Mask plate

Abstract

The utility model provides a mask plate, relates to the field of photovoltaic technology, and aims to solve the technical problem that the preparation process of a photovoltaic cell is complicated. The mask plate comprises at least one carrier plate, the carrier plate comprises a frame structure and a plurality of shielding strips which are arranged in the frame structure at intervals, and the two ends of each shielding strip are connected to two opposite first frames of the frame structure respectively; the first surface of the shielding strip is provided with a groove extending along the length direction of the shielding strip, and the groove is used for shielding a grid line protruding out of the surface of the photovoltaic cell; the shielding strip is further provided with a second surface and at least one through hole, the second surface is opposite to the first surface, and the through hole penetrates from the first surface to the second surface. The mask plate provided by the utility model is used for film coating of the photovoltaic battery piece, and can be compatible with the existing evaporation equipment, so that the manufacturing process of the photovoltaic battery piece is simple and effective.

Description

TECHNICAL FIELD

[0001] The utility model relates to photovoltaic technology field especially relates to a mask plate. BACKGROUND

[0002] The statements in this section merely provide background information related to the utility model and do not necessarily constitute the prior art.

[0003] Heterojunction with intrinsic thin layer (HJT) is a kind of high-efficiency photovoltaic cell technology.Transparent conductive oxide (TCO) is a kind of transparent conductive material, can be used as the conductive layer of improving HJT battery current, it plays the role of the collection of carrier, also has antireflection effect simultaneously, but antireflection effect is limited.

[0004] In order to improve the antireflection effect of HJT photovoltaic cell, a layer of insulating medium film needs to be plated on TCO layer, however, the layer of insulating medium film needs to be evaporated after the metallization process of HJT battery, which will inevitably be evaporated onto the metal grid lines of the battery, and the insulating medium film makes the grid lines unable to output current.In related technologies, mask glue is coated and the grid lines are shielded before evaporating the insulating medium film, but the mask glue needs to be removed subsequently, which complicates the entire process of HJT photovoltaic cell piece. UTILITY MODEL CONTENTS

[0005] The utility model aims at providing a mask plate to solve the technical problem that the preparation process of photovoltaic cell piece is complex.

[0006] In order to achieve the above-mentioned purpose, the utility model provides the following technical scheme:

[0007] Firstly, the utility model provides a mask plate for coating film of photovoltaic cell piece, the mask plate includes at least one carrier plate, the carrier plate includes frame structure and a plurality of interval arranged shielding strips arranged in the frame structure, two ends of the shielding strip are connected to the opposite two first frames of the frame structure respectively;

[0008] The first surface of the shielding strip is provided with a groove extending along the length direction of the shielding strip, and the groove is used for shielding the grid line protruding from the surface of the photovoltaic cell piece;

[0009] The shielding strip also has a second surface and at least one through hole, the second surface is opposite to the first surface, and the through hole penetrates from the first surface to the second surface.

[0010] According to at least one embodiment of the utility model, the groove is matched with the grid line.

[0011] According to at least one embodiment of the present application, the width of the cross section of the groove is constant or decreases along a direction away from the first surface.

[0012] According to at least one embodiment of the present application, the shielding strip has at least one set of through holes, and each set of through holes includes two through holes, and the two through holes in the same set are symmetrically arranged on the two sides of the groove.

[0013] According to at least one embodiment of the present application, the shielding strip has a plurality of sets of through holes, and the plurality of sets of through holes are uniformly distributed along the length direction of the shielding strip.

[0014] According to at least one embodiment of the present application, the size of the through hole ranges from 0.1mm to 0.2mm.

[0015] According to at least one embodiment of the present application, the carrier plate further comprises at least one set of supporting members, and each set of supporting members includes two supporting members, and the two supporting members in the same set are arranged on the opposite second frames of the frame structure.

[0016] One end of the supporting member is arranged on the inner side surface of the second frame, and the other end extends towards the other second frame.

[0017] According to at least one embodiment of the present application, the supporting member has a supporting surface parallel to the first surface.

[0018] According to at least one embodiment of the present application, the supporting surface of each supporting member is flush with the first surface.

[0019] According to at least one embodiment of the present application, the carrier plate is detachably arranged on the mask plate.

[0020] In one or more technical solutions provided in the exemplary embodiments of the present application, at least one of the following beneficial effects can be achieved.

[0021] The mask plate of the utility model exemplary embodiment is used for coating of photovoltaic cell piece, the mask plate includes at least one for carrying photovoltaic cell piece's carrier plate, and a plurality of interval arrangement's sheltering strip is arranged in the frame structure on the carrier plate, and each sheltering strip corresponds with the grid line (main grid) of photovoltaic cell piece one to one, when photovoltaic cell piece is placed on the carrier plate, the main grid protruding on the surface of photovoltaic cell piece will be embedded in the recess of corresponding sheltering strip, that is, the groove bottom wall and the groove side wall of recess will cover the main grid completely, at this time, the first surface of sheltering strip can be attached on the surface of photovoltaic cell piece. Since the coating of photovoltaic cell piece is carried out in the environment with negative pressure, through the through hole of the first surface and the second surface of the sheltering strip, the first surface of the sheltering strip can be adsorbed and fixed photovoltaic cell piece by the negative pressure environment, so that the main grid is guaranteed not to deviate and expose outside the sheltering strip, so that the insulating medium film is guaranteed not to be evaporated on the main grid, and the problem that the current of the main grid cannot be exported is avoided. Compared with the prior art, a layer of organic mask glue is coated on the TCO layer to shield the main grid, which will pollute the evaporation equipment and need to be cleaned in the subsequent process, and the process is relatively complex. The mask plate of the utility model exemplary embodiment can avoid the evaporation of the insulating medium film on the basis of the main grid, can be reused, does not need subsequent cleaning process, can be compatible with the existing evaporation equipment, the process is simple and effective, and is suitable for scale batch production. BRIEF DESCRIPTION OF DRAWINGS

[0022] The accompanying drawings illustrate exemplary embodiments of the present application and, together with the general description given above, explain the principles of the present application, wherein these drawings are included to provide further understanding of the present application and are incorporated into and constitute a part of the specification;

[0023] Figure 1 It is the structure schematic view of the mask plate according to an embodiment of the utility model;

[0024] Figure 2 It is the local structure schematic view of the carrier plate according to an embodiment of the utility model;

[0025] Figure 3 It is the sectional structure schematic view of the sheltering strip according to an embodiment of the utility model;

[0026] Figure 4 It is the structure schematic view of the carrier of the utility model exemplary embodiment;

[0027] Figure 5 It is the structure schematic view of the photovoltaic cell piece according to an embodiment of the utility model.

[0028] 10, carrier plate; 11, first frame; 12, second frame; 13, shielding strip; 131, first surface; 132, second surface; 133, groove; 134, through hole; 20, carrier; 30, N-type monocrystalline silicon wafer; 311, first intrinsic amorphous silicon layer; 312, N-type amorphous silicon layer; 313, first TCO conductive layer; 314, first insulating medium layer; 315, second insulating medium layer; 316, first main grid; 321, second intrinsic amorphous silicon layer; 322, P-type amorphous silicon layer; 323, second TCO conductive layer; 324, second main grid. DETAILED DESCRIPTION

[0029] In order to make the technical problems, technical solutions and beneficial effects of the utility model clearer, the utility model will be further described in detail below in combination with the drawings and examples. It should be understood that the specific examples described herein are only used to explain the utility model and do not limit the utility model.

[0030] Figure 5 is a structural schematic diagram of a photovoltaic cell according to the utility model embodiment. As shown in Figure 5 , in order to improve the current, the HJT photovoltaic cell stacks the first TCO conductive layer 313 on the light-receiving surface and leads out the current through the first main grid 316, and stacks the second TCO conductive layer 323 on the back surface and leads out the current through the second main grid 324.

[0031] The material of the two TCO conductive layers described above can be indium tin oxide (ITO), aluminum-doped zinc oxide (AZO), fluorine-doped tin oxide (FTO), etc. Since the anti-reflection effect of the TCO conductive layer is limited, in order to maximize the use of light, it is necessary to improve the anti-reflection effect of the photovoltaic cell, and usually a anti-reflection medium layer, such as SiN, SiON, AlOx, MgF, SiO, etc. insulating medium film, is stacked on the light-receiving surface, that is, the first TCO conductive layer 313, to effectively reduce the reflectivity of the TCO surface and improve the current density of the photovoltaic cell, and also effectively prevent H from escaping in the HJT cell stack film, thereby improving the stability and reliability of the HJT photovoltaic cell.

[0032] The existing HJT photovoltaic cell needs to use a low-temperature process grid line paste. When the grid line paste is sintered, it cannot burn through the above-mentioned insulating medium film, so as to form an electrical contact with the first TCO conductive layer 313. In the related art, a metallization process is first performed on the first TCO conductive layer 313, that is, the grid line paste is printed on the first TCO conductive layer 313 and sintered, part of the grid line is embedded into the first TCO conductive layer 313 to form an electrical contact, and then the insulating medium film is deposited by an evaporation process. However, this will cause the grid line to also be deposited with the insulating medium film, resulting in the grid line, especially the main grid, being unable to effectively guide the current out.

[0033] It should be noted that the grid lines of the photovoltaic cell are divided into main grids and fine grids, wherein the fine grids are used to collect the current inside the photovoltaic cell, and the main grids are used to collect the current of the fine grids and guide the current out, for example Figure 5 The first main grid 316 and the second main grid 324 in the above-mentioned embodiment, unless otherwise specified, the grid line in the following text refers to the main grid.

[0034] The mask plate provided by the exemplary embodiment of the present application is suitable for various film coating processes of substrates such as photovoltaic cell pieces, for example, vacuum evaporation, low pressure chemical vapor deposition (LPCVD), plasma enhanced chemical vapor deposition (PECVD), physical vapor deposition (PVD), and atomic layer deposition (ALD).

[0035] The exemplary embodiment of the present application takes a reactive physical vapor deposition (RPD) film coating device as an example to illustrate the use of the mask plate. The working principle is that an electron beam is emitted by an electron gun, the electron beam is bombarded to the surface of the target material under the action of a magnetic field, sublimation occurs on the surface of the target material, the sublimated molecules are ionized and then shot to the substrate (photovoltaic cell piece), and a solid thin film is formed on the surface of the substrate. The advantage of RPD deposition is that the surface temperature of the substrate is low, which can be lower than 100℃, and the thermal radiation damage is small.

[0036] Figure 1 is a structural schematic view of the mask plate according to the embodiment of the present application. As Figure 1 shown, the mask plate of the exemplary embodiment of the present application includes at least one carrier plate 10, the carrier plate 10 includes a frame structure and a plurality of spaced-apart shielding strips 13 arranged in the frame structure, and the two ends of the shielding strip 13 are respectively connected to the two opposite first frames 11 of the frame structure.

[0037] The number of the carrier plates 10 in the mask plate can be one or multiple. When the number of the carrier plates 10 in the mask plate is multiple, multiple photovoltaic cells can be evaporated at one time, thereby improving the evaporation efficiency. Each carrier plate 10 is used for shielding the corresponding grid lines of one photovoltaic cell to be evaporated. The distribution of the shielding strips 13 on each carrier plate 10 corresponds to the distribution and size of the first main grid 316 of the photovoltaic cell. The hollowed areas between the shielding strips 13 are the areas of the photovoltaic cell other than the first main grid 316 which need to be evaporated (insulating medium film).

[0038] It should be noted that the RPD is a low-temperature deposition thin film machine using a bottom evaporation method, that is, in the evaporation process, the first TCO conductive layer 313 (light receiving surface) of the photovoltaic cell is placed downward on the carrier plate 10 in the mask plate, and the frame structure and the shielding strip 13 of the carrier plate 10 also have the function of bearing the photovoltaic cell.

[0039] Figure 2 Fig. 4 is a partial structure schematic view of the carrier plate 10 according to the embodiment of the present application; Figure 3 Fig. 5 is a sectional structure schematic view of the shielding strip 13 according to the embodiment of the present application. As shown in Figs. 4 and 5, the shielding strip 13 in the mask plate of the exemplary embodiment of the present application has a first surface 131 and a second surface 132 opposite to the first surface 131. The first surface 131 of the shielding strip 13 is provided with a groove 133 extending along the length direction of the shielding strip 13, and the groove 133 is used for shielding the grid lines protruding from the surface of the photovoltaic cell. The shielding strip 13 also has at least one through hole 134 penetrating from the first surface 131 to the second surface 132. Exemplarily, the groove 133 is arranged at the middle position of the width direction of the shielding strip 13. Figure 2 Figure 3 As shown in Figs. 4 and 5, the first surface 131 of the shielding strip 13 is provided with a groove 133 extending along the length direction of the shielding strip 13, and the groove 133 is used for shielding the grid lines protruding from the surface of the photovoltaic cell. The shielding strip 13 also has at least one through hole 134 penetrating from the first surface 131 to the second surface 132. Exemplarily, the groove 133 is arranged at the middle position of the width direction of the shielding strip 13.

[0040] In practical application, the groove 133 of the shielding strip 13 is matched with the first main grid 316 of the photovoltaic cell to be evaporated. Exemplarily, the shape and size of the groove 133 are consistent with those of the first main grid 316, or the size of the groove 133 is slightly larger than that of the first main grid 316, and the two are gap-fitted, so that the groove 133 can easily and completely shield the corresponding first main grid 316.

[0041] Exemplarily, when the cross section of the first main grid 316 is rectangular, the cross section of the groove 133 is also rectangular. Since the grid line paste forming the metallized first main grid 316 collapses in the printing process, the grid line of the first main grid 316 is wide at the bottom and narrow at the top. The shape of the groove 133 is also matched with the shape of the cross section of the first main grid 316, that is, the width of the cross section of the groove 133 decreases along the direction away from the first surface 131. For example, the cross section of the groove 133 can be inverted triangular or inverted trapezoidal, which will not be listed one by one here.​

[0042] When the light-receiving surface of the photovoltaic cell is placed downward on the carrier plate 10, the first main grid 316 protruding from the surface of the photovoltaic cell is embedded into the groove 133 of the shielding strip 13, wherein the two side walls and the bottom wall of the groove 133 cover the first main grid 316, so that the surface of the photovoltaic cell is attached to the first surface 131 of the shielding strip 13. Since the evaporation environment of the RPD machine is a negative pressure environment, when the cavity where the mask plate is placed is vacuumized from the atmospheric state, the gas (N2 or compressed air) partially passes through the gap between the photovoltaic cell and the shielding strip 13, and is pumped away from the through hole 134 of the shielding strip 13 to form a pressure difference, so that the photovoltaic cell is adsorbed on the shielding strip 13 to complete the fixation. After the two are fixed, the position of the groove 133 of the shielding strip 13 and the first main grid 316 will not shift, and the first main grid 316 will not be exposed, which ensures that the first main grid 316 will not be affected by the insulating medium film around the plating to affect the current output.

[0043] Exemplarily, the through hole 134 is located on the side wall of the groove 133 and penetrates from the first surface 131 to the second surface 132 of the shielding strip 13.

[0044] When the photovoltaic cell placed on the carrier plate 10 is evaporated with an insulating medium film, the RPD machine actually has at least two cavities, a preheating cavity and a process cavity. The photovoltaic cell placed on the carrier plate 10 is first vacuumized in the preheating cavity, and the photovoltaic cell is adsorbed and fixed on the carrier plate 10. When the vacuum degree of the preheating cavity and the vacuum degree of the process cavity are consistent, the valve between the preheating cavity and the process cavity is opened, and the photovoltaic cell placed on the carrier plate 10 starts to be transferred from the preheating cavity to the process cavity for evaporation. Because the groove 133 of the shielding strip 13 shields the first main grid 316, and the through hole 134 firmly attaches the surface of the photovoltaic cell to the first surface 131 of the shielding strip 13 in a negative pressure environment, the insulating medium film is prevented from being evaporated onto the first main grid 316.

[0045] Continuing as shown in Figure 2 The shielding strip 13 has at least one set of through holes 134, and a set of through holes 134 includes two through holes 134, and the two through holes 134 in the same set of through holes 134 are symmetrically arranged on the two sides of the groove 133. The two symmetrically arranged sets of through holes 134 are arranged on the side walls on the two sides of the groove 133, so that the stress of the shielding strip 13 on the two sides of the first main grid 316 is consistent, which can prevent the side of the first surface 131 of the shielding strip 13 from being tightly attached to the surface of the photovoltaic cell, and the insulating medium film is prevented from being plated around the corresponding side of the first main grid 316.

[0046] In some embodiments, the shielding strip 13 has multiple sets of through holes 134, which are evenly distributed along the length direction of the shielding strip 13. The through holes 134 are evenly and symmetrically arranged at the positions close to the two sides of the shielding strip 13, i.e., the positions close to the outer surface of the side walls of the groove 133, so that the photovoltaic cell pieces can be uniformly stressed during the process of attaching the photovoltaic cell pieces to the shielding strip 13, and the consistency of the photovoltaic cell pieces with the attachment surface of the shielding strip 13 can make each position of the first surface 131 of the shielding strip 13 closely attach to the surface of the photovoltaic cell piece, thereby keeping the photovoltaic cell piece stable during the movement of the carrier plate 10.

[0047] For example, during the acceleration and deceleration of the carrier plate 10 carrying the photovoltaic cell pieces in the process cavity, the close attachment of the photovoltaic cell pieces to the shielding strip can prevent the displacement of the photovoltaic cell pieces in the carrier plate 10; when the carrier plate 10 carrying the photovoltaic cell pieces enters or exits the process cavity, the close attachment of the photovoltaic cell pieces to the shielding strip can prevent the displacement of the photovoltaic cell pieces in the horizontal position direction or the jumping of the photovoltaic cell pieces in the vertical position direction due to the fluctuation of the pressure in the cavity when the valve between the cavities is opened, thereby ensuring that the relative position of the first main grid 316 and the shielding strip 13 will not be offset to expose the first main grid 316. Thus, it is ensured that the first main grid 316 will not be plated with an insulating medium film.

[0048] In some embodiments, the size of the through hole 134 ranges from 0.1 mm to 0.2 mm. For example, the through hole 134 can be circular, square, or triangular, which are not listed one by one. Within the above size range, it can be ensured that there are enough through holes 134 arranged in the length direction of the shielding strip 13, and the photovoltaic cell pieces can be closely attached to the shielding strip 13 in a negative pressure environment. For example, when the through hole 134 is a circular hole, the diameter of the through hole 134 can be 0.15 mm.

[0049] In some embodiments, the width of the shielding strip 13 is 1.5 mm to 4 mm, and the thickness is 1 mm to 2 mm. Alternatively, the width of the shielding strip 13 is 2 mm, and the thickness is 1.5 mm. The width of the groove 133 of the shielding strip 13 is 0.5 mm to 1.3 mm, and the depth is 0.1 mm to 0.5 mm. Alternatively, the width of the groove 133 is 1.0 mm, and the depth is 0.2 mm. For example, the first surface 131 of the shielding strip 13 is flat and smooth without burrs.

[0050] Exemplarily, the number of the carrier plates 10 is multiple. The carrier plates 10 are detachably arranged on the mask plate. For example, the frame structure of the carrier plates 10 is made of stainless steel, and the overall frame of the mask plate is also made of stainless steel. The overall frame of the mask plate is arranged with a hollow structure at the corresponding position, and the top inner side of the overall frame arranged with the hollow structure is provided with a stepped surface formed annular groove, and the frame structure of the carrier plate 10 is clamped in the annular groove and supported on the groove bottom. The carrier plate 10 arranged on the mask plate in this embodiment can be conveniently taken out and installed one or more carrier plates 10, so as to facilitate the maintenance of the carrier plate 10, or to replace the carrier plate 10 with the corresponding shielding strip 13 in order to cope with different main grid structures of the photovoltaic cell pieces.

[0051] Figure 4 is a schematic view of the carrier 20 according to the embodiment of the present application. As shown in Figure 1 and Figure 4 shown, the carrier plate 10 further comprises at least one set of carriers 20, and one set of carriers 20 comprises two carriers 20, and the two carriers 20 in the same set of carriers 20 are arranged on the opposite second frames 12 of the frame structure respectively. One end of the carrier 20 is arranged on the inner side of the second frame 12, and the other end extends towards the opposite second frame 12.

[0052] The frame structure of the carrier plate 10 matches the rectangular structure of the photovoltaic cell piece, and the rectangular frame structure comprises two opposite first frames 11 and two opposite second frames 12. One or two carriers 20 are arranged on the opposite two second frames 12 respectively, which can assist in supporting the two side edges of the photovoltaic cell piece, so as to maintain the stability between the photovoltaic cell piece and the carrier plate 10. Alternatively, one or two carriers 20 are arranged on the two first frames 11 and the two second frames 12 respectively, which can assist in supporting the four side edges of the photovoltaic cell piece.

[0053] In order to maintain the stability of the support of the photovoltaic cell piece, the carrier 20 has a carrier surface parallel to the first surface 131. For example, the carrier surface of each carrier 20 is flush with the first surface 131, so that the surface of the photovoltaic cell piece can be stably attached to the first surface 131 of the shielding strip 13.

[0054] Exemplarily, the shape of the carrier surface of the carrier 20 can be rectangular, triangular, trapezoidal, etc., which is not limited here.

[0055] In some embodiments, the photovoltaic cell of the exemplary embodiment of the present application adopts a mask plate to shield the first main grid 316 to prepare the first insulating medium layer 314 and the second insulating medium layer 315. Specifically, the front surface of the N-type single crystal silicon wafer 30 is sequentially laminated with a first intrinsic amorphous silicon layer 311, an N-type amorphous silicon layer 312, a first TCO conductive layer 313 (ITO), a first insulating medium layer 314 (Al2O3), and a second insulating medium layer 315 (SiO2), wherein the first main grid 316 is further formed on the first TCO conductive layer 313; and the back surface is sequentially laminated with a second intrinsic amorphous silicon layer 321, a P-type amorphous silicon layer 322, and a second TCO conductive layer 323, wherein the second main grid 324 is further formed on the second TCO conductive layer 323.

[0056] Exemplarily, the thickness of the first TCO conductive layer 313 (ITO) is 50-120 nm, for example, 80 nm; the thickness of the first insulating medium layer 314 (Al2O3) is 10-100 nm, exemplarily 30-80 nm, for example, 55 nm; and the thickness of the second insulating medium layer 315 (SiO2) is 10-100 nm, exemplarily 30-70 nm. For example, in the HJT photovoltaic cell prepared by using the mask plate of the exemplary embodiment of the present application, the thickness of the first TCO conductive layer 313 (ITO) is 80 nm; the thickness of the first insulating medium layer 314 (Al2O3) is 55 nm; and the thickness of the second insulating medium layer 315 (SiO2) is 50 nm, and the rest of the layers are of a conventional structure, and the measured photo-generated current density is 42.79 mA / cm 2 .

[0057] As can be seen from the above, in the process of evaporating the insulating medium layer on the first TCO conductive layer 313 of the photovoltaic cell, the mask plate of the exemplary embodiment of the present application can effectively shield the first main grid 316 of the light-receiving surface of the photovoltaic cell, and evaporate the first insulating medium layer 314 and the second insulating medium layer 315 with antireflection effect on the area of the first TCO conductive layer 313 except the first main grid 316, so that the photovoltaic cell can effectively guide the current of the first main grid 316 while improving the photoelectric conversion efficiency. Without the need to modify the existing evaporation equipment and related processes, it is easy to realize large-scale batch production.

[0058] Those skilled in the art should understand that the above embodiments are only for clearly illustrating the present application, and are not intended to limit the scope of the present application. Based on the above disclosure, other changes or modifications can also be made by those skilled in the art, and these changes or modifications are still within the scope of the present application.

Claims

1. A mask, characterized in that, The application discloses a mask plate for a photovoltaic cell, which comprises at least one carrier plate, wherein the carrier plate comprises a frame structure and a plurality of spaced-apart shielding strips arranged in the frame structure, and two ends of each shielding strip are connected to two opposite first side frames of the frame structure. A first surface of each shielding strip is provided with a groove extending along the length direction of the shielding strip, and the groove is used for shielding a grid line protruding from the surface of the photovoltaic cell. Each shielding strip further comprises a second surface opposite to the first surface and at least one through hole penetrating through the first surface to the second surface.

2. The mask defined in claim 1, wherein The groove is matched with the grid line.

3. The mask defined in claim 1, wherein The width of the cross section of the groove is constant or decreases along the direction away from the first surface.

4. The mask defined in claim 1, wherein Each shielding strip comprises at least one group of through holes, and each group of through holes comprises two through holes.

5. The mask of claim 4, wherein, The two through holes in the same group of through holes are symmetrically arranged on two sides of the groove.

6. The mask of any of claims 1-5, wherein, Each shielding strip comprises a plurality of groups of through holes, and the groups of through holes are uniformly distributed along the length direction of the shielding strip.

7. The mask defined in claim 6, wherein The size of the through hole ranges from 0.1 mm to 0.2 mm. The carrier plate further comprises at least one group of bearing members, and each group of bearing members comprises two bearing members.

8. The mask defined in claim 7, wherein The two bearing members in the same group of bearing members are arranged on two opposite second side frames of the frame structure.

9. The mask of claim 8, wherein, One end of each bearing member is arranged on the inner side of the second side frame, and the other end of each bearing member extends towards the other second side frame.

10. The mask of claim 6, wherein, Each bearing member has a bearing surface parallel to the first surface. The bearing surface of each bearing member is flush with the first surface. The carrier plate is detachably arranged on the mask plate.

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