Polishing equipment

Abstract

The utility model discloses polishing equipment which comprises a polishing pool, a bubbling device and an air pressure adjusting device, the bubbling device comprises an air supply assembly, a first bubbling assembly and a second bubbling assembly, and the first bubbling assembly and the second bubbling assembly are arranged in the polishing pool in a spaced mode. The first bubbling assembly and the second bubbling assembly are respectively communicated with the air supply assembly, a plurality of first air holes are formed in the first bubbling assembly at intervals, and a plurality of second air holes are formed in the second bubbling assembly at intervals; the air pressure adjusting device comprises a first air pressure adjusting piece and a second air pressure adjusting piece, the first air pressure adjusting piece adjusts the air pressure in the first bubbling assembly, the second air pressure adjusting piece adjusts the air pressure in the second bubbling assembly, and the air pressure in the first bubbling assembly is not equal to the air pressure in the second bubbling assembly. And therefore, high-low pressure gas convection is formed in the polishing pool to greatly disturb the chemical polishing solution, the flowing uniformity of the chemical polishing solution is improved, and the polishing quality is improved.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the technical field of chemical polishing, and particularly relates to a polishing equipment. BACKGROUND

[0002] At present, electronic panel products commonly used are ceramic, metal, plastic, glass and the like, in the actual production process, in order to obtain better visual effect, electronic panel products are usually put into chemical polishing tank to carry out chemical polishing, however, the chemical polishing liquid in the chemical polishing tank flows unevenly, so that the product surface forms a larger color difference in each area after polishing, and the product polishing quality is affected. UTILITARY MODEL CONTENTS

[0003] In view of the above defects or insufficient, the utility model provides a polishing equipment, aims at solving the technical problems of uneven chemical polishing liquid flow and large color difference of product surface in each area.

[0004] In order to realize the above purpose, the utility model provides a polishing equipment, and the polishing equipment comprises:

[0005] A polishing tank;

[0006] A bubbling device, comprising a gas supply assembly, a first bubbling assembly and a second bubbling assembly, the first bubbling assembly and the second bubbling assembly are arranged in the polishing tank along the width direction of the polishing tank, and the first bubbling assembly and the second bubbling assembly are communicated with the gas supply assembly, a plurality of first air holes are arranged on the first bubbling assembly, and a plurality of second air holes are arranged on the second bubbling assembly;

[0007] A gas pressure adjusting device, comprising a first gas pressure adjusting part and a second gas pressure adjusting part, the first gas pressure adjusting part is arranged on the first bubbling assembly and adjusts the gas pressure in the first bubbling assembly, the second gas pressure adjusting part is arranged on the second bubbling assembly and adjusts the gas pressure in the second bubbling assembly, and the gas pressure in the first bubbling assembly is not equal to the gas pressure in the second bubbling assembly.

[0008] In the utility model embodiment, the gas pressure adjusting device further comprises a controller, the controller is communicated with the first gas pressure adjusting part and the second gas pressure adjusting part respectively, the controller controls the first gas pressure adjusting part to adjust the gas pressure in the first bubbling assembly and controls the second gas pressure adjusting part to adjust the gas pressure in the second bubbling assembly respectively, so that the gas pressure in the first bubbling assembly and the gas pressure in the second bubbling assembly are alternately changed in size.

[0009] In the embodiment of the utility model, first bubble assembly includes first air inlet pipe and a plurality of first bubble pipe, one end of first air inlet pipe communicates with gas supply component, the other end of first air inlet pipe branch and a plurality of first bubble pipe communicate, a plurality of first bubble pipe are spaced apart in the polishing pool along the width direction of polishing pool, and a plurality of first air holes are arranged along the length direction of polishing pool and are set up on each first bubble pipe, first air pressure adjusting spare is located on first air inlet pipe;

[0010] Second bubble assembly includes second air inlet pipe and a plurality of second bubble pipe, one end of second air inlet pipe communicates with gas supply component, the other end of second air inlet pipe branch and a plurality of second bubble pipe communicate, a plurality of second bubble pipe are spaced apart in the polishing pool along the width direction of polishing pool, and a plurality of second air holes are arranged along the length direction of polishing pool and are set up on each second bubble pipe, second air pressure adjusting spare is located on second air inlet pipe.

[0011] In the embodiment of the utility model, the distance between the first bubble pipe and the second bubble pipe arranged adjacent is greater than the distance between any two first bubble pipes arranged adjacent;

[0012] And / or, the distance between the first bubble pipe and the second bubble pipe arranged adjacent is greater than the distance between any two second bubble pipes arranged adjacent.

[0013] In the embodiment of the utility model, the polishing device further includes a polishing support frame, the polishing support frame includes a frame body and a limiting rod set, the frame body is arranged in the polishing pool, the limiting rod set includes a plurality of limiting rods spaced apart on the frame body, a placing space for placing the workpiece to be polished is formed between any two limiting rods arranged adjacent, and a plurality of limiting grooves are arranged in sequence on each limiting rod, and the opening size of the limiting groove gradually expands from the groove bottom to the groove opening.

[0014] In the embodiment of the utility model, the width size of the workpiece to be polished is w, the distance between the groove bottoms of two limiting grooves oppositely arranged on any two limiting rods arranged adjacent is defined as a limiting size, and the limiting size is (w+1.0) mm~(w+1.4) mm.

[0015] In the embodiment of the utility model, the depth size of the limiting groove is directly proportional to the limiting size, and the depth size of the limiting groove is 1.9 mm~2.4 mm.

[0016] In the embodiment of the utility model, the angle size of the limiting groove is inversely proportional to the limiting size, and the angle size of the limiting groove is 100°~130°.

[0017] In the embodiment of the utility model, the reinforcing rod is arranged in the limiting rod, and the hardness of the limiting rod is less than the hardness of the reinforcing rod.

[0018] In the embodiment of the present application, the hardness of the limiting rod is 25A-35A, and the reinforcing rod is made of hard material.

[0019] Through the above technical scheme, the polishing equipment provided in the embodiment of the present application has the following beneficial effects:

[0020] In the technical scheme of the present application, the polishing tank contains chemical polishing liquid and is provided with a first bubble assembly and a second bubble assembly arranged at intervals, the gas supply assembly is arranged outside the polishing tank and communicates with the first bubble assembly and the second bubble assembly to supply gas to the first bubble assembly and the second bubble assembly respectively, the first bubble assembly is provided with a plurality of first air holes arranged at intervals, so that the gas in the first bubble assembly can be sprayed from the first air holes to disturb the chemical polishing liquid, the second bubble assembly is provided with a plurality of second air holes arranged at intervals, so that the gas in the second bubble assembly can be sprayed from the second air holes to disturb the chemical polishing liquid, the first bubble assembly is provided with a first air pressure adjusting member, and the second bubble assembly is provided with a second air pressure adjusting member, the first air pressure adjusting member and the second air pressure adjusting member adjust the air pressure in the first bubble assembly and the second bubble assembly respectively one by one, so that the air pressure of the gas sprayed from the first air holes is not equal to the air pressure of the gas sprayed from the second air holes, and then high-low pressure gas convection is formed in the polishing tank to greatly disturb the chemical polishing liquid, the flow uniformity of the chemical polishing liquid is improved, the chemical polishing liquid uniformly flows through the surface of the polishing piece by being placed in the polishing tank to polish the polishing piece, the chemical polishing liquid flows uniformly, the surface color difference of the polishing piece is greatly reduced, and the polishing quality is improved.

[0021] Other features and advantages of the embodiments of the present application will be described in detail in the following specific embodiments. BRIEF DESCRIPTION OF DRAWINGS

[0022] The accompanying drawings are included to provide a further understanding of the embodiments of the present application, and constitute a part of the specification, and are used together with the following specific embodiments to explain the embodiments of the present application, but do not constitute a limitation on the embodiments of the present application. For those skilled in the art, other drawings can be obtained from the structures shown in the drawings without creative labor. In the drawings:

[0023] Figure 1 is a structural schematic view of a polishing equipment according to an embodiment of the present application in one view;

[0024] Figure 2 is a structural schematic view of a polishing equipment according to an embodiment of the present application in another view;

[0025] Figure 3 is a structural schematic view of a bubble device and an air pressure adjusting device according to an embodiment of the present application;

[0026] Figure 4 is a structural schematic view of the first bubble pipe or the second bubble pipe according to an embodiment of the present utility model;

[0027] Figure 5 is a structural schematic view of multiple polishing support frames according to an embodiment of the present utility model;

[0028] Figure 6 is a structural schematic view of the polishing support frame from one perspective according to an embodiment of the present utility model;

[0029] Figure 7 is a structural schematic view of the polishing support frame from another perspective according to an embodiment of the present utility model;

[0030] Figure 8 is Figure 7 is an enlarged schematic view of the A area in the middle;

[0031] Figure 9 is a structural schematic view of the limiting rod from one perspective according to an embodiment of the present utility model;

[0032] Figure 10 is a structural schematic view of the limiting rod from another perspective according to an embodiment of the present utility model.

[0033] BRIEF DESCRIPTION OF DRAWINGS

[0034] 10 polishing cell 70 controller

[0035] 11 fixed seat 80 polishing support frame

[0036] 12 heating pipe 81 frame body

[0037] 20 air supply assembly 811 support plate

[0038] 21 air compressor 812 fixed rod

[0039] 22 gas delivery pipe 82 limiting rod set

[0040] 30 first bubble assembly 821 limiting rod

[0041] 31 first air hole 8211 limiting groove

[0042] 32 first air inlet pipe 8212 clearance fillet

[0043] 33 first bubble pipe 8213 support part

[0044] 40 second bubble assembly 8214 limiting part

[0045] 41 second air hole 8215 clearance slope

[0046] 42 second air inlet pipe 8216 reinforcing rod

[0047] 43 second bubbling pipe 822 placement space

[0048] 50 first air pressure adjusting piece 90 liquid supply pump

[0049] 60 second air pressure adjusting piece 91 liquid supply pipe DETAILED DESCRIPTION

[0050] The specific embodiments of the utility model are described in detail below in combination with the drawings. It should be understood that the specific embodiments described herein are only used to illustrate and explain the utility model, and are not used to limit the utility model.

[0051] The polishing equipment of the utility model is described below with reference to the drawings.

[0052] As Figures 1 to 4 shown, the utility model provides a kind of polishing equipment, and the polishing equipment includes polishing cell 10, bubbling device and air pressure adjusting device, bubbling device includes air supply assembly 20, first bubbling assembly 30 and second bubbling assembly 40, first bubbling assembly 30 and second bubbling assembly 40 are spaced apart in the width direction of polishing cell 10 in polishing cell 10, and first bubbling assembly 30 and second bubbling assembly 40 are communicated with air supply assembly 20 respectively, multiple first air holes 31 spaced apart are opened in first bubbling assembly 30, multiple second air holes 41 spaced apart are opened in second bubbling assembly 40;Air pressure adjusting device includes first air pressure adjusting piece 50 and second air pressure adjusting piece 60, first air pressure adjusting piece 50 is located on first bubbling assembly 30 and adjusts the air pressure in first bubbling assembly 30, second air pressure adjusting piece 60 is located on second bubbling assembly 40 and adjusts the air pressure in second bubbling assembly 40, and the air pressure in first bubbling assembly 30 and the air pressure in second bubbling assembly 40 are not equal.

[0053] It should be noted that the polishing equipment of the utility model can be used for chemical polishing to product, and polishing cell 10 is used to contain chemical polishing liquid, and chemical polishing liquid flows through the surface of product to polish product, and product can be glass, ceramic, metal, plastic and other material parts, and the material quality of the part to be polished in the utility model embodiment is not limited.

[0054] Specifically, the polishing tank 10 is filled with a chemical polishing solution and is provided with a first bubbling assembly 30 and a second bubbling assembly 40 arranged at intervals, the air supply assembly 20 is arranged outside the polishing tank 10 and is in communication with the first bubbling assembly 30 and the second bubbling assembly 40 to supply air to the first bubbling assembly 30 and the second bubbling assembly 40 respectively, the first bubbling assembly 30 is provided with a plurality of first air holes 31 arranged at intervals, so that the gas in the first bubbling assembly 30 can be sprayed out from the first air holes 31 to disturb the chemical polishing solution, the second bubbling assembly 40 is provided with a plurality of second air holes 41 arranged at intervals, so that the gas in the second bubbling assembly 40 can be sprayed out from the second air holes 41 to disturb the chemical polishing solution, the first bubbling assembly 30 is provided with a first air pressure adjusting piece 50, the second bubbling assembly 40 is provided with a second air pressure adjusting piece 60, the first air pressure adjusting piece 50 and the second air pressure adjusting piece 60 adjust the air pressure in the first bubbling assembly 30 and the second bubbling assembly 40 respectively one by one, so that the air pressure of the gas sprayed out from the first air holes 31 is not equal to the air pressure of the gas sprayed out from the second air holes 41, and then a high-low pressure gas convection is formed in the polishing tank 10 to greatly disturb the chemical polishing solution, the flow uniformity of the chemical polishing solution is improved, the chemical polishing solution uniformly flows through the surface of the to-be-polished piece by placing the to-be-polished piece into the polishing tank 10 to polish the to-be-polished piece, the chemical polishing solution flows uniformly, the surface color difference of the to-be-polished piece is greatly reduced, and the polishing quality is improved.

[0055] In the embodiment of the utility model, the air pressure adjusting device further includes a controller 70, the controller 70 is in communication connection with the first air pressure adjusting piece 50 and the second air pressure adjusting piece 60 respectively, the controller 70 controls the first air pressure adjusting piece 50 to adjust the air pressure in the first bubbling assembly 30 and controls the second air pressure adjusting piece 60 to adjust the air pressure in the second bubbling assembly 40 respectively, so that the air pressure in the first bubbling assembly 30 and the air pressure in the second bubbling assembly 40 size alternately change.

[0056] As Figure 2 And Figure 3The controller 70 is used for controlling the first air pressure adjusting part 50 to adjust the air pressure in the first bubbling assembly 30, and controlling the second air pressure adjusting part 60 to adjust the air pressure in the second bubbling assembly 40, so as to adjust the air pressure in the first bubbling assembly 30 to be not equal to the air pressure in the second bubbling assembly 40, thereby making the gas sprayed at the first air hole 31 and the gas sprayed at the second air hole 41 form high-low pressure convection, so as to greatly disturb the chemical polishing liquid and improve the flow uniformity of the chemical polishing liquid.

[0057] In the preferred embodiment of the utility model, the controller 70 is used for controlling the first air pressure adjusting part 50 to adjust the air pressure in the first bubbling assembly 30 at a preset frequency of 15s / time to 30s / time, and controlling the second air pressure adjusting part 60 to adjust the air pressure in the second bubbling assembly 40, so as to adjust the air pressure in the first bubbling assembly 30 to be 0.5bar to 1.0bar and the air pressure in the second bubbling assembly 40 to be 1.2bar to 2.0bar in the first adjusting period, and adjust the air pressure in the first bubbling assembly 30 to be 1.2bar to 2.0bar and the air pressure in the second bubbling assembly 40 to be 0.5bar to 1.0bar in the second adjusting period, thereby further improving the flow uniformity of the chemical polishing liquid, and the air pressure in the first bubbling assembly 30 and the second bubbling assembly 40 is always between 0.5bar and 2.0bar, so as to avoid the air pressure being too large to cause the edge collapse of the workpiece to be polished, and play a role in disturbing the chemical polishing liquid, thereby effectively preventing the surface of the workpiece to be polished from producing color difference and improving the polishing quality.

[0058] In the embodiment of the utility model, first bubble assembly 30 includes first air inlet pipe 32 and a plurality of first bubble pipe 33, one end of first air inlet pipe 32 is communicated with gas supply assembly 20, the other end of first air inlet pipe 32 is branched and communicated with a plurality of first bubble pipe 33, a plurality of first bubble pipe 33 are spaced apart in the width direction of polishing pool 10 and are arranged in polishing pool 10, and a plurality of first air holes 31 are arranged on each first bubble pipe 33, and first air pressure adjusting part 50 is arranged on first air inlet pipe 32;Second bubble assembly 40 includes second air inlet pipe 42 and a plurality of second bubble pipe 43, one end of second air inlet pipe 42 is communicated with gas supply assembly 20, the other end of second air inlet pipe 42 is branched and communicated with a plurality of second bubble pipe 43, a plurality of second bubble pipe 43 are spaced apart in the width direction of polishing pool 10 and are arranged in polishing pool 10, and a plurality of second air holes 41 are arranged on each second bubble pipe 43, and second air pressure adjusting part 60 is arranged on second air inlet pipe 42.

[0059] As shown in Figures 2 to 4 A plurality of first bubble pipe 33 and a plurality of second bubble pipe 43 are arranged in polishing pool 10 in the left-right direction, and each first bubble pipe 33 and each second bubble pipe 43 extend in the front-rear direction, a plurality of first air holes 31 are arranged on each first bubble pipe 33 in the front-rear direction, and a plurality of first bubble pipe 33 are communicated with first air inlet pipe 32, a plurality of second air holes 41 are arranged on each second bubble pipe 43 in the front-rear direction, and a plurality of second bubble pipe 43 are communicated with second air inlet pipe 42, first air inlet pipe 32 and second air inlet pipe 42 are communicated with gas supply assembly 20, so that gas supply assembly 20 can supply gas to a plurality of first bubble pipe 33 through first air inlet pipe 32 and supply gas to a plurality of second bubble pipe 43 through second air inlet pipe 42, and the chemical polishing liquid in polishing pool 10 is disturbed by the gas sprayed from the first air holes 31 of the first bubble pipe 33 and the second air holes 41 of the second bubble pipe 43, so that the chemical polishing liquid flows uniformly and contacts the surface of the polishing piece, the polishing of the polishing piece is realized, and the uniform flow of the chemical polishing liquid prevents the appearance of color difference on the surface of the polishing piece, and the polishing quality is improved;And a plurality of first bubble pipe 33 and a plurality of second bubble pipe 43 can improve the stability of the bubble lifting product.

[0060] Further, the distance between the adjacent first bubble pipe 33 and the second bubble pipe 43 is greater than the distance between any two adjacent first bubble pipes 33;The distance between the adjacent first bubble pipe 33 and the second bubble pipe 43 is greater than the distance between any two adjacent second bubble pipes 43.

[0061] As shown in Figure 3As shown, the plurality of first bubble tubes 33 are arranged at intervals along the left-right direction and form a first bubble tube group, the plurality of second bubble tubes 43 are arranged at intervals along the left-right direction and form a second bubble tube group, and the first bubble tube group and the second bubble tube group are arranged at intervals, the distance between the first bubble tube group and the second bubble tube group is L1, that is, the distance between the adjacent first bubble tube 33 and the second bubble tube 43 is L1, the distance between any two adjacent first bubble tubes 33 is L2, L1>L2, and the distance between any two adjacent second bubble tubes 43 is L3, L1>L3, and the distance between the first bubble tube group and the second bubble tube group is too narrow, which can cause the gas sprayed at the first air hole 31 to quickly collide with the gas sprayed at the second air hole 41, and then cause the chemical polishing liquid to flow too fast to form a turbulent flow to damage the to-be-polished piece, by setting L1 to be greater than L2 and L3, the chemical polishing liquid flow rate is effectively prevented from being too fast to damage the to-be-polished piece, and the polishing quality is improved.

[0062] In the embodiment of the utility model, the diameter size of the first air hole 31 and the second air hole 41 is 1mm~2mm, and the diameter size of the first air hole 31 and the second air hole 41 is less than 1mm, which can cause the gas flow rate to be too large, and then increase the flow rate of the chemical polishing liquid to cause the to-be-polished piece to be edge collapsed, and the diameter size of the first air hole 31 and the second air hole 41 is greater than 2mm, which can cause the gas flow rate to be too small to fully disturb the chemical polishing liquid, and reduce the flow uniformity of the chemical polishing liquid, by setting the diameter size of the first air hole 31 and the second air hole 41 to be 1mm~2mm, the chemical polishing liquid flow rate is uniform, and the to-be-polished piece shakes uniformly in the polishing pool 10, and the polishing uniformity is effectively improved.

[0063] Further, as shown, Figure 4 The distance between any two adjacent first air holes 31 and the distance between any two adjacent second air holes 41 are both set to m, m=20mm~40mm, m is less than 20mm, which can cause the chemical polishing liquid flow rate to be too large to damage the to-be-polished piece, and m is greater than 40mm, which can reduce the flow uniformity of the chemical polishing liquid, by setting m to be 20mm~40mm, the flow uniformity of the chemical polishing liquid is further improved.

[0064] In the embodiment of the utility model, the end of the first bubble tube 33 away from the first air inlet pipe 32 and the end of the second bubble tube 43 away from the second air inlet pipe 42 are both provided with a waste hole, the waste hole is used for discharging the crystal precipitated in the first bubble tube 33 or the second bubble tube 43, and the crystal is effectively prevented from blocking the first bubble tube 33 or the second bubble tube 43.

[0065] In the embodiment of the utility model, as shown, Figure 1 And Figure 2As shown, the air supply assembly 20 includes an air compressor 21 and an air supply pipe 22, one end of the air supply pipe 22 is communicated with the air compressor 21, and the other end of the air supply pipe 22 is branched and communicated with the first air inlet pipe 32 and the second air inlet pipe 42, the air compressor 21 is used for inputting the gas in the external environment into the air supply pipe 22, so that the air supply pipe 22 supplies the gas into the first air inlet pipe 32 and the second air inlet pipe 42 respectively, the first air inlet pipe 32 and the second air inlet pipe 42 respectively deliver the gas into the first bubble pipe 33 and the second bubble pipe 43, and the gas is sprayed from the first air holes 31 of the first bubble pipe 33 and the second air holes 41 of the second bubble pipe 43 respectively to disturb the chemical polishing liquid and the parts to be polished, the parts to be polished continuously shake in the chemical polishing liquid, and the polishing of the parts to be polished is realized.

[0066] In the embodiment of the utility model, the polishing device further includes a polishing support frame 80, the polishing support frame 80 includes a frame body 81 and a limiting rod group 82, the frame body 81 is arranged in the polishing pool 10, the limiting rod group 82 includes a plurality of limiting rods 821 arranged at intervals on the frame body 81, a placing space 822 for placing the parts to be polished is formed between any two adjacent limiting rods 821, and a plurality of limiting grooves 8211 are arranged in sequence on each limiting rod 821, and the opening size of the limiting groove 8211 gradually expands from the groove bottom to the groove opening of the limiting groove 8211.

[0067] As shown in Figure 2 , Figures 5 to 9 As shown, the frame body 81 is arranged in the polishing pool 10 and corresponds to the first bubble pipe group or the second bubble pipe group, the limiting rod group 82 includes a plurality of limiting rods 821 arranged at intervals along the left-right direction on the frame body 81, a placing space 822 is formed between any two adjacent limiting rods 821, the parts to be polished are placed in the placing space 822, so that the limiting rods 821 limit the parts to be polished, and the first bubble pipe group and the second bubble pipe group spray air from below into the placing space 822 to make the chemical polishing liquid bubble, thereby continuously shaking and fully contacting the chemical polishing liquid, realizing the polishing of the parts to be polished, and the polishing effect is good, and the side of the limiting rod 821 towards the placing space 822 is provided with a plurality of limiting grooves 8211 arranged in sequence along the front-back direction, the opening size of the limiting groove 8211 gradually increases along the direction towards the placing space 822, so that the limiting groove 8211 can limit the shaking amplitude of the parts to be polished and prevent the parts to be polished from being damaged, and can also prevent the groove wall of the limiting groove 8211 from abutting against the parts to be polished for a long time to cause the surface color difference of the parts to be polished to be too large, thereby improving the polishing quality.

[0068] In the embodiment of the utility model, as shown in Figure 5As shown, the upper part of the first bubble tube group is provided with two polishing support frames 80 arranged in sequence along the front-rear direction, the upper part of the second bubble tube group is provided with two polishing support frames 80 arranged in sequence along the front-rear direction, and the frame body 81 of each polishing support frame 80 is provided with two limiting rod groups 82 arranged in sequence along the up-down direction, each limiting rod group 82 includes three limiting rods 821 arranged in sequence along the left-right direction, and a placing space 822 is formed between any two adjacent limiting rods 821, so that batch polishing of the to-be-polished parts is realized, and the polishing support frame 80 is arranged corresponding to the first bubble tube group or the second bubble tube group, so that the to-be-polished parts in the placing space 822 are uniformly stressed, effectively preventing the to-be-polished parts from shaking too much to cause edge collapse, and the polishing is stable and reliable. In addition, those skilled in the art can understand that the number of limiting rods 821 in each limiting rod group 82, the number of limiting rod groups 82 on each frame body 81, and the number of polishing support frames 80 can be flexibly set according to actual use requirements, and the number of limiting rods 821, the number of limiting rod groups 82, and the number of polishing support frames 80 of the polishing equipment of the utility model are not limited.

[0069] In the embodiment of the utility model, the width size of the to-be-polished part is w, the distance between the groove bottoms of the two limiting grooves 8211 oppositely arranged on any two limiting rods 821 is set as the limiting size, and the limiting size is (w+1.0) mm~(w+1.4) mm.

[0070] As shown in the figure, Figure 8 The limiting groove 8211 is used for the edge of the to-be-polished part to extend into, the placing space 822 for placing the to-be-polished part is formed between the two limiting grooves 8211 oppositely arranged along the left-right direction, and in the two oppositely arranged limiting grooves 8211, the distance between the groove bottoms of the two limiting grooves 8211 is set as the limiting size d, d=(w+1.0) mm~(w+1.4) mm, wherein w is the width size of the to-be-polished part, the to-be-polished part is located between the two limiting grooves 8211, so that the distance between the edge of the to-be-polished part and the groove bottom of the limiting groove 8211 is 0.5 mm~0.7 mm, the gas sprayed at the first air hole 31 and the second air hole 41 makes the chemical polishing liquid bubble, and the to-be-polished part will shake when the chemical polishing liquid bubbles, by setting the limiting size d as (w+1.0) mm~(w+1.4) mm, the small distance between the to-be-polished part and the groove bottom of the limiting groove 8211 is effectively prevented, which causes the surface of the to-be-polished part to produce color difference after polishing, the polishing quality is improved, and the large distance between the to-be-polished part and the groove bottom of the limiting groove 8211 is prevented, which causes the to-be-polished part to fall off from the placing space 822 and be damaged, and the polishing stability is improved.

[0071] In the embodiment of the utility model, the depth size of the limiting groove 8211 is directly proportional to the limiting size, and the depth size of the limiting groove 8211 is 1.9 mm~2.4 mm.Figure 9 As shown in the figure, the depth size of the limiting groove 8211 is h, h = 1.9mm~2.4mm, and the depth size h of the limiting groove 8211 is proportional to the limiting size d, that is, the smaller the depth size of the limiting groove 8211, the smaller the distance between the to-be-polished part and the groove bottom of the limiting groove 8211, effectively preventing the to-be-polished part from falling out of the placement space 822, improving the polishing stability, and the larger the depth size of the limiting groove 8211, the larger the distance between the to-be-polished part and the groove bottom of the limiting groove 8211, effectively preventing the groove wall of the limiting groove 8211 from abutting against the to-be-polished part for a long time to produce color difference; and by setting different depth sizes of the limiting groove 8211 to verify the polishing quality of the to-be-polished part, h less than 1.9mm is easy to cause the to-be-polished part to fall off, h greater than 2.4mm will increase the color difference of the to-be-polished part and reduce the polishing quality, by setting h to 1.9mm~2.4mm, both the polishing stability and the polishing quality are improved.

[0072] In the embodiment of the utility model, the angle size of limiting groove 8211 is inversely proportional to the limiting size, the angle size of limiting groove 8211 is 100 °~130 °. As shown in the figure, Figure 9 As shown in the figure, the angle size of the limiting groove 8211 is α, α = 100 °~130 °, and the angle size α of the limiting groove 8211 is inversely proportional to the limiting size d, that is, the smaller the angle size of the limiting groove 8211, the larger the distance between the to-be-polished part and the groove bottom of the limiting groove 8211, effectively preventing the groove wall of the limiting groove 8211 from abutting against the to-be-polished part for a long time to produce color difference, and the larger the angle size of the limiting groove 8211, the smaller the distance between the to-be-polished part and the groove bottom of the limiting groove 8211, effectively preventing the to-be-polished part from falling out of the placement space 822, improving the polishing stability; and by setting different angle sizes of the limiting groove 8211 to verify the polishing quality of the to-be-polished part, α less than 100 ° will cause the groove wall of the limiting groove 8211 to frequently collide with the to-be-polished part and damage the to-be-polished part, α greater than 130 ° is easy to cause the to-be-polished part to fall off, by setting α to 100 °~130 °, the polishing edge collapse defect rate is reduced.

[0073] In the embodiment of the utility model, the groove wall of the limiting groove 8211 is formed with a relief round corner 8212, and the radius of the relief round corner 8212 is 0.2mm~0.5mm. As shown in the figure, Figure 10As shown in the drawings, the groove wall of the limiting groove 8211 is provided with a rounded corner and forms an avoiding rounded corner 8212, the radius of the avoiding rounded corner 8212 is r, r = 0.2mm~0.5mm, by setting different radii of the avoiding rounded corner 8212 to verify the polishing quality of the to-be-polished piece, r less than 0.2mm will cause the groove wall of the limiting groove 8211 to be sharp and easy to scratch the to-be-polished piece, r greater than 0.5mm will cause the contact area between the groove wall of the limiting groove 8211 and the to-be-polished piece to increase and further produce color difference defects, by setting r as 0.2mm~0.5mm, the polishing edge collapse defect rate and the color difference defect rate are reduced.

[0074] In the embodiment of the utility model, the limiting rod 821 includes a supporting part 8213 and a limiting part 8214, the frame body 81 includes two supporting plates 811, the two ends of the supporting part 8213 are connected with the two supporting plates 811 respectively, the limiting part 8214 is connected on the supporting part 8213, and a limiting groove 8211 is formed on the side of the limiting part 8214 away from the supporting part 8213. Figure 6 、 Figure 9 and Figure 10 As shown in the drawings, the frame body 81 includes two supporting plates 811 which are spaced apart along the front-back direction, the supporting part 8213 is provided along the front-back direction and is connected with the two supporting plates 811 one by one, the limiting part 8214 is provided along the front-back direction and is connected on the supporting part 8213, the limiting groove 8211 is formed on the limiting part 8214 and is used for the edge of the to-be-polished piece to extend into, the supporting part 8213 plays a role of supporting the limiting part 8214, the limiting groove 8211 on the limiting part 8214 plays a role of limiting the to-be-polished piece, effectively preventing the to-be-polished piece from falling off, and improving the polishing stability.

[0075] Further, as shown in the drawings, Figure 9 and Figure 10 The two sides of the limiting part 8214 are formed with avoiding slopes 8215 which are provided in an inclined manner, the avoiding slopes 8215 are provided along the outer edge of the limiting groove 8211, and the distance between the two avoiding slopes 8215 is provided in a gradually expanding manner away from the limiting groove 8211, the avoiding slopes 8215 reduce the contact area between the limiting part 8214 and the to-be-polished piece, and further reduce the polishing color difference defect rate.

[0076] In the embodiment of the utility model, as shown in the drawings, Figure 1 The polishing pool 10 is provided with a fixing seat 11, the supporting plate 811 is arranged on the fixing seat 11 to stably support the polishing support frame 80, the polishing stability is improved, and the polishing support frame 80 further includes a fixing rod 812, the two ends of the fixing rod 812 are connected with the two supporting plates 811 one by one, the structural strength is strengthened, and the structural stability is improved.

[0077] In the embodiment of the utility model, as shown in the drawings, Figure 1As shown, the polishing device further comprises a liquid supply device, the liquid supply device comprising a liquid supply pump 90 and a liquid supply pipe 91, two ends of the liquid supply pipe 91 being in one-to-one correspondence with the liquid supply pump 90 and the polishing tank 10 respectively, the liquid supply pump 90 being used for pumping the chemical polishing liquid into the liquid supply pipe 91, so that the chemical polishing liquid flows into the polishing tank 10 along the liquid supply pipe 91 and polishes the workpiece to be polished, and the polishing tank 10 is further provided with a heating pipe 12, the heating pipe 12 being used for heating the chemical polishing liquid in the polishing tank 10, so as to enhance the flowability of the chemical polishing liquid, improve the polishing quality, and improve the polishing efficiency.

[0078] In the embodiment of the utility model, the reinforcing rod 8216 is arranged in the limiting rod 821, and the hardness of the limiting rod 821 is less than the hardness of the reinforcing rod 8216. Figure 10 As shown, the limiting rod 821 is hollow, and the reinforcing rod 8216 is arranged in the limiting rod 821. Since the limiting groove 8211 is arranged on the limiting rod 821 for the edge of the workpiece to be polished to extend into, the groove wall of the limiting groove 8211 will be in contact with the workpiece to be polished. The hardness of the limiting rod 821 is less than the hardness of the reinforcing rod 8216 to prevent the workpiece to be polished from being damaged due to the collision of the limiting rod 821 with the workpiece to be polished, improve the polishing quality, and the hardness of the reinforcing rod 8216 is greater than the hardness of the limiting rod 821 to support the limiting rod 821 and increase the structural strength, effectively preventing the limiting rod 821 from deforming and prolonging the service life.

[0079] Further, the hardness of the limiting rod 821 is 25A-35A. If the hardness of the limiting rod 821 is less than 25A, the limiting rod 821 is prone to deformation. If the hardness of the limiting rod 821 is greater than 35A, the workpiece to be polished is prone to damage. The hardness of the limiting rod 821 is set to 25A-35A to enable the limiting rod 821 to limit the workpiece to be polished while having a long service life and ensuring the polishing quality. In addition, the reinforcing rod 8216 is made of a hard material to stably support the limiting rod 821 and prevent the limiting rod 821 from deforming, improving the structural stability.

[0080] In the preferred embodiment of the utility model, the limiting rod 821 is made of an acid and alkali corrosion resistant high polymer plastic material. The limiting rod 821 can be made of poly ether-ether-ketone (PEEK) or polyfluoroalkoxy (PFA) material, which has good corrosion resistance, a long service life, and small hardness to prevent the workpiece to be polished from being damaged by collision. The reinforcing rod 8216 can be made of stainless steel material. The reinforcing rod 8216 made of stainless steel has large hardness to stably support the limiting rod 821 and effectively prevent the limiting rod 821 from deforming.

[0081] In the description of the utility model, it is understood that the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features limited by "first", "second" can be explicitly or implicitly included at least one of the features. In the description of the utility model, the meaning of "a plurality of" is at least two, such as two, three, etc., unless otherwise specifically limited.

[0082] In the utility model, unless otherwise specifically defined and limited, the terms "installation", "connection", "connection", "fixing" and other terms should be understood in a broad sense, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected or communicate with each other; it can be directly connected, or it can be indirectly connected through an intermediate medium, it can be the communication or interaction relationship between two elements, unless otherwise specifically limited. For ordinary skilled in the art, the specific meaning of the above terms in the utility model can be understood according to the specific circumstances.

[0083] In the description of the specification, the description of the terms "one embodiment", "some embodiments", "example", "specific example" or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the utility model. In the specification, the illustrative description of the above terms is not necessarily for the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, the skilled in the art can combine and combine the different embodiments or examples described in the specification and the features of different embodiments or examples without contradiction.

[0084] Although the embodiments of the utility model have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limiting the utility model, and the skilled in the art can change, modify, replace and modify the above embodiments within the scope of the utility model.

Claims

1. A polishing apparatus characterized by comprising: The polishing device comprises: a polishing tank (10); a bubbling device comprising a gas supply assembly (20), a first bubbling assembly (30) and a second bubbling assembly (40), the first bubbling assembly (30) and the second bubbling assembly (40) are arranged in the polishing tank (10) along the width direction of the polishing tank (10) and are in communication with the gas supply assembly (20), a plurality of first gas holes (31) are arranged on the first bubbling assembly (30), and a plurality of second gas holes (41) are arranged on the second bubbling assembly (40); a gas pressure adjusting device comprising a first gas pressure adjusting member (50) and a second gas pressure adjusting member (60), the first gas pressure adjusting member (50) is arranged on the first bubbling assembly (30) and adjusts the gas pressure in the first bubbling assembly (30), the second gas pressure adjusting member (60) is arranged on the second bubbling assembly (40) and adjusts the gas pressure in the second bubbling assembly (40), and the gas pressure in the first bubbling assembly (30) is different from the gas pressure in the second bubbling assembly (40).

2. The polishing apparatus according to claim 1, wherein The gas pressure adjusting device further comprises a controller (70), the controller (70) is in communication connection with the first gas pressure adjusting member (50) and the second gas pressure adjusting member (60), respectively, the controller (70) controls the first gas pressure adjusting member (50) to adjust the gas pressure in the first bubbling assembly (30) and controls the second gas pressure adjusting member (60) to adjust the gas pressure in the second bubbling assembly (40), so that the gas pressure in the first bubbling assembly (30) and the gas pressure in the second bubbling assembly (40) are alternately changed.

3. The polishing apparatus according to claim 1, wherein The first bubbling assembly (30) comprises a first gas inlet pipe (32) and a plurality of first bubbling pipes (33), one end of the first gas inlet pipe (32) is in communication with the gas supply assembly (20), the other end of the first gas inlet pipe (32) is branched and in communication with a plurality of the first bubbling pipes (33), a plurality of the first bubbling pipes (33) are arranged in the polishing tank (10) along the width direction of the polishing tank (10), and a plurality of the first gas holes (31) are arranged on each of the first bubbling pipes (33) along the length direction of the polishing tank (10), and the first gas pressure adjusting member (50) is arranged on the first gas inlet pipe (32). The second bubble assembly (40) comprises a second air inlet pipe (42) and a plurality of second bubble pipes (43), one end of the second air inlet pipe (42) is communicated with the air supply assembly (20), the other end of the second air inlet pipe (42) is branched and communicated with a plurality of the second bubble pipes (43), a plurality of the second bubble pipes (43) are arranged in the polishing tank (10) along the width direction of the polishing tank (10), and a plurality of the second air holes (41) are arranged on each of the second bubble pipes (43) along the length direction of the polishing tank (10), and the second air pressure adjusting member (60) is arranged on the second air inlet pipe (42).

4. The polishing apparatus according to claim 3, wherein The distance between the adjacent first bubble pipes (33) and the second bubble pipes (43) is greater than the distance between any two adjacent first bubble pipes (33). And / or, the distance between the adjacent first bubble pipes (33) and the second bubble pipes (43) is greater than the distance between any two adjacent second bubble pipes (43).

5. The polishing apparatus according to any one of claims 1 to 4, wherein The polishing device further comprises a polishing support frame (80), the polishing support frame (80) comprises a frame body (81) and a limiting rod group (82), the frame body (81) is arranged in the polishing tank (10), the limiting rod group (82) comprises a plurality of limiting rods (821) arranged on the frame body (81), a placing space (822) for placing a to-be-polished part is formed between any two adjacent limiting rods (821), and a plurality of limiting grooves (8211) are arranged on each limiting rod (821) in sequence, and the opening size of the limiting grooves (8211) gradually expands from the groove bottom to the groove opening.

6. The polishing apparatus according to claim 5, wherein The width size of the to-be-polished part is w, the distance between the groove bottoms of two limiting grooves (8211) arranged oppositely on any two adjacent limiting rods (821) is set as a limiting size, and the limiting size is (w+1.0) mm to (w+1.4) mm.

7. The polishing apparatus according to claim 6, wherein The depth size of the limiting groove (8211) is directly proportional to the limiting size, and the depth size of the limiting groove (8211) is 1.9 mm to 2.4 mm.

8. The polishing apparatus according to claim 6, wherein The angle size of the limiting groove (8211) is inversely proportional to the limiting size, and the angle size of the limiting groove (8211) is 100° to 130°.

9. The polishing apparatus according to claim 5, wherein The reinforcing rod (8216) is arranged in the limiting rod (821), and the hardness of the limiting rod (821) is less than the hardness of the reinforcing rod (8216).

10. The polishing apparatus according to claim 9, wherein The hardness of the limiting rod (821) is 25A to 35A, and the reinforcing rod (8216) is made of a hard material.

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