Adjusting device for alignment camera of exposure machine

Abstract

The utility model discloses an adjusting device for an alignment camera of an exposure machine, which comprises a photoetching frame, an adjusting bottom plate is fixedly mounted on the photoetching frame, an X sliding seat is slidably mounted on the adjusting bottom plate along the X direction, the X sliding seat is driven to slide by an X driving device, a Y sliding seat is slidably mounted on the X sliding seat along the Y direction, and the Y sliding seat is driven to slide by an X driving device. A connecting frame is installed on the Y sliding base, the Y sliding base is driven by a Y driving device to slide, a Z sliding base is installed on the connecting frame in the Z direction in an extending and sliding mode, the Z sliding base is driven by a Z driving device to slide, and an alignment camera and a lighting structure which slide along with the Z sliding base are installed on the Z sliding base. A vertical adjusting device for adjusting the alignment camera and the illumination structure to be vertically downward is arranged on the Y sliding seat; the adjusting device can change the position of the alignment camera and enlarge the shooting range, so that the vertical shooting of the alignment camera is accurate, and the use accuracy is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to exposure machine alignment camera technical field, concretely relates to a kind of exposure machine alignment camera's adjusting device. BACKGROUND

[0002] In the field of exposure machine, not only the mark on the mask plate needs to be captured before alignment movement, but also the mark on the wafer under the mask plate needs to be captured through the mask plate. Whether the clear and accurate image can be captured has a great influence on whether the subsequent alignment can be completed and whether the expected alignment accuracy can be achieved, to ensure the accuracy of lithography. In actual production, the imaging effect of the wafer in the image system is inconsistent due to different process treatments, which leads to the situation that the mark on the wafer cannot be found or misjudgment occurs during automatic alignment. The traditional device only uses a single light source to capture images when aligning, which has great limitations. When the wafer surface is coated with glass powder or has acid spots, it will seriously affect the automatic alignment. Patent No. 202210460940.3 discloses a lighting system suitable for proximity contact type automatic exposure machine. The CCD camera is fixedly installed through the L-shaped connecting plate, and then the coaxial illuminating lamp and the ring-shaped illuminating lamp for photographing are installed below the CCD camera. The ring-shaped illuminating lamp can be adjusted in height. However, since the CCD camera is fixedly installed and cannot be moved, the range of the camera cannot be adjusted, which has poor flexibility. Moreover, the CCD camera cannot be adjusted horizontally on the L-shaped connecting plate, which cannot ensure that the camera is perpendicular to the wafer every time. SUMMARY

[0003] The technical problem to be solved by the utility model is to provide an adjusting device for an exposure machine alignment camera, which can change the position of the alignment camera, expand the shooting range, make the alignment camera shoot vertically and accurately, and improve the accuracy of use.

[0004] To solve the above technical problems, the technical scheme of the utility model is as follows: an adjusting device for an exposure machine alignment camera, comprising a lithography frame, the lithography frame is fixedly installed with an adjusting bottom plate, the adjusting bottom plate is slidably installed with an X slide base along the X direction, the X slide base is driven to slide by an X driving device, the X slide base is slidably installed with a Y slide base along the Y direction, the Y slide base is installed with a connecting frame, the Y slide base is driven to slide by a Y driving device, the connecting frame is provided with a Z slide base slidably installed along the Z direction, the Z slide base is driven to slide by a Z driving device, the Z slide base is installed with an alignment camera and an illuminating structure which slide with the Z slide base, the Y slide base is provided with a vertical adjusting device for adjusting the alignment camera and the illuminating structure to be vertically downward.

[0005] As a preferred scheme, the Z slide seat comprises a Z slide rail and a Z slide block, the Z slide rail is fixedly installed on the connecting frame, the Z slide rail is respectively installed with an upper Z slide block and a lower Z slide block, the upper Z slide block is installed with an upper connecting plate connected with the alignment camera, the lower Z slide block is installed with a lower connecting plate connected with the lighting structure, the Z driving device comprises a Z driving handle respectively installed on the upper Z slide block and the lower Z slide block, and the upper Z slide block and the lower Z slide block are driven to reciprocatingly slide on the Z slide rail through the Z driving handle driving transmission mechanism.

[0006] As a preferred scheme, the upper connecting plate and the lower connecting plate are further provided with auxiliary slide seats which slide relative to each other.

[0007] As a preferred scheme, the vertical adjusting device comprises an X manual angle position table of X direction deflection and a Y manual angle position table of Y direction deflection which are stacked and installed on the Y slide seat.

[0008] As a preferred scheme, the Y slide seat comprises a Y slide rail and a Y slide block, the Y slide rail is slidably installed with a plurality of Y slide blocks, the Y slide blocks are respectively installed with corresponding X manual angle position tables and Y manual angle position tables, the connecting frame is fixedly installed on the X manual angle position table or the Y manual angle position table, and the Y driving device is the same as the Z driving device.

[0009] As a preferred scheme, the X slide seat comprises an X lead screw which is rotatably installed on the adjusting bottom plate and extends along the X direction, the X lead screw is slidably installed with an X slide block, the X lead screw and the X slide block form a lead screw nut structure, the X driving device is an X driving handle which manually drives the X lead screw to rotate, the X slide block is fixedly installed with an X support plate, and the Y slide rail is fixedly installed on the X support plate.

[0010] As a preferred scheme, the adjusting bottom plate is further provided with an X guide column which slidably guides the X slide block.

[0011] As a preferred scheme, the Y slide block, the upper Z slide block and the lower Z slide block are respectively provided with proximity switches.

[0012] The utility model discloses an effect is: because the exposure machine's adjusting device of camera, including the photoetching frame, its characterized in that: the photoetching frame fixed mounting has the adjusting base plate, the adjusting base plate is slidably installed with X slide base on the X direction, X slide base is driven to slide through X drive arrangement, Y slide base is slidably installed with Y slide base on X slide base along Y direction, Y slide base is installed with the connecting frame, Y slide base is driven to slide through Y drive arrangement, the connecting frame is equipped with Z slide base along Z direction and is slidably installed, Z slide base is driven to slide through Z drive arrangement, Z slide base is installed with the camera of following Z slide base sliding and the lighting structure, Y slide base is equipped with the vertical adjusting device of adjusting camera and lighting structure vertical downward, first through X drive arrangement, the position of X slide base in X direction is adjusted, then Y drive arrangement drives the position of Y slide base in Y direction is adjusted, then again through Z drive arrangement, the position of Z slide block in Z direction is adjusted, make camera and lighting structure can move to accurate shooting position, again through the vertical adjusting device, the shooting angle of camera and lighting structure is adjusted, ensure perpendicular to wafer shooting, the adjusting device can change the position of camera, expand the shooting range, make camera vertical shooting accurate, improve the accuracy of use.

[0013] And because the Z slide base includes Z slide rail and Z slide block, the Z slide rail is fixedly installed on the connecting frame, the upper Z slide block and the lower Z slide block are respectively installed on the Z slide rail, the upper connecting plate connecting the camera is installed on the upper Z slide block, the lower connecting plate connecting the lighting structure is installed on the lower Z slide block, the Z drive arrangement includes Z drive handles respectively installed on the upper Z slide block and the lower Z slide block, the upper Z slide block and the lower Z slide block drive the transmission mechanism to reciprocate on the Z slide rail through the Z drive handles, driving the upper Z slide block and the lower Z slide block respectively can drive the camera and the lighting structure to adjust, adapt to different shooting and lighting range.

[0014] And because the upper connecting plate and the lower connecting plate are further provided with auxiliary slide blocks that slide relative to each other, the upper Z slide block and the lower Z slide block can constrain each other and not affect the sliding when they slide respectively, improving the accuracy of sliding.

[0015] And because the vertical adjusting device includes an X manual angle positioner for X direction deviation and a Y manual angle positioner for Y direction deviation stacked on the Y slide base, it is convenient to adjust the shooting angle of the camera and the lighting structure installed on the upper connecting plate and the lower connecting plate, ensuring that the shooting is perpendicular to the wafer turntable and accurate and reliable.

[0016] And since the Y slide comprises a Y slide rail and a Y slider, a plurality of Y sliders are slidingly installed on the Y slide rail, the Y sliders are each installed with a corresponding X manual angle position table and Y manual angle position table, the connecting frame is fixedly installed on the X manual angle position table or Y manual angle position table, and the Y driving device is the same as the Z driving device; the plurality of Y sliders are each installed with a corresponding alignment camera and illumination mechanism, so that the shooting range can be expanded and the use effect can be improved.

[0017] And since the X slide comprises an X lead screw extending along the X direction and rotatingly installed on the adjusting bottom plate, the X slider is slidingly installed on the X lead screw, the X lead screw and the X slider form a lead screw nut structure, the X driving device is an X driving handle manually driving the X lead screw to rotate, the X slider is fixedly installed with an X support plate, and the Y slide rail is fixedly installed on the X support plate; the adjusting X slider is simple and reliable in sliding, and the practicality is improved.

[0018] And since the adjusting bottom plate is further provided with an X guide column assisting the X slider to slide, the X slider can stably slide along the X direction.

[0019] And since the Y slider, the upper Z slider and the lower Z slider are each provided with a proximity switch, the movement range is limited, the sliders can accurately move, and the use between the sliders is not affected. BRIEF DESCRIPTION OF DRAWINGS

[0020] The utility model will be further explained in connection with the drawings and examples.

[0021] Figure 1 It is the utility model embodiment perspective drawing;

[0022] Figure 2 It is the utility model embodiment structure schematic view;

[0023] Figure 3 It is the utility model embodiment X slide and Y slide structure schematic view;

[0024] Figure 4 It is the utility model embodiment Z slide structure schematic view;

[0025] Figure 5 It is the utility model embodiment Z slide lateral view;

[0026] In the accompanying drawings: 1. Photolithography frame; 2. Adjustment base plate; 3. Alignment camera; 4. Illumination structure; 5. Z slide rail; 6. Connecting frame; 7. Upper Z slider; 8. Lower Z slider; 9. Upper connecting plate; 10. Lower connecting plate; 11. Z drive handle; 12. Auxiliary guide rail; 13. Auxiliary slider; 14. X manual angle stage; 15. Y manual angle stage; 16. Y slide rail; 17. Y slider; 18. Y drive handle; 19. X lead screw; 20. X slider; 21. X drive handle; 22. X support plate; 23. X guide column; 24. Proximity switch. DETAILED DESCRIPTION

[0027] The present invention will be described in further detail below through specific embodiments.

[0028] like Figures 1 to 5 As shown, an adjustment device for an alignment camera of an exposure machine includes a photolithography frame 1, on which an adjustment base plate 2 is fixedly mounted, an X slide is mounted on the adjustment base plate 2 for sliding along the X direction, the X slide is driven to slide by an X drive device, a Y slide is mounted on the X slide for sliding along the Y direction, a connecting frame 7 is mounted on the Y slide, the Y slide is driven to slide by the Y drive device, a Z slide is mounted on the connecting frame 7 for sliding along the Z direction, the Z slide is driven to slide by the Z drive device, an alignment camera 3 and an illumination structure 4 that slide following the Z slide are mounted on the Z slide, and a vertical adjustment device for adjusting the alignment camera 3 and the illumination structure 4 to be vertically downward is provided on the Y slide.

[0029] In this embodiment, the photolithography frame 1 can slide so that the exposure head can move to perform accurate exposure, and at the same time the alignment camera 3 can also move, thereby photographing and positioning the wafer turntable.

[0030] like Figure 4 As shown, the Z slide includes a Z slide rail 5 and a Z slider. The Z slide rail 5 is fixedly mounted on the connecting frame 7. An upper Z slider and a lower Z slider 8 are respectively mounted on the Z slide rail 5. The upper Z slider is mounted with an upper connecting plate 9 connected to the alignment camera 3, and the lower Z slider 8 is mounted with a lower connecting plate 10 connected to the lighting structure 4. The Z drive device includes a Z drive handle 11 respectively mounted on the upper Z slider and the lower Z slider 8. The upper Z slider and the lower Z slider 8 drive the transmission mechanism to slide back and forth on the Z slide rail 5 through the Z drive handle 11; the transmission mechanism is a helical gear transmission mechanism, so that by twisting the Z drive handle 11, the corresponding upper Z slider and lower Z slider 8 can slide separately, and different distances can be formed between the alignment camera 3 and the lighting structure 4, thereby improving the use effect and adapting to different shooting and lighting ranges.

[0031] Further, the upper connecting plate 9 and the lower connecting plate 10 are also provided with auxiliary sliding seats which slide relative to each other; the auxiliary sliding seat comprises an auxiliary guide rail 12 and an auxiliary sliding block 13, the auxiliary guide rail 12 is fixedly installed on the upper connecting plate 9, and the auxiliary sliding block 13 is fixedly installed on the lower connecting plate 10; since the alignment camera 3 and the lighting structure 4 can move relative to each other, the upper Z sliding block and the lower Z sliding block 8 can constrain each other and do not affect the sliding when sliding, thereby improving the accuracy of the sliding and being more stable.

[0032] As shown in Figure 3 , the vertical adjusting device comprises an X-direction deviation X manual angle positioner 14 and a Y-direction deviation Y manual angle positioner 15 which are stacked and installed on the Y sliding seat; since the alignment camera 3 and the lighting structure 4 are connected to the X manual angle positioner 14 through the connecting frame 7, the swing of the alignment camera 3 and the lighting structure 4 can be controlled as a whole, thereby ensuring that the wafer turntable is perpendicular to the camera and the alignment is accurate and reliable; the manual angle positioner is a structure existing in the market, and thus is not described in detail herein.

[0033] In the embodiment, the Y sliding seat comprises a Y sliding rail 16 and a plurality of Y sliding blocks 17, the Y sliding rail 16 is slidably installed with the plurality of Y sliding blocks 17, the Y sliding block 17 is installed with a corresponding X manual angle positioner 14 and a Y manual angle positioner 15, the connecting frame 7 is fixedly installed on the X manual angle positioner 14 or the Y manual angle positioner 15, and the Y driving device is the same as the Z driving device; two Y sliding blocks 17 are arranged on the Y sliding rail 16, so that there are two pairs of alignment camera 3 and lighting structure 4, the shooting range is expanded, the use effect is improved, and the Y sliding block 17 is also provided with a Y driving handle 18, and the Y sliding block 17 is effectively slid through the bevel gear transmission mechanism.

[0034] Further, the X sliding seat comprises an X lead screw 19 which is rotatably installed on the adjusting bottom plate 2 and extends along the X direction, the X lead screw 19 is slidably installed with an X sliding block 20, the X lead screw 19 and the X sliding block 20 form a lead screw nut structure, the X driving device is an X driving handle 21 which manually drives the X lead screw 19 to rotate, the X sliding block 20 is fixedly installed with an X supporting plate 22, and the Y sliding rail 16 is fixedly installed on the X supporting plate 22; the rotation of the driving handle drives the lead screw to rotate, so that the X sliding block 20 slides, the structure is simple, and the use cost is low; the supporting range is expanded through the X supporting plate 22, and the stability of the support is improved.

[0035] In the embodiment, the adjusting bottom plate 2 is also provided with an X guide column 22 which helps the X sliding block 20 to slide stably in the sliding process of the X sliding block 20, so that the X supporting plate 22 is stably supported.

[0036] As shown in Figure 3 , Figure 4 , and Figure 5As shown, the Y slider 17, the upper Z slider and the lower Z slider 8 are all provided with proximity switches 24. Since the Y slider 17 is provided with two, in order to prevent contact during use, the movement range of the Y slider 17 is effectively limited by the limit switches, and the cooperation between the alignment camera 3 and the shooting is ensured, at the same time, the upper Z slider and the lower Z slider 8 avoid the movement range of the alignment camera 3 and the lighting structure 4 during their respective movements, and contact during use is avoided.

[0037] The working principle of the embodiment is as follows: first, the X slider 20 is moved along the X lead screw 19 by rotating the X drive handle 21, so that the X support plate 22 can move the Y slide rail 16 in the X direction, thereby adjusting the position of the alignment camera 3 and the lighting structure 4 in the X direction; then the Y slider 17 is slid in the Y direction by rotating the Y drive handle, thereby adjusting the position of the alignment camera 3 and the lighting structure 4 in the Y direction; then the upper Z slider and the lower Z slider 8 are slid in the Z direction by rotating the Z drive handle 11, thereby adjusting the distance between the alignment camera 3 and the lighting structure 4 and the wafer turntable; at the same time, the X manual angle stage 14 and the Y manual angle stage 15 control the shooting and lighting angle of the alignment camera 3 and the lighting structure 4, and the shooting alignment is completed.

[0038] The above-described embodiment is only a description of the preferred embodiment of the present application, and is not intended to limit the scope of the present application. Any deformation and modification of the technical solution of the present application without departing from the design spirit of the present application shall fall within the protection scope determined by the claims of the present application.

Claims

1. An exposure machine alignment camera adjustment device comprising a lithography frame, characterized by: The photoetching frame is fixedly installed with an adjusting base plate, an X slide base is slidably installed on the adjusting base plate along the X direction, the X slide base is driven to slide by an X driving device, a Y slide base is slidably installed on the X slide base along the Y direction, the Y slide base is driven to slide by a Y driving device, a connecting frame is installed on the Y slide base, a Z slide base is slidably installed on the connecting frame along the Z direction, the Z slide base is driven to slide by a Z driving device, an alignment camera and an illumination structure are installed on the Z slide base and slide with the Z slide base, and a vertical adjusting device is arranged on the Y slide base and used for adjusting the alignment camera and the illumination structure to be vertically downward.

2. An exposure apparatus alignment camera adjustment device as set forth in claim 1, characterized by: The Z slide base comprises a Z slide rail and Z slide blocks, the Z slide rail is fixedly installed on the connecting frame, the Z slide rail is respectively installed with an upper Z slide block and a lower Z slide block, an upper connecting plate connected with the alignment camera is installed on the upper Z slide block, a lower connecting plate connected with the illumination structure is installed on the lower Z slide block, and the Z driving device comprises Z driving handles respectively installed on the upper Z slide block and the lower Z slide block.

3. An exposure apparatus alignment camera adjustment device as set forth in claim 2, characterized by: The upper connecting plate and the lower connecting plate are further provided with auxiliary slide bases which slide with each other.

4. An exposure apparatus alignment camera adjustment device as set forth in claim 3, characterized by: The vertical adjusting device comprises an X manual angle position table which is installed on the Y slide base and used for adjusting the X direction deviation and a Y manual angle position table which is installed on the Y slide base and used for adjusting the Y direction deviation.

5. An exposure apparatus alignment camera adjustment device as set forth in claim 4, characterized by: The Y slide base comprises a Y slide rail and Y slide blocks, a plurality of Y slide blocks are slidably installed on the Y slide rail, the Y slide blocks are respectively installed with corresponding X manual angle position tables and Y manual angle position tables, the connecting frame is fixedly installed on the X manual angle position table or the Y manual angle position table, and the Y driving device is the same as the Z driving device.

6. An exposure apparatus alignment camera adjustment device as set forth in claim 5, characterized by: The X slide base comprises an X lead screw which is rotatably installed on the adjusting base plate and extends along the X direction, an X slide block is slidably installed on the X lead screw, the X lead screw and the X slide block form a screw nut structure, the X driving device is an X driving handle which is used for manually driving the X lead screw to rotate, an X supporting plate is fixedly installed on the X slide block, and the Y slide rail is fixedly installed on the X supporting plate.

7. An exposure apparatus alignment camera adjustment device as set forth in claim 6, characterized by: The adjusting base plate is further provided with an X guide column which is used for guiding the X slide block to slide.

8. An exposure apparatus alignment camera adjustment device as set forth in claim 7, characterized by: The Y slide block, the upper Z slide block and the lower Z slide block are respectively provided with proximity switches.

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