Multi-stage chamber system

Abstract

According to the multi-stage chamber system provided by the invention, the multi-stage chamber structure, the first electric gate valve, the second electric gate valve, the first pressure sensor, the second pressure sensor and the main control device are arranged, so that the monitoring on the internal air pressure of the detection chamber and the transition chamber is realized. The master control device monitors the pressure values of the detection chamber and the transition chamber in real time through the first pressure sensor and the second pressure sensor, misjudgment of manual reading is prevented, and meanwhile the master control device automatically judges the pressure difference range between the detection chamber and the transition chamber and the pressure difference range between the transition chamber and the feeding and discharging chamber according to the pressure data. Therefore, the opening time of the first electric gate valve and the opening time of the second electric gate valve are accurately judged, misoperation possibly caused by manual operation is avoided, and the safety when the detection cavity is communicated with the transition cavity or when the transition cavity is communicated with the feeding and discharging cavity is guaranteed. According to the design, the operation efficiency is improved, risks caused by improper manual operation are greatly reduced, and the risks of material damage, equipment damage and related pipeline damage possibly occurring in the detection process are effectively reduced.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor product detection, in particular to a multi-stage chamber system for semiconductor product detection. BACKGROUND

[0002] With the continuous development of the field of semiconductor processing, the requirements for semiconductor product detection equipment are also getting higher and higher.

[0003] In order to meet the detection requirements of semiconductor products, the semiconductor detection equipment is generally provided with multiple cavities, including a vacuum chamber for detection and a material discharge chamber for temporarily storing materials to be detected. In order to ensure the cleanliness of the detection environment of the semiconductor products, the materials need to be transferred from the material discharge chamber to the vacuum chamber during the detection process, and after the detection is completed, the materials also need to be transferred from the vacuum chamber to the material discharge chamber. Due to the difference in internal pressure between the material discharge chamber and the vacuum chamber, before the transfer, the pressure difference between the two chambers needs to be within a controllable range to avoid risks.

[0004] In the prior art, a pressure gauge is generally arranged on the material discharge chamber of the vacuum chamber to facilitate manual reading and judgment, and then the manual judgment is used to determine when the vacuum chamber and the material discharge chamber need to be connected to start the material transfer. However, manual reading and judgment have defects, in addition to low efficiency, there may be inaccurate reading and inaccurate judgment, and then after the manual adjustment of the pressure value of the chamber, the pressure difference between the two chambers when connected may be too large, which may cause damage to the detection materials, equipment and related pipelines when the vacuum chamber and the material discharge chamber are connected. CONTENT OF THE INVENTION

[0005] The purpose of the present application is to provide a multi-stage chamber system which can effectively determine the connection time of adjacent chambers through chamber pressure monitoring and pressure value comparison, and realize automatic connection process, greatly reducing the risk caused by improper manual operation, and effectively reducing the risk of material damage, equipment damage and related pipeline damage during the detection process.

[0006] The multi-stage chamber system provided by the present application is used for semiconductor detection, which comprises a multi-stage chamber structure, a first electric gate valve, a second electric gate valve, a first pressure sensor, a second pressure sensor and a main control device.

[0007] The multi-stage chamber structure comprises a detection chamber, a transition chamber and a feeding chamber arranged in sequence. The internal pressure value of the feeding chamber is always equal to the atmospheric pressure value. The first electrically operated gate valve is opened or closed to communicate or isolate the detection chamber and the transition chamber. The second electrically operated gate valve is opened or closed to communicate or isolate the transition chamber and the feeding chamber. The first pressure sensor is arranged in the detection chamber, and the second pressure sensor is arranged in the transition chamber. The main control device is in communication connection with the first pressure sensor, the second pressure sensor, the first electrically operated gate valve and the second electrically operated gate valve.

[0008] The main control device obtains the internal pressure value of the detection chamber through the first pressure sensor, which is recorded as a first pressure value. The main control device obtains the internal pressure value of the transition chamber through the second pressure sensor, which is recorded as a second pressure value. The internal pressure value of the feeding chamber is recorded as a third pressure value.

[0009] The first difference threshold value and the second difference threshold value are pre-stored in the main control device. The main control device compares the first pressure value and the second pressure value to obtain a first difference absolute value, and judges whether the first difference absolute value is greater than the first difference threshold value. If not, the first electrically operated gate valve is controlled to be opened. If yes, the first electrically operated gate valve is controlled to be kept closed. The main control device compares the second pressure value and the third pressure value to obtain a second difference absolute value, and judges whether the second difference absolute value is greater than the second difference threshold value. If not, the second electrically operated gate valve is controlled to be opened. If yes, the first electrically operated gate valve is controlled to be kept closed.

[0010] In an implementable scheme, the multi-stage chamber system further comprises a first gas supply device, a first vacuum pumping device, a second gas supply device and a second vacuum pumping device. The first gas supply device and the first vacuum pumping device are connected with the detection chamber, and the first gas supply device is used for delivering a first predetermined gas to the detection chamber, and the first vacuum pumping device is used for pumping the detection chamber. The second gas supply device and the second vacuum pumping device are connected with the transition chamber, and the second gas supply device is used for delivering a predetermined gas to the transition chamber, and the second vacuum pumping device is used for pumping the transition chamber. The main control device is in communication connection with the first gas supply device, the first vacuum pumping device, the second gas supply device and the second vacuum pumping device. The main control device controls the first gas supply device and / or the first vacuum pumping device to work to adjust the internal gas pressure of the detection chamber. The main control device controls the second gas supply device and / or the second vacuum pumping device to work to adjust the internal gas pressure of the transition chamber.

[0011] In an implementable scheme, the multi-stage chamber system further comprises a temperature sensor arranged in the detection chamber and in communication connection with the main control device. The first vacuum pumping device and the second vacuum pumping device are both provided with a liquid cooling pipeline. The multi-stage chamber system further comprises a liquid leakage sensor arranged in the liquid cooling pipeline and in communication connection with the main control device.

[0012] In an implementable solution, the first vacuum device comprises an A1 vacuum pump, an A2 vacuum pump, a first main pipeline, an A1 branch pipeline, an A2 branch pipeline, an A1 electric valve, and an A2 electric valve. One end of the first main pipeline is connected to the detection chamber, and the other end is connected in parallel to the A1 branch pipeline and the A2 branch pipeline. The A1 branch pipeline is connected to the A1 vacuum pump at the end, and the A2 branch pipeline is connected to the A2 vacuum pump at the end. The A1 electric valve is arranged on the A1 branch pipeline, and the A2 electric valve is arranged on the A2 branch pipeline. The A1 vacuum pump, the A2 vacuum pump, the A1 electric valve, and the A2 electric valve are connected to the main control device in communication. The liquid cooling pipeline is arranged outside the A1 vacuum pump and the A2 vacuum pump.

[0013] In an implementable solution, the second vacuum device comprises a B1 vacuum pump, a B2 vacuum pump, a second main pipeline, a B1 branch pipeline, a B2 branch pipeline, a B1 electric valve, and a B2 electric valve. One end of the second main pipeline is connected to the transition chamber, and the other end is connected in parallel to the B1 branch pipeline and the B2 branch pipeline. The B1 branch pipeline is connected to the B1 vacuum pump at the end, and the B2 branch pipeline is connected to the B2 vacuum pump at the end. The B1 electric valve is arranged on the B1 branch pipeline, and the B2 electric valve is arranged on the B2 branch pipeline. The B1 vacuum pump, the B2 vacuum pump, the B1 electric valve, and the B2 electric valve are connected to the main control device in communication. The liquid cooling pipeline is arranged outside the B1 vacuum pump and the B2 vacuum pump.

[0014] In an implementable solution, the liquid leakage sensor comprises a liquid leakage main controller and a liquid leakage detection rope. The liquid leakage detection rope is arranged along the liquid cooling pipeline. The liquid leakage detection rope is connected to the liquid leakage main controller in communication. The liquid leakage main controller is connected to the main control device in communication.

[0015] In an implementable solution, a first conveying channel is arranged between the detection chamber and the transition chamber. The first electric gate valve comprises a first driver and a first gate structure. The first gate structure is arranged in the first conveying channel. The first driver drives the first gate structure to act to close or open the first conveying channel. The first driver is connected to the main control device in communication.

[0016] In an implementable solution, a second conveying channel is arranged between the transition chamber and the loading and unloading chamber. The second electric gate valve comprises a second driver and a second gate structure. The second gate structure is arranged in the second conveying channel. The second driver drives the second gate structure to act to close or open the second conveying channel. The second driver is connected to the main control device in communication.

[0017] In an implementable solution, the device comprises a detection assembly, a first conveying mechanism, and a second conveying mechanism. The detection assembly is arranged in the detection chamber and is used for detecting the semiconductor products. The first conveying mechanism is arranged in the transition chamber and is used for transferring the semiconductor products between the transition chamber and the detection chamber. The second conveying mechanism is arranged in the loading and unloading chamber and is used for transferring the semiconductor products between the loading and unloading chamber and the transition chamber.

[0018] In an implementable solution, an operation terminal device is further included, which is in communication connection with the master device, and the operation terminal device at least includes an input module and a display module.

[0019] The master device includes an environment detection module, which includes an environment parameter master module, a collection module, an air pressure detection interface, a liquid leakage detection interface, and a temperature detection interface. The air pressure detection interface, the liquid leakage detection interface, and the temperature detection interface are in circuit connection with the collection module. The collection module is in circuit connection with the environment parameter master module, and the environment parameter master module is in communication connection with the operation terminal device. The air pressure detection interface is in circuit connection with the first pressure sensor and the second pressure sensor, the liquid leakage detection interface is in circuit connection with the liquid leakage sensor, and the temperature detection interface is in circuit connection with the temperature sensor. The collection module is used to receive the electrical signals of the first pressure sensor, the second pressure sensor, and the temperature sensor, and send the signals to the environment parameter master module after signal amplification and analog-to-digital conversion, and further send the signals to the operation terminal device. The collection module is used to receive the electrical signal of the liquid leakage sensor, and send the signal to the environment parameter master module after level conversion, and further send the signal to the operation terminal device.

[0020] Compared with the prior art, the application has at least the following beneficial effects:

[0021] The multi-stage chamber system of the application realizes accurate monitoring of the air pressure inside the detection chamber and the transition chamber by setting key components such as the multi-stage chamber structure, the electric gate valve, the first and second pressure sensors, and the master device. The master device monitors the pressure values of the detection chamber and the transition chamber in real time through the first and second pressure sensors, preventing misjudgment of manual reading. At the same time, the master device automatically judges the pressure difference range between the detection chamber and the transition chamber, and the transition chamber and the upper and lower feeding chambers, and then accurately judges the opening timing of the first and second electric gate valves, avoiding possible misoperation of manual operation and ensuring the safety when the detection chamber and the transition chamber are connected or when the transition chamber and the upper and lower feeding chambers are connected. The design of the application not only improves the operation efficiency, but also greatly reduces the risk caused by improper manual operation, effectively reducing the risk of material damage, equipment damage, and related pipeline damage during the detection process.

[0022] In summary, the multi-stage chamber system of the application can effectively determine the connection timing of adjacent chambers through chamber pressure monitoring and pressure value comparison, and realize automatic connection process, greatly reducing the risk caused by improper manual operation, effectively reducing the risk of material damage, equipment damage, and related pipeline damage during the detection process.

[0023] Further, the detection chamber is also provided with a temperature sensor connected with the master control device, so that the temperature in the detection chamber can be monitored in real time, to help control the temperature of the detection environment.

[0024] Further, the vacuumizing device of the multi-stage chamber system of the present application is provided with a liquid cooling pipeline, and a liquid leakage sensor is arranged in the liquid cooling pipeline, so that the master control device can determine whether the liquid cooling pipeline leaks liquid in time, and thus the liquid leakage problem can be found in time, and corresponding remedial measures can be taken to prevent the leaked liquid from damaging the equipment. BRIEF DESCRIPTION OF DRAWINGS

[0025] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present application, and therefore should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can also be obtained without creative labor.

[0026] Figure 1 A schematic diagram of a multi-stage chamber system according to an embodiment of the present application is shown;

[0027] Figure 2 A schematic diagram of a multi-stage chamber system with two-stage vacuumizing according to an embodiment of the present application is shown;

[0028] Figure 3 A schematic diagram of a multi-stage chamber system containing an operating end device according to an embodiment of the present application is shown;

[0029] Figure 4 A schematic diagram of a multi-stage chamber system showing the composition of an environment detection module according to an embodiment of the present application is shown;

[0030] Figure 5 A schematic diagram of an environment detection module according to an embodiment of the present application is shown;

[0031] Figure 6 A schematic diagram of a multi-stage chamber system according to an embodiment of the present application, in which the loading and unloading chamber can also adjust the size of the inner cavity air pressure.

[0032] In the figure: 1, detection chamber; 2, transition chamber; 3, loading and unloading chamber;

[0033] 4, first electric gate valve; 41, first driver; 42, first door structure; 43, first conveying channel;

[0034] 5, second electric gate valve; 51, second driver; 52, second door structure; 53, second conveying channel;

[0035] 6, first gas supply device; 61, first gas source mechanism; 62, first electric valve; 63, first filter;

[0036] 7, first vacuum device; 71, A1 vacuum pump; 72, A2 vacuum pump; 73, first main pipe; 74, A1 branch pipe; 75, A2 branch pipe; 76, A1 electric valve; 77, A2 electric valve;

[0037] 8, second gas supply device; 81, second gas source mechanism; 82, second electric valve; 83, second filter;

[0038] 9, second vacuum device; 91, B1 vacuum pump; 92, B2 vacuum pump; 93, second main pipe; 94, B1 branch pipe; 95, B2 branch pipe; 96, B1 electric valve; 97, B2 electric valve;

[0039] 10, first pressure sensor; 11, second pressure sensor;

[0040] 12, main control device; 121, environment detection module; 122, action control module;

[0041] 13, temperature sensor; 14, liquid leakage sensor;

[0042] 15, detection assembly; 16, first conveying mechanism; 17, second conveying mechanism;

[0043] 18, operation end device; 19, third pressure sensor; 20, third gas supply device; 21, third vacuum device;

[0044] 100, liquid cooling pipe. DETAILED DESCRIPTION

[0045] In order to make the objectives, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some but not all of the embodiments of the present application. The components of the embodiments of the present application described and shown in the drawings herein can be arranged and designed in various different configurations.

[0046] Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the claimed present application, but only represents selected embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work are within the scope of protection of the present application.

[0047] As Figure 1As shown, the embodiment of the present application provides a multi-stage chamber system for semiconductor detection, characterized in that it comprises a multi-stage chamber structure, a first electrically operated gate valve 4, a second electrically operated gate valve 5, a first pressure sensor 10, a second pressure sensor 11 and a master control device 12. The multi-stage chamber structure comprises a detection chamber 1, a transition chamber 2 and a loading and unloading chamber 3 arranged in sequence. Generally, the internal pressure value of the loading and unloading chamber 3 is always equal to the atmospheric pressure value.

[0048] The first electrically operated gate valve 4 is used to keep the detection chamber 1 and the transition chamber 2 in communication or isolation. Specifically, the first electrically operated gate valve 4 is arranged between the detection chamber 1 and the transition chamber 2. When the first electrically operated gate valve 4 is opened, the detection chamber 1 and the transition chamber 2 are in communication. When the first electrically operated gate valve 4 is closed, the detection chamber 1 and the transition chamber 2 are sealed and isolated.

[0049] The second electrically operated gate valve 5 is used to keep the transition chamber 2 and the loading and unloading chamber 3 in communication or isolation. Specifically, the second electrically operated gate valve 5 is arranged between the transition chamber 2 and the loading and unloading chamber 3. When the second electrically operated gate valve 5 is opened, the transition chamber 2 and the loading and unloading chamber 3 are in communication. When the second electrically operated gate valve 5 is closed, the transition chamber 2 and the loading and unloading chamber 3 are sealed and isolated.

[0050] The first pressure sensor 10 is arranged in the detection chamber 1 and used to obtain the pressure value in the detection chamber 1. The second pressure sensor 11 is arranged in the transition chamber 2 and used to obtain the pressure value in the transition chamber 2.

[0051] The master control device 12 is in communication connection with the first pressure sensor 10, the second pressure sensor 11, the first electrically operated gate valve 4 and the second electrically operated gate valve 5. The master control device 12 obtains the internal pressure value of the detection chamber 1 through the first pressure sensor 10, which is recorded as the first pressure value. The master control device 12 obtains the internal pressure value of the transition chamber 2 through the second pressure sensor 11, which is recorded as the second pressure value. The internal pressure value of the loading and unloading chamber 3 is recorded as the third pressure value.

[0052] The master control device 12 pre-stores a first difference threshold value and a second difference threshold value. The master control device 12 compares the first pressure value and the second pressure value to obtain a first difference absolute value and judges whether the first difference absolute value is greater than the first difference threshold value. If not, the first electrically operated gate valve 4 is controlled to be opened. If yes, the first electrically operated gate valve 4 is controlled to be kept closed. The master control device 12 compares the second pressure value and the third pressure value to obtain a second difference absolute value and judges whether the second difference absolute value is greater than the second difference threshold value. If not, the second electrically operated gate valve 5 is controlled to be opened. If yes, the second electrically operated gate valve 5 is controlled to be kept closed.

[0053] The multi-stage chamber system of the present application realizes accurate monitoring of the internal air pressure of the detection chamber and the transition chamber by setting key components such as a multi-stage chamber structure, an electric gate valve, first and second pressure sensors, and a master control device. The master control device monitors the pressure values of the detection chamber and the transition chamber in real time through the first and second pressure sensors to prevent misjudgment of manual reading, and automatically judges the pressure difference range between the detection chamber and the transition chamber, the transition chamber and the loading and unloading chamber according to the pressure data, thereby accurately determining the opening timing of the first and second electric gate valves, avoiding possible misoperation of manual operation, and ensuring the safety of the detection chamber and the transition chamber when they are connected or the transition chamber and the loading and unloading chamber when they are connected. The design of the present application not only improves the operation efficiency, but also greatly reduces the risk caused by improper manual operation, effectively reducing the risk of material damage, equipment damage and related pipeline damage during the detection process.

[0054] In an embodiment, as shown in Figure 1 The multi-stage chamber system of the present application includes a first gas supply device 6, a first vacuum pumping device 7, a second gas supply device 8, and a second vacuum pumping device 9. The first gas supply device 6 and the first vacuum pumping device 7 are connected to the detection chamber 1, the first gas supply device 6 is used to deliver a first predetermined gas to the detection chamber 1, and the first vacuum pumping device 7 is used to pump the detection chamber 1. The second gas supply device 8 and the second vacuum pumping device 9 are connected to the transition chamber 2, the second gas supply device 8 is used to deliver a predetermined gas to the transition chamber 2, and the second vacuum pumping device 9 is used to pump the transition chamber 2.

[0055] The master control device 12 is in communication with the first gas supply device 6, the first vacuum pumping device 7, the second gas supply device 8, and the second vacuum pumping device 9. The master control device 12 controls the first gas supply device 6 and / or the first vacuum pumping device 7 to work to adjust the internal air pressure of the detection chamber 1, and controls the second gas supply device 8 and / or the second vacuum pumping device 9 to work to adjust the internal air pressure of the transition chamber 2.

[0056] Further, when the multi-stage chamber system of the present application is used for semiconductor product (to-be-detected material) detection, the to-be-detected material is first placed in the loading and unloading chamber 3, then transferred to the transition chamber 2, and finally transferred from the transition chamber 2 to the detection chamber 1 for detection. After the semiconductor product is detected, it becomes a detected material, which is transferred from the detection chamber 1 to the transition chamber 2, then transferred from the transition chamber 2 to the loading and unloading chamber 3, and finally transported away from the loading and unloading chamber 3, completing the entire detection process.

[0057] When the material is transferred between the transition chamber 2 and the loading and unloading chamber 3, the loading and unloading chamber 3 is generally in communication with the outside, that is, the internal pressure of the loading and unloading chamber 3 is generally consistent with the atmospheric pressure, denoted as a third pressure value. The main control device 12 obtains the internal pressure of the transition chamber 2 in real time through the second pressure sensor 11, denoted as a second pressure value. The main control device 12 controls the second gas supply device 8 and / or the second vacuum pumping device 9 to work, so as to adjust the internal gas pressure of the transition chamber 2, until the second absolute difference value between the second pressure value and the third pressure value is less than or equal to the second difference threshold value, which indicates that the second electrically operated gate valve 5 between the transition chamber 2 and the loading and unloading chamber 3 can be opened, and the material can be transferred between the transition chamber 2 and the loading and unloading chamber 3.

[0058] Further, when the material is transferred between the detection chamber 1 and the transition chamber 2, the main control device 12 obtains the internal pressure of the detection chamber 1 through the first pressure sensor 10, denoted as a first pressure value. The main control device 12 obtains the internal pressure of the transition chamber 2 through the second pressure sensor 11, denoted as a second pressure value. If the main control device 12 calculates that the first absolute difference value between the first pressure value and the second pressure value is greater than the first difference threshold value, it indicates that the pressure difference between the detection chamber 1 and the transition chamber 2 is too large, and the first electrically operated gate valve 4 cannot be opened. At this time, the main control device 12 controls the first gas supply device 6 and / or the first vacuum pumping device 7 to work, so as to adjust the internal gas pressure of the detection chamber 1; and / or, the main control device 12 controls the second gas supply device 8 and / or the second vacuum pumping device 9 to work, so as to adjust the internal gas pressure of the transition chamber 2. During the adjustment process, the main control device 12 obtains the internal pressures of the detection chamber 1 and the transition chamber 2 in real time through the first pressure sensor 10 and the second pressure sensor 11, and calculates the first absolute difference value between the first pressure value and the second pressure value, until the first absolute difference value is less than or equal to the first difference threshold value, and the adjustment is stopped at the same time. The first electrically operated gate valve 4 can be opened to transfer the material between the detection chamber 1 and the transition chamber 2.

[0059] In the multi-stage chamber system of the present application, by setting the three-stage chamber structure of the detection chamber 1, the transition chamber 2 and the loading and unloading chamber 3, it can ensure that the internal pressure of the chamber is accurately adjusted and controlled during the material transfer process, thereby meeting the strict requirements of semiconductor product detection on environmental cleanliness. The detection chamber 1 is used for actual semiconductor product detection, the transition chamber 2 serves as an intermediary connecting the detection chamber 1 and the loading and unloading chamber 3, and the loading and unloading chamber 3 is used for temporarily storing the material to be detected. Through the control of the first electrically operated gate valve 4 and the second electrically operated gate valve 5, the communication or isolation between the chambers can be realized, ensuring the safe transfer of the material between different chambers. Moreover, the three-stage chamber structure can provide a high-cleanliness detection environment, ensuring the high-cleanliness requirement of the material during the transfer process.

[0060] Simultaneously, the first gas supply device 6, the first vacuum device 7, the second gas supply device 8, and the second vacuum device 9 are respectively connected to the detection chamber 1 and the transition chamber 2. This allows the main control device 12 to automatically adjust the gas supply and vacuum devices based on the pressure values ​​obtained from the first pressure sensor 10 and the second pressure sensor 11, precisely controlling the internal air pressure of the chambers and ensuring that the absolute value of the pressure difference between the chambers is within the preset expected range. This automated pressure monitoring and control not only improves operational efficiency and reduces the risks of manual operation but also ensures the stability and reliability of semiconductor product testing, thereby improving the quality and production efficiency of semiconductor products.

[0061] In one embodiment, such as Figure 1 As shown, the multi-chamber system may further include a temperature sensor 13, which is installed inside the detection chamber 1 and communicates with the main control device 12. The main control device 12 monitors the temperature in the detection chamber 1 in real time through the temperature sensor 13 to help control the temperature of the detection environment.

[0062] In one embodiment, such as Figure 1 As shown, both the first vacuum pumping device 7 and the second vacuum pumping device 9 are equipped with liquid-cooled pipelines 100. The multi-stage chamber system also includes a leak sensor 14, which is installed in the liquid-cooled pipeline 100 and is communicatively connected to the main control device 12. The main control device 12 can promptly determine whether the liquid-cooled pipeline 100 is leaking through the leak sensor 14, thereby detecting the leak problem in a timely manner and taking corresponding remedial measures to prevent the leaked liquid from damaging the equipment.

[0063] In one embodiment, the leakage sensor 14 may include a leakage controller and a leakage detection rope (not shown in the figure). The leakage detection rope extends along the liquid cooling pipeline 100 and is communicatively connected to the leakage controller. The leakage controller is communicatively connected to the main control device 12.

[0064] It should be noted that the principle of the leak detection rope is mainly based on the change in the conductivity of the liquid to detect the occurrence of leaks. Specifically, the leak detection rope typically consists of a spiral frame and a set of two conductive cores. These two conductive cores are attached to both sides of the spiral frame and are normally insulated by the spiral frame. When the leak detection rope comes into contact with water or other liquids, the liquid forms a low-resistance path between the conductive cores, causing a change in current. The detection circuit in the leak controller monitors this change in resistance. Once the change reaches a set threshold, it triggers an alarm system or shuts down the relevant equipment to prevent further liquid leakage or damage to the equipment. This working principle allows the leak detection rope to monitor potential leaks in real time, ensuring that any minor leak in the liquid cooling pipeline 100 can be quickly detected and dealt with. This design of the leak detection rope allows it to be freely arranged according to the actual path of the liquid cooling pipeline 100, covering the complex routing of the liquid cooling pipeline 100, and can be easily deployed even in confined spaces.

[0065] In one embodiment, such as Figure 2 and Figure 3 As shown, the first vacuum pumping device 7 may include an A1 vacuum pump 71, an A2 vacuum pump 72, a first main pipeline 73, an A1 branch pipeline 74, an A2 branch pipeline 75, an A1 electric valve 76, and an A2 electric valve 77. One end of the first main pipeline 73 is connected to the detection chamber 1, and the other end is connected in parallel to the A1 branch pipeline 74 and the A2 branch pipeline 75. The end of the A1 branch pipeline 74 is connected to the A1 vacuum pump 71, and the end of the A2 branch pipeline 75 is connected to the A2 vacuum pump 72. The A1 electric valve 76 is installed on the A1 branch pipeline 74, and the A2 electric valve 77 is installed on the A2 branch pipeline 75. The A1 vacuum pump 71, the A2 vacuum pump 72, the A1 electric valve 76, and the A2 electric valve 77 are communicatively connected to the main control device 12. Liquid cooling pipelines 100 are provided on the outside of the A1 vacuum pump 71 and the A2 vacuum pump 72. For example, the liquid cooling pipelines 100 can be wound around the vacuum pumps to achieve a good liquid cooling effect.

[0066] Specifically, the main control device 12 performs the vacuumizing operation on the detection chamber 1 by using the first vacuumizing device 7, which mainly includes a first stage and a second stage. The main control device 12 pre-stores an intermediate vacuum negative pressure value m and a final vacuum negative pressure value n. In the first stage, the main control device 12 controls one of the A1 electric valve 76 and the A2 electric valve 77 to be opened, and the vacuum pump corresponding to the opened electric valve is also opened, that is, only one vacuum pump is used to perform the vacuumizing operation on the detection chamber 1 at this time. When the main control device 12 detects that the negative pressure value in the detection chamber 1 reaches the intermediate vacuum negative pressure value m through the first pressure sensor 10, the second stage is entered. In the second stage, the main control device 12 controls the A1 electric valve 76 and the A2 electric valve 77 to be all opened, and controls the A1 vacuum pump 71 and the A2 vacuum pump 72 to be all opened, so as to perform the vacuumizing operation on the detection chamber 1 by using the A1 vacuum pump 71 and the A2 vacuum pump 72. When the main control device 12 detects that the negative pressure value in the detection chamber 1 reaches the final vacuum negative pressure value n through the first pressure sensor 10, the A1 electric valve 76 and the A2 electric valve 77 are closed, and the A1 vacuum pump 71 and the A2 vacuum pump 72 are closed, thereby completing the vacuumizing operation on the detection chamber 1.

[0067] In an embodiment, as shown in Figure 2 and Figure 3 The second vacuumizing device 9 can include the B1 vacuum pump 91, the B2 vacuum pump 92, the second main pipeline 93, the B1 branch pipeline 94, the B2 branch pipeline 95, the B1 electric valve 96, and the B2 electric valve 97. One end of the second main pipeline 93 is connected to the transition chamber 2, and the other end is connected in parallel to the B1 branch pipeline 94 and the B2 branch pipeline 95. The B1 branch pipeline 94 is connected to the B1 vacuum pump 91 at the end, and the B2 branch pipeline 95 is connected to the B2 vacuum pump 92 at the end. The B1 electric valve 96 is arranged on the B1 branch pipeline 94, and the B2 electric valve 97 is arranged on the B2 branch pipeline 95. The B1 vacuum pump 91, the B2 vacuum pump 92, the B1 electric valve 96, and the B2 electric valve 97 are in communication connection with the main control device 12. The liquid cooling pipeline 100 is arranged outside the B1 vacuum pump 91 and the B2 vacuum pump 92.

[0068] It should be noted that the working principle of the main control device 12 performing the vacuumizing operation on the transition chamber 2 by using the second vacuumizing device 9 is the same as the working principle of the main control device 12 performing the vacuumizing operation on the detection chamber 1 by using the first vacuumizing device 7, which will not be described here.

[0069] In an embodiment, as shown in Figure 2As shown, a first conveying passage 43 can be arranged between the detection chamber 1 and the transition chamber 2. The first electrically-driven gate valve 4 comprises a first driver 41 and a first gate structure 42 arranged in the first conveying passage 43, and the first driver 41 drives the first gate structure 42 to act to close or open the first conveying passage 43. The first driver 41 is in communication connection with the main control device 12.

[0070] Specifically, when the main control device 12 calculates the absolute value of the difference between the internal pressure of the detection chamber 1 and the internal pressure of the transition chamber 2, and the absolute value is less than or equal to the second expected difference value, the main control device 12 controls the first driver 41 to open the first gate structure 42, so as to communicate the detection chamber 1 and the transition chamber 2, thereby facilitating the conveying of materials between the detection chamber 1 and the transition chamber 2.

[0071] In an embodiment, as shown, Figure 2 A second conveying passage 53 can be arranged between the transition chamber 2 and the loading and unloading chamber 3. The second electrically-driven gate valve 5 comprises a second driver 51 and a second gate structure 52 arranged in the second conveying passage 53, and the second driver 51 drives the second gate structure 52 to act to close or open the second conveying passage 53. The second driver 51 is in communication connection with the main control device 12.

[0072] Specifically, when the main control device 12 calculates the absolute value of the difference between the internal pressure of the loading and unloading chamber 3 (generally equal to atmospheric pressure) and the internal pressure of the transition chamber 2, and the absolute value is less than or equal to the first expected difference value, the main control device 12 controls the second driver 51 to open the second gate structure 52, so as to communicate the loading and unloading chamber 3 and the transition chamber 2, thereby facilitating the conveying of materials between the loading and unloading chamber 3 and the transition chamber 2.

[0073] In an embodiment, the first driver 41 and the second driver 51 can adopt, but are not limited to, a pneumatic cylinder, a hydraulic cylinder, an electric push rod, a lead screw module, a synchronous belt module, a mechanical arm, etc. The position where the first gate structure 42 contacts the first conveying passage 43 can be provided with a groove structure (not shown in the figure) to form a guiding effect on the first gate structure 42, and a sealing strip structure can be arranged in the groove structure to form a good sealing effect when the first gate structure 42 is closed. Similarly, the position where the second gate structure 52 contacts the second conveying passage 53 can be provided with a groove structure (not shown in the figure) to form a guiding effect on the second gate structure 52, and a sealing strip structure can be arranged in the groove structure to form a good sealing effect when the second gate structure 52 is closed.

[0074] In an embodiment, as shown, Figures 1 to 6As shown, the multi-chamber system includes a detection component 15, a first conveying mechanism 16, and a second conveying mechanism 17, all communicatively connected to the main control device 12. The detection component 15 is located within the detection chamber 1 and is used to detect semiconductor products. The first conveying mechanism 16 is located within the transition chamber 2 and is used to transfer semiconductor products between the transition chamber 2 and the detection chamber 1. The second conveying mechanism 17 is located within the loading / unloading chamber 3 and is used to transfer semiconductor products between the loading / unloading chamber 3 and the transition chamber 2. The first conveying mechanism 16 and the second conveying mechanism 17 can be multi-degree-of-freedom robotic arms with grippers (for picking up objects) or trays (for lifting objects), synchronous belt modules, lead screw modules, etc.

[0075] In one embodiment, the multi-chamber system may be equipped with a first alarm and a second alarm, both of which are communicatively connected to the main control device 12. The first alarm and the second alarm may be audible and visual alarms.

[0076] Specifically, the main control device 12 calculates the absolute value of the first difference between the internal pressure of the detection chamber 1 and the internal pressure of the transition chamber 2. When the absolute value of the first difference is less than or equal to the first difference threshold, the main control device 12 controls the first alarm to sound, reminding the operator that the first electric valve 4 can be opened. The main control device 12 calculates the absolute value of the second difference between the internal pressure of the loading / unloading chamber 3 (generally equal to atmospheric pressure) and the internal pressure of the transition chamber 2. When the absolute value of the second difference is less than or equal to the second difference threshold, the main control device 12 controls the second alarm to sound, reminding the operator that the second electric valve 5 can be opened.

[0077] Furthermore, in one embodiment, as Figure 3 As shown, the multi-chamber system includes an operator terminal device 18, which is communicatively connected to the main control device 12. The operator terminal device 18 includes at least an input module and a display module. The operator terminal device 18 can be a desktop computer, laptop, tablet, mobile phone, industrial computer, etc. The input module can be a physical keyboard, a virtual keyboard on a touch screen, a physical mouse, etc., and the display module can be an LCD screen, LED display screen, OLED display screen, etc.

[0078] The main control device 12 can send the internal pressure data of the transition chamber 2 obtained in real time through the second pressure sensor 11, the internal pressure data of the detection chamber 1 obtained through the first pressure sensor 10, the internal temperature data of the detection chamber 1 obtained through the temperature sensor 13, and the leakage information of the liquid cooling pipeline 100 obtained through the leakage sensor 14 to the operation terminal device 18 and display them through the display module so that relevant personnel can view and record them.

[0079] In addition, the staff can also input instructions through the input module of the terminal device 18 and send them to the host device 12 to control the operation of the relevant electrical components.

[0080] Specifically, as shown in Figure 4 The host device 12 includes an environment detection module 121, which includes an environment parameter host module, a collection module, an air pressure detection interface, a liquid leakage detection interface, and a temperature detection interface. The air pressure detection interface, the liquid leakage detection interface, and the temperature detection interface are circuit-connected with the collection module. The collection module is circuit-connected with the environment parameter host module, and the environment parameter host module is communication-connected with the terminal device 18. The air pressure detection interface is circuit-connected with the first pressure sensor 10 and the second pressure sensor 11, the liquid leakage detection interface is circuit-connected with the liquid leakage sensor 14, and the temperature detection interface is circuit-connected with the temperature sensor 13. The collection module is used to receive the electrical signals of the first pressure sensor 10, the second pressure sensor 11, and the temperature sensor 13, and send them to the environment parameter host module after signal amplification and analog-digital conversion, and further send them to the terminal device 18. The collection module is used to receive the electrical signal of the liquid leakage sensor 14, and send it to the environment parameter host module after level conversion, and further send it to the terminal device 18.

[0081] In addition, as shown in Figure 4 The host device 12 can also include an action control module 122 that is communication-connected with the terminal device 18, and the terminal device 18 is communication-connected with the first and second air supply devices, the first and second vacuum pumping devices, the first and second electrically-operated gate valves, and the first and second conveying mechanisms to control the start-stop or operation of the relevant equipment.

[0082] In an embodiment, as shown in Figure 5 The collection module of the environment detection module 121 can include a precision amplifier, an operational amplifier, an ADC circuit, a level conversion module, etc., and the environment parameter host module can include a single-chip microcomputer, an Ethernet port, etc.

[0083] Specifically, after the air pressure signals collected by the first pressure sensor 10 and the second pressure sensor 11 are converted into electrical signals and operated by the operational amplifier, they are collected by the ADC to the environment parameter host module, and then uploaded to the terminal device 18 (such as a PC) in the upper layer, so that the pressure values measured by each pressure sensor can be directly read by the terminal device 18 without manual reading.

[0084] The electrical signal affected by temperature collected by the temperature sensor 13 is operated by the precision amplifier, and then collected by the ADC to the environment parameter host module, and then uploaded to the terminal device 18 in the upper layer, so that the temperature in the detection chamber can be accurately and conveniently read out. The accurate reading and detection control of the temperature are crucial for the measurement accuracy of the semiconductor detection equipment.

[0085] The leakage sensor 14 outputs a general closed or open switch signal, which cannot be directly read by the single-chip microcomputer, and therefore a level conversion module can be used to facilitate reading of the signal of the leakage sensor 14.

[0086] In addition, the environmental parameter master control module and the operation terminal device 18 can perform data transmission through a TCP / IP communication mode.

[0087] In an embodiment, as shown in Figure 6 , the feeding and discharging chamber 3 can be a sealed chamber, which is provided with an openable and closable third electric gate valve (not shown in the figure), and is further provided with a third pressure sensor 19, a third gas supply device 20 and a third vacuum pumping device 21 which are in communication connection with the master control device 12.

[0088] The master control device 12 controls the third gas supply device 20 and / or the third vacuum pumping device 21 to adjust the internal pressure of the feeding and discharging chamber 3, and the master control device 12 obtains the internal pressure of the feeding and discharging chamber 3 through the third pressure sensor 19, and performs difference calculation with the obtained internal pressure of the transition chamber 2 to obtain a difference absolute value, and if the difference absolute value does not exceed a third expected difference value, the second electric gate valve 5 can be opened to transfer the material between the feeding and discharging chamber 3 and the transition chamber 2.

[0089] In addition, when transferring the material between the feeding and discharging chamber 3 and the outside, the master control device 12 obtains the internal pressure of the feeding and discharging chamber 3 through the third pressure sensor 19, and performs difference calculation with the atmospheric pressure value of the outside to obtain a third difference absolute value, and if the third difference absolute value does not exceed a third difference threshold value preset in the master control device 12, the third electric gate valve can be opened to transfer the material between the feeding and discharging chamber 3 and the outside.

[0090] Among them, the feeding and discharging chamber 3 is provided with the third electric gate valve, the third pressure sensor 19, the third gas supply device 20 and the third vacuum pumping device 21, which can further regulate and control the internal pressure of the multi-stage chamber structure, reduce the pressure loss and reduce the energy consumption.

[0091] In an embodiment, as shown in Figure 2 and Figure 3 , the first gas supply device 6 can include a first gas source mechanism 61, a first electric valve 62 and a first filter 63, the first gas source mechanism 61 and the first electric valve 62 are in communication connection with the master control device 12, the first filter 63 and the first electric valve 62 are arranged on the communication pipeline between the first gas source mechanism 61 and the detection chamber 1, and the first filter 63 is used to filter the gas entering the detection chamber 1 to ensure the cleanliness of the gas delivered into the detection chamber 1.

[0092] In an embodiment, as shown in Figure 2 andFigure 3 As shown, the second gas supply device 8 can include a second gas source mechanism 81, a second electric valve 82, and a second filter 83. The second gas source mechanism 81 and the second electric valve 82 are in communication connection with the main control device 12. The second filter 83 and the second electric valve 82 are arranged on a communication pipeline between the second gas source mechanism 81 and the transition chamber 2. The second filter 83 is used to filter the gas entering the transition chamber 2, so as to ensure the cleanliness of the gas delivered into the transition chamber 2.

[0093] The above merely shows some embodiments of the present application and is not intended to limit the present application. Those skilled in the art can make various modifications and changes to the present application. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A multi-stage chamber system for semiconductor inspection, comprising: The application relates to a multi-stage chamber structure, which comprises a detection chamber (1), a transition chamber (2) and a feeding chamber (3) arranged in sequence; the internal pressure value of the feeding chamber (3) is always equal to the atmospheric pressure value; a first electrically-driven door valve (4) is arranged to open or close the detection chamber (1) to communicate or isolate the detection chamber (1) and the transition chamber (2); a second electrically-driven door valve (5) is arranged to open or close the transition chamber (2) to communicate or isolate the transition chamber (2) and the feeding chamber (3); a first pressure sensor (10) is arranged in the detection chamber (1); a second pressure sensor (11) is arranged in the transition chamber (2); a main control device (12) is connected with the first pressure sensor (10), the second pressure sensor (11), the first electrically-driven door valve (4) and the second electrically-driven door valve (5); the main control device (12) obtains the internal pressure value of the detection chamber (1) through the first pressure sensor (10) and records the value as a first pressure value; the main control device (12) obtains the internal pressure value of the transition chamber (2) through the second pressure sensor (11) and records the value as a second pressure value; the internal pressure value of the feeding chamber (3) is recorded as a third pressure value; the first difference threshold value and the second difference threshold value are pre-stored in the main control device (12); the main control device (12) compares the first pressure value and the second pressure value, obtains a first difference absolute value, and judges whether the first difference absolute value is greater than the first difference threshold value; if not, the first electrically-driven door valve (4) is controlled to be opened; if yes, the first electrically-driven door valve (4) is controlled to be kept closed; the main control device (12) compares the second pressure value and the third pressure value, obtains a second difference absolute value, and judges whether the second difference absolute value is greater than the second difference threshold value; if not, the second electrically-driven door valve (5) is controlled to be opened; if yes, the second electrically-driven door valve (5) is controlled to be kept closed. The application further relates to a first gas supply device (6) and a first vacuum pumping device (7) connected with the detection chamber (1), wherein the first gas supply device (6) is used for conveying a first predetermined gas to the detection chamber (1), and the first vacuum pumping device (7) is used for pumping the detection chamber (1); a second gas supply device (8) and a second vacuum pumping device (9) connected with the transition chamber (2), wherein the second gas supply device (8) is used for conveying a predetermined gas to the transition chamber (2), and the second vacuum pumping device (9) is used for pumping the transition chamber (2); the main control device (12) is connected with the first gas supply device (6), the first vacuum pumping device (7), the second gas supply device (8) and the second vacuum pumping device (9). ​ ​ ​ ​ ​ ​ ​ ​ ​ 2. The multi-stage chamber system of claim 1, wherein, ​ ​ ​ ​ The main control device (12) controls the first air supply device (6) and / or the first vacuum device (7) to work, so as to adjust the internal air pressure of the detection chamber (1); the main control device (12) controls the second air supply device (8) and / or the second vacuum device (9) to work, so as to adjust the internal air pressure of the transition chamber (2).

3. The multi-stage chamber system of claim 2, wherein, A temperature sensor (13) is further included, which is arranged in the detection chamber (1) and is in communication connection with the main control device (12); The first vacuum device (7) and the second vacuum device (9) are both provided with a liquid cooling pipeline (100); The multi-stage chamber system further includes a liquid leakage sensor (14) arranged in the liquid cooling pipeline (100) and in communication connection with the main control device (12).

4. The multi-stage chamber system of claim 3, wherein, The first vacuum device (7) includes an A1 vacuum pump (71), an A2 vacuum pump (72), a first main pipeline (73), an A1 branch pipeline (74), an A2 branch pipeline (75), an A1 electric valve (76), and an A2 electric valve (77); One end of the first main pipeline (73) is communicated with the detection chamber (1), and the other end is connected in parallel with the A1 branch pipeline (74) and the A2 branch pipeline (75); the A1 branch pipeline (74) is communicated with the A1 vacuum pump (71) at the tail end; and the A2 branch pipeline (75) is communicated with the A2 vacuum pump (72) at the tail end. The A1 electric valve (76) is arranged on the A1 branch pipeline (74), and the A2 electric valve (77) is arranged on the A2 branch pipeline (75). The A1 vacuum pump (71), the A2 vacuum pump (72), the A1 electric valve (76), and the A2 electric valve (77) are in communication connection with the main control device (12). The liquid cooling pipeline (100) is arranged outside the A1 vacuum pump (71) and the A2 vacuum pump (72).

5. The multi-stage chamber system of claim 4, wherein, The second vacuum device (9) includes a B1 vacuum pump (91), a B2 vacuum pump (92), a second main pipeline (93), a B1 branch pipeline (94), a B2 branch pipeline (95), a B1 electric valve (96), and a B2 electric valve (97); One end of the second main pipeline (93) is communicated with the transition chamber (2), and the other end is connected in parallel with the B1 branch pipeline (94) and the B2 branch pipeline (95); the B1 branch pipeline (94) is communicated with the B1 vacuum pump (91) at the tail end; and the B2 branch pipeline (95) is communicated with the B2 vacuum pump (92) at the tail end. The B1 electric valve (96) is arranged on the B1 branch pipeline (94), and the B2 electric valve (97) is arranged on the B2 branch pipeline (95). The B1 vacuum pump (91), the B2 vacuum pump (92), the B1 electric valve (96), and the B2 electric valve (97) are in communication connection with the main control device (12). The liquid cooling pipeline (100) is arranged outside the B1 vacuum pump (91) and the B2 vacuum pump (92).

6. The multi-stage chamber system of any one of claims 3 to 5, wherein, The leakage sensor (14) comprises a leakage master controller and a leakage detection rope, the leakage detection rope is arranged along the liquid cooling pipeline (100), the leakage detection rope is in communication connection with the leakage master controller, and the leakage master controller is in communication connection with the master control device (12).

7. The multi-stage chamber system of claim 1, wherein, A first conveying channel (43) is arranged between the detection chamber (1) and the transition chamber (2); The first electrically operated gate valve (4) comprises a first driver (41) and a first gate structure (42), the first gate structure (42) is arranged in the first conveying channel (43), and the first driver (41) drives the first gate structure (42) to act to close or open the first conveying channel (43); The first driver (41) is in communication connection with the master control device (12).

8. The multi-stage chamber system of claim 1, wherein, A second conveying channel (53) is arranged between the transition chamber (2) and the feeding and discharging chamber (3); The second electrically operated gate valve (5) comprises a second driver (51) and a second gate structure (52), the second gate structure (52) is arranged in the second conveying channel (53), and the second driver (51) drives the second gate structure (52) to act to close or open the second conveying channel (53); The second driver (51) is in communication connection with the master control device (12).

9. The multi-stage chamber system of claim 1, wherein, The detection assembly (15), the first conveying mechanism (16) and the second conveying mechanism (17) are arranged in the detection chamber (1), the first conveying mechanism (16) is arranged in the transition chamber (2), and the second conveying mechanism (17) is arranged in the feeding and discharging chamber (3). The detection assembly (15) is arranged in the detection chamber (1) and is used for detecting semiconductor products; The first conveying mechanism (16) is arranged in the transition chamber (2) and is used for transferring semiconductor products between the transition chamber (2) and the detection chamber (1); The second conveying mechanism (17) is arranged in the feeding and discharging chamber (3) and is used for transferring semiconductor products between the feeding and discharging chamber (3) and the transition chamber (2).

10. The multi-stage chamber system of claim 3, wherein, The operation end device (18) is in communication connection with the master control device (12), and the operation end device (18) at least comprises an input module and a display module; The master control device (12) comprises an environment detection module (121), the environment detection module (121) comprises an environment parameter master control module, an acquisition module, an air pressure detection interface, a leakage detection interface and a temperature detection interface; The air pressure detection interface, the leakage detection interface and the temperature detection interface are in circuit connection with the acquisition module; The acquisition module is in circuit connection with the environment parameter master control module, and the environment parameter master control module is in communication connection with the operation end device (18); The air pressure detection interface is in circuit connection with the first pressure sensor (10) and the second pressure sensor (11), the leakage detection interface is in circuit connection with the leakage sensor (14), and the temperature detection interface is in circuit connection with the temperature sensor (13); The acquisition module is used for receiving the electrical signals of the first pressure sensor (10), the second pressure sensor (11) and the temperature sensor (13), and sending the signals to the environmental parameter master control module after signal amplification and analog-digital conversion, and further sending the signals to the operation end device (18); The acquisition module is used for receiving the electrical signals of the liquid leakage sensor (14), and sending the signals to the environmental parameter master control module after level conversion, and further sending the signals to the operation end device (18).

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