Double-light-path diffraction light splitting processing system

Abstract

The utility model provides a double light path diffraction light splitting processing system, including reflection module, diffraction module and focusing module, the reflection module includes fixed reflection light path and flight light path, the diffraction module includes diffraction beam splitter and processing beam expander, the focusing module includes first reflector, second reflector and focusing module. According to the double-light-path diffraction light splitting processing system, the laser scribing distance can be changed according to a processing drawing, and multi-channel laser scribing can be carried out synchronously. The drawing replacement convenience is improved, and the time and labor cost generated by multiple laser procedures is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to photovoltaic laser processing field especially, relates to laser processing field of perovskite battery. BACKGROUND

[0002] Perovskite battery as a new type of high efficiency battery, it has conversion efficiency high, anti light decay and strong anti pollution ability etc. In the laser processing process preparation route of perovskite battery, there are three laser procedures, respectively P1-P2-P3, need to carry out laser scribing after each plating. According to the laser route of the drawing requirement processed on the overall product, it leads to the overall processing time to be too long, seriously influence the overall preparation time of perovskite thin film battery. Also increase the equipment cost. SUMMARY

[0003] In order to solve the problem in the prior art, the utility model provides a kind of double optical path diffraction light processing system, including reflection module, diffraction module and focusing module, the reflection module includes fixed reflection light path and flight light path, fixed reflection light path and flight light path are two groups of symmetric settings, the reflection module laser spot of laser is acted to diffraction module;The diffraction module includes diffraction beam splitter and processing beam expander, diffraction beam splitter and processing beam expander are two groups of symmetric settings, and processing beam expander is prepared into the proper size of spot with laser spot, wherein laser spot is carried out beam transformation after processing beam expander, as the incident light source of diffraction beam splitter;The focusing module includes first reflector, second reflector and focusing module, and the exit light source of diffraction beam splitter enters first reflector and second reflector, and focusing module focuses laser spot after the reflection of first reflector and second reflector on processing plane.

[0004] As a further improvement of the utility model, the reflection module includes first laser emission source, second laser emission source, first reflection module, second reflection module, third reflection module, fourth reflection module, first flight light path and second flight light path;First laser emission source, second laser emission source as the laser emission source of double optical path, emit processing laser to pass through first reflection module, second reflection module, third reflection module, fourth reflection module, and processing laser again passes through first flight light path and second flight light path to reach diffraction module.

[0005] As a further improvement of the utility model, the diffraction module includes first processing beam expander, second processing beam expander, first diffraction beam splitter, second diffraction beam splitter;First processing beam expander, second processing beam expander collimate and expand after processing laser, and processing laser beam is split into multiple laser beams after passing through first diffraction beam splitter, second diffraction beam splitter.

[0006] As a further improvement of the utility model, still include first fixed mounting plate, second fixed mounting plate, first rotating slide rail and second rotating slide rail, first reflector, second reflector and first diffraction beam splitter, second diffraction beam splitter and corresponding accessories are installed on first fixed mounting plate, second fixed mounting plate, first fixed mounting plate, second fixed mounting plate are fixed on first rotating slide rail, second rotating slide rail.

[0007] As a further improvement of the utility model, the diffraction module and the focusing module can move in the horizontal direction as a whole.

[0008] The utility model has the advantages of:

[0009] The utility model discloses a kind of double optical path diffraction light processing systems, can change laser scribe spacing according to processing drawing, and simultaneously carry out multiple laser scribe.

[0010] The utility model provides a kind of double optical path diffraction light processing systems, can change laser scribe spacing according to processing drawing, and simultaneously carry out multiple laser scribe. BRIEF DESCRIPTION OF DRAWINGS

[0011] In order to more clearly illustrate the technical scheme of the embodiments of the present application and the process advantages, the following will briefly introduce the drawings needed to be used in the embodiments of the present application, it should be understood that the following drawings only show some embodiments of the present application, therefore should not be regarded as the limitation to the scope. In the drawings:

[0012] Figure 1 The utility model provides a kind of double optical path diffraction light basic light path schematic diagram provided by embodiment of the utility model;

[0013] Figure 2 The utility model provides a kind of multiple laser scribe light path adjustment schematic diagram provided by embodiment of the utility model;

[0014] Figure 3 The utility model provides a kind of multiple laser scribe diffraction beam actual spacing adjustment schematic diagram provided by embodiment of the utility model;

[0015] Figure 4 The utility model provides a kind of double optical path diffraction processing product schematic diagram provided by embodiment of the utility model.

[0016] The names of various components in the drawings are as follows:

[0017] The first laser emitting source 100, the second laser emitting source 101, the first reflection module 102, the second reflection module 103, the third reflection module 104, the fourth reflection module 105, the first flight light path 106, the second flight light path 107, the first processing expander 108, the second processing expander 109, the first diffractive beam splitter 110, the second diffractive beam splitter 111, the first reflecting mirror 112, the second reflecting mirror 113, the focusing module 114, the first fixed mounting plate 204, the second fixed mounting plate 205, the first rotating slide rail 206, the second rotating slide rail 207, the vertical interval 300, the horizontal direction interval 301, and the product 400. DETAILED DESCRIPTION

[0018] The utility model will be further described below with reference to the drawings.

[0019] A double light path diffractive light processing system, taking a double light path diffractive light processing system applied to a perovskite battery as an example for illustration. It comprises a reflection module, a diffractive module and a focusing module.

[0020] The reflection module comprises two sets of fixed reflection light paths and a set of flight reflection light paths, wherein the fixed reflection light paths are used to transmit two laser light sources to the flight light paths, and the flight reflection light paths are used to keep the laser energy uniform at each position in movement.

[0021] The diffractive module comprises a processing expander and a processing diffractive beam splitter, wherein the processing laser emitted by each laser is subjected to beam transformation by the processing expander and then serves as an incident light source of the diffractive beam splitter; and the diffractive beam splitter comprises two sets of diffractive beam splitters, which can work separately or in combination.

[0022] The focusing module comprises an expander mirror and a focusing mirror, wherein the expander mirror prepares the processing laser spot into a proper size spot, and the focusing mirror focuses the expanded laser on the processing plane.

[0023] The utility model can change the laser scribe interval according to the demand processing drawing and simultaneously perform multi-channel laser scribing. The convenience of changing the drawing is improved, and the time and labor cost generated by the multi-channel laser process are reduced.

[0024] In order to more clearly illustrate the technical solutions of the patent, the patent will be further described in detail below with reference to the drawings and specific embodiments.

[0025] As Figure 1As shown, 100, 101 as a double light path laser emitting source, emitting processing laser through the reflection module 102, 103, 104, 105, processing laser through the flight light path 106, 107 to the diffraction module, it is illustrated that: the fixed light path is the light path of the fixed position of the lens such as mirror. The flight light path is the light path in which the mirror or module in the light path will move back and forth.

[0026] The processing beam expander 108, 109 collimates and expands the processing laser, and the processing laser beam is split into multiple laser beams after passing through the diffraction beam splitter 110, 111. The multiple laser beams change the beam direction through the mirrors 112, 113, and reach the focusing mirror of the focusing module 114 for laser focusing processing.

[0027] In order to more clearly illustrate that the light path system can be coordinated and debugged according to the actual drawing, Figure 2 the multiple laser scribing light path adjustment schematic diagram, Figure 3 the multiple laser scribing diffraction beam actual spacing adjustment schematic diagram, Figure 4 the double light path diffraction processing product schematic diagram are used for illustration.

[0028] As shown in Figure 2 , the mirrors 112, 113, the diffraction beam splitter 110, 111 and the corresponding accessories are mounted on the fixed mounting plate 204, 205, and the fixed mounting plate 204, 205 is fixed on the rotating slide rail 206, 207. When the laser scribing spacing needs to be adjusted, the angle of the rotating diffraction beam splitter 110, 111 is adjusted, and the corresponding multiple lasers with uniform spacing on the mirror 112, 113 are obtained. However, the overall spacing of the mirror 112, 113 is obviously increased (here, the overall spacing refers to the spacing between the last line of the first mirror 112 and the first line of the second mirror 113. When rotating, the internal spacing of a single mirror changes uniformly, but the spacing between the two mirrors will increase), so the rotating slide rail 206, 207 and the reflection module 104, 105 need to be adjusted according to the actual spacing, because the reflection module 104, 105 needs to be close to obtain the same spacing as the internal spacing of the mirror 112, 113, otherwise there will be a gap, so the reflection module 104, 105 needs to be adjusted. The adjustment requirement is: the verticality and stability of the flight light path 106, 107 can be maintained, as shown in Figure 1 , the verticality here refers to the light path from the third reflection module 104 being perpendicular to the first processing beam expander 108 and the first diffraction beam splitter 110, and the light path from the fourth reflection module 105 being perpendicular to the second processing beam expander 109 and the second diffraction beam splitter 111.

[0029] As shown in Figure 3 , Figure 4As shown, on the reflecting mirrors 112, 113, the diffraction split intervals 300, 301 are actually controlled by the diffraction splitters 110, 111, and the diffraction split interval of the laser is a fixed interval. When the rotation angle of the diffraction splitter 110, 111 changes, the original vertical interval 300 does not change, but the horizontal interval 301 has changed. The rotation angle of the diffraction splitter 110, 111 is in the range of 0-90 degrees, and the larger the rotation angle, the smaller the actual interval 301. For example, Figure 4 As shown, after the adjusted processing laser is focused by the focusing module 114, when it acts on the product 400 (such as a perovskite product), the number of lasers that can be processed simultaneously increases, greatly reducing the processing time of the product in the laser process.

[0030] The vertical interval 300 is the absolute distance between two adjacent beams after splitting. The vertical interval is the interval between adjacent beams in a single diffraction splitter after splitting, regardless of the change in angle. This interval is the fixed interval of the split beams of the diffraction splitter. The horizontal interval 301 is the interval between two adjacent beams after splitting by the rotating diffraction splitter 110, 111, and after reflection by the reflecting mirrors 112, 113, acting on the product 400. In the processing of larger products, Figure 2 The dashed box module can move horizontally (such as left and right) to process larger products.

[0031] In summary, the dual-optical-path diffraction splitting system can perform laser processing with different intervals in real time according to the drawings through adjustment of the diffraction splitter and debugging of the optical path module. The laser processing lines can also be processed in multiple passes simultaneously, improving the efficiency of laser processing in the same time, reducing the time of the product in the laser process, and reducing the operating cost of the equipment, better assisting the smooth production of perovskite thin film batteries.

[0032] The above content is a further detailed description of the present application in combination with specific preferred embodiments, and cannot be considered as limiting the specific implementation of the present application to these descriptions. For ordinary skilled persons in the technical field to which the present application belongs, without departing from the concept of the present application, a number of simple deductions or substitutions can be made, which should be considered as falling within the protection scope of the present application.

Claims

1. A dual light path diffractive light splitting processing system, characterized by: The reflection module includes fixed reflection light paths and flight light paths, which are symmetrically arranged in two groups, and the reflection module acts laser spots of a laser on the diffraction module; the diffraction module includes diffraction beam splitters and processing beam expanders, which are symmetrically arranged in two groups, and the processing beam expanders prepare laser spots into appropriate-sized spots, wherein the laser spots are subjected to beam transformation by the processing beam expanders and serve as incident light sources of the diffraction beam splitters; the focusing module includes a first mirror (112), a second mirror (113), and a focusing module (114), the exit light sources of the diffraction beam splitters enter the first mirror (112) and the second mirror (113), and the focusing module (114) focuses laser spots reflected by the first mirror (112) and the second mirror (113) on a processing plane.

2. A dual light path diffractive light splitting processing system according to claim 1, wherein: The reflection module includes a first laser emission source (100), a second laser emission source (101), a first reflection module (102), a second reflection module (103), a third reflection module (104), a fourth reflection module (105), a first flight light path (106), and a second flight light path (107); the first laser emission source (100) and the second laser emission source (101) serve as a dual-light-path laser emission source, emit processing laser, and pass through the first reflection module (102), the second reflection module (103), the third reflection module (104), and the fourth reflection module (105), and then pass through the first flight light path (106) and the second flight light path (107) to reach the diffraction module.

3. A dual light path diffractive light splitting processing system according to claim 2, wherein: The diffraction module includes a first processing beam expander (108), a second processing beam expander (109), a first diffraction beam splitter (110), and a second diffraction beam splitter (111); after the first processing beam expander (108) and the second processing beam expander (109) collimate and expand the processing laser, the processing laser beam is split into multiple laser beams after passing through the first diffraction beam splitter (110) and the second diffraction beam splitter (111).

4. A dual light path diffractive light splitting system according to claim 1, wherein: The first fixed mounting plate (204), the second fixed mounting plate (205), the first rotating slide rail (206), and the second rotating slide rail (207) are further included; the first mirror (112), the second mirror (113), the first diffraction beam splitter (110), the second diffraction beam splitter (111), and corresponding accessories are mounted on the first fixed mounting plate (204) and the second fixed mounting plate (205), and the first fixed mounting plate (204) and the second fixed mounting plate (205) are fixed on the first rotating slide rail (206) and the second rotating slide rail (207).

5. A dual light path diffractive light splitting system according to claim 1, wherein: The diffraction module and the focusing module as a whole can move in the horizontal direction.

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