Ultraviolet exposure photoresist removing auxiliary device and photoresist removing system

Abstract

The utility model discloses an ultraviolet exposure photoresist removing auxiliary device and a photoresist removing system. The ultraviolet exposure photoresist removing auxiliary device comprises a box body, a clamp and a light source, the box body is provided with a side opening matched with the clamp and a top face opening matched with the light source, correspondingly, the clamp is arranged on the box body in a sliding mode through the side opening, and the light source is arranged on the box body through the top face opening. The clamp is provided with a taking and placing station sliding out of the box body and an exposure station for shielding the side opening, and correspondingly, the clamp is used for controlling opening and closing of the side opening; the light source is used for providing ultraviolet light. The photoresist removing system comprises the ultraviolet exposure photoresist removing auxiliary device. When the ultraviolet exposure photoresist removing auxiliary device and the photoresist removing system are used for a mask plate, the photoresist can be comprehensively decomposed after the single exposure time is about 30 seconds, and the exposure efficiency is high; an ultraviolet dot matrix LED light source is selected as a light source, uniform light intensity distribution is formed on the surface of the whole mask, illumination uniformity and exposure uniformity are good, degumming is convenient after exposure, and residues are few.

Description

Technical Field

[0001] This utility model relates to the field of adhesive removal equipment technology, specifically to an ultraviolet exposure adhesive removal auxiliary device and adhesive removal system. Background Technology

[0002] An IC mask is a photomask used in the manufacturing process of integrated circuits (ICs). In existing technologies, the method for removing photoresist from IC masks involves immersion in a sodium hydroxide solution. The drawback of this method is that it leaves photoresist residue in the narrow seams or grooves of the pattern, forming stubborn residue. This residue not only causes significant contamination during AOI (Automated Optical Inspection), but it is also very difficult to remove, whether using a cleaning machine or manually.

[0003] Therefore, in the existing technology, if sodium hydroxide solution is used for soaking to remove glue, it will have a significant impact on production utilization rate and first pass rate. Utility Model Content

[0004] The technical problem to be solved by this invention is to remove photoresist from IC photomasks by immersion in sodium hydroxide solution. The purpose is to provide an auxiliary device and system for ultraviolet exposure photoresist removal to solve the above-mentioned problem.

[0005] This utility model is achieved through the following technical solution:

[0006] In the first aspect, this utility model provides an auxiliary device for ultraviolet exposure adhesive removal, including a housing, a fixture and a light source;

[0007] The housing has a side opening adapted to the clamp and a top opening adapted to the light source. Accordingly, the clamp is slidably mounted on the housing through the side opening, and the light source is mounted on the housing through the top opening.

[0008] The fixture has a pick-and-place station that slides out of the housing and an exposure station with a shielded side opening. Accordingly, the fixture is used to control the opening and closing of the side opening; the light source is used to provide ultraviolet light.

[0009] In one possible design, the fixture includes a base plate, a baffle, and a surrounding plate;

[0010] The bottom surface of the substrate is slidably mounted on the housing, and a supporting structure is provided on the top surface of the substrate. One side of the substrate is connected to a baffle, and the other side of the substrate is connected to a surrounding plate.

[0011] The baffle has two opposing outer surfaces, one of which is configured as a shielding surface for connecting the lower substrate, and the remaining part of the shielding surface is used to shield the side opening; the other is configured as a control surface facing away from the side opening, and a handle is provided on the control surface.

[0012] The enclosure is connected to the substrate and extends above the top surface of the substrate to form a placement groove for placing workpieces.

[0013] In one possible design, the supporting structure includes several spaced-apart support bars, each with a rounded top surface and an auxiliary groove between adjacent support bars.

[0014] In one possible design, when a mask is used for the workpiece, the size of the placement slot is adapted to a 9-inch mask.

[0015] In one possible design, the width of the support strip is 8-12cm, the radius of the arc top surface is 4-6cm, the height of the support strip is 18-22cm, and the width of the auxiliary groove is 28-32cm.

[0016] In one possible design, the platform has two opposing notches for picking up and putting down workpieces. Correspondingly, the auxiliary grooves located at the notches are constructed as through grooves with both ends connected to the outside.

[0017] In one possible design, the bottom surface of the box is provided with a slide rail adapted to the clamp, and the clamp is slidably mounted on the slide rail accordingly;

[0018] Below the opening on the top surface of the housing, there is a support strip for placing the light source. Accordingly, the light source passes through the opening on the top surface and presses against the support strip.

[0019] In one possible design, the enclosure is made of bakelite.

[0020] In one possible design, an ultraviolet dot matrix LED light source is selected as the light source.

[0021] Secondly, this utility model provides a de-adhesive system, including the aforementioned ultraviolet exposure de-adhesive auxiliary device.

[0022] Compared with the prior art, this utility model has the following advantages and beneficial effects:

[0023] When used in photomasks, a single exposure time of about 30 seconds is sufficient to completely decompose the photoresist, resulting in high exposure efficiency. The light source is an ultraviolet dot matrix LED light source, which forms a uniform light intensity distribution on the entire photomask surface, ensuring good illumination uniformity and exposure uniformity. It also facilitates photoresist removal after exposure with minimal residue.

[0024] Furthermore, the UV exposure adhesive removal auxiliary device has a pull-out structure, which is simple in structure, easy to operate, and easy to master and promote. Attached Figure Description

[0025] The accompanying drawings, which are included to provide a further understanding of the embodiments of the present invention and form part of this application, do not constitute a limitation thereof. In the drawings:

[0026] Figure 1 This is a schematic diagram of a UV exposure adhesive removal auxiliary device.

[0027] Figure 2 This is a schematic diagram of the fixture.

[0028] Figure 3 This is a structural diagram of the box.

[0029] The attached diagram shows the markings and corresponding component names:

[0030] 100. Housing; 101. Side opening; 102. Top opening; 103. Slide rail; 104. Support bar; 200. Fixture; 201. Base plate; 202. Baffle; 203. Enclosure; 204. Handle; 205. Support bar; 206. Auxiliary groove; 207. Notch; 300. Light source. Detailed Implementation

[0031] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the embodiments and accompanying drawings. The illustrative embodiments and descriptions of this utility model are only used to explain this utility model and are not intended to limit this utility model.

[0032] Example:

[0033] like Figures 1-3 As shown, an ultraviolet exposure adhesive removal auxiliary device includes a housing 100, a clamp 200, and a light source 300;

[0034] The housing 100 has a side opening 101 adapted to the clamp 200 and a top opening 102 adapted to the light source 300. Accordingly, the clamp 200 is slidably mounted on the housing 100 through the side opening 101, and the light source 300 is mounted on the housing 100 through the top opening 102.

[0035] The fixture 200 has a pick-and-place station that slides out of the housing 100 and an exposure station that shields the side opening 101. Accordingly, the fixture 200 is used to control the opening and closing of the side opening 101; the light source 300 is used to provide ultraviolet light.

[0036] For some types of adhesives, when exposed to ultraviolet light, the photosensitizer in the adhesive changes. The photosensitizer absorbs ultraviolet light and generates active free radicals or cations, initiating monomer polymerization, cross-linking, and grafting chemical reactions. This causes the adhesive to transform from a liquid to a solid state, while simultaneously reducing its viscosity, making it easier to remove. This achieves the goal of reducing the adhesive's viscosity and facilitating its removal.

[0037] Specifically, photoresist is a high-molecular polymer. When positive photoresist is exposed to ultraviolet light, the photosensitizer absorbs light of a specific wavelength and undergoes a decomposition reaction, generating substances soluble in the developer. Therefore, before photoresist removal, UV light is used to expose the photoresist, causing a decomposition reaction on the surface. This allows the photoresist to dissolve directly in the alkaline solution during removal, preventing the formation of stubborn residue.

[0038] The UV exposure adhesive removal auxiliary device utilizes the aforementioned principle for adhesive removal. Specifically, when the clamp 200 is located at the pick-and-place station, at least a portion of the clamp 200 slides outside the housing 100 to facilitate placing the workpiece onto the clamp 200; then, the clamp 200 slides back into the housing 100, positioning itself at the exposure station and shielding the side opening 101. Simultaneously, the top opening 102 of the housing 100 is shielded by the light source 300. Therefore, when the clamp 200 is located at the exposure station, the space inside the housing 100 has excellent airtightness, preventing UV light leakage and avoiding injury to surrounding personnel.

[0039] When the fixture 200 is in the exposure station, the light source 300 is activated to expose the workpiece for a certain period of time. After exposure, the light source 300 is turned off, and the fixture 200 is moved to the pick-and-place station to remove the exposed workpiece and perform adhesive removal. This makes adhesive removal more convenient, facilitates cleaning, and saves a significant amount of time spent on cleaning and rework. For batch processing, the above steps can be repeated.

[0040] When the ultraviolet exposure photoresist removal auxiliary device is used on a photomask, the photoresist can be completely decomposed in a single exposure time of about 30 seconds, resulting in high exposure efficiency. The light source 300 is an ultraviolet dot matrix LED light source, which forms a uniform light intensity distribution on the entire photomask surface, resulting in good illumination uniformity and exposure uniformity. After exposure, the photoresist is easily removed with minimal residue.

[0041] Furthermore, the UV exposure adhesive removal auxiliary device has a pull-out structure, which is simple in structure, easy to operate, and easy to master and promote.

[0042] In one possible implementation, the fixture 200 includes a base plate 201, a baffle 202, and a surrounding plate 203;

[0043] The bottom surface of the substrate 201 is slidably mounted on the housing 100, and a support structure is provided on the top surface of the substrate 201. One side of the substrate 201 is connected to a baffle 202, and the other side of the substrate 201 is connected to a surrounding plate 203.

[0044] The baffle 202 has two opposing outer surfaces, one of which is configured as a shielding surface for connecting the lower part of the substrate 201, and the remaining part of the shielding surface is used to shield the side opening 101. The other is configured as a control surface facing away from the side opening 101, and a handle 204 is provided on the control surface.

[0045] The enclosure 203 is connected to the substrate 201 and extends above the top surface of the substrate 201 to form a placement groove for placing workpieces.

[0046] Based on the above design, the substrate 201 is slidably connected to the housing 100, allowing the fixture 200 to slide relative to the housing 100 and switch workstations. The substrate 201 connects to the workpiece via a support structure, which ensures that the front of the workpiece is uniformly exposed to ultraviolet light, the back of the workpiece is not scratched, and wear is minimized. The baffle 202 is used to block the side opening 101 to ensure the airtightness of the housing 100 and prevent ultraviolet light leakage. The enclosure 203 forms a placement groove, further defining the position of the workpiece and preventing accidental disturbance and falling of the workpiece during the movement of the fixture 200, thus protecting the workpiece.

[0047] Furthermore, the baffle 202 is equipped with a handle 204, which makes it easier for the operator to pull out the clamp 200. That is, during operation, the operator pulls out the clamp 200 to the pick-up / place station using the handle 204, and then pushes the clamp 200 to the shielding station using the handle 204. It is easy to understand that the handle 204 can be constructed in any suitable shape.

[0048] In one possible implementation, the supporting structure includes a number of spaced-apart support strips 205, each support strip 205 having a rounded top surface, and an auxiliary groove 206 between two adjacent support strips 205.

[0049] Based on the above design, when the workpiece is placed in the placement slot, the back of the workpiece presses against the support strip 205. Since the top surface of the set is an arc-shaped top surface, wear is reduced during loading and unloading, and scratches on the workpiece can be avoided. At the same time, multiple support strips 205 cooperate with each other to form multiple contact points, achieving a certain anti-slip effect and preventing the workpiece from sliding during the pulling process of the clamp 200, thus avoiding wear and scratches caused by it.

[0050] In one possible implementation, when a mask is selected for the workpiece, the size of the placement slot is adapted to a 9-inch mask. It is easy to understand that it can also be used for masks smaller than 9 inches, thus making the fixture 200 versatile and practical.

[0051] Optionally, the width of the support strip 205 is 8-12cm, the radius of the arc-shaped top surface is 4-6cm, the height of the support strip 205 is 18-22cm, and the width of the auxiliary groove 206 is 28-32cm. Based on the above design, it meets the needs of photomasks of 9 inches and below, or other plates of the same size.

[0052] It is worth noting that if the workpiece is large, the UV exposure adhesive removal auxiliary device can also be constructed in a larger size to fit the workpiece.

[0053] In one possible implementation, the platform is provided with two opposing notches 207 for picking up and putting down workpieces. Correspondingly, the auxiliary groove 206 located at the notch 207 is constructed as a through groove with both ends connected to the outside.

[0054] Based on the above design, the notch 207 is used for picking up and placing workpieces. Combined with the auxiliary groove 206, which is constructed as a through groove, it is more convenient for workers to pick up and place workpieces. On the one hand, it improves the efficiency of picking up and placing workpieces, and on the other hand, it helps to reduce the wear and damage to workpieces during the picking and placing process.

[0055] In one possible implementation, the bottom surface of the housing 100 is provided with a slide rail 103 adapted to the clamp 200, and the clamp 200 is slidably disposed on the slide rail 103.

[0056] Below the top opening 102 of the housing 100, there is a support strip 104 for placing the light source 300. Accordingly, the light source 300 passes through the top opening 102 and presses against the support strip 104.

[0057] Based on the above design, the clamp 200 is connected via the slide rail 103, which not only achieves a sliding connection but also guides the sliding direction, making the clamp 200 slide more accurately and efficiently. It is easy to understand that any suitable commercially available model can be selected for the slide rail 103. The number of support strips 104 is adapted to the number of inner surfaces of the housing 100 to maximize the contact area and ensure the stability of the light source 300.

[0058] In one possible implementation, the housing 100 is made of bakelite. Based on the above design, bakelite, also known as phenolic plastic, is a material with high mechanical strength, good insulation, heat resistance, and corrosion resistance, which can well meet the working requirements of the ultraviolet exposure adhesive removal auxiliary device.

[0059] In one possible implementation, the light source 300 is a UV dot matrix LED light source. Based on the above design scheme, the dot matrix design ensures the uniformity of UV light irradiation.

[0060] This embodiment introduces a resist removal system based on the aforementioned UV exposure resist removal auxiliary device. The resist removal system includes the aforementioned UV exposure resist removal auxiliary device. Based on the above design, the resist removal system can also include other suitable functional modules, resulting in richer functionality to meet different work requirements and improve practicality. It is easy to understand that the functional modules can be any suitable existing equipment, offering a wide range of choices.

[0061] The specific embodiments described above further illustrate the purpose, technical solution, and beneficial effects of this utility model. It should be understood that the above description is only a specific embodiment of this utility model and is not intended to limit the scope of protection of this utility model. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this utility model should be included within the scope of protection of this utility model.

Claims

1. An auxiliary device for ultraviolet exposure adhesive removal, characterized in that, Includes a housing (100), a clamp (200), and a light source (300); The housing (100) has a side opening (101) adapted to the clamp (200) and a top opening (102) adapted to the light source (300). Accordingly, the clamp (200) is slidably mounted on the housing (100) through the side opening (101), and the light source (300) is mounted on the housing (100) through the top opening (102). The fixture (200) has a pick-up and drop station that slides out of the housing (100) and an exposure station with a shielded side opening (101). Accordingly, the fixture (200) is used to control the opening and closing of the side opening (101); the light source (300) is used to provide ultraviolet light.

2. The UV exposure adhesive removal auxiliary device according to claim 1, characterized in that, The fixture (200) includes a base plate (201), a baffle (202), and a surrounding plate (203); The bottom surface of the substrate (201) is slidably mounted on the housing (100), and a support structure is provided on the top surface of the substrate (201). One side of the substrate (201) is connected to a baffle (202), and the other side of the substrate (201) is connected to a surrounding plate (203). The baffle (202) has two opposing outer surfaces, one of which is configured as a shielding surface for connecting the lower substrate (201), and the remaining part of the shielding surface is used to shield the side opening (101), and the other is configured as a control surface facing away from the side opening (101), and a handle (204) is provided on the control surface. The enclosure (203) is connected to the substrate (201) and extends above the top surface of the substrate (201) to form a placement groove for placing workpieces.

3. The UV exposure adhesive removal auxiliary device according to claim 2, characterized in that, The supporting structure includes several spaced-apart support strips (205), the top surface of each support strip (205) is constructed as an arc top surface, and an auxiliary groove (206) is left between two adjacent support strips (205).

4. The UV exposure adhesive removal auxiliary device according to claim 3, characterized in that, When a mask is selected for the workpiece, the size of the placement slot is adapted to a 9-inch mask.

5. The UV exposure adhesive removal auxiliary device according to claim 4, characterized in that, The width of the support strip (205) is 8-12cm, the radius of the arc top surface is 4-6cm, the height of the support strip (205) is 18-22cm, and the width of the auxiliary groove (206) is 28-32cm.

6. The UV exposure adhesive removal auxiliary device according to claim 5, characterized in that, The platform has two opposing notches (207) for taking and placing workpieces. Correspondingly, the auxiliary groove (206) located at the notch (207) is constructed as a through groove with both ends connected to the outside.

7. The UV exposure adhesive removal auxiliary device according to any one of claims 1-6, characterized in that, The bottom surface of the housing (100) is provided with a slide rail (103) adapted to the clamp (200), and the clamp (200) is slidably mounted on the slide rail (103); Below the top opening (102) of the housing (100) is a support strip (104) for placing the light source (300). Accordingly, the light source (300) passes through the top opening (102) and presses against the support strip (104).

8. The UV exposure adhesive removal auxiliary device according to claim 7, characterized in that, The enclosure (100) is made of bakelite.

9. The UV exposure adhesive removal auxiliary device according to claim 7, characterized in that, The light source (300) is an ultraviolet dot matrix LED light source.

10. A glue removal system, characterized in that, The UV exposure adhesive removal auxiliary device includes any one of claims 1-9.

Images