PECVD (plasma enhanced chemical vapor deposition) cavity cleaning device
By integrating chemical cleaning, water rinsing, and high-temperature drying into the PECVD chamber cleaning device, the problem of cleaning deposit residues and impurities in the PECVD chamber has been solved, achieving efficient and comprehensive cleaning results and improving film quality and cleaning efficiency.
Patent Information
- Application Number
- CN202520218618.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-12
- Publication Date
- 2025-12-26
- Estimated Expiration
- 2035-02-12
AI Technical Summary
Existing technologies are insufficient to effectively clean deposited residues and impurities within the PECVD chamber, affecting the uniformity and quality of the film. Furthermore, the dispersed nature of the cleaning equipment leads to low efficiency.
A PECVD cavity cleaning device integrating chemical cleaning, water rinsing, and high-temperature drying was designed. The device uses nozzles to perform high-pressure cleaning and rotational cleaning on the inner and outer walls of the cavity, and combines hydraulic telescopic rods and motor drive to achieve comprehensive cleaning.
It achieves comprehensive and efficient cleaning of the PECVD chamber, shortens cleaning time, ensures cleanliness and purity, and saves energy and time costs.
Smart Images
Figure CN223717936U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to the technical field of PECVD, specifically relates to a PECVD cavity cleaning device. BACKGROUND
[0002] PECVD is an important thin film deposition technology widely used in many fields such as semiconductor manufacturing, photovoltaic industry, optical film preparation and material surface modification. In the PECVD process, the reaction gas is excited to form plasma in the cavity, and then chemical reaction occurs to deposit the required thin film on the substrate. However, during the deposition process, due to the influence of various factors, it will bring many problems to the PECVD cavity, so that cleaning becomes an essential operation.
[0003] On the one hand, during the thin film deposition process, the reaction gas will produce deposition residues at the positions of the inner wall of the cavity, the susceptor, the support structure, the gas jet and the gas inlet pipeline under the action of the plasma. For example, when depositing silicon dioxide film, the silicon-containing compounds produced by the reaction of silane and oxygen may adhere to the inner wall of the cavity; when depositing silicon nitride film, the products of the reaction of ammonia and silane will also leave deposits everywhere in the cavity. These deposits will gradually accumulate as the deposition process continues, which will have adverse effects on the PECVD process. First of all, they will change the physical and chemical environment inside the cavity, causing changes in the gas flow state inside the cavity, affecting the uniform distribution of the reaction gas, and then affecting the uniformity and quality of the thin film. Secondly, the deposits may peel off, causing particle contamination on the surface of the thin film, resulting in defects in the thin film and reducing the performance and yield of the thin film.
[0004] On the other hand, the action of the plasma will cause etching and other effects on the components inside the cavity. The inner wall of the cavity will produce sputtering effect under the bombardment of the plasma, and the generated substances will combine with the reaction gas to form impurities. In addition, particle impurities may be introduced into the cavity, such as impurity particles in the gas source or particles falling off from the surface of the substrate, which will affect the integrity and performance of the thin film during the deposition process.
[0005] Currently, the cleaning of PECVD cavity usually adopts traditional cleaning methods. For example, mechanical wiping, which is difficult to reach some complex structures and hard-to-reach parts inside the cavity, has poor cleaning effect; ultrasonic cleaning cannot effectively remove some deposits that are tightly combined with the surface of the cavity; and although plasma cleaning can clean the cavity to a certain extent, it is not ideal to use it alone for cleaning complex chemical deposits, and often needs to be combined with chemical cleaning. However, there is a lack of a convenient integrated cleaning device to effectively combine these cleaning methods in the prior art. SUMMARY
[0006] The utility model discloses in order to solve above -mentioned problem, design a kind of PECVD cavity cleaning device.
[0007] In order to realize the above technical purpose, reach the above technical effect, the utility model is through following technical scheme implementation:
[0008] A kind of PECVD cavity cleaning device, including base, the top end wall both sides of the base are equipped with top seat by support column, the top end wall middle part of the top seat is equipped with cleaning bucket, the bottom end wall of the cleaning bucket is equipped with drain pipe, two branches of the drain pipe are equipped with drain sub-pipe one and drain sub-pipe two respectively, the top end wall both sides of the top seat are equipped with hydraulic telescopic rod, the drive top end of the hydraulic telescopic rod is equipped with support seat, the top end wall middle part of the support seat is equipped with shell, the top end wall of the shell is equipped with motor, the outer wall both sides of the shell are equipped with water inlet pipe and liquid inlet pipe respectively, the upper and lower inner walls of the shell are rotatably connected with rotating rod by bearing one, and the top end of rotating rod is fixedly connected with the output end of motor by coupling, the outer wall of rotating rod is equipped with through-hole, which is communicated with inner cavity, the bottom end of rotating rod extends out of shell, and is equipped with cleaning mechanism, the outer wall of rotating rod is equipped with drying mechanism.
[0009] Further, the drying mechanism includes a cover, the outer wall of the cover is rotatably connected between the bearing two and the rotating rod, the top end wall of the cover is equipped with one end of the air inlet pipe, the lower end surface of the cover is equipped with a plurality of exhaust holes communicated with the inner cavity.
[0010] Further, the outer ring of the bearing two is fixedly connected with the outer wall of the cover by bearing seat, and the inner ring of the bearing two is connected with the outer wall of the rotating rod by interference fit.
[0011] Further, the cleaning mechanism includes a connecting plate, the bottom end wall both sides of the connecting plate are equipped with round rods, the inner side wall of the round rod is equipped with a plurality of spray heads one, the bottom end wall middle part of the connecting plate is equipped with connecting rod, and the outer wall of the connecting rod is equipped with a plurality of spray heads two.
[0012] Further, the spray head one is double-row inwardly arranged, and the spray head two is double-row outwardly arranged.
[0013] The utility model has the advantages of:
[0014] The PECVD cavity cleaning device integrates multiple cleaning modes, can comprehensively and efficiently clean each part of the PECVD cavity, can effectively remove deposition residues at positions such as an inner wall of the cavity, a base, a support structure, a gas nozzle and a gas inlet pipeline by spraying high-pressure chemical cleaning liquid on the outer wall and the inner wall of the cavity through the spray head one and the spray head two, and can ensure that the cleaning liquid can cover every corner of the cavity by rotating the motor-driven spray head around the PECVD cavity, so that even some complex structures and hard-to-reach parts can be effectively cleaned;
[0015] The cleaning device integrates multiple cleaning steps such as chemical cleaning, water flushing and high-temperature drying in one device, is convenient to operate, and only needs to place the PECVD cavity into the cleaning barrel, sequentially inject the chemical cleaning liquid, rotate and spray, flush with water and dry with high-temperature gas according to the set program, does not need to frequently transfer the cavity between different cleaning devices and processes, greatly shortens the cleaning time, improves the cleaning efficiency, can completely remove the residual chemical cleaning agent in the cavity through water flushing after chemical cleaning, avoids pollution of the subsequent deposition process caused by the residual chemical reagent, ensures the purity of the PECVD process, and the high-temperature gas drying step quickly dries the cleaned PECVD cavity by using high-temperature gas, does not need additional drying equipment or long-time natural drying, saves energy and time cost. BRIEF DESCRIPTION OF DRAWINGS
[0016] In order to more clearly illustrate the technical scheme of the embodiments of the utility model, the following will be briefly introduced the drawings needed to be used in the embodiment description, obviously, the drawings in the following description only some embodiments of the utility model, for the person skilled in the art comes, under the premise of not paying the creative labor, can also obtain other drawings according to these drawings.
[0017] Fig. 1 It is the structure schematic diagram of the utility model;
[0018] Fig. 2 It is the structure schematic diagram of the cleaning mechanism of the utility model.
[0019] In the drawings, the component list represented by each sign is as follows:
[0020] 1, base, 2, support column, 3, top seat, 4, cleaning barrel, 5, drain pipe, 6, drain sub-pipe one, 7, drain sub-pipe two, 8, hydraulic telescopic rod, 9, support seat, 10, shell, 11, motor, 12, water inlet pipe, 13, liquid inlet pipe, 14, rotating rod, 15, through hole, 16, cover, 17, gas inlet pipe, 18, connecting plate, 19, round rod, 20, spray head one, 21, connecting rod, 22, spray head two. DETAILED DESCRIPTION
[0021] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of the utility model.
[0022] Referring to Figs. 1-2 As shown in the figure, a PECVD cavity cleaning device, including base 1, the top wall both sides of base 1 are equipped with top seat 3 through support column 2, the top wall middle part of top seat 3 is equipped with cleaning barrel 4, the bottom wall of cleaning barrel 4 is equipped with drain pipe 5, two branches of drain pipe 5 are equipped with drain sub-pipe one 6 and drain sub-pipe two 7 respectively, the top wall both sides of top seat 3 are equipped with hydraulic telescopic rod 8, the driving top end between hydraulic telescopic rod 8 is equipped with support seat 9, the top wall middle part of support seat 9 is equipped with shell 10, the top wall of shell 10 is equipped with motor 11, the outer wall both sides of shell 10 are equipped with water inlet pipe 12 and liquid inlet pipe 13 respectively, the upper and lower inner walls of shell 10 are rotatably connected with rotating rod 14 through bearing one, and the top end of rotating rod 14 is fixedly connected with the output end of motor 11 through a shaft coupling, the outer wall of rotating rod 14 is provided with through hole 15 which is communicated with the inner cavity, the bottom end of rotating rod 14 extends out of shell 10, and is equipped with cleaning mechanism, the outer wall of rotating rod 14 is equipped with drying mechanism.
[0023] Further, the drying mechanism includes a cover 16, the outer wall of the cover 16 is rotatably connected between the rotating rod 14 and the bearing two, the top end wall of the cover 16 is equipped with one end of the air inlet pipe 17, the lower end face of the cover 16 is provided with a plurality of exhaust holes communicated with the inner cavity, the high-temperature gas is transported into the cover 16 through the air inlet pipe 17, and is discharged into the cleaning barrel 4 through the exhaust hole, the PECVD cavity is dried, and after cleaning and drying, the cover 16 is opened upward, and the PECVD cavity is taken out from the cleaning barrel 4.
[0024] Further, the outer ring of the bearing two is fixedly connected with the outer wall of the cover 16 through the bearing seat, the inner ring of the bearing two is connected with the outer wall of the rotating rod 14 in interference fit, the cover 16 is fixed on the outer wall of the rotating rod 14 through the bearing two, and the rotation of the rotating rod 14 is not affected.
[0025] Further, the cleaning mechanism comprises a connecting plate 18, the bottom end wall of the connecting plate 18 is provided with a circular rod 19 on both sides, a plurality of spray heads one 20 are arranged on the inner side wall of the circular rod 19, a connecting rod 21 is arranged in the middle of the bottom end wall of the connecting plate 18, a plurality of spray heads two 22 are arranged on the outer wall of the connecting rod 21, clean water is injected into the shell 10 through the water inlet pipe 12 and enters the rotating rod 14, the connecting plate 18, the circular rod 19 and the connecting rod 21, and is sprayed out through the spray heads one 20 and the spray heads two 22, and the spray heads one 20 and the spray heads two 22 perform circumferential rotary motion around the PECVD cavity, and the outer wall and the inner wall of the PECVD cavity are washed through the clean water, and the chemical cleaning agent is washed away.
[0026] Further, the spray heads one 20 are double rows arranged towards the inner side, the spray heads two 22 are double rows arranged towards the outer side, and the cleaning liquid and the clean water can be uniformly sprayed on the outer wall and the inner wall of the PECVD cavity through the spray heads one 20 and the spray heads two 22 to perform cleaning operation.
[0027] Through the personnel in the art, all electrical components and parts in the case are general standard parts or parts known to those skilled in the art, the structure and principle of which are known to those skilled in the art through technical manual or through conventional experimental method, the model and the scheme are adapted to normally operate, all electrical components in the case and the power supply adapted thereto are connected through wires, and according to the actual situation, a suitable controller is selected to meet the control requirement, the specific connection and control sequence should be referred to the working principle below, the working sequence of each electrical component is completed, the detailed connection means is a known technology in the art, and the electrical control is not described.
[0028] One specific application of the embodiment is:
[0029] In use, the PECVD cavity is placed into the cleaning barrel 4, the support base 9 drives the shell 10, the rotating rod 14, the cover 16, the circular rod 19 and the connecting rod 21 and the like to move downwards by the hydraulic telescopic rod 8, the cover 16 is covered on the cleaning barrel 4, the circular rod 19 is placed outside the outer wall of the PECVD cavity, the connecting rod 21 is placed in the inner cavity of the PECVD cavity, the chemical cleaning liquid after being pressurized is injected into the shell 10 through the liquid inlet pipe 13, enters the rotating rod 14 through the through hole 15, enters the connecting plate 18, the circular rod 19 and the connecting rod 21 through the rotating rod 14, is sprayed out through the nozzle one 20 and the nozzle two 22, the cleaning liquid sprayed out through the nozzle one 20 is used for high-pressure cleaning the outer wall of the PECVD cavity, the cleaning liquid sprayed out through the nozzle two 22 is used for cleaning the inner wall of the PECVD cavity, the connecting plate 18, the circular rod 19, the nozzle one 20, the connecting rod 21 and the nozzle two 22 are rotated by the rotating rod 14 after the motor 11 is started, the nozzle one 20 and the nozzle two 22 are circularly rotated around the PECVD cavity, the outer wall and the inner wall of the PECVD cavity are comprehensively high-pressure cleaned, after cleaning, the cleaning liquid is discharged from the cleaning barrel 4 through the liquid discharge branch pipe two 7;
[0030] The clean water is injected into the shell 10 through the water inlet pipe 12 and enters the rotating rod 14, the connecting plate 18, the circular rod 19 and the connecting rod 21, is sprayed out through the nozzle one 20 and the nozzle two 22, and is circularly rotated around the PECVD cavity through the nozzle one 20 and the nozzle two 22, the outer wall and the inner wall of the PECVD cavity are washed through the clean water, the chemical cleaning agent is washed away, after washing, the clean water is discharged from the cleaning barrel 4 through the liquid discharge branch pipe one 6;
[0031] The high-temperature gas is delivered into the cover 16 through the gas inlet pipe 17 and is discharged to the cleaning barrel 4 through the gas discharge hole, the PECVD cavity is dried, after cleaning and drying, the cover 16 is opened upwards, and the PECVD cavity is taken out from the cleaning barrel 4.
[0032] Of course, the above description is not a limitation of the present application, the present application is not limited to the above examples, the changes, changes, additions or replacements made by the ordinary skilled in the art within the essential scope of the present application shall belong to the protection scope of the present application.
Claims
1. A PECVD chamber cleaning apparatus, characterized by: The base (1) comprises a top wall, The top wall of the top seat (3) is provided with a cleaning barrel (4) in the middle, the bottom wall of the cleaning barrel (4) is provided with a liquid discharge pipe (5), the two branches of the liquid discharge pipe (5) are respectively provided with a liquid discharge sub-pipe one (6) and a liquid discharge sub-pipe two (7), the top wall of the top seat (3) is provided with a hydraulic telescopic rod (8) on the left and right sides, the driving top ends of the hydraulic telescopic rod (8) are provided with a support seat (9), the top wall of the support seat (9) is provided with a shell (10) in the middle, the top wall of the shell (10) is provided with a motor (11), the outer wall of the shell (10) is provided with a water inlet pipe (12) and a liquid inlet pipe (13) on the left and right sides, the upper and lower inner walls of the shell (10) are rotatably connected with a rotating rod (14) through a bearing one, and the top end of the rotating rod (14) is fixedly connected with the output end of the motor (11) through a shaft coupling, the outer wall of the rotating rod (14) is provided with a through hole (15) in communication with the inner cavity, the bottom end of the rotating rod (14) extends out of the shell (10), and a cleaning mechanism is arranged, and a drying mechanism is arranged on the outer wall of the rotating rod (14).
2. The PECVD chamber cleaning apparatus of claim 1, wherein: The drying mechanism comprises a cover (16), the outer wall of the cover (16) is rotatably connected between the rotating rod (14) and the bearing two, one end of the air inlet pipe (17) is arranged on the top wall of the cover (16), and a plurality of exhaust holes in communication with the inner cavity are arranged on the lower end face of the cover (16).
3. The PECVD chamber cleaning apparatus of claim 2, wherein: The outer ring of the bearing two is fixedly connected with the outer wall of the cover (16) through a bearing seat, and the inner ring of the bearing two is connected with the outer wall of the rotating rod (14) in interference fit.
4. The PECVD chamber cleaning apparatus of claim 1, wherein: The cleaning mechanism comprises a connecting plate (18), the bottom wall of the connecting plate (18) is provided with a circular rod (19) on the left and right sides, a plurality of nozzle one (20) are arranged on the inner side wall of the circular rod (19), the bottom wall of the connecting plate (18) is provided with a connecting rod (21) in the middle, and a plurality of nozzle two (22) are arranged on the outer wall of the connecting rod (21).
5. The PECVD chamber cleaning apparatus of claim 4, wherein: The nozzle one (20) is double-row inwardly arranged, and the nozzle two (22) is double-row outwardly arranged.