Gas treatment device for semiconductor production and processing

Abstract

The utility model provides a gas treatment device for semiconductor production and processing, which relates to the field of semiconductor production and processing and comprises a constant-temperature storage cabinet, a gas filter and a pneumatic pump, the gas filter is fixed on the upper end face of the constant-temperature storage cabinet and is connected with the pneumatic pump through a gas delivery pipe, and the pneumatic pump is connected with the constant-temperature storage cabinet. A residual gas reaction box is fixed to the left side end of the constant-temperature storage cabinet, the upper end of the residual gas reaction box is connected with a gas filter through an exhaust pipe, the lower end of the residual gas reaction box is connected with a reaction gas tank through a gas inlet pipe, a reaction cavity is formed in the inner side of the residual gas reaction box, and a molecular sieve net plate is inserted into the reaction cavity in a sealed mode. And the right end of the reaction cavity is respectively communicated with a gas inlet pipe and a gas outlet pipe through a gas guide groove. The cleaning gas treatment device solves the problem that in the prior art, when the cleaning gas treatment device is unlocked and detached, if internal gas is not exhausted, the human body is harmed.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor production and processing, specifically relates to a kind of gas treatment device for semiconductor production and processing. BACKGROUND

[0002] In the semiconductor production process, gas plays a vital role. These gases are not only used in various process links, but also have a direct impact on the performance and quality of the final product, and gas is widely used in cleaning, deposition / CVD, lithography, etching, ion implantation, film forming and other semiconductor processes, through the search, prior art (application number: CN202420139195.7) a kind of gas treatment device for semiconductor production and processing, the document records "by letting the second shrinker freely slide in the first shrinker, then the sliding function of the second shrinker is realized, when the second shrinker extends out of the first shrinker, the slider will be in the locking state at this time, otherwise when the second shrinker is completely slid into the interior of the first shrinker, the slider will be in the unlocked state at this time, then the spring will directly pop out the slider, the base is arranged in the direction of the lower side of the device main body, the base has the function of supporting the installation of the overall device", but the existing technology has the problem that if the internal gas is not exhausted when unlocking and disassembling the cleaning gas treatment device, it will cause harm to the human body. UTILITY MODEL CONTENTS

[0003] To overcome the defects existing in the prior art, a gas treatment device for semiconductor production and processing is provided to solve the problem that if the internal gas is not exhausted when unlocking and disassembling the cleaning gas treatment device in the prior art, it will cause harm to the human body.

[0004] To achieve the above-mentioned purpose, a gas treatment device for semiconductor production and processing is provided, which comprises: a constant-temperature storage cabinet, a gas filter and a gas pump, the constant-temperature storage cabinet is fixed with a gas filter on the upper end face, the gas filter is connected with a gas pump through a gas conveying pipe,

[0005] The left side end of the constant-temperature storage cabinet is fixed with a residual gas reaction box, the upper end of the residual gas reaction box is connected with the gas filter through an exhaust pipe, the lower end of the residual gas reaction box is connected with a reaction gas tank through an air inlet pipe, the inside of the residual gas reaction box is provided with a reaction cavity, a molecular sieve net plate is sealingly inserted into the reaction cavity, and the right end of the reaction cavity is connected with the air inlet pipe and the exhaust pipe through a gas guide groove.

[0006] Further, the processing gas tank is placed in the constant-temperature storage cabinet, and the heat preservation cabinet door is magnetically attached to the front end face of the constant-temperature storage cabinet.

[0007] Further, the lower end of the gas filter is connected with the processing gas tank through a connecting pipe, and two groups of filter screens are clamped in the gas filter.

[0008] Further, a sealing cover is buckled on the upper end surface of the gas filter, and a gas conveying pipe is connected with the upper surface of the sealing cover; and the gas conveying pipe is connected with the gas inlet of the air pump.

[0009] Further, an exhaust pipe is connected with the left side end of the gas filter, and an air pump is installed on the surface of the exhaust pipe; and columnar air guide grooves are distributed on the lower pipe opening of the exhaust pipe.

[0010] Further, a plugging plug is plugged in the slot at the lower end surface of the residual gas reaction box; and the plugging plug is located below the molecular sieve screen.

[0011] Further, a reaction gas tank is placed on the left side of the constant-temperature storage cabinet, and an air pump is fixed on the right side end of the constant-temperature storage cabinet.

[0012] The semiconductor production and processing gas treatment device has the advantages that the semiconductor production and processing gas treatment device utilizes the residual gas reaction box to pump the residual gas in the gas filter and the gas conveying pipe, mixes the residual gas with the gas capable of reacting, carries out the mixing reaction, absorbs the residual gas, effectively avoids the residual gas in the gas treatment device from flowing out, facilitates the clean treatment of the residual gas in the gas treatment device, reduces the harm of the gas used in the semiconductor production and processing to workers, and improves the treatment effect of the gas treatment device. BRIEF DESCRIPTION OF DRAWINGS

[0013] Fig. 1 It is a front view structural schematic diagram of the semiconductor production and processing gas treatment device of the utility model embodiment.

[0014] Fig. 2 It is a front view sectional structure schematic diagram of the semiconductor production and processing gas treatment device of the utility model embodiment.

[0015] Fig. 3 It is a front view sectional structure schematic diagram of the residual gas reaction box of the utility model embodiment.

[0016] Fig. 4 It is a front view sectional structure schematic diagram of the gas filter of the utility model embodiment.

[0017] In the drawing: 1, constant-temperature storage cabinet; 11, heat preservation cabinet door; 12, processing gas tank; 2, residual gas reaction box; 21, molecular sieve screen; 22, reaction cavity; 23, gas inlet pipe; 24, plugging plug; 25, air guide groove; 3, gas filter; 31, exhaust pipe; 32, air pump; 33, filter screen; 34, connecting pipe; 35, sealing cover; 4, air pump; 41, gas conveying pipe; 5, reaction gas tank. DETAILED DESCRIPTION

[0018] Referring to Figs. 1 to 4 The utility model provides a kind of gas treatment device for semiconductor production and processing, comprising: constant temperature storage cabinet 1, gas filter 3 and air pump 4, constant temperature storage cabinet 1 upper end is fixed with gas filter 3, gas filter 3 is connected with air pump 4 by gas pipe 41,

[0019] Constant temperature storage cabinet 1 left side end is fixed with residual gas reaction box 2, residual gas reaction box 2 upper end is connected with gas filter 3 by exhaust pipe 31, residual gas reaction box 2 lower end is connected with reaction gas tank 5 by gas inlet pipe 23, residual gas reaction box 2 inside is provided with reaction cavity 22, reaction cavity 22 is sealedly inserted with molecular sieve screen board 21, reaction cavity 22 right end is communicated with gas inlet pipe 23 and exhaust pipe 31 respectively by gas guide groove 25.

[0020] When gas filter 3 needs to be disassembled and cleaned, close processing gas tank 12, control air pump 32 to open, remaining gas in gas filter 3 and gas pipe 41 is transported to residual gas reaction box 2, at this time, the gas reacted with reaction gas tank 5 is sent to reaction gas tank, so that the gas in reaction gas tank 5 (the gas stored in reaction gas tank 5 can be selected according to the gas stored in processing gas tank 12) is mixed with remaining gas and enters reaction cavity 22 to react and absorb, while molecular sieve screen board 21 catalyzes and absorbs the reaction of remaining gas and mixed gas, after reaction, gas filter 3 can be opened for cleaning work.

[0021] In the embodiment, processing gas tank 12 is placed in constant temperature storage cabinet 1, and heat preservation cabinet door 11 is installed on the front surface of constant temperature storage cabinet 1.

[0022] As a preferred embodiment, processing gas tank 12 is convenient for low-temperature storage, so that processing gas tank 12 is in an adaptive environment, ensuring stable storage of gas in processing gas tank 12 and reducing the risk of explosion.

[0023] In the embodiment, gas filter 3 is connected with processing gas tank 12 by connecting pipe 34, and two groups of filter screen boards 33 are clamped in gas filter 3. Sealing cover 35 is buckled on the upper end surface of gas filter 3, and gas pipe 41 is connected to the upper surface of sealing cover 35; and gas pipe 41 is connected with the gas inlet of air pump 4. Exhaust pipe 31 is connected to the left side end of gas filter 3, and air pump 32 is installed on the surface of exhaust pipe 31; and columnar gas guide groove 25 is distributed at the lower pipe opening of exhaust pipe 31.

[0024] As a preferred embodiment, the gas filter 3 guides the gas in the processing gas tank 12 into the filter screen plate 33 through the connecting pipe 34, and after filtering through the filter screen plate 33, the filtered gas is transported to the semiconductor processing site for use. The exhaust pipe 31 facilitates guiding the remaining gas in the gas filter 3 and the gas conveying pipe 41 into the residual gas reaction box 2, and the gas conveyed through the gas guiding groove 25 and the lower end reaction gas tank 5 is mixed and reacted.

[0025] In the embodiment, the residual gas reaction box 2 is provided with a sealing plug 24 at the lower end surface slot, and the sealing plug 24 is located below the molecular sieve screen plate 21. The reaction gas tank 5 is placed on the left side of the constant temperature storage cabinet 1, and the pneumatic pump 4 is fixed on the right side end of the constant temperature storage cabinet 1.

[0026] As a preferred embodiment, the sealing plug 24 is used to seal the reaction product, and opening the sealing plug 24 facilitates discharging the product in the residual gas reaction box 2. The reaction gas tank 5 is used to react with the gas used for semiconductor production and processing, and plays a role of reaction absorption of the semiconductor production and processing gas.

[0027] The semiconductor production and processing gas treatment device can effectively solve the problem that the residual gas in the gas treatment device will cause harm to the human body when the gas treatment device is unlocked and disassembled for cleaning in the prior art, effectively avoid the outflow of the residual gas in the gas treatment device, facilitate the cleaning of the residual gas in the gas treatment device, reduce the harmfulness of the gas used for semiconductor production and processing to the workers, improve the processing effect of the gas treatment device, and is suitable for semiconductor production and processing gas treatment device.

Claims

1. A gas handling apparatus for semiconductor manufacturing and processing, comprising: A constant temperature storage cabinet (1), a gas filter (3), and a pneumatic pump (4) are provided. The gas filter (3) is fixed on the upper surface of the constant temperature storage cabinet (1), and the gas filter (3) is connected to the pneumatic pump (4) through a gas supply pipe (41). The features are as follows: The constant temperature storage cabinet (1) has a residual gas reaction chamber (2) fixed on the left side. The upper end of the residual gas reaction chamber (2) is connected to the gas filter (3) through the exhaust pipe (31). The lower end of the residual gas reaction chamber (2) is connected to the reaction gas tank (5) through the air inlet pipe (23). The residual gas reaction chamber (22) is provided inside the side of the residual gas reaction chamber (2). A molecular sieve plate (21) is sealed and inserted inside the reaction chamber (22). The right end of the reaction chamber (22) is connected to the air inlet pipe (23) and the exhaust pipe (31) through the gas guide groove (25).

2. The gas handling apparatus for semiconductor manufacturing and processing according to claim 1, characterized in that, The constant temperature storage cabinet (1) has a processing gas tank (12) placed inside, and a heat preservation cabinet door (11) is installed on the front surface of the constant temperature storage cabinet (1); and the heat preservation cabinet door (11) is magnetically attached to the front surface of the constant temperature storage cabinet (1).

3. The gas handling apparatus for semiconductor manufacturing and processing according to claim 1, characterized in that, The lower end of the gas filter (3) is connected to the processing gas tank (12) through a connecting pipe (34), and two sets of filter screens (33) are snapped into the inner side of the gas filter (3).

4. The gas handling apparatus for semiconductor manufacturing and processing according to claim 1, characterized in that, The gas filter (3) is fitted with a sealing cap (35) on its upper end face, and the upper surface of the sealing cap (35) is connected to a gas supply pipe (41); and the gas supply pipe (41) is connected to the air inlet of the pneumatic pump (4).

5. A gas handling apparatus for semiconductor manufacturing and processing according to claim 1, characterized in that, The gas filter (3) is connected to an exhaust pipe (31) on the left side, and an air pump (32) is installed on the surface of the exhaust pipe (31); and columnar air guide grooves (25) are distributed at the lower opening of the exhaust pipe (31).

6. The gas handling apparatus for semiconductor manufacturing and processing according to claim 1, characterized in that, The residual gas reaction chamber (2) has a sealing plug (24) plugged into the groove on the lower end face; and the sealing plug (24) is located below the molecular sieve plate (21).

7. A gas handling apparatus for semiconductor manufacturing and processing according to claim 1, characterized in that, A reaction gas tank (5) is placed on the left side of the constant temperature storage cabinet (1), and a pneumatic pump (4) is fixed on the right side of the constant temperature storage cabinet (1).

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