Metal mask plate for increasing effective area of vacuum evaporation

Abstract

The utility model provides a metal mask plate for increasing the effective area of vacuum evaporation, which is characterized by comprising a square metal frame, the metal frame comprises four edges, a square opening is enclosed by the four edges, a groove is formed between the metal frame and masks, the masks are positioned at four corners of the square opening, and the grooves are communicated with the square opening. The surface, close to one side of the mask, of the square metal frame is defined as an upper surface. According to the utility model, the edge structure of the mask is optimized, and the four-corner groove mask structure design is introduced, so that an embedded evaporation substrate can be effectively supported, the edge transition of the mask is smoother, the non-uniform deposition of a thin film in an edge area is reduced, the edge shielding problem of the vacuum evaporation mask is effectively solved, and the production efficiency is improved. High precision and high flatness of the mask plate are guaranteed, the uniformity of the film and the effective coating area of the substrate are increased, and therefore the overall performance and yield of the vacuum evaporation film are improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to a metal mask, especially a metal mask plate improving vacuum evaporation effective area. BACKGROUND

[0002] Vacuum evaporation technology is a process method that vaporizes and condenses into a film on the surface of a substrate under vacuum conditions by heating evaporation of plating film material. This technology has the advantages of simple film forming method, high film purity and compactness, unique film structure and performance, etc. Vacuum evaporation technology is widely used in photovoltaic, display, semiconductor and other fields. In the future, with the continuous progress of technology and the continuous expansion of application fields, the market size of China's vacuum plating equipment industry will continue to maintain high-speed growth. Mask is a key tool in the vacuum evaporation process, used to transfer the designer's pattern to the substrate or wafer through exposure, thereby realizing mass production. Today, the mask market is also growing rapidly.

[0003] However, vacuum evaporation masks do face a series of complex and urgent technical difficulties in the manufacturing process, the most prominent of which is the edge shielding problem. The root cause of this problem lies in the fact that the traditional evaporation process uses a bottom-up plating method, that is, the evaporation material sublimates under heat in a vacuum environment and then deposits onto the substrate at a certain angle and speed. Under this plating mechanism, the edge of the mask, which is used to support the substrate to be placed smoothly, is often difficult to be evenly covered by the evaporation material due to its special location, resulting in a significant loss of the effective area of the substrate plating film. Specifically, edge shielding not only leads to uneven film thickness in the edge area of the product, but also may cause edge effects such as uneven brightness, color deviation, etc., which seriously affect the final display quality and aesthetics of the product. The edge shielding problem has become one of the bottlenecks restricting the further development of vacuum evaporation mask technology.

[0004] In summary, the edge shielding problem of vacuum evaporation masks is a comprehensive problem involving design, manufacturing, and materials, and its solution requires interdisciplinary cooperation and innovation to promote the continuous progress and industrial upgrading of vacuum evaporation technology. SUMMARY

[0005] The utility model aims at avoiding the deficiency of prior art, provides a novel mask design scheme, optimizes the edge structure of mask, introduces the four-corner groove mask structure design, can effectively support the embedded evaporation substrate, makes the mask edge transition more smooth, reduces the uneven deposition of thin film in the edge area, effectively solves the edge shielding problem of vacuum evaporation mask, guarantees the high precision and high flatness of mask, increases the uniformity of thin film and the effective area of substrate plating film, thereby improving the overall performance and yield of vacuum evaporation thin film.

[0006] The utility model discloses a technical scheme which realizes the purpose that is to improve the effective area of vacuum evaporation through the following technical scheme.

[0007] A metal mask plate for improving the effective area of vacuum evaporation, comprising a metal frame, a groove and a mask, the metal frame is square, and four edges thereof enclose a square opening; the groove is formed between the metal frame and the mask, and the mask is located at four corners of the opening, and the surface of the metal frame on the side close to the mask is defined as an upper surface.

[0008] Further, the material of the metal frame is any one of stainless steel, aluminum plate, titanium plate and other alloy plates, and the thickness thereof is 0.5-10 mm.

[0009] Specifically, the size of the opening is a*b.

[0010] Specifically, the mask is an isosceles right triangle with a side length of z or a right angle sector with a radius of z.

[0011] Specifically, the depth of the groove is equal to the thickness of the metal frame (1) minus the thickness of the mask (3).

[0012] Specifically, the thickness of the mask is 0.05-1 mm.

[0013] Further, the size of the effective film plating area of the metal mask plate is S1=a*b-4*(z*z / 2) or a*b-4*(π*z*z / 4).

[0014] The utility model discloses the beneficial effect that is:

[0015] 1. The utility model discloses a more fine edge structure design optimization edge shape, makes the mask plate edge transition more smooth, introduces special film plating channel in the edge area, reduces the uneven deposition of film in the edge area, avoids the excessive shielding of the support area to the evaporation film.

[0016] 2. The edge mask structure of the utility model has very small edge shielding area, reduces the warping defect of the mask plate, reduces the shielding of the edge to the evaporation film, improves the adhesion and uniformity of the film, and improves the shielding characteristics of the evaporation film. BRIEF DESCRIPTION OF DRAWINGS

[0017] In order to more clearly illustrate the technical scheme in the specific embodiment of the utility model, the following will briefly introduce the drawings needed to be used in the embodiment description, and obviously, the following described drawings are only some embodiments of the utility model, and for those skilled in the art, other drawings can also be obtained according to these drawings without paying creative labor.

[0018] Figure 1is a schematic diagram of a planar structure of a metal mask plate of Example 1;

[0019] Figure 2 is a schematic diagram of a planar structure of a metal mask plate of Example 2;

[0020] Figure 3 is a schematic diagram of a planar structure of a metal mask plate of Example 3;

[0021] Figure 4 is a schematic diagram of a planar structure of a metal mask plate of Example 4.

[0022] The figure mark, metal frame-1; groove-2; mask-3; opening-4. DETAILED DESCRIPTION

[0023] The embodiments of the present application will be described in detail below with reference to the accompanying drawings. However, those skilled in the art can understand that in the embodiments of the present application, many technical details are proposed in order to make the reader better understand the present application. However, even without these technical details and various changes and modifications based on the following embodiments, the technical solutions claimed by the present application can be realized.

[0024] The purpose of the present application is achieved by the following technical solutions: a metal mask plate for improving the effective area of vacuum evaporation, comprising a metal frame 1, a groove 2 and a mask 3, the metal frame 1 is square, and four edges thereof enclose a square opening 4; the groove 2 is formed between the metal frame 1 and the mask 3, and the mask 3 is located at four corners of the opening 4, and the surface of the metal frame 1 close to the mask 3 is defined as an upper surface. The material of the metal frame 1 is any one of stainless steel, aluminum plate, titanium plate and other alloy plates, and the thickness is 0.5-10 mm. The design size of the opening 4 is a*b. The mask 3 is designed as an isosceles right triangle with a side length z or a right angle sector with a radius z. The depth of the groove 2 is designed as the thickness of the metal frame 1 minus the thickness of the mask 3. The thickness of the mask 3 is 0.05-1 mm. The effective coating area of the metal mask plate is designed as S1=a*b-4*(z*z / 2) or a*b-4*(π*z*z / 4).

[0025] Example 1

[0026] As Figure 1 shown, the present application provides a metal mask plate, which comprises a square metal frame 1, the metal frame 1 comprises four edges, the four edges enclose a square opening 4, a groove 2 is formed between the metal frame 1 and a mask 3, the mask 3 is located at four corners of the square opening 4, and the surface of the square metal frame 1 close to the mask 3 is defined as an upper surface. The size of the opening 4 is a*b=100mm*100mm=10000mm2 The depth of the groove 2 is 1.5mm, and the size of the mask 3 is an isosceles right triangle with a side length z = 1mm. Further, the effective plating area size S1 of the mask 3 is a*b-4*(z*z / 2) = 100mm*100mm-4*(1mm*1mm / 2) = 9998mm 2 .

[0027] Example 2

[0028] As shown in FIG. 2, a metal mask plate includes a square metal frame 1, the metal frame 1 including four sides that enclose a square opening 4, a groove 2 being formed between the metal frame 1 and a mask 3, the mask 3 being located on two parallel sides of the opening 4, a surface of the square metal frame 1 close to the mask 3 being defined as an upper surface; the size of the opening 4 is a*b = 100mm*100mm = 10000mm 2 The depth of the groove 2 is 1.5mm, and the size of the mask 3 is 2*a*y+2*(b-2y)*x = 2*100mm*1mm+2*(100mm-2*1mm)*1mm = 396mm 2 . Further, the effective plating area size S2 of the mask 3 is (a-2x)*(b-2y) = (100mm-2*1mm)*(100mm-2*1mm) = 9604mm 2 .

[0029] Example 3

[0030] As shown in FIG. 3, a metal mask plate includes a square metal frame 1, the metal frame 1 including four sides that enclose a square opening 4, a groove 2 being formed between the metal frame 1 and a mask 3, the mask 3 being located on two parallel sides of the opening 4, a surface of the square metal frame 1 close to the mask 3 being defined as an upper surface; the size of the opening 4 is a*b = 100mm*100mm = 10000mm 2 The depth of the groove 2 is 1.5mm, and the size of the mask 3 is 2*b*x = 2*100mm*1mm = 200mm 2 . Further, the effective plating area size S3 of the mask 3 is (a-2x)*b = (100mm-2*1mm)*100mm = 9800mm 2 .

[0031] Example 4

[0032] As shown in FIG. 4, a metal mask plate includes a square metal frame 1, the metal frame 1 including four sides that enclose a square opening 4, a groove 2 being formed between the metal frame 1 and a mask 3, the mask 3 being located on two parallel sides of the opening 4, a surface of the square metal frame 1 close to the mask 3 being defined as an upper surface; the size of the opening 4 is a*b = 100mm*100mm = 10000mm 2 The depth of the groove 2 is 1.5mm, and the size of the mask 3 is 2*a*y+2*(b-2y)*x = 2*100mm*1mm+2*(100mm-2*1mm)*1mm = 396mm 2 . Further, the effective plating area size S4 of the mask 3 is (a-2x)*(b-2y) = (100mm-2*1mm)*(100mm-2*1mm) = 9604mm 2 .As shown, a metal mask plate comprises a square metal frame 1, the metal frame 1 comprises four edges, the four edges enclose a square opening 4, a groove 2 is formed between the metal frame 1 and a mask 3, the mask 3 is located at two parallel edges of the opening 4, and is composed of n discontinuous square sub-mask blocks, the interval of two adjacent square sub-mask blocks is q, and the surface of the metal frame 1 close to the mask 3 is defined as an upper surface. The size of the opening 4 is a*b=100mm*100mm=10000mm 2 square, the depth of the groove 2 is 1.5mm, and the size of the mask 3 is 2*n*x*w=2*3*1mm*1mm=6mm 2 Further, the effective film plating area size S4 of the mask 3 is (a-2x)*b+2*(n-1)*x*q=(100mm-2*1mm)*100mm+2*(3-1)*1mm*48.5mm=9994mm 2 wherein q=(b-n*w) / (n-1)=(100mm-3*1mm) / (3-1)=48.5mm 2 .

[0033] In summary, the effective film plating area size is large and small: S1>S4>S3>S2, which indicates that the metal mask plate of the utility model reduces the uneven deposition of the film in the edge area, avoids the excessive shielding of the support area to the evaporated film, greatly improves the effective film plating area, and this will significantly promote the rapid development of the vacuum film plating technology.

[0034] Some commonly used English nouns or letters used for the convenience of clear description in the application are only used for exemplary reference and are not limited by the possible Chinese translation or specific letters.

[0035] It should be further noted that, in this paper, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between the entities or operations.

Claims

1. A metal mask for improving the effective area of ​​vacuum evaporation, characterized in that, It includes metal frame (1), groove (2) and mask (3), the metal frame (1) is square, and four edges enclose a square opening (4); The groove (2) is formed between the metal frame (1) and the mask (3), and the mask (3) is located at the four corners of the opening (4), and the surface of the metal frame (1) close to the mask (3) side is defined as the upper surface.

2. The metal mask plate for improving the effective area of vacuum evaporation according to claim 1, wherein, The material of the metal frame (1) is any one of stainless steel, aluminum plate and titanium plate, and the thickness is 0.5-10mm.

3. The metal mask plate for improving the effective area of vacuum evaporation according to claim 1, wherein, The size of the opening (4) is a*b.

4. The metal mask plate for improving the effective area of vacuum evaporation according to claim 1, wherein, The mask (3) is an isosceles right triangle with side length z or a right angle sector with radius z.

5. The metal mask plate for improving the effective area of vacuum evaporation according to claim 1, wherein, The depth of the groove (2) is equal to the thickness of the metal frame (1) minus the thickness of the mask (3).

6. The metal mask plate for improving effective area of vacuum evaporation according to claim 1, wherein, The thickness of the mask (3) is 0.05-1mm.

7. The metal mask plate for improving effective area of vacuum evaporation according to claim 1, wherein, The size of the effective plating area of the metal mask plate is S1=a*b-4*z*z / 2 or a*b-4*π*z*z / 4.

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