Angle-adjustable sample table of ultra-precise magnetron ion sputtering instrument

Abstract

The utility model belongs to the technical field of application of ultra-precise magnetic control ion sputtering instruments, and particularly discloses an angle-adjustable sample table of an ultra-precise magnetic control ion sputtering instrument. Comprising a table body, a PLC (Programmable Logic Controller), a lower circular fixed table, a metal ball, an upper circular movable supporting table, a circular material table, a sample groove, a group of vertical frame plates, a vertical hydraulic cylinder, a group of transverse plates, a tilt angle sensor mounting seat, a tilt angle sensor and the like, wherein the vertical hydraulic cylinder and the tilt angle sensor are respectively connected with the PLC. The device disclosed by the utility model has the beneficial effects that the lower circular fixed table, the circular groove of the lower circular fixed table, the metal ball, the upper circular movable supporting table, the circular groove of the upper circular movable supporting table and the like which are matched for use are utilized, and the vertical hydraulic cylinder, the tilt angle sensor and the PLC are combined, so that accurate and stable angle adjustment on a sputtered sample according to needs can be realized; the high-quality sputtering detection requirements of different sputtered samples are met; a split type multi-module structural design is adopted as a whole, so that assembly or maintenance is facilitated, and popularization is facilitated.

Description

Technical Field

[0001] This utility model belongs to the field of application technology of ultra-precision magnetron sputtering instruments, specifically relating to an angle-adjustable sample stage for ultra-precision magnetron sputtering instruments. Background Technology

[0002] Magnetron sputtering involves filling a high vacuum with an appropriate amount of argon gas and applying a DC voltage between the cathode (cylindrical or planar target) and the anode (coating chamber wall). This generates a magnetron-controlled abnormal glow discharge within the coating chamber, ionizing the argon gas. The argon ions are accelerated by the cathode and bombard the target surface, sputtering atoms from the target surface and depositing them onto the substrate to form a thin film. By changing the target material and controlling the sputtering time, films of different materials and thicknesses can be obtained.

[0003] In sputtering operations, the angle between the sample and the magnetron sputtering components of an ultra-precision magnetron ion sputtering instrument affects the sputtering effect and ultimately the accuracy of the detection. However, in actual sample sputtering processes, different samples require control of the sputtering angle. Current sample stages typically only allow rotation and cannot precisely stabilize the sample on the stage or adjust the tilt angle accurately.

[0004] Therefore, based on the above problems, this utility model provides an angle-adjustable sample stage for an ultra-precision magnetron sputtering instrument. Utility Model Content

[0005] Purpose of the utility model: The purpose of this utility model is to provide an angle-adjustable sample stage for an ultra-precision magnetron sputtering instrument, which solves the problem that existing sample stages can only rotate and cannot make precise adjustments to the sample angle.

[0006] Technical Solution: The ultra-precision magnetron sputtering ion stage with adjustable angle provided by this utility model includes a stage body, a PLC controller, and a sample. A lower circular fixed stage is provided on one end face of the stage body. A circular groove is provided on one side of the lower circular fixed stage, and a metal ball is placed inside the circular groove. An upper circular movable support stage is provided on the metal ball, and a circular groove matching the metal ball is provided on one side of the upper circular movable support stage. A circular material stage is provided on the other side of the upper circular movable support stage, and a sample slot is provided on one side of the circular material stage. At least one set of vertical frame plates are symmetrically arranged on one end face of the stage body, outside the lower circular fixed stage. A vertical hydraulic cylinder is provided at one end of each vertical frame plate. At least one set of horizontal plates are symmetrically arranged on the outer wall of the upper circular movable support stage. An angle sensor mounting seat is provided on one end face of each horizontal plate, and an angle sensor is installed on each angle sensor mounting seat. The vertical hydraulic cylinder and the angle sensor are connected to the PLC controller.

[0007] In this technical solution, the ultra-precision magnetron sputtering ion stage with adjustable angle also includes vertical screws respectively set on the vertical hydraulic cylinder, and horizontal plate through holes respectively set in one end face of the horizontal plate, and vertical screw locking nuts that fix the vertical hydraulic cylinder and the horizontal plate through the vertical screws and the horizontal plate through holes.

[0008] In this technical solution, the lower circular fixed platform and the upper circular movable support platform are configured as cylindrical structures with the same diameter.

[0009] In this technical solution, the diameters of the circular grooves of the lower circular fixed platform and the upper circular movable support platform are the same.

[0010] Compared with existing technologies, the advantages of the adjustable sample stage of the ultra-precision magnetron sputtering instrument of this invention are as follows: 1. By using the lower circular fixed stage, the lower circular fixed stage circular groove, the metal ball, the upper circular moving support stage, and the upper circular moving support stage circular groove, combined with the vertical hydraulic cylinder, tilt sensor, and PLC controller, the angle of the sputtered sample can be precisely and stably adjusted as needed, meeting the high-quality sputtering detection requirements of different sputtered samples; 2. The overall design adopts a split multi-module structure, which is convenient for assembly or maintenance, and is practical and easy to promote. Attached Figure Description

[0011] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0012] Figure 1 This is a schematic diagram of the main structure of the angle-adjustable sample stage of the ultra-precision magnetron sputtering instrument of this utility model.

[0013] Figure 2 yes Figure 1 A schematic diagram of the split structure;

[0014] Figure 3 This is a top view schematic diagram of an embodiment of the upper circular moving support platform, circular material platform, sample tank, horizontal plate, through hole in the horizontal plate, and tilt sensor mounting base;

[0015] Figure 4 This is a top view schematic diagram of another embodiment of the upper circular moving support platform, circular material platform, sample tank, horizontal plate, horizontal plate through hole and tilt sensor mounting base;

[0016] The numbers in the diagram are as follows: 100-Platform, 101-Lower circular fixed platform, 102-Circular groove of lower circular fixed platform, 103-Metal ball, 104-Upper circular moving support platform, 105-Circular groove of upper circular moving support platform, 106-Circular material platform, 107-Sample, 108-Sample groove, 109-Horizontal plate, 110-Horizontal plate through hole, 111-Vertical screw, 112-Vertical screw locking nut, 113-Tilt sensor mounting base, 114-Tilt sensor, 115-Vertical frame plate, 116-Vertical hydraulic cylinder, 117-PLC controller. Detailed Implementation

[0017] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present utility model without creative effort are within the protection scope of the present utility model.

[0018] In the description of this utility model, it should be noted that the terms "top," "bottom," "one side," "the other side," "front," "back," "middle part," "inner," "top," and "bottom," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this utility model and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. The terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. Furthermore, unless otherwise explicitly specified and limited, the terms "installed," "connected," and "joined" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0019] Example 1

[0020] like Figure 1 , Figure 2 and Figure 3 The ultra-precision magnetron sputtering instrument shown has an adjustable sample stage, including a stage body 100, a PLC controller 117, and a sample 107.

[0021] A lower circular fixed platform 101 is provided on one end face of the platform body 100.

[0022] One side of the lower circular fixing platform 101 is provided with a lower circular fixing platform circular groove 102.

[0023] A metal ball 103 is disposed in the circular groove 102 of the lower circular fixed platform.

[0024] A circular movable support platform 104 is provided on the metal ball 103.

[0025] One side of the upper circular movable support platform 104 is provided with a circular groove 105 that matches the metal ball 103.

[0026] A circular material platform 106 is provided on the other side of the upper circular movable support platform 104.

[0027] A sample groove 108 is provided on one side of the circular material stage 106.

[0028] At least one set of vertical frame plates 115 are symmetrically arranged on one end face of the platform 100, located on the outer layer of the lower circular fixed platform 101.

[0029] A vertical hydraulic cylinder 116 is installed at one end of each vertical frame plate 115.

[0030] The outer wall of the upper circular movable support platform 104 is symmetrically provided with at least one set of horizontal plates 109.

[0031] Tilt sensor mounting bases 113 are respectively provided on one end face of the horizontal plate 109.

[0032] Inclination sensors 114 are respectively installed on the tilt sensor mounting base 113;

[0033] The vertical hydraulic cylinder 116 and the tilt sensor 114 are respectively connected to the PLC controller 117.

[0034] The working principle is as follows: the tilt sensor 114 is used to monitor the horizontal angle of the upper circular moving support platform 104 and feeds back the angle parameter to the PLC controller 117; the PLC controller 117 is used to receive the angle parameter information fed back by the tilt sensor 114 and control the extension / retraction state of the vertical hydraulic cylinder 116 according to the corresponding angle parameter information.

[0035] (1) Place sample 107 in sample slot 108;

[0036] (2) When the ultra-precision magnetron sputtering is working, the vertical hydraulic cylinder 116 is extended / retracted as needed by the PLC controller 117 (if there is a set of vertical hydraulic cylinders 116, one extends and the other retracts). At this time, the vertical hydraulic cylinder 116 drives the upper circular moving support stage 104 to follow the horizontal plate 109 with the metal ball 103 as the support center and perform the same tilting action. In this way, the sample 107 placed in the sample slot 108 on one side of the circular material stage 106 on the upper circular moving support stage 104 completes the synchronous tilting action and completes a certain sputtering angle control.

[0037] Example 2

[0038] Based on Embodiment 1, the angle-adjustable sample stage of the ultra-precision magnetron sputtering instrument also includes vertical screws 111 respectively disposed on the vertical hydraulic cylinder 116, horizontal plate through holes 110 respectively disposed in one end face of the horizontal plate 109, and vertical screw locking nuts 112 that fix the vertical hydraulic cylinder 116 and the horizontal plate 109 through the vertical screws 111 and the horizontal plate through holes 110.

[0039] The above structure enables a convenient and detachable design between the vertical hydraulic cylinder 116 and the horizontal plate 109, which facilitates assembly and maintenance.

[0040] In addition, preferably the lower circular fixed platform 101 and the upper circular movable support platform 104 are set as cylindrical structures with the same diameter to ensure that the center of gravity is concentric when the tilt angle is adjusted, so as to achieve safe and precise angle adjustment.

[0041] In addition, preferably the lower circular fixed platform circular groove 102 and the upper circular moving support platform circular groove 105 have the same diameter, respectively matching the metal ball 103 for operation, and are tightly attached to the outer layer of the metal ball 103 to achieve stable tilt angle adjustment support.

[0042] like Figure 4 As shown, two sets of horizontal plates 109, vertical frame plates 115, and vertical hydraulic cylinders 116 are respectively set, which can realize multiple arbitrary tilting sputtering angle adjustments of the sample 107 in the sample tank 108. The working state of adjacent sets of vertical hydraulic cylinders 116 is the same, such as the adjacent set of vertical hydraulic cylinders 116 extending and the adjacent other set of vertical hydraulic cylinders 116 retracting.

[0043] The ultra-precision magnetron sputtering instrument of this structure features an adjustable sample stage, a stage body 100 (sputtering components are not shown and do not affect the disclosure of the technical solution of this application), an tilt sensor 114, a vertical hydraulic cylinder 116, and a PLC controller 117, all of which are conventional components or devices. These will not be described in detail in this application.

[0044] It should be noted that, in this document, terms such as "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0045] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. An adjustable sample stage for an ultra-precision magnetron sputtering instrument, comprising a stage body (100), a PLC controller (117), and a sample (107), characterized in that: A lower circular fixed platform (101) is provided on one end face of the platform (100). One side of the lower circular fixing platform (101) is provided with a lower circular fixing platform circular groove (102). Metal beads (103) are provided in the circular groove (102) of the lower circular fixed platform. The metal ball (103) is provided with an upper circular movable support platform (104). One side of the upper circular movable support platform (104) is provided with a circular groove (105) that matches the metal ball (103). A circular material platform (106) is provided on the other side of the upper circular movable support platform (104). One side of the circular material platform (106) is provided with a sample groove (108). At least one set of vertical frame plates (115) are symmetrically arranged on one end face of the platform (100) and on the outer layer of the lower circular fixed platform (101). A vertical hydraulic cylinder (116) is respectively provided at one end of the vertical frame plate (115). The outer wall of the upper circular movable support platform (104) is provided with at least one set of horizontal plates (109) symmetrically arranged. One end face of the horizontal plate (109) is respectively provided with an angle sensor mounting base (113). Inclination sensors (114) are respectively provided on the tilt sensor mounting base (113); The vertical hydraulic cylinder (116) and the tilt sensor (114) are connected to the PLC controller (117) respectively.

2. The angle-adjustable sample stage of the ultra-precision magnetron sputtering instrument according to claim 1, characterized in that: The ultra-precision magnetron sputtering ion stage with adjustable angle also includes a vertical screw (111) respectively set on the vertical hydraulic cylinder (116), a horizontal plate through hole (110) respectively set in one end face of the horizontal plate (109), and a vertical screw locking nut (112) that fixes the vertical hydraulic cylinder (116) and the horizontal plate (109) through the vertical screw (111) and the horizontal plate through hole (110).

3. The angle-adjustable sample stage of the ultra-precision magnetron sputtering instrument according to claim 1, characterized in that: The lower circular fixed platform (101) and the upper circular movable support platform (104) are configured as cylindrical structures with the same diameter.

4. The angle-adjustable sample stage of the ultra-precision magnetron sputtering instrument according to claim 1, characterized in that: The lower circular fixed platform circular groove (102) and the upper circular moving support platform circular groove (105) have the same diameter.

Images