Water system of semiconductor waste gas treatment equipment
By combining pressure sensors and nitrogen purging, the accuracy of liquid level detection in semiconductor waste gas treatment equipment was solved, achieving stable and safe operation of the equipment and reducing costs.
Patent Information
- Application Number
- CN202423125588.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-17
- Publication Date
- 2025-12-05
- Estimated Expiration
- 2034-12-17
AI Technical Summary
In semiconductor waste gas treatment equipment, conventional level gauges are easily jammed by solid viscous substances or generate false signals, and the level gauges require corrosion-resistant materials, resulting in high costs. Existing technology cannot accurately detect the liquid level in the water tank.
A pressure sensor is used to detect the pressure inside the water tank and convert it into liquid level. Nitrogen purging is used to prevent interference from solid viscous substances. A float level detector is used as a supplementary monitoring device to achieve non-contact detection.
This ensures the accuracy of water tank level detection and the stability of equipment operation, avoids the need for corrosion resistance requirements for sensors, reduces costs, and improves system safety.
Smart Images
Figure CN223628350U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to semiconductor waste gas treatment technical field, especially relates to a semiconductor waste gas treatment equipment's water system. BACKGROUND
[0002] In the semiconductor production process, will produce all sorts of toxic and harmful gas, exhaust gas is pumped to the exhaust gas treatment equipment by vacuum pump, after being handled by the exhaust gas treatment equipment, forms the gas discharge of non-toxic harmless. So the exhaust gas treatment equipment is the important equipment of the semiconductor production process later section. Semiconductor exhaust gas treatment equipment is generally composed of high-temperature reaction cavity, cooling cavity, cooling water tank, exhaust system.
[0003] In some semiconductor process manufacturing process or exhaust gas treatment equipment handling process, insoluble solid material and viscous material etc. are produced, the water in the water tank is also corrosive, when the conventional float ball liquid level meter is used to deal with the solid viscous material in the water tank, it is easy to be stuck to cause false signal, and the capacitive liquid level meter also produces false signal when dealing with viscous material, therefore, the conventional detection means cannot solve the problem. And because the water in the water tank is also corrosive, the liquid level meter also needs to select corrosion-resistant material, and the cost is higher. UTILITY MODEL CONTENTS
[0004] The utility model aims at providing a semiconductor exhaust gas treatment equipment's water system, aiming at the condition that solid viscous material is produced in the process of semiconductor etching and grinding, can guarantee the accuracy of water tank liquid level detection, to guarantee the stability of equipment operation.
[0005] A semiconductor exhaust gas treatment equipment's water system, including water tank,
[0006] The bottom or sidewall bottom end of the water tank is provided with a water tank detection port, and the water tank detection port is communicated with the first interface of the gas pipe tee joint through a pipeline;
[0007] The nitrogen container is communicated with the second interface of the gas pipe tee joint through a pipeline, a first valve, a pressure regulating valve and a first flow limiting hole;
[0008] The pressure sensor is communicated with the third interface of the gas pipe tee joint through a pipeline and a second flow limiting hole;
[0009] The water outlet of the water tank is communicated with the water using equipment through a pipeline and a water pump.
[0010] In the preferred implementation, a check valve is further connected between the first flow limiting hole and the gas pipe tee joint.
[0011] In the preferred implementation, the aperture of the first flow limiting hole is 0.3mm.
[0012] In a preferred embodiment, the second flow-restricting hole has a diameter of 0.7 mm.
[0013] In a preferred embodiment, the upper portion of the inner cavity of the water tank is further provided with a floating ball liquid level detector.
[0014] In a preferred embodiment, the water source is connected to the water inlet of the water tank through a pipeline, a second valve and a waterway ball valve.
[0015] In a preferred embodiment, the water outlet of the water tank is connected to the water inlet of the overflow tower through a pipeline, and the upper portion of the overflow tower is provided with a reactor; the water outlet of the overflow tower is connected to the water tank.
[0016] In a preferred embodiment, the water outlet of the water tank is connected to the water inlets of the upper washing tower and the lower washing tower through a pipeline respectively, the upper washing tower is arranged above the lower washing tower, and the inner cavities of the two are connected; the water outlet of the lower washing tower is connected to the water tank.
[0017] In a preferred embodiment, the water outlet of the water tank is further connected to the outside through a drain valve.
[0018] In a preferred embodiment, the height of the inner cavity of the water tank is x, and the height of the floating ball liquid level detector is 0.85x-0.9x.
[0019] The utility model has the following beneficial effects:
[0020] The pressure sensor is used for detecting the pressure in the water tank and converting it into the actual liquid level height. According to the formula P = ρgh, the liquid level h in the water tank is P / ρg, wherein P is the detected water tank pressure, ρ is the liquid density, and g is the gravitational acceleration. The non-contact detection mode is adopted, and the corrosion resistance requirement of the sensor is avoided.
[0021] Meanwhile, nitrogen is used for purging in the detection tube, the interference of solid viscous substances is avoided, and the detection accuracy is ensured. DRAWINGS
[0022] In order to more clearly illustrate the technical scheme of the embodiments of the utility model, the following will briefly introduce the drawings needed to be used in the embodiments, and it should be understood that the following drawings only show some embodiments of the utility model, and should not be regarded as the limitation to the scope, and for the ordinary skilled in the art, other related drawings can be obtained without the creative labor on the premise of the drawings.
[0023] Figure 1 The utility model provides the schematic diagram of the water system of semiconductor waste gas treatment equipment;
[0024] Mark in the drawing:
[0025] 1 - first valve; 2 - pressure regulating valve; 3 - first flow restriction;
[0026] 4 - check valve; 5 - pressure sensor; 6 - second flow restriction;
[0027] 7 - air pipe tee; 8 - water tank detection port; 9 - water tank;
[0028] 10 - water pump; 11 - reactor; 12 - overflow tower;
[0029] 13 - upper washing tower; 14 - lower washing tower; 15 - floating ball liquid level detector;
[0030] 16 - water outlet; 17 - second valve; 18 - water path ball valve;
[0031] 19 - drain valve. DETAILED DESCRIPTION
[0032] In order to make the purpose, technical scheme and advantages of the embodiments of the present application more clear, the technical scheme of the embodiments of the present application will be described clearly and completely below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments. The components of the embodiments of the present application described and marked in the drawings can be arranged and designed in various different configurations.
[0033] Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the claimed present application, but only represents selected embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative labor fall within the scope of the present application.
[0034] It should be noted that: similar reference numbers and letters represent similar items in the following drawings, therefore, once an item is defined in one drawing, it does not need to be further defined and explained in the subsequent drawings.
[0035] In the description of the utility model, it needs to be explained that, the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship commonly placed when the utility model product is used, which is merely for the convenience of describing the utility model and simplifying the description, and does not indicate or imply that the indicated device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the utility model. In addition, the terms "first", "second", "third" and the like are only used for differentiation in description and cannot be understood as indicating or implying relative importance.
[0036] In addition, the terms "horizontal", "vertical", "overhanging" and the like do not mean that the components must be absolutely horizontal or overhanging, but can be slightly inclined. For example, "horizontal" only means that it is more horizontal relative to "vertical", and does not mean that the structure must be completely horizontal, but can be slightly inclined.
[0037] In the description of the utility model, it also needs to be explained that, unless otherwise explicitly specified and limited, the terms "setting", "mounting", "connecting", "connection" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium, or it can be the communication inside two elements. For ordinary skilled persons in the art, the specific meanings of the above terms in the utility model can be understood according to the specific circumstances.
[0038] Some embodiments of the utility model will be described in detail below with reference to the drawings. In the case of no conflict, the following examples and features in the examples can be combined with each other.
[0039] As shown in Figure 1 The water system of the semiconductor waste gas treatment equipment provided by the embodiment comprises a water tank 9;
[0040] A water tank detection port 8 is arranged at the bottom end of the side wall of the water tank 9, and the water tank detection port 8 is in communication with the first interface of the gas pipe three-way joint 7 through a pipeline;
[0041] The nitrogen container is in communication with the second interface of the gas pipe three-way joint 7 through a pipeline, a first valve 1, a pressure regulating valve 2, a first flow limiting hole 3 and a check valve 4;
[0042] The pressure sensor 5 is in communication with the third interface of the gas pipe three-way joint 7 through a pipeline and a second flow limiting hole 6;
[0043] The water source is in communication with the water inlet of the water tank 9 through a pipeline, a second valve 17 and a waterway ball valve 18;
[0044] The bottom of the water tank 9 is provided with a water outlet 16, which is connected to the water inlets of the overflow tower 12, the upper washing tower 13 and the lower washing tower 14 through a pipeline and a water pump 10, and is further connected to the outside through the water pump 10 and a drain valve 19.
[0045] The reactor 11 of the semiconductor waste gas treatment device is arranged above the overflow tower 12, and is used to provide a high-temperature environment for treating waste gas; the water outlet of the overflow tower 12 is connected to the water tank 9, and is used to reduce the temperature of the treated waste gas before entering the water tank 9; the upper washing tower 13 is arranged above the lower washing tower 14, and the two towers jointly function to cool and reduce the temperature; the water outlet of the lower washing tower 14 is connected to the water tank 9.
[0046] The inner cavity of the water tank 9 is further provided with a floating ball liquid level detector 15, which is used to prevent the failure of the pressure sensor 5. When the pressure sensor 5 fails, the floating ball liquid level detector 15 can be used as a supplementary monitoring means to prevent the water in the water tank 9 from overflowing, and the safety of the entire system operation can be improved.
[0047] In the embodiment, the first flow limiting hole 3 has a hole diameter of 0.3 mm, and a front end pressure is swept by using a nitrogen blowing source with a pressure of 5 Psi. The first flow limiting hole 3 can stabilize the flow of the blowing gas, and prevent the occurrence of inaccurate detection caused by pressure fluctuation.
[0048] The second flow limiting hole 6 has a hole diameter of 0.07 mm, which reduces the influence of the blowing gas flow on the detection pressure, and ensures the accuracy of the detection.
[0049] The pressure sensor is used to detect the pressure in the water tank, and convert it into the actual liquid level height. According to the formula P = ρgh, the liquid level h in the water tank = P / ρg, wherein P is the detected water tank pressure, ρ is the liquid density, and g is the acceleration of gravity.
[0050] The operation logic of the system is as follows:
[0051] The water system provides system cooling for the semiconductor waste gas treatment device, and treats some gases dissolved in water.
[0052] When the device is running, the water pump 10 runs to provide water in the water tank 9 to the overflow tower 12, the upper washing tower 13 and the lower washing tower 14 for cooling the device. At this time, the second valve 17 and the water route ball valve 18 are opened to provide fresh water for the water tank 9, and ensure the circulation of the water in the water tank 9.
[0053] The pressure sensor 5 detects the water level inside the water tank 9, and controls the opening and closing of the drain valve 19 according to the detection result. In the present scheme, the inner cavity height of the water tank 9 is 400 mm, the drain valve 19 is opened when the water level inside the water tank 9 reaches 300 mm, and the drain valve 19 is closed when the water level inside the water tank 9 reaches 100 mm, so as to ensure that the liquid level inside the water tank 9 is between 100 mm and 300 mm. The float ball liquid level detector 15 is installed at the position of 360 mm of the inner cavity height of the water tank 9, which prevents the pressure sensor 5 from failure and causes the water inside the water tank 9 to overflow, and improves the safety of the whole system. When the float ball liquid level detector 15 detects water, the waterway ball valve 18 is closed, and the water entering the water tank 9 is stopped.
[0054] When there is interference of solid viscous material in the water tank 9, the first valve 1 is opened, and the pressure regulating valve 2 is adjusted to 5 Psi, so as to ensure that the N2 flows out through the first flow limiting hole 3 and the check valve 4 at the water tank detection port 8, and the solid viscous material near the water tank detection port 8 is swept to the side, so as to prevent the water tank detection port 8 from being blocked. The first flow limiting hole 3 in the gas sweeping pipeline plays a very key role, and the 0.3 mm first flow limiting hole 3 can provide stable gas under the gas source pressure of 5 Psi. If the first flow limiting hole 3 and the second flow limiting hole 6 are not installed, the detection value of the pressure sensor 5 will have great fluctuation, which affects the accuracy and stability of the detection.
[0055] The water tank liquid level detection uses pressure detection, and since there is sweeping gas, zero point calibration of the liquid level is required. That is, when there is no water in the water tank 9 and no gas sweeping, the value of the liquid level sensor 5 is 0 Pa, and when there is gas sweeping, the initial value is 126 Pa. Therefore, when the controller detects the liquid level, the initial offset needs to be subtracted, and zero point calibration is required.
[0056] Considering the problems of adjusting gas pressure and the machining precision of the flow limiting hole, the liquid level offset value detected by the pressure sensor 5 may be different under the same sweeping condition. Therefore, a one-key automatic zero point calibration method is provided in the present embodiment. Each time the device operation button is clicked, the water pump 10 is automatically operated, and the drain valve 19 is opened at the same time, so as to drain the water inside the water tank 9. The value of the pressure sensor 5 gradually decreases during the draining process, and when the value of the pressure sensor 5 remains unchanged for 5 s, it is determined that the water inside the water tank 9 is drained, and the current pressure value P0 is recorded. The value is the zero point drift caused by gas sweeping, that is, the offset of the detection. The detection value minus the offset is the pressure of the actual water tank liquid level.
[0057] The above is only a preferred embodiment of the present application, and is not used to limit the present application. For those skilled in the art, the present application can be variously changed and modified. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims
1. A water system for a semiconductor waste gas treatment device, characterized in that, The water tank comprises a water tank body, a water inlet, a water outlet, and a water tank detection port; The water tank detection port is arranged at the bottom of the water tank or the bottom end of the sidewall of the water tank, and is communicated with the first interface of the gas pipe tee joint through a pipeline; The nitrogen container is communicated with the second interface of the gas pipe tee joint through a pipeline, a first valve, a pressure regulating valve, and a first flow limiting hole; The pressure sensor is communicated with the third interface of the gas pipe tee joint through a pipeline and a second flow limiting hole; The water outlet of the water tank is communicated with the water using equipment through a pipeline and a water pump.
2. The water system of a semiconductor exhaust gas treatment apparatus according to claim 1, characterized by, A check valve is further connected between the first flow limiting hole and the gas pipe tee joint.
3. The water system of the semiconductor exhaust gas treatment apparatus according to claim 1, characterized by, The first flow limiting hole has a hole diameter of 0.3 mm.
4. The water system of the semiconductor exhaust gas treatment apparatus according to claim 1, characterized by, The second flow limiting hole has a hole diameter of 0.7 mm.
5. The water system of the semiconductor exhaust gas treatment apparatus according to claim 1, wherein A floating ball liquid level detector is further arranged at the upper portion of the inner cavity of the water tank.
6. The water system of a semiconductor exhaust gas treatment apparatus according to claim 1, wherein The water source is communicated with the water inlet of the water tank through a pipeline, a second valve, and a water route ball valve.
7. The water system of a semiconductor exhaust gas treatment apparatus according to Claim 1, wherein The water outlet of the water tank is communicated with the water inlet of the overflow tower through a pipeline, and the upper portion of the overflow tower is provided with a reactor; the water outlet of the overflow tower is communicated with the water tank.
8. The water system of a semiconductor exhaust gas treatment apparatus according to Claim 1, wherein The water outlet of the water tank is respectively communicated with the water inlets of the upper washing tower and the lower washing tower through a pipeline, the upper washing tower is arranged above the lower washing tower, and the inner cavities of the two are communicated; the water outlet of the lower washing tower is communicated with the water tank.
9. The water system of a semiconductor exhaust gas treatment apparatus according to Claim 1, wherein The water outlet of the water tank is further communicated with the outside through a drain valve.
10. The water system of the semiconductor exhaust gas treatment apparatus according to claim 5, wherein The height of the inner cavity of the water tank is x, and the height of the floating ball liquid level detector is 0.85x-0.9x.