Roller for semiconductor film laminating machine

By installing a cleaning brush and a filtration system on the rollers of a semiconductor coating machine, the problem of dust adhesion on the roller surface is solved, achieving effective cleaning and extended lifespan of the rollers.

CN223631005UActive Publication Date: 2025-12-05CHANGJIESI (SUZHOU) AUTOMATION TECH CO LTD
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Patent Information

Application Number
CN202423113354.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-17
Publication Date
2025-12-05
Estimated Expiration
2034-12-17

AI Technical Summary

Technical Problem

In existing semiconductor coating machines, dust and other small particulate impurities easily adhere to the surface of the rollers during the coating process, causing damage to the rollers and affecting their service life.

Method used

A roller for a semiconductor coating machine has been designed, equipped with a cleaning brush and a filtration system. The cleaning brush cleans the surface of the roller, and the exhaust assembly and filter element collect dust to prevent accumulation.

Benefits of technology

It effectively cleans the roller surface, improves the roller's service life, prevents dust accumulation, and extends the roller's lifespan.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of rollers, and discloses a roller for a semiconductor laminating machine, which comprises two support frames, the opposite sides of the two support frames are rotatably connected with a laminating roller, the opposite sides of the two support frames are fixedly connected with a connecting frame, the inner side of the connecting frame is fixedly connected with a limiting rod, and the limiting rod is fixedly connected with the laminating roller. A moving sleeve is slidably connected to the outer side of the limiting rod, a pushing assembly is fixedly connected to the outer side of the moving sleeve, a cleaning brush is fixedly connected to the outer side of the moving sleeve, the outer side of the cleaning brush makes contact with the outer side of the film covering roller, and a filtering frame is fixedly connected to the inner side of the connecting frame. The inner side of the filter frame is fixedly connected with an exhaust assembly, the inner side of the filter frame is movably connected with a filter shell, and the bottom end of the filter shell is fixedly connected with a limiting assembly. The roller for the semiconductor film laminating machine has the advantages that the surface of the roller can be cleaned, and the service life of the roller is prolonged.
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Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of gyro wheel, concretely to a gyro wheel for semiconductor laminating machine. BACKGROUND

[0002] The gyro wheel for semiconductor laminating machine is an important component of the semiconductor laminating machine, mainly used for compacting film material and base material, ensuring close adhesion of the two, avoiding bubble and falling phenomenon, and tightly adhering the film material and the base material through applying appropriate pressure, ensuring the quality and stability of the film pasting effect.

[0003] The existing semiconductor laminating machine can complete the film laminating operation in the using process, but some small particle impurities such as dust may be on the semiconductor in the film laminating process, which will be directly adhered to the surface of the gyro wheel in the film laminating process, and long-time use may cause damage to the gyro wheel, so a gyro wheel for semiconductor laminating machine is proposed to solve the above problems. UTILITY MODEL CONTENTS

[0004] (I) technical problems solved

[0005] In view of the defects of the prior art, the utility model provides a gyro wheel for semiconductor laminating machine, which has the advantages of being capable of cleaning the surface of the gyro wheel and prolonging the service life of the gyro wheel, and solves the problem that the existing semiconductor laminating machine can complete the film laminating operation in the using process, but some small particle impurities such as dust may be on the semiconductor in the film laminating process, which will be directly adhered to the surface of the gyro wheel in the film laminating process, and long-time use may cause damage to the gyro wheel.

[0006] (II) technical scheme

[0007] The utility model solves the technical problems that the existing semiconductor laminating machine can complete the film laminating operation in the using process, but some small particle impurities such as dust may be on the semiconductor in the film laminating process, which will be directly adhered to the surface of the gyro wheel in the film laminating process, and long-time use may cause damage to the gyro wheel.

[0008] The utility model has the advantages of the following:

[0009] The semiconductor coating machine roller has the advantages that the roller surface can be cleaned, and the service life of the roller is improved.

[0010] On the basis of the above technical scheme, the utility model further can make improvement as follows.

[0011] Further, the filter shell extends to the inside of the filter frame, the number of the exhaust assembly is multiple, and the multiple exhaust assemblies are distributed in the inside of the filter frame in equal distance linear array.

[0012] The beneficial effect of the above further scheme is that the multiple exhaust assemblies can improve the dust cleaning effect.

[0013] Further, the push assembly comprises a push block fixedly connected to the outside of the moving sleeve, the inside of the connecting frame is fixedly connected with a push cylinder, and the outside of the extension end of the push cylinder is fixedly connected with the outside of the push block.

[0014] The beneficial effect of the above further scheme is that the push assembly can make the moving sleeve move left and right.

[0015] Further, the exhaust assembly comprises an exhaust block fixedly connected to the inside of the filter frame, and the inside of the exhaust block is fixedly connected with an exhaust fan.

[0016] Further, the limiting assembly comprises a limiting plate fixedly connected to the bottom end of the filter shell, the bottom end of the connecting frame is rotationally connected with a rotating column, the outside of the rotating column is fixedly connected with a fixed plate, and the outside of the fixed plate is extruded with the outside of the limiting plate.

[0017] The beneficial effect of the above further scheme is that the limiting assembly can limit the position of the filter frame. DETAILED DESCRIPTION

[0018] Figure 1 It is a structural schematic view of the utility model;

[0019] Figure 2 It is a structural sectional view of the utility model;

[0020] Figure 3 It is a partial sectional view of the utility model;

[0021] Figure 4 It is a connecting view of the push block and the push cylinder of the utility model.

[0022] In the figure: 1, support frame; 2, film roller; 3, connecting frame; 5, limiting rod; 6, moving sleeve; 7, pushing assembly; 71, pushing block; 72, pushing cylinder; 8, cleaning brush; 9, filter frame; 10, exhaust assembly; 101, exhaust block; 102, exhaust fan; 11, filter shell; 12, limiting assembly; 121, limiting plate; 122, rotating column; 123, fixed plate; 13, filter element. DETAILED DESCRIPTION

[0023] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the utility model.

[0024] In the embodiments, the pushing assembly 7 is provided with the pushing block 71 fixedly connected to the outer side of the moving sleeve 6, the inner side of the connecting frame 3 is fixedly connected with the pushing cylinder 72, and the outer side of the telescopic end of the pushing cylinder 72 is fixedly connected with the outer side of the pushing block 71. Figures 1-4 The utility model discloses a kind of rollers for semiconductor film coating machine, the utility model includes support frame 1, the opposite side of two support frames 1 is connected with film roller 2 rotationally, the opposite side of two support frames 1 is fixedly connected with connecting frame 3, the inner side of connecting frame 3 is fixedly connected with limiting rod 5, the outer side of limiting rod 5 is slidably connected with moving sleeve 6, the outer side of moving sleeve 6 is fixedly connected with pushing assembly 7, the outer side of moving sleeve 6 is fixedly connected with cleaning brush 8, the outer side of cleaning brush 8 and the outer side of film roller 2 are mutually contacted, the inner side of connecting frame 3 is fixedly connected with filter frame 9, the inner side of filter frame 9 is fixedly connected with exhaust assembly 10, the inner side of filter frame 9 is movably connected with filter shell 11, the bottom of filter shell 11 is fixedly connected with limiting assembly 12, the inner side of filter shell 11 is fixedly connected with filter element 13.

[0025] Wherein, filter shell 11 extends to the inner side of filter frame 9, the number of exhaust assembly 10 is multiple, and the multiple exhaust assembly 10 is distributed in the inner side of filter frame 9 in equidistance linear array.

[0026] The number of exhaust assembly 10 is multiple, which can improve the cleaning effect of dust, thereby effectively preventing dust from accumulating in the inner side of connecting frame 3.

[0027] Wherein, pushing assembly 7 includes pushing block 71 fixedly connected to the outer side of moving sleeve 6, the inner side of connecting frame 3 is fixedly connected with pushing cylinder 72, and the outer side of the telescopic end of pushing cylinder 72 is fixedly connected with the outer side of pushing block 71.

[0028] Starting pushing cylinder 72 can make pushing block 71 move left and right with moving sleeve 6, so that cleaning brush 8 moves left and right, thereby cleaning the outer side of film roller 2.

[0029] The air exhaust assembly 10 comprises an air exhaust block 101 fixedly connected to the inner side of the filter frame 9, and an air exhaust fan 102 fixedly connected to the inner side of the air exhaust block 101.

[0030] The limiting assembly 12 comprises a limiting plate 121 fixedly connected to the bottom end of the filter shell 11, a rotating column 122 rotatably connected to the bottom end of the connecting frame 3, a fixed plate 123 fixedly connected to the outer side of the rotating column 122, and the outer side of the fixed plate 123 is in mutual extrusion with the outer side of the limiting plate 121.

[0031] The limiting assembly 12 can limit the position of the filter frame 9.

[0032] Working principle:

[0033] During the rotation of the film coating roller 2, when the film coating roller 2 rotates, the cleaning brush 8 will be in contact with the outer side of the film coating roller 2, and the outer side of the film coating roller 2 can be cleaned in the process of contact, and the starting of the push cylinder 72 can drive the push block 71 to move the moving sleeve 6 left and right, so that the cleaning brush 8 moves left and right, and the cleaning effect is better.

[0034] And the starting of the air exhaust fan 102 can make the air in the inner side of the connecting frame 3 pass through the filter element 13 into the air exhaust block 101 and then be exhausted, and the filter element 13 can collect dust to some extent, thereby improving the overall filtering effect.

[0035] It should be noted that, in the present text, relational terms such as first and second and the like are used merely to differentiate one entity or action from another, without necessarily requiring or implying any actual such relationship or order between or among the entities or actions. Also, the terms "comprises", "comprising", or any other variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but can include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by an "including a" statement does not exclude the existence of additional identical elements in the process, method, article, or apparatus that includes the element.

[0036] Although the embodiments of the present application have been shown and described, it should be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present application, and the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A roller for a semiconductor coating machine comprising two support frames (1), characterized in that: Both opposite sides of the two support frames (1) are rotationally connected with the film-coating roller (2), and both opposite sides of the two support frames (1) are fixedly connected with the connecting frame (3), the inner side of the connecting frame (3) is fixedly connected with the limiting rod (5), the outer side of the limiting rod (5) is slidably connected with the moving sleeve (6), the outer side of the moving sleeve (6) is fixedly connected with the pushing assembly (7), the outer side of the moving sleeve (6) is fixedly connected with the cleaning brush (8), the outer side of the cleaning brush (8) is in contact with the outer side of the film-coating roller (2), the inner side of the connecting frame (3) is fixedly connected with the filtering frame (9), the inner side of the filtering frame (9) is fixedly connected with the air exhaust assembly (10), the inner side of the filtering frame (9) is movably connected with the filtering shell (11), the bottom end of the filtering shell (11) is fixedly connected with the limiting assembly (12), and the inner side of the filtering shell (11) is fixedly connected with the filtering filter element (13).

2. The roller for a semiconductor coater according to claim 1, characterized by: The filtering shell (11) extends to the inner side of the filtering frame (9), the number of the air exhaust assembly (10) is a plurality, and the plurality of air exhaust assemblies (10) are arranged in an equidistant linear array on the inner side of the filtering frame (9).

3. The roller according to claim 1, wherein: The pushing assembly (7) comprises a pushing block (71) fixedly connected to the outer side of the moving sleeve (6), the inner side of the connecting frame (3) is fixedly connected with a pushing cylinder (72), and the outer side of the telescopic end of the pushing cylinder (72) is fixedly connected with the outer side of the pushing block (71).

4. The roller according to claim 1, wherein: The air exhaust assembly (10) comprises an air exhaust block (101) fixedly connected to the inner side of the filtering frame (9), and the inner side of the air exhaust block (101) is fixedly connected with an air exhaust fan (102).

5. The roller according to claim 1, wherein: The limiting assembly (12) comprises a limiting plate (121) fixedly connected to the bottom end of the filtering shell (11), the bottom end of the connecting frame (3) is rotationally connected with a rotating column (122), the outer side of the rotating column (122) is fixedly connected with a fixed plate (123), and the outer side of the fixed plate (123) is in extrusion with the outer side of the limiting plate (121).