Ion source mechanism and passivation equipment
By adding electrode plates to the ion source structure and utilizing the synergistic effect of magnetic and electric fields, the problem of insufficient ion ionization efficiency in the prior art has been solved, achieving high density and uniformity of the ion beam, and improving the passivation effect and stability of the solar cell.
Patent Information
- Application Number
- CN202520297569.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-24
- Publication Date
- 2025-12-12
- Estimated Expiration
- 2035-02-24
AI Technical Summary
Existing gas ionization mechanisms have shortcomings in ionization efficiency and uniformity, which leads to a decrease in the quality of the passivation film layer on the surface of the solar cell, affecting the photoelectric conversion efficiency and the stability of the solar cell.
An ion source mechanism is designed to further ionize unionized gas between the electrode plates by adding electrode plates above the anode and cathode and utilizing the synergistic effect of magnetic and electric fields, thereby improving the density and uniformity of the ion beam and ensuring effective bonding of ions to the surface of the solar cell.
This improved the quality and uniformity of the ion beam, enhanced the density and uniformity of the passivation film, and improved the photoelectric conversion efficiency and long-term stability of the solar cell.
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Figure CN223665405U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to battery piece production technical field especially, and relates to a kind of ion source mechanism and passivation equipment. BACKGROUND
[0002] In the battery piece preparation process, the plating film process of the surface or cutting surface of battery piece is a crucial link in solar photovoltaic power generation system, usually plating film on the surface or cutting surface of battery piece, effectively reduce the recombination rate of battery piece surface, improve photoelectric conversion efficiency, ensure the stability and durability of battery piece in long-term use. In order to form high-quality passivation film layer, the distribution and energy of ion source need to be accurately controlled to ensure the uniformity and density of the film layer. The existing gas ionization mechanism only ionizes gas through the electric field between cathode and anode, which has deficiencies in ionization efficiency and uniformity, and cannot fully ionize the gas introduced into the plating film furnace body. The gas that is not fully ionized will also participate in passivation plating film reaction, resulting in a decrease in film quality and affecting photoelectric conversion efficiency. SUMMARY
[0003] To solve the above technical problems, the utility model provides an ion source mechanism and passivation equipment.
[0004] In the first aspect, an ion source mechanism includes: a mounting seat and an ion source assembly provided on the mounting, the ion source assembly includes an insulating bottom sleeve, a cathode, an insulating top plate, an anode provided in sequence on the upper part of the cathode, and a ring-shaped magnet provided on the upper part of the anode, a magnet cover with a central hole is provided above the ring-shaped magnet, a hollow ionization cavity is provided in the cathode, an air inlet pipe is provided below the cathode, one end of the air inlet pipe is communicated with the hollow ionization cavity, the other end of the air inlet pipe extends out of the insulating bottom sleeve and is communicated with an external gas source, the insulating top plate and the anode are both provided with an ejection port facing the hollow ionization cavity, an electrode plate is provided above the ejection port, the electrode plate is connected with a second power supply, and the anode and the cathode are connected with a first power supply.
[0005] Optionally, an insulating sleeve is provided between the air inlet pipe and the mounting seat.
[0006] Optionally, the hollow ionization cavity is cylindrical or long strip-shaped, and the ejection ports on the insulating top plate and the anode matched with the hollow ionization cavity are round holes or slits.
[0007] Optionally, a plurality of flow uniforming holes are provided on the electrode plate.
[0008] Optionally, the electrode plate includes a negative electrode plate and a positive electrode plate, the negative electrode plate is connected with the positive electrode plate through an insulating column, the positive electrode plate is connected with the magnet cover, the positive electrode plate is connected with the positive electrode of the second power supply, and the negative electrode is connected with the negative electrode plate.
[0009] Optionally, the anode middle part is further provided with a diffuser, the bottom of the diffuser is provided with dispersion holes, the upper part of the diffuser is provided with horn mouths in communication with the dispersion holes, the horn mouths are towards the electrode plate side, and the dispersion holes are towards the hollow ionization cavity side.
[0010] Optionally, the ion source assembly comprises two or more groups, and the two or more groups of ion source assemblies are dispersedly arranged on the mounting seat, and the bottom of the insulating bottom sleeve of each ion source assembly is commonly connected with a ventilation plate, and the ventilation plate is provided with air passages in communication with the air inlet pipes.
[0011] Optionally, the air passage is a groove in the bottom of the ventilation plate, and the cover plate is in closed connection with the ventilation plate to form the air passage.
[0012] Optionally, the mounting seat is provided with a water cooling channel, and the water cooling channel is arranged around the annular magnet.
[0013] In the second aspect, a passivation device comprises a furnace body, a furnace cover and a vacuum pumping mechanism, and the ion source mechanism of any one of the above is arranged in the passivation furnace body, the furnace cover is used for covering the passivation furnace body and for carrying the battery piece to be passivated, the vacuum pumping mechanism is used for pumping air in the passivation furnace body, the ion source mechanism is arranged on the passivation furnace body and below the battery piece loaded on the furnace cover, and the emission port is opposite to the passivation surface of the battery piece.
[0014] Compared with the prior art, the ion source mechanism has the advantages that: the electrode plate is added above the anode and the cathode, the cathode, the anode and the electrode plate are respectively connected to two different power sources, the ions ionized in the hollow ionization cavity of the cathode accelerate to the electrode plate under the action of the magnetic field, the gas not fully ionized is further ionized into ions in the electric field between the electrode plates, so that the density and uniformity of the ion beam are improved, the kinetic energy and utilization rate of the ions are improved, the fully ionized ions are neutralized with the dangling bonds on the surface of the battery piece to form more firm chemical bonds when the ion plating film is used on the surface or the cutting surface of the battery piece, the quality of the ion beam is improved through the optimization of the design of the ion source, the uniformity and consistency in the passivation process are ensured, and the purpose of improving the passivation effect of the battery piece is achieved. BRIEF DESCRIPTION OF DRAWINGS
[0015] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed in the embodiments. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without any creative effort.
[0016] Figure 1 The first ion source mechanism structure diagram of the utility model is shown in the figure.
[0017] Figure 2 The first ion source mechanism structure diagram of the utility model is shown in the figure. Figure 1 The first ion source mechanism structure diagram of the utility model is shown in the figure.
[0018] Figure 3 The second ion source mechanism structure diagram of the utility model is shown in the figure.
[0019] Figure 4 The third ion source mechanism structure diagram of the utility model is shown in the figure.
[0020] Figure 5 The third ion source mechanism structure diagram of the utility model is shown in the figure. Figure 4 The third ion source mechanism structure diagram of the utility model is shown in the figure.
[0021] Figure 6 The third ion source mechanism structure diagram of the utility model is shown in the figure.
[0022] Wherein, the reference sign is:
[0023] 1, mounting seat; 11, water cooling channel; 2, ion source assembly; 21, insulating bottom sleeve; 22, cathode;
[0024] 221, hollow ionization cavity; 222, air inlet pipe; 223, insulating sleeve; 23, insulating top plate; 24, anode; 25, magnet; 26, magnet cover; 3, electrode plate; 311, uniform flow hole; 31, negative plate; 32, positive plate; 4, diffuser; 41, dispersion hole; 42, horn mouth; 5, air plate; 6, cover plate. DETAILED DESCRIPTION
[0025] The technical solutions in the embodiments of the utility model will be described clearly and completely below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of the utility model.
[0026] In order to make the above-mentioned purposes, features and advantages of the utility model more obvious and easy to understand, the specific embodiments of the utility model will be described in detail below with reference to the drawings.
[0027] As Figure 1As shown, the ion source mechanism provided in the present application comprises a mounting base 1 and an ion source assembly 2. The ion source assembly 2 comprises, from outside to inside, an insulating bottom sleeve 21, a cathode 22, and, in sequence, an insulating top plate 23, an anode 24 arranged on the upper portion of the cathode 22, and a ring-shaped magnet 25 arranged on the upper portion of the anode 24. A magnet cover 26 with a central opening is arranged above the ring-shaped magnet 25. The cathode 22 is internally provided with a hollow ionization cavity 221. A gas inlet pipe 222 is arranged below the cathode, one end of which is communicated with the hollow ionization cavity, and the other end extends out of the insulating bottom sleeve 21 to be communicated with an external gas source. The insulating top plate 23 and the anode 24 are both provided with an ejection port corresponding to the hollow ionization cavity 221. An electrode plate 3 is arranged above the ejection port. The electrode plate 3 is communicated with a second power supply. The anode 24 is communicated with a first power supply. The insulating bottom sleeve 21 and the insulating top plate 23 insulate and connect the cathode 22 and the mounting base 1.
[0028] In a specific embodiment, the magnet cover 26 is made of a metal conductive material. The anode 24 directly contacts the mounting base 1. The anode 24 is connected to the positive pole of the first power supply. The negative pole of the first power supply is connected to the cathode 22. The electrode plate 3 is connected to the negative pole of the second power supply. The positive pole of the second power supply is connected to the magnet cover 26 arranged opposite to the electrode plate 3. The ion beam intensity and direction are controlled by adjusting the power supply voltage. The first power supply forms a stable electric field between the anode 24 and the cathode 22, thereby ensuring the stability of discharge. A voltage-adjustable positive constant voltage source with a voltage of 100-800 V is connected between the cathode 22 and the anode 24, thereby optimizing the uniformity of extracted ions. The second power supply ensures the effective guidance of the ion beam by the electrode plate 3, thereby realizing the efficient transmission and uniform distribution of the ion beam and ensuring the uniform deposition of the aluminum oxide thin film on the surface of the battery piece.
[0029] Specifically, there is a voltage difference between the first power supply and the second power supply. For example, the first power supply is set to 500 V, and the second power supply is set to 200 V, with a voltage difference of 300 V. By accurately adjusting and controlling, the ion beam is ensured to stably move in the electric field, uniformly cover the target area, and improve the quality of the thin film. Through the above design, the ion source generates a supersonic downward beam ion with an energy of less than 30 eV in the vacuum chamber, and the vacuum degree reaches 6×10-8 Pa. The high-purity plasma beam flow is rich in free radicals, effectively improves the hydrogen passivation effect on the surface of the battery piece, and significantly enhances the compactness and adhesion of the thin film, thereby ensuring its long-term stability in a high-temperature vacuum environment.
[0030] The electric field distribution between the electrode plate 3 and the anode 24 plate is optimized, further enhancing the stability and penetration of the ion beam, and the discharge area is formed between the electrode plate 3 and the cathode 22, and the annular magnet 25 is used to enhance the ionization effect, limit the diffusion of plasma, and guide the ions to accelerate rapidly towards the anode 24. The magnetic field generated by the annular magnet 25 cooperates with the electric field to ensure that the ion beam forms a high-density, high-energy ion flow at the exit, effectively improving the ionization efficiency. By accurately regulating the power parameters, the ion beam moves stably in the electric field, uniformly covers the target area, and significantly improves the deposition quality of the aluminum oxide film and the passivation effect of the surface of the battery piece.
[0031] In some embodiments, an insulating sleeve 223 is sleeved between the gas inlet pipe 222 and the mounting seat 1, one end of the insulating sleeve 223 is in contact with the insulating bottom sleeve 21, and the other end extends out of the bottom of the mounting seat 1, so that the insulating sleeve 223 insulates and connects between the cathode 22 and the mounting seat 1, one end of the gas inlet pipe 222 is in contact with the cathode 22, and the other end is connected to the negative electrode of the first power supply. The positive electrode of the first power supply is connected to the mounting seat 1 which is directly connected to the anode 24. Through this structural design, when the ion source is working, a stable electric field is formed between the cathode 22 and the anode 24, and the gas in the gas inlet pipe 222 is ionized in the hollow ionization cavity 221 under the action of the electric field to generate plasma. The ions move towards the anode 24 under the joint action of the electric field and the magnetic field.
[0032] It should be noted that the gas inlet pipe 222 can be an integral structure with the cathode 22, extending from the bottom of the cathode 22 to the outside of the insulating bottom sleeve 21 and the mounting seat 1; or it can be a separate gas inlet pipe 222 connected to the cathode 22, one end of the gas inlet pipe 222 being communicated with the hollow ionization cavity 221 and the other end extending to the outside of the mounting seat 1 and being connected to an external gas source.
[0033] The gas inlet pipe 222 is communicated with the hollow ionization cavity 221 through the insulating bottom sleeve 21, ensuring that the gas enters the discharge area uniformly. The insulating top plate 23 is made of pure iron, and the cathode 22 is made of tantalum, optimizing the ionization efficiency.
[0034] In some embodiments, as shown in Figure 2 、 Figure 3 The hollow ionization cavity 221 can be cylindrical or long strip-shaped, and the exit on the insulating top plate 23 and the anode 24 corresponding thereto is a round hole or a slit.
[0035] In some embodiments, a plurality of uniform flow holes 311 are uniformly arranged on the electrode plate 3, which accurately regulate the density and energy of the ion beam emitted from the exit on the anode 24 and the insulating top plate 23, ensuring that the ion beam uniformly covers the target area and improves the film coating quality and efficiency. Ensure that the hydrogen ions uniformly cover the surface of the battery piece to improve the film coating quality.
[0036] In some embodiments, the circuit board is fixed to the mounting base 1 by the magnet cover 26, and the electrode plate 3 includes a positive plate 32 and a negative plate 31, the negative plate 31 is connected to the positive plate 32 by an insulating column, the positive plate 32 is connected to the magnet cover 26, the positive pole of the second power supply is connected to the positive plate 32, the negative pole is connected to the negative plate 31, and a uniform electric field is formed between the positive plate 32 and the negative plate 31. The ions ionized in the hollow ionization cavity 221 move towards the anode 24 under the action of the annular magnet 25, pass through the exit on the insulating top plate 23 and the anode 24, and enter the uniform electric field between the electrode plates 3 arranged above the magnet cover 26. The uniform electric field accelerates the ions emitted from the exit to pass through the uniform flow hole 311 on the circuit board, so that the beam-shaped ion beam is uniformly dispersed under the shunt effect of the uniform flow hole. On the other hand, the uniform electric field can ionize the gas emitted from the exit into ions again, fully ionize the gas entering the hollow ionization cavity 221, improve the ionization efficiency, ensure the stability and uniformity of the ion beam, further improve the coating quality and passivation effect of the surface of the battery piece, and optimize the overall process performance.
[0037] In some embodiments, as shown in Figure 4 、 Figure 5 The ion source assembly 2 is provided with two or more groups, and the two or more groups of ion source assemblies 2 are dispersedly arranged on the mounting base 1, and the bottoms of the insulating bottom sleeves 21 in each ion source assembly are commonly connected to the air inlet plate 5. The air inlet plate 5 is provided with air channels respectively communicating with each gas inlet pipe 222, and the air channels communicate with the same external gas source to introduce gas into the hollow ionization cavities 221 of the plurality of ion source assemblies 2. Through reasonable layout, the plurality of ion source assemblies 2 work cooperatively to further improve the ion beam coverage area and ionization efficiency.
[0038] In some embodiments, the anode 24 in the ion source assembly 2 can also be integrated with the mounting base 1, and the mounting base 1 is directly connected to the positive pole of the first power supply. The top end of the mounting base 1 extends to the top of the insulating top plate 23 and is used as the anode 24.
[0039] In addition, the air inlet plate 5 can be directly connected to the gas inlet pipe 222 or indirectly connected to the gas inlet pipe 222 through a connecting piece. When directly connected, the air inlet plate 5 is made of insulating materials such as silicone and polytetrafluoroethylene. When indirectly connected, a metal connecting piece can be used.
[0040] In some embodiments, a cover plate 6 is further connected to the bottom of the mounting base 1. The air channels provided on the air inlet plate 5 are provided on the bottom of the air inlet plate 5, and the air channels are closed and connected between the cover plate 6 and the air inlet plate 5 to form the air channels. Ensure that the gas flows uniformly into each ion source assembly 2. The air inlet plate 5 is tightly combined with the cover plate 6 to prevent gas leakage and maintain stable internal pressure of the system. In addition, the cover plate 6 is designed to be easy to disassemble and clean, facilitating maintenance and prolonging the service life of the equipment.
[0041] In some embodiments, referring to Figure 5 As shown in the drawings, the mounting seat 1 is provided with a water cooling channel 11, the water cooling channel 11 surrounds the periphery of the annular magnet 25, and the two ends of the water cooling channel 11 are connected with a water inlet and a water outlet; cooling water circulates and flows away excess heat, improves the heat dissipation efficiency, effectively reduces the working temperature of the annular magnet 25, prevents overheating, ensures stable operation of the equipment, and prolongs the service life of the annular magnet 25.
[0042] In some embodiments, as shown in the drawings, Figure 6 The middle part of the anode 24 is further provided with a diffuser 4, the bottom of the diffuser 4 is provided with a dispersion hole 41 matched with the hollow ionization cavity 221 in shape, which can effectively disperse the ion beam, the upper part of the diffuser 4 is provided with a horn mouth 42 communicated with the dispersion hole, the horn mouth 42 is directed to the side of the electrode plate 3, and the dispersion hole 41 is directed to the side of the hollow ionization cavity 221. Further, the ions introduced from the hollow ionization cavity 221 are further dispersed by the diffuser 4, and are more uniformly dispersed according to the preset angle and area of the dispersion hole 41, which ensures that the ion beam uniformly covers a larger area, improves the uniformity and consistency of the film coating, prevents local overheating of the annular magnet 25, optimizes the heat dissipation effect, and prolongs the service life of the equipment.
[0043] In another aspect, the utility model also provides a passivation equipment, the equipment includes passivation furnace body and furnace cover, and be located in passivation furnace body in any one ion source mechanism and vacuumizing mechanism above, wherein the furnace cover is used for covering passivation furnace body and is used for bearing the battery piece to be passivated, the vacuumizing mechanism is used for pumping passivation furnace body, the ion source mechanism is located below the battery piece of the furnace cover loading, and the emission port is directed to the one side of the battery piece to be passivated, ensures that the ion beam directly acts on the surface of the battery piece, improves the passivation effect. The furnace cover adopts the detachable design, and the battery piece is quickly loaded and unloaded, and the production efficiency is improved.
[0044] To sum up, the ion source mechanism and the passivation equipment improve the conversion efficiency and long-term stability of the battery piece by precisely controlling the density and energy of the ion beam, optimizing the microstructure of the surface of the battery piece, and enhancing the compactness and uniformity of the passivation layer, while fully ionizing the gas introduced into the passivation furnace body, ensuring the stability and uniformity of the ion beam, further optimizing the quality of the passivation layer, prolonging the service life of the battery piece, and improving the overall production benefit.
[0045] The principle and implementation mode of the specific examples in the utility model are described, and the description of the above examples is only used to help understand the method and core idea of the utility model; meanwhile, for the general technical personnel in the field, the specific implementation mode and application range will be changed according to the idea of the utility model. To sum up, the content of the specification should not be understood as the limitation of the utility model.
Claims
1. An ion source mechanism, characterized in that, include: The mounting base (1) and the ion source assembly (2) mounted on the mounting base are provided. The ion source assembly (2) includes an insulating base sleeve (21) and a cathode (22) arranged from the outside to the inside, an insulating top plate (23) and an anode (24) arranged sequentially on the upper part of the cathode (22), and an annular magnet (25) arranged on the upper part of the anode (24). A magnet cover (26) with a central opening is provided above the annular magnet (25). A hollow ionization cavity (221) is provided inside the cathode (22). An air inlet pipe (222) is provided below the cathode. One end of the air inlet pipe (222) is connected to the hollow ionization chamber (221), and the other end extends out of the insulating bottom sleeve (21) to connect to an external air source. Both the insulating top plate (23) and the anode (24) are provided with an ejection port facing the hollow ionization chamber (221). An electrode plate (3) is provided above the ejection port. The electrode plate (3) is connected to a second power source. The anode (24) and the cathode (22) are connected to a first power source.
2. The ion source mechanism according to claim 1, characterized in that, An insulating sleeve (223) is provided between the air intake pipe (222) and the mounting base (1).
3. The ion source mechanism according to claim 1, characterized in that, The hollow ionization cavity (221) is cylindrical or elongated, and the injection outlet on the insulating top plate (23) and the anode (24) that match it is a round hole or a slit.
4. The ion source mechanism according to claim 1, characterized in that, The electrode plate (3) is provided with several flow equalization holes (311).
5. The ion source mechanism according to claim 1, characterized in that, The electrode plate (3) includes a negative electrode plate (31) and a positive electrode plate (32). The negative electrode plate (31) is connected to the positive electrode plate (32) through an insulating post. The positive electrode plate (32) is connected to the magnet cover (26). The positive terminal of the second power supply is connected to the positive electrode plate (32), and the negative terminal is connected to the negative electrode plate (31).
6. The ion source mechanism according to claim 1, characterized in that, The anode (24) is also provided with a diffuser (4) in the middle. The diffuser (4) has a dispersion hole (41) at the bottom and a flared mouth (42) communicating with the dispersion hole (41) at the top. The flared mouth (42) faces the electrode plate (3) and the dispersion hole (41) faces the hollow ionization cavity (221).
7. The ion source mechanism according to claim 1, characterized in that, The ion source assembly (2) includes two or more sets, and the two or more sets of ion source assemblies (2) are distributed on the mounting base (1). The bottom of the insulating base sleeve (21) on each ion source assembly (2) is connected to a vent plate (5). The vent plate (5) is provided with air passages that are respectively connected to each of the air inlet pipes (222).
8. The ion source mechanism according to claim 7, characterized in that, It also includes a cover plate (6) connected to the bottom of the mounting base (1), the air passage slot is provided at the bottom of the vent plate (5), and the cover plate (6) and the vent plate (5) are closedly connected to form the air passage.
9. The ion source mechanism according to claim 1, characterized in that, The mounting base (1) is provided with a water-cooling channel (11), which is arranged around the annular magnet (25).
10. A passivation device, characterized in that, The present invention includes a passivation furnace body, a furnace cover, and a vacuum pumping mechanism, and an ion source mechanism as described in any one of claims 1-9 disposed within the passivation furnace body. The furnace cover is used to seal the passivation furnace body and to support the battery cells to be passivated. The vacuum pumping mechanism is used to evacuate air from the passivation furnace body. The ion source mechanism is disposed on the passivation furnace body and located below the battery cells on the furnace cover. The injection outlet is directly opposite the passivation surface of the battery cells.