Red-light dichroic beam-combining optical filter applied to high-power laser

Abstract

The utility model discloses a dichroic beam-combining optical filter with red light applied to high-power laser, which is characterized by comprising a substrate layer positioned in the middle, a main film structure layer arranged at the upper part of the substrate layer, and a secondary film structure layer arranged at the lower part of the substrate layer, the main film structure layer is composed of 60 layers of high-refractive-index film structures and low-refractive-index film structures which are alternately overlapped outwards along one side close to the substrate layer, and the secondary film structure layer is composed of 6 layers of high-refractive-index film structures and low-refractive-index film structures which are alternately overlapped outwards along one side close to the substrate layer. The dichroic beam-combining optical filter with the red light can obtain high transmissivity in the working wave bands of 635 + / -10nm and 976 + / -10nm, can obtain high reflectivity in the working wave band of 915 + / -10nm, and realizes beam combination by reflecting and transmitting laser with different wavelengths.

Description

TECHNICAL FIELD

[0001] The utility model relates to the field of manufacturing red light dichroic beam combining filter, and particularly relates to a red light dichroic beam combining filter for high-power laser. BACKGROUND

[0002] The laser beam combining filter is an optical element used for combining multiple laser beams into one, commonly used in fields such as laser processing, laser display, and laser communication.

[0003] It can combine laser beams of different wavelengths or different directions, improving the efficiency and flexibility of the laser system. It achieves beam combining by reflecting and transmitting different wavelengths of laser light.

[0004] Therefore, it is very important to manufacture a red light dichroic beam combining filter that can withstand high-power laser while avoiding damage. SUMMARY

[0005] In order to overcome the above-mentioned defects of the prior art, the purpose of the utility model is to provide a red light dichroic beam combining filter for high-power laser.

[0006] A red light dichroic beam combining filter for high-power laser, comprising:

[0007] A base layer in the middle, a main film structure layer is provided on the upper part of the base layer,

[0008] A secondary film structure layer is provided on the lower part of the base layer;

[0009] The main film structure layer is 60 layers of high refractive index film structure and low refractive index film structure alternately stacked outward along the side close to the base layer,

[0010] The main film structure layer is as follows:

[0011] Base layer / 144.67nm H, 239.45nm L, 171.03nm H, 284.04nm L, 163.12nm H, 487.77nm L, 126.69nm H, 208.94nm L, 114.69nm H, 251.49nm L, 183.54nm H, 255.34nm L, 131.45nm H, 207.49nm L, 117.92nm H, 173.47nm L, 125.02nm H, 203.46nm L, 168.03nm H, 275.72nm L, 80.21nm H, 80nm L, 209.82nm H, 127.29nm L, 168.61nm H, 128.27nm L, 191.79nm H, 120.17nm L, 246.6nm H, 186.93nm L, 242.05nm H, 136.66nm L, 204.57nm H, 124.75nm L, 185.59nm H, 114.12nm L, 230.95nm H, 145.25nm L, 256.39nm H, 191.14nm L, 196.42nm H, 140.02nm L, 114nm H, 134.87nm L, 218.57nm H, 128.65nm L, 229.2nm H, 227.4nm L, 203.82nm H, 243.06nm L, 128.82nm H, 225.73nm L, 40nm H, 86.04nm L, 520.37nm H, 159.11nm L, 160.74nm H, 454.54nm L, 132.62nm H, 291.04nm L / air;

[0012] The secondary film structure layer is 6 layers of high refractive index film structure and low refractive index film structure which are alternately stacked outward along a side close to the base layer,

[0013] The secondary film structure layer is:

[0014] Base layer / 24.98nm H, 75.32nm L, 66.4nm H, 23.3nm L, 90.62nm H, 185.88nm L / air;

[0015] Wherein, H represents a high refractive index film structure, L represents a low refractive index film structure, and the nanometer number before H and L is the thickness of the corresponding film structure.

[0016] In a preferred embodiment of the utility model, the working wave band of the red light dichroic beam combining filter is 625-986nm.

[0017] In an optimal embodiment of the present application, the high-transmittance working wavelength band of the red-light dichroic beam-combining filter is 635±10nm and 915±10nm, and the high transmittance is specifically a transmittance T>95% at the working wavelength band of 635±10nm and a transmittance T>99% at the working wavelength band of 915±10nm.

[0018] In an optimal embodiment of the present application, the high-reflectivity working wavelength band of the red-light dichroic beam-combining filter is 976±10nm, and the high reflectivity is specifically a reflectivity R>99% at the working wavelength band of 976±10nm.

[0019] In an optimal embodiment of the present application, the high-refractive-film structure is a tantalum pentoxide Ta2O5 material.

[0020] In an optimal embodiment of the present application, the low-refractive-film structure is a silicon dioxide SIO2 material.

[0021] In an optimal embodiment of the present application, the material of the substrate layer is a quartz material, preferably a Heraeus 313 quartz material.

[0022] The present application has the following beneficial effects:

[0023] The red-light dichroic beam-combining filter of the present application can achieve high transmittance in the working wavelength band of 635±10nm and 976±10nm, and high reflectivity in the working wavelength band of 915±10nm, thereby realizing beam combination by reflecting and transmitting laser beams of different wavelengths. The material of the substrate layer is Heraeus 313 quartz, which has the characteristics of low expansion coefficient, few impurities, high heat resistance, high moisture resistance, and excellent chemical stability, and is suitable for high-energy lasers. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 FIG. 1 is a structural schematic diagram of the present application.

[0025] Figure 2 FIG. 2 is an effect schematic diagram of an embodiment of the present application. DETAILED DESCRIPTION

[0026] In order to make the purpose, technical scheme and advantages of the present application more clear and explicit, the present application is further described in detail below with reference to the drawings and embodiments. However, it should be understood that the specific embodiments described herein are only used to explain the present application and do not limit the scope of the present application. In addition, the description of known structures and technologies is omitted in the following structure to avoid unnecessary confusion of the concept of the present application.

[0027] In the description of the utility model, it is necessary to explain that the terms "upper", "lower", "inner", "outer", "top / bottom end" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the utility model and simplifying the description. It is not intended to indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the utility model.

[0028] As shown in Figure 1 A red light dichroic beam combiner filter applied to high-power laser, comprising a base layer 100 in the middle, the base layer 100 is helly 313 quartz material.

[0029] A main film structure layer 200 is arranged on the upper part of the base layer 100. A secondary film structure layer 300 is arranged on the lower part of the base layer 100.

[0030] The main film structure layer 200 is 60 layers of high refractive index film structure and low refractive index film structure alternately stacked outward along the side close to the base layer 100, and the main film structure layer 200 is as follows:

[0031] Base layer / 144.67nmH, 239.45nmL, 171.03nmH, 284.04nmL, 163.12nmH, 487.77nmL, 126.69nmH, 208.94nmL, 114.69nmH, 251.49nmL, 183.54nmH, 255.34nmL, 131.45nmH, 207.49nmL, 117.92nmH, 173.47nmL, 125.02nmH, 203.46nmL, 168.03nmH, 275.72nmL, 80.21nmH, 80nmL, 209.82nmH, 127.29nmL, 168.61nmH, 128.27nmL, 191.79nmH, 120.17nmL, 246.6nmH, 186.93nmL, 242.05nmH, 136.66nmL, 204.57nmH, 124.75nmL, 185.59nmH,

[0032] 114.12nmL, 230.95nmH, 145.25nmL, 256.39nmH, 191.14nmL, 196.42nmH, 140.02nmL, 114nmH, 134.87nmL, 218.57nmH, 128.65nmL, 229.2nmH, 227.4nmL, 203.82nmH, 243.06nmL, 128.82nmH, 225.73nmL, 40nmH, 86.04nmL, 520.37nmH, 159.11nmL, 160.74nmH, 454.54nmL, 132.62nmH, 291.04nmL / air. Wherein, H represents a high refractive index film structure, L represents a low refractive index film structure, and the nanometer number before H and L is the thickness of the corresponding film structure.

[0033] The secondary film structure layer is 6 layers of high refractive index film structures and low refractive index film structures alternately stacked outward along the side close to the substrate layer 100.

[0034] The secondary film structure layer is:

[0035] Substrate layer / 24.98nmH, 75.32nmL, 66.4nmH, 23.3nmL, 90.62nmH, 185.88nmL / air;

[0036] Wherein, H represents a high refractive index film structure, L represents a low refractive index film structure, and the nanometer number before H and L is the thickness of the corresponding film structure.

[0037] The high refractive index film structure is tantalum pentoxide Ta2O5 material. The low refractive index film structure is silicon dioxide SIO2 material.

[0038] The working wavelength band of the high transmittance of the red dichroic beam combining filter is 635±10nm, 915±10nm, and the high transmittance is specifically that the transmittance T>95% under the working wavelength band of 635±10nm, and the transmittance T>99% under the working wavelength band of 915±10nm.

[0039] The working wavelength band of the high reflectivity of the red dichroic beam combining filter is 976±10nm, and the high reflectivity is specifically that the reflectivity R>99% under the working wavelength band of 976±10nm.

[0040] The main feature of the utility model lies in that:

[0041] The helios SUP-313 adopted by the substrate layer is suitable for quartz base material with low expansion coefficient, few impurities, heat resistance, moisture resistance and chemical stability for high energy laser.

[0042] The beam combining filter has high transmittance, so that the energy loss is reduced.

[0043] The beam combining filter is designed for a specific wavelength range, in this embodiment, 625-986nm, and can effectively combine laser beams of different wavelengths.

[0044] The beam combining filter has high reflectivity, which can effectively reduce reflected light and avoid interfering with the laser system.

[0045] Combining laser beams of different wavelengths improves the efficiency and flexibility of the laser system. By reflecting and transmitting laser beams of different wavelengths, the beam combining filter has high transmission of 915±10nm T>99% and high reflectivity of 976±10nm R>99%.

[0046] The beam combining filter has a high damage threshold, which can withstand high-power laser of about 6000w, and avoid damage.

[0047] The beam combining filter has a function of red light 635nm waveband at the same time, which can be used for low energy indication.

[0048] The above shows and describes the basic principle and main features of the utility model and the advantages of the utility model.

[0049] Those skilled in the art should understand that the utility model is not limited by the above embodiments, and the above embodiments and descriptions in the specification are only to illustrate the principle of the utility model, and various changes and improvements can be made without departing from the spirit and scope of the utility model. The utility model falls within the scope of the utility model claimed, which is defined by the appended claims and their equivalents.

Claims

1. A red-light dichroic beam combiner filter for use in high-power lasers, characterized in that, It comprises: a base layer in the middle, a main film structure layer is arranged on the upper part of the base layer, a secondary film structure layer is arranged on the lower part of the base layer; the main film structure layer is 60 layers of high refractive index film structure and low refractive index film structure which are alternately stacked outward along the side close to the base layer, the main film structure layer is as follows: Base layer / 144.67nmH, 239.45nmL, 171.03nmH, 284.04nmL, 163.12nmH, 487.77nmL, 126.69nmH, 208.94nmL, 114.69nmH, 251.49nmL, 183.54nmH, 255.34nmL, 131.45nmH, 207.49nmL, 117.92nmH, 173.47nmL, 125.02nmH, 203.46nmL, 168.03nmH, 275.72nmL, 80.21nmH, 80nmL, 209.82nmH, 127.29nmL, 168.61nmH, 128.27nmL, 191.79nmH, 120.17nmL, 246.6nmH, 186.93nmL, 242.05nmH, 136.66nmL, 204.57nmH, 124.75nmL, 185.59nmH, 114.12nmL, 230.95nmH, 145.25nmL, 256.39nmH, 191.14nmL, 196.42nmH, 140.02nmL, 114nmH, 134.87nmL, 218.57nmH, 128.65nmL, 229.2nmH, 227.4nmL, 203.82nmH, 243.06nmL, 128.82nmH, 225.73nmL, 40nmH, 86.04nmL, 520.37nmH, 159.11nmL, 160.74nmH, 454.54nmL, 132.62nmH, 291.04nmL / air; the secondary film structure layer is 6 layers of high refractive index film structure and low refractive index film structure which are alternately stacked outward along the side close to the base layer, the secondary film structure layer is: Base layer / 24.98nmH, 75.32nmL, 66.4nmH, 23.3nmL, 90.62nmH, 185.88nmL / air; wherein H represents high refractive index film structure, L represents low refractive index film structure, and the nanometer number before H and L is the thickness of the corresponding film structure.

2. A red dichroic combiner filter for use with high power lasers as recited in claim 1, wherein, The working waveband of the red dichroic beam combining filter is 625-986nm.

3. A red-pass dichroic combiner filter for use with high power lasers as recited in claim 1, wherein: The high transmittance working waveband of the red dichroic beam combining filter is 635±10nm, 915±10nm.

4. A red-pass dichroic combiner filter for use with high power lasers as recited in claim 1, wherein, The high reflectivity working waveband of the red dichroic beam combining filter is 976±10nm.

5. A red-pass dichroic combiner filter for use with high power lasers as recited in claim 1, wherein, The high refractive index film structure is tantalum pentoxide Ta2O5 material.

6. A red-pass dichroic combiner filter for use with high power lasers as recited in claim 1, wherein, The low-refractive-index film structure is made of silicon dioxide SIO2.

7. A red-pass dichroic combiner filter for use with high power lasers as recited in claim 1, wherein, The substrate layer is made of quartz.

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