Equipment for plasma treatment

Abstract

The utility model relates to the field of plasma cleaning equipment, and discloses equipment for plasma treatment. Equipment for plasma treatment comprises a cavity and a door, a support is arranged in the cavity and used for containing materials, the cavity is provided with a discharging port, the door is rotationally connected to the side wall of the cavity and used for closing or opening the discharging port, an elastic blocking piece is arranged on the face, facing the interior of the cavity, of the side wall of the cavity, and the elastic blocking piece is adjacent to the discharging port. According to the equipment used for plasma processing, the elastic blocking piece is arranged near the discharging port, the support abuts against the elastic blocking piece, the elastic blocking piece can prevent the support from moving in the cavity and prevent the support from shaking in the cavity, meanwhile, the support is made of a conductor, and under the condition that the support is powered on, the support is not prone to shaking. An electric field can be generated between every two adjacent supports, so that gas in the cavity is ionized, an electrode does not need to be arranged independently, and the production cost is saved.

Description

Technical Field

[0001] This utility model relates to the field of plasma cleaning equipment, and in particular to a device for plasma treatment. Background Technology

[0002] Equipment used for plasma treatment utilizes electrode plates to generate an electric field. Inside the equipment, the gas, in a relatively vacuum environment, is subjected to this electric field, causing electrons in the neutral gas atoms to gain enough energy to overcome the attraction of the atomic nucleus and become free electrons. Simultaneously, neutral atoms or molecules lose negatively charged electrons and become positively charged ions, thus generating plasma. Plasma treatment equipment typically has a closed cavity. For easy loading and unloading of materials, a door is installed in the cavity. A movable support is installed inside the cavity to hold the materials. However, due to the gap between the support and the door, the support often sways within the cavity during operation, affecting the processing efficiency of the materials.

[0003] Therefore, there is an urgent need for a device for plasma processing to solve the above-mentioned technical problems. Utility Model Content

[0004] The purpose of this invention is to provide a device for plasma treatment that can solve the problem that the support for placing materials often shakes during the operation of the plasma treatment device when the support is movable inside the cavity.

[0005] To achieve this objective, the present invention adopts the following technical solution:

[0006] An apparatus for plasma processing includes a cavity and a door. The cavity is provided with a support for placing materials. The cavity is provided with a discharge port. The door is rotatably connected to the side wall of the cavity and is used to close or open the discharge port. An elastic blocking member is provided on the side wall facing the interior of the cavity. The elastic blocking member is adjacent to the discharge port and is used to prevent the support from moving inside the cavity.

[0007] As an optional solution, the elastic blocking member includes a fixing part and a rotating part. The fixing part is fixedly connected to the side wall of the cavity and has a mounting groove. The rotating part is rotatably connected in the mounting groove. When the bracket is placed inside the cavity, the bracket abuts against the rotating part, and the rotating part can prevent the bracket from moving.

[0008] As an alternative, when the stent is removed from the cavity, the stent can be pushed by an external force to rotate the rotating part toward the outside of the cavity.

[0009] As an optional scheme, the bottom of the mounting groove is provided with an elastic limiting piece, the rotating part is provided with a mounting hole in the direction of the mounting groove, the elastic limiting piece is clamped in the mounting hole, and the elastic limiting piece can reset the rotating part.

[0010] As an optional scheme, the first conductive device and the second conductive device are oppositely arranged inside the cavity, the support is arranged between the first conductive device and the second conductive device, a plurality of conductive rotating parts are respectively arranged on the first conductive device and the second conductive device, the material of the support is a conductor, the support is arranged on the conductive rotating parts and is electrically connected with the conductive rotating parts.

[0011] As an optional scheme, a plurality of insulating rotating parts are respectively arranged on the first conductive device and the second conductive device, and the insulating rotating parts and the conductive rotating parts are alternately arranged.

[0012] As an optional scheme, the first conductive device comprises a second shielding plate, a first shielding plate and a first conductive plate, a first accommodating cavity is formed between the second shielding plate and the first shielding plate, the first conductive plate is accommodated in the first accommodating cavity, and the conductive rotating parts are electrically connected with the first conductive plate.

[0013] As an optional scheme, the second shielding plate is provided with a first air hole, the first air hole is communicated with an external air source, the first conductive plate is provided with a plurality of second air holes, the first shielding plate is provided with a plurality of third air holes, and external air can flow into the cavity through the first air hole, the second air hole and the third air hole.

[0014] As an optional scheme, the second conductive device comprises a third shielding plate, a fourth shielding plate and a second conductive plate, a second accommodating cavity is formed between the third shielding plate and the fourth shielding plate, the second conductive plate is accommodated in the second accommodating cavity, and the conductive rotating parts are electrically connected with the second conductive plate.

[0015] As an optional scheme, a suction source is further included, the second conductive device is provided with a fourth air hole penetrating through the third shielding plate, the fourth shielding plate and the second conductive plate, and the fourth air hole is communicated with the suction source.

[0016] The utility model at least has the following advantages: the elastic blocking piece is arranged near the discharge port, the support abuts against the elastic blocking piece, the elastic blocking piece can prevent the support from moving in the cavity, and the support is prevented from shaking in the cavity. BRIEF DESCRIPTION OF DRAWINGS

[0017] In order to more clearly illustrate the technical scheme in the embodiments of the utility model, the drawings needed in the description of the embodiments of the utility model will be briefly introduced.

[0018] Figure 1 A structure schematic view of a device for plasma processing is provided for the embodiment of the utility model;

[0019] Figure 2 A structure schematic view of a device (remove door) for plasma processing is provided for the embodiment of the utility model;

[0020] Figure 3 A structure schematic view of an elastic blocking piece is provided for the embodiment of the utility model;

[0021] Figure 4 A structure schematic view of a fixed part is provided for the embodiment of the utility model;

[0022] Figure 5 A structure schematic view of a rotating part is provided for the embodiment of the utility model;

[0023] Figure 6 A structure schematic view of a device (remove cavity) for plasma processing is provided for the embodiment of the utility model;

[0024] Figure 7 A structure schematic view of a first conductive device is provided for the embodiment of the utility model;

[0025] Figure 8 An exploded view of the first conductive device is provided for the embodiment of the utility model;

[0026] Figure 9 Another angle view of the second shielding plate is provided for the embodiment of the utility model.

[0027] Reference signs:

[0028] 1, cavity; 2, door; 3, elastic blocking piece; 31, fixed part; 32, rotating part; 33, installation groove; 34, elastic limiting piece; 4, support; 5, first conductive device; 51, first shielding plate; 52, first conductive plate; 53, second shielding plate; 531, first air hole; 54, conductive rotating piece; 55, insulating rotating piece; 56, third air hole; 57, second air hole, 58, first terminal post; 59, recess; 6, second conductive device; 61, fourth air hole; 62, second terminal post. DETAILED DESCRIPTION

[0029] In order to more clearly understand the technical means of the utility model, and can be implemented according to the content of the specification, the specific embodiment of the utility model is further described in detail below, the following examples are used to illustrate the utility model, but not to limit the scope of the utility model.

[0030] In the prior art, in order to facilitate the handling of materials, a door is provided in the plasma treatment equipment, and a support is installed inside the equipment to hold the materials. However, due to the gap between the support and the door, the support often shakes inside the cavity during the operation of the plasma treatment equipment, which affects the treatment effect on the materials.

[0031] Therefore, such as Figures 1 to 9 As shown, an embodiment of this utility model provides a device for plasma processing to solve the above-mentioned technical problems.

[0032] Specifically, such as Figure 1 , Figure 2 As shown, a device for plasma treatment includes a cavity 1 and a door 2. The cavity 1 is provided with a support 4 for placing materials. The cavity 1 is provided with a discharge port. The door 2 is rotatably connected to the side wall of the cavity 1 and is used to close or open the discharge port. An elastic blocking member 3 is provided on the side wall facing the inside of the cavity 1. The elastic blocking member 3 is adjacent to the discharge port, and the support 4 abuts against the elastic blocking member 3. Therefore, the elastic blocking member 3 can prevent the support 4 from moving inside the cavity 1 and avoid the support 4 from shaking inside the cavity 1.

[0033] In some embodiments, in order to facilitate the loading and unloading of materials, the cavity 1 is provided with two discharge ports and two doors 2, and each discharge port is provided with an elastic blocking member 3, and the bracket 4 can be locked between the two elastic blocking members 3.

[0034] like Figure 3 , Figure 4 and Figure 5 As shown, in some embodiments, the elastic blocking member 3 includes a fixing part 31 and a rotating part 32. The fixing part 31 is fixedly connected to the side wall of the cavity 1. The fixing part 31 is provided with a mounting groove 33. The rotating part 32 is rotatably connected in the mounting groove 33. When the bracket 4 is placed inside the cavity 1, the bracket 4 abuts against the rotating part 32. The rotating part 32 can prevent the bracket 4 from moving. When the bracket 4 is taken out of the cavity 1, the bracket 4 can push the rotating part 32 to rotate towards the outside of the cavity 1 under the action of external force, so that the bracket 4 can be taken out of the cavity 1.

[0035] In some embodiments, the bottom of the mounting groove 33 is provided with an elastic limiting member 34, and the rotating part 32 is provided with a mounting hole 36 in the direction of the mounting groove 33. The elastic limiting member 34 is engaged in the mounting hole 36 and can reset the rotating part 32. Here, the elastic limiting member 34 can be a spring. One end of the spring is provided in the mounting hole 36, and the other end of the spring is fixed to the bottom of the mounting groove 33. When the bracket 4 is taken out from the cavity 1, the bracket 4 can cause the spring to deflect in the direction of the door 2 under the action of external force, thereby pulling the bracket 4 out of the cavity 1. After the external force is removed, the spring returns to a state perpendicular to the bottom of the mounting groove 33.

[0036] As shown in Figure 6 some embodiments, in order to generate plasma inside the cavity 1, the first and second conductive devices 5 and 6 are oppositely arranged inside the cavity 1, the holder 4 is arranged between the first and second conductive devices 5 and 6, a plurality of conductive rotating members 54 are arranged on the first and second conductive devices 5 and 6 respectively, the holder 4 is made of a conductor, the holder 4 is arranged on the conductive rotating members 54 and electrically connected with the conductive rotating members 54, a plurality of first connecting posts 58 are arranged on the surface of the first conductive device 5 away from the conductive rotating members 54, a plurality of second connecting posts 62 are arranged on the surface of the second conductive device 6 away from the conductive rotating members 54, the first and second connecting posts 58 and 62 are respectively connected with an external power supply, in the case of power supply, an electric field can be generated between the adjacent holders 4 (i.e. the adjacent holders 4 can discharge), so that the gas inside the cavity 1 is ionized, thus the electrode does not need to be arranged separately, and the production cost is saved. In addition, the conductive rotating members 54 can rotate, so that the holder 4 can be taken out of the cavity 1 more easily. The conductive rotating members 54 described herein can be metal rotating wheels.

[0037] As shown in Figure 7 some embodiments, in order to improve the support ability of the holder 4 without increasing the production cost, the first conductive device 5 is provided with a plurality of insulating rotating members 55. At the same time, in order to ensure good electrical conductivity, the insulating rotating members 55 and the conductive rotating members 54 are arranged alternately, of course, a plurality of insulating rotating members 55 can also be arranged on the second conductive device 6, and the insulating rotating members 55 and the conductive rotating members 54 are arranged alternately. The insulating rotating members 55 described herein can be rubber wheels.

[0038] As shown in Figure 8 some embodiments, in order to prevent the discharge arc phenomenon inside the cavity 1, the first conductive device 5 includes a second shielding plate 53, a first shielding plate 51 and a first conductive plate 52, the surface of the second shielding plate 53 facing the first conductive plate 52 is provided with a groove 59, when the first shielding plate 51 covers the second shielding plate 53, a first accommodating cavity is formed between the first and second shielding plates 51 and 53, the first conductive plate 52 is accommodated in the first accommodating cavity, the conductive rotating members 54 are electrically connected with the first conductive plate 52, and the second shielding plate 53 and the first shielding plate 51 can shield the first conductive plate 52, so as to prevent the discharge arc phenomenon between the first conductive plate 52 and the holder 4. The first conductive plate 52 described herein can be a metal plate.

[0039] In some embodiments, in order to introduce uniform gas into the cavity 1, the second shielding plate 53 is provided with a first air hole 531, the first air hole 531 is communicated with an external gas source, the first conductive plate 52 is uniformly provided with a plurality of second air holes 57, the first shielding plate 51 is uniformly provided with a plurality of third air holes 56, and the external gas can flow into the cavity 1 through the first air hole 531, the second air hole 57 and the third air hole 56, and the airflow direction is parallel to the plane where the support 4 is located, so that the material placed on the support 4 has less resistance to the airflow.

[0040] In some embodiments, in order to prevent the electric field generated in the cavity 1 from radiating outward, the second conductive device 6 includes a third shielding plate, a fourth shielding plate and a second conductive plate, the second conductive device 6 includes a third shielding plate, a fourth shielding plate and a second conductive plate, a second containing cavity is formed between the third shielding plate and the fourth shielding plate, the second conductive plate is contained in the second containing cavity, the conductive rotating part 54 is electrically connected with the second conductive plate, and the second containing cavity is formed in the same way as the first containing cavity, which will not be repeated here.

[0041] In some embodiments, in order to form a relatively vacuum environment in the cavity 1, the application also includes a suction source, the second conductive device 6 is provided with a fourth air hole 61 penetrating through the third shielding plate, the fourth shielding plate and the second conductive plate, and the fourth air hole 61 is communicated with the suction source, and the suction source can be a vacuum pump.

[0042] The above is only the preferred embodiment of the present application, and is not used to limit the present application, it should be pointed out that for ordinary skilled in the art, without departing from the technical principles of the present application, can make a number of improvements and modifications, these improvements and modifications should also be considered as the protection scope of the present application.

Claims

1. An apparatus for plasma processing, characterized by, The utility model provides a material placing device, which comprises a cavity (1) and a door (2), the cavity (1) is internally provided with a support (4) for placing materials, the cavity (1) is provided with a material outlet, the door (2) is rotatably connected to the side wall of the cavity (1), and the door (2) is used for closing or opening the material outlet, and the side wall of the cavity (1) is provided with an elastic blocking piece (3) on the surface facing the inside of the cavity (1), the elastic blocking piece (3) is adjacent to the material outlet, and the elastic blocking piece (3) is used for preventing the support (4) from moving inside the cavity (1).

2. The apparatus for plasma processing according to claim 1, wherein The elastic blocking piece (3) comprises a fixed part (31) and a rotating part (32), the fixed part (31) is fixedly connected to the side wall of the cavity (1), the fixed part (31) is provided with a mounting groove (33), the rotating part (32) is rotatably connected in the mounting groove (33), when the support (4) is placed inside the cavity (1), the support (4) abuts against the rotating part (32), and the rotating part (32) can prevent the support (4) from moving.

3. The apparatus for plasma processing according to claim 1 or 2, characterized by, When the support (4) is taken out from the cavity (1), the support (4) can push the rotating part (32) to rotate towards the outside of the cavity (1) under the action of external force.

4. The apparatus for plasma processing according to claim 2, wherein The bottom of the mounting groove (33) is provided with an elastic limiting piece (34), the rotating part (32) is provided with a mounting hole (36) in the direction of the mounting groove (33), the elastic limiting piece (34) is clamped in the mounting hole (36), and the elastic limiting piece (34) can reset the rotating part (32).

5. The apparatus for plasma processing according to claim 1, wherein The first conductive device (5) and the second conductive device (6) are oppositely arranged inside the cavity (1), the support (4) is arranged between the first conductive device (5) and the second conductive device (6), a plurality of conductive rotating pieces (54) are arranged on the first conductive device (5) and the second conductive device (6) respectively, the material of the support (4) is a conductor, the support (4) is arranged on the conductive rotating piece (54) and is electrically connected with the conductive rotating piece (54).

6. The apparatus for plasma processing according to claim 5, wherein A plurality of insulating rotating pieces (55) are arranged on the first conductive device (5) and the second conductive device (6) respectively, and the insulating rotating pieces (55) and the conductive rotating pieces (54) are alternately arranged.

7. The apparatus for plasma processing of claim 5, wherein, The first conductive device (5) comprises a first shielding plate (51), a second shielding plate (53) and a first conductive plate (52), a first containing cavity is formed between the second shielding plate (53) and the first shielding plate (51), the first conductive plate (52) is contained in the first containing cavity, and the conductive rotating piece (54) is electrically connected with the first conductive plate (52).

8. The apparatus for plasma processing according to claim 7, wherein The second shielding plate (53) is provided with a first air hole (531) in communication with an external air source, the first conductive plate (52) is provided with a plurality of second air holes (57), and the first shielding plate (51) is provided with a plurality of third air holes (56), so that external air can flow into the cavity (1) through the first air hole (531), the second air hole (57) and the third air hole (56).

9. The apparatus for plasma processing according to any one of claims 5 to 8, characterized by, The second conductive device (6) comprises a third shielding plate, a fourth shielding plate and a second conductive plate, a second containing cavity is formed between the third shielding plate and the fourth shielding plate, and the second conductive plate is contained in the second containing cavity, the conductive rotating part (54) is electrically connected with the second conductive plate.

10. The apparatus for plasma processing of claim 9, wherein, Further comprising a suction source, the second conductive device (6) is provided with a fourth air hole (61) penetrating through the third shielding plate, the fourth shielding plate and the second conductive plate, and the fourth air hole (61) is in communication with the suction source.

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