Optical waveguide structure and AR near-to-eye display device

By introducing a combination structure of rigid support layer, low refractive index layer and high refractive index layer into the optical waveguide, combined with a resin layer, the problems of easy deformation and large thickness of the optical waveguide are solved, and high strength, lightweight and improved safety are achieved.

CN223742778UActive Publication Date: 2025-12-30ZHUHAI MOJIE TECH CO LTD
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Patent Information

Application Number
CN202423053031.1
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-10
Publication Date
2025-12-30
Estimated Expiration
2034-12-10

AI Technical Summary

Technical Problem

Existing optical waveguide products lack rigidity, are prone to deformation, are thick, and have poor impact resistance, resulting in poor safety and affecting user experience.

Method used

A combination structure of rigid support layer, low refractive index layer and high refractive index layer is adopted, combined with resin layer, to achieve light propagation through total internal reflection and diffraction, thereby enhancing structural strength and reducing thickness.

Benefits of technology

This improved the structural strength and deformation resistance of the optical waveguide, reduced the risk of breakage, achieved a lightweight design, and enhanced safety and user experience.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses an optical waveguide structure and an AR near-to-eye display device. The optical waveguide structure comprises a rigid supporting layer, a low refractive index layer, a high refractive index layer and a resin layer. The rigid supporting layer is provided with a first surface and a second surface which are opposite. The low-refractive-index layer is at least connected to the first surface, at least one low-refractive-index grating structure is arranged on the side, away from the rigid supporting layer, of the low-refractive-index layer, the high-refractive-index layer is connected to the side, away from the rigid supporting layer, of the low-refractive-index layer, and at least one high-refractive-index grating structure is arranged on the high-refractive-index layer. And the high-refractive-index grating structure and the low-refractive-index grating structure are correspondingly attached. The resin layer is arranged on the side, away from the low refractive index layer, of the high refractive index layer. The optical waveguide structure provided by the utility model is good in rigidity, not easy to deform, resistant to external force impact, light in weight and small in thickness.
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Description

Technical Field

[0001] This utility model relates to the field of optical device technology, and in particular to optical waveguide structures and AR near-eye display devices. Background Technology

[0002] Optical waveguides are widely used in near-eye display devices such as augmented reality and mixed reality due to their thinness, light weight, and good light transmittance.

[0003] Among existing optical waveguide products, the rigidity of the optical waveguide is relatively small. When subjected to external forces, it is easy to deform, which leads to the deterioration of the performance of the optical waveguide. In addition, the thickness of the optical waveguide is relatively large during the manufacturing process, which is not conducive to the lightweight design of the structure. In other optical waveguide products, the impact resistance is poor, it is easy to break, the safety is poor, and the user experience is poor. Utility Model Content

[0004] In view of this, the present invention proposes an optical waveguide structure and an AR near-eye display device, aiming to achieve an optical waveguide structure with certain structural strength and anti-deformation performance while having a small thickness and light weight.

[0005] The optical waveguide structure proposed in the first aspect of this utility model includes: a rigid support layer having opposing first and second surfaces; a low refractive index layer, at least connected to the first surface, with at least one low refractive index grating structure disposed on the side of the low refractive index layer away from the rigid support layer; a high refractive index layer, connected to the side of the low refractive index layer away from the rigid support layer, with at least one high refractive index grating structure disposed on the high refractive index layer, and the high refractive index grating structure correspondingly and fitted to the low refractive index grating structure; and a resin layer disposed on the side of the high refractive index layer away from the low refractive index layer.

[0006] As can be seen from the above technical solution, the optical waveguide structure proposed in the first aspect of this utility model has a rigid support layer with sufficient rigidity, making it difficult to deform under external force. When other structural layers use the rigid support layer as an attachment layer, the entire optical waveguide structure can have a certain structural strength and resistance to deformation. Furthermore, due to the refractive index difference between the low-refractive-index layer and the high-refractive-index layer, light undergoes total internal reflection when moving from the high-refractive-index layer to the low-refractive-index layer, preventing it from entering the rigid support layer. Instead, the light can diffract and propagate at the high-refractive-index grating structure, allowing the light to continuously propagate between the resin layer and the high-refractive-index layer. Because of the combination of the rigid support layer and the resin layer in this utility model, the overall structure is thinner compared to using multiple resin layers; compared to using multiple rigid support layers, the overall structure is lighter, and the risk of breakage is significantly reduced.

[0007] In some embodiments of this utility model, the rigid support layer includes at least one of a tempered glass layer, a sapphire glass layer, a quartz layer, or a rigid light-transmitting resin layer.

[0008] In some examples, the rigid transparent resin layer includes at least one of a polycarbonate layer, a polymethyl methacrylate layer, a polystyrene layer, an acrylonitrile-styrene copolymer layer, a polyethylene terephthalate layer, a transparent ABS resin layer, or a polyamide layer.

[0009] In some embodiments of this utility model, the low refractive index layer, the high refractive index layer, and the resin layer each comprise two layers, with the two low refractive index layers respectively connected to the first surface and the second surface; a high refractive index layer is connected to the side of each low refractive index layer away from the rigid support layer; and a resin layer is connected to the side of each high refractive index layer away from the low refractive index layer.

[0010] In some embodiments of this utility model, the optical waveguide structure further includes an anti-fouling film, wherein the low refractive index layer is connected to the first surface and the anti-fouling film covers the second surface; or, the low refractive index layer is connected to the second surface and the anti-fouling film covers the first surface.

[0011] In some embodiments of this invention, the resin layer and the high refractive index layer are bonded together.

[0012] In some embodiments of this utility model, the refractive index of the low refractive index layer is 1.0~1.4; and / or, the refractive index of the high refractive index layer is 1.6~2.0; and / or, the refractive index of the resin layer is 1.6~2.0.

[0013] In some embodiments of this utility model, the thickness of the low refractive index layer ranges from 0.1 μm to 5 μm; and / or, the thickness of the high refractive index layer ranges from 0.1 μm to 10 μm; and / or, the thickness of the resin layer ranges from 0.1 mm to 1.0 mm; and / or, the thickness of the rigid support layer ranges from 0.2 mm to 1 mm.

[0014] The AR near-eye display device proposed in the second aspect of this utility model includes: an optical engine and an optical waveguide structure in the foregoing embodiments, wherein the optical engine emits signal light to the optical waveguide structure, the optical waveguide structure couples the signal light into the optical waveguide structure, and couples the signal light out to the human eye.

[0015] As can be seen from the above technical solution, the AR near-eye display device proposed in the second aspect of this utility model emits signal light through an optomechanical system. When the signal light is transmitted to the optical waveguide structure, it can be coupled in and out of the light source to realize the transmission of light from the optomechanical system to the human eye, thereby enabling the human eye to see the virtual image.

[0016] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and do not limit the disclosure of the embodiments of this utility model. Attached Figure Description

[0017] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of a colored optical waveguide structure proposed in some embodiments of this utility model;

[0019] Figure 2 This is a schematic diagram of a monochromatic optical waveguide structure proposed in some embodiments of this utility model;

[0020] Figure 3 This is a schematic diagram of the fabrication method of the optical waveguide structure proposed in some embodiments of this utility model;

[0021] Figure 4 This is a schematic diagram of the structure after processing in the main steps of the fabrication method of the optical waveguide structure proposed in some embodiments of this utility model;

[0022] Figure 5 This is a schematic diagram of the fabrication method of an optical waveguide structure proposed in some embodiments of the utility model, wherein an antifouling film is also prepared on the side of the rigid support layer away from the low refractive index layer;

[0023] Figure 6 This is a schematic diagram of the structure after processing of each main step in the fabrication method of the optical waveguide structure proposed in some embodiments of this utility model. In this case, an anti-fouling film is also coated on the side of the rigid support layer away from the low refractive index layer.

[0024] Figure 7 This is a schematic diagram of the fabrication method of the optical waveguide structure proposed in some embodiments of this utility model;

[0025] Figure 8 This is a schematic diagram of the structure after processing in the main steps of the fabrication method of the optical waveguide structure proposed in some embodiments of this utility model;

[0026] Figure 9This is a schematic diagram of the fabrication method of the optical waveguide structure proposed in some embodiments of this utility model, wherein an antifouling film is also prepared on the side of the rigid support layer away from the low refractive index layer;

[0027] Figure 10 This is a schematic diagram of the structure after processing each major step in the fabrication method of the optical waveguide structure proposed in some embodiments of this utility model, wherein an anti-fouling film is also coated on the side of the rigid support layer away from the low refractive index layer.

[0028] Explanation of reference numerals in the attached figures:

[0029] 100. Optical waveguide structure;

[0030] 10. Rigid support layer; 11. First surface; 12. Second surface;

[0031] 20. Low refractive index layer; 21. Low refractive index grating structure; 22. Low refractive index imprinting adhesive;

[0032] 30. High refractive index layer; 31. High refractive index grating structure; 32. High refractive index imprinting adhesive;

[0033] 40. Resin layer;

[0034] 50. Anti-fouling film. Detailed Implementation

[0035] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, not all embodiments. Other embodiments obtained by those skilled in the art based on the embodiments of the present utility model without creative effort are all within the protection scope of the present utility model.

[0036] It should also be understood that the terminology used in this application specification is for the purpose of describing particular embodiments only and is not intended to limit the application. As used in this application specification and the appended claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise.

[0037] It should also be further understood that the term "and / or" as used in this application specification and the appended claims refers to any combination of one or more of the associated listed items, and all possible combinations, and includes such combinations. Unless otherwise specified, the following embodiments and features described herein can be combined with each other.

[0038] Existing optical waveguides cannot achieve high structural strength while being thin and lightweight, and the finished products are prone to breakage and have poor safety in use.

[0039] In view of this, the optical waveguide structure 100 proposed in this utility model, such as Figure 1 and Figure 2 As shown, it includes: a rigid support layer 10, a low refractive index layer 20, a high refractive index layer 30, and a resin layer 40.

[0040] The rigid support layer 10 has opposing first surfaces 11 and second surfaces 12. For example, the rigid support layer 10 is a plate with a certain thickness, and therefore has a first surface 11 (such as the bottom surface) and a second surface 12 (such as the top surface) that are sufficiently large compared to the other four sides.

[0041] The low refractive index layer 20 is at least connected to the first surface 11, that is, the low refractive index layer 20 is connected to the first surface 11, or the low refractive index layer 20 is connected to both the first surface 11 and the second surface 12.

[0042] At least one low-refractive-index grating structure 21 is provided on the side of the low-refractive-index layer 20 away from the rigid support layer 10. There can be one, two, three, or more low-refractive-index grating structures 21. When there are multiple low-refractive-index grating structures 21, they can be spaced apart or arranged continuously.

[0043] A high-refractive-index layer 30 is connected to the side of the low-refractive-index layer 20 away from the rigid support layer 10. At least one high-refractive-index grating structure 31 is provided on the high-refractive-index layer 30, and the high-refractive-index grating structure 31 is correspondingly and fitted to the low-refractive-index grating structure 21. Therefore, as... Figure 1 As shown, when the low refractive index layer 20 is only disposed on the first surface 11, the high refractive index layer 30 is only disposed on one side of the low refractive index layer 20, that is, the high refractive index layer 30 is only disposed on one side of the rigid support layer 10. Figure 2 As shown, when the low refractive index layer 20 is simultaneously connected to the first surface 11 and the second surface 12, the high refractive index layer 30 is provided in two layers, that is, the high refractive index layer 30 is simultaneously provided on the low refractive index layer 20 on both sides of the rigid support layer 10.

[0044] The resin layer 40 is disposed on the side of the high refractive index layer 30 away from the low refractive index layer 20. Similarly, as... Figure 1 As shown, when the high refractive index layer 30 is only disposed on the low refractive index layer 20 on one side of the rigid support layer 10, and the resin layer 40 is also only disposed on one layer, the optical waveguide structure 100 is a monochromatic optical waveguide, and light can propagate on one side. Figure 2As shown, when the high refractive index layer 30 is simultaneously disposed on the low refractive index layers 20 on both sides of the rigid support layer 10, two resin layers 40 are also disposed accordingly. At this time, the optical waveguide structure 100 is a colored optical waveguide, and light can propagate on both sides.

[0045] As can be seen from the above technical solution, the optical waveguide structure 100 proposed by this utility model has a rigid support layer 10 with sufficient rigidity, and is not easily deformed after being subjected to external force. When other structural layers use the rigid support layer 10 as an attachment layer, the entire optical waveguide structure 100 can have a certain structural strength and anti-deformation performance, good impact resistance, high rigidity, and significantly reduced deformation.

[0046] Because of the refractive index difference between the low-refractive-index layer 20 and the high-refractive-index layer 30, light undergoes total internal reflection when traveling from the high-refractive-index layer 30 to the low-refractive-index layer 20. This means that light can undergo total internal reflection within the high-refractive-index layer 30, while the light will not enter the low-refractive-index layer 20 or the rigid support layer 10. The low-refractive-index layer 20 acts as a light insulator, isolating the light on the side facing the high-refractive-index layer 30, while no light propagates within the rigid support layer 10. Light can diffract and propagate at the high-refractive-index grating structure 31, allowing it to continuously propagate between the resin layer 40 and the high-refractive-index layer 30.

[0047] Because the rigid support layer 10 and the resin layer 40 of this invention work together, the overall structure is thinner compared to using multiple resin layers 40; compared to using multiple rigid support layers 10, the overall structure is lighter, less heavy, and the risk of breakage is significantly reduced. The resin layer 40 of this invention can also protect the internal high-refractive-index grating structure 31, effectively preventing damage to the high-refractive-index grating structure 31, thereby allowing light to propagate effectively.

[0048] In this invention, light can be incident from the resin layer 40 onto the high refractive index layer 30, then onto the high refractive index grating structure 31, and subsequently diffracted back into the resin layer 40. This propagation method is suitable for reflective gratings and when the optomechanism is located on opposite sides of the substrate. Alternatively, light can be incident from the high refractive index grating structure 31 and then diffracted into the resin layer 40. This propagation method is suitable for transmissive gratings and when the optomechanism is located on the same side of the substrate.

[0049] In some examples of this invention, the rigid support layer 10 includes at least one of a tempered glass layer, a sapphire glass layer, a quartz layer, or a rigid transparent resin layer. These materials, as the rigid support layer 10, all provide the optical waveguide structure 100 with sufficient structural strength and a certain degree of rigidity, making it less prone to deformation under external forces. Furthermore, these materials have a certain degree of light transmittance, resulting in high overall light transmittance of the optical waveguide structure 100. In particular, the use of a tempered glass layer significantly improves the rigidity of the optical waveguide structure 100; under external forces, the deformation of the optical waveguide structure 100 is significantly reduced, and its impact resistance is significantly improved. Since the low-refractive-index layer 20 isolates light on the side facing the high-refractive-index layer 30, the light will not propagate within the tempered glass, and the propagation path of the light will not be affected by the stress within the tempered glass.

[0050] In some specific examples, the rigid light-transmitting resin layer includes at least one of a polycarbonate layer (commonly known as PC), a polymethyl methacrylate layer (commonly known as PMMA), a polystyrene layer (commonly known as PS), an acrylonitrile-styrene copolymer layer (commonly known as AS), a polyethylene terephthalate layer (commonly known as PET), a transparent ABS resin layer, or a polyamide layer (commonly known as PA). These rigid light-transmitting resins have a light transmittance of 85% or higher. In particular, when a polymethyl methacrylate (PMMA) layer is used, the light transmittance reaches as high as 92%. When a polycarbonate (PC) layer is used, the light transmittance reaches as high as 90%.

[0051] In some examples of this utility model, such as Figure 2 As shown, the refractive index layer 20, the high refractive index layer 30, and the resin layer 40 each consist of two layers. Two low refractive index layers 20 are respectively connected to the first surface 11 and the second surface 12. A high refractive index layer 30 is connected to the side of each low refractive index layer 20 away from the rigid support layer 10, and a resin layer 40 is connected to the side of each high refractive index layer 30 away from the low refractive index layer 20. In these examples, light can propagate through the high refractive index layers 30 and the resin layer 40 on both sides of the two low refractive index layers 20. Compared to the prior art with added glass covers, the optical waveguide structure 100 is lighter and can withstand greater impacts without cracking or breaking, thus improving safety. These examples of optical waveguide structures 100 constitute a colored optical waveguide.

[0052] In some examples of this utility model, such as Figure 1As shown, the optical waveguide structure 100 also includes an anti-fouling film 50. A low-refractive-index layer 20 is attached to the first surface 11, and the anti-fouling film 50 covers the second surface 12. In these examples, light can propagate through the high-refractive-index layer 30 and resin layer 40 on the side of the low-refractive-index layer 20 on the first surface 11, without entering the low-refractive-index layer 20 and the rigid support layer 10. The anti-fouling film 50 on the second surface 12 provides protection to the exposed rigid support layer 10, effectively preventing dust and other contaminants from adhering to the second surface 12 of the rigid support layer 10, thus maintaining the cleanliness and aesthetic appearance of the optical waveguide structure 100. The optical waveguide structure 100 in these examples is a monochromatic optical waveguide.

[0053] In other examples, the low-refractive-index layer 20 is attached to the second surface 12, and the anti-fouling film 50 covers the first surface 11. In these examples, light can propagate over the high-refractive-index layer 30 and resin layer 40 on the side of the low-refractive-index layer 20 on the second surface 12, without entering the low-refractive-index layer 20 and the rigid support layer 10. The anti-fouling film 50 on the first surface 11 provides protection to the exposed rigid support layer 10, effectively preventing dust and other contaminants from adhering to the first surface 11 of the rigid support layer 10, thus maintaining the cleanliness and aesthetic appearance of the optical waveguide structure 100. In these examples, the optical waveguide structure 100 is a monochromatic optical waveguide.

[0054] For example, the anti-fouling film 50 is an AF film (Anti-Fingerprint) layer, which can effectively resist the adhesion of fingerprints and stains. It has the advantages of high transparency, high hardness, scratch resistance and chemical corrosion resistance, thereby effectively protecting the exposed surface of the rigid support layer 10.

[0055] In some examples of this utility model, such as Figure 1 As shown, the resin layer 40 and the high refractive index layer 30 are bonded together. This allows the resin layer 40 and the high refractive index layer 30 to form a surface-to-surface connection. For example, an OCA (Optically Clear Adhesive) adhesive is applied to the side of the resin layer 40 facing the high refractive index layer 30. This optical adhesive is colorless and transparent with a total light transmittance greater than 99%, minimizing its impact on light propagation and allowing stable light propagation between the resin layer 40 and the high refractive index layer 30. This optical adhesive has good bonding strength, ensuring a stable connection between the resin layer 40 and the high refractive index layer 30. The optical adhesive can cure at room temperature, making bonding convenient. This optical adhesive is not prone to yellowing over long-term use, ensuring that the portion of the optical waveguide structure 100 that propagates light remains transparent and that light can propagate effectively over extended periods. The optical adhesive has low curing shrinkage, preventing the resin layer 40 from peeling off after bonding to the high refractive index layer 30.

[0056] In other examples, the resin layer 40 may first come into contact with the high refractive index imprinting adhesive 32 used to prepare the high refractive index layer 30, and then the high refractive index imprinting adhesive 32 may be cured to achieve the connection between the resin layer 40 and the high refractive index layer 30.

[0057] In some examples of this invention, the refractive index of the low refractive index layer 20 is 1.0 to 1.4. For example, the refractive index of the low refractive index layer 20 is 1.0, 1.1, 1.2, 1.3, 1.4, etc.

[0058] In some examples of this invention, the refractive index of the high refractive index layer 30 is 1.6 to 2.0. For example, the refractive index of the high refractive index layer 30 is 1.6, 1.7, 1.8, 1.9, 2.0, etc. The high refractive index layer 30 and the low refractive index layer 20 have a certain refractive index difference, which allows total internal reflection to occur at the interface between the high refractive index layer 30 and the low refractive index layer 20 during the propagation of light from the resin layer 40 and the high refractive index layer 30 to the low refractive index layer 20, thus preventing light from propagating into the low refractive index layer 20 and the rigid support layer 10.

[0059] For example, the refractive index difference between the high refractive index layer 30 and the low refractive index layer 20 is a minimum of 0.2 and a maximum of 1.0. As long as the light entering from the resin layer 40 and propagating through the high refractive index layer 30 to the low refractive index layer 20 can undergo total internal reflection at the interface between the high refractive index layer 30 and the low refractive index layer 20, it is acceptable.

[0060] In some examples of this invention, the refractive index of the resin layer 40 is 1.6 to 2.0. Therefore, the refractive index of the resin layer 40 is essentially the same as or very similar to the refractive index of the high-refractive-index layer 30, allowing light to propagate along a predetermined optical path between the resin layer 40 and the high-refractive-index layer 30. For example, the refractive index of the resin layer 40 is 1.6, 1.7, 1.8, 1.9, 2.0, etc.

[0061] In this invention, the high refractive index layer 30 is made of high refractive index imprinting adhesive 32, and the low refractive index layer 20 is made of low refractive index imprinting adhesive 22.

[0062] In some examples of this invention, the thickness of the rigid support layer 10 ranges from 0.2 mm to 1 mm. This allows the low-refractive-index imprinting adhesive 22, used to prepare the low-refractive-index layer 20, to adhere to the rigid support layer 10. The rigid support layer 10 provides sufficient support, facilitating the imprinting of the low-refractive-index imprinting adhesive 22. Within the aforementioned thickness range, the rigid support layer 10 also ensures that the final optical waveguide structure 100 possesses sufficient rigidity, effectively resisting external impacts and significantly reducing deformation caused by external forces. For example, the thickness of the rigid support layer 10 can be 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, or 1 mm, etc.

[0063] In some examples of this invention, the thickness of the low-refractive-index layer 20 ranges from 0.1 μm to 5 μm. Within this thickness range, the low-refractive-index imprinting adhesive 22 used to prepare the low-refractive-index layer 20 (see [reference needed]) is used. Figure 8 and Figure 10 As shown, this process enables rapid curing and, after imprinting, achieves a low-refractive-index grating structure 21 of the required size. It also allows for control of the final optical waveguide structure 100's thickness within a reasonable range, facilitating thinner waveguide structure 100 designs. For example, the thickness of the low-refractive-index layer 20 can be 0.1 μm, 0.3 μm, 0.5 μm, 0.7 μm, 0.9 μm, 1 μm, 2 μm, 3 μm, 4 μm, or 5 μm.

[0064] In some examples of this invention, the thickness of the high refractive index layer 30 ranges from 0.1 μm to 10 μm. This allows the high refractive index imprinting adhesive 32 (see [reference needed]) used to form the high refractive index layer 30 to [be used in this invention]. Figure 4 and Figure 6 (As shown) The high-refractive-index layer 20 can completely cover the surface of the low-refractive-index layer 20, or the high-refractive-index imprinting adhesive 32 can completely fill the low-refractive-index grating structure 21. For example, the thickness of the high-refractive-index layer 30 is 0.1 μm, 0.2 μm, 0.3 μm, 0.5 μm, 0.8 μm, 1 μm, 2 μm, 3 μm, 5 μm, 8 μm, or 10 μm, etc.

[0065] In some examples of this invention, the thickness of the resin layer 40 ranges from 0.1 mm to 1.0 mm. This allows the resin layer 40 to provide some protection and support for the high refractive index layer 30, and also makes the overall structural strength of the optical waveguide structure 100 high, while being thinner than when using a glass cover plate. For example, the thickness of the resin layer 40 is 0.1 mm, 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, or 1.0 mm, etc.

[0066] The AR near-eye display device proposed in this application is described below.

[0067] The AR near-eye display device proposed according to this utility model includes: an optical engine and an optical waveguide structure 100 in the aforementioned embodiments. The optical engine emits signal light into the optical waveguide structure 100, the optical waveguide structure 100 couples in the signal light, and couples the signal light out to the human eye.

[0068] As can be seen from the above technical solution, the AR near-eye display device proposed in this utility model emits signal light through an optomechanical system. When the signal light is transmitted to the optical waveguide structure 100, it can be coupled in and out of the light source to realize the transmission of light from the optomechanical system to the human eye, thereby enabling the human eye to see the virtual image.

[0069] The application of the AR near-eye display device of this application is described below.

[0070] According to the application of the AR near-eye display device proposed in this utility model, the AR near-eye display device in the aforementioned example is applied to naked-eye 3D light field display.

[0071] As can be seen from the above technical solution, the application of the AR near-eye display device of this utility model can be used for naked-eye 3D light field display, which can enable the human eye to see clear and continuous stereoscopic images from different angles and enhance the interactive immersive experience.

[0072] The fabrication steps and methods for the optical waveguide structure 100 proposed in this application are described below.

[0073] Specifically, such as Figure 3 and Figure 4 As shown, it includes the following steps:

[0074] Step S10: Provide a rigid support layer 10. The material selection for the rigid support layer 10 is as described above and will not be repeated here.

[0075] Optionally, after providing the rigid support layer 10 in step S10, step S11 is also included to clean the rigid support layer 10.

[0076] Step S20: Apply low-refractive-index imprinting adhesive 22 to the first surface 11 and / or the second surface 12 of the rigid support layer 10, imprint and cure to form a low-refractive-index layer 20 with a low-refractive-index grating structure 21. The low-refractive-index grating structure 21 formed at this time can be used as a mold for preparing a high-refractive-index grating structure 31.

[0077] Step S30: Coat the low refractive index layer 20 with high refractive index imprinting adhesive 32, so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21. The high refractive index imprinting adhesive 32 has a certain fluidity, and under the action of gravity, it can automatically fill into the low refractive index grating structure 21, which facilitates further molding in the subsequent process.

[0078] Step S40: Place the resin layer 40 on the side of the high refractive index imprinting adhesive 32 away from the low refractive index layer 20, and cure the high refractive index imprinting adhesive 32 to form an optical waveguide structure 100.

[0079] Specifically, in step S40, the method for fabricating the optical waveguide structure 100 can be selected from one of the following steps S41 and S42.

[0080] S41. Place the resin layer 40 on the side of the high-refractive-index imprinting adhesive 32 away from the low-refractive-index layer 20. At this time, the resin layer 40 can squeeze the high-refractive-index imprinting adhesive 32 by its own gravity, so that the low-refractive-index grating structure 21 is filled with the high-refractive-index imprinting adhesive 32, and the gap between the high-refractive-index imprinting adhesive 32 and the low-refractive-index layer 20 is smaller and better adhered, with fewer air bubbles between the high-refractive-index imprinting adhesive 32 and the low-refractive-index layer 20. After curing, the high-refractive-index imprinting adhesive 32 can form a connection between the high-refractive-index layer 30 and the low-refractive-index layer 20, can also form a connection between the low-refractive-index grating structure 21 and the high-refractive-index grating structure 31, and can also form a connection between the high-refractive-index layer 30 and the resin layer 40, finally obtaining the optical waveguide structure 100. In these examples, the high refractive index imprinting adhesive 32 is in contact with the resin layer 40 while still wet. When the high refractive index imprinting adhesive 32 is subsequently cured and becomes the high refractive index layer 30, it automatically connects with the resin layer 40 without the need to apply adhesive to the resin layer 40, thus saving adhesive usage. The overall thickness of the optical waveguide structure 100 is smaller than that of S42, and the process of applying additional adhesive to the resin layer 40 is saved, reducing the thickness by approximately 0.05 mm.

[0081] It should be noted that, as Figure 4 As shown, for a monochromatic waveguide, step S41 only needs to be performed on a low refractive index layer 20 (e.g., a low refractive index layer 20 on the first surface 11 or a low refractive index layer 20 on the second surface 12), and each of the above steps only needs to be performed once.

[0082] For a colored optical waveguide, a low-refractive-index imprinting adhesive 22 is coated onto the first surface 11 of the rigid support layer 10, imprinted, and cured to form a low-refractive-index layer 20 with a low-refractive-index grating structure 21. The low-refractive-index imprinting adhesive 22 is then coated onto the second surface 12 of the rigid support layer 10, imprinted, and cured to form another low-refractive-index layer 20 with the low-refractive-index grating structure 21. Steps S30 and S41 are repeated once each, forming a high-refractive-index layer 30 and a resin layer 40 on both the first surface 11 and the second surface 12 of the low-refractive-index layer 20, thereby achieving the fabrication of the colored optical waveguide.

[0083] Optionally, in another embodiment of this application, the resin layer 40 is placed on the side of the high refractive index imprinting adhesive 32 away from the low refractive index layer 20, and the high refractive index imprinting adhesive 32 is cured to form the optical waveguide structure 100. This is prepared by the following method:

[0084] Step S42: The high-refractive-index imprinting adhesive 32 is cured, forming a high-refractive-index layer 30. This high-refractive-index layer 30 is connected to the low-refractive-index layer 20, and the high-refractive-index grating structure 31 on the high-refractive-index layer 30 is also connected to the low-refractive-index grating structure 21. The resin layer 40 is then bonded to the side of the high-refractive-index layer 30 away from the low-refractive-index layer 20, resulting in the optical waveguide structure 100. In these examples, by further bonding the resin layer 40 to the high-refractive-index layer 30, a complete optical waveguide structure 100 is formed.

[0085] It should be noted that, as Figure 4 As shown, for a monochromatic waveguide, step S42 only needs to be performed on a low refractive index layer 20 (e.g., a low refractive index layer 20 on the first surface 11 or a low refractive index layer 20 on the second surface 12), and each of the above steps only needs to be performed once.

[0086] For a colored optical waveguide, a low-refractive-index imprinting adhesive 22 is coated onto the first surface 11 of the rigid support layer 10, imprinted, and cured to form a low-refractive-index layer 20 with a low-refractive-index grating structure 21. The low-refractive-index imprinting adhesive 22 is then coated onto the second surface 12 of the rigid support layer 10, imprinted, and cured to form another low-refractive-index layer 20 with the low-refractive-index grating structure 21. Steps S30 and S42 are repeated once each to ensure that a high-refractive-index layer 30 and a resin layer 40 are formed on both the first and second surfaces 11 and on the low-refractive-index layer 20, thereby achieving the fabrication of the colored optical waveguide.

[0087] As can be seen from the above, the fabrication method of the optical waveguide structure 100 described in this application is simple. A low-refractive-index grating structure 21 formed by imprinting and curing a low-refractive-index imprinting adhesive 22 can be used to form a high-refractive-index grating structure 31. This fabrication of the high-refractive-index grating structure 31 allows for better adhesion between the high-refractive-index grating structure 31 and the low-refractive-index grating structure 21, and simplifies the connection arrangement between the low-refractive-index layer 20 and the high-refractive-index layer 30. The fabricated optical waveguide structure 100 exhibits good rigidity, is not easily deformed, is resistant to external impact, is lightweight, and has a small thickness.

[0088] In this utility model, such as Figure 5As shown, the fabrication method of the optical waveguide structure 100 further includes the following steps: In step S50, when the low-refractive-index imprinting adhesive 22 is only applied to the first surface 11 or the second surface 12 of the rigid support layer 10, before obtaining the optical waveguide structure 100, an anti-fouling film 50 is also coated on the side of the rigid support layer 10 away from the low-refractive-index layer 20. That is, for a monochromatic optical waveguide, an anti-fouling film 50 is coated on the exposed side of the rigid support layer 10.

[0089] like Figure 6 As shown, this embodiment illustrates an example where the low-refractive-index imprinting adhesive 22 is only disposed on the first surface 11 of the rigid support layer 10, and the second surface 12 is also coated with an antifouling film 50. The example where the low-refractive-index imprinting adhesive 22 is only disposed on the second surface 12 of the rigid support layer 10, and the first surface 11 is coated with an antifouling film 50, will not be elaborated upon here. The material and advantages of the antifouling film 50 have been described above and will not be repeated here.

[0090] For example, the coated antifouling film 50 is an AF film. For curable resin-based AF films, preparation is achieved by spraying followed by UV curing or heat curing. For self-limiting surface reaction-based AF films, preparation is achieved by spraying or vacuum evaporation.

[0091] Regarding another method for fabricating the optical waveguide structure 100 of this utility model, such as... Figure 7 and Figure 8 As shown, it includes the following steps:

[0092] Step S100: Provide a rigid support layer 10. The material selection for the rigid support layer 10 is as described above and will not be repeated here.

[0093] Optionally, after providing the rigid support layer 10 in step S100, the method further includes step S110, which involves cleaning the rigid support layer 10.

[0094] Step S200: Apply low refractive index imprinting adhesive 22 to the first surface 11 or the second surface 12 of the rigid support layer 10 and form a first substrate with the rigid support layer 10. At this time, the low refractive index imprinting adhesive 22 is not cured and is in a wet adhesive state.

[0095] In step S300, a resin layer 40 is provided, and a high-refractive-index imprinting adhesive 32 is coated on the resin layer 40 for imprinting and curing, forming a high-refractive-index layer 30 with a high-refractive-index grating structure 31. The resin layer 40 and the high-refractive-index layer 30 form a second substrate. At this time, the resin layer 40 provides adhesion for the high-refractive-index imprinting adhesive 32, facilitating the imprinting of the high-refractive-index imprinting adhesive 32. The high-refractive-index grating structure 31 serves as an imprinting mold for preparing the low-refractive-index grating structure 21. When the high-refractive-index layer 30 with the high-refractive-index grating structure 31 is bonded to the uncured low-refractive-index imprinting adhesive 22, a matching structure can be formed on the low-refractive-index imprinting adhesive 22.

[0096] Step S400: The second substrate and the first substrate are bonded and debubbled in a vacuum environment. Exemplarily, debubbling is performed in a debubbling machine to eliminate air bubbles that may exist during the bonding process, thereby ensuring a tight bond between the second substrate and the first substrate with no or fewer air bubbles; that is, to form a bubble-free bond between the high refractive index layer 30 and the low refractive index imprinting adhesive 22.

[0097] Step S500: The low-refractive-index imprinting adhesive 22 is cured to obtain the optical waveguide structure 100. The portion of the cured low-refractive-index imprinting adhesive 22 that mates with the high-refractive-index grating structure 31 will automatically form a low-refractive-index grating structure 21. Thus, the low-refractive-index imprinting adhesive 22 forms a low-refractive-index layer 20 with the low-refractive-index grating structure 21.

[0098] It should be noted that, as Figure 7 As shown, for a monochromatic waveguide, steps S200, S300, S400 and S500 only need to be performed on one side of the rigid support layer 10 (e.g., the low refractive index layer 20 on the first surface 11 or the low refractive index layer 20 on the second surface 12), and each of the above steps only needs to be performed once.

[0099] For a colored optical waveguide, steps S200, S300, S400, and S500 need to be repeated. In addition to performing steps S200, S300, S400, and S500 on one side of the aforementioned rigid support layer 10 (such as the first surface 11), steps S200, S300, S400, and S500 also need to be performed on the other side of the rigid support layer 10 (such as the second surface 12) to achieve the fabrication of the colored optical waveguide. The fabrication process of the colored optical waveguide will not be elaborated upon here.

[0100] As can be seen from the above, the fabrication method of the optical waveguide structure 100 of this application is simple, produces few bubbles, and has a high degree of adhesion between the layers. A low-refractive-index grating structure 21 can be formed using a high-refractive-index grating structure 31 formed by imprinting and curing a high-refractive-index imprinting adhesive 32. This fabrication of the low-refractive-index grating structure 21 ensures a high degree of fit between the low-refractive-index grating structure 21 and the high-refractive-index grating structure 31, and simplifies the connection arrangement between the low-refractive-index layer 20 and the high-refractive-index layer 30. The fabricated optical waveguide structure 100 exhibits good rigidity, is not easily deformed, is resistant to external impact, is lightweight, and has a small thickness.

[0101] like Figure 9 As shown, the optical waveguide structure 100 provided in this application, the fabrication method of the optical waveguide structure 100 further includes the following steps:

[0102] In step S600, when the low-refractive-index imprinting adhesive 22 is only applied to the first surface 11 or the second surface 12 of the rigid support layer 10, before obtaining the optical waveguide structure 100, an anti-fouling film 50 is also coated on the side of the rigid support layer 10 away from the low-refractive-index layer 20. Therefore, when the low-refractive-index imprinting adhesive 22 is only applied to the first surface 11 or the second surface 12 of the rigid support layer 10, an anti-fouling film 50 is also coated on the side of the rigid support layer 10 away from the low-refractive-index layer 20. In other words, for a monochromatic optical waveguide, an anti-fouling film 50 is coated on the exposed side of the rigid support layer 10.

[0103] like Figure 10 As shown, this embodiment illustrates an example where the low-refractive-index imprinting adhesive 22 is only disposed on the first surface 11 of the rigid support layer 10, and the second surface 12 is also coated with an antifouling film 50. The example where the low-refractive-index imprinting adhesive 22 is only disposed on the second surface 12 of the rigid support layer 10, and the first surface 11 is coated with an antifouling film 50, will not be elaborated upon here. The material and advantages of the antifouling film 50 have been described above and will not be repeated here.

[0104] For example, the coated antifouling film 50 is an AF film. For curable resin-based AF films, preparation is achieved by spraying followed by UV curing or heat curing. For self-limiting surface reaction-based AF films, preparation is achieved by spraying or vacuum evaporation.

[0105] The optical waveguide structure 100 and its fabrication method of this utility model are further described below with reference to specific embodiments. The following embodiments are merely exemplary descriptions of this utility model and should not be construed as limiting this utility model.

[0106] Example 1

[0107] An optical waveguide structure 100, such as Figure 1As shown, the structure includes a rigid support layer 10, a low-refractive-index layer 20, a high-refractive-index layer 30, a resin layer 40, and an anti-fouling film 50. The rigid support layer 10 has opposing first surfaces 11 and second surfaces 12. The low-refractive-index layer 20 is at least connected to the first surface 11, and two spaced-apart low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layer 20 away from the rigid support layer 10. The high-refractive-index layer 30 is connected to the side of the low-refractive-index layer 20 away from the rigid support layer 10, and two high-refractive-index grating structures 31 are provided on the high-refractive-index layer 30, with the two high-refractive-index grating structures 31 correspondingly attached to the two low-refractive-index grating structures 21. The resin layer 40 is located on the side of the high-refractive-index layer 30 away from the low-refractive-index layer 20. The anti-fouling film 50 covers the second surface 12.

[0108] A method for fabricating an optical waveguide structure 100, combined with Figure 3 and Figure 5 As shown, it includes the following steps:

[0109] Step S10: Provide a rigid support layer 10.

[0110] Step S20: Apply low-refractive-index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 for imprinting and curing to form a low-refractive-index layer 20 with a low-refractive-index grating structure 21.

[0111] Step S30: Coat the low refractive index layer 20 with high refractive index imprinting adhesive 32 so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0112] Step S41: Place the resin layer 40 on the side of the high refractive index imprinting adhesive 32 away from the low refractive index layer 20, and then cure it.

[0113] Step S50: An anti-fouling film 50 is coated on the second surface 12 of the rigid support layer 10, and a monochromatic optical waveguide structure 100 is finally obtained.

[0114] Example 2

[0115] An optical waveguide structure 100, such as Figure 1As shown, the structure includes a rigid support layer 10, a low-refractive-index layer 20, a high-refractive-index layer 30, a resin layer 40, and an anti-fouling film 50. The rigid support layer 10 has opposing first surfaces 11 and second surfaces 12. The low-refractive-index layer 20 is at least connected to the first surface 11, and two spaced-apart low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layer 20 away from the rigid support layer 10. The high-refractive-index layer 30 is connected to the side of the low-refractive-index layer 20 away from the rigid support layer 10, and two high-refractive-index grating structures 31 are provided on the high-refractive-index layer 30, with the two high-refractive-index grating structures 31 correspondingly attached to the two low-refractive-index grating structures 21. The resin layer 40 is located on the side of the high-refractive-index layer 30 away from the low-refractive-index layer 20. The anti-fouling film 50 covers the second surface 12.

[0116] A method for fabricating an optical waveguide structure 100, combined with Figure 3 and Figure 5 As shown, it includes the following steps:

[0117] Step S10: Provide a rigid support layer 10.

[0118] Step S20: Apply low-refractive-index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 for imprinting and curing to form a low-refractive-index layer 20 with a low-refractive-index grating structure 21.

[0119] Step S30: Coat the low refractive index layer 20 with high refractive index imprinting adhesive 32 so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0120] Step S42: First, cure the high refractive index imprinting adhesive 32. After curing, the high refractive index imprinting adhesive 32 forms a high refractive index layer 30. Then, bond the resin layer 40 to the side of the high refractive index layer 30 away from the low refractive index layer 20.

[0121] Step S50: An anti-fouling film 50 is coated on the second surface 12 of the rigid support layer 10, and a monochromatic optical waveguide structure 100 is finally obtained.

[0122] Example 3

[0123] An optical waveguide structure 100, such as Figure 2As shown, the structure includes a rigid support layer 10, two low-refractive-index layers 20, two high-refractive-index layers 30, and two resin layers 40. The rigid support layer 10 has a first surface 11 and a second surface 12 facing each other. The two low-refractive-index layers 20 are connected to the first surface 11 and the second surface 12, and two spaced low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layers 20 away from the rigid support layer 10. The two high-refractive-index layers 30 are respectively connected to the side of the low-refractive-index layers 20 away from the rigid support layer 10, and each high-refractive-index layer 30 has two high-refractive-index grating structures 31, with the two high-refractive-index grating structures 31 on the same side correspondingly attached to the two low-refractive-index grating structures 21. The two resin layers 40 are respectively disposed on the side of the high-refractive-index layers 30 away from the low-refractive-index layers 20, forming a colored optical waveguide.

[0124] A method for fabricating an optical waveguide structure 100, with reference to Figure 3 This includes the following steps:

[0125] Step S10: Provide a rigid support layer 10.

[0126] Step S20: Apply low-refractive-index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 for imprinting and curing, and apply low-refractive-index imprinting adhesive 22 to the second surface 12 of the rigid support layer 10 for imprinting and curing, thereby forming a low-refractive-index layer 20 with a low-refractive-index grating structure 21 connected to both sides of the rigid support layer 10.

[0127] Step S30: Coat the low refractive index layer 20 of the first surface 11 with a high refractive index imprinting adhesive 32, so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0128] Step S41: Place a resin layer 40 on the side of the high refractive index imprinting adhesive 32 away from the low refractive index layer 20, and then cure it.

[0129] Step S30: Coat the low refractive index layer 20 of the second surface 12 with high refractive index imprinting adhesive 32 so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0130] Step S41: Place another resin layer 40 on the side of the high refractive index imprinting adhesive 32 away from the low refractive index layer 20, and then cure it to finally obtain a colored optical waveguide structure 100.

[0131] Example 4

[0132] An optical waveguide structure 100, such as Figure 2As shown, the structure includes a rigid support layer 10, two low-refractive-index layers 20, two high-refractive-index layers 30, and two resin layers 40. The rigid support layer 10 has a first surface 11 and a second surface 12 facing each other. The two low-refractive-index layers 20 are connected to the first surface 11 and the second surface 12, and two spaced low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layers 20 away from the rigid support layer 10. The two high-refractive-index layers 30 are respectively connected to the side of the low-refractive-index layers 20 away from the rigid support layer 10, and each high-refractive-index layer 30 has two high-refractive-index grating structures 31, with the two high-refractive-index grating structures 31 on the same side correspondingly attached to the two low-refractive-index grating structures 21. The two resin layers 40 are respectively disposed on the side of the high-refractive-index layers 30 away from the low-refractive-index layers 20, forming a colored optical waveguide.

[0133] A method for fabricating an optical waveguide structure 100, with reference to Figure 3 This includes the following steps:

[0134] Step S10: Provide a rigid support layer 10.

[0135] Step S20: Apply low-refractive-index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 for imprinting and curing, and apply low-refractive-index imprinting adhesive 22 to the second surface 12 of the rigid support layer 10 for imprinting and curing, thereby forming a low-refractive-index layer 20 with a low-refractive-index grating structure 21 connected to both sides of the rigid support layer 10.

[0136] Step S30: Coat the low refractive index layer 20 of the first surface 11 with a high refractive index imprinting adhesive 32, so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0137] Step S42: Cure the high refractive index imprinting adhesive 32. After curing, the high refractive index imprinting adhesive 32 forms a high refractive index layer 30. Then, a resin layer 40 is bonded to the side of the high refractive index layer 30 away from the low refractive index layer 20.

[0138] Repeat step S30 to coat a high refractive index imprinting adhesive 32 onto the low refractive index layer 20 of the second surface 12, so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0139] Repeat step S42 to cure the high refractive index imprinting adhesive 32 on the low refractive index layer 20 of the second surface 12. After the high refractive index imprinting adhesive 32 is cured, it forms another high refractive index layer 30. Then, another resin layer 40 is bonded to the side of the high refractive index layer 30 away from the low refractive index layer 20 to form a colored optical waveguide structure 100.

[0140] Example 5

[0141] An optical waveguide structure 100, such as Figure 1 As shown, the structure includes a rigid support layer 10, a low-refractive-index layer 20, a high-refractive-index layer 30, a resin layer 40, and an anti-fouling film 50. The rigid support layer 10 has opposing first surfaces 11 and second surfaces 12. The low-refractive-index layer 20 is at least connected to the first surface 11, and two spaced-apart low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layer 20 away from the rigid support layer 10. The high-refractive-index layer 30 is connected to the side of the low-refractive-index layer 20 away from the rigid support layer 10, and two high-refractive-index grating structures 31 are provided on the high-refractive-index layer 30, with the two high-refractive-index grating structures 31 correspondingly attached to the two low-refractive-index grating structures 21. The resin layer 40 is located on the side of the high-refractive-index layer 30 away from the low-refractive-index layer 20. The anti-fouling film 50 covers the second surface 12.

[0142] A method for fabricating an optical waveguide structure 100, combined with Figure 7 and Figure 9 As shown, it includes the following steps:

[0143] Step S100: Provide a rigid support layer 10.

[0144] Step S200: Apply low refractive index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 and form a first substrate with the rigid support layer 10.

[0145] Step S300: Provide a resin layer 40, and coat the resin layer 40 with a high refractive index imprinting adhesive 32 for imprinting and curing to form a high refractive index layer 30 with a high refractive index grating structure 31. The resin layer 40 and the high refractive index layer 30 form a second substrate.

[0146] Step S400: Bond the second substrate and the first substrate together in a vacuum environment and remove bubbles.

[0147] Step S500: Curing the low refractive index imprinting adhesive 22.

[0148] Step S600: An anti-fouling film 50 is coated on the second surface 12 of the rigid support layer 10, and a monochromatic optical waveguide structure 100 is finally obtained.

[0149] Example 6

[0150] An optical waveguide structure 100, such as Figure 2As shown, the structure includes a rigid support layer 10, two low-refractive-index layers 20, two high-refractive-index layers 30, and two resin layers 40. The rigid support layer 10 has a first surface 11 and a second surface 12 facing each other. The two low-refractive-index layers 20 are connected to the first surface 11 and the second surface 12, and two spaced low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layers 20 away from the rigid support layer 10. The two high-refractive-index layers 30 are respectively connected to the side of the low-refractive-index layers 20 away from the rigid support layer 10, and each high-refractive-index layer 30 has two high-refractive-index grating structures 31, with the two high-refractive-index grating structures 31 on the same side correspondingly attached to the two low-refractive-index grating structures 21. The two resin layers 40 are respectively disposed on the side of the high-refractive-index layers 30 away from the low-refractive-index layers 20, forming a colored optical waveguide.

[0151] A method for fabricating an optical waveguide structure 100, such as... Figure 7 As shown, it includes the following steps:

[0152] Step S100: Provide a rigid support layer 10.

[0153] Step S200: Apply low refractive index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 and form a first substrate with the rigid support layer 10.

[0154] Step S300: Provide a resin layer 40, and coat the resin layer 40 with a high refractive index imprinting adhesive 32 for imprinting and curing to form a high refractive index layer 30 with a high refractive index grating structure 31. The resin layer 40 and the high refractive index layer 30 form a second substrate.

[0155] Step S400: The second substrate and the first substrate are bonded together and debubbled in a vacuum environment to form a one-sided optical waveguide.

[0156] Step S500: Curing the low refractive index imprinting adhesive 22 on the first surface 11.

[0157] Repeat step S200 to coat the second surface 12 of the rigid support layer 10 with low refractive index imprinting adhesive 22 and combine it with the single-sided optical waveguide formed after the previous step S400 to form a new first substrate.

[0158] Repeat step S300, provide another resin layer 40, and coat the resin layer 40 with high refractive index imprinting adhesive 32 for imprinting and curing to form another high refractive index layer 30 with a high refractive index grating structure 31. The resin layer 40 and the high refractive index layer 30 form a new second substrate.

[0159] Repeat step S400 to bond the new second substrate and the new first substrate together in a vacuum environment and remove bubbles.

[0160] Repeat step S500 to cure the low-refractive-index imprint adhesive 22 on the second surface 12, and finally obtain the colored optical waveguide structure 100.

[0161] The above description is merely a specific embodiment of this utility model, but the protection scope of this utility model is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this utility model, and these modifications or substitutions should all be covered within the protection scope of this utility model. Therefore, the protection scope of this utility model should be determined by the scope of the claims.

Claims

1. An optical waveguide structure, characterized by, Comprising: a rigid support layer having opposite first and second surfaces; a low refractive index layer connected at least on the first surface, the low refractive index layer being provided with at least one low refractive index grating structure on a side away from the rigid support layer; a high refractive index layer connected on a side of the low refractive index layer away from the rigid support layer, the high refractive index layer being provided with at least one high refractive index grating structure, and the high refractive index grating structure being correspondingly attached with the low refractive index grating structure; a resin layer provided on a side of the high refractive index layer away from the low refractive index layer.

2. The optical waveguide structure of claim 1, wherein, The rigid support layer comprises at least one of a rigid glass layer, a sapphire glass layer, a quartz layer or a rigid light-transmitting resin layer.

3. An optical waveguide structure as claimed in claim 2, c h a r a c t e r i s e d in that The rigid light-transmitting resin layer comprises at least one of a polycarbonate layer, a polymethyl methacrylate layer, a polystyrene layer, an acrylonitrile-styrene copolymer layer, a polyethylene terephthalate layer, a transparent ABS resin layer or a polyamide layer.

4. The optical waveguide structure of claim 1, wherein, The low refractive index layer, the high refractive index layer and the resin layer each comprise two layers, two low refractive index layers being connected on the first and second surfaces respectively; each low refractive index layer being connected with a high refractive index layer on a side away from the rigid support layer; and each high refractive index layer being connected with a resin layer on a side away from the low refractive index layer.

5. The optical waveguide structure of claim 1, wherein, Further comprising an anti-fouling film, the low refractive index layer being connected on the first surface, and the anti-fouling film being covered on the second surface; or, the low refractive index layer being connected on the second surface, and the anti-fouling film being covered on the first surface.

6. An optical waveguide structure as claimed in claim 5, wherein, The resin layer and the high refractive index layer are connected by bonding.

7. An optical waveguide structure as claimed in claim 6, c h a r a c t e r i s e d in that One side of the resin layer facing the high refractive index layer is attached with an OCA adhesive; or, the resin layer is in contact with a high refractive index pressure-sensitive adhesive used for preparing the high refractive index layer.

8. The optical waveguide structure of claim 1, wherein, The low refractive index layer has a refractive index of 1.0-1.4; and / or, the high refractive index layer has a refractive index of 1.6-2.0; and / or, the resin layer has a refractive index of 1.6-2.

0.

9. The optical waveguide structure of claim 1, wherein, The low refractive index layer has a thickness in the range of 0.1-5 μm; and / or, the high refractive index layer has a thickness in the range of 0.1-10 μm; and / or, the resin layer has a thickness in the range of 0.1-1.0 mm; and / or, the rigid support layer has a thickness in the range of 0.2-1 mm.

10. An AR near-eye display device, comprising: Comprising: an optical machine and an optical waveguide structure according to any one of claims 1-9, the optical machine emitting signal light to the optical waveguide structure, the optical waveguide structure coupling in the signal light and coupling out the signal light to a human eye.