A rapid temperature control plasma discharge device

By setting a conductive heating layer and electrode connector on the outside of the vacuum discharge tube, the problems of large space occupation and low thermal energy utilization of existing temperature control equipment are solved, achieving high purity and temperature uniformity of plasma reaction and improving the consistency of processing quality.

CN223613521UActive Publication Date: 2025-11-28KUNSHAN PLAUX ELECTRONICS TECH CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
CN202423004389.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-06
Publication Date
2025-11-28
Estimated Expiration
2034-12-06

AI Technical Summary

Technical Problem

In existing low-pressure vacuum plasma treatment, temperature control methods suffer from problems such as large equipment footprint, low thermal energy utilization, and uneven reaction.

Method used

The conductive heating layer on the outside of the vacuum discharge tube is used, combined with the electrode connector and the power supply. Rapid temperature control is achieved through the nano-resistive diaphragm layer and the resistance wire heating element, which improves temperature uniformity and heat preservation effect.

Benefits of technology

It achieves high purity of plasma reaction, simple structure, rapid heating and heat preservation, and improves temperature uniformity and consistency of processing quality.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN223613521U_ABST
    Figure CN223613521U_ABST
Patent Text Reader

Abstract

The utility model provides a kind of plasma discharge device of quick temperature control, including vacuum discharge tube and plasma coupling coil.Vacuum discharge tube is the container of plasma discharge and material processing, and plasma is generated under the electric field effect of plasma coupling coil.The tube wall of vacuum discharge tube is also provided with heat preservation component, and the technology of nano electric heating is combined into plasma discharge device, compared with the scheme of muffle furnace heating in prior art, the plasma reaction purity higher, structure simpler is used in the utility model, the rapid heating and heat preservation of vacuum discharge tube can be realized, and the uniformity of plasma reaction is higher.
Need to check novelty before this filing date? Find Prior Art

Description

TECHNICAL FIELD

[0001] The utility model relates to a kind of plasma discharge equipment, in particular to a kind of plasma discharge device of fast temperature control. BACKGROUND

[0002] In the process of plasma processing material under low-pressure vacuum environment, in order to ensure that the process achieves the best effect, the heating and heat preservation measures of the reaction cavity are particularly important. Keeping the temperature in the reaction cavity helps the depth and uniformity of material surface modification, and can further optimize the distribution of plasma, enhance its stability, avoid the adverse effects of temperature fluctuations on plasma state, so as to ensure the consistency and repeatability of processing quality.

[0003] The temperature control means of the prior art usually installs a heating system in the reaction cavity, or matches an infrared heating device outside the reaction cavity, for example, a quartz glass cylinder is used as the reaction cavity, which usually needs to be matched with a muffle furnace for heating. The device occupies a large space and has low heat utilization rate, and there is a situation of uneven reaction. In summary, the heat preservation technology of low-pressure vacuum plasma has many deficiencies and great room for improvement. UTILITY MODEL CONTENT

[0004] To solve the above technical problems, the utility model provides a kind of plasma discharge device of fast temperature control, including vacuum discharge pipe, the outer side of the pipe body of discharge pipe is equipped with plasma coupling coil, and the two ends of plasma coupling coil are respectively led out anode and cathode;It also includes heat preservation component, the heat preservation component includes the electrically conductive heating layer with resistance characteristic, the electrically conductive heating layer is ringed on the outside of vacuum discharge pipe, and is electrically connected with power supply by electrode connector.

[0005] Further, the electrically conductive heating layer is a nano-resistance barrier membrane layer wrapped around the wall of the vacuum discharge tube, and the electrode connector is led out from the surface of the nano-resistance barrier membrane layer.

[0006] Further, the electrode connector is a printed electrode provided on the surface of the resistance barrier membrane layer.

[0007] Further, the electrode connector is a silver layer electrode, and at least two are provided on the surface of the resistance barrier membrane layer.

[0008] Further, the nano-resistance barrier membrane layer is a spray-painted membrane layer or a printed membrane layer.

[0009] Further, the electrically conductive heating layer includes a heating sheet composed of a continuous resistance wire and a planar heat-conducting adhesive layer provided between the heating sheet and the wall of the vacuum discharge tube, and the resistance wire is wound around the wall of the vacuum discharge tube.

[0010] Further, the electrode joint is led out from two ends of the resistance wire.

[0011] Further, the outer side of the heating sheet is provided with a heat insulation layer, and the resistance wire is wrapped between the heat insulation layer and the heat conductive adhesive layer.

[0012] Further, the vacuum discharge tube is open at two ends and provided with vacuum joints connected with vacuumizing equipment.

[0013] Further, a sealing ring is installed between the vacuum joint and the vacuum discharge tube.

[0014] The utility model provides a kind of plasma discharge device of quick temperature control, including vacuum discharge tube and plasma coupling coil.Vacuum discharge tube is the container of plasma discharge and material processing, and plasma is generated under the electric field effect of plasma coupling coil.Vacuum discharge tube's tube wall is also provided with heat preservation component, and the technology of nanometer electric heating is combined into plasma discharge device, compared with the scheme of muffle furnace heating in prior art, the plasma reaction purity higher, structure simpler of the utility model is used, the rapid heating and heat preservation of vacuum discharge tube can be realized, and the uniformity of plasma reaction is higher. BRIEF DESCRIPTION OF DRAWINGS

[0015] Figure 1 It is a kind of plasma discharge device structure schematic diagram of quick temperature control of the utility model;

[0016] Figure 2 It is the forming structure of conductive heating layer on vacuum discharge tube in example 3.

[0017] Reference signs: vacuum discharge tube 1, plasma coupling coil 2, cathode 3, anode 4, vacuum joint 5, sealing ring 6, conductive heating layer 7, electrode joint 8, resistance wire 9, heat conductive adhesive layer 10. DETAILED DESCRIPTION

[0018] Example 1: as Figure 1 The utility model provides a kind of plasma discharge device of quick temperature control, including vacuum discharge tube 1, the vacuum discharge tube 1 is quartz material, and the cavity of vacuum discharge tube 1 is the reaction area of plasma.In the outer side of the tube body of the discharge tube, plasma coupling coil 2 is respectively equipped.Plasma coupling coil 2 is the generation component of plasma, and the outer side of the tube body of discharge tube is wound with plasma coupling coil 2, and anode 4 and cathode 3 are respectively led out from two ends of plasma coupling coil 2, and the anode 4 is arranged to ground, and the cathode 3 is feed-in pole.When the circuit of plasma coupling coil 2 is connected, the electric field along a certain direction is generated on plasma coupling coil 2, directs the directional movement and interaction of particle in vacuum discharge tube 1, and generates plasma in vacuum discharge tube 1.

[0019] The vacuum discharge tube 1 is open at both ends and provided with vacuum connectors 5 connected to vacuumizing equipment, through which process gas is introduced into the cavity of the vacuum discharge tube 1 or the vacuum degree of the cavity of the vacuum discharge tube 1 is maintained, to ensure the occurrence of plasma. The vacuum connectors 5 are symmetrically arranged on both sides, and any one side can be selected as the input end of the process gas, and the other side as the vacuum extraction end. The vacuum connectors 5 can be sleeved on both ends of the vacuum discharge tube 1 through threaded connection or elastic connection, and a sealing ring 6 is arranged between the vacuum connector 5 and the vacuum discharge tube 1 to enhance the tightness of the connection between the vacuum connector 5 and the vacuum discharge tube 1, thereby increasing the sealing degree of the vacuum discharge tube 1.

[0020] In order to ensure the stable generation of plasma in the vacuum discharge tube 1, the cavity of the vacuum discharge tube 1 needs to be maintained at a certain temperature to protect the process gas and ionized gas introduced into the vacuum discharge tube 1, and therefore a heat preservation assembly is further arranged outside the vacuum discharge tube 1. The heat preservation assembly comprises a conductive heating layer 7 having a resistance characteristic, which is annularly arranged outside the vacuum discharge tube 1 and electrically connected to a power supply through an electrode connector 8. The conductive heating layer 7 generates heat after being connected to the power supply to increase and maintain the temperature in the vacuum discharge tube 1.

[0021] The resistance heating has the advantages of fast heat transfer speed and high heating efficiency. The conductive heating layer 7 is annularly arranged on the circumference of the vacuum discharge tube 1 to quickly increase the temperature in the vacuum discharge tube 1. In the embodiment, the conductive heating layer 7 is a planar film formed by high-temperature film forming treatment of nanometer resistance material to form a uniform and stable film on the circumference of the vacuum discharge tube 1. The high-temperature film forming treatment can be vapor deposition, liquid deposition or other methods. The planar film is wrapped outside the vacuum discharge tube 1, and the electrode connector 8 is a silver layer electrode formed on the surface or in the middle of the conductive heating layer 7 by printing. After the silver layer electrode is connected, the temperature of the planar film can be quickly increased.

[0022] Embodiment 2 shows a second forming method of the conductive heating layer 7. Like embodiment 1, a vacuum discharge tube 1 and a plasma coupling coil 2 are provided, and a resistance film is also arranged outside the vacuum discharge tube 1. The difference lies in the film forming method of the resistance film. The resistance film is prepared from uniform resistance paste of resistance nanometer material, and the resistance paste is formed into a resistance film on the surface of the vacuum discharge tube 1 by screen printing or spray drawing, and at least two silver layer electrodes are printed on the surface of the resistance film. After the electrodes are connected, the resistance film can generate heat.

[0023] Figure 2The third forming mode of the conductive heating layer 7 is shown, the conductive heating layer 7 of the embodiment includes a heating sheet composed of a continuous resistance wire 9, the resistance wire 9 is wound around the outside of the vacuum discharge tube 1, and the two ends of the resistance wire 9 are respectively connected with the electrode connector 8 and the external power supply. A planar heat-conducting glue layer 10 is arranged between the vacuum discharge tube 1 and the heating sheet, which is formed by coating high-temperature heat-conducting glue on the wall of the vacuum discharge tube 1, the heat generated by the resistance wire 9 can be quickly transmitted to the inside of the vacuum discharge tube 1 through the heat-conducting glue layer 10, and the resistance wire 9 is uniformly arranged along the extension direction of the heat-conducting glue layer 10 to ensure the uniformity of the temperature at each part of the heat-conducting glue layer 10. Further, the outside of the heating sheet is provided with a heat insulation layer, and the resistance wire 9 is wrapped between the heat insulation layer and the heat-conducting glue layer 10, so as to reduce the heat loss after the resistance wire 9 is powered on.

[0024] Although the embodiments of the utility model have been shown and described above, it can be understood that the above-mentioned embodiments are exemplary and cannot be understood as the limitation of the utility model, and the ordinary skilled in the art can change, modify, replace and transform the above-mentioned embodiments within the scope of the utility model.

Claims

1. A rapid temperature controlled plasma discharge device, characterized by: The application relates to a vacuum discharge tube (1) which is provided with a plasma coupling coil (2) outside the tube body of the discharge tube, and the two ends of the plasma coupling coil (2) are respectively connected with an anode (4) and a cathode (3); the application further relates to a heat preservation assembly which comprises a conductive heating layer (7) with resistance characteristics, the conductive heating layer (7) is arranged outside the vacuum discharge tube (1), and the conductive heating layer (7) is electrically connected with a power supply through an electrode connector (8).

2. A rapid temperature controlled plasma discharge device as claimed in claim 1, characterized in that: The conductive heating layer (7) is a nano-resistance diaphragm layer which is wrapped around the tube wall of the vacuum discharge tube (1), and the electrode connector (8) is led out from the surface of the nano-resistance diaphragm layer.

3. A rapid temperature controlled plasma discharge device as claimed in claim 2, characterized in that: The electrode connector (8) is a printed electrode which is arranged on the surface of the resistance diaphragm layer.

4. A rapid temperature controlled plasma discharge device as claimed in claim 3, characterized in that: The electrode connector (8) is a silver layer electrode, and at least two electrode connectors are arranged on the surface of the resistance diaphragm layer.

5. A rapid temperature controlled plasma discharge device as defined in claim 2, wherein: The nano-resistance diaphragm layer is a spray diaphragm layer or a printed diaphragm layer.

6. A rapid temperature controlled plasma discharge device as defined in claim 1, wherein: The conductive heating layer (7) comprises a heating sheet which is composed of continuous resistance wires (9) and a planar heat-conducting adhesive layer (10) which is arranged between the heating sheet and the tube wall of the vacuum discharge tube (1), and the resistance wires (9) are wound around the tube wall of the vacuum discharge tube (1).

7. A rapid temperature cycled plasma discharge device as claimed in claim 6, characterized in that: The electrode connector (8) is led out from the two ends of the resistance wires (9).

8. A rapid temperature controlled plasma discharge device as defined in claim 6, wherein: The outer side of the heating sheet is provided with a heat insulation layer, and the resistance wires (9) are wrapped between the heat insulation layer and the heat-conducting adhesive layer (10).

9. A rapid temperature cycled plasma discharge device as defined in claim 1, wherein: The two ends of the vacuum discharge tube (1) are open and provided with vacuum connectors (5) which are connected with vacuumizing equipment.

10. A rapid temperature controlled plasma discharge device as claimed in claim 9, characterized in that: A sealing ring (6) is arranged between the vacuum connector (5) and the vacuum discharge tube (1).