Feeding mechanism of magnetron sputtering coating equipment

Abstract

The utility model discloses a feeding mechanism of magnetron sputtering coating equipment, which comprises a magnetron sputtering coating feeding mechanism and a feeding assembly, the feeding assembly comprises a first fixing plate and a second fixing plate, one side of the first fixing plate and one side of the second fixing plate are internally provided with moving grooves, and the moving grooves are communicated with the first fixing plate and the second fixing plate. A moving block is slidably connected into the moving groove, a movable shaft is rotatably connected into the moving block, a feeding base plate is clamped between an upper conveying wheel and a lower conveying wheel up and down, horizontal linear movement can be effectively and stably kept, deviation of the feeding base plate in the moving and conveying process is avoided, and the conveying efficiency is improved. When a feeding base plate conveys a target coating film into a vacuum chamber of a magnetron sputtering coating mechanism for conveying the feeding base plate front and back, a telescopic hydraulic cylinder is driven to drive a telescopic guide column to move up and down, a movable support is further driven to move, and an upper conveying wheel can be moved and extruded into a rail groove in the upper end of the feeding base plate; and the situation that a coating film is fed into a low-pressure vacuum cavity from a normal-pressure environment, impact on a feeding base plate is caused by sudden change of the air pressure difference, and the position of the feeding base plate is deviated can be avoided.

Description

Technical Field

[0001] This utility model relates to the field of packaging equipment technology, specifically to a feeding mechanism for a magnetron sputtering coating equipment. Background Technology

[0002] In modern industry and scientific research, magnetron sputtering coating equipment has become widely used in the semiconductor, optics, decorative and functional coating industries due to its ability to precisely control the thickness and composition of thin films, as well as its high efficiency and environmental friendliness.

[0003] Current magnetron sputtering coating equipment uses a feeding mechanism to place the coating substrate onto a feeding device, which then transports the substrate into a vacuum chamber. High-energy particles (usually ions) bombard the surface of the solid target. A vacuum chamber and gas control device maintain a low-pressure environment. The coating is then fixedly placed on the feeding substrate and transported into the vacuum chamber. When the substrate is transported in the vacuum chamber on rollers, the sudden change in pressure difference when the coating is moved from an atmospheric pressure environment into a low-pressure vacuum chamber can impact the feeding substrate, causing it to shift position. Utility Model Content

[0004] The purpose of this invention is to provide a feeding mechanism for a magnetron sputtering coating equipment to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a feeding mechanism for a magnetron sputtering coating equipment, comprising a magnetron sputtering coating feeding mechanism and a feeding assembly. The feeding assembly includes a first fixed plate and a second fixed plate. A movable groove is formed inside one side of the first fixed plate and the second fixed plate. A movable block is slidably connected inside the movable groove. A movable shaft is rotatably connected inside the movable block. An upper conveying wheel is installed at one end of the movable shaft. A movable bracket is fixedly installed at one end of the movable block. A fixed rod is connected and fixed at the upper end of the movable bracket by bolts. A connecting rod is connected and fixed at the upper end of the fixed rod by bolts. A telescopic guide post is installed at the lower end of the connecting rod. A telescopic hydraulic cylinder is fixedly installed at the lower end of the telescopic guide post.

[0006] As a further preferred embodiment of this technical solution, the telescopic hydraulic cylinder is bolted to one end of the support plate, and one end of the support plate is welded to one end of the first fixed plate. The first fixed plate and the second fixed plate are disposed inside the magnetron sputtering coating mechanism.

[0007] As a further preferred embodiment of this technical solution, the interior of the first fixed plate is rotatably connected with several rolling rollers, and a lower conveying wheel is fixedly installed on the outer side of the rolling rollers. The upper end of the lower conveying wheel contacts a track groove, which is opened at the lower end of the feeding plate.

[0008] As a further preferred embodiment of this technical solution, the upper end of the feeding substrate is provided with a track groove, the upper conveying wheel is in contact with the inside of the track groove, and the lower conveying wheel and the upper conveying wheel roll inside the track groove, thereby conveying the feeding substrate back and forth.

[0009] As a further preferred embodiment of this technical solution, a main gear is fixedly installed at one end of the rolling roller, a rotating shaft is installed at one end of the main gear, and a servo motor is fixedly installed at one end of the rotating shaft.

[0010] As a further preferred embodiment of this technical solution, the servo motor is bolted to one end of the second fixed plate, the plurality of rolling rollers are fixedly mounted with auxiliary gears, and the lower ends of the second fixed plate and the first fixed plate are fixedly mounted with support legs.

[0011] As a further preferred embodiment of this technical solution, a transmission toothed belt meshes with the outer side of the secondary gear, and the gear of the transmission toothed belt meshes with the outer side of the main gear.

[0012] This utility model provides a feeding mechanism for a magnetron sputtering coating equipment, which has the following advantages:

[0013] (1) By clamping the feeding substrate between the upper and lower conveying wheels, this utility model can effectively maintain stable horizontal linear movement and avoid deviation during the movement and transportation of the feeding substrate. When the feeding substrate transports the target material for coating in the vacuum chamber of the magnetron sputtering coating mechanism that transports the feeding substrate back and forth, the telescopic hydraulic cylinder drives the telescopic guide column to move up and down, which in turn drives the moving bracket to move. The moving bracket further drives the moving block to move inside the moving groove of the first fixed plate and the second fixed plate. This can move the upper conveying wheel and press it into the upper track groove of the feeding substrate. This can prevent the coating from being sent from the normal pressure environment into the low pressure vacuum chamber, and the sudden change in the air pressure difference will cause an impact on the feeding substrate, thus avoiding its position deviation. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0015] Figure 2 This is a schematic diagram of the feeding component structure of this utility model;

[0016] Figure 3This is a schematic diagram of the fixed rod and movable support structure of this utility model;

[0017] Figure 4 This is a schematic diagram of the upper transmission wheel and movable shaft structure of this utility model;

[0018] In the figure: 100, magnetron sputtering coating feeding mechanism; 200, feeding assembly; 201, first fixed plate; 202, second fixed plate; 203, moving groove; 204, support leg; 205, support plate; 206, servo motor; 207, rolling roller; 208, lower conveyor wheel; 209, transmission toothed belt; 210, auxiliary gear; 211, main gear; 212, rotating shaft; 213, feeding base plate; 214, track groove; 215, movable shaft; 216, moving block; 217, moving bracket; 218, fixed rod; 219, connecting rod; 220, telescopic guide column; 221, telescopic hydraulic cylinder; 223, upper conveyor wheel; 300, magnetron sputtering coating mechanism. Detailed Implementation

[0019] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention.

[0020] This utility model provides a technical solution: such as Figure 1 , Figure 3-4 As shown in this embodiment, a feeding mechanism for a magnetron sputtering coating equipment includes a magnetron sputtering coating feeding mechanism 100 and a feeding assembly 200. The feeding assembly 200 includes a first fixed plate 201 and a second fixed plate 202. A movable groove 203 is provided inside one side of the first fixed plate 201 and the second fixed plate 202. A movable block 216 is slidably connected inside the movable groove 203. A movable shaft 215 is rotatably connected inside the movable block 216. An upper conveyor wheel 223 is installed at one end of the movable shaft 215. A movable bracket 217 is fixedly installed at one end of the movable block 216. A fixed rod 218 is connected and fixed to the upper end of the movable bracket 217 by bolts. A connecting rod 219 is connected and fixed to the upper end of the fixed rod 218 by bolts. A telescopic guide post 220 is installed at the lower end of the connecting rod 219. A telescopic hydraulic cylinder 221 is fixedly installed at the lower end of the telescopic guide post 220.

[0021] like Figure 1-4As shown, the telescopic hydraulic cylinder 221 is bolted to one end of the support plate 205. One end of the support plate 205 is welded to one end of the first fixed plate 201. The first fixed plate 201 and the second fixed plate 202 are disposed inside the magnetron sputtering coating mechanism 300. Several rolling rollers 207 are rotatably connected inside the first fixed plate 201. A lower conveyor wheel 208 is fixedly installed on the outer side of the rolling roller 207. The upper end of the lower conveyor wheel 208 contacts the track groove 214. The track groove 214 is opened at the lower end of the feeding base plate 213. The upper end of the feeding base plate 213 has the track groove 214. The upper conveyor wheel 223 contacts the lower conveyor wheel 208 and the upper conveyor wheel 223 and rolls inside the track groove 214.

[0022] like Figure 1-3 As shown, a main gear 211 is fixedly installed at one end of the rolling roller 207, a rotating shaft 212 is installed at one end of the main gear 211, a servo motor 206 is fixedly installed at one end of the rotating shaft 212, and the servo motor 206 is bolted to one end of the second fixed plate 202. A secondary gear 210 is fixedly installed on several rolling rollers 207. Support legs 204 are fixedly installed on the lower ends of the second fixed plate 202 and the first fixed plate 201. A transmission toothed belt 209 meshes with the outer side of the secondary gear 210, and the gear of the transmission toothed belt 209 meshes with the outer side of the main gear 211.

[0023] When the target material is placed on the feeding substrate 213, the servo motor 206 drives the rotating shaft 212 to rotate, which in turn drives the main gear 211 to rotate. During the rotation of the main gear 211, the rolling rollers 207 and the conveyor belt rotate, further driving the secondary gear 210 to rotate. This drives several rolling rollers 207 to rotate, which in turn drives several lower conveyor wheels 208 to rotate. When the operator places the lower track groove of the feeding substrate 213 above the lower conveyor wheels 208, the feeding substrate 213 moves. During this movement, the upper guide groove of the feeding substrate 213 contacts the upper conveyor wheel 223, causing the upper conveyor wheel 223 to rotate. By clamping the feeding substrate 213 between the upper and lower guide rails, the feeding substrate 213 can achieve the desired rotation. Between the feed roller 223 and the lower conveyor roller 208, stable horizontal linear movement can be effectively maintained, preventing deviation during the movement and conveying of the feed substrate 213. When the feed substrate 213 conveys the target material for coating within the vacuum chamber of the magnetron sputtering coating mechanism 300 that transports the feed substrate 213 back and forth, the telescopic hydraulic cylinder 221 drives the telescopic guide column 220 to move up and down, further driving the moving bracket 217 to move. The moving bracket 217 further drives the moving block 216 to move within the moving groove 203 of the first fixed plate 201 and the second fixed plate 202, which can move and press the upper conveyor roller 223 into the upper track groove 214 of the feed substrate 213. This can prevent the sudden change in air pressure difference when the coating is sent from the normal pressure environment into the low pressure vacuum chamber, which would cause an impact on the feed substrate 213 and prevent its position from shifting.

[0024] This utility model provides a feeding mechanism for a magnetron sputtering coating equipment. The specific working principle is as follows: When the target material is placed on the feeding substrate 213, the servo motor 206 drives the rotating shaft 212 to rotate, which in turn drives the main gear 211 to rotate. During the rotation of the main gear 211, the rolling rollers 207 and the conveyor belt rotate, further driving the secondary gear 210 to rotate. This drives several rolling rollers 207 to rotate. During the rotation of the rolling rollers 207, several lower conveyor wheels 208 rotate. When the operator places the lower track groove of the feeding substrate 213 above the lower conveyor wheels 208, the feeding substrate 213 moves. During this movement, the upper guide rail groove of the feeding substrate 213 contacts the upper conveyor wheel 223, further driving the upper conveyor wheel 223 to rotate. The feeding substrate 213 is clamped between the upper conveyor wheel 223 and the lower conveyor wheel 208, which can effectively maintain stable horizontal linear movement and prevent the feeding substrate 213 from deviating during the movement and transportation process. When the feeding substrate 213 transports the target material for coating in the vacuum chamber of the magnetron sputtering coating mechanism 300 that transports the feeding substrate 213 back and forth, the telescopic guide column 220 is moved up and down by driving the telescopic hydraulic cylinder 221, which in turn moves the moving bracket 217. The moving bracket 217 further moves the moving block 216 inside the moving groove 203 of the first fixed plate 201 and the second fixed plate 202. This can move the upper conveyor wheel 223 and press it into the upper track groove 214 of the feeding substrate 213. This can prevent the sudden change in air pressure difference when the coating is sent from the normal pressure environment into the low pressure vacuum chamber, which would cause an impact on the feeding substrate 213 and prevent its position from deviating.

[0025] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A feeding mechanism for a magnetron sputtering coating apparatus, comprising a magnetron sputtering coating feeding mechanism (100) and a feeding assembly (200), characterized in that: The feeding assembly (200) includes a first fixed plate (201) and a second fixed plate (202). A movable groove (203) is provided inside one side of the first fixed plate (201) and the second fixed plate (202). A movable block (216) is slidably connected inside the movable groove (203). A movable shaft (215) is rotatably connected inside the movable block (216). An upper conveyor wheel (223) is installed at one end of the movable shaft (215). A movable bracket (217) is fixedly installed at one end of the movable block (216). A fixed rod (218) is connected and fixed at the upper end of the movable bracket (217) by bolts. A connecting rod (219) is connected and fixed at the upper end of the fixed rod (218) by bolts. A telescopic guide post (220) is installed at the lower end of the connecting rod (219). A telescopic hydraulic cylinder (221) is fixedly installed at the lower end of the telescopic guide post (220).

2. The feeding mechanism of a magnetron sputtering coating equipment according to claim 1, characterized in that: The telescopic hydraulic cylinder (221) is bolted to one end of the support plate (205), and one end of the support plate (205) is welded to one end of the first fixing plate (201). The first fixing plate (201) and the second fixing plate (202) are located inside the magnetron sputtering coating mechanism (300).

3. The feeding mechanism of a magnetron sputtering coating equipment according to claim 2, characterized in that: The first fixed plate (201) has several rolling rollers (207) connected inside by rotation. A lower conveyor wheel (208) is fixedly installed on the outside of the rolling roller (207). The upper end of the lower conveyor wheel (208) contacts a track groove (214). The track groove (214) is opened at the lower end of the feeding plate (213).

4. The feeding mechanism of a magnetron sputtering coating equipment according to claim 3, characterized in that: The upper end of the feeding substrate (213) is provided with a track groove (214), and the upper conveyor wheel (223) is in contact with the inside of the track groove (214). The lower conveyor wheel (208) and the upper conveyor wheel (223) roll inside the track groove (214) to transport the feeding substrate (213) back and forth.

5. The feeding mechanism of a magnetron sputtering coating equipment according to claim 4, characterized in that: A main gear (211) is fixedly installed at one end of the rolling roller (207), a rotating shaft (212) is installed at one end of the main gear (211), and a servo motor (206) is fixedly installed at one end of the rotating shaft (212).

6. The feeding mechanism of a magnetron sputtering coating equipment according to claim 5, characterized in that: The servo motor (206) is bolted to one end of the second fixed plate (202), and the plurality of rolling rollers (207) are fixedly mounted with a secondary gear (210). The second fixed plate (202) and the lower end of the first fixed plate (201) are fixedly mounted with support legs (204).

7. The feeding mechanism of a magnetron sputtering coating equipment according to claim 6, characterized in that: The outer side of the secondary gear (210) is engaged with a transmission belt (209), and the gear of the transmission belt (209) is engaged with the outer side of the main gear (211).

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