Spin dryer rotation cavity compatible with wafers of multiple sizes
By designing a rotary chamber compatible with multi-size wafers and employing high-speed centrifugal drying, the problem of easy particle contamination during the handling of silicon wafers in a humid state in existing technologies has been solved. This achieves efficient and uniform dehydration within the equipment, thereby improving product quality.
Patent Information
- Application Number
- CN202423317664.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-31
- Publication Date
- 2025-12-19
- Estimated Expiration
- 2034-12-31
AI Technical Summary
Existing semiconductor cleaning equipment relies on external centrifugal drying methods during the drying process, which causes silicon wafers to be handled in a damp state, making them prone to particle contamination and affecting product quality.
Design a rotary chamber for a multi-size wafer spin dryer, comprising a support platform, a rotary chamber assembly, and a drive assembly. It uses wafer baskets of different sizes to carry the wafers. The rotary chamber is driven by a motor to rotate at high speed to generate centrifugal force to spin dry the water. The rotation angle is detected by a photoelectric sensor and integrated inside the equipment to prevent particle contamination.
This achieves uniform dehydration inside the equipment, preventing silicon wafers from becoming contaminated with particles during handling and improving product quality.
Smart Images

Figure CN223691454U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to a spin dryer rotary cavity which is compatible with multiple sizes of wafers. BACKGROUND
[0002] In the process of semiconductor cleaning equipment, there is a dehydration process after wafer cleaning. The dehydration treatment methods mainly include centrifugal spin-drying, nitrogen drying, and surface tension drying. Currently, domestic equipment manufacturers cannot realize the dry-out function requirement due to technical reasons when producing equipment. In terms of drying, they often rely on the centrifugal spin-drying method outside the equipment. The biggest disadvantage of this method is that the silicon wafer must be transported in a wet state, and it is easy to contaminate the particles in the air during the transportation process, which causes the quality of the product to decrease. SUMMARY
[0003] In view of the above problems, the utility model aims at providing a spin dryer rotary cavity which is compatible with multiple sizes of wafers.
[0004] The technical scheme of the utility model is as follows
[0005] A spin dryer rotary cavity which is compatible with multiple sizes of wafers, comprising a support table, a rotary cavity assembly is installed above the support table, and a drive assembly for driving the rotary cavity assembly to rotate is installed below the support table; the rotary cavity assembly comprises a drive seat and a rotary cavity installed on the drive seat; the rotary cavity comprises an upper support ring and a lower support disc, and an installation space is formed between the upper support ring and the lower support disc, four wafer basket carrying stations are uniformly distributed on the installation space, a first wafer basket carrying box is installed on each of one pair of oppositely arranged wafer basket carrying stations, and a second wafer basket carrying box is installed on each of the other pair of oppositely arranged wafer basket carrying stations.
[0006] The first wafer basket carrying box and the second wafer basket carrying box are different in size.
[0007] The drive assembly comprises a motor, a first transmission wheel is installed on the motor drive shaft, and the first transmission wheel is in transmission connection with a second transmission wheel through a conveying belt; the second transmission wheel is located directly below the drive seat, a rotating shaft is arranged in a mounting hole in the center of the second transmission wheel, and the rotating shaft penetrates through the support table and the drive seat and is connected with the lower support disc.
[0008] An L-shaped support arm is arranged on the support table on one side of the second transmission wheel, and a photoelectric sensor is arranged on the exposed end of the support arm.
[0009] The first wafer basket carrying box and the second wafer basket carrying box each comprise two support side plates oppositely arranged on the lower support disc, a first connecting rod connecting the two support side plates, and the top surface of the support side plate is connected with the upper support ring through a screw; a placing box matched with the shape of the wafer basket is installed between the two support side plates, and a second connecting rod connecting the two support side plates is arranged on the placing box.
[0010] The placing box is provided with outwardly folded edges on four side edges close to the inner end of the rotating shaft.
[0011] By adopting the technical scheme, the placing box is integrated in the equipment; therefore, the silicon wafer quality will not be affected by the particles during the carrying. Different wafer baskets are adopted, and multiple sizes of wafers can be compatible. The rotating cavity can realize relatively uniform dehydration effect. BRIEF DESCRIPTION OF DRAWINGS
[0012] Figure 1 It is a structural schematic view of the utility model;
[0013] Figure 2 It is a three-dimensional structural schematic view of the utility model;
[0014] Figure 3 It is a structural schematic view of the placing box of the utility model;
[0015] In the drawings, 1 is a support table, 2 is a rotating cavity assembly, 3 is a driving assembly, 4 is a driving seat, 5 is a rotating cavity, 6 is an upper support ring, 7 is a lower support disc, 8 is a wafer basket bearing station, 9 is a first wafer basket bearing box, 10 is a second wafer basket bearing box, 11 is a motor, 12 is a first transmission wheel, 13 is a conveying belt, 14 is a second transmission wheel, 15 is a rotating shaft, 16 is a support arm, 17 is a photoelectric sensor, 18 is a support side plate, 19 is a first connecting rod, 20 is a placing box, 21 is a second connecting rod, and 22 is an edge. DETAILED DESCRIPTION
[0016] In order to make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme of the embodiments of the utility model will be described clearly and completely in combination with the drawings of the embodiments of the utility model. Obviously, the described embodiments are part of the embodiments of the utility model, rather than all the embodiments. Based on the described embodiments of the utility model, all other embodiments obtained by those skilled in the art without creative labor belong to the protection scope of the utility model.
[0017] A spin-dryer rotary cavity compatible with multiple sizes of wafers, comprising a support table 1, a rotary cavity assembly 2 installed above the support table, and a drive assembly 3 installed below the support table to drive the rotary cavity assembly to rotate; the rotary cavity assembly comprises a drive seat and a rotary cavity 5 installed on the drive seat 4; the rotary cavity comprises an upper support ring 6 and a lower support disc 7, and an installation space is formed between the upper support ring and the lower support disc, and four wafer basket carrying stations 8 are uniformly distributed on the installation space, wherein a first wafer basket carrying box 9 is installed on each of the oppositely arranged wafer basket carrying stations, and a second wafer basket carrying box 10 is installed on each of the other oppositely arranged wafer basket carrying stations. The wafer basket is installed in the wafer basket carrying box, and the rotary cavity is driven to rotate at high speed by the motor of the drive assembly, so that a centrifugal force is generated, and water is quickly spun off from the surface of the wafer under the action of the centrifugal force. The drive assembly drives the rotary cavity to rotate with four wafer basket carrying stations, and the two oppositely arranged wafer basket carrying stations are a group of wafer basket carrying boxes of the same type, so that the rotary cavity has two different types of wafer basket carrying boxes.
[0018] The first wafer basket carrying box and the second wafer basket carrying box are different in size. The wafer basket can be rotated to the appropriate size for dehydration as needed.
[0019] The drive assembly comprises a motor 11, a first transmission wheel 12 installed on the motor drive shaft, a transmission belt 13, and a second transmission wheel 14 in transmission connection; the second transmission wheel is located directly below the drive seat, a rotating shaft 15 is arranged in the central mounting hole of the second transmission wheel, and the rotating shaft penetrates through the support table and the drive seat and is connected with the lower support disc. The motor drives the first transmission wheel to rotate, which drives the second transmission wheel to rotate through the transmission belt. Since the second transmission wheel has a rotating shaft in the center, the rotation of the second transmission wheel will drive the rotating shaft to rotate. Since the rotating shaft is connected with the lower support disc, the rotation of the rotating shaft drives the entire rotary cavity to rotate.
[0020] An L-shaped support arm 16 is arranged on the support table on one side of the second transmission wheel, and a photoelectric sensor 17 is arranged on the exposed end of the support arm. The photoelectric sensor is used to detect the rotation angle.
[0021] The first wafer basket carrying box and the second wafer basket carrying box each comprise two support side plates 18 oppositely arranged on the lower support disc, a first connecting rod 19 connecting the two support side plates, and the top surface of the support side plate is connected with the upper support ring through a screw; a placing box 20 matched with the shape of the wafer basket is arranged between the two support side plates, and a second connecting rod 21 connecting the two support side plates is arranged on the placing box. A support space for installing the wafer basket is formed.
[0022] Four side edges of the placing box close to the inner side of the rotating shaft are each provided with an outwardly folded edge 22. The wafer basket can be guided when being put into the wafer basket carrying box, and the wafer basket can be better slid into the carrying box.
Claims
1. A spin-dryer rotary cavity compatible with multiple wafer sizes, characterized in that, The application relates to a rotary cavity assembly and a driving assembly thereof.
2. A spin dryer rotary chamber compatible with wafers of different sizes according to claim 1, characterized in that, The first slice basket carrying box and the second slice basket carrying box are different in size.
3. A spin dryer rotary chamber compatible with wafers of different sizes according to claim 1, characterized in that, The driving assembly comprises a motor, a first transmission wheel mounted on a driving shaft of the motor, a transmission belt and a second transmission wheel; the second transmission wheel is located directly below the driving seat, a rotating shaft is arranged in a mounting hole in the center of the second transmission wheel, and the rotating shaft penetrates through the support table and the driving seat and is connected with the lower supporting disc.
4. A spin dryer rotary chamber compatible with wafers of different sizes according to claim 3, wherein, An L-shaped supporting arm is arranged on the support table on one side of the second transmission wheel, and a photoelectric sensor is arranged on the exposed end of the supporting arm.
5. A spin dryer rotary chamber compatible with multiple wafer sizes according to claim 1, wherein, The first slice basket carrying box and the second slice basket carrying box each comprise two supporting seat side plates oppositely arranged on the lower supporting disc, a first connecting rod connecting the two supporting seat side plates, and a placing box with a shape matched with that of the slice basket and arranged between the two supporting seat side plates; the top surface of the supporting seat side plate is connected with the upper supporting ring through screws; and a second connecting rod connecting the two supporting seat side plates is arranged on the placing box.
6. A spin dryer rotary chamber compatible with multiple wafer sizes according to claim 5, wherein, Four side edges of the placing box close to the inner side end of the rotating shaft are each provided with an outwardly folded edge.