Organic polymer chemical vapor deposition device with self-cleaning function

Abstract

The utility model relates to the field of manufacturing of organic polymer chemical vapor deposition devices, in particular to an organic polymer chemical vapor deposition device with a self-cleaning function, which is characterized in that a raw material evaporation chamber, a raw material reaction chamber, a deposition chamber, a waste trapping cavity and a vacuum pump are sequentially communicated; the heating module surrounds the raw material evaporation chamber and the raw material reaction chamber; the raw material evaporation chamber is communicated with the self-cleaning raw material inlet through a valve; valves are respectively arranged between the raw material reaction chamber and the deposition chamber as well as between the deposition chamber and the waste trapping cavity; the raw material reaction chamber is provided with a bypass pipeline communicated with the waste trapping cavity, and the bypass pipeline is provided with a valve. According to the device, the aim of cleaning sediments in the cavity of the device is achieved through physical and chemical reactions, the convenience of maintenance and cleaning work is improved, and meanwhile the maintenance time is saved.

Description

TECHNICAL FIELD

[0001] The utility model relates to organic polymer chemical vapor deposition device manufacturing field, especially organic polymer chemical vapor deposition device with self cleaning function. BACKGROUND

[0002] Organic polymer chemical vapor deposition device is a kind of more common industrial equipment, especially in semiconductor manufacturing, the film deposition of organic polymer material is crucial.It can realize high-quality film deposition, preparation of doped materials, formation of heterostructure, wien processing and growth of two-dimensional materials.

[0003] At present, the equipment with thermal evaporation structure is widely used in organic polymer chemical vapor deposition device, and its principle is mainly that raw material is gasified and sublimated in raw material evaporation chamber, then is transported to raw material reaction chamber to carry out material chemical cracking, then is transported to deposition chamber, and after chemical reaction on product surface, is deposited on product surface, and excess material is collected in waste collecting device by vacuum device.

[0004] However, after the process of most organic polymer chemical vapor deposition devices, the used material is deposited in equipment pipeline, especially raw material evaporation chamber and reaction chamber, and after long time use, the deposited material will fall off in the next use, enter deposition chamber with process gas and be deposited in product partially.For semiconductor devices, the above process is not friendly, and the deposited material will form foreign matter in product, causing defects, so regular maintenance and cleaning of equipment process pipeline are needed, and conventional maintenance needs to disassemble and assemble equipment, so there are long recovery time period, poor convenience, unknown stability and other conditions. UTILITY MODEL CONTENTS

[0005] To solve the above technical problems existing in equipment, the utility model discloses an organic polymer chemical vapor deposition device with self cleaning function.

[0006] The utility model discloses an organic polymer chemical vapor deposition device with self cleaning function, which is characterized in that the device comprises a raw material evaporation chamber, a raw material reaction chamber, a deposition chamber, a waste trapping cavity, a vacuum pump and a heating module, wherein: the raw material evaporation chamber, the raw material reaction chamber, the deposition chamber, the waste trapping cavity and the vacuum pump are sequentially communicated; the heating module surrounds the raw material evaporation chamber and the raw material reaction chamber outside; the raw material evaporation chamber is communicated with the self cleaning raw material inlet through a valve; valves are arranged between the raw material reaction chamber and the deposition chamber and between the deposition chamber and the waste trapping cavity; a bypass pipeline is arranged on the raw material reaction chamber and communicated with the waste trapping cavity, and a valve is arranged on the bypass pipeline.

[0007] Specifically, the self-cleaning raw material inlet is further provided with a special treatment device, which adopts a functional module for improving the reaction activity of the cleaning raw material, including but not limited to an ozone generator or a gas plasma generator.

[0008] Specifically, the waste collection cavity adopts a cold trap or a physical filter layer that does not affect the vacuum pumping speed of the device.

[0009] Further, the device further comprises a heated material port cover located at the end of the raw material evaporation chamber, which realizes omnidirectional heating and heat preservation of the material.

[0010] Further, temperature sensors are arranged in the raw material evaporation chamber and the raw material reaction chamber to realize program control and feedback of temperature.

[0011] The use method of the organic high polymer chemical vapor deposition device with a self-cleaning function is as follows.

[0012] During cleaning operation, the valves at the self-cleaning raw material inlet and the bypass pipeline are opened, the valves between the reaction chamber and the deposition chamber and between the deposition chamber and the waste collection cavity are closed, the cleaning raw material corresponding to the raw material and physically and chemically reacting with the raw material is selected, and the deposited material adhered in the raw material evaporation chamber, the raw material reaction chamber and the deposition chamber is cleaned.

[0013] The method is suitable for high polymer materials mainly formed by C, O and H bonds, and the thin film is deposited by chemical vapor deposition, and there is a corresponding oxidation-reduction material, and the reduced substance is mainly gas which can be pumped out by a vacuum pump.

[0014] The organic high polymer chemical vapor deposition device with a self-cleaning function of the utility model utilizes the heating module, the self-cleaning raw material inlet and the special treatment device of the device itself, and achieves the purpose of cleaning the deposits in the chamber of the device through physical and chemical reactions, so that the cleaning operation can be completed without disassembling the device, the convenience of maintenance and cleaning work is improved, and the maintenance time is saved. BRIEF DESCRIPTION OF DRAWINGS

[0015] Figure 1 The structure of the utility model is shown in the figure.

[0016] The raw material evaporation chamber 1, the raw material reaction chamber 2, the deposition chamber 3, the waste collection cavity 4, the vacuum pump 5, the heating module 6, the self-cleaning raw material inlet 7, the bypass pipeline 8, the special treatment device 9 and the material port cover 10. DETAILED DESCRIPTION

[0017] The drawings are referred to.Figure 1 When the organic polymer chemical vapor deposition device is in deposition operation, raw materials are put into the raw material evaporation chamber 1 from the material inlet cover 10. After the material inlet cover 10 is closed, the device pipeline is vacuumized by the program control vacuum pump 5. After the temperature is heated to the raw material evaporation temperature or sublimation temperature by the program control heating module 6 outside the raw material evaporation chamber 1, the raw materials become gas. Under the action of the vacuum pump 5, the raw materials enter the raw material reaction chamber 2. After the temperature is heated to the raw material reaction temperature by the program control heating module 6 outside the raw material reaction chamber 2, the raw materials become free radicals, single chains or small molecules. Under the action of the vacuum pump 5, the raw materials enter the deposition chamber 3. The materials in the deposition chamber 3 react and deposit on the surface of the product to form a new combined film layer, achieving the purpose of material deposition. Then the excess materials are pumped into the waste collection chamber 4, and the material deposition is completed. During the entire deposition process, the valves at the self-cleaning raw material inlet 7 and the bypass pipeline 8 are opened, and the valves between the reaction chamber and the deposition chamber 3 and between the deposition chamber 3 and the waste collection chamber 4 are closed.

[0018] The self-cleaning function uses poly-p-xylylene as an example. After the material is deposited in the process, the material adheres to the inner walls of the material inlet cover 10, the raw material evaporation chamber 1 and the raw material reaction chamber 2. After multiple uses, the material will fall off and enter the product film surface with the next process, causing defects in the product. Therefore, the self-cleaning function can remove the deposition residues. The operation is as follows: open the vacuum pump 5, open the valves at the self-cleaning raw material inlet 7 and the bypass pipeline 8, and close the valves between the reaction chamber and the deposition chamber 3 and between the deposition chamber 3 and the waste collection chamber 4.

[0019] Example 1: The heating module 6 is simultaneously heated to 1000-1200℃, and oxygen is introduced from the self-cleaning raw material inlet 7.

[0020] Example 2: The heating module 6 is simultaneously heated to 800-1000℃, and oxygen and high-pressure pure water are introduced from the self-cleaning raw material inlet 7. The special treatment device 9 uses an ozone generator, and the oxygen and high-pressure pure water are converted into ozone under the action of the ozone generator.

[0021] Example 3: The heating module 6 is simultaneously heated to 500-800℃, and oxygen is introduced from the self-cleaning raw material inlet 7. The special treatment device 9 uses a gas plasma generator, and the oxygen and high-pressure pure water are converted into oxygen plasma under the action of the ozone generator.

[0022] After a period of time, the material adhering to the inner wall will react with oxygen at high temperature to generate carbon dioxide, water vapor and other products. These products enter the waste collection chamber 4 through the bypass pipeline 8, thereby achieving the purpose of maintaining and cleaning the internal residues without disassembling the device.

[0023] Obviously, the above embodiments are only examples for clearly illustrating the present application, and are not intended to limit the present application. Based on the above description, one of ordinary skill in the art can make other different forms of changes or modifications on the application range, material system, and using method without departing from the spirit and scope of the present application. Here, it is not necessary and also impossible to enumerate all the embodiments. The obvious changes or modifications derived from the above description should still be within the protection scope of the present application.

Claims

1. An organic polymer chemical vapor deposition apparatus with a self-cleaning function, characterized by The device comprises a raw material evaporation chamber (1), a raw material reaction chamber (2), a deposition chamber (3), a waste collection cavity (4), a vacuum pump (5), and a heating module (6), wherein: the raw material evaporation chamber (1), the raw material reaction chamber (2), the deposition chamber (3), the waste collection cavity (4), and the vacuum pump (5) are sequentially communicated; the heating module (6) surrounds the raw material evaporation chamber (1) and the raw material reaction chamber (2) outside; the raw material evaporation chamber (1) is communicated with a self-cleaning raw material inlet (7) through a valve; each of the raw material reaction chamber (2) and the deposition chamber (3), and the deposition chamber (3) and the waste collection cavity (4) is provided with a valve; the raw material reaction chamber (2) is provided with a bypass pipeline (8) communicated with the waste collection cavity (4), and the bypass pipeline (8) is provided with a valve.

2. The organic polymer chemical vapor deposition apparatus with a self-cleaning function according to claim 1, wherein A special treatment device (9) is further arranged at the self-cleaning raw material inlet (7), wherein the special treatment device (9) is an ozone generator or a gas plasma generator.

3. The organic polymer chemical vapor deposition apparatus with self-cleaning function according to claim 1, wherein The waste collection cavity (4) is a cold trap or a physical filter layer.

4. The organic polymer chemical vapor deposition apparatus with self-cleaning function according to claim 1, wherein A heated material port cover (10) is further included, and the material port cover (10) is located at the end of the raw material evaporation chamber (1).

5. The organic polymer chemical vapor deposition apparatus having a self-cleaning function according to claim 1, wherein Temperature sensors are arranged in the raw material evaporation chamber (1) and the raw material reaction chamber (2).

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