Ultra-wideband black matt film

By superimposing four matting film layers and a SiO2 layer on the surface of optical components, and utilizing the properties of variable valence metal oxides and SiO2, the problems of narrow application spectrum and low production efficiency of black matting film for optical components in existing technologies have been solved, achieving wide-band matting and high-efficiency production.

CN223565917UActive Publication Date: 2025-11-18ZHONGSHAN FLASHLIGHT POLYTECHNIC +1
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Patent Information

Application Number
CN202422361836.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-09-26
Publication Date
2025-11-18
Estimated Expiration
2034-09-26

AI Technical Summary

Technical Problem

In the existing technology, the black matting film for optical components has a narrow application spectrum, and the preparation process is complicated, with many types of raw materials and low production efficiency, which cannot meet the wide-band matting requirements.

Method used

At least four extinction layers are stacked on the surface of optical components, including a variable valence metal oxide extinction film layer and a SiO2 layer. By combining extinction film layers and SiO2 layers of different thicknesses, the high absorption characteristics of variable valence metal oxide in the visible and near-infrared regions are utilized, along with the high transmittance and refractive index of SiO2, to achieve wide-band extinction using only two film materials.

Benefits of technology

It achieves wide-band extinction in the 400-1100nm range, simplifies the production process, reduces the types of raw materials, and improves production efficiency.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses an ultra-wide-band black matt film, which comprises at least four matt laminated layers which are sequentially arranged on the surface of an optical part, and each matt laminated layer comprises a matt film layer and a SiO2 layer which are sequentially arranged from one side close to the optical part to one side far away from the optical part, a matt film material in the matt film layer is an oxide of a valence-variable metal, and the refractive index of the matt film layer to visible light to near-infrared band is 2.3-2.6. The characteristic of high extinction coefficient of variable valence metal oxide is utilized, the surface reflectivity of the matt film layer is reduced by utilizing high transmittance and refractive index of silicon dioxide, and the matt film layer and the SiO2 film layer are combined by adjusting different thicknesses of the matt film layer and the SiO2 film layer, so that the matt film can be applied to extinction of light with the spectral range of 400-1100nm, and a broadband black matt film layer is obtained; and the matt film is prepared only by using two film materials, namely the oxide of the variable-valence metal and the silicon dioxide, so that the raw material sources are fewer, and the production process is simpler.
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Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of optical coating produced after coating or surface treatment of the surface of an optical element, and in particular to an ultra-wideband black light extinction film. BACKGROUND

[0002] The existing surface light extinction of optical parts is usually achieved by coating light extinction ink, which has many procedures, low production efficiency, thick light extinction film and poor high temperature resistance. Another film preparation method is to prepare a black light extinction film by vacuum plating, which has small film thickness, high production efficiency and good high temperature resistance. The commonly used application spectrum range of the black light extinction film prepared by the vacuum plating method is the visible light band of 420-680 nm, and the application band is narrow. The black light extinction film is generally prepared by plating three or more film materials. SUMMARY

[0003] The present application aims to solve at least one of the technical problems existing in the prior art. To this end, the present application provides an ultra-wideband black light extinction film with fewer types of film materials and suitable for a larger spectrum range, which adopts the technical scheme of:

[0004] An ultra-wideband black light extinction film, which comprises at least four light extinction layers arranged in sequence on the surface of an optical part, each light extinction layer comprising a light extinction film layer and a SiO2 layer arranged in sequence from the side close to the optical part to the side away from the optical part, wherein the light extinction film material in the light extinction film layer is an oxide of a variable valence metal, and the refractive index of the light extinction film layer to the visible light to near-infrared band is 2.3-2.6.

[0005] In an embodiment of the present application, the variable valence metal is nickel.

[0006] In an embodiment of the present application, the surface of the optical part is sequentially provided with the first light extinction film layer, the first SiO2 layer, the second light extinction film layer, the second SiO2 layer, the third light extinction film layer, the third SiO2 layer, the fourth light extinction film layer and the fourth SiO2 layer from the side close to the optical part to the side away from the optical part.

[0007] In an embodiment of the present application, the thickness d1 of the light extinction film layer is 0

[0008] In an embodiment of the present application, the thickness d11 of the first light extinction film layer is 40

[0009] The technical scheme adopted by the embodiment of the utility model for solving the technical problems thereof is: the thickness d12 of the second extinction film layer is 20≤d12≤70nm; the thickness d22 of the second SiO2 layer is 0<d22≤40nm.

[0010] The technical scheme adopted by the embodiment of the utility model for solving the technical problems thereof is: the thickness d13 of the third extinction film layer is 20≤d13≤70nm; the thickness d23 of the third SiO2 layer is 50≤d23≤100nm.

[0011] The technical scheme adopted by the embodiment of the utility model for solving the technical problems thereof is: the thickness d14 of the fourth extinction film layer is 0<d14≤40nm; the thickness d24 of the fourth SiO2 layer is 60≤d24≤150nm.

[0012] The technical scheme adopted by the embodiment of the utility model for solving the technical problems thereof is: the optical part is a glass substrate.

[0013] The utility model has the advantages of:

[0014] The application realizes that the extinction film can be applied to the extinction of light with a light spectrum range of 400-1100nm by at least four extinction film layers being superimposed on the surface of the optical part, the high extinction coefficient and good absorption of light in the visible light and near-infrared regions of the variable valence metal oxide, the high transmittance and refractive index of the silicon dioxide for reducing the surface reflectivity of the extinction film layer, and the combination of the extinction film layer and the SiO2 film layer with different thicknesses, and a wide-band black extinction film layer is obtained, and the application range is wider.

[0015] The preparation of the extinction film only uses two kinds of film materials of the variable valence metal oxide and the silicon dioxide, the raw material sources are fewer, and the production process is simpler. DRAWINGS

[0016] The above and / or additional aspects and advantages of the utility model will become apparent and more readily appreciated from the following description of the embodiments, with reference to the following drawings, in which:

[0017] Figure 1 The structure diagram of the ultra-wideband black extinction film is shown in the embodiment of the application

[0018] Figure 2 The transmittance and reflectance curves of the ultra-wideband black extinction are shown in the embodiment of the application. DETAILED DESCRIPTION

[0019] The detailed embodiments of the utility model will be described in this part, the preferred embodiment of the utility model is shown in the drawings, the role of the drawings is to supplement the description of the written part with graphics, so that people can intuitively and visually understand each technical feature and the overall technical scheme of the utility model, but it cannot be understood as limiting the protection scope of the utility model.

[0020] In the description of the utility model, the meaning of multiple is more than two, greater than, less than, more than, etc. is not included in the number, above, below, etc. is included in the number. If it is described as first, second, it is only used for distinguishing technical features for the purpose, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features or implicitly indicating the sequence of indicated technical features.

[0021] In the description of the utility model, it is understood that the orientation description, such as the orientation or position relationship indicated by up, down, front, back, left, right, etc. is based on the orientation or position relationship shown in the drawings, which is only for the convenience of describing the utility model and simplifying the description, and is not used to indicate or imply that the device or element indicated must have a specific orientation, be constructed and operated in a specific orientation, so it cannot be understood as limiting the utility model.

[0022] In the utility model, unless otherwise explicitly limited, the words such as "set", "install", "connect" should be understood broadly, for example, it can be directly connected, or indirectly connected through intermediate medium; it can be fixedly connected, or detachably connected, or integrally formed; it can be mechanically connected; it can be the communication or interaction relationship between two elements. The skilled in the art can reasonably determine the specific meaning of the above words in the utility model according to the specific content of the technical scheme.

[0023] The ultra-wideband black light extinction film described in the application comprises at least four extinction layers arranged in sequence on the surface of the optical part 90, each extinction layer comprises an extinction film layer and a SiO2 layer arranged in sequence from the side close to the optical part 90 to the side away from the optical part 90, wherein the extinction film material in the extinction film layer is the oxide of variable valence metal, and the refractive index of the extinction film layer to the visible light to near infrared wave band is 2.3-2.6.

[0024] Referring to the drawings Figure 1 As shown in the drawings, the ultra-wideband black light extinction film described in the embodiment adopts the following scheme, which is coated on a glass substrate and comprises a first extinction film layer 10, a first SiO2 layer 20, a second extinction film layer 30, a second SiO2 layer 40, a third extinction film layer 50, a third SiO2 layer 60, a fourth extinction film layer 70 and a fourth SiO2 layer 80 arranged in sequence from the bottom layer to the surface layer.

[0025] The application is stacked on the surface of the optical part through at least four extinction film layers, uses the variable valence metal oxide which has good absorption effect on visible light and near infrared region and high extinction coefficient, and then uses the high transmittance and refractive index of the silicon dioxide to reduce the surface reflectivity of the extinction film layer, and adjusts the different thicknesses of the extinction film layer and the SiO2 film layer to realize the application of the extinction film in the extinction of the light with a spectral range of 400-1100nm, obtains the wide-band black extinction film layer, and has a wider application range.

[0026] Since the film plating method is the method of depositing film on the substrate finally by the ion source assisted electron beam evaporation, the film plating is performed by controlling the electron motion trajectory in the electric field by using the special distribution of the magnetic field, so that the film plating thickness and uniformity are controllable, and when the extinction film layer is produced, only the evaporation rate and the film plating time need to be changed, without the need of replacing the target material, so that the production is more convenient. The specific film plating process in the embodiment is shown in Table 1.

[0027] Table 1

[0028]

[0029]

[0030] Based on the above content, the specific embodiment of the application is proposed, and the wide-band black extinction film plating parameters in the embodiment are shown in Table 2.

[0031] Table 2

[0032] Serial number Material Thickness (nm) 1 Matte film layer 69.79 2 SiO2layer 157.63 3 Matte film layer 25.3 4 SiO2layer 26.19 5 Matte film layer 44.48 6 SiO2layer 61.42 7 Matte film layer 19.73 8 SiO2layer 79.7

[0033] The light transmittance and reflectance coefficient curve of the wide-band black extinction film obtained in the above embodiment in the visible light and near infrared range is shown in Figure 2

[0034] Of course, the utility model is not limited to the above-mentioned implementation, and the skilled person in the art can also make equivalent transformation or replacement without departing from the spirit of the utility model, and these equivalent transformations and replacements are all included in the range defined by the claims of the application.​

Claims

1. An ultra-wideband black light extinction film, characterized by, The optical part (90) comprises at least four extinction layers arranged in sequence on the surface of the optical part (90), each of the extinction layers comprises an extinction film layer and a SiO2 layer arranged in sequence from the side close to the optical part (90) to the side away from the optical part (90), wherein the extinction film material in the extinction film layer is an oxide of metallic nickel, and the extinction film layer has a refractive index of 2.3-2.6 for visible light to near-infrared waveband.

2. The ultra-wideband black light extinction film of claim 1, wherein, The surface of the optical part (90) is provided with a first extinction film layer (10), a first SiO2 layer (20), a second extinction film layer (30), a second SiO2 layer (40), a third extinction film layer (50), a third SiO2 layer (60), a fourth extinction film layer (70), and a fourth SiO2 layer (80) arranged in sequence from the side close to the optical part (90) to the side away from the optical part (90).

3. The ultra-wideband black light extinction film of claim 2, wherein, The thickness d1 of the extinction film layer is 0 4. The ultra-wideband black light extinction film of claim 3, wherein, The thickness d11 of the first extinction film layer (10) is 40≤d11≤80nm; and the thickness d21 of the first SiO2 layer (20) is 120≤d21≤200nm.

5. The ultra-wideband black light extinction film of claim 3, wherein, The thickness d12 of the second extinction film layer (30) is 20≤d12≤70nm; and the thickness d22 of the second SiO2 layer (40) is 0 6. The ultra-wideband black light extinction film of claim 3, wherein, The thickness d13 of the third extinction film layer (50) is 20≤d13≤70nm; and the thickness d23 of the third SiO2 layer (60) is 50≤d23≤100nm.

7. The ultra-wideband black light extinction film of claim 3, wherein, The thickness d14 of the fourth extinction film layer (70) is 0 8. The ultra-wideband black light extinction film of claim 1, wherein, The optical part (90) is glass.