Cold trap device and CVD (Chemical Vapor Deposition) treatment equipment

By constructing a zigzag channel and labyrinth structure in the cold trap device, the problems of insufficient cooling capacity and low trapping efficiency are solved, achieving efficient trapping and stable cooling of gas, which is suitable for CVD processing equipment.

CN223602040UActive Publication Date: 2025-11-28WUXI LEADPRO TECH CO LTD
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Patent Information

Application Number
CN202423212245.9
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-25
Publication Date
2025-11-28
Estimated Expiration
2034-12-25

AI Technical Summary

Technical Problem

Existing cold trap devices have insufficient cooling capacity and low capture efficiency, failing to meet the processing requirements for large volumes and mixed gases with multiple volatile components.

Method used

A cold trap device is designed to increase the contact opportunities between gas molecules and the surface of the cooling components by constructing zigzag channels and a labyrinth structure in the processing chamber, thereby forming a stable temperature gradient, optimizing the gas flow path, and improving the cooling effect and trapping efficiency.

Benefits of technology

It improves the capture efficiency of large molecules in gases, enhances the zoned cooling capacity for gases with different boiling points, ensures equipment stability and product collection effect, and extends the service life of the filter.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a cold trap device and CVD processing equipment, and belongs to the technical field of semiconductor processing equipment. The cold trap device comprises a shell and a plurality of cooling assemblies, the shell is provided with a processing chamber, the shell comprises a first wall and a second wall which are arranged at intervals in the vertical direction and a side wall located between the first wall and the second wall, the side wall is connected with the first wall and the second wall, and the processing chamber is defined by the side wall and the first wall and the second wall; the plurality of cooling assemblies are mutually sleeved and arranged in the treatment chamber at intervals, in every two adjacent cooling assemblies, one cooling assembly is connected with the first wall, and the other cooling assembly is connected with the second wall, so that the internal space of the treatment chamber is divided, and a zigzag channel is formed. Through the zigzag channel formed by matching the two adjacent cooling assemblies and the shell, the complexity of a cooling path is increased, the opportunity that gas molecules make contact with the surfaces of the cooling assemblies is increased, and the trapping efficiency of macromolecules in gas is improved.
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Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of semiconductor processing equipment, and particularly relates to a cold trap device and a CVD processing equipment. BACKGROUND

[0002] The CVD (chemical vapor deposition) processing equipment is widely applied in the field of semiconductor film forming, and generally comprises a cold trap device, which is a device for capturing or condensing specific substances through cooling, and the cooling capacity and the capturing effect of the cold trap device are directly related.

[0003] At present, the cold trap device has low capturing efficiency for macromolecules in gas, and cannot meet the current processing requirements as the processing capacity continues to increase. CONTENT OF THE UTILITY MODEL

[0004] The utility model aims to overcome the technical problems of insufficient cooling capacity and low capturing efficiency of the current cold trap device, and another object of the embodiments of the application is to provide a CVD processing equipment.

[0005] TECHNICAL SCHEME The embodiments of the application disclose a cold trap device, which comprises:

[0006] A shell has a processing chamber, and the shell comprises a first wall and a second wall arranged in a vertical direction, and a side wall located between the first wall and the second wall, the side wall is connected to the first wall and the second wall respectively, and the side wall and the first wall and the second wall together form the processing chamber;

[0007] A plurality of cooling components are arranged in the processing chamber in a sleeved and spaced manner, in two adjacent cooling components, one cooling component is connected to the first wall, and the other cooling component is connected to the second wall, so as to divide the internal space of the processing chamber and form a zigzag channel.

[0008] In some embodiments, the cooling component comprises a cooling pipe group, the cooling pipes of the cooling pipe group are spirally wound and arranged in a stacked manner along the vertical direction, and a horn-shaped channel is formed around the cooling pipes, the expanding direction of the horn-shaped channel is the direction in which the cross section of the horn-shaped channel gradually increases, and the expanding directions of adjacent horn-shaped channels are opposite.

[0009] In some embodiments, the cooling component further comprises a flow guide plate, the flow guide plate has a ring structure, one flow guide plate is arranged on the outside or the inside of each cooling pipe group, the flow guide plate is arranged in an extending manner along the vertical direction, in two adjacent cooling components, one flow guide plate is connected to the cooling pipe group and the first wall, and the other flow guide plate is connected to the cooling pipe group and the second wall.

[0010] In some embodiments, the deflector at least partially extends into the trumpet-shaped passage of the cooling tube group, and a projection of the deflector on the sidewall covers a projection of the cooling tube group on the sidewall in a direction perpendicular to the up-down direction.

[0011] In some embodiments, the plurality of cooling assemblies divide the processing chamber into a plurality of flow channels, including a first flow channel, a second flow channel, and a third flow channel, the first flow channel being located between the outermost cooling tube group and the sidewall, the second flow channel being located between adjacent cooling tube groups or between the adjacent cooling tube group and the deflector, and the third flow channel being located in a space enclosed by the innermost cooling tube group.

[0012] Each flow channel has an inlet end and an outlet end, and the flow cross-section of the flow channel gradually decreases from the inlet end to the outlet end. In two adjacent flow channels, the outlet end of the flow channel on the outer side is connected to the inlet end of the flow channel on the inner side.

[0013] In some embodiments, the cooling tube group includes a plurality of coil structures stacked along the up-down direction, and the plurality of coil structures are connected in series end to end, and a gap is formed between adjacent layers of the coil structures, and the gap is less than or equal to 2 mm.

[0014] In some embodiments, the cooling tube group is spaced apart from the first wall or the second wall at least at one end, and the cooling tube group and the first wall or the second wall have a buffer area for connecting the outlet end of the flow channel on the outer side to the inlet end of the flow channel on the inner side.

[0015] In some embodiments, the housing has an air inlet and an air outlet, the inlet end of the first flow channel is connected to the air inlet, and the outlet end of the third flow channel is connected to the air outlet.

[0016] In some embodiments, the cooling tubes of adjacent cooling tube groups are connected in series.

[0017] The cold trap device further includes a liquid inlet pipe and a liquid outlet pipe, the liquid inlet pipe being connected to the innermost cooling tube group, and the liquid outlet pipe being connected to the outermost cooling tube group.

[0018] Embodiments of the present application also disclose a CVD processing device, including a reactor and an exhaust path connected to the reactor, at least one cold trap device as described in the above embodiments being arranged on the exhaust path, and a filter being connected downstream of the cold trap device.

[0019] Beneficial Effects: The cold trap device in this embodiment includes a housing and multiple cooling components. The housing has a processing chamber and includes a first wall and a second wall spaced apart in a vertical direction, and a side wall located between the first wall and the second wall. The side wall connects to the first wall and the second wall respectively, and together they enclose the processing chamber. Multiple cooling components are nested within each other and spaced apart in the processing chamber. In two adjacent cooling components, one cooling component is connected to the first wall, and the other cooling component is connected to the second wall, thereby dividing the internal space of the processing chamber and forming a zigzag channel. The zigzag channel formed by the cooperation of two adjacent cooling components with the housing increases the complexity of the cooling path, increases the opportunity for gas molecules to contact the surface of the cooling components, and improves the capture efficiency of large molecules in the gas.

[0020] The CVD processing equipment of this application includes a reactor and an exhaust path connected to the reactor. At least one cold trap device as described in the above embodiment is arranged on the exhaust path, and a filter is connected downstream of the cold trap device. The complex cooling path inside the cold trap device improves the capture efficiency of large molecules in the gas and extends the service life of the filter. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 This is a three-dimensional structural diagram of the cold trap device according to an embodiment of this application;

[0023] Figure 2 This is a top view of the cold trap device according to an embodiment of this application;

[0024] Figure 3 This is a simplified structural cross-sectional view of the cold trap device according to an embodiment of this application, showing a zigzag channel;

[0025] Figure 4 for Figure 2 Cross-sectional view along the AA direction;

[0026] Figure 5 This is a cross-sectional view of another embodiment of this application in the AA direction;

[0027] Figure 6 for Figure 2 Cross-sectional view along the middle BB direction;

[0028] Figure 7 This is a simplified structural diagram of a CVD processing device according to an embodiment of this application;

[0029] 10, housing; 100, processing chamber; X, up-down direction; 101, first wall; 102, second wall; 103, side wall; 11, cooling assembly; 1000, zigzag channel; 111, cooling pipe group; 112, flow guide plate; 1001, first flow-through channel; 1002, second flow-through channel; 1003, third flow-through channel; 1004, inlet end; 1005, outlet end; 1113, gap; 113, buffer area; 104, gas inlet; 105, gas outlet; 12, liquid inlet pipe; 13, liquid outlet pipe; 1, cold trap device; 2, filter; 3, reactor. DETAILED DESCRIPTION

[0030] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by a person skilled in the art without creative work fall within the scope of protection of the present application.

[0031] In the description of the present application, it should be understood that the terms "upper", "lower", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or component referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In the description of the present application, the meaning of "a plurality of" is two or more, at least one of which can be one, two or more, unless otherwise explicitly specified. The terms "first", "second", "third" and the like are only for the convenience of description and are the names of parts or embodiments with numbers, and do not imply an important order between the parts or between the embodiments.

[0032] It should also be noted that in the drawings of the present application, the arrow marked X indicates the up-down direction, and in the description of the present application, the up-down direction is introduced to more clearly define the structure and relative positional relationship of the components in the cold trap device and the CVD processing equipment. In actual implementation, the up-down direction is generally the vertical direction or the height direction.

[0033] As a preamble of the embodiments of the present application, the cold trap device has low trapping efficiency for macromolecules in the gas, and as the processing capacity continues to increase, it cannot meet the current processing needs. The cooling path of the gas molecules in the traditional cold trap device is simple, and when the gas processing capacity is large, part of the gas molecules cannot be captured and directly pass through the cold trap. Secondly, the cooling efficiency of the front stage area in the cold trap device is greatly reduced, which limits the overall processing capacity and has low trapping efficiency. Furthermore, when processing mixed gas containing multiple volatile components, such as some mixed gas containing low-boiling hydrogen impurities and high-boiling organic solvent vapor, the cold trap device cannot form an effective temperature gradient inside, its cooling object is single, and the specificity is poor, and it cannot form zoned cooling and trapping.

[0034] Therefore, the embodiments of the present application provide a cold trap device, which aims to solve at least one of the above technical problems.

[0035] Please refer to Figures 1 to 3 As shown in the figure, the cold trap device 1 in the present application includes a shell 10 and a plurality of cooling assemblies 11. The shell 10 has a processing chamber 100, and the shell 10 includes a first wall 101 and a second wall 102 arranged in the up-down direction X, and a side wall 103 between the first wall 101 and the second wall 102. The side wall 103 is connected to the first wall 101 and the second wall 102, respectively, and together encloses the processing chamber 100. The plurality of cooling assemblies 11 are arranged in the processing chamber 100 in a nested and spaced manner. Among the two adjacent cooling assemblies 11, one cooling assembly 11 is connected to the first wall 101, and the other cooling assembly 11 is connected to the second wall 102, so as to divide the internal space of the processing chamber 100 and form a zigzag channel 1000.

[0036] It should be understood that by constructing one or more zigzag channels 1000 inside the processing chamber 100, a labyrinth structure is formed, the path is more complex, the opportunity for gas molecules to contact the surface of the cooling assembly 11 is increased, and the possibility of gas molecules directly passing through the cooling assembly 11 to reach the outlet after entering the processing chamber 100 is reduced. The gas molecules continuously change direction in the channel and continuously collide with the low-temperature surface of the cooling assembly 11, effectively improving the trapping efficiency of the cold trap device 1.

[0037] Furthermore, by connecting the first wall 101 and the second wall 102 with the adjacent cooling assemblies 11 respectively, it is beneficial to form different temperature zones at different positions, a lower temperature zone can be formed near the cooling assembly 11 connected to the bottom wall, a higher temperature zone can be formed near the cooling assembly 11 connected to the top wall, a higher temperature zone can be formed near the outer side, and a lower temperature zone can be formed near the inner side, so that a stable temperature gradient is formed inside the treatment chamber 100, and the direction of the zigzag channel is guided to achieve the capture of gases with different boiling points. For gases with lower boiling points, they can be cooled in a slightly higher temperature zone, and for gases with higher boiling points, they can be captured in the subsequent low-temperature zone. When treating mixed gases containing multiple volatile components, such as some mixed gases containing low-boiling-point hydrogen impurities and high-boiling-point organic solvent vapors, the temperature gradient formed inside the cold trap device 1 can better achieve the partition cooling and capture of gases with different boiling point components.

[0038] In addition, when the cold trap device 1 is in some situations that require to change the working state, such as sudden reduction or stop of the refrigeration power of the cooling assembly 11, the structure of the labyrinth channel can hinder the backflow of the gas. When the gas flows in the labyrinth channel, the resistance of its backflow is large, thereby ensuring the stability of the equipment and the effective collection of the product.

[0039] Please refer to Figures 4 to 6 In some embodiments, the cooling assembly 11 includes a cooling pipe group 111, the cooling pipes of the cooling pipe group 111 are spirally wound and stacked in the up-down direction X, and surround a horn-shaped channel, the gradually enlarged direction of the channel cross section of the horn-shaped channel is the expansion direction, and the expansion directions of adjacent horn-shaped channels are opposite.

[0040] It needs to be understood that the horn-shaped channel surrounded by the cooling pipe group 111 can provide a larger cooling area, and secondly, by forming horn-shaped channels nested in each other in a limited space, the overall space occupied by the cooling assembly 11 in the device is further increased, and the heat exchange efficiency is improved. The expansion directions of the horn-shaped channels of adjacent cooling assemblies 11 are opposite, and while being nested, the internal space of the processing chamber 100 can be further divided into multiple annular variable-diameter flow channels between the two adjacent cooling assemblies 11, so that after the gas enters the cold trap device 1, a special vortex or spiral flow path is formed. The vortex or spiral flow can also make the gas molecules more evenly distributed. Specifically, it needs to be understood that in a single variable-diameter flow channel, along the flow direction of the gas, the flow area of the variable-diameter flow channel gradually decreases, the flow rate of the gas gradually increases, and the gas is compressed, increasing the cooling efficiency; when the gas enters the next variable-diameter flow channel, the compressed gas is initially released, forming a turbulent flow, and the gas flow rate decreases, and then the gas is accelerated and compressed again by the variable-diameter flow channel. According to the number of variable-diameter flow channels, the above compression-release-compression process is sequentially cycled. This flow path can prolong the residence time of the gas in the cooling area and improve the opportunity for the gas to fully contact the surface of the cooling assembly 11. Different gas molecules can more evenly contact the cooling surface, avoiding local overheating or uneven cooling, thereby improving the cooling effect and trapping efficiency of the cold trap device 1.

[0041] Referring to Figures 4 to 6 As shown in the drawings, in some embodiments, the cooling assembly 11 further comprises a flow guide plate 112, which is annular in structure. One flow guide plate 112 is arranged on the outer side or the inner side of each cooling pipe group 111. The flow guide plate 112 extends along the up-down direction X. In adjacent two cooling assemblies 11, one flow guide plate 112 connects the cooling pipe group 111 and the first wall 101, and the other flow guide plate 112 connects the cooling pipe group 111 and the second wall 102.

[0042] It needs to be understood that by arranging the flow guide plate 112 on the outer side or the inner side of the cooling pipe group 111, the gas flow path can be further optimized, and the flow direction of the gas can be guided. To some extent, the flow guide plate 112 can fill the gap 1113 between the cooling pipe group 111 and the first wall 101 or the second wall 102 (depending on whether the cooling assembly is connected to the first wall 101 or the second wall 102). At the same time, the flow guide plate 112 can play a role in fixing and supporting the cooling pipe group 111. During the operation of the cold trap device 1, especially during the initial operation, the influence of vibration, impact or thermal expansion caused by temperature changes on the cold trap device 1 is reduced. The cooling pipe group 111 can remain in a stable position, avoiding displacement or damage of the cooling pipe group 111, and ensuring normal operation of the cold trap device 1.

[0043] Referring toFigure 4 With Figure 6 As shown in FIG. 1 1, in some embodiments, the deflector 112 at least partially extends into the trumpet-shaped passage of the cooling tube set 111, and in the vertical direction X, the projection of the deflector 112 on the side wall 103 covers the projection of the cooling tube set 111 on the side wall 103. It should be understood that the deflector 112 can be sleeved in the cooling tube set 111 and completely cover the cooling path of the cooling tube set 111. In the present embodiment, the deflector 112 can divide the internal space of the processing chamber 100. In the region where the cooling tube set 111 and the deflector 112 are sleeved with each other, a buffer cooling region is formed between the cooling tube set 111 and the deflector 112. When the gas flow rate or pressure is too large, part of the gas will pass through the cooling tube set 111 to reach the buffer cooling region. On the one hand, the impact force of the gas on the cooling tube set 111 is reduced, and the gas flow rate is reduced. At the same time, the back side of the cooling tube set 111 also participates in cooling, further increasing the cooling area of the cooling assembly 11, and ultimately ensuring that different gas molecules can more uniformly contact the cooling surface, improving the cooling effect and trapping efficiency of the cold trap device 1.

[0044] Please refer to Figures 4 to 6 As shown in FIG. 12, in some embodiments, the plurality of cooling assemblies 11 divide the internal space of the processing chamber 100 into a plurality of flow-through passages, including a first flow-through passage 1001, a second flow-through passage 1002, and a third flow-through passage 1003. The first flow-through passage 1001 is located between the outermost cooling tube set 111 and the side wall 103. The second flow-through passage 1002 is located between adjacent cooling tube sets 111 or between adjacent cooling tube sets 111 and deflectors 112. The third flow-through passage 1003 is located in the space surrounded by the innermost cooling tube set 111. Each flow-through passage has an inlet end 1004 and an outlet end 1005. From the inlet end 1004 to the outlet end 1005, the flow-through cross section of the flow-through passage gradually decreases. In adjacent two flow-through passages, the outlet end 1005 of the flow-through passage on the outside side is in communication with the inlet end 1004 of the flow-through passage on the inside side.

[0045] It should be understood that the formation of the second flow-through passage 1002 is related to the cooperation relationship between the deflector 112 and the cooling tube set 111. When the deflector 112 is connected between the cooling tube set 111 and the first wall 101 or the second wall 102 and is used to seal the gap 1113 between the cooling tube set 111 and the first wall 101 or the second wall 102 (depending on whether the cooling assembly is connected to the first wall 101 or the second wall 102), the second flow-through passage 1002 is located between adjacent cooling tube sets 111 (such as FIG. 12). Figure 5(As shown); In the direction perpendicular to the vertical direction X, when the projection of the guide plate 112 on the side wall 103 covers the projection of the cooling pipe assembly 111 on the side wall 103, the second flow channel 1002 is located between the adjacent cooling pipe assembly 111 and the guide plate 112 (as shown). Figure 4 and Figure 6 (As shown). It should be noted that the number of second flow channels 1002 is related to the number of cooling tube assemblies 111. Here, the number of second flow channels 1002 can be one or more. The multi-flow channel structure allows gas to pass through the first flow channel 1001, the second flow channel 1002, and the third flow channel 1003 sequentially from the outside to the inside when passing through the processing chamber 100. As the flow cross-section of each channel gradually decreases, the gas flow velocity gradually increases, thereby enabling the step-by-step processing of gases or impurities with different properties. As the inner diameter of the flow channel gradually decreases, the gas flow velocity increases, and the convective heat transfer coefficient between the gas and the cooling tube assembly 111 increases. In each flow channel, the gas can make closer contact with the surface of the cooling tube assembly 111 as the flow cross-section gradually decreases. At the same time, by connecting the outlet end 1005 of the outer flow channel to the inlet end 1004 of the inner flow channel, the gas flow path can be optimized, ensuring that the gas passes through the processing chamber 100 with a stable flow rate and path, preventing local gas accumulation or obstructed flow.

[0046] Please see Figures 4 to 6 As shown, in some embodiments, the cooling tube assembly 111 includes multiple coil structures stacked in a vertical direction X. These coil structures are connected end-to-end, and gaps 1113 are formed between adjacent coil structures, with the gaps 1113 being less than or equal to 2 mm. It should be understood that the stacked coil structures and the small gaps 1113 make the cooling tube assembly 111 more compact, effectively utilizing the internal space of the processing chamber 100. The small gaps 1113 between adjacent coil structures facilitate heat conduction between their outer surfaces, allowing for a more even distribution of heat among the coils. This also prevents heat accumulation between adjacent coils, ensuring the cooling capacity of each coil structure and enhancing the thermal interaction between the gas and the coil structure. Furthermore, some gas can pass through the gaps 1113 and exchange heat with the back side of the coil structure, increasing the usable heat exchange area of ​​the cooling coils and improving cooling capacity.

[0047] Please see Figures 4 to 6As shown, in some embodiments, the cooling tube group 111 is spaced apart from the first wall 101 and the second wall 102, and has a buffer area 113 between at least one end of the cooling tube group 111 and the first wall 101 or the second wall 102. The buffer area 113 is used to connect the outlet end 1005 of the flow channel on the outer side with the inlet end 1004 of the flow channel on the inner side. It should be understood that the buffer area 113 can effectively buffer the gas flow. When the gas flows in a single flow channel, the flow rate and pressure of the gas are gradually increasing. The buffer area 113 releases the pressure of the gas and reduces the flow rate of the gas, so as to reduce the impact on the adjacent flow channel during the flow reversing of the gas, protect the tube wall of the cooling tube group 111, and reduce the vibration and noise caused by the change of the gas pressure, so that the equipment runs more smoothly.

[0048] Secondly, the buffer area 113 can promote better mixing of gases with different temperatures and different compositions. In the cooling process, the gas in the flow channel on the inner side has a lower temperature, and the gas in the flow channel on the outer side has a relatively high temperature. In the buffer area 113, the gases in the adjacent two flow channels can be fully mixed, so that the distribution of the gas temperature and composition is more uniform, and the overall heat exchange efficiency of the cold trap device 1 is improved.

[0049] Please refer to Figure 6 As shown, in some embodiments, the shell 10 has an air inlet 104 and an air outlet 105. The inlet end 1004 of the first flow channel 1001 is connected with the air inlet 104, and the outlet end 1005 of the third flow channel 1003 is connected with the air outlet 105. It should be understood that the air inlet 104 in the present application is located on the side wall 103 of the shell 10, and the air outlet 105 is located on the first wall 101 of the shell 10 and at the middle position, so as to form a channel flowing from the outside to the inside. It should be noted that the positions of the air inlet 104 and the air outlet 105 in the present application can be freely adjusted according to the requirements, that is, the air outlet 105 can also be arranged on the second wall 102, which will not be described in detail here.

[0050] Please refer to Figures 4 to 5As shown, in some embodiments, the cooling pipes of the adjacent cooling pipe groups 111 are connected in series; the cold trap device 1 further comprises an inlet pipe 12 and an outlet pipe 13, the inlet pipe 12 is connected to the cooling pipe group 111 located at the innermost side, and the outlet pipe 13 is connected to the cooling pipe group 111 located at the outermost side. It should be understood that the cooling pipe groups 111 of the plurality of cooling assemblies 11 can be integrally formed or spliced together, and secondly, the multi-layer coil structure in the cooling pipe group 111 can be integrally formed or spliced together. It should be understood that by connecting the inlet pipe 12 to the cooling pipe group 111 located at the innermost side and connecting the outlet pipe 13 to the cooling pipe group 111 located at the outermost side, it can be ensured that during the entire cooling process, the cooling medium flowing in the internal flow channel always maintains a large temperature difference between the gas and the cooling pipe, so as to ensure the heat exchange efficiency and ensure the cooling effect.

[0051] The embodiment of the present application also discloses a CVD processing device, comprising a reactor and an exhaust path connected to the reactor, at least one cold trap device 1 as in the above embodiment is arranged on the exhaust path, and a filter 2 is connected downstream of the cold trap device 1. Through the complex cooling path inside the cold trap device 1, the capture efficiency of macromolecules in the gas is improved, and the service life of the filter 2 is improved. At the same time, the CVD processing device of the embodiment of the present application can have all the technical features and technical effects of the above cold trap device 1, which will not be repeated here.

[0052] In the above embodiments, the description of each embodiment has its own focus, and the parts not described in detail in a certain embodiment can be referred to the related description of other embodiments.

[0053] The cold trap device and the CVD processing device provided by the embodiments of the present application are described in detail above, and the principles and implementation manners of the present application are described by applying specific examples; the above embodiment descriptions are only used to help understand the technical solutions and core ideas of the present application; those skilled in the art should understand that the technical solutions recorded in the above embodiments can be modified, or some technical features can be replaced by equivalents; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A cold trap device, characterized by, The application relates to a shell (10) with a processing chamber (100), the shell (10) comprising a first wall (101) and a second wall (102) arranged in a vertical direction (X) and a side wall (103) between the first wall (101) and the second wall (102), the side wall (103) connecting the first wall (101) and the second wall (102) and forming the processing chamber (100) together; a plurality of cooling assemblies (11) arranged in the processing chamber (100) and sleeved with each other, two adjacent cooling assemblies (11) being connected with the first wall (101) and the second wall (102) respectively, so as to divide the internal space of the processing chamber (100) and form a zigzag channel (1000). The cooling assembly (11) comprises a cooling pipe group (111), the cooling pipes of the cooling pipe group (111) being spirally wound and arranged in a vertical direction (X) and forming a horn-shaped channel, the expanding direction of the horn-shaped channel being a direction in which the channel section gradually increases, and the expanding directions of adjacent horn-shaped channels being opposite. The cooling assembly (11) further comprises a flow guide plate (112), the flow guide plate (112) being in an annular structure, one flow guide plate (112) being sleeved with each cooling pipe group (111) on the outside or the inside, the flow guide plate (112) being arranged in the vertical direction (X), one flow guide plate (112) being connected with the cooling pipe group (111) and the first wall (101) and the other flow guide plate (112) being connected with the cooling pipe group (111) and the second wall (102) in two adjacent cooling assemblies (11).

2. The cold trap device of claim 1, wherein, The flow guide plate (112) at least partially extends into the horn-shaped channel of the cooling pipe group (111), and the projection of the flow guide plate (112) on the side wall (103) covers the projection of the cooling pipe group (111) on the side wall (103) in a direction perpendicular to the vertical direction (X).

3. The cold trap device of claim 2, wherein, A plurality of the cooling assemblies (11) divide the processing chamber (100) into a plurality of flow-through channels, the plurality of flow-through channels comprising a first flow-through channel (1001), a second flow-through channel (1002) and a third flow-through channel (1003), the first flow-through channel (1001) being located between the outermost cooling pipe group (111) and the side wall (103), the second flow-through channel (1002) being located between adjacent cooling pipe groups (111) or between adjacent cooling pipe groups (111) and the flow guide plate (112), and the third flow-through channel (1003) being located in the space surrounded by the innermost cooling pipe group (111).

4. The cold trap device of claim 3, wherein, ​ 5. The cold trap apparatus of claim 3, wherein, ​ Each of the flow channels has an inlet end (1004) and an outlet end (1005), and the flow section of the flow channel gradually decreases from the inlet end (1004) to the outlet end (1005), and the outlet end (1005) of the flow channel on the outer side and the inlet end (1004) of the flow channel on the inner side of the adjacent two flow channels are communicated.

6. The cold trap apparatus of claim 3, wherein, The cooling pipe group (111) comprises a plurality of coil pipe structures arranged in layers along the up-down direction (X), the coil pipe structures are connected in series at the ends, and a gap (1113) is formed between adjacent layers of the coil pipe structures, and the gap (1113) is less than or equal to 2 mm.

7. The cold trap apparatus of claim 5, wherein, At least one end of the cooling pipe group (111) is spaced apart from the first wall (101) or the second wall (102), and the cooling pipe group (111) and the first wall (101) or the second wall (102) have a buffer area (113) for communicating the outlet end (1005) of the flow channel on the outer side and the inlet end (1004) of the flow channel on the inner side.

8. The cold trap apparatus of claim 5, wherein, The shell (10) has an air inlet (104) and an air outlet (105), the inlet end (1004) of the first flow channel (1001) is communicated with the air inlet (104), and the outlet end (1005) of the third flow channel (1003) is communicated with the air outlet (105).

9. The cold trap device of any one of claims 2 to 8, wherein, The cooling pipes of adjacent cooling pipe groups (111) are connected in series; The cold trap device (1) further comprises a liquid inlet pipe (12) and a liquid outlet pipe (13), the liquid inlet pipe (12) is communicated with the cooling pipe group (111) on the innermost side, and the liquid outlet pipe (13) is communicated with the cooling pipe group (111) on the outermost side.

10. A CVD processing apparatus characterized by comprising: The cold trap device (1) further comprises a liquid inlet pipe (12) and a liquid outlet pipe (13), the liquid inlet pipe (12) is communicated with the cooling pipe group (111) on the innermost side, and the liquid outlet pipe (13) is communicated with the cooling pipe group (111) on the outermost side. The cold trap device (1) further comprises a liquid inlet pipe (12) and a liquid outlet pipe (13), the liquid inlet pipe (12) is communicated with the cooling pipe group (111) on the innermost side, and the liquid outlet pipe (13) is communicated with the cooling pipe group (111) on the outermost side.