Device for liquid outlet of wafer edge polishing filter

By installing a reversing valve and a valve on the drain pipe of the wafer edge polishing filter, the backflow and discharge of liquid are realized, which solves the problem of drain port blockage caused by impurities in polishing slurry, improves drainage efficiency and reduces operating costs.

CN223628211UActive Publication Date: 2025-12-05SHANDONG YOUYAN AISI SEMICON MATERIALS CO LTD
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Patent Information

Application Number
CN202423100750.4
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-16
Publication Date
2025-12-05
Estimated Expiration
2034-12-16

AI Technical Summary

Technical Problem

During wafer edge polishing, impurities in the polishing slurry accumulate near the filter drain, causing blockage and affecting drainage efficiency.

Method used

Design a device for a wafer edge polishing filter. By installing a reversing valve and two branch drain pipes on the drain pipe, which are connected to the return tank and the plant drain pipe respectively, the return and discharge of liquid are achieved by controlling the valve, thus avoiding the accumulation of impurities.

Benefits of technology

It effectively solves the problem of clogged drain outlets, improves drainage efficiency, and is simple to operate and inexpensive.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The utility model discloses a device for a liquid outlet of a wafer edge polishing filter. The device is used for solving the problem that the liquid outlet of the wafer edge polishing filter is blocked. The device comprises a liquid discharge pipe installed at a liquid discharge port of the filter, a reversing valve is arranged on the liquid discharge pipe, the liquid discharge pipe is divided into two branch liquid discharge pipes from the reversing valve, the first branch liquid discharge pipe is connected to a liquid return barrel, the second branch liquid discharge pipe is connected to a factory liquid discharge pipe, and valves are arranged on the first branch liquid discharge pipe and the second branch liquid discharge pipe respectively. The device has the characteristics of simple structure, convenience in operation and low manufacturing cost, and can solve the problems of blockage of the liquid discharge port, difficulty in liquid discharge and the like caused by the fact that many impurities in the polishing liquid are deposited to the liquid discharge port.
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Description

TECHNICAL FIELD

[0001] The utility model relates to a device for wafer edge polishing filter liquid discharge port belongs to filter device field. BACKGROUND

[0002] Liquid filter is generally used in the middle of medium pipeline, removes the impurities in liquid, and is the key to maintain the purity of liquid conveying process. In the edge polishing process, the polishing liquid is recycled, and the filter is needed to filter the polishing cloth slag generated in the processing process. The fine polishing cloth slag will continuously accumulate near the filter liquid discharge port, causing the liquid discharge port to be blocked. When liquid needs to be discharged, the liquid cannot be discharged in time, which will affect the liquid discharge efficiency. SUMMARY

[0003] The utility model discloses a device for wafer edge polishing filter liquid discharge port to solve the problem of liquid filter liquid discharge port blockage.

[0004] In order to realize the above-mentioned purpose, the utility model adopts the following technical scheme:

[0005] A device for wafer edge polishing filter liquid discharge port, the device comprises a liquid discharge pipe installed on the filter liquid discharge port, a reversing valve is arranged on the liquid discharge pipe, the liquid discharge pipe is divided into two branch pipes from the reversing valve, wherein the first branch pipe is connected to the liquid return barrel, and the second branch pipe is connected to the factory liquid discharge pipe. Valves are arranged on the first branch pipe and the second branch pipe respectively.

[0006] Further, in the normal liquid supply process of the wafer edge polishing equipment, the first valve between the reversing valve and the liquid return barrel is opened, and the second valve between the reversing valve and the factory liquid discharge pipe is closed.

[0007] Further, when the wafer edge polishing equipment stops supplying liquid and the filter element is replaced, the first valve between the reversing valve and the liquid return barrel is closed, and the second valve between the reversing valve and the factory liquid discharge pipe is opened.

[0008] The utility model has the advantages that:

[0009] The device provided by the utility model has the characteristics of simple structure, convenient operation and low cost, and can solve the problems of liquid discharge port blockage, liquid discharge difficulty and the like caused by the deposition of many impurities in the polishing liquid to the liquid discharge port. BRIEF DESCRIPTION OF DRAWINGS

[0010] Figure 1 It is the structure schematic view of the device of the utility model.

[0011] Figure 2 It is the structure schematic view of the device of the utility model, wherein the first valve is opened, the second valve is closed, and the liquid returns to the liquid return barrel from the filter.

[0012] Figure 3 This is a schematic diagram of the structure of the device of this utility model, wherein the first valve is closed, the second valve is open, and the liquid is discharged from the filter to the plant drainage pipe.

[0013] Figure Labels

[0014] 1 Filter, 2 Reversing valve, 3 First valve, 4 Second valve, 5 Plant drain pipe, 6 Return tank. Detailed Implementation

[0015] The present invention will now be described in detail with reference to the accompanying drawings. However, the embodiments described are only for explaining the present invention and are not intended to limit the scope of the present invention.

[0016] like Figure 1 As shown, the device provided by this utility model is used to control the drainage and recovery of liquid at the drain port of a wafer edge polishing filter. The device includes a drain pipe installed at the drain port of filter 1. A reversing valve 2 is provided on the drain pipe. Two branch drain pipes branch off from the reversing valve 2. The first branch drain pipe is connected to a return tank 6, and the second branch drain pipe is connected to a plant maintenance drain pipe 5. A first valve 3 (a valve between the reversing valve and the return tank) is provided on the first branch drain pipe, and a second valve 4 (a valve between the reversing valve and the plant maintenance drain pipe) is provided on the second branch drain pipe.

[0017] In practical applications, this utility model device is used to solve, for example, the problem of clogging in the drain port of a 300mm wafer edge polishing filter. The specific operation process is as follows:

[0018] During the normal operation of the wafer edge polishing equipment and its liquid supply process, the reversing valve is controlled by the system to switch to the return tank direction. At this time, the system opens the first valve 3 and closes the second valve 4, allowing some liquid to flow back into the return tank to prevent impurities from accumulating at the drain port and causing blockage. Figure 2 The arrows shown indicate the direction of liquid flow.

[0019] When the wafer edge polishing equipment stops supplying liquid and the filter element is replaced, the system controls the reversing valve to switch to the plant drainage direction. At this time, the system will open the second valve 4 and close the first valve 3, allowing the liquid in the filter to drain into the plant drainage pipe 5. Then, the filter element can be replaced normally. Figure 3 As shown.

[0020] In the device of this utility model, valves are connected between the reversing valve and the plant drain pipe, and between the reversing valve and the return tank, respectively, to control the drainage and recycling, thereby solving the problem of blockage of the drain port of the wafer edge polishing filter.

Claims

1. An apparatus for the drain port of a wafer edge polishing filter, characterized in that, The device includes a drain pipe installed at the drain port of the filter, a reversing valve on the drain pipe, and two branch drain pipes branching off from the reversing valve. The first branch drain pipe is connected to the return tank, and the second branch drain pipe is connected to the plant's drain pipe. Valves are provided on the first branch drain pipe and the second branch drain pipe respectively.

2. The apparatus for the drain port of a wafer edge polishing filter according to claim 1, characterized in that, During the normal operation of the wafer edge polishing equipment, the first valve between the reversing valve and the return tank is opened, and the second valve between the reversing valve and the plant drain pipe is closed.

3. The apparatus for the drain port of a wafer edge polishing filter according to claim 1, characterized in that, When the wafer edge polishing equipment stops supplying liquid and the filter element is replaced, the first valve between the reversing valve and the return liquid tank is closed, and the second valve between the reversing valve and the plant drain pipe is opened.