Resistance-adjustable soluble microneedle massager

Abstract

The utility model relates to the technical field of microneedle application appliances, in particular to a resistance-adjustable soluble microneedle massager which comprises a handle, a massage roller and a soluble microneedle patch, the soluble microneedle patch is adhered to the peripheral wall of the massage roller, one end of the handle is provided with a first fork plate and a second fork plate which are arranged in parallel at an interval, and the first fork plate and the second fork plate are connected with the massage roller. A first rotating shaft and a second rotating shaft are arranged at the two ends of the massage roller along the central axis respectively, the first rotating shaft is rotationally assembled on the first fork plate, the second rotating shaft is rotationally assembled on the second fork plate, and a resistance adjusting part is movably arranged on the second fork plate and used for adjusting the rotating resistance between the second rotating shaft and the second fork plate. According to the resistance-adjustable soluble micro-needle massager, the rolling resistance of the massage roller can be adjusted according to needs, one product can be used in multiple scenes according to different users and different skin areas, and the resistance-adjustable soluble micro-needle massager is suitable for application and popularization.

Description

Technical Field

[0001] This application relates to the field of microneedle application device technology, and in particular to a soluble microneedle massager with adjustable resistance. Background Technology

[0002] Microneedle massage sticks utilize numerous tiny needles on a microneedle roller to stimulate the skin, allowing active ingredients to effectively penetrate the skin. When used with specialized products for wrinkle reduction, whitening, repair, stretch mark removal, and scar removal, they can achieve ideal results such as reducing wrinkles, treating scars and stretch marks, whitening the skin, reducing pigmentation, improving eye wrinkles and dark circles, and tightening and lifting facial skin tissue.

[0003] A search revealed that Chinese Patent Application No. 202120956489.5 discloses a soluble microneedle massage stick, which includes a handle, a massage roller, and a soluble microneedle patch. One end of the handle is provided with a fork, and the massage roller is rotatably mounted on the fork. The soluble microneedle patch includes a substrate and microneedles. The substrate is bonded to the outer peripheral wall of the massage roller, and the massage roller is detachably mounted on the fork mainly by snap-fit.

[0004] Regarding the aforementioned technologies, the inventors believe that the following technical defects exist and require improvement:

[0005] The different rolling resistance of massage rollers will bring different massage experiences and levels of comfort to users, especially for different users and different skin areas. However, the rolling resistance of massage rollers in common massagers is not adjustable, so the same massager cannot be used in multiple scenarios. Utility Model Content

[0006] This application provides a soluble microneedle massager with adjustable resistance to improve the following technical problems:

[0007] The different rolling resistance of massage rollers will bring different massage experiences and levels of comfort to users, especially for different users and different skin areas. However, the rolling resistance of massage rollers in common massagers is not adjustable, so the same massager cannot be used in multiple scenarios.

[0008] This application provides a soluble microneedle massager with adjustable resistance, employing the following technical solution:

[0009] An adjustable-resistance soluble microneedle massager includes a handle, a massage roller, and soluble microneedle patches. The soluble microneedle patches are adhered to the outer peripheral wall of the massage roller. One end of the handle is provided with a first fork plate and a second fork plate arranged in parallel at intervals. The two ends of the massage roller are respectively provided with a first rotating shaft and a second rotating shaft along the central axis. The first rotating shaft is rotatably mounted on the first fork plate, and the second rotating shaft is rotatably mounted on the second fork plate. Moreover, a resistance adjustment component is movably provided on the second fork plate to adjust the rotational resistance between the second rotating shaft and the second fork plate.

[0010] In one feasible technical solution of this application, the resistance adjusting component includes a damping rubber sleeve and an adjusting screw. A second shaft hole is provided on the second fork plate, the damping rubber sleeve is fixed in the second shaft hole, the second rotating shaft passes through the damping rubber sleeve, the adjusting screw is threadedly assembled to the top of the second fork plate, and the bottom of the adjusting screw abuts against the damping rubber sleeve.

[0011] In one feasible technical solution of this application, a force-applying ring is provided at the top of the adjusting screw, and the force-applying ring is used for finger insertion.

[0012] In one feasible technical solution of this application, the adjusting screw is made of stainless steel, and the thickness of the damping rubber sleeve is between 3 and 5 millimeters.

[0013] In one feasible technical solution of this application, a second sealing cover is provided on the outer side of the second fork plate, the second sealing cover is threaded into the second shaft hole, and the second sealing cover is flush with the outer side of the second fork plate.

[0014] In one feasible technical solution of this application, a first shaft hole is provided on the first fork plate, and a rolling bearing passes through the first rotating shaft. The rolling bearing is located between the inner wall of the first rotating shaft and the first shaft hole.

[0015] In one feasible technical solution of this application, a first sealing cover is provided on the outer side of the first fork plate, the first sealing cover is threaded into the first shaft hole, and the first sealing cover is flush with the outer side of the first fork plate.

[0016] In one feasible technical solution of this application, the massage roller includes an inner cylinder and a rubber sleeve, the rubber sleeve is sleeved and fixed on the inner cylinder, and the soluble microneedle patch is adhered to the outer peripheral wall of the rubber sleeve.

[0017] In one feasible technical solution of this application, the inner cylinder is provided with baffle rings at both ends, and the baffle rings are used to block the two sides of the soluble microneedle patch.

[0018] In one feasible technical solution of this application, the soluble microneedle patch includes an integrally formed substrate and a needle tip portion. The substrate is bent into a cylindrical shape, and a plurality of needle tips are arranged in an array on the outer wall of the substrate. The length direction of the needle tips is arranged along the inner diameter direction of the cylindrical substrate.

[0019] In summary, this application includes at least one of the following beneficial technical effects:

[0020] The first rotating shaft can rotate freely relative to the first fork plate, and the second rotating shaft can rotate freely relative to the second fork plate. The resistance adjustment component added to the second fork plate can adjust the rotational resistance between the second rotating shaft and the second fork plate. Thus, the rolling resistance of the massage roller can be adjusted as needed. For different user groups and different skin areas, one product can be used in multiple scenarios, making it suitable for widespread application. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 This is a schematic diagram of the structure of the adjustable resistance soluble microneedle massager according to an embodiment of this application.

[0023] Figure 2 yes Figure 1 Enlarged view of point A in the middle.

[0024] Figure 3 yes Figure 1 Enlarged view of point B in the middle.

[0025] Explanation of reference numerals in the attached figures:

[0026] 1. Handle; 11. First fork plate; 12. Second fork plate; 2. Massage roller; 21. Inner cylinder; 211. Spacer ring; 22. Rubber sleeve; 23. First rotating shaft; 24. Second rotating shaft; 3. Soluble microneedle patch; 31. Substrate; 32. Needle tip; 4. Resistance adjustment component; 41. Damping rubber sleeve; 42. Adjusting screw; 43. Force-applying ring; 5. Rolling bearing; 6. Second sealing cover; 7. First sealing cover. Detailed Implementation

[0027] To make the technical problems, technical solutions, and beneficial effects to be solved by this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and are not intended to limit the scope of this application.

[0028] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0029] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0030] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0031] The following is in conjunction with the appendix Figure 1-3 This application will be described in further detail.

[0032] This application discloses an adjustable-resistance soluble microneedle massager. (See also...) Figure 1-3 The adjustable resistance soluble microneedle massager includes a handle 1, a massage roller 2, and a soluble microneedle patch 3. The soluble microneedle patch 3 is adhered to the outer peripheral wall of the massage roller 2. One end of the handle 1 is provided with a first fork plate 11 and a second fork plate 12 arranged in parallel at intervals. The two ends of the massage roller 2 are respectively provided with a first rotating shaft 23 and a second rotating shaft 24 along the central axis. The first rotating shaft 23 is rotatably mounted on the first fork plate 11, and the second rotating shaft 24 is rotatably mounted on the second fork plate 12. Moreover, a resistance adjustment component 4 is movably provided on the second fork plate 12. The resistance adjustment component 4 is used to adjust the rotational resistance between the second rotating shaft 24 and the second fork plate 12.

[0033] In this embodiment, the resistance adjusting component 4 includes a damping rubber sleeve 41 and an adjusting screw 42. A second shaft hole is provided on the second fork plate 12, and the damping rubber sleeve 41 is fixed in the second shaft hole. The second rotating shaft 24 passes through the damping rubber sleeve 41. The adjusting screw 42 is threadedly fitted to the top of the second fork plate 12, and the bottom of the adjusting screw 42 abuts against the damping rubber sleeve 41. Specifically, a force-applying ring 43 is provided on the top of the adjusting screw 42 for finger insertion. In order to improve the service life of the adjusting screw 42 and the damping rubber sleeve 41, the adjusting screw 42 is made of stainless steel, and the thickness of the damping rubber sleeve 41 is between 3 and 5 mm.

[0034] The resistance adjustment component 4 designed above has a simple structure and low manufacturing and assembly costs, and can facilitate users to quickly adjust the rotational resistance between the second rotating shaft 24 and the second fork plate 12.

[0035] To prevent dust and other impurities from entering the second shaft hole, a second sealing cover 6 is provided on the outer side of the second fork plate 12. The second sealing cover 6 is threaded into the second shaft hole and is flush with the outer side of the second fork plate 12, thereby effectively ensuring the smoothness of the rotation of the second rotating shaft 24.

[0036] In this embodiment, a first shaft hole is provided on the first fork plate 11, and a rolling bearing 5 passes through the first rotating shaft 23. The rolling bearing 5 is located between the inner wall of the first rotating shaft 23 and the first shaft hole.

[0037] To prevent dust and other impurities from entering the first shaft hole, a first sealing cover 7 is provided on the outer side of the first fork plate 11. The first sealing cover 7 is threaded into the first shaft hole and is flush with the outer side of the first fork plate 11, thereby effectively ensuring the smoothness of the rotation of the first rotating shaft 23.

[0038] In this embodiment, the massage roller 2 includes an inner cylinder 21 and a rubber sleeve 22. The rubber sleeve 22 is fitted and fixed onto the inner cylinder 21, and the soluble microneedle patch 3 is adhered to the outer peripheral wall of the rubber sleeve 22. The rubber sleeve 22 has a certain degree of elasticity. When the massage roller 2 is rolled on the skin, the soluble microneedle patch 3 will fit the skin surface more closely and significantly improve the comfort of use.

[0039] To prevent the soluble microneedle patch 3 from becoming misaligned during application, the inner cylinder 21 is provided with baffle rings 211 at both ends. The baffle rings 211 are used to separate the two sides of the soluble microneedle patch 3, and the two baffle rings 211 provide good protection for the soluble microneedle patch 3 in the middle.

[0040] The soluble microneedle patch 3 includes an integrally formed substrate 31 and a needle tip portion 32. The substrate 31 is bent into a cylindrical shape, and multiple needle tips 32 are arranged in a row on the outer wall of the substrate 31. The length direction of the needle tips 32 is arranged along the inner diameter direction of the cylindrical substrate 31.

[0041] The soluble microneedle patch 3 designed above can be in the form of a flat sheet before being bonded to the massage roller 2, which makes it easy to manufacture and die-cut into a square shape of a preset size, thus reducing manufacturing and assembly costs to a certain extent.

[0042] The beneficial technical effects of the adjustable resistance soluble microneedle massager according to the embodiments of this application are roughly as follows:

[0043] The first rotating shaft 23 can rotate freely relative to the first fork plate 11, and the second rotating shaft 24 can rotate freely relative to the second fork plate 12. The resistance adjustment component 4 added to the second fork plate 12 can adjust the rotational resistance between the second rotating shaft 24 and the second fork plate 12. Thus, the rolling resistance of the massage roller 2 can be adjusted as needed. For different user groups and different skin areas, one product can be used in multiple scenarios, making it suitable for widespread application.

[0044] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A resistance-adjustable soluble microneedle massager, comprising a handle (1), a massage roller (2), and a soluble microneedle patch (3), wherein the soluble microneedle patch (3) is adhered to the outer peripheral wall of the massage roller (2), characterized in that, One end of the handle (1) is provided with a first fork plate (11) and a second fork plate (12) arranged in parallel at intervals. The two ends of the massage roller (2) are respectively provided with a first rotating shaft (23) and a second rotating shaft (24) along the central axis. The first rotating shaft (23) is rotatably mounted on the first fork plate (11), and the second rotating shaft (24) is rotatably mounted on the second fork plate (12). Moreover, a resistance adjusting member (4) is movably provided on the second fork plate (12). The resistance adjusting member (4) is used to adjust the rotational resistance between the second rotating shaft (24) and the second fork plate (12). The resistance adjusting component (4) includes a damping rubber sleeve (41) and an adjusting screw (42). The second fork plate (12) is provided with a second shaft hole. The damping rubber sleeve (41) is fixed in the second shaft hole. The second rotating shaft (24) passes through the damping rubber sleeve (41). The adjusting screw (42) is threadedly fitted to the top of the second fork plate (12). The bottom of the adjusting screw (42) abuts against the damping rubber sleeve (41).

2. The adjustable resistance soluble microneedle massager according to claim 1, characterized in that, The top of the adjusting screw (42) is provided with a force-applying ring (43), which is used for finger insertion.

3. The adjustable resistance soluble microneedle massager according to claim 2, characterized in that, The adjusting screw (42) is made of stainless steel, and the thickness of the damping rubber sleeve (41) is between 3 and 5 mm.

4. The adjustable resistance soluble microneedle massager according to claim 1, characterized in that, The outer side of the second fork plate (12) is provided with a second sealing cover (6), which is threaded into the second shaft hole and is flush with the outer side of the second fork plate (12).

5. The adjustable resistance soluble microneedle massager according to claim 1, characterized in that, The first fork plate (11) is provided with a first shaft hole, and a rolling bearing (5) passes through the first rotating shaft (23). The rolling bearing (5) is located between the inner wall of the first rotating shaft (23) and the first shaft hole.

6. The adjustable resistance soluble microneedle massager according to claim 5, characterized in that, The outer side of the first fork plate (11) is provided with a first sealing cover (7), which is threaded into the first shaft hole and is flush with the outer side of the first fork plate (11).

7. The adjustable resistance soluble microneedle massager according to claim 1, characterized in that, The massage roller (2) includes an inner cylinder (21) and a rubber sleeve (22). The rubber sleeve (22) is fitted and fixed on the inner cylinder (21), and the soluble microneedle patch (3) is bonded to the outer peripheral wall of the rubber sleeve (22).

8. The adjustable resistance soluble microneedle massager according to claim 7, characterized in that, The inner cylinder (21) is provided with baffle rings (211) at both ends, and the baffle rings (211) are used to block the two sides of the soluble microneedle patch (3).

9. The adjustable resistance soluble microneedle massager according to claim 1, characterized in that, The soluble microneedle patch (3) includes an integrally formed substrate (31) and a needle tip portion (32). The substrate (31) is bent into a cylindrical shape, and a plurality of needle tips (32) are arranged in a row on the outer wall of the substrate (31). The length direction of the needle tips (32) is arranged along the inner diameter direction of the cylindrical substrate (31).

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