Immersed head cover and immersed photoetching machine

Abstract

The utility model provides an immersed head cover and an immersed photoetching machine, the immersed head cover comprises a liquid discharge mechanism and a detection mechanism, the detection mechanism is installed on the immersed head cover, the liquid discharge mechanism comprises an interval water supply hole group, a first needle-shaped water extraction hole group, an air knife hole group and a first external extraction hole group which are annularly arranged, and the first needle-shaped water extraction hole group, the air knife hole group and the first external extraction hole group are arranged along the radial direction of the liquid discharge mechanism. The interval water supply hole set, the first needle-shaped water extraction hole set, the air knife hole set and the first external extraction hole set are sequentially spaced, a second needle-shaped water extraction hole set is arranged between the interval water supply hole set and the first needle-shaped water extraction hole set, and a second external extraction hole set is arranged on the outer side of the air knife hole set. When the detection mechanism detects that water drops exist in the outer side area of the air knife hole group, the first control module improves the suction force of the first needle-shaped water extraction hole group, the second needle-shaped water extraction hole group, the second external extraction hole group and the second external extraction hole group, so that the water drops or the bubbles are sucked away, and the water drops or the bubbles are prevented from causing defects to the wafer.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of semiconductor manufacturing, and more particularly relates to an immersion head cover and an immersion lithography machine. BACKGROUND

[0002] Immersion lithography is widely used in the miniaturization process in semiconductor manufacturing, especially in the manufacture of smaller chips. Unlike traditional dry lithography technology, the key point of immersion lithography technology is to use a liquid medium (usually deionized water) to cover the mask and wafer surface during exposure. This technology can effectively reduce the refraction of light in the air, thereby improving the resolution and allowing precise exposure at a smaller scale.

[0003] However, compared with dry lithography technology, since the immersion lithography machine needs to introduce a liquid between the lens and the wafer surface, the particles on the wafer will increase the particle source, and bubbles and liquid medium will appear during the exposure process. If the bubbles and liquid medium are not removed in time, the bubbles and liquid medium will enter and cause defects on the wafer.

[0004] In the prior art, if some of the suction holes in the suction flow channel of the liquid discharge mechanism of the immersion head cover of the immersion lithography machine are blocked, there is a problem of insufficient suction capacity for bubbles and liquid medium, which cannot guarantee complete removal of bubbles and liquid medium, and cannot detect the defects caused by bubbles and liquid medium on the wafer, thereby affecting the exposure efficiency of the immersion lithography machine on the wafer. SUMMARY

[0005] The purpose of the embodiments of the present application is to provide an immersion head cover and an immersion lithography machine to solve the technical problem that bubbles and liquid medium cannot be completely removed due to insufficient suction force of the liquid discharge mechanism in the prior art.

[0006] To achieve the above-mentioned purpose, the first aspect of the present application provides an immersion head cover, comprising:

[0007] A liquid discharge mechanism comprising a set of spaced water supply holes, a first set of needle-shaped water extraction holes, a set of air knife holes, and a first set of external extraction holes arranged in a ring shape. Along the radial direction of the liquid discharge mechanism, the set of spaced water supply holes, the first set of needle-shaped water extraction holes, the set of air knife holes, and the first set of external extraction holes are sequentially spaced. The liquid discharge mechanism further comprises:

[0008] A second set of needle-shaped water extraction holes is arranged between the set of spaced water supply holes and the first set of needle-shaped water extraction holes:

[0009] A second set of external extraction holes is arranged outside the set of air knife holes;

[0010] A detection mechanism is installed on the immersion head cover and electrically connected with the first control module of the liquid discharge mechanism, for detecting whether there is water droplet in the area outside the air knife hole group;

[0011] When the detection mechanism detects that there is water droplet in the area outside the air knife hole group, the first control module increases the suction force of the first needle-shaped water extraction hole group, the second needle-shaped water extraction hole group, the second external extraction hole group and the second external extraction hole group, and the detection mechanism sends an alarm signal and transmits the alarm signal to the first control module.

[0012] Optionally, the second external extraction hole group is arranged inside the first external extraction hole group.

[0013] Optionally, the liquid discharge mechanism is provided with:

[0014] a first suction cavity in communication with the first needle-shaped water extraction hole group;

[0015] a second suction cavity in communication with the second needle-shaped water extraction hole group;

[0016] a third suction cavity in communication with the first external extraction hole group;

[0017] a fourth suction cavity in communication with the second external extraction hole group;

[0018] The first suction cavity, the second suction cavity, the third suction cavity and the fourth suction cavity are independently arranged.

[0019] Optionally, the detection mechanism comprises:

[0020] a laser connected with the immersion head cover and electrically connected with the first control module, for emitting a laser beam to the area outside the air knife hole group;

[0021] a photoelectric sensor connected with the liquid discharge mechanism and electrically connected with the first control module, and located on the light path of part of the scattered light formed by the water droplet scattering the laser beam;

[0022] When the water droplet exists in the area outside the air knife hole group, the water droplet scatters the laser beam to form the scattered light, the photoelectric sensor generates a first control signal and the alarm signal according to part of the received scattered light, and transmits the first control signal to the first control module, and the first control module increases the suction force of the first needle-shaped water extraction hole group, the second needle-shaped water extraction hole group, the second external extraction hole group and the second external extraction hole group according to the first control signal.

[0023] Optionally, the photoelectric sensor is located outside the first group of external extraction holes.

[0024] Optionally, the detection mechanism further comprises:

[0025] a linear light beam generating member connected to the immersion head cover and arranged on the light path of the laser light beam, for converting the laser light beam into a linear detection light beam and irradiating the detection light beam into the area outside the group of air knife holes.

[0026] Optionally, the number of the lasers is multiple, and the multiple lasers are arranged in a circumferential interval along the immersion head cover.

[0027] The number of the linear light beam generating members is multiple, and the multiple linear light beam generating members are connected to the immersion head cover and arranged in a circumferential interval along the immersion head cover, and the multiple linear light beam generating members correspond to the multiple lasers one by one, and each linear light beam generating member is arranged on the light path of the laser light beam emitted by the corresponding laser.

[0028] The multiple linear light beam generating members are used for converting the laser light beams emitted by the multiple lasers into a ring-shaped detection light beam and irradiating the detection light beam into the area outside the group of air knife holes.

[0029] Optionally, the detection mechanism further comprises:

[0030] a ring-shaped light beam generating member connected to the immersion head cover and arranged on the light path of the laser light beam, for converting the laser light beam into a ring-shaped detection light beam and irradiating the detection light beam into the area outside the group of air knife holes.

[0031] Optionally, the detection mechanism further comprises:

[0032] a storage module electrically connected to the first control module.

[0033] The first control module generates error information according to the alarm signal and transmits the error information to the storage module for storage.

[0034] The beneficial effects of the immersion hood provided in this application are as follows: Compared with the prior art, the immersion hood provided in this application includes a drainage mechanism and a detection mechanism. The detection mechanism is installed in the immersion hood and electrically connected to the first control module of the drainage mechanism. The drainage mechanism includes a ring-shaped set of spaced water supply holes, a first set of needle-shaped water extraction holes, an air knife hole set, and a first set of external extraction holes. Along the radial direction of the drainage mechanism, the set of spaced water supply holes, the first set of needle-shaped water extraction holes, the air knife hole set, and the first set of external extraction holes are spaced apart sequentially. A second set of needle-shaped water extraction holes is provided between the set of spaced water supply holes and the first set of needle-shaped water extraction holes. The outer side of the air knife hole group is provided with a second external extraction hole group. When the detection mechanism detects the presence of water droplets in the area outside the air knife hole group, the first control module increases the suction force of the first needle-shaped water extraction hole group, the second needle-shaped water extraction hole group, the second external extraction hole group, and the second external extraction hole group to remove the water droplets or bubbles, preventing water droplets or bubbles from causing defects in the wafer. At the same time, the detection mechanism issues an alarm signal and transmits the alarm signal to the first control module so that the operator can subsequently detect the wafer corresponding to the alarm signal based on the alarm signal, preventing defective wafers from entering the subsequent production process.

[0035] Secondly, this application provides an immersion lithography machine, comprising:

[0036] An immersion hood, wherein the immersion hood is any one of the immersion hoods described above;

[0037] The second control module is used to control the immersion lithography machine and is electrically connected to the first control module or storage module in the immersion head cover.

[0038] The second control module is also electrically connected to the production management system for transmitting error information to the production management system.

[0039] The immersion lithography machine provided by the application has the beneficial effects that, compared with the prior art, the immersion lithography machine provided by the application includes the immersion head cover provided by any one of the above, the immersion head cover includes a liquid discharge mechanism and a detection mechanism, the detection mechanism is installed on the immersion head cover and is electrically connected with a first control module of the liquid discharge mechanism, the liquid discharge mechanism includes a ring-shaped arranged interval water supply hole group, a first needle-shaped water extraction hole group, an air knife hole group and a first external extraction hole group, along the radial direction of the liquid discharge mechanism, the interval water supply hole group, the first needle-shaped water extraction hole group, the air knife hole group and the first external extraction hole group are sequentially spaced, a second needle-shaped water extraction hole group is arranged between the interval water supply hole group and the first needle-shaped water extraction hole group, a second external extraction hole group is arranged outside the air knife hole group, when the detection mechanism detects that there is water droplet in the area outside the air knife hole group, the first control module increases the suction force of the first needle-shaped water extraction hole group, the second needle-shaped water extraction hole group, the second external extraction hole group and the second external extraction hole group to extract the water droplet or the air bubble, so as to prevent the water droplet or the air bubble from causing defects on the wafer, at the same time, the detection mechanism sends an alarm signal and transmits the alarm signal to the first control module, so that the operator subsequently detects the wafer corresponding to the alarm signal according to the alarm signal, to prevent the defective wafer from entering the subsequent production process. BRIEF DESCRIPTION OF DRAWINGS

[0040] In order to more clearly illustrate the technical solutions in the embodiments of the application, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description only some embodiments of the application, and for those skilled in the art, other drawings can also be obtained without creative labor.

[0041] Figure 1 The structure diagram of the immersion head cover provided by the embodiment of the application is shown in the figure.

[0042] Figure 2 The structure diagram of the detection mechanism provided by the embodiment of the application is shown in the figure.

[0043] Figure 3 The structure diagram of the immersion head cover provided by the embodiment of the application is shown in the figure.

[0044] Figure 4 The structure diagram of the detection mechanism provided by the embodiment of the application is shown in the figure. Figure 3 The enlarged view of the local structure in the figure.

[0045] Figure 5 The structure diagram of the detection mechanism provided by the embodiment of the application is shown in the figure.

[0046] In the figure, various reference signs are as follows:

[0047] 10, liquid discharge mechanism; 11, interval water supply hole group; 111, interval water supply hole; 12, first needle-shaped water extraction hole group; 121, first needle-shaped water extraction hole; 122, first suction chamber; 13, air knife hole group; 131, air knife hole; 14, first external extraction hole group; 141, first external extraction hole; 142, third suction chamber; 15, second needle-shaped water extraction hole group; 151, second needle-shaped water extraction hole; 152, second suction chamber; 16, second external extraction hole group; 161, second external extraction hole; 162, fourth suction chamber; 20, detection mechanism; 21, laser; 22, photoelectric sensor; 23, linear light beam generator; 30, wafer. DETAILED DESCRIPTION

[0048] In order to make the technical problems to be solved, technical solutions and beneficial effects of the present application clearer, the present application will be further described in detail below in conjunction with the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and not intended to limit the present application.

[0049] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

[0050] It should be understood that the terms "length", "width", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application.

[0051] In addition, the terms "first", "second" are only for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise specifically limited.

[0052] Please refer to Figures 1 to 5 , now the immersion head cover provided by the embodiments of the present application will be described.

[0053] The first aspect of the present application is to provide an immersion head cover, comprising a liquid discharge mechanism 10 and a detection mechanism 20.

[0054] Please refer toFigures 1 to 3 The liquid discharge mechanism 10 includes a ring-shaped spacer water supply hole group 11, a first needle-shaped water extraction hole group 12, a gas knife hole group 13, and a first external extraction hole group 14, which are sequentially spaced along the radial direction of the liquid discharge mechanism 10.

[0055] As shown in FIG. 1, the spacer water supply hole group 11 is used to inject a liquid medium, such as pure water, between the surface of the wafer 30 and the immersion head cover. The gas knife hole group 13 is used to inject a gas medium, such as carbon dioxide, between the surface of the wafer 30 and the immersion head cover. Figure 1 As shown in FIG. 1, the spacer water supply hole group 11 is used to inject a liquid medium, such as pure water, between the surface of the wafer 30 and the immersion head cover. The gas knife hole group 13 is used to inject a gas medium, such as carbon dioxide, between the surface of the wafer 30 and the immersion head cover. Figure 1 As shown in FIG. 1, the spacer water supply hole group 11 is used to inject a liquid medium, such as pure water, between the surface of the wafer 30 and the immersion head cover. The gas knife hole group 13 is used to inject a gas medium, such as carbon dioxide, between the surface of the wafer 30 and the immersion head cover.

[0056] The liquid discharge mechanism 10 further includes a second needle-shaped water extraction hole group 15 and a second external extraction hole group 16, which are arranged in a ring shape between the spacer water supply hole group and the first needle-shaped water extraction hole group 12 and outside the gas knife hole group 13, respectively.

[0057] The liquid medium and the gas medium are mixed at the first needle-shaped water extraction hole group 12, and the mixture of the liquid medium and the gas medium is extracted from the position between the surface of the wafer 30 and the immersion head cover by the first needle-shaped water extraction hole group 12. The liquid medium between the spacer water supply hole group 11 and the first needle-shaped water extraction hole group 12 is extracted from the position between the surface of the wafer 30 and the immersion head cover by the second needle-shaped water extraction hole group 15.

[0058] The gas medium on the right side of the gas knife hole group 13 is extracted from the position between the surface of the wafer 30 and the immersion head cover by the first external extraction hole group 14 and the second external extraction hole group 16.

[0059] If part of the liquid medium enters the position on the right side of the gas knife hole group 13, the liquid medium entering the position is extracted from the position between the surface of the wafer 30 and the immersion head cover by the first external extraction hole group 14 and the second external extraction hole group 16.

[0060] The second needle-shaped water extraction hole group 15 is arranged to cooperate with the first needle-shaped water extraction hole group 12 to improve the suction capacity of the liquid medium, and if part of the liquid medium enters the right side of the air knife hole group 13, the first external extraction hole group 14 and the second external extraction hole group 16 are arranged to suck the part of the liquid medium, further improving the suction capacity of the liquid medium.

[0061] Meanwhile, the second external extraction hole group 16 is arranged to cooperate with the first external extraction hole group 14 and the first needle-shaped water extraction hole group 12 to suck the gas medium away from the position between the wafer 30 surface and the immersion head cover, thereby improving the suction capacity of the gas medium.

[0062] The detection mechanism 20 is installed on the immersion head cover and is electrically connected to the first control module of the liquid discharge mechanism 10, and is used to detect whether there is water droplet in the area outside the air knife hole group 13.

[0063] When the detection mechanism 20 detects that there is water droplet in the area outside the air knife hole group 13, the detection mechanism 20 generates a first detection signal and transmits the first detection signal to the first control module, and the first control module increases the suction force of the first needle-shaped water extraction hole group 12, the second needle-shaped water extraction hole group 15, the first external extraction hole group 14 and the second external extraction hole group 16 according to the first detection signal, thereby further improving the suction capacity of the liquid medium and the gas medium, thereby preventing the liquid medium and the gas medium from staying on the wafer 30 surface to cause defects of the wafer 30.

[0064] Meanwhile, when the detection mechanism 20 detects that there is water droplet in the area outside the air knife hole group 13, the detection mechanism 20 sends an alarm signal and transmits the alarm signal to the first control module, so as to subsequently track or check the wafer 30 corresponding to the alarm signal according to the alarm signal.

[0065] When the detection mechanism 20 detects that there is no water droplet in the area outside the air knife hole group 13, the detection mechanism 20 generates a second detection signal and transmits the second detection signal to the second control module, and the second control module maintains the suction force of the first needle-shaped water extraction hole group 12, the second needle-shaped water extraction hole group 15, the second external extraction hole group 16 and the second external extraction hole group 16 according to the second detection signal.

[0066] Compared with the prior art, the immersion head cover provided by the application comprises a liquid discharge mechanism 10 and a detection mechanism 20. The detection mechanism 20 is installed on the immersion head cover and is electrically connected with a first control module of the liquid discharge mechanism 10. The liquid discharge mechanism 10 comprises a ring-shaped interval water supply hole group 11, a first needle-shaped water extraction hole group 12, a gas knife hole group 13 and a first external extraction hole group 14. Along the radial direction of the liquid discharge mechanism 10, the interval water supply hole group 11, the first needle-shaped water extraction hole group 12, the gas knife hole group 13 and the first external extraction hole group 14 are sequentially spaced. A second needle-shaped water extraction hole group 15 is arranged between the interval water supply hole group and the first needle-shaped water extraction hole group 12. A second external extraction hole group 16 is arranged outside the gas knife hole group 13. When the detection mechanism 20 detects that there is water droplet in the area outside the gas knife hole group 13, the first control module increases the suction force of the first needle-shaped water extraction hole group 12, the second needle-shaped water extraction hole group 15, the second external extraction hole group 16 and the second external extraction hole group 16 to extract the water droplet or the bubble, so as to prevent the water droplet or the bubble from causing defects of the wafer 30. At the same time, the detection mechanism 20 sends an alarm signal and transmits the alarm signal to the first control module, so that the operator can detect the wafer 30 corresponding to the alarm signal according to the alarm signal, and prevent the defective wafer 30 from entering the subsequent production process.

[0067] In the present application, please refer to Figure 1 and Figure 3 The second external extraction hole group 16 is arranged outside the first external extraction hole group 14.

[0068] In the present application, please refer to Figure 2 The liquid discharge mechanism 10 comprises a first suction cavity 122, a second suction cavity 152, a third suction cavity 142 and a fourth suction cavity 162. The first suction cavity 122 is in communication with the first needle-shaped water extraction hole group 12. The second suction cavity 152 is in communication with the second needle-shaped water extraction hole group 15. The third suction cavity 142 is in communication with the first external extraction hole group 14. The fourth suction cavity 162 is in communication with the second external extraction hole group 16.

[0069] Specifically, the liquid discharge mechanism 10 is provided with a ring-shaped liquid flow channel (not marked in the figure). The liquid flow channel is connected with a liquid medium injection device. The liquid medium injection device is used for injecting liquid medium into the liquid flow channel. The interval water supply hole group 11 comprises a plurality of interval water supply holes 111. The plurality of interval water supply holes 111 are uniformly spaced along the circumferential direction of the liquid discharge mechanism 10. The plurality of interval water supply holes 111 are in communication with the liquid flow channel. The liquid flow channel is used for injecting liquid medium between the wafer 30 and the immersion head cover through the interval water supply holes 111.

[0070] The liquid discharging mechanism 10 is provided with an annular gas flow channel (not labeled in the figure), and the gas flow channel is circumscribed by a gas storage device for injecting gas medium into the gas flow channel. The gas knife hole group 13 includes a plurality of gas knife holes 131, which are uniformly spaced along the circumference of the liquid discharging mechanism 10, and the plurality of gas knife holes 131 are all in communication with the gas flow channel, and the gas flow channel is used to inject gas medium between the surface of the wafer 30 and the immersion head cover through the gas knife holes 131.

[0071] The liquid discharging mechanism 10 is provided with an annular first suction cavity 122, and the first needle-shaped water extraction hole group 12 includes a plurality of first needle-shaped water extraction holes 121, which are uniformly spaced along the circumference of the liquid discharging mechanism 10, and the plurality of first needle-shaped water extraction holes 121 are all in communication with the first suction cavity 122, and the first suction cavity 122 is used to extract the mixture of liquid medium and gas medium between the surface of the wafer 30 and the immersion head cover through the plurality of first needle-shaped water extraction holes 121.

[0072] The liquid discharging mechanism 10 is provided with an annular second suction cavity 152, and the second needle-shaped water extraction hole group 15 includes a plurality of second needle-shaped water extraction holes 151, which are uniformly spaced along the circumference of the liquid discharging mechanism 10, and the plurality of second needle-shaped water extraction holes 151 are all in communication with the second suction cavity 152, and the second suction cavity 152 is used to extract the liquid medium between the surface of the wafer 30 and the immersion head cover through the plurality of second needle-shaped water extraction holes 151, thereby realizing the cooperation with the first suction cavity 122 to extract the liquid medium between the surface of the wafer 30 and the immersion head cover.

[0073] The liquid discharging mechanism 10 is provided with an annular third suction cavity 142, and the first external extraction hole group 14 includes a plurality of first external extraction holes 141, which are uniformly spaced along the circumference of the liquid discharging mechanism 10, and the plurality of first external extraction holes 141 are all in communication with the third suction cavity 142, and the third suction cavity 142 is used to extract the gas medium between the surface of the wafer 30 and the immersion head cover through the plurality of first external extraction holes 141.

[0074] The liquid discharging mechanism 10 is provided with an annular fourth suction cavity 162, and the second external extraction hole group 16 includes a plurality of second external extraction holes 161, which are uniformly spaced along the circumference of the liquid discharging mechanism 10, and the plurality of second external extraction holes 161 are all in communication with the fourth suction cavity 162, and the fourth suction cavity 162 is used to extract the gas medium between the surface of the wafer 30 and the immersion head cover through the plurality of second external extraction holes 161, thereby realizing the cooperation with the third suction cavity 142 to extract the gas medium between the surface of the wafer 30 and the immersion head cover.

[0075] As Figure 1As shown, if part of the liquid medium enters the right side of the air knife hole group 13, i.e. the area outside the air knife hole group 13, the third suction cavity 142 is used to extract the part of the liquid medium through the plurality of first external extraction holes 141, and the fourth suction cavity 162 is used to extract the part of the liquid medium through the plurality of second external extraction holes 161.

[0076] Along the radial direction of the wafer 30, the liquid flow channel, the second suction cavity 152, the first suction cavity 122, the gas flow channel, the fourth suction cavity 162 and the third suction cavity 142 are sequentially and independently arranged.

[0077] In the present application, the first suction cavity 122, the second suction cavity 152, the third suction cavity 142 and the fourth suction cavity 162 are in communication with the same air extraction mechanism in the immersion head cover, and the air extraction mechanism is used to extract air from the first suction cavity 122, the second suction cavity 152, the third suction cavity 142 and the fourth suction cavity 162.

[0078] When the detection mechanism 20 detects that there is a water bead in the area outside the air knife hole group 13, the detection mechanism 20 generates a first detection signal and transmits the first detection signal to the first control module, and the first control module generates a first control signal according to the first detection signal and transmits the first control signal to the air extraction mechanism to control the air extraction mechanism to increase the operating power, so as to improve the extraction effect of the liquid medium and the gas medium.

[0079] In another embodiment of the present application, the first suction cavity 122, the second suction cavity 152, the third suction cavity 142 and the fourth suction cavity 162 are respectively in communication with an air extraction mechanism, and the four air extraction mechanisms are used to correspond to the first suction cavity 122, the second suction cavity 152, the third suction cavity 142 and the fourth suction cavity 162 respectively, and each air extraction mechanism is used to extract air from the corresponding suction cavity.

[0080] When the detection mechanism 20 detects that there is a water bead in the area outside the air knife hole group 13, the detection mechanism 20 generates a first detection signal and transmits the first detection signal to the first control module, and the first control module generates a first control signal according to the first detection signal and transmits the first control signal to the air extraction mechanism to control the air extraction mechanism to increase the operating power, so as to improve the extraction effect of the liquid medium and the gas medium.

[0081] In the present application, please refer to Figure 1 and Figure 2 , the detection mechanism 20 includes a laser 21 and a photoelectric sensor 22.

[0082] The laser 21 is connected to the immersion head cover and is electrically connected to the first control module, and is used to emit a laser beam into the area outside the air knife hole group 13. The photoelectric sensor 22 is connected to the liquid discharge mechanism 10 and is electrically connected to the first control module, and is located in the light path of part of the scattered light formed by the water bead scattering the laser beam.

[0083] When the water droplets exist in the outer side area of the air knife hole group 13, the water droplets scatter the laser beams to form scattered light rays, the photoelectric sensor 22 generates a first detection signal according to the received part of the scattered light rays, and transmits the first detection signal to the first control module, the first control module generates a first control signal and an alarm signal according to the first detection signal, and transmits the first control signal to the first control module, and the first control module transmits the first control signal to the air extraction mechanism, and the air extraction mechanism increases the power according to the first control signal to improve the suction force of the first needle-shaped water extraction hole group 12, the second needle-shaped water extraction hole group 15, the second external extraction hole group 16 and the second external extraction hole group 16.

[0084] In the application, the photoelectric sensor 22 is located outside the first external extraction hole group 14.

[0085] In an embodiment of the application, the detection mechanism 20 further comprises a linear beam generating piece 23.

[0086] Please refer to Figure 5 , the linear beam generating piece 23 is connected to the immersion head cover and is arranged on the light path of the laser beam, which is used to convert the laser beam into a linear detection beam, and then make the detection beam irradiate to the outer side area of the air knife hole group 13, so as to increase the irradiation length of the laser beam in the outer side area of the air knife hole group 13.

[0087] The point-shaped laser beam is converted into a linear laser beam by the linear beam generating piece 23, so as to increase the irradiation area of the laser beam in the outer side area of the air knife hole group 13, and thus improve the detection accuracy of the water droplets.

[0088] In the application, the linear beam generating piece 23 is a cylindrical lens or a light deflection prism.

[0089] In other embodiments of the application, the linear beam generating piece 23 can also be other optical devices, as long as it can convert the point-shaped laser beam into a linear detection beam.

[0090] In an embodiment of the application, the number of the laser 21 is multiple, and the multiple lasers 21 are spaced along the circumference of the immersion head cover. The number of the linear beam generating piece 23 is also multiple, and the multiple linear beam generating pieces 23 are connected to the immersion head cover and are spaced along the circumference of the immersion head cover, and the multiple linear beam generating pieces 23 correspond to the multiple lasers 21 one by one, and each linear beam generating piece 23 is arranged on the light path of the laser beam emitted by the corresponding laser 21. The multiple linear beam generating pieces 23 are used to convert the laser beams emitted by the multiple lasers 21 into a ring-shaped detection beam, and make the detection beam irradiate to the outer side area of the air knife hole group 13.

[0091] In an embodiment of the present application, the detection mechanism 20 further comprises a ring-shaped light beam generator.

[0092] The ring-shaped light beam generator is connected to the immersion head cover and is arranged in the light path of the laser beam, and is used to convert the laser beam into a ring-shaped detection beam and irradiate the detection beam into the area outside the gas knife hole group 13.

[0093] In this embodiment, the ring-shaped light beam generator is any one of a spiral phase plate, a spatial light modulator or a ring-shaped optical diffraction grating.

[0094] In other embodiments of the present application, the ring-shaped light beam generator can also be other optical devices as necessary to be able to convert the point-shaped laser beam into a ring-shaped detection beam.

[0095] In the present application, the immersion head cover further comprises a storage module.

[0096] The storage module is electrically connected to the first control module, and the first control module generates error information according to the alarm signal and transmits the error information to the storage module for storage.

[0097] By setting the storage module, the wafer 30 production information triggering the alarm signal is stored, so as to facilitate subsequent tracking or checking of the wafer 30 triggering the alarm signal stored in the storage module, thereby preventing defective wafers 30 from flowing into the next production link.

[0098] In a second aspect, the present application provides an immersion lithography machine, comprising an immersion head cover and a second control module.

[0099] The immersion head cover is any one of the above immersion head covers. The second control module is used to control the immersion lithography machine and is electrically connected to the first control module or the storage module in the immersion head cover.

[0100] The second control module is further electrically connected to a production management system and is used to transmit the error information to the production management system.

[0101] Specifically, since the second control module is further electrically connected to the production management system, when the immersion head cover detects whether there is a water droplet in the area outside the gas knife hole group 13 and triggers an alarm signal, the operator can obtain the production information of the wafer 30 corresponding to the alarm signal triggered by the second control module, and combine the production management system to track and check the wafer 30 triggering the alarm signal, thereby preventing defective wafers 30 from flowing into the next process flow.

[0102] The immersion lithography machine provided by the application has the beneficial effects that, compared with the prior art, the immersion lithography machine provided by the application includes any one of the immersion head covers provided above, the immersion head cover includes a liquid discharge mechanism 10 and a detection mechanism 20, the detection mechanism 20 is installed on the immersion head cover and is electrically connected with a first control module of the liquid discharge mechanism 10, the liquid discharge mechanism 10 includes a ring-shaped interval water supply hole group 11, a first needle-shaped water extraction hole group 12, a gas knife hole group 13 and a first external extraction hole group 14, along the radial direction of the liquid discharge mechanism 10, the interval water supply hole group 11, the first needle-shaped water extraction hole group 12, the gas knife hole group 13 and the first external extraction hole group 14 are sequentially spaced, a second needle-shaped water extraction hole group 15 is arranged between the interval water supply hole group and the first needle-shaped water extraction hole group 12, a second external extraction hole group 16 is arranged outside the gas knife hole group 13, when the detection mechanism 20 detects that there is a water bead in the area outside the gas knife hole group 13, the first control module increases the suction force of the first needle-shaped water extraction hole group 12, the second needle-shaped water extraction hole group 15, the second external extraction hole group 16 and the second external extraction hole group 16, so as to extract the water bead or the bubble, and prevent the water bead or the bubble from causing defects of the wafer 30, at the same time, the detection mechanism 20 sends an alarm signal and transmits the alarm signal to the first control module, so that the operator subsequently detects the wafer 30 corresponding to the alarm signal according to the alarm signal, and prevents the defective wafer 30 from entering the subsequent production process.

[0103] The above is only a preferred embodiment of the application, and is not used to limit the application, any modification, equivalent replacement and improvement made within the spirit and principle of the application should be included in the protection scope of the application.

Claims

1. An immersion headgear for an immersion lithography machine, characterized by, The immersion head cover comprises: a liquid discharge mechanism comprising a ring-shaped water supply hole group, a first needle-shaped water extraction hole group, an air knife hole group, and a first external extraction hole group, which are sequentially spaced along the radial direction of the liquid discharge mechanism, the liquid discharge mechanism further comprising: a second needle-shaped water extraction hole group arranged between the water supply hole group and the first needle-shaped water extraction hole group; a second external extraction hole group arranged outside the air knife hole group; a detection mechanism installed on the immersion head cover and electrically connected to the first control module of the liquid discharge mechanism, for detecting whether there is water droplet in the area outside the air knife hole group; when the detection mechanism detects the presence of water droplet in the area outside the air knife hole group, the first control module increases the suction force of the first needle-shaped water extraction hole group, the second needle-shaped water extraction hole group, the second external extraction hole group, and the second external extraction hole group, and the detection mechanism sends an alarm signal and transmits the alarm signal to the first control module.

2. The immersion head cover of claim 1, wherein: the second external extraction hole group is arranged inside the first external extraction hole group.

3. The head-immersed hood of claim 2, wherein, The liquid discharge mechanism is provided with: a first suction chamber in communication with the first needle-shaped water extraction hole group; a second suction chamber in communication with the second needle-shaped water extraction hole group; a third suction chamber; in communication with the first external extraction hole group; a fourth suction chamber in communication with the second external extraction hole group; the first suction chamber, the second suction chamber, the third suction chamber, and the fourth suction chamber are independently arranged.

4. The head-immersed hood according to claim 1 or 3, characterized in that The detection mechanism comprises: a laser connected to the immersion head cover and electrically connected to the first control module, for emitting a laser beam to the area outside the air knife hole group; a photoelectric sensor connected to the liquid discharge mechanism and electrically connected to the first control module, and located on the light path of part of the scattered light formed by the scattering of the laser beam by the water droplet; when the water droplet is present in the area outside the air knife hole group, the water droplet scatters the laser beam to form the scattered light, and the photoelectric sensor generates a first control signal and the alarm signal according to the part of the scattered light received, and transmits the first control signal to the first control module, and the first control module increases the suction force of the first needle-shaped water extraction hole group, the second needle-shaped water extraction hole group, the second external extraction hole group, and the second external extraction hole group according to the first control signal.

5. The immersion head cover of claim 4, wherein: the photoelectric sensor is located outside the first external extraction hole group.

6. The head-immersed hood of claim 5, wherein, The detection mechanism further comprises: a linear beam generating element connected to the immersion head cover and arranged on the light path of the laser beam, for converting the laser beam into a linear detection beam and irradiating the detection beam into the area outside the air knife hole group.

7. The immersion head cover of claim 6, wherein: The number of the lasers is multiple, and the multiple lasers are spaced along the circumference of the immersion head cover; The number of the linear light beam generators is multiple, and the multiple linear light beam generators are connected to and spaced along the circumference of the immersion head cover, and the multiple linear light beam generators correspond to the multiple lasers one by one, and each linear light beam generator is arranged on the light path of the laser beam emitted by the corresponding laser; The multiple linear light beam generators are used to convert the laser beams emitted by the multiple lasers into a ring-shaped detection beam, and make the detection beam irradiate into the area outside the group of air knife holes.

8. The head-immersed hood of claim 5, wherein, The detection mechanism further comprises: A ring-shaped light beam generator connected to the immersion head cover and arranged on the light path of the laser beam, which is used to convert the laser beam into a ring-shaped detection beam and irradiate the detection beam into the area outside the group of air knife holes.

9. The head-immersed hood of claim 1, wherein, Further comprising: A storage module electrically connected to the first control module; The first control module generates error information according to the alarm signal and transmits the error information to the storage module for storage.

10. An immersion photolithography machine characterized by, Comprise: An immersion head cover, which is the immersion head cover according to any one of claims 1-9; A second control module for controlling the immersion lithography machine and electrically connected to the first control module or the storage module in the immersion head cover; The second control module is also electrically connected to a production management system, and is used to transmit error information to the production management system.

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