchanger, and the air inlet pipe is in communication with the internal pipeline of the heat exchanger.

[0015] Optionally, the heat source of the heat exchanger is high-temperature tail gas after semiconductor processing.

[0016] Optionally, the outer cleaning tank is provided with a liquid level sensor.

[0017] Optionally, the liquid level sensor comprises an HH liquid level sensor, an H liquid level sensor and an L liquid level sensor, which are respectively used to detect whether the water level in the outer cleaning tank exceeds a safe water level line, exceeds a high water level line and is lower than a low water level line, wherein the safe water level line is higher than the high water level line.

[0018] The present application has at least the following beneficial effects:

[0019] By using the mechanical arm cleaning device of the present application, the silicon powder adhered to the mechanical arm can be cleaned by the cleaning assembly, and the cleaning liquid on the mechanical arm can be dried by the drying assembly, so that the silicon powder on the mechanical arm can be quickly cleaned. By starting the pneumatic diaphragm pump at regular time intervals, periodic cleaning of the silicon powder can be realized, that is, the silicon powder can be cleaned in an automatic and non-manual intervention manner according to the needs. The cleaning assembly comprises a cleaning tank and an outer cleaning tank, the outer cleaning tank can receive the cleaning liquid containing silicon powder overflowing from the inner cleaning tank, and at the same time, filtered cleaning liquid is introduced into the inner cleaning tank, so as to ensure that the cleaning liquid in the inner cleaning tank can be filtered. By using the water inlet pipe and the water outlet pipe, the concentration of the cleaning liquid in the outer cleaning tank can be controlled to reach a suitable concentration for cleaning the mechanical arm in the inner cleaning tank, so as to ensure that the concentration of the cleaning liquid in the inner cleaning tank can remain stable in the case that the cleaning liquid in the inner cleaning tank may be lost during the cleaning process.

[0020] The drying assembly comprises a blowing part which is in the shape of a swimming ring, has a through hole in the middle, and has a plurality of blowing holes arranged at intervals around the blowing part; during the process of the mechanical arm passing through the through hole of the blowing part, the plurality of blowing holes blow hot air to the mechanical arm from different angles, so that the drying efficiency is improved. BRIEF DESCRIPTION OF DRAWINGS

[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed in the embodiments will be briefly introduced as follows. It should be understood that the following drawings only show some embodiments of the present application, and therefore should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can also be obtained without creative labor on the basis of these drawings.

[0022] Figure 1 FIG. 1 is a structural schematic diagram of a mechanical arm cleaning device according to an embodiment of the present application;

[0023] Figure 2 FIG. 2 is a structural schematic diagram of a cleaning assembly according to an embodiment of the present application;

[0024] Figure 3 FIG. 3 is a top view of a blowing part according to an embodiment of the present application;

[0025] FIG. 1 is a structural schematic diagram of a mechanical arm cleaning device according to an embodiment of the present application;

[0026] 11 inner cleaning tank; 12 outer cleaning tank; 13 filter; 14 pipeline; 15 heater; 16 pneumatic valve; 17 liquid level sensor; 18 flow meter; 19 pneumatic diaphragm pump; 20 blowing part; 21 blowing hole; 300 mechanical arm; 31 guide rail; 41 heat exchanger. DETAILED DESCRIPTION

[0027] The embodiments of the present application will be described in detail below through specific, concrete embodiments. Those skilled in the art can easily understand other advantages and effects of the present application from the content disclosed in the present specification. The present application can also be implemented or applied through other different specific embodiments, and various modifications or changes can be made to the details in the present application based on different views and applications without departing from the spirit of the present application. It should be noted that the following embodiments and features in the embodiments can be combined with each other without conflict.

[0028] In the description of the present application, it should be noted that the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance.

[0029] The present embodiment provides a robot cleaning device. The robot cleaning device can be located between a film tearing workbench and a centering workbench. The film tearing machine includes the film tearing workbench and the centering workbench.

[0030] The robot cleaning device includes a cleaning assembly and a drying assembly. The cleaning assembly is used to clean the robot, and the drying assembly is used to dry the robot which has residual cleaning liquid after cleaning. The cleaning assembly includes an inner cleaning pool 11, which is a box structure with an open top. The inner cleaning pool 11 contains cleaning liquid inside, and the robot can move to the inside of the inner cleaning pool 11 through a guide rail to receive cleaning.

[0031] The inner cleaning pool 11 is provided with an ultrasonic generator, which applies ultrasonic oscillation to the cleaning liquid. The liquid transmits energy to the robot 300, cleaning the contaminants such as silicon powder on the surface of the robot 300.

[0032] The cleaning liquid is generally a chemical agent, which can be selected according to the user's needs. Specifically, the cleaning liquid can be SC-1 solution, Spin-D solution, hydrogen peroxide, ammonia, etc. SC-1 solution is composed of a mixture of ammonium hydroxide, hydrogen peroxide and water. The main components of Spin-D solution include hydrofluoric acid, nitric acid, sulfuric acid and phosphoric acid.

[0033] The inner cleaning pool 11 of the present application continuously flows out the cleaning liquid containing silicon powder after cleaning and continuously flows in clean cleaning liquid, so that the cleaning liquid inside the inner cleaning pool 11 is filtered.

[0034] In some embodiments of the present application, the cleaning liquid in the inner cleaning pool 11 can flow out of the inner cleaning pool 11 by overflow. Specifically, the cleaning assembly further includes an outer cleaning pool 12, which is a box structure with a hole in the middle. The outer cleaning pool 12 is sleeved on the outer periphery of the inner cleaning pool 11, and is used to receive the cleaning liquid containing silicon powder overflowed from the inner cleaning pool 11. The overflow of the cleaning liquid can be realized directly through the top opening of the inner cleaning pool 11, or through the overflow port provided on the inner cleaning pool 11. In the case of providing the overflow port, an overflow valve can also be installed.

[0035] It should be noted that, with reference to Figure 2 The side wall of the outer cleaning pool 12 is higher than the side wall of the inner cleaning pool 11, so that the cleaning liquid in the inner cleaning pool 11 can overflow into the inner cleaning pool 12, but not from the outer cleaning pool 12. The height of the side wall of the outer cleaning pool 12 is designed to meet the requirement that even if the cleaning liquid overflowing from the inner cleaning pool 11 to the outer cleaning pool 12 is the maximum overflow amount, no cleaning liquid will overflow from the outer cleaning pool 12.

[0036] The cleaning liquid containing silicon powder in the inner cleaning pool 11 can be overflowed, filtered to obtain clean cleaning liquid without silicon powder, and then flowed into the inner cleaning pool 11 to realize continuous updating and circulation of the cleaning liquid and save production cost. Specifically, the bottom of the outer cleaning pool 12 and the bottom of the inner cleaning pool 11 are connected by a pipeline 14, and a pneumatic diaphragm pump 19 is arranged on the pipeline 14 to provide power for pumping the liquid in the outer cleaning pool 12 into the inner cleaning pool 11, so that the filtered cleaning liquid without silicon powder in the outer cleaning pool 12 enters the inner cleaning pool 11 through the pipeline 14.

[0037] The filter 13 is used for filtering, and is installed on the pipeline 14 to ensure the cleanliness of the cleaning liquid flowing into the inner cleaning pool 11. The filter 13 can be a filter screen.

[0038] In some embodiments of the present application, the side wall of the outer cleaning pool 12 is higher than the side wall of the inner cleaning pool 11, so that the cleaning liquid splashed out of the inner cleaning pool 11 during the cleaning process will be received by the outer cleaning pool 12.

[0039] The bottom of the outer cleaning pool 12 is inclined, and one end of the pipeline 14 connected to the outer cleaning pool 12 is arranged at the lowest part of the outer cleaning pool 12, so as to facilitate the sliding of silicon powder along the inclined bottom and the deposition of silicon powder at the lowest part of the outer cleaning pool 12, and finally the silicon powder flows into the pipeline 14.

[0040] In some embodiments of the present application, a heater 15 is further installed on the pipeline 14 to pass the filtered cleaning liquid at a suitable temperature into the outer cleaning pool 12. The suitable temperature refers to the most suitable temperature or recommended temperature of the cleaning liquid when cleaning the mechanical hand 300.

[0041] In some embodiments of the present application, the liquid level of the outer cleaning pool 12 needs to be stable before and after the cleaning process. Avoiding the start of cleaning without enough cleaning liquid entering the inner cleaning pool 11, and avoiding the overflow of the inner cleaning pool 11 to the outer cleaning pool 12 exceeding the safety water level of the outer cleaning pool 12.

[0042] Specifically, the outer cleaning tank 12 is provided with an inlet pipe and an outlet pipe to ensure the liquid level of the outer cleaning tank 12 stable. The inlet pipe and the outlet pipe are both provided with a pneumatic valve 16 and a flow meter 18, and the flow meter 18 is used to monitor the liquid flow through the pneumatic valve 16 to ensure that the liquid in the outer cleaning tank 12 can continuously flow in and out.

[0043] The inlet pipe includes a pure water inlet pipe and a cleaning liquid inlet pipe. By controlling the flow ratio of the pure water and the cleaning liquid into the outer cleaning tank 12 to be the same as the ratio of the pure water and the cleaning liquid in the inner cleaning tank 11, the concentration of the cleaning liquid in the outer cleaning tank 12 and the inner cleaning tank 11 is stable.

[0044] In some embodiments of the present application, the outer cleaning tank 12 is provided with a liquid level sensor 17. The liquid level sensor 17 can be multiple, for example, including an HH liquid level sensor, an H liquid level sensor and an L liquid level sensor, which are respectively used to detect whether the water level in the outer cleaning tank 12 exceeds a safe water level line, exceeds a high water level line and is lower than a low water level line. Among them, the safe water level line is higher than the high water level line.

[0045] The HH liquid level sensor is used to detect whether the water level in the outer cleaning tank 12 exceeds the safe water level line. The HH liquid level sensor can be a normally closed signal sensor, which can trigger an alarm when the HH liquid level sensor is damaged or power off, to avoid the problem that the sensor fails to cause the water level to exceed the safe water level line. The H liquid level sensor closes the pneumatic valves 16 of the pure water inlet pipe and the cleaning liquid inlet pipe when detecting that the water level exceeds the high water level line. The L liquid level sensor opens the pneumatic valves 16 of the pure water inlet pipe and the cleaning liquid inlet pipe when detecting that the water level is lower than the low water level line.

[0046] The drying assembly includes a blowing part 20, and the blowing part 20 is provided with a plurality of blowing holes 21 for blowing hot air to the cleaned mechanical hand 300 to dry the mechanical hand 300.

[0047] In order to enable the mechanical hand 300 to be cleaned without disassembly, the cleaning assembly is arranged below the guide rail between the film tearing workbench and the centering workbench, and the blowing part 20 is arranged above the cleaning assembly without interfering with the travel route of the mechanical hand 300. Further, the blowing part 20 can be designed as a swimming ring shape with a through hole in the middle. The blowing part 20 is installed below the guide rail, the mechanical hand 300 passes through the through hole of the blowing part 20 and then enters the inner cleaning tank 11 for cleaning, and after cleaning, the mechanical hand 300 leaves the inner cleaning tank 11 and then passes through the through hole of the blowing part 20 to leave the mechanical hand cleaning device. A plurality of blowing holes 21 can be arranged around the blowing part 20 at intervals to realize omnidirectional cleaning of the mechanical hand 300 at various angles.

[0048] The drying assembly further includes an air inlet pipe. The blowing part 20 is internally provided with an airflow channel, and the airflow channel is in communication with the plurality of blowing holes 21 and the air inlet pipe. Clean and dry air is introduced into the blowing part 20 from the air inlet pipe and then blown out from the blowing holes 21.

[0049] The air inlet pipe is provided with a pneumatic valve for opening or stopping the supply of clean dry air and a speed regulating valve for controlling the flow rate of the clean dry air.

[0050] The drying assembly further comprises a heat exchanger 41. The air inlet pipe is in communication with the internal pipeline of the heat exchanger 41, which is used to heat the clean dry air. The heat source of the heat exchanger 41 comes from the high-temperature exhaust gas after the semiconductor process, and the residual heat energy is utilized to achieve energy saving and emission reduction. In other embodiments, the heater 15 described above can also be used to heat the dry air.

[0051] The working process of the robot cleaning device is as follows:

[0052] The robot 300 performs cleaning operation after grabbing 100 wafers. The robot 300 is installed on the guide rail 31, and the drying assembly and the cleaning assembly are sequentially arranged below the guide rail 31. The robot 300 first moves to the inner cleaning pool 11 of the cleaning assembly at a speed of 50 mm / s. The ultrasonic generator cleans the robot 300. After cleaning, the robot 300 leaves the inner cleaning pool 11 and moves to the vicinity of the air blowing part 20 of the drying assembly located above the inner cleaning pool 11 at a speed of 50 mm / s. The air blowing part 20 blows hot air towards the robot 300 for drying the robot 300. The robot 300 passes through the air blowing part 20 at a speed of 5 mm / s and stops at a predetermined position.

[0053] The working process of the filtered cleaning liquid in the inner cleaning pool 11 is as follows:

[0054] The overflow valve of the inner cleaning pool 11 is opened, and the cleaning liquid containing silicon powder in the inner cleaning pool 11 overflows to the outer cleaning pool 12. After 30 seconds, the overflow valve is closed to confirm that the cleaning liquid containing silicon powder in the inner cleaning pool 11 can be normally discharged. After 10 minutes, the overflow valve is opened again, and the cycle program of timed overflow is started. At the same time, the filtered clean cleaning liquid is continuously supplied from the outer cleaning pool 12 to the inner cleaning pool 11 through the pipeline. The cleaning liquid flowing from the outer cleaning pool 12 to the inner cleaning pool 11 is more than the cleaning liquid overflowing from the inner cleaning pool 11 to the outer cleaning pool 12, which causes the L liquid level sensor to detect that the liquid level of the outer cleaning pool 12 decreases. When the liquid level decreases to the low water level line, the pneumatic valve 16 of the water inlet pipe is opened. The pure water and the SC-1 solution enter the outer cleaning pool 12 through the pure water inlet pipe and the cleaning liquid inlet pipe respectively according to the flow ratio of 1:2, and the outer cleaning pool 12 is supplemented with clean cleaning liquid with appropriate concentration. After the H liquid level sensor detects that the liquid level of the outer cleaning pool 12 rises to the high water level line, the pneumatic valves 16 of the water outlet pipe and the water inlet pipe are closed, and the cycle program of timed overflow is ended.

[0055] The above merely describes the preferred embodiments of the present application, and it should be pointed out that, for those skilled in the art, some improvements and replacements can be made without departing from the technical principles of the present application, and these improvements and replacements should also be considered as the protection scope of the present application.

Claims

1. A robot cleaning device, characterized in that, it comprises a cleaning assembly and a drying assembly; the cleaning assembly comprises an inner cleaning pool, an ultrasonic generator and an outer cleaning pool; the inner cleaning pool is a box structure with an open top, and contains cleaning liquid inside; the ultrasonic generator is located inside the inner cleaning pool and used for cleaning the robot; the outer cleaning pool is a box structure with a hole in the middle, and is sleeved on the outer periphery of the inner cleaning pool; the outer cleaning pool is used for containing the cleaning liquid overflowed from the inner cleaning pool; the bottom of the outer cleaning pool is connected with the bottom of the inner cleaning pool through a pipeline, and a filter is arranged on the pipeline; the cleaning liquid in the outer cleaning pool is filtered through the filter and then flows into the inner cleaning pool through the pipeline; the drying assembly comprises a blowing part, and the blowing part is provided with a plurality of blowing holes for blowing hot air to the cleaned robot to dry the robot.

2. The robotic cleaning device of claim 1, wherein The bottom of the outer cleaning pool is inclined, and one end of the pipeline connected with the outer cleaning pool is arranged at the lowest part of the outer cleaning pool.

3. The robotic cleaning device of claim 1, wherein, The outer cleaning pool is also provided with a water inlet pipe and a water outlet pipe, and the water inlet pipe comprises a pure water inlet pipe and a cleaning liquid inlet pipe.

4. The robotic cleaning device of claim 1, wherein, The blowing part is in the shape of a swimming ring, and has a through hole in the middle; the blowing part is installed below the guide rail along which the robot moves; the robot passes through the through hole of the blowing part, enters the inner cleaning pool for cleaning, and then passes through the through hole of the blowing part again to leave the robot cleaning device after cleaning.

5. The robotic cleaning device of claim 4, wherein, The drying assembly further comprises an air inlet pipe, and the blowing part is internally provided with an air flow channel; the air flow channel is in communication with the plurality of blowing holes and the air inlet pipe; clean dry air is introduced into the blowing part from the air inlet pipe and then blown out from the blowing holes.

6. The robotic cleaning device of claim 5, wherein, The drying assembly comprises a heat exchanger, and the air inlet pipe is in communication with the internal pipeline of the heat exchanger.

7. The robotic cleaning device according to claim 6, characterized by The heat source of the heat exchanger comes from high-temperature tail gas after semiconductor processing.

8. The robotic cleaning device of claim 1, wherein, The outer cleaning pool is provided with a liquid level sensor.

9. The robotic cleaning device according to claim 8, characterized by The liquid level sensor comprises an HH liquid level sensor, an H liquid level sensor and an L liquid level sensor, which are respectively used for detecting whether the water level in the outer cleaning pool exceeds a safe water level line, exceeds a high water level line and is lower than a low water level line; the safe water level line is higher than the high water level line.

Images