Device for detecting components of high-pressure gas

Abstract

The utility model provides a device for detecting components of high-pressure gas. The device comprises a test interface, a mass flow controller, a stop valve, a split-flow sample injection pipe, a differential sample injection pipe valve, a gas analysis device and a vacuum pump, an inlet of the mass flow controller is connected with the test interface, and an outlet of the mass flow controller is connected with an inlet of the stop valve; a split-flow sample injection pipe is communicated between an outlet of the mass flow controller and an inlet of the stop valve, an outlet of the stop valve is connected with an inlet of the gas analysis device, and the vacuum pump is connected with the gas analysis device; the split-flow sample injection pipe and the differential sample injection pipe are sequentially arranged between the test interface and the gas analysis device, and due to the miniaturized multi-channel differential design, flow limiting by a pipeline is not needed, and the flow limiting efficiency is greatly improved. The response speed is second-level, no additional vacuum pump is needed, the cost is controllable, no complex logic judgment is needed, and the reliability is high.

Description

Technical Field

[0001] This utility model relates to the field of analytical instrument technology, and more specifically, to a device for detecting the composition of high-pressure gases. Background Technology

[0002] There are many types of devices for detecting high-pressure gas components, including gas analysis devices such as spectrophotometry, mass spectrometry, and chromatography. Because the substances to be monitored contain nonpolar molecules, infrared spectroscopy cannot detect them. Chromatography analysis time is on the order of minutes, which cannot meet the needs of real-time online monitoring. Mass spectrometers require a certain vacuum level during operation. Conventional designs introduce the sample through a stainless steel or quartz capillary tube, typically longer than 1 meter, which also acts as a flow limiter to maintain the vacuum for mass spectrometry operation. Under this design, the gas exchange time within the capillary is usually greater than half an hour, making real-time monitoring impossible. Another conventional design uses a flow-limiting orifice to maintain the operating conditions of the mass spectrometer. This design can achieve real-time monitoring, but when the vacuum in the test chamber is higher than 10 Torr, the orifice diameter is <20 μm, making machining difficult and precision control impossible, resulting in high cost and poor stability. To solve this problem, some existing equipment also uses a flow-limiting capillary tube. When semiconductor process exhaust gas treatment equipment is operating normally, its processing efficiency for different substances is relatively stable. By monitoring the inlet and outlet concentrations of substances in the semiconductor process exhaust gas treatment equipment in real time, it is possible to effectively reflect whether the equipment and the manufacturing process are operating normally. Therefore, the monitoring equipment needs to achieve a response time of seconds.

[0003] Patent document CN115060782A discloses a residual gas analysis device for semiconductor industry exhaust gases. It includes a pressure stabilizing tank connected to a first and second vacuum gauge, and a pressure gauge. The first and second vacuum gauges measure the vacuum level within the pressure stabilizing tank. One end of the pressure stabilizing tank is connected to the output of a manual valve via a first flow meter and a first solenoid valve in parallel. The input of the manual valve is connected to the outlet of an exhaust gas collection device in the semiconductor production line. The other end of the pressure stabilizing tank is connected to a measuring chamber via multiple parallel channels. A third vacuum gauge and a mass spectrometer are connected to the measuring chamber. The third vacuum gauge detects the vacuum level in the measuring chamber. The measuring chamber is also connected to a molecular pump via a fourth solenoid valve, and the molecular pump is connected to a backing pump. This device enables quantitative detection of residual gases in semiconductor industry exhaust gases over a wide pressure range. However, this patent utilizes a solenoid valve for flow control, requiring multiple logical checks to ensure the application of residual gas analysis, making the process overly complex. Utility Model Content

[0004] In view of the deficiencies in the existing technology, the purpose of this utility model is to provide a device for detecting the composition of high-pressure gases.

[0005] The device for detecting high-pressure gas components according to this utility model includes a test interface, a mass flow controller, a shut-off valve, a split injection tube, a differential injection tube valve, a gas analysis device, and a vacuum pump.

[0006] The inlet of the mass flow controller is connected to an external testing system through the test interface, and the outlet of the mass flow controller is connected to the inlet of the shut-off valve.

[0007] A shunt injection tube is connected between the outlet of the mass flow controller and the inlet of the shut-off valve. The shunt injection tube is used to discharge gas that has not passed through the shut-off valve to the outside of the system. The outlet of the shut-off valve is connected to the inlet of the gas analysis device. The vacuum pump is connected to the gas analysis device. A flow limiting device is installed at the inlet of the gas analysis device.

[0008] The vacuum pump is connected to one end of a differential injection tube, and the other end of the differential injection tube is connected to the outlet of a shut-off valve and the inlet of a gas analysis device. A differential injection tube valve is installed on the differential injection tube.

[0009] Preferably, the vacuum pump includes a molecular pump and a backing pump;

[0010] The forepump is located downstream of the molecular pump and is used for vacuuming. The molecular pump is connected to the gas analysis device and the differential injection valve.

[0011] Preferably, the test interface includes a KF interface, a CF interface, a VCR interface, or a card sleeve interface.

[0012] Preferably, the pressure at the shunt inlet tube is lower than the pressure at the test interface.

[0013] Preferably, the shut-off valve is a pneumatic valve, an electric valve, or a manual valve, and the shut-off valve is used to control whether the gas to be tested is introduced into the gas analysis device.

[0014] Preferably, the differential injection valve is a pneumatic valve, an electric valve, or a manual valve, and the differential injection valve is used to control the on / off state of the differential injection tube.

[0015] Preferably, the vacuum pump is provided with a differential interface, and one end of the differential injection tube is connected through the differential interface.

[0016] Preferably, the test interface includes a first test interface and a third test interface, and the mass flow controller includes a first mass flow controller and a third mass flow controller;

[0017] The inlet of the first mass flow controller is connected to the outlet of the external exhaust gas treatment device through the first test interface, and the inlet of the third mass flow controller is connected to the inlet of the external exhaust gas treatment device through the third test interface.

[0018] Preferably, it also includes a second test interface, a second mass flow controller, a first gas path control valve, and a second gas path control valve, wherein the inlet of the second mass flow controller is connected to an external nitrogen source through the second test interface;

[0019] The second test interface and the second mass flow controller have a second air inlet pipe, the first test interface and the first mass flow controller have a first air inlet pipe, and the third test interface and the third mass flow controller have a third air inlet pipe;

[0020] The first air path control valve is used to connect the second air intake pipe and the first air intake pipe, and the second air path control valve is used to connect the second air intake pipe and the third air intake pipe.

[0021] Compared with the prior art, the present invention has the following beneficial effects:

[0022] This utility model has a simple structure and is easy to operate. It adopts the technical means of setting a split injection tube and a differential injection tube in sequence between the test interface and the gas analysis device. Through miniaturized multi-channel differential design, the gas to be tested is limited step by step. There is no need to use pipelines for flow limiting. The response speed is in the second range. There is no need to add a vacuum pump. The cost is controllable. There is no need for complex logic judgment. It has high reliability. Attached Figure Description

[0023] Other features, objects, and advantages of this invention will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings:

[0024] Figure 1 This is a schematic diagram of the overall structure of Example 1;

[0025] Figure 2 This is a schematic diagram of the overall structure of Example 2;

[0026] Figure 3 This is a schematic diagram of the measured results of gas outlet monitoring in Example 2.

[0027] The diagram shows:

[0028] 13 Flow inlet tube 22 First mass flow controller

[0029] Shut-off valve 14 Second test interface 23

[0030] Differential injection valve 15 Second mass flow controller 24

[0031] Gas Analysis Device 16 Third Test Interface 25

[0032] Molecular pump 17 Third mass flow controller 26

[0033] Fore-pump 18 First air path control valve 27

[0034] First test interface 21 Second air circuit control valve 28 Detailed Implementation

[0035] The present invention will now be described in detail with reference to specific embodiments. These embodiments will help those skilled in the art to further understand the present invention, but do not limit the present invention in any way. It should be noted that those skilled in the art can make several changes and improvements without departing from the concept of the present invention. These all fall within the protection scope of the present invention.

[0036] This utility model discloses a device for detecting high-pressure gas components. By sequentially setting a split injection tube and a differential injection tube between the test interface and the gas analysis device, a miniaturized multi-channel differential design is achieved. It eliminates the need for pipeline flow restriction, achieves a response speed in seconds, eliminates the need for an additional vacuum pump, keeps costs under control, eliminates the need for complex logic judgments, and ensures high reliability.

[0037] The device for high-pressure gas component detection according to this utility model includes a test interface, a mass flow controller, a shut-off valve 14, a split injection tube 13, a differential injection valve 15, a gas analysis device 16, and a vacuum pump. The inlet of the mass flow controller is connected to an external test system through the test interface, and the outlet of the mass flow controller is connected to the inlet of the shut-off valve 14. A split injection tube 13 is connected between the outlet of the mass flow controller and the inlet of the shut-off valve 14. The outlet of the shut-off valve 14 is connected to the inlet of the gas analysis device 16, and the vacuum pump is connected to the gas analysis device 16. One end of the vacuum pump is connected to the differential injection tube, and the other end of the differential injection tube is connected to the outlet of the shut-off valve 14 and the inlet of the gas analysis device 16. A differential injection valve 15 is provided on the differential injection tube.

[0038] Preferably, the test interface is of the KF16, KF25, KF40, CF35, 1 / 4” VCR, or 1 / 4” ferrule type. The purpose of the mass flow controller is to initially limit the gas injection volume, determine the system injection volume, and ensure the accuracy of quantification. The mass flow controller is set to 4 L / min. The pressure at the split injection tube 13 is lower than the pressure at the test interface. The shut-off valve 14 is a pneumatic valve, electric valve, or manual valve, which controls whether the gas to be tested is introduced into the gas analysis device. The flow rate of the shut-off valve 14 is 1-2 sccm. The differential injection tube valve 15 is a pneumatic valve, electric valve, or manual valve, which controls the opening and closing of the differential injection tube. The gas analysis device 16 is a mass spectrometer. The inlet of the gas analysis device 16 has a flow limiting device with a flow rate <1 sccm. The forepump 18 is a rotary pump or diaphragm pump with a pumping speed of 15-50 L / min. The pumping speed of the molecular pump 17 is 70-90 L / s. The molecular pump 17 has a differential interface, specifically a G1 / 8 internal thread interface on the housing of the molecular pump 17. The mass flow controller, shut-off valve 14, and differential injection valve 15 are corrosion-resistant. The bearings of the molecular pump 17 are purged with clean nitrogen. The differential injection tube is made of 316L stainless steel or polytetrafluoroethylene.

[0039] Example 1

[0040] This embodiment is a preferred embodiment of the above embodiments, such as... Figure 1 The diagram shows a structural schematic of a device for detecting high-pressure gas components according to this embodiment. It includes a first test interface 21, a first mass flow controller 22, a shut-off valve 14, a split injection tube 13, a differential injection valve 15, a gas analysis device 16, a molecular pump 17, and a backing pump 18. The first test interface 21 is connected to the system under test. The gas to be tested passes through the first mass flow controller 22 and enters the split injection area according to a set flow rate. The first mass flow controller 22 is set to 4 L / min. The shut-off valve 14 controls whether the gas to be tested enters the subsequent detection equipment. When the shut-off valve 14 is closed, the gas to be tested is discharged through the split injection tube 13. When the shut-off valve 14 is open, a small amount of the gas to be tested passes through the shut-off valve 14, and most of the gas is discharged through the split injection tube 13. The gas flow rate through the shut-off valve 14 is related to the pumping speed of the molecular pump 17 and the size of the flow limiting device before the gas analysis device 16, and is generally 1-2 sccm.

[0041] When the equipment is running, the forepump 18 starts operating. Once the vacuum level of the gas analyzer 16 is less than or equal to 200 Pa, the molecular pump 17 automatically starts. The molecular pump housing has a G1 / 8 threaded interface, which connects to the differential injection valve 15 via a 1 / 8-inch 316L stainless steel capillary. The differential injection valve 15 is connected to the outlet of the shut-off valve 14 and the inlet of the gas analyzer 16 via a 1 / 8-inch 316L stainless steel capillary, forming a T-channel gas path. A flow restrictor is installed at the inlet of the gas analyzer 16, limiting the gas flow rate to <1 sccm. Part of the gas to be tested flowing from the shut-off valve 14 passes through the flow restrictor and enters the gas analyzer 16 for monitoring; the remaining portion is directly drawn off by the molecular pump 17 through the differential injection valve 15. The differential function of the molecular pump 17 differs from that of conventional differential pumps, which have two sets of turbine blades. The molecular pump used in this invention has only one set of turbine blades, resulting in a smaller size and simpler structure. If the target gas being tested is corrosive, the downstream of the split injection tube 13 and the forepump 18 needs to be connected to a specific exhaust gas emission area for treatment or dilution before discharge. The molecular pump 17 requires nitrogen purging of its bearings. The first test interface 21 is made of 316L stainless steel. The split injection tube 13 is made of 316L stainless steel or corrosion-resistant PTFE; the first mass flow controller 22, the shut-off valve 14, and the differential injection valve 15 have corrosion-resistant valve bodies.

[0042] Example 2

[0043] This embodiment is a preferred embodiment of the above embodiments, such as... Figure 2The diagram illustrates the application of a high-pressure gas composition detection device, as described in this embodiment, in a semiconductor exhaust gas treatment device. The exhaust gas treatment device has its inlet connected to a third test interface 25, its outlet connected to a first test interface 21, and a nitrogen source connected to a second test interface 23. A first gas path control valve 27 controls the cleaning of the pipeline containing the first test interface 21 with nitrogen. A second gas path control valve 28 controls the cleaning of the pipeline containing the third test interface 25 with nitrogen. By setting the parameters of the second mass flow controller 24 and the third mass flow controller 26, the gas concentration at the exhaust gas treatment device inlet can be diluted. When testing the gas composition at the exhaust gas treatment device inlet, the second mass flow controller 24 and the third mass flow controller 26 are simultaneously activated and diluted according to a certain ratio. The flow rate setting of the second mass flow controller 24 is 100 to 1000 times that of the third mass flow controller 26. The sum of the flow rate setting values ​​of the second mass flow controller 24 and the third mass flow controller 26 is 4 L / min. After the gas component test at the inlet of the exhaust gas treatment device is completed, the second mass flow controller 24 is closed, and the gas path control valve 28 is opened for nitrogen purging. After purging, the second gas path control valve 28 and the third mass flow controller 26 are closed. When testing the gas component at the outlet of the exhaust gas treatment device, the first gas path control valve 27 and the second gas path control valve 28 are closed, and the second mass flow controller 24 and the third mass flow controller 26 are closed. The operating steps are the same as in Example 1. After the test is completed, the first gas path control valve 27 is opened for nitrogen purging. After purging, the first gas path control valve 27 and the first mass flow controller 22 are closed.

[0044] like Figure 3 The figure shows the measured results of the device in this embodiment for monitoring the gas outlet of a semiconductor exhaust gas treatment equipment. The monitored substance is SF6. The m / z31 is monitored in real time using a single-ion monitoring mode. The response speed of the device is tested by adjusting the inlet gas flow rate and concentration of the exhaust gas treatment system. The software proposed in this invention for monitoring semiconductor process exhaust gas treatment equipment can display up to 100 items simultaneously. Figure 3 The example demonstrates simultaneous real-time online monitoring of multiple substances. Based on the concentration tests of the inlet and outlet gases, the software automatically calculates the processing efficiency. By setting thresholds for normal processing efficiency and inlet gas concentration, exceeding these thresholds indicates an abnormality or malfunction in the exhaust gas treatment device. Similarly, exceeding the inlet gas concentration threshold indicates an abnormality or malfunction in upstream process equipment or the process itself.

[0045] In the description of this application, it should be understood that the terms "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application.

[0046] The above describes specific embodiments of the present invention. It should be understood that the present invention is not limited to the specific embodiments described above, and those skilled in the art may make various changes or modifications within the scope of the claims, which do not affect the essence of the present invention. The embodiments of this application and the features in the embodiments may be combined with each other in any manner unless there is a conflict.

Claims

1. A device for detecting the composition of high-pressure gases, characterized in that, It includes a test interface, a mass flow controller, a shut-off valve (14), a split injection tube (13), a differential injection tube valve (15), a gas analysis device (16), and a vacuum pump; The inlet of the mass flow controller is connected to an external testing system through the test interface, and the outlet of the mass flow controller is connected to the inlet of the shut-off valve (14). A shunt injection tube (13) is connected between the outlet of the mass flow controller and the inlet of the shut-off valve (14). The shunt injection tube (13) is used to discharge the gas that has not passed through the shut-off valve (14) to the outside of the system. The outlet of the shut-off valve (14) is connected to the inlet of the gas analysis device (16). The vacuum pump is connected to the gas analysis device (16). A flow limiting device is provided at the inlet of the gas analysis device (16). The vacuum pump is connected to one end of the differential injection tube, and the other end of the differential injection tube is connected to the outlet of the shut-off valve (14) and the inlet of the gas analysis device (16). A differential injection tube valve (15) is provided on the differential injection tube.

2. The apparatus for detecting high-pressure gas components according to claim 1, characterized in that, The vacuum pump includes a molecular pump (17) and a backing pump (18); The forepump (18) is located downstream of the molecular pump (17) and is used for vacuuming. The molecular pump (17) is connected to the gas analyzer (16) and the differential injection valve (15).

3. The apparatus for detecting high-pressure gas components according to claim 1, characterized in that, The test interface includes a KF interface, a CF interface, a VCR interface, or a card sleeve interface.

4. The apparatus for detecting high-pressure gas components according to claim 1, characterized in that, The pressure at the shunt injection tube (13) is lower than the pressure at the test interface.

5. The apparatus for detecting high-pressure gas components according to claim 1, characterized in that, The shut-off valve (14) is a pneumatic valve, an electric valve, or a manual valve. The shut-off valve (14) is used to control whether the gas to be tested is introduced into the gas analysis device (16).

6. The apparatus for detecting high-pressure gas components according to claim 1, characterized in that, The differential injection tube valve (15) is a pneumatic valve, an electric valve, or a manual valve, and the differential injection tube valve (15) is used to control the opening and closing of the differential injection tube.

7. The apparatus for detecting high-pressure gas components according to claim 1, characterized in that, The vacuum pump is provided with a differential interface, and one end of the differential injection tube is connected through the differential interface.

8. The apparatus for detecting high-pressure gas components according to claim 1, characterized in that, The test interface includes a first test interface (21) and a third test interface (25), and the mass flow controller includes a first mass flow controller (22) and a third mass flow controller (26); The inlet of the first mass flow controller (22) is connected to the outlet of the external exhaust gas treatment device through the first test interface (21), and the inlet of the third mass flow controller (26) is connected to the inlet of the external exhaust gas treatment device through the third test interface (25).

9. The apparatus for detecting high-pressure gas components according to claim 8, characterized in that, It also includes a second test interface (23), a second mass flow controller (24), a first gas path control valve (27) and a second gas path control valve (28). The inlet of the second mass flow controller (24) is connected to an external nitrogen source through the second test interface (23). The second test interface (23) has a second air inlet pipe between it and the second mass flow controller (24), the first test interface (21) has a first air inlet pipe between it and the first mass flow controller (22), and the third test interface (25) has a third air inlet pipe between it and the third mass flow controller (26). The first air path control valve (27) is used to connect the second air intake pipe and the first air intake pipe, and the second air path control valve (28) is used to connect the second air intake pipe and the third air intake pipe.

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