Base station and cleaning system

Abstract

The utility model provides a base station and a cleaning system. The base station comprises a base station body and a gas source system arranged on the base station body. The gas source system comprises a gas pumping device for providing a gas source, a sewage tank, a valve assembly and a control device. The sewage tank is used for storing liquid, is communicated with an external liquid source through the liquid pumping pipe to pump in the liquid and is communicated with the outside through the liquid discharging pipe to discharge the liquid. The valve assembly is arranged between the outflow port of the sewage tank and the discharge port of the liquid discharge pipe, and the connection or disconnection between the outflow port and the discharge port is correspondingly controlled by opening or closing the valve assembly. The control device is communicated with the gas pumping device through the gas conveying pipe and communicated with the valve assembly through the first pipeline assembly, the liquid pumping pipe passes through the control device, and the control device is used for controlling connection or disconnection of the liquid pumping pipe and connection or disconnection between the gas conveying pipe and the first pipeline assembly.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to the technical field of cleaning, and more particularly, to a base station and a cleaning system. BACKGROUND

[0002] With the continuous improvement of people's living standards, cleaning equipment is increasingly applied to people's lives. A base station is usually used with the cleaning equipment to provide maintenance work such as charging, cleaning the mop, or discharging sewage for the cleaning equipment. After the cleaning equipment enters the base station to clean the mop or discharge the sewage, the base station needs to treat the sewage discharged therein. The current base station uses hydraulic passive to realize the conduction of the liquid suction passage and the liquid discharge passage. However, due to the complex composition of the liquid source, the passive conduction mode is easy to fail, thereby causing the base station to be unable to normally suction or discharge liquid. SUMMARY

[0003] The present disclosure provides a base station and a cleaning system, at least for solving the problem that passive conduction of the liquid suction passage and the liquid discharge passage causes the base station to be unable to normally suction or discharge liquid.

[0004] The present disclosure provides a base station, which comprises a base station body and a gas source system arranged on the base station body. The gas source system comprises a gas suction device, a sewage tank, a valve assembly, and a control device. The gas suction device is used to provide a gas source. The sewage tank is used to store liquid and is connected to an external liquid source through a liquid suction pipe to suction liquid and is connected to the outside through a liquid discharge pipe to discharge liquid. The valve assembly is arranged between a flow outlet of the sewage tank and a discharge outlet of the liquid discharge pipe, and the conduction or disconnection between the flow outlet and the discharge outlet is controlled by opening or closing the valve assembly. The control device is connected to the gas suction device through a gas conveying pipe, is connected to the valve assembly through a first pipe assembly, and the liquid suction pipe passes through the control device. The control device is used to control the conduction or disconnection of the liquid suction pipe and the conduction or disconnection between the gas conveying pipe and the first pipe assembly. When the control device is in a pre-liquid suction state, the control device controls the conduction of the gas conveying pipe and the first pipe assembly, and the gas suction device provides positive pressure gas to the valve assembly through the gas conveying pipe, the control device, and the first pipe assembly, so that the valve assembly is closed to disconnect the flow outlet and the discharge outlet. When the control device is in a pre-liquid discharge state, the control device controls the conduction of the gas conveying pipe and the first pipe assembly, and the gas suction device provides negative pressure gas to the valve assembly through the gas conveying pipe, the control device, and the first pipe assembly, so that the valve assembly is opened to conduct the flow outlet and the discharge outlet.

[0005] In some embodiments, the control device is further in communication with the sewage tank through a second pipeline assembly and is configured to control the connection or disconnection between the gas delivery pipe and the second pipeline assembly. When the control device is in the formal liquid pumping state, the control device controls the connection of the liquid pumping pipe and the connection of the gas delivery pipe and the second pipeline assembly, and the liquid pumping pipe, the sewage tank, the second pipeline assembly, the control device, the gas delivery pipe and the gas pumping device together form a liquid pumping path, and the gas pumping device provides the negative pressure gas to the liquid pumping path to make the sewage tank pump in liquid through the liquid pumping pipe; when the control device is in the formal liquid discharging state, the control device controls the connection of the gas delivery pipe and the second pipeline assembly, and the gas pumping device, the gas delivery pipe, the control device, the second pipeline assembly, the sewage tank, the valve assembly and the liquid discharging pipe together form a liquid discharging path, and the gas pumping device provides the positive pressure gas to the liquid discharging path to make the sewage tank discharge liquid to the outside through the liquid discharging pipe.

[0006] In some embodiments, the control device is further in communication with the atmosphere through a third pipeline assembly and is configured to control the connection or disconnection between the gas delivery pipe and the third pipeline assembly; when the control device is in the formal liquid discharging state, the control device controls the connection of the gas delivery pipe and the third pipeline assembly, and the third pipeline assembly, the control device, the gas delivery pipe and the gas pumping device together form a balance path, and the gas pumping device provides the negative pressure gas to the balance path to suck external gas.

[0007] In some embodiments, the control device is further in communication with the clean water box of the cleaning device through a fourth pipeline assembly and is configured to control the connection or disconnection between the gas delivery pipe and the fourth pipeline assembly; when the control device is in the formal liquid pumping state, the control device controls the connection of the gas delivery pipe and the fourth pipeline assembly, and the gas pumping device, the gas delivery pipe, the control device and the fourth pipeline assembly together form a gas charging path, and the gas pumping device provides the positive pressure gas to the gas charging path to deliver to the clean water box.

[0008] In some embodiments, after the control device switches from the pre-liquid pumping state to the formal liquid pumping state or switches from the pre-liquid discharging state to the formal liquid discharging state, the control device controls the disconnection of the gas delivery pipe and the first pipeline assembly.

[0009] In some embodiments, when the control device is in the zero state, the control device controls the connection of the liquid pumping pipe, the connection of the gas delivery pipe and the first pipeline assembly, the second pipeline assembly, the third pipeline assembly and the fourth pipeline assembly;

[0010] In response to the liquid pumping instruction, the gas pumping device works, the control device switches from the zero position state to the pre-liquid pumping state, and then switches from the pre-liquid pumping state to the formal liquid pumping state; in the case that the liquid level in the sewage tank reaches the preset liquid level, the gas pumping device stops working, and the control device switches from the formal liquid pumping state to the zero position state; or,

[0011] In response to the liquid pumping instruction, the gas pumping device works, the control device switches from the zero position state to the pre-liquid pumping state, and then switches from the pre-liquid pumping state to the formal liquid pumping state; in the case that the liquid level in the sewage tank reaches the preset liquid level, the gas pumping device stops working, and the control device switches from the formal liquid pumping state to the zero position state; or,

[0012] In some embodiments, the control device comprises a body, a gas transmission pipe arranged on the body, a gas path pipe and a control switch assembly. The gas transmission pipe is in communication with the gas pumping device through the gas delivery pipe, the gas path pipe is in communication with the gas delivery pipe through the gas transmission pipe, the gas path pipe comprises a valve closing gas path, a valve opening gas path, a liquid pumping gas path, a liquid discharging gas path, a balance gas path and a gas inflating gas path, the valve closing gas path and the valve opening gas path are in communication with the valve assembly through the first pipe assembly, the liquid pumping gas path and the liquid discharging gas path are in communication with the sewage tank through the second pipe assembly, the balance gas path is in communication with the external atmosphere through the third pipe assembly, and the gas inflating gas path is in communication with the clean water box of the cleaning equipment through the fourth pipe assembly. The control switch assembly controls the opening or closing of the valve assembly by controlling the opening or closing of the valve closing gas path and the valve opening gas path, controls the pumping or discharging of the liquid by the sewage tank by controlling the opening or closing of the liquid pumping gas path, the liquid discharging gas path, the liquid pumping pipe and the balance gas path, and controls the input or non-input of the positive pressure gas into the clean water box by controlling the opening or closing of the gas inflating gas path. When the sewage tank pumps in liquid, the control device is in the formal liquid pumping state, the valve assembly is closed to disconnect the flow outlet and the discharge outlet, the control switch assembly closes the valve closing gas path, the valve opening gas path, the liquid discharging gas path and the balance gas path, and opens the liquid pumping gas path, the gas inflating gas path and the liquid pumping pipe, the gas pumping device works, and the gas in the sewage tank is pumped out through the gas delivery pipe, the gas transmission pipe and the liquid pumping gas path, so that the liquid of the external liquid source enters the sewage tank under the action of negative pressure. When the sewage tank discharges liquid, the control device is in the formal liquid discharging state, the valve assembly is opened to connect the flow outlet and the discharge outlet, the control switch assembly closes the liquid pumping gas path, the gas inflating gas path and the liquid pumping pipe, and opens the liquid discharging gas path and the balance gas path, the gas pumping device works, and the gas is delivered into the sewage tank through the gas delivery pipe, the gas transmission pipe and the liquid discharging gas path, so that the liquid in the sewage tank is discharged to the outside of the gas source system under the action of positive pressure.

[0013] In some embodiments, the first pipe assembly comprises a first pipe and a first three-way pipe. One end of the first pipe is in communication with the valve assembly. The first three-way pipe is provided with a first flow passage, a second flow passage and a third flow passage in communication with each other, the first flow passage is in communication with the other end of the first pipe, and the second flow passage and the third flow passage are in communication with the valve closing gas path and the valve opening gas path respectively.

[0014] In some embodiments, the second pipe assembly comprises a second pipe and a second tee. One end of the second pipe is in communication with the sewage tank. The second tee is provided with a first communication port, a second communication port and a third communication port in communication with each other, the first communication port is in communication with the other end of the second pipe, and the second communication port and the third communication port are in communication with the liquid suction gas path and the liquid discharge gas path, respectively.

[0015] In some embodiments, the third pipe assembly comprises a third pipe, one end of which is in communication with the external atmosphere, and the other end of which is in communication with the balance gas path.

[0016] In some embodiments, the third pipe assembly comprises a third pipe and a first tee. One end of the third pipe is in communication with the external atmosphere. The two open ends of the first tee are in communication with the other end of the third pipe and the balance gas path, respectively.

[0017] In some embodiments, the fourth pipe assembly comprises a fourth pipe, one end of which is in communication with the clean water tank, and the other end of which is in communication with the inflation gas path.

[0018] In some embodiments, the fourth pipe assembly comprises a fourth pipe and a second tee. One end of the fourth pipe is in communication with the clean water tank. The two open ends of the second tee are in communication with the other end of the fourth pipe and the inflation gas path, respectively.

[0019] In some embodiments, at least part of the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path and the inflation gas path is flexible.

[0020] In some embodiments, the control switch assembly closes the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path or the inflation gas path in a manner comprising at least one of the following manners:

[0021] Squeezing the flexible part of the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path or the inflation gas path;

[0022] Bending the flexible part of the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path or the inflation gas path;

[0023] Clamping the flexible part of the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path or the inflation gas path.

[0024] In some embodiments, the gas delivery pipe includes a first gas delivery pipe and a second gas delivery pipe, one end of the first gas delivery pipe is in communication with the first gas source port of the gas pumping device, one end of the second gas delivery pipe is in communication with the second gas source port of the gas pumping device, the gas delivery pipe includes a first four-way pipe and a second four-way pipe, one interface of the first four-way pipe is in communication with the other end of the first gas delivery pipe, the remaining three interfaces of the first four-way pipe are in communication with the valve closing gas path, the liquid discharging gas path and the inflating gas path respectively, one interface of the second four-way pipe is in communication with the other end of the second gas delivery pipe, the remaining three interfaces of the second four-way pipe are in communication with the valve opening gas path, the liquid pumping gas path and the balancing gas path respectively.

[0025] In some embodiments, the control switch assembly includes a pressing member and a driving module, the output end of the driving module is connected to the pressing member, and the driving module is used to drive the pressing member to move, so as to switch the control device between the zero position state, the pre-liquid pumping state, the formal liquid pumping state, the pre-liquid discharging state, the formal liquid discharging state. When the control device is in the zero position state, the pressing member opens the liquid pumping pipe, the valve closing gas path, the valve opening gas path, the liquid pumping gas path, the liquid discharging gas path, the balancing gas path and the inflating gas path.

[0026] When the control device is in the pre-liquid pumping state, the pressing member opens the liquid pumping pipe, the valve closing gas path and the liquid pumping gas path, and closes the valve opening gas path, the liquid discharging gas path, the balancing gas path and the inflating gas path.

[0027] When the control device is in the pre-liquid discharging state, the pressing member opens the valve opening gas path and the liquid discharging gas path, and closes the liquid pumping pipe, the valve closing gas path, the liquid pumping gas path, the balancing gas path and the inflating gas path.

[0028] When the control device is in the formal liquid pumping state, the pressing member opens the liquid pumping pipe, the liquid pumping gas path and the inflating gas path, and closes the valve opening gas path, the valve closing gas path, the liquid discharging gas path and the balancing gas path.

[0029] When the control device is in the formal liquid discharging state, the pressing member opens the liquid discharging gas path and the balancing gas path, and closes the valve closing gas path, the liquid pumping pipe, the valve opening gas path, the liquid pumping gas path and the inflating gas path.

[0030] In some embodiments, the driving module drives the pressing member to move in at least one of the following ways:

[0031] The driving module is configured to drive the pressing member to rotate, so as to correspondingly squeeze at least one of the liquid suction pipe, the valve opening gas path, the valve closing gas path, the liquid suction gas path, the liquid discharge gas path, the air inflation gas path and the balance gas path when the control device is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state.

[0032] The driving module is configured to drive the pressing member to move, so as to correspondingly bend at least one of the liquid suction pipe, the valve opening gas path, the valve closing gas path, the liquid suction gas path, the liquid discharge gas path, the air inflation gas path and the balance gas path when the control device is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state.

[0033] The driving module is configured to drive the pressing member to open and close, so as to correspondingly clamp at least one of the liquid suction pipe, the valve opening gas path, the valve closing gas path, the liquid suction gas path, the liquid discharge gas path, the air inflation gas path and the balance gas path when the control device is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state.

[0034] In some embodiments, the pressing member includes a plurality of pressing members arranged along a first direction; in the control device, the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path and the air inflation gas path are arranged along a second direction and located at the periphery of the pressing member; wherein the second direction is different from the first direction, and the driving module drives the pressing member to rotate.

[0035] In some embodiments, the control switch assembly further includes a rotating shaft, the pressing member is arranged on the rotating shaft, the rotating shaft is arranged along the first direction and connected with the driving module, the driving module drives the rotating shaft to rotate to drive the pressing member to rotate; the number of the pressing members is at least four, and the at least four pressing members are arranged at intervals on the rotating shaft, so as to correspondingly clamp at least one of the liquid suction pipe, the valve opening gas path, the valve closing gas path, the liquid suction gas path, the liquid discharge gas path, the air inflation gas path and the balance gas path when the control device is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state.

[0036] In some embodiments, the control switch assembly further comprises a rotating shaft, the pressing members are arranged on the rotating shaft, the rotating shaft is arranged along the first direction and is connected with the driving module, the driving module drives the rotating shaft to rotate to drive the pressing members to rotate; in a third direction perpendicular to the first direction and the second direction, the rotating shaft comprises opposite first and second sides, the valve closing gas path, the liquid discharging gas path and the gas inflating path are located on the first side of the rotating shaft, and the valve opening gas path, the liquid pumping gas path and the balance gas path are located on the second side of the rotating shaft; the number of the pressing members is at least four, and the at least four pressing members are arranged at intervals on the rotating shaft to form at least four avoiding spaces between the rotating shaft and the body, when the liquid pumping pipe, the valve closing gas path, the valve opening gas path, the liquid pumping gas path, the liquid discharging gas path, the balance gas path and the gas inflating path are located in the avoiding spaces by rotating the pressing members, the liquid pumping pipe, the valve closing gas path, the valve opening gas path, the liquid pumping gas path, the liquid discharging gas path, the balance gas path or the gas inflating path in the avoiding spaces are correspondingly opened.

[0037] In some embodiments, the body is internally formed with an inner cavity, and the pressing members are located in the inner cavity; an outer wall of the body is provided with a mounting hole communicating with the inner cavity, and the liquid pumping pipe and each gas path pipe pass through the mounting hole and penetrate through the inner cavity.

[0038] In some embodiments, the control switch assembly further comprises a rotating shaft position detector, and the position detector is used to detect the rotating direction of the pressing members.

[0039] In some embodiments, the control switch assembly further comprises a rotating shaft and a position detector, the pressing members are arranged on the rotating shaft; the driving module comprises a driving motor and a speed reduction structure, the driving motor is arranged on the body or the base body; a part of the speed reduction structure is in transmission connection with the output end of the driving motor, and another part is in transmission connection with the rotating shaft to drive the rotating shaft to rotate, thereby driving the pressing members to rotate; and the position detector is used to detect the rotating direction of the pressing members.

[0040] In some embodiments, the valve assembly comprises a bracket and a valve body. One end of the bracket is connected to the outlet of the sewage tank, and the other end is connected to the outlet of the liquid discharge pipe. The bracket has a cavity inside, and the side wall of the bracket has a vent. The valve body is accommodated in the cavity, and the side wall of the valve body and the inner wall of the bracket form a regulating cavity. The vent is in communication with the regulating cavity, and the internal space of the valve body is separated from the regulating cavity by the side wall of the valve body and is in communication with the outlet and the outlet. The gas pumping device provides the positive pressure gas to the regulating cavity through the gas supply pipe, the control device and the first pipeline assembly through the vent to close the valve assembly; the gas pumping device provides the negative pressure gas to the regulating cavity through the gas supply pipe, the control device and the first pipeline assembly through the vent to open the valve assembly.

[0041] In some embodiments, the base station body is further provided with a cleaning tank in communication with the liquid pumping pipe. The cleaning tank is used to accommodate and clean the cleaning part of the cleaning device. When the cleaning device enters the parking position of the base station and starts to execute the process of cleaning the cleaning part, water is injected into the cleaning tank and / or on the cleaning part to clean the cleaning part. When the base station is in the liquid pumping state, the liquid after cleaning the cleaning part enters the sewage tank through the liquid pumping pipe. When the base station is in the liquid discharge state, the liquid in the sewage tank is discharged to the outside through the liquid discharge pipe.

[0042] The present disclosure also provides a base station, which comprises a base station body and a gas source system arranged on the base station body. The gas source system comprises a gas pumping device, a sewage tank, a valve assembly and a control device. The gas pumping device is used to provide a gas source. The sewage tank is used to store liquid and is connected to a water source through a liquid suction pipe to suck in liquid and is connected to the outside through a liquid discharge pipe to discharge liquid. The valve assembly is arranged between the flow outlet of the sewage tank and the discharge outlet of the liquid discharge pipe, and by opening or closing the valve assembly, the conduction or disconnection between the flow outlet and the discharge outlet is correspondingly controlled. The control device is connected to the gas pumping device through a gas conveying pipe, connected to the sewage tank through a second pipe assembly, connected to a clean water box of a cleaning device through a fourth pipe assembly, and is used to control the conduction or disconnection of the liquid suction pipe, the conduction or disconnection between the gas conveying pipe and the second pipe assembly, and the conduction or disconnection between the gas conveying pipe and the fourth pipe assembly. When the control device is in a formal liquid suction state, the control device controls the conduction of the liquid suction pipe and the conduction of the gas conveying pipe and the second pipe assembly, the liquid suction pipe, the sewage tank, the second pipe assembly, the control device, the gas conveying pipe and the gas pumping device jointly form a liquid suction path, the gas pumping device provides negative pressure gas to the liquid suction path to make the sewage tank suck in liquid through the liquid suction pipe, the control device controls the conduction of the gas conveying pipe and the fourth pipe assembly, and the gas pumping device provides positive pressure gas to the clean water box through the gas conveying pipe, the control device and the fourth pipe assembly; when the control device is in a formal liquid discharge state, the control device controls the conduction of the gas conveying pipe and the second pipe assembly, and the gas pumping device, the gas conveying pipe, the control device, the second pipe assembly, the sewage tank, the valve assembly and the liquid discharge pipe jointly form a liquid discharge path, the gas pumping device provides positive pressure gas to the liquid discharge path to make the sewage tank discharge liquid to the outside through the liquid discharge pipe.

[0043] The present disclosure also provides a cleaning system including a cleaning device and a base station, wherein the cleaning device is movable into the base station for maintenance. The base station includes a base station body and a gas source system arranged on the base station body. The gas source system includes a gas pumping device, a sewage tank, a valve assembly and a control device. The gas pumping device is used to provide a gas source. The sewage tank is used to store liquid and is connected to an external liquid source through a liquid suction pipe to suck liquid and is connected to an external liquid discharge pipe to discharge liquid. The valve assembly is arranged between a flow outlet of the sewage tank and a discharge outlet of the liquid discharge pipe, and the valve assembly is opened or closed to correspondingly control the connection or disconnection between the flow outlet and the discharge outlet. The control device is connected to the gas pumping device through a gas supply pipe, is connected to the valve assembly through a first pipe assembly, and the liquid suction pipe passes through the control device. The control device is used to control the connection or disconnection of the liquid suction pipe and the connection or disconnection between the gas supply pipe and the first pipe assembly. When the control device is in a pre-liquid suction state, the control device controls the connection between the gas supply pipe and the first pipe assembly, and the gas pumping device provides positive pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipe assembly, so that the valve assembly is closed to disconnect the flow outlet and the discharge outlet. When the control device is in a pre-liquid discharge state, the control device controls the connection between the gas supply pipe and the first pipe assembly, and the gas pumping device provides negative pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipe assembly, so that the valve assembly is opened to connect the flow outlet and the discharge outlet.

[0044] The base station and the cleaning system of the present disclosure utilize the control device to control the connection between the gas supply pipe and the first pipe assembly, and then utilize the gas pumping device to provide positive pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipe assembly, so that the valve assembly disconnects the connection between the flow outlet and the discharge outlet, and actively prepares for the connection of the liquid suction path. The control device is also used to control the connection between the gas supply pipe and the first pipe assembly, and then the gas pumping device is used to provide negative pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipe assembly, so that the valve assembly connects the connection between the flow outlet and the discharge outlet, and actively prepares for the connection of the liquid discharge path. This can reduce the risk of valve assembly blockage, improve the service life, reduce the maintenance frequency of the user, and improve the user experience. At the same time, the same gas pumping device and the same control device can be used to control the connection or disconnection of the liquid suction path and the liquid discharge path, and then control the liquid suction or liquid discharge of the sewage tank. This realizes the integration of the control of multiple components into one control device, and one gas source can realize multiple functions, effectively reduces the cost, makes the overall structure of the base station or the cleaning system more compact and simple and reliable, and thus improves the service life and functional reliability of the base station or the cleaning system.

[0045] Additional aspects and advantages of the present disclosure will be in part apparent and in part pointed out hereinafter. BRIEF DESCRIPTION OF DRAWINGS

[0046] The above and / or additional aspects and advantages of the present disclosure will become apparent and be readily appreciated from the following description, including the references to the figures, in which:

[0047] Figure 1 is a perspective schematic view of a cleaning system according to certain embodiments of the present disclosure;

[0048] Figure 2 is a perspective schematic view of a cleaning system according to certain embodiments of the present disclosure; Figure 1 is a structural schematic view of one embodiment of the cleaning system shown;

[0049] Figure 3 is a structural schematic view of another embodiment of the cleaning system shown; Figure 1

[0050] Figure 4 is a partial perspective schematic view of a cleaning system according to certain embodiments of the present disclosure;

[0051] Figure 5 is a perspective schematic view of a base of a base station in the cleaning system shown; Figure 4

[0052] is a perspective schematic view of a portion of the structure of a base station in the cleaning system shown from one perspective; Figure 6 Figure 4 is a perspective schematic view of a portion of the structure of a base station in the cleaning system shown from another perspective;

[0053] Figure 7 Figure 4 is a perspective schematic view of a portion of the structure of a base station in the cleaning system shown from yet another perspective;

[0054] Figure 8 is a perspective schematic view of a portion of the structure of a base station in the cleaning system shown from yet another perspective; Figure 4

[0055] is a plan schematic view of a portion of the structure of a base station in the cleaning system shown; Figure 9 Figure 8 is a perspective assembly schematic view of a control device in the base station shown;

[0056] Figure 10 Figure 7 is a partial perspective exploded schematic view of the control device shown from one perspective;

[0057] Figure 11 is a partial perspective exploded schematic view of the control device shown from one perspective; Figure 10

[0058] Figure 12 ​​​​​​is Figure 10 partially exploded schematic view of the control device from another perspective;

[0059] Figure 13 is Figure 7 schematic plan view of the drain pipe in the base station;

[0060] Figure 14 is Figure 13 schematic cross-sectional view of the drain pipe;

[0061] Figure 15 schematic view of the base station in the pre-drainage state in the cleaning system according to some embodiments of the present disclosure;

[0062] Figure 16 schematic view of the base station in the formal drainage state in the cleaning system according to some embodiments of the present disclosure;

[0063] Figure 17 schematic view of the base station in the pre-drainage state in the cleaning system according to some embodiments of the present disclosure;

[0064] Figure 18 schematic view of the base station in the formal drainage state in the cleaning system according to some embodiments of the present disclosure;

[0065] Figure 19 is a working scene diagram of the cleaning system provided by the embodiments of the present disclosure.

[0066] Explanation of main element symbols:

[0067] Cleaning system 1000;

[0068] Cleaning device 100; housing 21; cleaning element 22; clean water box 23; liquid supplement port 231; second liquid outlet port 235; sewage box 24; communication port 243; recovery element 251; control valve 25183; device control panel 50; one-way self-locking valve 105;

[0069] Base station 200; water outlet 201; base station body 60; base 61; docking interface 63; top 64; side wall 65; opening 67; cleaning tank 610; liquid containing area 611; liquid supply system 70; gas source system 80; sewage tank 81; liquid suction port 811; flow-through port 813; flow outlet 815; gas suction device 82; first gas source port 821; second gas source port 823; control device 83; body 830; inner cavity 8300; first mounting hole 8301; second mounting hole 8302; third mounting hole 8303; fourth mounting hole 8304; fifth mounting hole 8305; sixth mounting hole 8306; seventh mounting hole 8307; base 8308; upper cover 8309; first side wall 8310; second side wall 8312; third side wall 8314; fourth side wall 8315; air transmission pipe 831; first four-way pipe 8311; second four-way pipe 8313; gas path pipe 833; valve-closing gas path 8331; valve-opening gas path 8332; liquid suction gas path 8333; liquid discharge gas path 8334; balance gas path 8335; gas inflation gas path 8336; control switch assembly 835; pressure applying piece 8351; drive module 8353; drive motor 83531; speed reduction structure 83530; worm 83532; worm wheel 83533; first gear wheel 83534; second gear wheel 83535; third gear wheel 83536; rotating shaft 8355; first side 83551; second side 83553; avoidance space 8350; position detector 8357; gas transmission pipe 84; first gas transmission pipe 841; second gas transmission pipe 843; liquid suction pipe 85; first opening 851; second opening 853; liquid discharge pipe 86; discharge inlet 861; discharge outlet 863; pipe assembly 87; first pipe assembly 871; first pipe 8711; first three-way pipe 8713; first flow-through port 87131; second flow-through port 87133; third flow-through port 87135; second pipe assembly 873; second pipe 8731; second three-way pipe 8733; first communication port 87331; second communication port 87333; third communication port 87335; third pipe assembly 875; third pipe 8751; first two-way pipe 8753; fourth pipe assembly 877; fourth pipe 8771; second two-way pipe 8773; valve assembly 88; bracket 881; cavity 8811; air vent 8813; adjustment cavity 880; valve body 883; inner space 8830; base station control panel 90. DETAILED DESCRIPTION

[0070] In order to make the above objectives, features and advantages of the present disclosure more obvious and easy to understand, the specific embodiments of the present disclosure will be described in detail below with reference to the drawings. In the following description, a large number of specific details are set forth in order to facilitate a thorough understanding of the present disclosure. However, the present disclosure can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present disclosure, so the present disclosure is not limited by the specific embodiments disclosed below.

[0071] In the description of the present disclosure, it needs to be understood that the orientation or positional relationship indicated by the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like is based on the orientation or positional relationship shown in the drawings, and is only for the purpose of facilitating the description of the present disclosure and simplifying the description, and does not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation of the present disclosure.

[0072] In addition, the terms "first", "second" are only for descriptive purpose, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include at least one of the features. In the description of the present disclosure, the meaning of "a plurality of" is at least two, such as two, three, etc., unless otherwise explicitly specified and limited.

[0073] In the present disclosure, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting", "fixing" and the like should be understood in a broad sense, for example, it can be fixed connection, or detachable connection, or integral; it can be mechanical connection, or electrical connection; it can be direct connection, or indirect connection through intermediate medium; it can be the internal communication of two elements or the interaction relationship between two elements, unless otherwise explicitly limited. For those skilled in the art, the specific meaning of the above terms in the present disclosure can be understood according to the specific circumstances.

[0074] In the present disclosure, unless otherwise explicitly specified and limited, the first feature "on" or "under" the second feature can be that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature "above", "over" and "on" the second feature can be that the first feature is directly above or obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The first feature "below", "under" and "under" the second feature can be that the first feature is directly below or obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0075] It is to be noted that when an element is referred to as being "fixed" or "set" on another element, it can be directly on the other element or there can be an intervening element. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or there can be an intervening element. The terms "vertical", "horizontal", "upper", "lower", "left", "right", and similar expressions used herein are for illustrative purposes only and are not meant to be limiting.

[0076] With the continuous improvement of people's living standards, cleaning devices are increasingly applied to people's lives. A base station is usually used with a cleaning device to provide maintenance work such as charging, cleaning a mop, or discharging sewage for the cleaning device. After the cleaning device enters the base station to clean the mop or discharge the sewage, the base station needs to treat the sewage discharged therein by the cleaning device. The current base station uses hydraulic passive to realize the conduction of the liquid pumping path and the liquid discharging path. However, due to the complex composition of the liquid source, the passive conduction mode is easy to fail, thereby causing the base station to be unable to normally pump or discharge liquid. In order to solve this problem, the gas source system 80 of the base station 200 (as shown in Figure 2 and Figure 3 ) and the cleaning system 1000 (as shown in Figures 1 to 3 ) and the cleaning system 1000 (as shown in Figures 1 to 3 ) are provided.

[0077] Referring to Figures 1 to 3 , the cleaning system 1000 of the embodiment of the present disclosure includes a cleaning device 100 and a base station 200. The cleaning device 100 can be moved into the base station 200 for maintenance.

[0078] Referring to Figure 4 , the cleaning device 100 is a device for cleaning a surface to be cleaned. For example, the cleaning device 100 can include a sweeping robot, a mopping robot, and a sweeping and mopping integrated robot, etc. The sweeping robot can be used to clean the surface to be cleaned, the mopping robot can be used to wipe and clean the surface to be cleaned, and the sweeping and mopping integrated robot can integrate the functions of the above two robots, i.e., the sweeping and mopping integrated robot can be used to clean the surface to be cleaned, and the sweeping and mopping integrated robot can also be used to wipe and clean the surface to be cleaned. The cleaning device 100 of the present disclosure is taken as an example of a sweeping and mopping integrated robot. The surface to be cleaned includes but is not limited to a floor, a tile, a marble surface, a carpet, or a glass surface, etc. The present disclosure takes the floor as an example of the surface to be cleaned. The cleaning device 100 includes a clean water box 23. The clean water box 23 is used to store liquid.

[0079] The base station 200 of the present disclosure will be described in detail below with reference to the accompanying drawings. It should be noted that the base station 200 of the present disclosure is applicable to any kind of cleaning device, including but not limited to the cleaning device 100 of the present disclosure. Figure 2 or Figure 3The cleaning device 100 shown only needs to include the clean water box 23.

[0080] Please refer to Figures 1 to 3 The base station 200 includes a base station body 60 and an air supply system 80. The air supply system 80 is arranged on the base station body 60 and is used to provide an air source for the cleaning device 100.

[0081] The base station body 60 is a component for loading other elements on the base station 200 except the base station body 60. The base station body 60 generally includes a base 61, a top 64 and a side wall 65, and the three components form a semi-enclosed structure, and the opening 67 of the semi-enclosed structure is used for the cleaning device 100 to enter and exit. The base 61 can be used to receive sewage discharged from the cleaning device 100 and liquid generated by the liquid supply system 70 of the base station 200. Specifically, please refer to Figure 4 and Figure 5 The base 61 is provided with a cleaning tank 610. The cleaning tank 610 can be a groove formed on the base 61 and is used to accommodate and clean the cleaning element 22 of the cleaning device 100 returned to the base station 200. The cleaning tank 610 has a liquid containing area 611, which is used to at least accommodate sewage discharged from the cleaning device 100, sewage flowing into the cleaning device 100 when the liquid supply system 70 of the base station 200 supplies liquid to clean the cleaning element 22, and sewage formed by self-cleaning of the liquid supply system 70. The base 61 is also provided with a docking port 63, which is used to dock and communicate with the cleaning device 100. Specifically, the docking port 63 docks and communicates with the liquid supplement port 231 of the clean water box 23 of the cleaning device 100. In some embodiments, the docking port 63 directly docks and connects with the liquid supplement port 231, and a one-way self-locking valve 105 is arranged at the docking port 63 or the liquid supplement port 231. In other embodiments, the docking port 63 indirectly docks and connects with the liquid supplement port 231 through a pipeline, and a one-way self-locking valve 105 is arranged at the docking port 63, the liquid supplement port 231 or the pipeline. In the case that the docking port 63 and the liquid supplement port 231 are docked or not docked, and the one-way self-locking valve 105 is closed, the docking port 63 and the liquid supplement port 231 are not communicated; in the case that the docking port 63 and the liquid supplement port 231 are docked, and the one-way self-locking valve 105 is opened, the docking port 63 and the liquid supplement port 231 are communicated.

[0082] In addition, the number of the interface 63 and the number of the liquid supplementing port 231 can be arbitrary as long as the two can form the connection to enable the base station 200 to provide the cleaning device 100 with the gas, the liquid, or the gas-liquid mixture (gas bubble liquid) through the connection of the interface 63 and the liquid supplementing port 231. In the cleaning system 100 of the present disclosure, the interface 63 is one, and the liquid supplementing port 231 is also one. In this way, the base station 200 and the cleaning device 100 can realize the provision of the liquid, the gas, or the gas-liquid mixture by the base station 200 to the cleaning device 100 through the connection of the one interface 63 and the one liquid supplementing port 231, so that the cleaning device 100 is in at least one of the sewage discharging state, the liquid supplementing state, the cleaning element 22 cleaning state, and the preliminary sewage tank 24 cleaning state. Only one connection accuracy between the interface 63 and the liquid supplementing port 231 needs to be considered, which greatly reduces the connection difficulty, has high connection accuracy, avoids waste caused by improper connection, ensures sufficient liquid supplementing, and also ensures that the sewage can be discharged according to the predetermined path and will not leak to the base 61 of the base station 200, thereby avoiding additional cleaning work.

[0083] The gas source system 80 is a system on the base station 200 at least for providing the cleaning device 100 with the gas, providing the base station 200 with the gas to enable the liquid in the liquid containing area 611 of the cleaning tank 610 to be extracted and stored (liquid extraction), and enabling the stored liquid to be discharged to the outside of the base station 200 (liquid discharge).

[0084] Specifically, referring to Figure 2 , Figure 3 , Figure 6 , Figure 7 , the gas source system 80 includes a sewage tank 81, a gas pumping device 82, a control device 83, a gas conveying pipe 84, a liquid extracting pipe 85, a liquid discharging pipe 86, a pipeline assembly 87, and a valve assembly 88, which are arranged on the base station body 60. The sewage tank 81 is used to store the liquid and is connected to the outside liquid source through the liquid extracting pipe 85 to extract the liquid and is connected to the outside through the liquid discharging pipe 86 to discharge the liquid. The gas pumping device 82 is used to provide the gas source. The valve assembly 88 is arranged between the flow outlet 815 of the sewage tank 81 and the discharge outlet 863 of the liquid discharging pipe 86, and the valve assembly 88 is opened or closed to correspondingly control the conduction or disconnection between the flow outlet 815 and the discharge outlet 863. The pipeline assembly 87 includes a first pipeline assembly 871. The control device 83 is connected to the gas pumping device 82 through the gas conveying pipe 84 and is connected to the valve assembly 88 through the first pipeline assembly 871. The liquid extracting pipe 85 passes through the control device 83, and the control device 83 is used to control the conduction or disconnection of the liquid extracting pipe 85 and the conduction or disconnection between the gas conveying pipe 84 and the first pipeline assembly 871.

[0085] The sewage tank 81 is a container for loading or storing liquid in the base station 200. It should be noted that the naming of the sewage tank 81 does not constitute a limitation on the type of liquid therein, i.e., the liquid in the sewage tank 81 is not limited to storing sewage, but can store various properties of liquid, such as clean water, sewage, treatment liquid (including but not limited to maintenance liquid and cleaning liquid), etc. In this disclosure, the sewage tank 81 can be used to recover and store the sewage in the liquid containing area 611. Here, "sewage" is a relative concept, and only water (or a mixture of water and dirt) that is dirtier than the clean water recognized by the user is within the scope of protection. The sewage tank 81 can be of any form, for example, the cross-sectional shape of the sewage tank 81 can be regular or irregular. In this document, the cross-sectional shape of the sewage tank 81 is irregular. The design of the irregular cross-section can adapt to the structural layout of the base station 200, facilitating the compact arrangement of other components.

[0086] The sewage tank 81 is provided with a liquid suction port 811, a flow port 813 and a flow outlet 815. The shape and size of the liquid suction port 811, the flow port 813 and the flow outlet 815 can be arbitrarily set, and the disclosure does not make any limitation. In some embodiments, the setting height of the flow outlet 815 on the sewage tank 81 is lower than the setting height of the liquid suction port 811 on the sewage tank 81, and the setting height of the liquid suction port 811 on the sewage tank 81 is lower than the setting height of the flow port 813 on the sewage tank 81. Specifically, the sewage tank 81 has a height dividing line (a line passing through the height point and perpendicular to the height direction Z), and the liquid suction port 811 and the flow port 813 are both located above the height dividing line, and the flow outlet 815 is located below the height dividing line. In one example, the flow outlet 815 is located at or near the bottom of the sewage tank 81, and the liquid suction port 811 and the flow port 813 are located at or near the top of the sewage tank 81.

[0087] The gas pumping device 82 is a device for providing a gas source, including but not limited to a gas pump. In this embodiment, the gas pumping device 82 can provide a first gas source and a second gas source. The first gas source can be a positive pressure gas source, i.e., the gas pumping device 82 can discharge gas outward to provide positive pressure gas. The second gas source can be a negative pressure gas source, i.e., the gas pumping device 82 can suck gas inward to provide negative pressure. When the gas pumping device 82 provides a positive pressure gas source and a negative pressure gas source, the gas flow directions are opposite. Of course, in other embodiments, the first gas source can be a negative pressure gas source, and the second gas source can be a positive pressure gas source. This disclosure only takes the first gas source as a positive pressure gas source and the second gas source as a negative pressure gas source as an example for illustration. In one example, the gas pumping device 82 includes a first gas source port 821 and a second gas source port 823. The first gas source port 821 is used to provide the first gas source, i.e., to provide positive pressure gas. The second gas source port 823 is used to provide the second gas source, i.e., to provide negative pressure gas or to suck negative pressure.

[0088] The gas delivery pipe 84 is a pipe for connecting the gas pumping device 82 and the control device 83. In one example, the gas delivery pipe 84 includes a first gas delivery pipe 841 and a second gas delivery pipe 843. The first gas delivery pipe 841 has one end connected to the first gas source port 821 of the gas pumping device 82 and is used for delivering positive pressure gas. The second gas delivery pipe 843 has one end connected to the second gas source port 823 of the gas pumping device 82 and is used for delivering negative pressure gas.

[0089] The control device 83 is connected to the gas pumping device 82 through the gas delivery pipe 84, connected to the valve assembly 88 through the pipe assembly 87, connected to the sewage tank 81 through the pipe assembly 87, connected to the atmosphere through the pipe assembly 87, and connected to the clean water box 23 of the cleaning device 100 through the pipe assembly 87. Thus, the control device 83 can control the connection or disconnection between the gas pumping device 82 and the valve assembly 88, the connection or disconnection between the gas pumping device 82 and the sewage tank 81, the connection or disconnection between the gas pumping device 82 and the atmosphere, and the connection or disconnection between the gas pumping device 82 and the clean water box 23 of the cleaning device 100 by controlling the connection or disconnection between the gas delivery pipe 84 and the pipe assembly 87. In addition, since the liquid pumping pipe 85 passes through the control device 83, the control device 83 is also used to control the connection or disconnection of the liquid pumping pipe 85.

[0090] The liquid pumping pipe 85 is a pipe for connecting the liquid containing area 611 of the base 61 and the sewage tank 81. Specifically, the liquid pumping pipe 85 includes a first opening 851 and a second opening 853 at opposite ends. The first opening 851 is connected to the liquid containing area 611, and the second opening 853 is connected to the liquid pumping port 811 of the sewage tank 81.

[0091] The liquid discharging pipe 86 is a pipe for connecting the sewage tank 81 and the water outlet 201 of the base station 200. Specifically, the liquid discharging pipe 86 includes a liquid inlet 861 and a liquid outlet 863 at opposite ends. The water outlet 201 of the base station 200 is used to be connected to a floor drain, the liquid inlet 861 is connected to the liquid outlet 815 of the sewage tank 81, and the liquid outlet 863 is connected to the water outlet 201 of the base station 200, thereby being connected to the floor drain.

[0092] The pipeline assembly 87 is a pipeline assembly for connecting the control device 83 with the valve assembly 88, the control device 83 with the sewage tank 81, the control device 83 with the atmosphere, and the control device 83 with the clean water tank 23 of the cleaning device 100. Thus, the gas pumping device 82 can be connected with the valve assembly 88, the sewage tank 81, the atmosphere, and the clean water tank 23 in sequence through the gas conveying pipe 84, the control device 83, and the pipeline assembly 87. In the embodiment of the present disclosure, the pipeline assembly 87 at least includes a first pipeline assembly 871. The control device 83 is connected with the valve assembly 88 through the first pipeline assembly 871, and is used for controlling the conduction or disconnection between the gas conveying pipe 84 and the first pipeline assembly 871.

[0093] The base station 200 can further include a base station control board 90. The base station control board 90 is a device used for controlling various functional modules in the base station 200, such as controlling the operation of the gas source system 80. The base station control board 90 is arranged on the base station body 60, and generally includes a circuit board and a controller or a processor arranged on the circuit board. In the present disclosure, the base station control board 90 is electrically connected with the control device 83 in the gas source system 80. The base station control board 90 sends a control instruction to the control device 83, and the control device 83 responds to the control instruction and specifically performs a control operation, so that the base station 200 is in a required working state.

[0094] The base station 200 at least has a pre-liquid pumping state and a pre-liquid discharging state. It should be noted that, when the base station 200 is in the pre-liquid pumping state, the gas source system 80 is correspondingly in the pre-liquid pumping state, that is, each element in the gas source system 80 is also in the pre-liquid pumping state, for example, the control device 83 is in the pre-liquid pumping state; when the base station 200 is in the pre-liquid discharging state, the gas source system 80 is correspondingly in the pre-liquid discharging state, that is, each element in the gas source system 80 is also in the pre-liquid discharging state, for example, the control device 83 is in the pre-liquid discharging state. Wherein, “liquid pumping” refers to pumping the liquid in the liquid containing area 611 into the sewage tank 81. “Liquid discharging” refers to discharging the liquid in the sewage tank 81 to the outside of the sewage tank 81, for example, the outside of the base station 200. Specifically, as described above, the liquid is discharged through the liquid discharging pipe 86 and the water outlet 201 of the base station 200 into the floor drain, and then into the drainage system outside the cleaning system 1000.

[0095] Please continue to see Figure 2 、 Figure 3 、 Figure 6 、 Figure 7If the base station control board 90 sends a liquid pumping command, the control device 83 responds to the liquid pumping command and first enters a pre-liquid pumping state. In the pre-liquid pumping state, the control device 83 controls the gas supply pipe 84 to be in communication with the first pipeline assembly 871, and the gas pumping device 82 provides positive pressure gas to the valve assembly 88 through the gas supply pipe 84, the control device 83 and the first pipeline assembly 871, so that the valve assembly 88 is closed to disconnect the flow outlet 815 and the discharge outlet 863. If the base station control board 90 sends a liquid discharge command, the control device 83 responds to the liquid discharge command and first enters a pre-liquid discharge state. In the pre-liquid discharge state, the control device 83 controls the gas supply pipe 84 to be in communication with the first pipeline assembly 871, and the gas pumping device 82 provides negative pressure gas (i.e. pumped gas) to the valve assembly 88 through the gas supply pipe 84, the control device 83 and the first pipeline assembly 871, so that the valve assembly 88 is opened to connect the flow outlet 815 and the discharge outlet 863.

[0096] In the base station 200 of the embodiment of the present disclosure, the gas source system 80 controls the gas supply pipe 84 to be in communication with the first pipeline assembly 871 by using the control device 83, and then uses the gas pumping device 82 to provide positive pressure gas to the valve assembly 88 through the gas supply pipe 84, the control device 83 and the first pipeline assembly 871, so that the valve assembly 88 disconnects the communication between the flow outlet 861 and the discharge outlet 863, and actively prepares for the connection of the liquid pumping path. The gas source system 80 also controls the gas supply pipe 84 to be in communication with the first pipeline assembly 871 by using the control device 83, and then uses the gas pumping device 82 to provide negative pressure gas to the valve assembly 88 through the gas supply pipe 84, the control device 83 and the first pipeline assembly 871, so that the valve assembly 88 connects the communication between the flow outlet 861 and the discharge outlet 863, and actively prepares for the connection of the liquid discharge path. Thus, the gas source system 80 can ensure that the liquid pumping path and the liquid discharge path can be normally connected, and thus can normally pump and discharge liquid.

[0097] Further, please also refer to Figure 2 、 Figure 3 、 Figure 6 、 Figure 7In some embodiments, the pipe assembly 87 further comprises a second pipe assembly 873. The control device 83 is in communication with the sewage tank 81 through the second pipe assembly 873, and is configured to control the on or off between the gas delivery pipe 84 and the second pipe assembly 873. The base station 200 further has a formal liquid pumping state and a formal liquid discharging state. It is to be noted that when the base station 200 is in the formal liquid pumping state, the gas source system 80 is correspondingly in the formal liquid pumping state, that is, each element in the gas source system 80 is also in the formal liquid pumping state, for example, the control device 83 is in the formal liquid pumping state; when the base station 200 is in the formal liquid discharging state, the gas source system 80 is correspondingly in the formal liquid discharging state, that is, each element in the gas source system 80 is also in the formal liquid discharging state, for example, the control device 83 is in the formal liquid discharging state.

[0098] When the base station control board 90 issues a liquid pumping instruction, the control device 83 will first be in a pre-liquid pumping state and then switch from the pre-liquid pumping state to the formal liquid pumping state in response to the liquid pumping instruction. When the control device 83 is in the pre-liquid pumping state, the control device 83 also controls the gas delivery pipe 84 and the first pipe assembly 871 to be in communication, and the gas pumping device 82 provides positive pressure gas to the valve assembly 88 through the gas delivery pipe 84, the control device 83 and the first pipe assembly 871, so that the valve assembly 88 remains closed to disconnect the flow outlet 815 and the discharge outlet 863. When the control device 83 is in the formal liquid pumping state, the control device 83 controls the liquid pumping pipe 85 to be in communication and the gas delivery pipe 84 and the second pipe assembly 873 to be in communication, and the liquid pumping pipe 85, the sewage tank 81, the second pipe assembly 873, the control device 83, the gas delivery pipe 84 and the gas pumping device 82 together form a liquid pumping path, and the gas pumping device 82 provides negative pressure gas to the liquid pumping path to make the sewage tank 81 pump the liquid in the liquid containing area 611 through the liquid pumping pipe 85, so as to realize the liquid pumping of the base station 200. After the control device 83 switches from the pre-liquid pumping state to the formal liquid pumping state, the control device 83 is in the formal liquid pumping state, and the control device 83 also controls the gas delivery pipe 84 and the first pipe assembly 871 to be in communication, and the gas pumping device 82 provides positive pressure gas to the valve assembly 88 through the gas delivery pipe 84, the control device 83 and the first pipe assembly 871, so that the valve assembly 88 remains closed to disconnect the flow outlet 815 and the discharge outlet 863. Of course, after the control device 83 switches from the pre-liquid pumping state to the formal liquid pumping state, the valve assembly 88 remains closed, and the control device 83 can also control the gas delivery pipe 84 and the first pipe assembly 871 to be closed, and control the gas delivery pipe 84 and the second pipe assembly 873 to be in communication, so that the gas provided by the gas delivery pipe 84 is only for the second pipe assembly 873. Compared with the scheme of simultaneously supplying the first pipe assembly 871 and the second pipe assembly 873, the liquid pumping efficiency is higher.

[0099] If the base station control board 90 issues a liquid discharge instruction, the control device 83 will first be in a pre-liquid discharge state and then switch from the pre-liquid discharge state to a formal liquid discharge state in response to the liquid discharge instruction. When the control device 83 is in the pre-liquid discharge state, the control device 83 also controls the conduction between the gas supply pipe 84 and the first pipe assembly 871, and the gas pumping device 82 provides negative pressure gas to the valve assembly 88 through the gas supply pipe 84, the control device 83 and the first pipe assembly 871, so that the valve assembly 88 is opened to conduct the flow outlet 815 and the discharge outlet 863. When the control device 83 is in the formal liquid discharge state, the control device 83 controls the conduction between the gas supply pipe 84 and the second pipe assembly 873, and the gas pumping device 82, the second pipe assembly 873, the sewage tank 81, the valve assembly 88 and the liquid discharge pipe 86 together form a liquid discharge path, and the gas pumping device 82 provides positive pressure gas to the liquid discharge path, so that the sewage tank 81 discharges liquid to the outside through the liquid discharge pipe 86, to realize the liquid discharge of the base station 200. After the control device 83 switches from the pre-liquid discharge state to the formal liquid discharge state, the control device 83 is in the formal liquid discharge state, the control device 83 controls the conduction between the gas supply pipe 84 and the first pipe assembly 871, and the gas pumping device 82 provides negative pressure gas to the valve assembly 88 through the gas supply pipe 84, the control device 83 and the first pipe assembly 871, so that the valve assembly 88 is always opened to conduct the flow outlet 815 and the discharge outlet 863. Of course, after the control device 83 switches from the pre-liquid discharge state to the formal liquid discharge state, the valve assembly 88 is kept open at this time, the control device 83 can also control the gas supply pipe 84 and the first pipe assembly 871 to be closed, and the gas supply pipe 84 and the second pipe assembly 873 to be conducted, so that the gas provided by the gas supply pipe 84 is only for the second pipe assembly 873. Compared with the scheme of simultaneously supplying the first pipe assembly 871 and the second pipe assembly 873, the liquid discharge efficiency is higher.

[0100] Further, please refer to Figures 6 to 9 In some embodiments, the pipe assembly 87 further includes a third pipe assembly 875. The control device 83 communicates with the outside atmosphere through the third pipe assembly 875, and is used to control the conduction or disconnection between the gas supply pipe 84 and the third pipe assembly 875. When the control device 83 is in the formal liquid discharge state, the control device 83 controls the conduction between the gas supply pipe 84 and the third pipe assembly 875, and the gas pumping device 82 sucks external gas through the gas supply pipe 84, the control device 83 and the third pipe assembly 875. That is, external gas is sucked to supply the sewage tank 81, so that the liquid in the sewage tank 81 is discharged to the outside under the action of positive pressure.

[0101] It should be noted that, in the formal draining state of the control device 83, the gas pumping device 82 provides positive pressure gas to the draining passage, and the gas pressure in the draining passage is unbalanced. The present disclosure also designs a third pipeline assembly 875 in communication with the external atmosphere, and in the formal draining state of the control device 83, the control device 83 controls the conduction between the gas conveying pipe 84 and the third pipeline assembly 875 to conduct the external gas and the gas pumping device 82, so as to balance the gas pressure in the draining passage.

[0102] Furthermore, in some embodiments, the pipeline assembly 87 further comprises a fourth pipeline assembly 877. The control device 83 also communicates with the clean water box 23 of the cleaning device 100 through the fourth pipeline assembly 877, and is used to control the conduction or disconnection between the gas conveying pipe 84 and the fourth pipeline assembly 877. In the formal draining state of the control device 83, the control device 83 controls the conduction between the gas conveying pipe 84 and the fourth pipeline assembly 877, and the gas pumping device 82 provides positive pressure gas to the clean water box 23 through the gas conveying pipe 84, the control device 83 and the fourth pipeline assembly 877. Please refer to Figure 3 , the cleaning device 100 can comprise a sewage box 24 in communication with the clean water box 23, a recovery member 251 for recovering sewage, a device control panel 50 and a control valve 25183. The recovery member 251 is provided with a sewage containing cavity, and the opposite ends of the sewage containing cavity in the length direction are respectively provided with a first sewage outlet and a second sewage outlet. The opening and closing of the control valve 25183 is used to control the conduction or disconnection of the second sewage outlet with the external atmosphere. The positive pressure gas delivered by the gas source system 80 overflows from the second liquid outlet 235 of the clean water box 23 to the sewage box 24, and the sewage in the sewage box 24 is extruded outward to pass through the communication port 243 and the first sewage outlet to be discharged into the sewage containing cavity of the recovery member 251. Then, the device control panel 50 of the cleaning device 100 controls the control valve 25183 to open to conduct the second sewage outlet with the external atmosphere, and the sewage in the sewage containing cavity is discharged to the base station 200 through the second sewage outlet, thereby realizing the sewage discharge of the cleaning device 100.

[0103] It should be noted that, in the formal draining state of the control device 83, the gas pumping device 82 provides positive pressure gas to the draining passage, and the gas pressure in the draining passage is unbalanced. The present disclosure also designs a third pipeline assembly 875 in communication with the external atmosphere, and in the formal draining state of the control device 83, the control device 83 controls the conduction between the gas conveying pipe 84 and the third pipeline assembly 875 to conduct the external gas and the gas pumping device 82, so as to balance the gas pressure in the draining passage.

[0104] The base station 200 also includes a zero position state, and correspondingly, the gas source system 80 is in the zero position state, that is, each element in the gas source system 80 is also in the zero position state, for example, the control device 83 is in the zero position state. The "zero position state" here refers to a state in which all elements are open and ready to be controlled, which is the state of the base station 200 before performing the liquid pumping (before entering the "pre-liquid pumping state") and the state to which the base station 200 needs to return after performing the liquid pumping, which is the state of the base station 200 before performing the liquid discharge (before entering the "pre-liquid discharge state") and the state to which the base station 200 needs to return after performing the liquid discharge. In other words, after each execution of liquid pumping or liquid discharge, the base station 200 will return to the "zero position state". This design is to facilitate the logical control of the base station 200 each time the liquid pumping or liquid discharge is performed. Of course, in other embodiments of the present disclosure, the base station 200 can also not be designed to have a zero position state.

[0105] Specifically, when the control device 83 is in the zero position state, the valve assembly 88 is open, the liquid pumping pipe 85 is connected, and the control device 83 controls the gas conveying pipe 84 to be connected to the first pipe assembly 871, the second pipe assembly 873, the third pipe assembly 875, and the fourth pipe assembly 877.

[0106] If the base station control panel 90 issues a liquid pumping instruction, the gas pumping device 82 works in response to the liquid pumping instruction, the control device 83 switches from the zero position state to the pre-liquid pumping state, and then switches from the pre-liquid pumping state to the formal liquid pumping state; when the liquid level in the sewage tank 81 reaches the preset liquid level, the gas pumping device 82 stops working, and the control device 83 switches from the formal liquid pumping state to the zero position state.

[0107] If the base station control panel 90 issues a liquid pumping instruction, the gas pumping device 82 works in response to the liquid pumping instruction, the control device 83 switches from the zero position state to the pre-liquid pumping state, and then switches from the pre-liquid pumping state to the formal liquid pumping state; when the liquid level in the sewage tank 81 reaches the preset liquid level, the gas pumping device 82 stops working, and the control device 83 switches from the formal liquid pumping state to the zero position state.

[0108] The states of the elements in the "zero position state", "pre-liquid pumping state", and "formal liquid pumping state" are as described above and will not be repeated here. The "pre-set liquid level" is a pre-set known empirical value, and is usually a critical value at which the liquid in the sewage tank 81 will not overflow. When the liquid level in the sewage tank 81 reaches the pre-set liquid level, it means that the liquid in the sewage tank 81 has reached the upper limit, and if the liquid pumping continues, there will be a risk of overflow. Therefore, in the embodiments of the present disclosure, on the one hand, when the liquid level in the sewage tank 81 reaches the pre-set liquid level, the gas pumping device 82 stops working, which can ensure that the liquid in the sewage tank 81 will not be overloaded and overflow. On the other hand, the control device 83 switches from the formal liquid pumping state to the zero position state, which can set the starting point of the logical control for the upcoming liquid discharge operation and simplify the liquid discharge operation.

[0109] Similarly, the "preset time length" is also a preset known empirical value, and is usually the time length when the liquid level in the sewage tank 81 reaches the lowest value or is just emptied or is slightly longer than the time length of being emptied when the gas pumping device 82 works at a certain power. When the base station 200 is in the formal draining state for the preset time length, the gas pumping device 82 also works for the preset time length, and the liquid level in the sewage tank 81 drops to a lower position or is completely emptied. If the gas pumping device 82 continues to work to perform the draining, energy consumption will be caused. Therefore, in the embodiments of the present disclosure, on the one hand, when the base station 200 is in the formal draining state and the gas pumping device 82 works for the preset time length, the gas pumping device 82 stops working, so that energy consumption can be saved. On the other hand, the control device 83 switches from the formal draining state to the zero position state, so that the starting point of the logic control for the next liquid pumping operation to be performed can be determined, and the liquid pumping operation is simplified.

[0110] Please refer to Figure 7 In some embodiments, the control device 83 comprises a body 830, a gas transmission pipe 831, a gas path pipe 833 and a control switch assembly 835. The gas transmission pipe 831, the gas path pipe 833 and the control switch assembly 835 are all arranged on the body 830. The gas transmission pipe 831 is in communication with the gas pumping device 82 through the gas conveying pipe 84, one end of the gas path pipe 833 is in communication with the gas conveying pipe 84 through the gas transmission pipe 831, and the other end of the gas path pipe 833 is in communication with the pipe assembly 87.

[0111] Specifically, please refer to Figure 7 , Figures 10 to 12The body 830 is a component of the control device 83 that serves to load other components. The body 830 can be a non-detachable whole structure, or can be a structure composed of at least two components that can be detached from each other. Regardless of the structure, the body 830 is provided with an inner cavity 8300. The outer wall of the body 830 is provided with mounting holes that communicate with the inner cavity 8300, and the liquid suction pipe 85 and each gas path pipe 833 pass through the mounting holes and extend through the inner cavity 8300. The number of mounting holes can be one, two, or more, and can be set according to actual conditions. For example, the number of mounting holes is one, and the liquid suction pipe 85 and the gas path pipe 833 pass through the mounting hole; for another example, the number of mounting holes is two, and part of the liquid suction pipe 85 and the gas path pipe 833 pass through one of the mounting holes, and the remaining part of the liquid suction pipe 85 and the gas path pipe 833 pass through the other mounting hole; for another example, the number of mounting holes is equal to the sum of the number of the liquid suction pipe 85 and the number of the gas path pipe 833, that is, the liquid suction pipe 85 and each gas path pipe 833 correspond to one mounting hole, and the liquid suction pipe 85 and each gas path pipe 833 do not interfere with each other. When the number of mounting holes is small, the design and processing difficulty of the body 830 can be reduced; when the number of mounting holes is large, the relevant interference between the liquid suction pipe 85 and each gas path pipe 833 can be reduced, so that the control device 83 runs more stably.

[0112] Exemplarily, the outer wall of the body 830 is provided with a first mounting hole 8301 for inserting and extending through the inner cavity 8300 by the liquid suction pipe 85. The outer wall of the body 830 is provided with other mounting holes that communicate with the inner cavity 8300, and the other mounting holes are used for inserting and extending through the inner cavity 8300 by the gas path pipe 833, and the specific form is described below. In an embodiment in which the body 830 includes a plurality of components that can be detached from each other, the body 830 can include a base 8308 and an upper cover 8309, and the base 8308 and the upper cover 8309 can be detachably connected together and surround the inner cavity 8300. The connection mode of the base 8308 and the upper cover 8309 includes but is not limited to buckling, fasteners, etc. The body 830 includes first and second side walls 8310 and 8312 that are spaced apart from each other, and third and fourth side walls 8314 and 8315 that are spaced apart from each other. The first, third, second, and fourth side walls 8310, 8314, 8312, and 8315 are sequentially connected end to end to surround the inner cavity 8300. The gas supply pipe 84 is arranged on the side where the first side wall 8310 is located, and the pipe assembly 87 is arranged on the side where the second side wall 8312 is located. For example, the body 830 is a rectangular body provided with mounting holes on the outer wall and an inner cavity in the middle.

[0113] The gas transmission pipe 831 is a pipe for connecting the gas delivery pipe 84 and the gas path pipe 833. The gas transmission pipe 831 can be connected to one side of the body 830 in a detachable manner or a non-detachable manner. In one embodiment, the gas transmission pipe 831 includes a first four-way pipe 8311 and a second four-way pipe 8313. One interface of the first four-way pipe 8311 is connected to the other end of the first gas delivery pipe 841, and the other three interfaces of the first four-way pipe 8311 are respectively connected to the three gas path pipes 833, so as to sequentially transmit the positive pressure gas pumped out of the first gas source port 821 of the gas pumping device 82 to the gas path pipes 833 through the first gas delivery pipe 841 and the first four-way pipe 8311. One interface of the second four-way pipe 8313 is connected to the other end of the second gas delivery pipe 843, and the other three interfaces of the second four-way pipe 8313 are respectively connected to the other three gas path pipes 833, so as to sequentially transmit the negative pressure gas in the gas path pipes 833 to the second gas source port 823 of the gas pumping device 82 through the second four-way pipe 8313 and the second gas delivery pipe 843. The first four-way pipe 8311 and the second four-way pipe 8313 are not in gas flow communication with each other, that is, the gas flow between them is not communicated. In some examples, the first four-way pipe 8311 and the second four-way pipe 8313 are structurally independent of each other, that is, they are not directly connected to each other in a mechanical manner. In other examples, the first four-way pipe 8311 and the second four-way pipe 8313 are directly connected to each other in a mechanical manner to form a whole structure of the gas transmission pipe 831, as shown in Figure 10 In the embodiment of the present disclosure, the whole structure of the gas transmission pipe 831 is connected to the first side wall 8310 of the body 830 in a detachable manner.

[0114] The gas path pipe 833 is a pipe for connecting the gas transmission pipe 831 and the pipeline assembly 87. The gas path pipe 833 is inserted and penetrates the inner cavity 8300, and the opposite ends of the gas path pipe 833 protrude from the opposite sides of the body 830. The gas path pipe 833 includes a plurality of, at least part of the gas delivery pipe 84 and the plurality of gas path pipes 833 are flexible, and in some examples, the gas delivery pipe 84 and the plurality of gas path pipes 833 are flexible pipelines, that is, the gas delivery pipe 84 and the plurality of gas path pipes 833 are flexible as a whole. In other examples, part of the gas delivery pipe 84 and the plurality of gas path pipes 833 are flexible, that is, part of the gas delivery pipe 84 and the plurality of gas path pipes 833 are flexible. In the embodiment of the present disclosure, the opposite ends of the gas path pipe 833 protrude relative to the first side wall 8310 and the second side wall 8312 of the body 830, so as to be connected to the gas delivery pipe 84 on the side where the first side wall 8310 is located and to be connected to the pipeline assembly 87 on the side where the second side wall 8312 is located.

[0115] Specifically, in the present disclosure, the gas path pipe 833 at least includes a closing valve gas path 8331 and an opening valve gas path 8332. The outer wall of the body 830 is also provided with a second mounting hole 8302 and a third mounting hole 8303, the second mounting hole 8302 and the third mounting hole 8303 penetrating the first side wall 8310 and the second side wall 8312 and communicating with the inner cavity 8300, the second mounting hole 8302 being used for inserting and penetrating the inner cavity 8300 by the closing valve gas path 8331, and the third mounting hole 8303 being used for inserting and penetrating the inner cavity 8300 by the opening valve gas path 8332.

[0116] One end of the closing valve gas path 8331 is connected to the first four-way joint 8311 on the side where the first side wall 8310 is located, so as to realize the communication with the first gas source port 821 of the gas pumping device 82 through the first four-way joint 8311 and the first gas conveying pipe 841; the other end of the closing valve gas path 8331 is connected to the first pipe assembly 871 on the side where the second side wall 8312 is located, so as to realize the communication with the valve assembly 88 through the first pipe assembly 871, thereby realizing the communication of the gas pumping device 82 with the valve assembly 88 through the first gas conveying pipe 841, the first four-way joint 8311, the closing valve gas path 8331 and the first pipe assembly 871 to form a closing valve path.

[0117] One end of the opening valve gas path 8332 is connected to the second four-way joint 8313 on the side where the first side wall 8310 is located, so as to realize the communication with the second gas source port 823 of the gas pumping device 82 through the second four-way joint 8313 and the second gas conveying pipe 843; the other end of the opening valve gas path 8332 is connected to the first pipe assembly 871 on the side where the second side wall 8312 is located, so as to realize the communication with the valve assembly 88 through the first pipe assembly 871, thereby realizing the communication of the gas pumping device 82 with the valve assembly 88 through the second gas conveying pipe 843, the second four-way joint 8313, the opening valve gas path 8332 and the first pipe assembly 871 to form an opening valve path.

[0118] In the embodiment in which the pipe assembly 87 further includes a second pipe assembly 873, the gas path pipe 833 further includes a liquid pumping gas path 8333 and a liquid discharging gas path 8334. The outer wall of the body 830 is also provided with a fourth mounting hole 8304 and a fifth mounting hole 8305, the fourth mounting hole 8304 and the fifth mounting hole 8305 penetrating the first side wall 8310 and the second side wall 8312 and communicating with the inner cavity 8300, the fourth mounting hole 8304 being used for inserting and penetrating the inner cavity 8300 by the liquid pumping gas path 8333, and the fifth mounting hole 8305 being used for inserting and penetrating the inner cavity 8300 by the liquid discharging gas path 8334.

[0119] One end of the liquid-gas extraction path 8333 is connected to the second four-way joint 8313 on the side where the first side wall 8310 is located, so as to realize communication with the second gas source port 823 of the gas extraction device 82 through the second four-way joint 8313 and the second gas pipe 843; the other end of the liquid-gas extraction path 8333 is connected to the second pipe assembly 873 on the side where the second side wall 8312 is located, so as to realize communication with the flow port 813 of the sewage tank 81 through the second pipe assembly 873, thereby realizing the communication of the gas extraction device 82 with the sewage tank 81 through the second gas pipe 843, the second four-way joint 8313 and the second pipe assembly 873 to form a liquid extraction path.

[0120] One end of the liquid-gas extraction path 8333 is connected to the second four-way joint 8313 on the side where the first side wall 8310 is located, so as to realize communication with the second gas source port 823 of the gas extraction device 82 through the second four-way joint 8313 and the second gas pipe 843; the other end of the liquid-gas extraction path 8333 is connected to the second pipe assembly 873 on the side where the second side wall 8312 is located, so as to realize communication with the flow port 813 of the sewage tank 81 through the second pipe assembly 873, thereby realizing the communication of the gas extraction device 82 with the sewage tank 81 through the second gas pipe 843, the second four-way joint 8313 and the second pipe assembly 873 to form a liquid extraction path.

[0121] In the embodiment in which the pipe assembly 87 further comprises a third pipe assembly 875, the gas path pipe 833 further comprises a balance gas path 8335. The outer wall of the body 830 is further provided with a sixth mounting hole 8306, which penetrates the first side wall 8310 and the second side wall 8312 and communicates with the inner cavity 8300, and is used for inserting and penetrating the balance gas path 8335 through the inner cavity 8300.

[0122] One end of the liquid-gas extraction path 8333 is connected to the second four-way joint 8313 on the side where the first side wall 8310 is located, so as to realize communication with the second gas source port 823 of the gas extraction device 82 through the second four-way joint 8313 and the second gas pipe 843; the other end of the liquid-gas extraction path 8333 is connected to the second pipe assembly 873 on the side where the second side wall 8312 is located, so as to realize communication with the flow port 813 of the sewage tank 81 through the second pipe assembly 873, thereby realizing the communication of the gas extraction device 82 with the sewage tank 81 through the second gas pipe 843, the second four-way joint 8313 and the second pipe assembly 873 to form a liquid extraction path.

[0123] In the embodiment in which the pipeline assembly 87 further comprises the fourth pipeline assembly 877, the gas path pipeline 833 further comprises a pumping gas path 8336. The outer wall of the body 830 is further provided with a seventh mounting hole 8307, which penetrates the first side wall 8310 and the second side wall 8312 and communicates with the inner cavity 8300, and is used for inserting and penetrating the pumping gas path 8336 through the inner cavity 8300.

[0124] One end of the pumping gas path 8336 is connected to the first four-way joint 8311 on the side where the first side wall 8310 is located, so as to realize communication with the first gas source port 821 of the gas pumping device 82 through the first four-way joint 8311 and the first gas pipeline 841; the other end of the pumping gas path 8336 is connected to the fourth pipeline assembly 877 on the side where the second side wall 8312 is located, so as to realize communication with the docking port 63 through the fourth pipeline assembly 877, thereby realizing the communication of the gas pumping device 82 with the docking port 63 through the first gas pipeline 841, the first four-way joint 8311, the pumping gas path 8336 and the fourth pipeline assembly 877, and forming a pumping gas path.

[0125] It should be noted that the communication of the fourth pipeline assembly 877 with the docking port 63 includes direct communication or indirect communication. An example of indirect communication is as follows: please refer to Figure 2 and Figure 3The base station 200 further comprises a multi-port connector 72 disposed on the base station body 60, which can be part of the liquid supply system 70, part of the gas supply system 80, or a component independent of the liquid supply system 70 and the gas supply system 80. The multi-port connector 72 comprises at least two input ports 721, an output port 723, and a fluid storage cavity 725. The at least two input ports 721 and the output port 723 are in communication with the fluid storage cavity 725. The at least two input ports 721 are also in communication with the liquid channel of the liquid supply system 70 and / or the gas channel of the gas supply system 80 (e.g., the fourth pipe assembly 877), and the output port 723 is in communication with the docking port 63. In one example, the liquid supply system 70 and the gas supply system 80 access the fluid storage cavity 725 through different input ports 721 of the multi-port connector 72 and output from the same output port 723 to communicate with the same docking port 63. Fluids input from different input ports 721 of the multi-port connector 72 can mix in the fluid storage cavity 725 and then flow out through the output port 723. The liquid supply system 70 can supply liquid to the docking port 63 through the multi-port connector 72, and the gas supply system 80 can also supply gas to the docking port 63 through the multi-port connector 72. If the liquid supply system 70 supplies liquid to the docking port 63 through the multi-port connector 72 at the same time that the gas supply system 80 supplies gas to the docking port 63 through the multi-port connector 72, the gas and liquid will mix in the fluid storage cavity 725 of the multi-port connector 72 to form a bubbly liquid, which then passes through the docking port 63 and the liquid supplement port 231 into the clean water tank 23 for use in flushing the sewage tank 24 and / or for decontaminating the sewage tank 24.

[0126] In the illustrated embodiment of the present disclosure, the air path pipe 833 includes a valve closing air path 8331, a valve opening air path 8332, a liquid pumping air path 8333, a liquid discharging air path 8334, a balance air path 8335, and a gas charging air path 8336. Correspondingly, the body 830 is provided with a second mounting hole 8302, a third mounting hole 8303, a fourth mounting hole 8304, a fifth mounting hole 8305, a sixth mounting hole 8306, and a seventh mounting hole 8307, and the pipe assembly 87 includes a first pipe assembly 871, a second pipe assembly 873, a third pipe assembly 875, and a fourth pipe assembly 877. One interface of the first four-way pipe 8311 is in communication with the other end of the first gas conveying pipe 841, and the remaining three interfaces of the first four-way pipe 8311 are in communication with the valve closing air path 8331, the liquid discharging air path 8334, and the gas charging air path 8336, respectively. One interface of the second four-way pipe 8313 is in communication with the other end of the second gas conveying pipe 843, and the remaining three interfaces of the second four-way pipe 8313 are in communication with the valve opening air path 8332, the liquid pumping air path 8333, and the balance air path 8335, respectively. In addition, in the control device 83, the valve closing air path 8331, the valve opening air path 8332, the liquid pumping air path 8333, the liquid discharging air path 8334, the balance air path 8335, and the gas charging air path 8336 are in the same direction as the extension direction of the liquid pumping pipe 85, and can be arranged in the same layer and in parallel, or can be arranged in different layers and in parallel as shown in the present disclosure, which is not limited in the present disclosure. Figure 11

[0127] Please refer to Figure 7 and Figure 11 , the first pipe assembly 871 includes a first pipe 8711 and a first three-way pipe 8713. One end of the first pipe 8711 is in communication with the valve assembly 88. The first three-way pipe 8713 is provided with a first flow passage 87131, a second flow passage 87133, and a third flow passage 87135 in communication with each other, the first flow passage 87131 is in communication with the other end of the first pipe 8711, and the second flow passage 87133 and the third flow passage 87135 are in communication with the valve closing air path 8331 and the valve opening air path 8332, respectively. The above-mentioned valve closing path is through the second flow passage 87133 and the first flow passage 87131, and the above-mentioned valve opening path is through the third flow passage 87135 and the first flow passage 87131.

[0128] Please continue to refer to Figure 7 and Figure 11 ​In some embodiments, the second pipe assembly 873 includes a second pipe 8731 and a second tee 8733. One end of the second pipe 8731 is in communication with the sewage tank 81. The second tee 8733 is provided with a first communication port 87331, a second communication port 87333 and a third communication port 87335 in communication with each other, the first communication port 87331 is in communication with the other end of the second pipe 8731, and the second communication port 87333 and the third communication port 87335 are in communication with the liquid pumping gas path 8333 and the liquid discharging gas path 8334, respectively. The above-mentioned liquid pumping path is through the second communication port 87333 and the first communication port 87331, and the above-mentioned liquid discharging path is through the third communication port 87335 and the first communication port 87331.

[0129] Referring to Figure 9 and Figure 11 In some embodiments, the third pipe assembly 875 includes a third pipe 8751 and a first two-way pipe 8753. One end of the third pipe 8751 is in communication with the atmosphere, and the other end of the third pipe 8751 is in communication with the balance gas path 8335. The above-mentioned balance path is through the two open ends of the first two-way pipe 8753. In other embodiments, the third pipe assembly 875 only includes the third pipe 8751, and the first two-way pipe 8753 can be omitted. At this time, one end of the third pipe 8751 is in communication with the atmosphere, and the other end of the third pipe 8751 is in communication with the balance gas path 8335.

[0130] Referring to Figure 2 , Figure 3 , Figure 7 and Figure 11 In some embodiments, the fourth pipe assembly 877 includes a fourth pipe 8771 and a second two-way pipe 8773. One end of the fourth pipe 8771 is in communication with the clean water tank 23, and the other end of the fourth pipe 8771 is in communication with the gas charging gas path 8336. The above-mentioned gas charging path is through the two open ends of the second two-way pipe 8773. In other embodiments, the fourth pipe assembly 877 only includes the fourth pipe 8771, and the second two-way pipe 8773 can be omitted. At this time, one end of the fourth pipe 8771 is in communication with the clean water tank 23, and the other end of the fourth pipe 8771 is in communication with the gas charging gas path 8336.

[0131] The following Table 1 and the accompanying Figures 15 to 18 The working states of the base station 200 are described by way of example.

[0132] Table 1: On and off states of each element in each working state of the base station 200

[0133]

[0134] When the base station 200 is in the zero position, the valve closing passage is open, the valve opening passage is open, the liquid discharging passage is open, the liquid pumping passage is open, the air charging passage is open, the balance passage is open, and the liquid pumping pipe is also open. The corresponding control device 83 is in the initial state. The "open" in this part means the same as "on" in Table 1.

[0135] Please refer to Figure 15 , Figure 15 The bold part is the gas passage, and the arrow of the bold part is the gas flow direction. Figures 16 to 18 The same is true. When the base station 200 is in the pre-liquid pumping state, the valve closing passage is open, and the first gas source port 821 of the gas pumping device 82 provides positive pressure gas to the valve closing passage. At the same time, the liquid pumping passage and the liquid pumping pipe 85 are open, and the second gas source port 823 of the gas pumping device 82 provides negative pressure gas to the liquid pumping passage, so that the liquid pumping pipe 85, the liquid pumping passage, the gas pumping device 82, and the valve closing passage form a circulating gas path. In this way, the gas pumping device 82 can be used to pump negative pressure from the sewage tank 81 to the valve assembly 88, and the valve assembly 88 is closed under the action of positive pressure (how the valve assembly 88 performs closing under the action of positive pressure will be described below). At the same time, the valve opening passage is disconnected, the liquid discharging passage is disconnected, the air charging passage is disconnected, and the balance passage is disconnected. The "disconnected" in this part means the same as "off" in Table 1.

[0136] Please refer to Figure 16 When the base station 200 is in the formal liquid pumping state, the liquid pumping passage and the liquid pumping pipe 85 are open, and the second gas source port 823 of the gas pumping device 82 provides negative pressure gas to the liquid pumping passage. At the same time, the air charging passage is open, and the first gas source port 821 of the gas pumping device 82 provides positive pressure gas to the air charging passage, so that the liquid pumping pipe 85, the liquid pumping passage, the gas pumping device 82, the air charging passage, and the clean water box 23 form a circulating gas path. In this way, the gas pumping device 82 can be used to pump gas from the sewage tank 81 to the clean water box 23. At the same time, the valve closing passage is disconnected, the valve opening passage is disconnected, the liquid discharging passage is disconnected, and the balance passage is disconnected.

[0137] Please refer to Figure 17When the base station 200 is in the pre-drainage state, the open valve passage is connected, and the second gas source port 823 of the gas pumping device 82 provides negative pressure gas to the open valve passage, so that the valve assembly 88 can be opened (how the valve assembly 88 opens will be described below). At the same time, the drainage passage is connected, and the first gas source port 821 of the gas pumping device 82 provides positive pressure gas to the drainage passage, so that the open valve passage, the gas pumping device 82 and the drainage passage form a circulating gas path, so that the gas pumping device 82 can be used to pump negative pressure from the valve assembly 88 to the sewage tank 81, and the valve assembly 88 opens under the action of negative pressure (how the valve assembly 88 opens under the action of negative pressure will be described below). At the same time, the closing valve passage is disconnected, the liquid pumping passage is disconnected, the gas charging passage is disconnected, the balance passage and the liquid pumping pipe 85 are disconnected.

[0138] Please refer to Figure 18 When the base station 200 is in the formal drainage state, the drainage passage is connected, and the first gas source port 821 of the gas pumping device 82 provides positive pressure gas to the drainage passage. At the same time, the balance passage is connected, and the second gas source port 823 of the gas pumping device 82 provides negative pressure gas to the balance passage, so that the balance passage, the gas pumping device 82 and the drainage passage form a circulating gas path, so that the gas pumping device 82 can be used to pump positive pressure to the sewage tank 81 to drain. At the same time, the closing valve passage is disconnected, the open valve passage is disconnected, the liquid pumping passage is disconnected, the gas charging passage is disconnected, and the liquid pumping pipe is disconnected.

[0139] It should be noted that the control switch assembly 835 of the control device 83 controls the opening or closing of the closing valve gas path 8331, so as to correspondingly connect or disconnect the closing valve passage; the control switch assembly 835 controls the opening or closing of the open valve gas path 8332, so as to correspondingly connect or disconnect the open valve passage; the control switch assembly 835 controls the opening or closing of the liquid pumping gas path 8333, so as to correspondingly connect or disconnect the liquid pumping passage; the control switch assembly 835 controls the opening or closing of the drainage gas path 8334, so as to correspondingly connect or disconnect the drainage passage; the control switch assembly 835 controls the opening or closing of the balance gas path 8335, so as to correspondingly connect or disconnect the balance passage; the control switch assembly 835 controls the opening or closing of the gas charging gas path 8336, so as to correspondingly connect or disconnect the gas charging passage; and the control device 83 controls the opening or closing of the liquid pumping pipe 85, so as to correspondingly connect or disconnect the liquid pumping pipe 85.

[0140] Among them, the control switch assembly 835 is a structure in the control device 83 for controlling the opening or closing of the gas path pipe 833. Please refer to Figure 7 and Figure 11, at least part of the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335 and the gas filling gas path 8336 is flexible, in some embodiments, the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335 and the gas filling gas path 8336 are flexible pipes, that is, the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335 and the gas filling gas path 8336 are flexible as a whole. At this time, the way in which the control switch assembly 835 closes the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335 or the gas filling gas path 8336 includes at least one of extrusion, bending and clamping. In other embodiments, part of the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335 and the gas filling gas path 8336 is flexible, that is, part of the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335 and the gas filling gas path 8336 is flexible. At this time, the way in which the control switch assembly 835 closes the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335 or the gas filling gas path 8336 includes at least one of the following ways: extruding the flexible part of the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335 or the gas filling gas path 8336; bending the flexible part of the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335 or the gas filling gas path 8336; clamping the flexible part of the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335 or the gas filling gas path 8336.

[0141] Specifically, please refer to Figures 10 to 12 , the control switch assembly 835 includes a pressing member 8351 and a driving module 8353.

[0142] The pressing member 8351 is accommodated in the inner cavity 8300 and is a structure for closing the gas path pipe 833 and / or the liquid suction pipe 85 by at least one of extrusion, bending and clamping.

[0143] In the present disclosure, the plurality of pressing members 8351 are arranged along a first direction P1. The first direction P1 is the direction in which the third side wall 8314 points to the fourth side wall 8315, or the direction in which the fourth side wall 8315 points to the third side wall 8314 (e.g., the front-to-back direction as shown). Figure 10 In the control device 83, the liquid suction pipe 85, the valve-closing gas path 8331, the valve-opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335, and the gas filling path 8336 are arranged along a second direction P2 and located at the periphery of the pressing members 8351. The second direction P2 is different from the first direction P1, and is, for example, the direction in which the first side wall 8310 points to the second side wall 8312, or the direction in which the second side wall 8312 points to the first side wall 8310, i.e., the second direction P2 is perpendicular to the first direction P1 (e.g., the left-to-right direction as shown). Figure 10

[0144] The pressing members 8351 can be, for example, cams or protrusions with arc-shaped convex surfaces. In this way, the opening and closing of the gas path pipe 833 and / or the liquid suction pipe 85 by the pressing members 8351 can make the passages (liquid suction passage, liquid discharge passage, etc.) more simple, which is conducive to cost reduction. Meanwhile, the pressing members 8351 can avoid the gas passage in the gas passage state, which is conducive to ensuring smooth gas passage and small gas flow loss.

[0145] The driving module 8353 is a module for driving the pressing members 8351 to move. The output end of the driving module 8353 is connected to the pressing members 8351 and is used to drive the pressing members 8351 to move, so as to drive the pressing members 8351 to switch between the first state and the second state, thereby enabling the control device 83 to switch between the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state, and the formal liquid discharge state. When the pressing members 8351 are in the first state, the pressing members 8351 close the gas path pipe 833 and / or the liquid suction pipe 85. When the pressing members 8351 are in the second state, the pressing members 8351 open the gas path pipe 833 and / or the liquid suction pipe 85.

[0146] ​In one embodiment, the driving module 8353 is configured to drive the pressing member 8351 to rotate, so as to press at least one of the liquid suction tube 85, the open valve gas path 8332, the close valve gas path 8331, the liquid suction gas path 8333, the liquid discharge gas path 8334, the gas inflation path 8336 and the balance gas path 8335 corresponding to the pressing member 8351 when the control device 83 is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state, i.e., the control device 83 presses the corresponding liquid suction tube 85 or gas path 833 to close when the control device 83 is in different states. For example, the pressing part of the pressing member 8351 is located at one side of the liquid suction tube 85 or the gas path 833, and when the pressing member 8351 rotates, the pressing part of the pressing member 8351 contacts the side wall of the liquid suction tube 85 or the gas path 833 close to the pressing part of the pressing member 8351, so as to push the side wall to move towards the side wall on the opposite side until abutting to the side wall on the opposite side, thereby realizing the closing of the liquid suction tube 85 or the gas path 833.

[0147] In another embodiment, the driving module 8353 is configured to drive the pressing member 8351 to move, so as to bend at least one of the liquid suction tube 85, the open valve gas path 8332, the close valve gas path 8331, the liquid suction gas path 8333, the liquid discharge gas path 8334, the gas inflation path 8336 and the balance gas path 8335 corresponding to the pressing member 8351 when the control device 83 is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state, i.e., the control device 83 bends the corresponding liquid suction tube 85 or gas path 833 to close when the control device 83 is in different states. For example, the pressing member 8351 can drive a part of the liquid suction tube 85 or the gas path 833 to move when the pressing member 8351 moves, so as to bend the part of the path, until the path of the bent part cannot pass fluid, thereby realizing the closing of the liquid suction tube 85 or the gas path 833.

[0148] In still another embodiment, the driving module 8353 is configured to drive the pressing member 8351 to open and close, so as to clamp at least one of the liquid suction tube 85, the open valve gas path 8332, the close valve gas path 8331, the liquid suction gas path 8333, the liquid discharge gas path 8334, the gas inflation path 8336 and the balance gas path 8335 corresponding to the pressing member 8351 when the control device 83 is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state, i.e., the control device 83 clamps the corresponding liquid suction tube 85 or gas path 833 to close when the control device 83 is in different states. For example, the pressing member 8351 is composed of two sub-members which can open and close, and the two sub-members are respectively located at two sides of the liquid suction tube 85 or the gas path 833, and when the two sub-members of the pressing member 8351 are closed, they can clamp a part of the liquid suction tube 85 or the gas path 833, until the path of the clamped part cannot pass fluid, thereby realizing the closing of the liquid suction tube 85 or the gas path 833.

[0149] Further, in some embodiments, the control switch assembly 835 further comprises a rotating shaft 8355. The rotating shaft 8355 penetrates the third side wall 8314 and the fourth side wall 8315 and is arranged along the first direction P1, i.e., the rotating shaft 8355 extends along the first direction P1. The rotating shaft 8355 is connected with the driving module 8353. The pressing members 8351 are arranged on the outer circumferential wall of the rotating shaft 8355 and are arranged along the first direction P1. The driving module 8353 drives the rotating shaft 8355 to rotate so as to drive the pressing members 8351 to rotate.

[0150] Specifically, in a third direction P3 perpendicular to the first direction P1 and the second direction P2, the rotating shaft 8355 comprises opposite first and second sides 83551 and 83553. The valve closing gas path 8331, the liquid discharging gas path 8334 and the gas charging gas path 8336 are located on the first side 83551 of the rotating shaft 8355, and the valve opening gas path 8332, the liquid pumping gas path 8333 and the balance gas path 8335 are located on the second side 83553 of the rotating shaft 8355, so that the plurality of gas path tubes 833 are arranged in the aforementioned two layers in parallel. Such an arrangement can make the overall structure of the control device 83 more compact.

[0151] In the embodiment in which the plurality of gas path tubes 833 are arranged in two layers in parallel, in order to enable the pressing members 8351 to simultaneously close the plurality of gas path tubes 833, the number of the pressing members 8351 is at least four. The at least four pressing members 8351 are arranged at intervals on the rotating shaft 8355 so as to correspond to at least one of the clamped liquid pumping tube 85, the valve opening gas path 8332, the valve closing gas path 8331, the liquid pumping gas path 8333, the liquid discharging gas path 8334, the gas charging gas path 8336 and the balance gas path 8335 when the control device 83 is in the zero position state, the pre-liquid pumping state, the formal liquid pumping state, the pre-liquid discharging state, the formal liquid discharging state, respectively. At this time, at least four avoiding spaces 8350 are formed between the rotating shaft 8355 and the body 830. When the pressing members 8351 are rotated to make at least one of the liquid pumping tube 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid pumping gas path 8333, the liquid discharging gas path 8334, the balance gas path 8335 and the gas charging gas path 8336 located in the avoiding space 8350, the liquid pumping tube 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid pumping gas path 8333, the liquid discharging gas path 8334, the balance gas path 8335 or the gas charging gas path 8336 located in the avoiding space 8350 are correspondingly opened.

[0152] Please refer to Figures 10 to 12 In some embodiments, the driving module 8353 comprises a driving motor 83531 and a speed reduction structure 83530. The driving motor 83531 is a driving source for providing driving force for rotating the rotating shaft 8355. The driving motor 83531 is arranged on the body 830 or the base station body 60 (not shown in the figure) Figure 1The driving motor 83531 can be, but is not limited to, a direct current motor, a servo motor, etc. The speed reduction structure 83530 is a structure for reducing the rotating speed of the driving motor 83531 and increasing the output torque. A part of the speed reduction structure 83530 is in transmission connection with the output end of the driving motor 83531, and a part is in transmission connection with the rotating shaft 8355, so as to transmit the driving force of the driving motor 83531 to the rotating shaft 8355 and drive the rotating shaft 8355 to rotate. The speed reduction structure 83530 can be, but is not limited to, a speed reduction gear box, etc.

[0153] Specifically, in one embodiment, in order to make the structure of the driving module 8353 more compact and ensure that the overall control device 83 occupies less space, the speed reduction structure 83530 can include a worm 83532, a worm wheel 83533 with a first gear 83534 and a second gear 83535, and a third gear 83536. The worm 83532 is sleeved on the output end of the driving motor 83531. The diameter of the first gear 83534 is greater than that of the second gear 83535, and the first gear 83534 is in meshing connection with the worm 83532. The third gear 83536 is sleeved on the rotating shaft 8355 and has a diameter at least greater than that of the second gear 83535. It can be understood that the speed reduction structure 83530 can also be an assembly of other transmission components, which can include, but are not limited to, gears, racks, pulleys, belts, lead screws, etc.

[0154] In some embodiments, the control switch assembly 835 further includes a position detector 8357 for detecting the rotating orientation of the pressing member 8351, so as to determine the timing when the driving module 8353 drives the rotating shaft 8355 to stop rotating. For example, the control switch assembly 835 further includes a control board, and the position detector 8357 can be two photoelectric sensors arranged on the control board. Correspondingly, the body 830 is provided with photoelectric shielding strips, for example, a plurality of photoelectric shielding strips are arranged on the periphery of the end of the rotating shaft 8355 facing the third gear 83536. During the rotation of the pressing member 8351 along with the rotating shaft 8355, the plurality of photoelectric shielding strips can shield, partially shield or not shield the two photoelectric sensors, thereby transmitting different signals to indicate different rotating orientations of the pressing member 8351.

[0155] Please refer to Figure 13 and Figure 14 In one embodiment, the valve assembly 88 includes a bracket 881 and a valve body 883 arranged in the bracket 881.

[0156] The bracket 881 is a component for loading the valve body 883 and serving as a connection with other external elements. Please refer to Figure 7One end of the bracket 881 is connected with the flow outlet 815 of the sewage tank 81, and the other end is connected with the discharge outlet 863 of the liquid discharge pipe 86. The bracket 881 is internally provided with a cavity 8811, and the side wall of the bracket 881 is provided with a vent 8813.

[0157] The valve body 883 is accommodated in the cavity 8811, and the side wall of the valve body 883 and the inner wall of the bracket 881 form a regulating cavity 880. The vent 8813 is in communication with the regulating cavity 880. The internal space 8830 of the valve body 883 is separated from the regulating cavity 880 by the side wall of the valve body 883, and is in communication with the flow outlet 815 (the discharge inlet 861) and the discharge outlet 863.

[0158] As described above, when the second gas source port 823 of the gas pumping device 82 provides positive pressure gas to the valve path, the valve assembly 88 can be closed. Specifically, the gas pumping device 82 provides positive pressure gas to the regulating cavity 880 through the gas conveying pipe 84, the control device 83, the first pipe assembly 871 and the vent 8813. The positive pressure gas in the regulating cavity 880 extrudes the side wall of the valve body 883, so that the cross-sectional area of the internal space 8830 gradually decreases until it is completely zero, thereby completing the closing of the valve assembly 88. The sewage in the sewage tank 81 cannot be discharged to the floor drain through the liquid discharge pipe 86. Similarly, as described above, when the second gas source port 823 of the gas pumping device 82 provides negative pressure gas to the valve path, the valve assembly 88 can be opened. Specifically, the gas pumping device 82 provides negative pressure gas to the regulating cavity 880 through the gas conveying pipe 84, the control device 83, the first pipe assembly 871 and the vent 8813. The negative pressure gas in the regulating cavity 880 pulls the side wall of the valve body 883 outward, so that the cross-sectional area of the internal space 8830 gradually increases until it is maximum, thereby completing the opening of the valve assembly 88. The sewage in the sewage tank 81 can be discharged to the floor drain through the liquid discharge pipe 86.

[0159] In some embodiments, at least part of the valve body 883 is elastic. Specifically, the side wall of the part of the valve body 883 corresponding to the regulating cavity 880 is elastic, so that when the positive pressure gas in the regulating cavity 880 extrudes the side wall of the valve body 883, the part of the side wall is elastic to facilitate deformation (for example, the part of the side wall moves towards the center of the valve body 883 to abut each other), or when the negative pressure gas in the regulating cavity 880 pulls the side wall of the valve body 883 outward, the part of the side wall is elastic to facilitate its deformation and self-recovery, or continues to expand under the action of negative pressure (for example, the part of the side wall moves away from the center of the valve body 883 to expand), so as to expand the cross-sectional area of the internal space 8830. Illustratively, the bracket 881 can be a hollow cylinder, and the valve body 883 can be a column body sleeved in the bracket 881. Specifically, the diameter of the part of the valve body 883 in contact with the regulating cavity 880 is smaller than the diameter of the part of the valve body 883 not in contact with the regulating cavity 880.

[0160] When the control device 83 is in the zero position state, the pressure applying member 8351 opens the liquid suction pipe 85, the valve closing gas path 8331, the valve opening gas path 8332, the liquid suction gas path 8333, the liquid discharge gas path 8334, the balance gas path 8335, and the inflation gas path 8336. When the control device 83 is in the pre-liquid suction state, the pressure applying member 8351 opens the liquid suction pipe 85, the valve closing gas path 8331, and the liquid suction gas path 8333, and closes the valve opening gas path 8332, the liquid discharge gas path 8334, the balance gas path 8335, and the inflation gas path 8336. When the control device 83 is in the pre-liquid discharge state, the pressure applying member 8351 opens the valve opening gas path 8332 and the liquid discharge gas path 8334, and closes the liquid suction pipe 85, the valve closing gas path 8331, the liquid suction gas path 8333, the balance gas path 8335, and the inflation gas path 8336. When the control device 83 is in the formal liquid suction state, the pressure applying member 8351 opens the liquid suction pipe 85, the liquid suction gas path 8333, and the inflation gas path 8336, and closes the valve opening gas path 8332, the valve closing gas path 8331, the liquid discharge gas path 8334, and the balance gas path 8335. When the control device 83 is in the formal liquid discharge state, the pressure applying member 8351 opens the liquid discharge gas path 8334 and the balance gas path 8335, and closes the valve closing gas path 8331, the liquid suction pipe 85, the valve opening gas path 8332, the liquid suction gas path 8333, and the inflation gas path 8336.

[0161] The above embodiments will be described in connection with some specific application scenarios.

[0162] Please refer to Figure 2 , Figure 3 and Figure 19When the user starts the sweeping and mopping integrated machine (cleaning device 100) to move on the floor of the living room under the drive of the drive wheel, the water tank 23 built in the sweeping and mopping integrated machine provides clean water to the track-type cleaning member 22 to wet the track-type cleaning member 22, and the track-type cleaning member 22 contacts and rolls on the floor to wipe the dust on the floor clean. With the movement of the sweeping and mopping integrated machine, the track-type cleaning member 22 cleans the floor to a set area, for example, an area of 20 m2, or when the liquid in the water tank 23 is insufficient, the sweeping and mopping integrated machine can navigate to the positioning point of the base station 200 and rotate to the liquid supplementing opening 231 of the water tank 23 of the sweeping and mopping integrated machine to face the entrance of the base station 200, and the sweeping and mopping integrated machine retreats into the base station 200. In this process, the liquid supplementing opening 231 of the water tank 23 of the sweeping and mopping integrated machine is connected to the docking opening 63 of the base station 200, and the liquid supplementing system 70 of the base station 200 is used to supplement the liquid in the water tank 23 of the sweeping and mopping integrated machine. In the process of continuously supplementing the liquid in the water tank 23 by the base station 200, the water level in the water tank 23 continuously rises until the water level rises to exceed the second liquid outlet opening 235 of the water tank 23, and a large amount of liquid is overflowed from the second liquid outlet opening 235 of the water tank 23 and flows to the track-type cleaning member 22. In this process, the track-type cleaning member 22 can continuously rotate forward or alternately rotate forward and reversely to realize the self-cleaning of the track-type cleaning member 22 with a large flow. The sewage generated by the cleaning of the cleaning member 22 can flow to the liquid containing area 611 of the cleaning tank 610. After the cleaning of the cleaning member 22 is completed, the sweeping and mopping integrated machine can return to the floor again to clean other areas that have not been cleaned. It should be noted that "exceeding the second liquid outlet opening 235" means that when the liquid level in the water tank 23 reaches the lowest position of the second liquid outlet opening 235, and the liquid is supplemented into the water tank 23, it is considered that the liquid level exceeds the second liquid outlet opening 235, and at this time, the liquid in the water tank 23 can overflow from the second liquid outlet opening 235 to the outside of the water tank 23. When the liquid level in the water tank 23 is higher than the lowest position of the second liquid outlet opening 235, it is more considered that the liquid level exceeds the second liquid outlet opening 235.

[0163] Alternatively, the all-in-one sweeper-mop used in the user's home is provided with a dirt detection sensor, which can detect the dirt level on the cleaning element 22 or the dirt level of the water scraped off the cleaning element 22. The user is away from home for a long time, and the living room floor is covered with dust. The user starts the all-in-one sweeper-mop (cleaning device 100) to move on the floor under the drive of the drive wheel. In the moving process, the water tank 23 inside the all-in-one sweeper-mop provides clean water to the track-type cleaning element 22 to wet the track-type cleaning element 22. The track-type cleaning element 22 is in contact with the ground and rolls, thereby wiping the dust on the ground clean. As the all-in-one sweeper-mop moves, the dirt sensor inside the all-in-one sweeper-mop detects that the track-type cleaning element 22 is very dirty. If the track-type cleaning element 22 is not deep cleaned at this time, it will affect the subsequent cleaning effect on the ground. At this time, the all-in-one sweeper-mop can navigate to the positioning point (e.g., parking position) of the base station 200 and rotate to the replenishment port 231 of the water tank 23 of the all-in-one sweeper-mop facing the inlet of the base station 200. The all-in-one sweeper-mop retreats into the base station 200. In this process, the replenishment port 231 of the water tank 23 of the all-in-one sweeper-mop is in communication with the docking port 63 of the base station 200, and the cleaning element 22 enters the cleaning tank 610. The cleaning device 100 and / or the base station 200 can start the process of cleaning the cleaning element 22. The base station 200 can inject water into the cleaning tank 611 and / or the cleaning element 22 to clean the cleaning element 22. For example, the base station 200 injects water into the cleaning element 22 to clean the cleaning element 22. Specifically, the liquid supply system 70 of the base station 200 replenishes the water tank 23 of the all-in-one sweeper-mop. In the process of continuously replenishing the water tank 23 by the base station 200, the liquid level in the water tank 23 continuously rises until the liquid level rises above the second liquid outlet 235 of the water tank 23. A large amount of liquid spills out of the second liquid outlet 235 of the water tank 23 and flows onto the track-type cleaning element 22. In this process, the track-type cleaning element 22 can continuously rotate forward or alternately rotate forward and backward to achieve self-cleaning of the track-type cleaning element 22 with a large flow rate, thereby deeply cleaning the dirt attached to the track-type cleaning element 22. The sewage generated by cleaning the cleaning element 22 flows to the liquid-containing area 611 of the cleaning tank 610. After the task of cleaning the cleaning element 22 is completed, the all-in-one sweeper-mop returns to the ground again to clean other areas that have not been cleaned.

[0164] In the above two scenarios, when the cleaning device 100 is in the process of cleaning the cleaning piece 22 or after cleaning the cleaning piece 22, the gas source system 80 of the base station 200 is switched from the zero position state to the pre-liquid extraction state, and then from the pre-liquid extraction state to the formal liquid extraction state to extract the liquid (including but not limited to the liquid after cleaning the cleaning piece 22) in the liquid storage area 611 into the sewage tank 81 through the liquid extraction pipe 85, and when the liquid level in the sewage tank 81 reaches the preset liquid level, the control device 83 is switched from the formal liquid extraction state to the zero position state. Then, the gas source system 80 of the base station 200 is switched from the zero position state to the pre-liquid discharge state, and then from the pre-liquid discharge state to the formal liquid discharge state, and the liquid in the sewage tank 81 is discharged to the floor drain through the liquid discharge pipe 86, and after the gas pumping device 82 works for a preset length of time, the sewage in the sewage tank 81 is basically emptied, and the control device 83 is switched from the formal liquid discharge state to the zero position state.

[0165] Please refer to Figure 2 , Figure 3 and Figure 7 , the disclosure also provides a base station 200, the base station 200 includes a base station body 60 and a gas source system 80, the gas source system 80 is arranged on the base station body 60. The gas source system 80 includes: a gas pumping device 82, a sewage tank 81, a valve assembly 88 and a control device 83. The gas pumping device 82 is used to provide a gas source. The sewage tank 81 is used to store liquid, and is connected to the water source through the liquid extraction pipe 85 to extract liquid and is connected to the outside through the liquid discharge pipe 86 to discharge liquid. The valve assembly 88 is arranged between the flow outlet 815 of the sewage tank 81 and the discharge outlet 863 of the liquid discharge pipe 86, and the valve assembly 88 is opened or closed to correspondingly control the conduction or disconnection between the flow outlet 815 and the discharge outlet 863. The control device 83 is connected to the gas pumping device 82 through the gas conveying pipe 84, is connected to the sewage tank 81 through the second pipeline assembly 873, is connected to the clean water box 23 of the cleaning device 100 through the fourth pipeline assembly 877, and is used to control the conduction or disconnection of the liquid extraction pipe 85, the conduction or disconnection between the gas conveying pipe 84 and the second pipeline assembly 873, and the conduction or disconnection between the gas conveying pipe 84 and the fourth pipeline assembly 877. Wherein, when the control device 83 is in the formal liquid extraction state, the control device 83 controls the conduction of the liquid extraction pipe 85 and the conduction of the gas conveying pipe 84 and the second pipeline assembly 873, the liquid extraction pipe 85, the sewage tank 81, the second pipeline assembly 873, the control device 83, the gas conveying pipe 84 and the gas pumping device 82 jointly form a liquid extraction path, the gas pumping device 82 provides negative pressure gas to the liquid extraction path, so that the sewage tank 81 extracts liquid through the liquid extraction pipe 85, the control device 83 controls the conduction of the gas conveying pipe 84 and the fourth pipeline assembly 877, and the gas pumping device 82 provides positive pressure gas to the clean water box 23 through the gas conveying pipe 84, the control device 83 and the fourth pipeline assembly 877.

[0166] Please refer to Figure 1 , 2 ,Figure 3 and Figure 7 The present disclosure also provides a cleaning system 1000, which comprises a cleaning device 100 and a base station 200. The cleaning device 100 can be any of the cleaning devices 100 described above. The base station 200 can be any of the base stations 200 described above.

[0167] Exemplarily, the base station 200 comprises a base station body 60 and a gas source system 80, which is arranged on the base station body 60. The gas source system 80 comprises a gas pumping device 82, a sewage tank 81, a valve assembly 88 and a control device 83. The gas pumping device 82 is configured to provide a gas source. The sewage tank 81 is configured to store liquid and is connected to a water source through a liquid pumping pipe 85 to pump in liquid and is connected to the outside through a liquid discharging pipe 86 to discharge liquid. The valve assembly 88 is arranged between an outlet 815 of the sewage tank 81 and an outlet 863 of the liquid discharging pipe 86. By opening or closing the valve assembly 88, the communication or disconnection between the outlet 815 and the outlet 863 can be controlled. The control device 83 is connected to the gas pumping device 82 through a gas conveying pipe 84, is connected to the sewage tank 81 through a second pipe assembly 873, is connected to the cleaning device 100 through a fourth pipe assembly 877, and is configured to control the communication or disconnection of the liquid pumping pipe 85, the communication or disconnection between the gas conveying pipe 84 and the second pipe assembly 873, and the communication or disconnection between the gas conveying pipe 84 and the fourth pipe assembly 877. When the control device 83 is in a pre-liquid pumping state, the control device 83 controls the gas conveying pipe 84 to be in communication with the first pipe assembly 871. The gas pumping device 82 provides positive pressure gas to the valve assembly 88 through the gas conveying pipe 84, the control device 83 and the first pipe assembly 871, so that the valve assembly 88 is closed to disconnect the outlet 815 and the outlet 863. When the control device 83 is in a pre-liquid discharging state, the control device 83 controls the gas conveying pipe 84 to be in communication with the first pipe assembly 871. The gas pumping device 82 provides negative pressure gas to the valve assembly 88 through the gas conveying pipe 84, the control device 83 and the first pipe assembly 871, so that the valve assembly 88 is opened to connect the outlet 815 and the outlet 863.

[0168] Please refer to Figure 2 , Figure 3 and Figure 7The present disclosure also provides a gas source system 80 of a base station 200, which includes a gas pumping device 82, a sewage tank 81, a valve assembly 88 and a control device 83. The gas pumping device 82 is configured to provide a gas source. The sewage tank 81 is configured to store liquid and is connected to an external liquid source through a liquid pumping pipe 85 to pump liquid and is connected to an external liquid discharge through a liquid discharge pipe 86 to discharge liquid. The valve assembly 88 is arranged between a flow outlet 815 of the sewage tank 81 and a discharge outlet 863 of the liquid discharge pipe 86, and the valve assembly 88 is opened or closed to correspondingly control the connection or disconnection between the flow outlet 815 and the discharge outlet 863. The control device 83 is connected to the gas pumping device 82 through a gas delivery pipe 84, is connected to the valve assembly 88 through a first pipe assembly 871, and the liquid pumping pipe 85 passes through the control device 83. The control device 83 is configured to control the connection or disconnection of the liquid pumping pipe 85 and the connection or disconnection between the gas delivery pipe 84 and the first pipe assembly 871. When the control device 83 is in a pre-liquid pumping state, the control device 83 controls the gas delivery pipe 84 and the first pipe assembly 871 to be connected, and the gas pumping device 82 provides positive pressure gas to the valve assembly 88 through the gas delivery pipe 84, the control device 83 and the first pipe assembly 871, so that the valve assembly 88 is closed to disconnect the flow outlet 815 and the discharge outlet 863. When the control device 83 is in a pre-liquid discharge state, the control device 83 controls the gas delivery pipe 84 and the first pipe assembly 871 to be connected, and the gas pumping device 82 provides negative pressure gas to the valve assembly 88 through the gas delivery pipe 84, the control device 83 and the first pipe assembly 871, so that the valve assembly 88 is opened to connect the flow outlet 815 and the discharge outlet 863.

[0169] Please refer to Figure 2 、 Figure 3 and Figure 7The present disclosure also provides a gas source system 80 of a base station 200, which includes a gas pumping device 82, a sewage tank 81, a valve assembly 88 and a control device 83. The gas pumping device 82 is configured to provide a gas source. The sewage tank 81 is configured to store liquid and is connected to a water source through a liquid pumping pipe 85 to pump in liquid and is connected to an outside through a liquid discharging pipe 86 to discharge liquid. The valve assembly 88 is arranged between a flow outlet 815 of the sewage tank 81 and a discharge outlet 863 of the liquid discharging pipe 86, and by opening or closing the valve assembly 88, the conduction or disconnection between the flow outlet 815 and the discharge outlet 863 is controlled. The control device 83 is connected to the gas pumping device 82 through a gas conveying pipe 84, is connected to the sewage tank 81 through a second pipe assembly 873, is connected to the clean water box 23 of the cleaning device 100 through a fourth pipe assembly 877, and is configured to control the conduction or disconnection of the liquid pumping pipe 85, the conduction or disconnection between the gas conveying pipe 84 and the second pipe assembly 873, and the conduction or disconnection between the gas conveying pipe 84 and the fourth pipe assembly 877. When the control device 83 is in a formal liquid pumping state, the control device 83 controls the conduction of the liquid pumping pipe 85 and the conduction of the gas conveying pipe 84 and the second pipe assembly 873, the liquid pumping pipe 85, the sewage tank 81, the second pipe assembly 873, the control device 83, the gas conveying pipe 84 and the gas pumping device 82 form a liquid pumping path together, the gas pumping device 82 provides negative pressure gas to the liquid pumping path, so that the sewage tank 81 pumps in liquid through the liquid pumping pipe 85, the control device 83 controls the conduction of the gas conveying pipe 84 and the fourth pipe assembly 877, and the gas pumping device 82 provides positive pressure gas to the clean water box 23 through the gas conveying pipe 84, the control device 83 and the fourth pipe assembly 877.

[0170] The base station 200 and the cleaning system 1000 of the embodiments of the present disclosure utilize the control device 83 to control the conduction of the gas conveying pipe 84 and the first pipeline assembly 871, and then utilize the gas pumping device 82 to provide positive pressure gas to the valve assembly 88 through the gas conveying pipe 84, the control device 83 and the first pipeline assembly 871, so as to make the valve assembly 88 disconnect the communication between the flow outlet 815 and the discharge outlet 863, and actively prepare for the conduction of the liquid pumping passage; the control device 83 is also utilized to control the conduction of the gas conveying pipe 84 and the first pipeline assembly 871, and then the gas pumping device 82 is utilized to provide negative pressure gas to the valve assembly 88 through the gas conveying pipe 84, the control device 83 and the first pipeline assembly 871, so as to make the valve assembly 88 conduct the communication between the flow outlet 815 and the discharge outlet 863, and actively prepare for the conduction of the liquid discharge passage, which can reduce the risk of blockage of the valve assembly 88, prolong the service life of the valve assembly 88, reduce the maintenance frequency of the user, and improve the user experience; at the same time, the same gas pumping device 82 and the same control device 83 can be utilized to control the conduction or closing of the liquid pumping passage and the liquid discharge passage, and then control the liquid pumping or liquid discharge of the sewage tank 81, so that the control of multiple components is integrated into the control device 83, and one gas source can realize multiple functions, which effectively reduces the cost, makes the overall structure of the base station 200 or the cleaning system 1000 more compact and simple and reliable, and thus improves the service life and functional reliability of the base station 200 or the cleaning system 1000.

[0171] The technical features of the above-described embodiments can be combined in any manner. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described, but it should be considered that any combination of the technical features is within the scope of the present disclosure. Other embodiments can be derived from the above-described embodiments, so that structural and logical substitutions and changes can be made without departing from the scope of the present disclosure.

[0172] The above-described embodiments only express several embodiments of the present disclosure, and the description is relatively specific and detailed, but it should not be considered as a limitation on the patent scope. It should be noted that for ordinary skilled persons in the art, several modifications and improvements can be made without departing from the concept of the present disclosure, and these are within the protection scope of the present disclosure. Therefore, the protection scope of the present patent of the present disclosure should be subject to the appended claims.

Claims

1. A base station, characterized by The utility model relates to a gas source system for a base station, comprising: a base station body; a gas source system arranged on the base station body, the gas source system comprising: a gas pumping device for providing a gas source; a sewage tank for storing liquid and connecting an external liquid source through a liquid suction pipe to suck in liquid and connecting the outside through a liquid discharge pipe to discharge liquid; a valve assembly arranged between a flow outlet of the sewage tank and a discharge outlet of the liquid discharge pipe, the valve assembly being opened or closed to correspondingly control the connection or disconnection between the flow outlet and the discharge outlet; and a control device connected to the gas pumping device through a gas delivery pipe, connected to the valve assembly through a first pipeline assembly, the liquid suction pipe passing through the control device, the control device being used to control the connection or disconnection of the liquid suction pipe and the connection or disconnection between the gas delivery pipe and the first pipeline assembly; wherein, when the control device is in a pre-liquid suction state, the control device controls the connection between the gas delivery pipe and the first pipeline assembly, the gas pumping device provides positive pressure gas to the valve assembly through the gas delivery pipe, the control device and the first pipeline assembly, so that the valve assembly is closed to disconnect the flow outlet and the discharge outlet; when the control device is in a pre-liquid discharge state, the control device controls the connection between the gas delivery pipe and the first pipeline assembly, the gas pumping device provides negative pressure gas to the valve assembly through the gas delivery pipe, the control device and the first pipeline assembly, so that the valve assembly is opened to connect the flow outlet and the discharge outlet. The control device is also connected to the sewage tank through a second pipeline assembly and is used to control the connection or disconnection between the gas delivery pipe and the second pipeline assembly; 2. The base station of claim 1, wherein wherein, when the control device is in a formal liquid suction state, the control device controls the connection of the liquid suction pipe and the connection between the gas delivery pipe and the second pipeline assembly, the liquid suction pipe, the sewage tank, the second pipeline assembly, the control device, the gas delivery pipe and the gas pumping device together form a liquid suction path, and the gas pumping device provides the negative pressure gas to the liquid suction path to make the sewage tank suck in liquid through the liquid suction pipe; when the control device is in a formal liquid discharge state, the control device controls the connection between the gas delivery pipe and the second pipeline assembly, the gas pumping device, the gas delivery pipe, the control device, the second pipeline assembly, the sewage tank, the valve assembly and the liquid discharge pipe together form a liquid discharge path, and the gas pumping device provides the positive pressure gas to the liquid discharge path to make the sewage tank discharge liquid to the outside through the liquid discharge pipe. The control device is also connected to the outside atmosphere through a third pipeline assembly and is used to control the connection or disconnection between the gas delivery pipe and the third pipeline assembly; 3. The base station of claim 2, wherein wherein, when the control device is in the formal liquid discharge state, the control device controls the connection between the gas delivery pipe and the third pipeline assembly, the third pipeline assembly, the control device, the gas delivery pipe and the gas pumping device together form a balance path, and the gas pumping device provides the negative pressure gas to the balance path to suck in external gas. ​ 4. The base station of claim 2, wherein, The control device is also communicated with a clean water box of the cleaning equipment through a fourth pipeline assembly, and is used for controlling the conduction or disconnection between the gas conveying pipe and the fourth pipeline assembly; Wherein, when the control device is in the formal liquid pumping state, the control device controls the conduction between the gas conveying pipe and the fourth pipeline assembly, the gas pumping device, the gas conveying pipe, the control device and the fourth pipeline assembly jointly form a gas pumping path, and the gas pumping device provides the positive pressure gas to the gas pumping path to be delivered to the clean water box.

5. The base station of claim 2, wherein, After the control device is switched from the pre-liquid pumping state to the formal liquid pumping state or from the pre-liquid discharging state to the formal liquid discharging state, the control device controls the disconnection between the gas conveying pipe and the first pipeline assembly.

6. The base station of claim 2, wherein, When the control device is in the zero state, the control device controls the conduction of the liquid pumping pipe and the conduction of the first pipeline assembly, the second pipeline assembly, the third pipeline assembly and the fourth pipeline assembly; In response to a liquid pumping instruction, the gas pumping device works, the control device is switched from the zero state to the pre-liquid pumping state and then from the pre-liquid pumping state to the formal liquid pumping state; when the liquid level in the sewage tank reaches a preset liquid level, the gas pumping device stops working, and the control device is switched from the formal liquid pumping state to the zero state; or, In response to a liquid discharging instruction, the gas pumping device works, the control device is switched from the zero state to the pre-liquid discharging state and then from the pre-liquid discharging state to the formal liquid discharging state; after the gas pumping device works for a preset time length, the gas pumping device stops working, and the control device is switched from the formal liquid discharging state to the zero state.

7. The base station according to any of claims 1-6, characterized by The control device comprises a body, a gas conveying pipe, a gas path pipe and a control switch assembly arranged on the body; The gas conveying pipe is communicated with the gas pumping device through the gas conveying pipe, the gas path pipe is communicated with the gas conveying pipe through the gas conveying pipe, the gas path pipe comprises a valve closing gas path, a valve opening gas path, a liquid pumping gas path, a liquid discharging gas path, a balance gas path and a gas pumping gas path, the valve closing gas path and the valve opening gas path are both communicated with the valve assembly through the first pipeline assembly, the liquid pumping gas path and the liquid discharging gas path are both communicated with the sewage tank through the second pipeline assembly, the balance gas path is communicated with the outside atmosphere through the third pipeline assembly, and the gas pumping gas path is communicated with the clean water box of the cleaning equipment through the fourth pipeline assembly; The control switch assembly controls the opening or closing of the valve assembly by controlling the opening or closing of the valve closing gas path and the valve opening gas path, controls the pumping or discharging of the sewage tank by controlling the opening or closing of the liquid pumping gas path, the liquid discharging gas path, the liquid pumping pipe and the balance gas path, and controls the input or non-input of the positive pressure gas to the clean water box by controlling the opening or closing of the gas pumping gas path. When the sewage tank is drawing liquid, the control device is in a formal liquid drawing state, the valve assembly is closed to disconnect the flow outlet and the discharge outlet, the control switch assembly is closed to the liquid drawing gas path, the valve opening gas path, the liquid discharging gas path and the balance gas path, and is opened to the liquid drawing gas path, the gas filling gas path and the liquid drawing pipe, the gas pumping device works, and the gas in the sewage tank is pumped out through the gas conveying pipe, the gas transmission pipe and the liquid drawing gas path, so that the liquid of the external liquid source enters the sewage tank under the action of negative pressure through the liquid drawing pipe; When the sewage tank is discharging liquid, the control device is in a formal liquid discharging state, the valve assembly is opened to connect the flow outlet and the discharge outlet, the control switch assembly is closed to the liquid drawing gas path, the gas filling gas path and the liquid drawing pipe, and is opened to the liquid discharging gas path and the balance gas path, the gas pumping device works, and the gas is conveyed to the sewage tank through the gas conveying pipe, the gas transmission pipe and the liquid discharging gas path, so that the liquid in the sewage tank is discharged to the outside of the gas source system through the liquid discharging pipe under the action of positive pressure.

8. The base station of claim 7, wherein the first pipe assembly comprises: a first pipe having one end in communication with the valve assembly; and a first tee having first, second and third flow ports in communication with each other, the first flow port being in communication with the other end of the first pipe, and the second and third flow ports being in communication with the valve closing gas path and the valve opening gas path, respectively; the second pipe assembly comprises: a second pipe having one end in communication with the sewage tank; and a second tee having first, second and third communication ports in communication with each other, the first communication port being in communication with the other end of the second pipe, and the second and third communication ports being in communication with the liquid drawing gas path and the liquid discharging gas path, respectively; the third pipe assembly comprises: a third pipe having one end in communication with the external atmosphere and the other end in communication with the balance gas path; or the third pipe assembly comprises: a third pipe having one end in communication with the external atmosphere; and a first two-way pipe having two open ends in communication with the other end of the third pipe and the balance gas path, respectively; and the fourth pipe assembly comprises: a fourth pipe having one end in communication with the clean water box and the other end in communication with the gas filling gas path; or the fourth pipe assembly comprises: a fourth pipe having one end in communication with the clean water box; and a second two-way pipe having two open ends in communication with the other end of the fourth pipe and the gas filling gas path, respectively. At least part of the liquid drawing pipe, the valve closing gas path, the valve opening gas path, the liquid drawing gas path, the liquid discharging gas path, the balance gas path and the gas filling gas path is flexible. The manner in which the control switch assembly closes the liquid drawing pipe, the valve closing gas path, the valve opening gas path, the liquid drawing gas path, the liquid discharging gas path, the balance gas path or the gas filling gas path includes at least one of the following manners: ​ ​ ​ ​ ​ ​ ​ 9. The base station of claim 7, wherein, ​ 10. The base station of claim 9, characterized in that, ​ bending a flexible portion of the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path or the gas filling gas path; bending a flexible portion of the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path or the gas filling gas path; clamping a flexible portion of the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path or the gas filling gas path.

11. The base station of claim 7, wherein, The gas transmission pipe comprises a first gas transmission pipe and a second gas transmission pipe, one end of the first gas transmission pipe is in communication with a first gas source port of the gas pumping device, one end of the second gas transmission pipe is in communication with a second gas source port of the gas pumping device, the gas transmission pipe comprises a first four-way joint and a second four-way joint, one interface of the first four-way joint is in communication with the other end of the first gas transmission pipe, the remaining three interfaces of the first four-way joint are in communication with the valve closing gas path, the liquid discharge gas path and the gas filling gas path respectively, one interface of the second four-way joint is in communication with the other end of the second gas transmission pipe, the remaining three interfaces of the second four-way joint are in communication with the valve opening gas path, the liquid suction gas path and the balance gas path respectively.

12. The base station of claim 7, wherein, The control switch assembly comprises: a pressing member; a driving module, an output end of the driving module is connected with the pressing member, and the driving module is used for driving the pressing member to move, so that the control device is switched among a zero position state, a pre-liquid suction state, a formal liquid suction state, a pre-liquid discharge state, a formal liquid discharge state; When the control device is in the zero position state, the pressing member opens the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path and the gas filling gas path; When the control device is in the pre-liquid suction state, the pressing member opens the liquid suction pipe, the valve closing gas path and the liquid suction gas path, and closes the valve opening gas path, the liquid discharge gas path, the balance gas path and the gas filling gas path; When the control device is in the pre-liquid discharge state, the pressing member opens the valve opening gas path and the liquid discharge gas path, and closes the liquid suction pipe, the valve closing gas path, the liquid suction gas path, the balance gas path and the gas filling gas path; When the control device is in the formal liquid suction state, the pressing member opens the liquid suction pipe, the liquid suction gas path and the gas filling gas path, and closes the valve opening gas path, the valve closing gas path, the liquid discharge gas path and the balance gas path; When the control device is in the formal liquid discharge state, the pressing member opens the liquid discharge gas path and the balance gas path, and closes the valve closing gas path, the liquid suction pipe, the valve opening gas path, the liquid suction gas path and the gas filling gas path.

13. The base station of claim 12, characterized in that, The driving module drives the pressing member to move in at least one of the following ways: The driving module is configured to drive the pressing member to rotate, so as to correspondingly squeeze at least one of the liquid suction pipe, the valve opening gas path, the valve closing gas path, the liquid suction gas path, the liquid discharge gas path, the air inflation gas path and the balance gas path when the control device is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state. The driving module is configured to drive the pressing member to move, so as to correspondingly bend at least one of the liquid suction pipe, the valve opening gas path, the valve closing gas path, the liquid suction gas path, the liquid discharge gas path, the air inflation gas path and the balance gas path when the control device is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state. The driving module is configured to drive the pressing member to open and close, so as to correspondingly clamp at least one of the liquid suction pipe, the valve opening gas path, the valve closing gas path, the liquid suction gas path, the liquid discharge gas path, the air inflation gas path and the balance gas path when the control device is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state.

14. The base station of claim 12, wherein, The pressing member includes a plurality of pressing members arranged along a first direction. In the control device, the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path and the air inflation gas path are arranged along a second direction and located at the periphery of the pressing member. The second direction is different from the first direction, and the driving module drives the pressing member to rotate.

15. The base station of claim 14, characterized in that, The control switch assembly further includes a rotating shaft, the pressing member is arranged on the rotating shaft, the rotating shaft is arranged along the first direction and connected with the driving module, and the driving module drives the rotating shaft to rotate to drive the pressing member to rotate. The number of the pressing members is at least four, and the at least four pressing members are arranged at intervals on the rotating shaft to correspondingly close at least one of the liquid suction pipe, the valve opening gas path, the valve closing gas path, the liquid suction gas path, the liquid discharge gas path, the air inflation gas path and the balance gas path when the control device is in the zero position state, the pre-liquid suction state, the formal liquid suction state, the pre-liquid discharge state or the formal liquid discharge state.

16. The base station of claim 14, wherein, The control switch assembly further includes a rotating shaft, the pressing member is arranged on the rotating shaft, the rotating shaft is arranged along the first direction and connected with the driving module, and the driving module drives the rotating shaft to rotate to drive the pressing member to rotate. In a third direction perpendicular to the first direction and the second direction, the rotating shaft includes opposite first and second sides, the valve closing gas path, the liquid discharge gas path and the air inflation gas path are located on the first side of the rotating shaft, and the valve opening gas path, the liquid suction gas path and the balance gas path are located on the second side of the rotating shaft. The number of the pressure applying members is at least four, and the at least four pressure applying members are arranged at intervals on the rotating shaft to form at least four avoiding spaces between the rotating shaft and the body. When the pressure applying members rotate to make at least one of the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path and the inflating gas path be located in the avoiding spaces, the liquid suction pipe, the valve closing gas path, the valve opening gas path, the liquid suction gas path, the liquid discharge gas path, the balance gas path or the inflating gas path located in the avoiding spaces are opened correspondingly.

17. The base station of claim 12, wherein, The body is internally formed with an inner cavity, and the pressure applying members are located in the inner cavity. The outer wall of the body is provided with a mounting hole communicating with the inner cavity, and the liquid suction pipe and the gas path pipe pass through the mounting hole and penetrate through the inner cavity.

18. The base station of claim 12, wherein, The control switch assembly further comprises a rotating shaft and a position detector, and the pressure applying members are arranged on the rotating shaft. The driving module comprises: a driving motor arranged on the body or the base station body; a speed reduction structure, one part of which is in transmission connection with the output end of the driving motor, and the other part is in transmission connection with the rotating shaft to drive the rotating shaft to rotate and drive the pressure applying members to rotate; the position detector is used to detect the rotating direction of the pressure applying members.

19. The base station of claim 1, wherein, The valve assembly comprises: a support, one end of which is connected with the flow outlet of the sewage tank, and the other end is connected with the discharge outlet of the liquid discharge pipe. The support is internally provided with a cavity, and the side wall of the support is provided with a gas passage. a valve body accommodated in the cavity. The side wall of the valve body and the inner wall of the support enclose an adjusting cavity. The gas passage is in communication with the adjusting cavity. The inner space of the valve body is separated from the adjusting cavity by the side wall of the valve body and is in communication with the flow outlet and the discharge outlet. The gas suction device provides the positive pressure gas to the adjusting cavity through the gas conveying pipe, the control device and the first pipeline assembly through the gas passage to make the valve assembly close. The gas suction device provides the negative pressure gas to the adjusting cavity through the gas conveying pipe, the control device and the first pipeline assembly through the gas passage to make the valve assembly open.

20. The base station of claim 19, wherein, The base station body is further provided with a cleaning tank in communication with the liquid suction pipe. The cleaning tank is used to accommodate and clean the cleaning member of the cleaning equipment. When the cleaning equipment enters the parking position of the base station and starts to execute the process of cleaning the cleaning member, water is injected into the cleaning tank and / or on the cleaning member to clean the cleaning member. When the base station is in the liquid suction state, the liquid after cleaning the cleaning member enters the sewage tank through the liquid suction pipe. When the base station is in the liquid discharge state, the liquid in the sewage tank is discharged to the outside through the liquid discharge pipe.

21. A base station, characterized by It comprises: a base station body; and a gas source system arranged on the base station body. The gas source system comprises: a gas suction device for providing a gas source; a sewage tank for storing liquid and connecting with a water source through a liquid suction pipe to suck liquid and connecting with the outside through a liquid discharge pipe to discharge liquid; a valve assembly disposed between a flow outlet of the sewage tank and a discharge outlet of the discharge pipe, and through opening or closing the valve assembly to correspondingly control the connection or disconnection between the flow outlet and the discharge outlet; and a control device in communication with the gas pumping device through a gas delivery pipe, in communication with the sewage tank through a second pipe assembly, in communication with a clean water box of the cleaning device through a fourth pipe assembly, and configured to control the connection or disconnection of the discharge pipe, the connection or disconnection between the gas delivery pipe and the second pipe assembly, and the connection or disconnection between the gas delivery pipe and the fourth pipe assembly; wherein, when the control device is in a formal liquid pumping state, the control device controls the discharge pipe to be connected and the gas delivery pipe and the second pipe assembly to be connected, the discharge pipe, the sewage tank, the second pipe assembly, the control device, the gas delivery pipe and the gas pumping device together form a liquid pumping path, the gas pumping device provides negative pressure gas to the liquid pumping path to make the sewage tank pump liquid through the discharge pipe, the control device controls the gas delivery pipe and the fourth pipe assembly to be connected, and the gas pumping device provides positive pressure gas to the clean water box through the gas delivery pipe, the control device and the fourth pipe assembly; when the control device is in a formal liquid pumping state, the control device controls the gas delivery pipe and the second pipe assembly to be connected, the gas pumping device, the gas delivery pipe, the control device, the second pipe assembly, the sewage tank, the valve assembly and the discharge pipe together form a liquid pumping path, the gas pumping device provides positive pressure gas to the liquid pumping path to make the sewage tank pump liquid through the discharge pipe.

22. A cleaning system characterized by, comprising: a cleaning device; and a base station, the cleaning device being movable into the base station for maintenance, the base station comprising: a base station body; and a gas source system, the gas source system being disposed on the base station body, the gas source system comprising: a gas pumping device for providing a gas source; a sewage tank for storing liquid and connecting an external liquid source through a discharge pipe to pump liquid and connecting an external through a discharge pipe to discharge liquid; a valve assembly disposed between a flow outlet of the sewage tank and a discharge outlet of the discharge pipe, and through opening or closing the valve assembly to correspondingly control the connection or disconnection between the flow outlet and the discharge outlet; and a control device in communication with the gas pumping device through a gas delivery pipe, in communication with the valve assembly through a first pipe assembly, the discharge pipe passing through the control device, and the control device being configured to control the connection or disconnection of the discharge pipe and the connection or disconnection between the gas delivery pipe and the first pipe assembly; wherein, when the control device is in a pre-liquid pumping state, the control device controls the gas delivery pipe and the first pipe assembly to be connected, and the gas pumping device provides positive pressure gas to the valve assembly through the gas delivery pipe, the control device and the first pipe assembly to make the valve assembly close to disconnect the flow outlet and the discharge outlet; In the pre-priming state, the control device controls the gas delivery pipe and the first pipe assembly to be in communication, and the gas pumping device provides negative pressure gas to the valve assembly through the gas delivery pipe, the control device and the first pipe assembly, so that the valve assembly is opened to make the flow outlet and the discharge outlet in communication.

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