Drying tank and drying equipment

Abstract

The embodiment of the utility model provides a drying tank and drying equipment. The drying tank comprises a tank body and a drying device, wherein a containing cavity used for containing the flower basket is formed in the tank body; the basket is provided with a containing cavity, the water guide support is arranged at the bottom of the containing cavity, the water guide support is provided with a water guide supporting rod, the water guide supporting rod is provided with a flow guide part, the water guide supporting rod can jack up a silicon wafer in the basket in the containing cavity, and the flow guide part can be used for conducting flow guide on liquid on the silicon wafer. According to the drying tank, the drying time of the silicon wafer can be shortened, the energy consumption in the silicon wafer drying process is reduced, and the drying efficiency of the silicon wafer is improved.

Description

Technical Field

[0001] This application belongs to the field of photovoltaic processing technology, specifically relating to a drying tank and drying equipment. Background Technology

[0002] With the development of photovoltaic technology, silicon wafers are being used more and more widely. In the silicon wafer production process, baskets are typically used to hold multiple wafers for cleaning and transport. Usually, multiple wafers are inserted into the basket and then cleaned. After cleaning, the baskets holding the wafers are placed in a drying tank. The drying tank is heated and heated to remove water from the surface of the wafers, resulting in dry silicon wafers.

[0003] However, because water easily accumulates at the contact point between the silicon wafer and the basket, and this water is difficult to remove, the drying time for the silicon wafer is relatively long and the drying efficiency is low. Utility Model Content

[0004] This application aims to provide a drying tank and drying equipment to solve the problem of low drying efficiency of existing drying tanks for silicon wafers.

[0005] To solve the above-mentioned technical problems, this application is implemented as follows:

[0006] In a first aspect, this application discloses a drying tank, the drying tank comprising:

[0007] The trough body has a receiving cavity for accommodating the flower basket.

[0008] The water guide bracket is disposed at the bottom of the receiving cavity. The water guide bracket is provided with a water guide support rod and a flow guide part. The water guide support rod can lift the silicon wafer in the basket in the receiving cavity, and the flow guide part can be used to guide the liquid on the silicon wafer.

[0009] Optionally, the guide portion is disposed at the top of the water guide strut, and the width of the guide portion increases gradually from the top to the bottom of the water guide strut.

[0010] Optionally, the cross-sectional shape of the guide portion includes at least one of a triangle, a trapezoid, and a circle.

[0011] Optionally, the water guide bracket further includes: a base and an adjusting component; wherein,

[0012] The base is connected to the bottom of the receiving cavity;

[0013] The adjusting component is connected to the base;

[0014] The water guide rod is connected to the adjusting member, which supports the water guide rod and drives the water guide rod to adjust its height.

[0015] Optionally, the water guide bracket further includes a first fastener and a second fastener; wherein,

[0016] The base is provided with a first threaded hole extending along the height direction. The first fastener is connected to the adjusting member and extends partially into the first threaded hole, so that by adjusting the depth of the first fastener extending into the first threaded hole, the height of the adjusting member relative to the base can be adjusted to the target height.

[0017] The second fastener connects the adjusting member and the base in sequence to keep the adjusting member at the target height.

[0018] Optionally, the base has a second threaded hole on its side, the adjusting member has an adjusting hole at a position corresponding to the second threaded hole, and the second fastener passes through the adjusting hole and is threadedly connected to the second threaded hole.

[0019] Optionally, the drying tank further includes an air inlet pipe and an air outlet pipe, which are connected to the bottom of the tank body. The air inlet pipe is used to introduce external gas into the receiving cavity, and the air outlet pipe is used to exhaust the gas from the receiving cavity.

[0020] The intake pipe is provided with a diversion mechanism, which divides the space inside the intake pipe into multiple intake channels, so that the gas entering the intake pipe is diverted into the multiple intake channels and enters the receiving cavity through the multiple intake channels.

[0021] Optionally, the diversion mechanism includes a plurality of diversion fins arranged at intervals, the plurality of diversion fins dividing the intake pipe into a plurality of intake channels.

[0022] Optionally, the tank includes a first sidewall and a second sidewall that are spaced apart from each other, the air inlet pipe is disposed near the first sidewall, and the air outlet pipe is disposed near the second sidewall;

[0023] The cavity is further provided with a first air guide plate and a second air guide plate. The first air guide plate is disposed opposite to the first side wall and surrounds the first side wall to form an air inlet cavity, which is connected to the air inlet pipe. The second air guide plate is disposed opposite to the second side wall and surrounds the second side wall to form an air outlet cavity, which is connected to the air outlet pipe.

[0024] Both the first and second air guide plates are provided with multiple air guide holes for gas to pass through.

[0025] Secondly, this application also discloses a drying device, which includes: a blower mechanism and a drying tank as described in any of the above claims; wherein,

[0026] The blower assembly is connected to the drying tank.

[0027] In this embodiment, a water-guiding support is provided inside the drying tank. The water-guiding support is located at the bottom of the receiving cavity and is equipped with a water-guiding strut with a flow-guiding section. When the basket is placed in the receiving cavity, the water-guiding support can lift the silicon wafer inside the basket, preventing water accumulation at the contact point between the silicon wafer and the basket, and quickly guiding the liquid on the silicon wafer away through the flow-guiding section. This shortens the drying time of the silicon wafer, reduces energy consumption during the drying process, and improves the drying efficiency of the silicon wafer.

[0028] Additional aspects and advantages of this invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0029] The above and / or additional aspects and advantages of this utility model will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0030] Figure 1 This is a schematic diagram of the structure of a drying tank at a certain angle according to an embodiment of this application;

[0031] Figure 2 yes Figure 1 An enlarged structural schematic diagram of the drying tank at position A shown;

[0032] Figure 3 yes Figure 1 A schematic diagram of the drying tank from another angle is shown;

[0033] Figure 4 yes Figure 1 A schematic diagram of the water guide support for the drying tank shown;

[0034] Figure 5 yes Figure 4 A partial structural schematic diagram of the water guide support shown;

[0035] Figure 6 This is a schematic diagram of another drying tank as described in an embodiment of this application;

[0036] Figure 7 yes Figure 6 One of the schematic diagrams of the internal structure of the drying tank shown;

[0037] Figure 8 yes Figure 6 A partial structural schematic diagram of the drying tank shown;

[0038] Figure 9 yes Figure 6 The second schematic diagram of the internal structure of the drying tank is shown.

[0039] Reference numerals: 1 - Tank, 10 - Receiving cavity, 101 - Air inlet cavity, 102 - Air outlet cavity, 103 - Bottom cavity, 11 - Flower basket support, 12 - Air inlet pipe, 121 - Air inlet channel, 13 - Air outlet pipe, 14 - Diverting mechanism, 141 - Diverting fins, 15 - First side wall, 16 - Second side wall, 17 - First air guide plate, 18 - Second air guide plate, 180 - Air guide hole, 2 - Water guide support, 20 - Water guide strut, 201 - Flow guide section, 21 - Base, 22 - Adjusting component, 221 - Adjusting hole, 23 - First fastener, 24 - Second fastener, 3 - Flower basket, 31 - Bottom rod, 32 - Side rod, 33 - Top rod, 4 - Silicon wafer. Detailed Implementation

[0040] The embodiments of this utility model will now be described in detail. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model. All other embodiments obtained by those skilled in the art based on the embodiments in this application without inventive effort are within the scope of protection of this application.

[0041] The terms "first" and "second" in the specification and claims of this application may explicitly or implicitly include one or more of the features. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.

[0042] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0043] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0044] Reference Figure 1 The diagram shows a structural schematic of a drying tank at a certain angle according to an embodiment of this application. (Refer to...) Figure 2 , showed Figure 1 The enlarged structural diagram of position A in the drying tank shown is for reference. Figure 3 , showed Figure 1 The schematic diagram of the drying tank from another angle is shown below. Figure 5 , showed Figure 1 The schematic diagram of the water guide bracket of the drying tank shown is for reference. Figure 5 , showed Figure 4 The diagram shows a partial structural schematic of the water guide support.

[0045] like Figures 1 to 5 As shown, the drying tank may specifically include: a tank body 1, the tank body 1 having a receiving cavity 10 for accommodating the flower basket 3; and a water guide support 2, the water guide support 2 being disposed at the bottom of the receiving cavity 10, the water guide support 2 being provided with a water guide strut 20, the water guide strut 20 being provided with a flow guide part 201, when the flower basket 3 is accommodated in the receiving cavity 10, the water guide strut 20 can lift the silicon wafer 4 inside the flower basket 3 in the receiving cavity 10, and the flow guide part 201 can be used to guide the liquid on the silicon wafer 4.

[0046] In this embodiment, a water-guiding support 2 is provided inside the drying tank, located at the bottom of the receiving cavity 10. The water-guiding support 2 is equipped with a water-guiding strut 20, and a flow-guiding part 201 is provided on the water-guiding strut 20. When the basket 3 is placed in the receiving cavity 10, the water-guiding strut 20 can lift the silicon wafer 4 inside the basket 3, preventing water accumulation at the contact point between the silicon wafer 4 and the basket 3, and quickly guiding the liquid on the silicon wafer 4 out through the flow-guiding part 201. In this way, the drying time of the silicon wafer 4 can be shortened, the energy consumption during the drying process of the silicon wafer 4 can be reduced, and the drying efficiency of the silicon wafer 4 can be improved.

[0047] In this embodiment, a water-guiding bracket 2 can be provided at the bottom of the receiving cavity 10 of the drying tank. The water-guiding bracket 2 is equipped with a water-guiding support rod 20, and the water-guiding support rod 20 is equipped with a flow-guiding part 201. During the process of placing the basket 3 into the drying tank, or after the basket 3 is placed into the drying tank, the water-guiding support rod 20 on the water-guiding bracket 2 can lift the silicon wafer 4 inside the basket 3, causing the contact point between the silicon wafer 4 and the basket 3 to loosen, thereby draining the water accumulated at the contact point. Furthermore, the water-guiding support rod 20 can directly contact the silicon wafer 4, guiding the water accumulated on the silicon wafer 4 to the bottom of the drying tank, preventing water residue on the surface of the silicon wafer 4. This greatly shortens the drying time of the silicon wafer 4 and improves its drying efficiency. Moreover, during the process of the water-guiding support rod 20 lifting the silicon wafer 4, the basket 3 can be placed on the drying tank according to a predetermined trajectory or can remain stationary, making operation extremely convenient.

[0048] It should be noted that the flower basket 3 can typically include a bottom rod 31, a side rod 32, and a top rod 33. The contact point between the silicon wafer 4 and the flower basket 3 can be the contact point between the flower basket 3 and the bottom rod 31, or the contact point between the flower basket 3 and the side rod 32. This application does not limit this.

[0049] like Figure 3 As shown, a flower basket support 11 can also be installed inside the drying tank, which can be used to support the flower basket 3. Figure 4 As shown, the water-guiding support 2 may specifically include at least two spaced-apart water-guiding struts 20. During the process of placing the basket 3 from above the drying trough onto the basket support 11, the water-guiding struts 20 will first contact the silicon wafer 4 in the basket 3 before the bottom rod 31 of the basket 3 contacts the bottom of the receiving cavity 10 of the drying trough. As the basket 3 descends further, the water-guiding struts 20 can lift the silicon wafer 4, loosening the contact point between the silicon wafer 4 and the basket 3, thereby draining the water accumulated at the contact point and draining the water between the basket 3 and the silicon wafer 4, until the basket 3 is finally placed on the drying trough. Any remaining water on the silicon wafer 4 can be guided to the bottom of the drying trough or other locations through the guide portion 201 on the water-guiding strut 20.

[0050] It should be noted that the accompanying drawings of this application embodiment only show the case where the water guide bracket 2 includes two water guide struts 20. In actual applications, the number of water guide struts 20 in the water guide bracket 2 can be set according to the actual situation. For example, the number of water guide struts 20 can be 3, 4 or 6, etc. This application embodiment does not make a specific limitation on the number of water guide struts 20.

[0051] In practical applications, after the silicon wafer 4 is placed into the basket 3, there is usually a certain gap between the silicon wafer 4 and the top rod 33. However, in this embodiment, after the basket 3 is placed into the drying tank, the water-guiding support rod 20 lifts the silicon wafer 4 a certain distance. To prevent the silicon wafer 4, lifted by the water-guiding support rod 20, from colliding with the top rod 33 and causing damage, it is necessary to control the height at which the silicon wafer 4 is lifted by the water-guiding support rod 20 to be less than the initial gap height between the silicon wafer 4 and the top rod 33. This ensures that after the silicon wafer 4 is lifted by the water-guiding support rod 20, a certain gap can still be maintained between the top of the silicon wafer 4 and the top rod 33 of the basket 3.

[0052] like Figure 5 As shown, the guide section 201 is located at the top of the water guide support rod 20, and its width increases progressively from the top to the bottom of the water guide support rod 20. Since the top of the guide section 201 is in direct contact with the bottom of the silicon wafer 4, the progressively increasing width of the guide section 201 helps to keep the top size of the guide section 201 relatively small. This improves the water guiding effect of the guide section 201 on the surface of the silicon wafer 4 and accelerates the drainage of water from the bottom of the silicon wafer 4 through the guide section 201. Ultimately, this further shortens the drying time of the silicon wafer 4.

[0053] In some optional embodiments of this application, the cross-sectional shape of the guide portion 201 includes at least one of triangle, trapezoid and circle, so that the contact area between the guide portion 201 and the silicon wafer 4 is small, which is conducive to the drainage of water accumulated on the silicon wafer 4.

[0054] It should be noted that, Figure 5 The diagram only shows the case where the cross-sectional shape of the current guide 201 is triangular, that is, the contact between the current guide 201 and the bottom of the silicon wafer 4 is a line contact. The case where the cross-sectional shape of the current guide 201 is circular or trapezoidal can be referred to in the same way, and will not be described in detail here.

[0055] like Figure 4 and Figure 5 As shown, the water guide bracket 2 may further include: a base 21 and an adjusting member 22; wherein, the base 21 is connected to the bottom of the receiving cavity 10; the adjusting member 22 is connected to the base 21 and its height relative to the base 21 is adjustable; the water guide support rod 20 is connected to the adjusting member 22, and the adjusting member 22 can support the water guide support rod 20 and drive the water guide support rod 20 to adjust its height. By adjusting the height of the water guide support rod 20, the height at which the water guide support rod 20 lifts the silicon wafer 4 can be adjusted to accommodate different specifications of baskets 3 and silicon wafers 4.

[0056] For example, if the distance between the top of the silicon wafer 4 and the top rod 33 inside the basket 3 is relatively small, in order to prevent the silicon wafer 4 from hitting the top rod 33 after the water support rod 20 lifts the silicon wafer 4, the lifting height of the silicon wafer 4 needs to be controlled to be small. At this time, the height of the water guide rod 20 can be lowered by adjusting the adjustment component 22 so that the height of the water guide rod 20 lifting the silicon wafer 4 is smaller.

[0057] For example, if the distance between the top of the silicon wafer 4 and the top rod 33 inside the basket 3 is relatively large, the lifting height of the silicon wafer 4 can be controlled to be larger, so that the distance between the silicon wafer 4 and the bottom rod 31 is larger, which is conducive to the drainage of accumulated water. At this time, the height of the water guide rod 20 can be adjusted by adjusting the adjustment component 22, so that the water guide rod 20 lifts the silicon wafer 4 to a greater height.

[0058] like Figure 4 and Figure 5 As shown, the water guide bracket 2 also includes a first fastener 23 and a second fastener 24; wherein, the base 21 is provided with a first threaded hole (not shown in the figure) extending in the height direction, the first fastener 23 is connected to the adjusting member 22 and extends partially into the first threaded hole, so that by adjusting the depth of the first fastener 23 extending into the first threaded hole, the height of the adjusting member 22 relative to the base 21 can be adjusted to the target height; the second fastener 24 connects the adjusting member 22 and the base 21 in sequence, so that the adjusting member 22 is held at the target height.

[0059] In practical applications, when the height of the water guide strut 20 needs to be adjusted, the second fastener 24 can be unscrewed from the adjusting member 22 and the base 21 to release the fixed connection between the adjusting member 22 and the base 21. Then, the height of the adjusting member 22 relative to the base 21 can be adjusted by turning the first fastener 23 clockwise or counterclockwise until the adjusting member 22 is adjusted to the target height. Finally, the second fastener 24 is screwed back onto the adjusting member 22 and the base 21 to fix the adjusting member 22 to the base 21, so that the adjusting member 22 can be maintained at the target height.

[0060] For example, the first fastener 23 and the second fastener 24 can be fasteners with threaded structures such as bolts, studs, and screws. In this embodiment of the application, the specific types of the first fastener 23 and the second fastener 24 are not limited.

[0061] As shown in Figure 5, a second threaded hole (not shown) is provided on the side of the base 21. An adjusting member 22 has an adjusting hole 221 at a position corresponding to the second threaded hole. A second fastener 24 passes through the adjusting hole 221 and is threadedly connected to the second threaded hole. The adjusting hole 221 is larger in the height direction than in the width direction, allowing adjustment of the position of the second fastener 24 within the adjusting hole 221 along the height direction. This ensures that after height adjustment of the adjusting member 22, the second fastener 24 can still pass through the adjusting hole 221 and be threadedly connected to the second threaded hole, achieving a reliable connection between the adjusting member 22 and the base 21.

[0062] In practical applications, the adjustment hole 221 can be an elliptical hole with the long axis in the height direction, or an oblong hole with the length direction in the height direction. The shape of the adjustment hole 221 is not specifically limited in this embodiment.

[0063] Reference Figure 6 This shows a schematic diagram of another drying tank according to an embodiment of this application. (Refer to...) Figure 7 , showed Figure 6 One of the schematic diagrams of the internal structure of the drying tank shown is referenced. Figure 8 , showed Figure 6 The schematic diagram of a partial structure of the drying tank shown is for reference only. Figure 9 , showed Figure 6 The second schematic diagram of the internal structure of the drying tank is shown.

[0064] like Figures 6 to 9 As shown, the drying tank may further include an air inlet pipe 12 and an air outlet pipe 13, which are connected to the bottom of the tank body 1. The air inlet pipe 12 can be used to introduce external gas into the receiving cavity 10, and the air outlet pipe 13 can be used to discharge the gas in the receiving cavity 10. The air inlet pipe 12 is provided with a diversion mechanism 14, which can divide the space in the air inlet pipe 12 into multiple air inlet channels 121, so that the gas entering the air inlet pipe 12 is diverted into multiple air inlet channels 121 and enters the receiving cavity 10 through multiple air inlet channels 121, thereby realizing the diversion of gas.

[0065] In practical applications, without the diversion mechanism 14, the gas entering the receiving cavity 10 through the inlet pipe 12 tends to concentrate in the area opposite to the centerline of the inlet pipe 12, which can lead to insufficient drying gas in other areas of the receiving cavity 10, affecting the overall drying effect of the drying tank on the silicon wafer 4. In this embodiment, the diversion mechanism 14 can divide the space inside the inlet pipe 12 into multiple inlet channels 121, and introduce drying gas into the receiving cavity 10 through these multiple inlet channels 121, thus achieving forced diversion of the gas. The gas diverted through the multiple inlet channels 121 can be evenly introduced into the receiving cavity 10, avoiding the problem of excessive concentration of airflow near the centerline of the inlet pipe 12, and effectively improving the overall drying efficiency of the drying tank.

[0066] Moreover, by setting a diversion mechanism 14 in the intake pipe 12 to divert the gas, compared with setting a mechanism inside the tank 1 to divert the gas, only the diversion mechanism 14 needs to be added in the intake pipe 12. There is no need to make significant destructive modifications to the existing tank 1, and the modification and maintenance costs are low.

[0067] like Figure 8 As shown, the flow splitting mechanism 14 may specifically include multiple flow splitting fins 141 arranged at intervals. The multiple flow splitting fins 141 divide the air intake pipe 12 into multiple air intake channels 121, so as to achieve gas flow splitting through a simple structure. The modification is simple and easy to implement.

[0068] It should be noted that the accompanying drawings of this application embodiment only show the case where each air intake pipe 12 is provided with 3 diversion fins 141, and these 3 diversion fins 141 divide the space inside the air intake pipe 12 into 4 air intake channels 121. In practical applications, the number of diversion fins 141 in each air intake pipe 12 can also be 2, 4, or 5, etc., and these diversion fins 141 can be arranged symmetrically or asymmetrically according to actual needs. The included angle between the diversion fins 141 can also be set according to requirements. This application embodiment does not specifically limit the number and distribution of diversion fins 141.

[0069] In practical applications, multiple air inlet pipes 12 can be provided in the drying tank as needed. These multiple air inlet pipes 12 can be spaced apart along the length of the drying tank to allow gas to enter at multiple locations within the drying tank. The flow-dividing fins 141 within each air inlet pipe 12 can be correspondingly spaced apart along the length of the drying tank to divide the space within the air inlet pipe 12 into multiple air intake channels 121 distributed along the length of the drying tank, thereby further improving the uniformity of airflow distribution along the length of the drying tank.

[0070] like Figure 7 and Figure 9 As shown, the tank 1 may include a first sidewall 15 and a second sidewall 16 arranged at relative intervals. The air inlet pipe 12 is arranged near the first sidewall 15, and the air outlet pipe 13 is arranged near the second sidewall 16. The receiving cavity 10 is also provided with a first air guide plate 17 and a second air guide plate 18. The first air guide plate 17 is arranged opposite to the first sidewall 15 and surrounds the first sidewall 15 to form an air inlet cavity 101, which is connected to the air inlet pipe 12. The second air guide plate 18 is arranged opposite to the second sidewall 16 and surrounds the second sidewall 16 to form an air outlet cavity 102, which is connected to the air outlet pipe 13. Both the first air guide plate 17 and the second air guide plate 18 are provided with a plurality of air guide holes 180 for gas to pass through. The air guide holes 180 on the first air guide plate 17 can be used to uniformly guide the gas in the air inlet chamber 101 into the receiving chamber 10, and the air guide holes 180 on the second air guide plate 18 can be used to uniformly guide the gas in the receiving chamber 10 into the air outlet chamber 102.

[0071] In this embodiment, by placing the diversion fins 141 at the ends of each air inlet pipe 12, the uniformity of airflow distribution within the accommodating cavity 10 can be effectively improved, increasing the area with poor drying effect. Figure 9 The gas flow velocity in the area formed by the bottom rod 31 of the flower basket 3 (within the dashed line) is increased, thereby effectively improving the overall drying efficiency of the drying tank. In practical applications, without the diversion mechanism 14, the area formed by the bottom rod 31 of the flower basket 3 and the bottom cavity 103 area are areas with poor drying effect. The embodiments of this application can better improve the gas distribution in the above two areas and achieve a better drying effect.

[0072] In this embodiment, by setting a diversion mechanism 14 in the intake pipe 12, the fluid that was originally concentrated near the center line of the intake pipe 12 is forcibly and uniformly diverted, covering a larger area of ​​the intake chamber 101, inducing gas dispersion and uniformity, fundamentally changing the intake mode on the intake side, redistributing the gas, and greatly improving the uniformity of the flow near the bottom rod 31 of the basket 3.

[0073] In summary, the drying tank described in the embodiments of this application may include at least the following advantages:

[0074] In this embodiment, a water-guiding support is provided inside the drying tank. The water-guiding support is located at the bottom of the receiving cavity and is equipped with a water-guiding strut with a flow-guiding section. When the basket is placed in the receiving cavity, the water-guiding support can lift the silicon wafer inside the basket, preventing water accumulation at the contact point between the silicon wafer and the basket, and quickly guiding the liquid on the silicon wafer away through the flow-guiding section. This shortens the drying time of the silicon wafer, reduces energy consumption during the drying process, and improves the drying efficiency of the silicon wafer.

[0075] This application also provides a drying device, which may specifically include: a blower mechanism and a drying tank as described in any of the above embodiments; wherein the blower mechanism is connected to the drying tank. The drying tank can be used to accommodate a flower basket, and the blower mechanism can be used to blow circulating hot air into the drying tank to dry the silicon wafers inside the flower basket.

[0076] In this embodiment, the structure and working principle of the drying tank are the same as those of the drying tanks in the foregoing embodiments, and their beneficial effects are also similar, so they will not be described in detail here.

[0077] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0078] Although embodiments of the present invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A drying tank, characterized in that, The drying tank includes: The trough body has a receiving cavity for accommodating the flower basket. The water guide bracket is disposed at the bottom of the receiving cavity. The water guide bracket is provided with a water guide support rod and a flow guide part. The water guide support rod can be used to lift the silicon wafer in the basket in the receiving cavity, and the flow guide part can be used to guide the liquid on the silicon wafer. The drying tank also includes an air inlet pipe and an air outlet pipe, which are connected to the bottom of the tank body. The air inlet pipe is used to introduce external gas into the receiving cavity, and the air outlet pipe is used to discharge the gas in the receiving cavity. A diversion mechanism is provided inside the air inlet pipe, which divides the space inside the air inlet pipe into multiple air inlet channels, so that the gas entering the air inlet pipe is diverted into multiple air inlet channels and enters the receiving cavity through multiple air inlet channels.

2. The drying tank according to claim 1, characterized in that, The flow guide is disposed at the top of the water guide support rod, and the width of the flow guide increases from the top to the bottom of the water guide support rod.

3. The drying tank according to claim 2, characterized in that, The cross-sectional shape of the guide portion includes at least one of triangle, trapezoid, and circle.

4. The drying tank according to claim 1, characterized in that, The water guide bracket further includes: a base and an adjusting component; wherein... The base is connected to the bottom of the receiving cavity; The adjusting component is connected to the base; The water guide rod is connected to the adjusting member, which supports the water guide rod and drives the water guide rod to adjust its height.

5. The drying tank according to claim 4, characterized in that, The water guide bracket further includes a first fastener and a second fastener; wherein... The base is provided with a first threaded hole extending along the height direction. The first fastener is connected to the adjusting member and extends partially into the first threaded hole, so that by adjusting the depth of the first fastener extending into the first threaded hole, the height of the adjusting member relative to the base can be adjusted to the target height. The second fastener connects the adjusting member and the base in sequence to keep the adjusting member at the target height.

6. The drying tank according to claim 5, characterized in that, The base has a second threaded hole on its side, and the adjusting member has an adjusting hole at a position corresponding to the second threaded hole. The second fastener passes through the adjusting hole and is threadedly connected to the second threaded hole.

7. The drying tank according to claim 1, characterized in that, The diversion mechanism includes a plurality of diversion fins arranged at intervals, which divide the intake pipe into a plurality of intake channels.

8. The drying tank according to claim 1, characterized in that, The tank includes a first sidewall and a second sidewall that are spaced apart from each other. The air inlet pipe is located near the first sidewall, and the air outlet pipe is located near the second sidewall. The cavity is further provided with a first air guide plate and a second air guide plate. The first air guide plate is disposed opposite to the first side wall and surrounds the first side wall to form an air inlet cavity, which is connected to the air inlet pipe. The second air guide plate is disposed opposite to the second side wall and surrounds the second side wall to form an air outlet cavity, which is connected to the air outlet pipe. Both the first and second air guide plates are provided with multiple air guide holes for gas to pass through.

9. A drying device, characterized in that, The drying equipment includes: a blower mechanism and a drying tank as described in any one of claims 1 to 8; wherein... The blower assembly is connected to the drying tank.

Images