System for detecting particulate matters in silane gas

Abstract

The utility model provides a system for detecting particulate matters in silane gases. The system comprises a purging gas source, a sample injection purging unit, a detection unit, a residual gas purging unit and a tail gas treatment unit, the sample injection purging unit comprises a vacuumizing unit and an inert gas replacement unit which are arranged in parallel; the vacuumizing unit comprises a vacuum pump; the inert gas replacement unit comprises a first filter; the detection unit comprises a high-pressure gas diffuser and a particle counter; the residual air purging unit comprises a first one-way valve, a second filter and a Venturi vacuum generator; the tail gas treatment unit comprises an anti-suck-back tank and a tail gas absorption tank; the outlet of the vacuum pump is connected with a second one-way valve; and outlet pipelines of the anti-suck-back tank, the Venturi vacuum generator and the second one-way valve are all inserted into the absorption liquid in the tail gas absorption tank. The system is simple in structure, convenient to operate, clean in front-end sample introduction and high in detection precision, tail gas is discharged after being treated, and blockage and pollution caused by direct discharge are avoided.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the field of gas particle detection, specifically related to a system for silane gas particle detection. BACKGROUND

[0002] As a kind of electronic special gas, silane gas has become very important special gas used in semiconductor microelectronic technology, and it can be said that almost all modern advanced integrated circuit production lines need to use silane gas. With the development of semiconductor industry to smaller and more complex process size, there are higher requirements for electronic special gas related analysis technology, and the requirement for electronic special gas related impurity detection is higher and higher, including the requirement for gas particle content is constantly improved.

[0003] The existing particle analysis technology and system are mostly for air or inert gas in the environment and adopt direct sampling mode, which can not guarantee the cleanliness of front-end sampling, and the pressure fluctuation of each sampling is different, resulting in low detection accuracy. The exhaust gas discharged by the detector is directly discharged, which can cause SiO2 powder produced by the combustion of silane gas and air to block the outlet pipeline and even pollute the internal instrument. UTILITY MODEL CONTENT

[0004] The utility model aims at providing a system for silane gas particle detection, which has simple structure, convenient operation, clean front-end sampling, high detection accuracy and exhaust gas after treatment, to avoid blockage and pollution caused by direct discharge.

[0005] To achieve the purpose of the utility model, the following technical solutions are adopted:

[0006] A system for silane gas particle detection, the system includes purge gas source, sampling purge unit, detection unit, residual gas purge unit and exhaust gas treatment unit connected by pipeline, wherein,

[0007] The sampling purge unit includes vacuum pumping unit and inert gas replacement unit connected in parallel, the vacuum pumping unit includes vacuum pump, the inlet of vacuum pump is connected to sampling pipeline, for vacuumizing sampling pipeline, the inert gas replacement unit includes first filter, and its inlet is connected to the outlet of purge gas source, and the outlet is connected to sampling pipeline, for filtering out particles in purge gas and replacing inert gas in sampling pipeline;

[0008] The detection unit comprises a high-pressure gas diffuser and a particle counter connected in sequence through pipelines, and is connected to a sample feeding pipeline through an inlet of the high-pressure gas diffuser, for sequentially decompressing and detecting particles in sample gas of the feed;

[0009] The residual gas purging unit comprises a first one-way valve, a second filter and a Venturi vacuum generator connected in sequence through pipelines; an inlet of the first one-way valve is connected to an outlet of the purging gas source; the Venturi vacuum generator is further provided with a residual gas inlet, and the residual gas inlet is connected to a residual gas outlet of the high-pressure gas diffuser, for introducing the residual sample gas from the high-pressure gas diffuser;

[0010] The tail gas treatment unit comprises an anti-suckback tank and a tail gas absorption tank connected in sequence through pipelines, and an inlet of the anti-suckback tank is connected to an outlet of the particle counter; an outlet pipeline of the anti-suckback tank is inserted into absorption liquid in the tail gas absorption tank, for sending tail gas from the particle counter to the tail gas absorption tank for absorption;

[0011] An outlet pipeline of the Venturi vacuum generator is inserted into the absorption liquid in the tail gas absorption tank;

[0012] An outlet of the vacuum pump is connected with a second one-way valve, and an outlet pipeline of the second one-way valve is inserted into the absorption liquid in the tail gas absorption tank.

[0013] The system for detecting particles in silane gas, preferably, a ratio of a terminal end height of the outlet pipeline of the anti-suckback tank inserted into the tail gas absorption tank to a height of the tail gas absorption tank is (1-2) / 6.

[0014] The system for detecting particles in silane gas, preferably, a ratio of a terminal end height of the outlet pipeline of the Venturi vacuum generator inserted into the tail gas absorption tank to a height of the tail gas absorption tank is (1-2) / 6.

[0015] The system for detecting particles in silane gas, preferably, a ratio of a terminal end height of the outlet pipeline of the second one-way valve inserted into the tail gas absorption tank to a height of the tail gas absorption tank is (1-2) / 6.

[0016] The system for detecting particles in silane gas, preferably, the outlet pipeline of the anti-suckback tank is provided with a gas distributor at a terminal end inserted into the tail gas absorption tank.

[0017] The utility model is used for the system of particle detection in silane gas, preferably, the outlet pipeline of venturi vacuum generator is provided with gas distributor at the end in the tail gas absorption tank.

[0018] The utility model is used for the system of particle detection in silane gas, preferably, the outlet pipeline of second check valve is provided with gas distributor at the end in the tail gas absorption tank.

[0019] The utility model is used for the system of particle detection in silane gas, preferably, the bottom of anti -suck -up tank is higher than the top of tail gas absorption tank, is used for preventing the absorption liquid in the tail gas absorption tank suck -up.

[0020] The utility model is used for the system of particle detection in silane gas, preferably, the volume ratio of anti -suck -up tank and tail gas absorption tank is 1: (1.5-3).

[0021] The utility model is used for the system of particle detection in silane gas, preferably, still be provided with liquid intercommunicator on the tail gas absorption tank, be used for testing the liquid level of absorption liquid in the tail gas absorption tank.

[0022] The utility model has the beneficial effect that:

[0023] The utility model is used for the system of particle detection in silane gas, simple structure, convenient operation, front end sampling clean, sampling pressure fluctuation is little, and the detection precision is high, and the tail gas is discharged after processing, avoids the blockage and pollution caused by direct discharge of tail gas. ACCURACY

[0024] Figure 1 It is the structural schematic drawing of the system of particle detection in silane gas of the utility model in an embodiment. CONCRETE IMPLEMENTING METHOD

[0025] The technical scheme of the utility model and its effect are further explained below in combination with the drawings and concrete implementing method. The following embodiment is only used for explaining the content of the utility model, and the utility model is not limited to the following embodiment or example. Simple changes of the utility model are within the scope of the utility model.

[0026] As Figure 1 The utility model is used for the system of particle detection in silane gas, the system includes the purging gas source 5, sampling purging unit, detection unit, residual gas purging unit and tail gas treatment unit through pipeline intercommunication, wherein,

[0027] The sample injection purging unit comprises a vacuum pumping unit and an inert gas replacing unit arranged in parallel, the vacuum pumping unit comprises a vacuum pump 1011, the inlet of the vacuum pump 1011 is connected to the sample injection pipeline for vacuumizing the sample injection pipeline, the inert gas replacing unit comprises a first filter 1021, the inlet of the first filter 1021 is connected to the outlet of the purging gas source 5, and the outlet is connected to the sample injection pipeline for replacing the sample injection pipeline with inert gas after filtering out the particulate matters in the purging gas;

[0028] The detection unit comprises a high-pressure gas diffuser 201 and a particle counter 202 connected in sequence through pipelines, the inlet of the high-pressure gas diffuser 201 is connected to the sample injection pipeline for sequentially decompressing and detecting the particulate matters in the sample gas, and the high-pressure gas diffuser 201 is further provided with a residual gas outlet for outputting the excess sample gas;

[0029] The residual gas purging unit comprises a first one-way valve 301, a second filter 302 and a Venturi vacuum generator 303 connected in sequence through pipelines, the inlet of the first one-way valve 301 is connected to the outlet of the purging gas source 5, and the Venturi vacuum generator 303 is further provided with a residual gas inlet connected to the residual gas outlet of the high-pressure gas diffuser 201 for inputting the excess sample gas from the high-pressure gas diffuser 201, and the sample gas comprises silane gas;

[0030] The tail gas treatment unit comprises an anti-suck-back tank 401 and a tail gas absorption tank 402 connected in sequence through pipelines, the inlet of the anti-suck-back tank 401 is connected to the outlet of the particle counter 202, and the outlet pipeline of the anti-suck-back tank 401 is inserted into the absorption liquid in the tail gas absorption tank 402 for sending the tail gas from the particle counter 202 to the tail gas absorption tank 402 for absorption;

[0031] The outlet pipeline of the Venturi vacuum generator 303 is inserted into the absorption liquid in the tail gas absorption tank 402;

[0032] The outlet of the vacuum pump 1011 is connected with a second one-way valve 1012, and the outlet pipeline of the second one-way valve 1012 is inserted into the absorption liquid in the tail gas absorption tank 402.

[0033] In the utility model, the purging gas in the purging gas source 5 is inert gas, which can be helium, argon or nitrogen.

[0034] In the utility model, the first filter 1021 and the second filter 302 are particulate filters, preferably high-purity particulate filters, which are used for filtering out the particulate matters in the purging gas, so as to ensure the cleanliness of the sample gas injection pipeline, avoid the influence of the particulate matters carried by the purging gas on the detection result of the particulate matters in the sample gas, and ensure the accuracy and stability of the detection result.

[0035] The first one-way valve 301 and the second one-way valve 1012 can ensure the forward flow of the related materials, avoid the backflow to affect the cleanliness of the sample inlet pipeline and cause the pressure fluctuation of the sample inlet pipeline, and as far as possible ensure the accuracy and stability of the detection result.

[0036] The system can filter the purge gas by the first filter 1021, and perform the purging and vacuum displacement of the sample inlet pipeline by the filtered purge gas, so as to ensure the cleanliness of the sample gas inlet pipeline; the system can reduce the pressure of the high-purity high-pressure gas to close to atmospheric pressure by the high-pressure gas diffuser 201, so that the flow metering system of the particle counter 202 can operate according to the design; the system can filter the purge gas by the second filter 302, and use the filtered purge gas to form a micro-negative pressure by the Venturi vacuum generator 303, so that the excess sample gas of the high-pressure gas diffuser 201 is discharged into the tail gas treatment unit, and the residual gas purging unit is continuously purged to ensure that no sample gas or air is left in the pipeline and the tank body; and the system can ensure that the silane tail gas of the sample gas is fully absorbed by the tail gas treatment unit, so as to avoid direct discharge.

[0037] The system for detecting particles in a silane gas has the advantages of simple structure, convenient operation, clean front-end sampling, small sampling pressure fluctuation, high detection precision, tail gas discharge after treatment, and avoidance of blockage and pollution caused by direct discharge of the tail gas; the system realizes the cleanliness of the pipeline during the sampling process of the sample gas by the sample purging unit, avoids the interference of other impurities, effectively prevents the inaccurate detection result caused by the interference of other impurities, and thus improves the repeatability and accuracy of the sample gas detection; the system realizes the safe absorption of the silane tail gas by the residual gas purging unit and the tail gas treatment unit, ensures the airtightness of the whole sample pipeline, effectively prevents the damage of the powder generated by the contact combustion of the silane gas and air to the pipeline and the instrument, and ensures the accuracy and authenticity of the sample gas detection result.

[0038] In an embodiment, the ratio of the height of the end of the outlet pipeline of the anti-suck-back tank 401 inserted into the tail gas absorption tank 402 to the height of the tail gas absorption tank 402 is (1-2) / 6, such as 1 / 6, 1 / 5, 1 / 4, 1 / 3, and any value and value range in the range.

[0039] In an embodiment, the ratio of the height of the end of the outlet pipeline of the Venturi vacuum generator 303 inserted into the tail gas absorption tank 402 to the height of the tail gas absorption tank 402 is (1-2) / 6, such as 1 / 6, 1 / 5, 1 / 4, 1 / 3, and any value and value range in the range.

[0040] In an embodiment, the ratio of the height of the end of the outlet pipeline of the second one-way valve 1012 inserted into the tail gas absorption tank 402 to the height of the tail gas absorption tank 402 is (1-2) / 6, such as 1 / 6, 1 / 5, 1 / 4, 1 / 3, and any value and value range in the range.

[0041] In the utility model, the height of the end of the outlet pipeline inserted into the tail gas absorption tank 402 refers to the height of the end of the outlet pipeline based on the bottom of the tail gas absorption tank 402.

[0042] In an embodiment, the outlet pipeline of the anti-back suction tank 401 is provided with a gas distributor at the end located in the tail gas absorption tank 402, thereby facilitating uniform absorption of tail gas and improving tail gas absorption efficiency.

[0043] In an embodiment, the outlet pipeline of the Venturi vacuum generator 303 is provided with a gas distributor at the end located in the tail gas absorption tank 402, thereby facilitating uniform absorption of tail gas and improving tail gas absorption efficiency.

[0044] In an embodiment, the outlet pipeline of the second one-way valve 1012 is provided with a gas distributor at the end located in the tail gas absorption tank 402, thereby facilitating uniform absorption of tail gas and improving tail gas absorption efficiency.

[0045] In an embodiment, the bottom of the anti-back suction tank 401 is higher than the top of the tail gas absorption tank 402, for preventing the absorption liquid in the tail gas absorption tank 402 from being sucked back.

[0046] In an embodiment, the volume ratio of the anti-back suction tank 401 to the tail gas absorption tank 402 is 1: (1.5-3), such as 1: 1.5, 1: 2, 1: 2.5, 1: 3, and any value and value range in the range.

[0047] In an embodiment, the tail gas absorption tank 402 is further provided with a liquid level gauge, for testing the liquid level of the absorption liquid in the tail gas absorption tank 402, thereby ensuring sufficient absorption liquid therein.

[0048] In an embodiment, the absorption liquid is a 10-30 wt% sodium hydroxide solution, such as 10 wt%, 15 wt%, 20 wt%, 25 wt%, 30 wt%, and any value and value range in the range.

[0049] Those skilled in the art understand that the system of the utility model is provided with valves on the relevant pipelines, for controlling material flow direction and flow rate, etc.

[0050] In an embodiment, the inlet end of the sample injection pipeline is provided with a first valve 601, and the inlet of the vacuum pump 1011 is connected to the outlet end of the first valve 601; the first valve 601 is a diaphragm valve.

[0051] In an embodiment, a second valve 602 is arranged on the inlet pipeline of the vacuum pump 1011; the second valve 602 is a diaphragm valve.

[0052] In an embodiment, a third valve 603 is further arranged on the sample injection pipeline, and the third valve 603 is arranged at the inlet end of the high-pressure gas diffuser 201; the third valve 603 is a diaphragm valve.

[0053] In an embodiment, the outlet end of the purge gas source 5 is provided with a fourth valve 604, and the outlet end of the fourth valve 604 is connected to the inlets of the inert gas replacement unit and the residual gas purge unit respectively; the fourth valve 604 is a pressure reducing valve.

[0054] The pressure reducing valve, i.e., the fourth valve 604, can stably control the sample injection pressure, realizes the pressure stability of the sample gas in the sample injection process, and further guarantees the accuracy and authenticity of the sample gas detection result.

[0055] In an embodiment, the inlet of the first filter 1021 is provided with a fifth valve 605; the fifth valve 605 is a diaphragm valve.

[0056] In an embodiment, a sixth valve 606 is arranged on the pipeline from the first one-way valve 301 to the second filter 302; the sixth valve 606 is a diaphragm valve.

[0057] In an embodiment, the outlet end of the Venturi vacuum generator 303 is provided with a seventh valve 607; the seventh valve 607 is a ball valve.

[0058] In an embodiment, an eighth valve 608 is arranged on the pipeline from the particle counter 202 to the anti-suckback tank 401; the eighth valve 608 is a ball valve.

[0059] In an embodiment, a ninth valve 609 is arranged on the pipeline from the anti-suckback tank 401 to the tail gas absorption tank 402; the ninth valve 609 is a ball valve.

[0060] In an embodiment, the bottom of the tail gas absorption tank 402 is provided with a liquid discharge port, and a liquid discharge pipeline is connected to the liquid discharge port, and a tenth valve 610 is arranged on the liquid discharge pipeline; the tenth valve 610 is a ball valve.

[0061] AsFigure 1 The process of detecting particles in silane gas by using the foregoing system is as follows:

[0062] (1) According to the above description, the process of detecting particles in silane gas by using the foregoing system is as follows: Figure 1 Connect the devices, wherein the anti-suck tank 401 and the tail gas absorption tank 402 are arranged according to the volume ratio (for example, 1:2); prepare the absorption solution (for example, a sodium hydroxide solution with a mass fraction of 20%) and add it to the tail gas absorption tank 402 until the absorption solution is sufficient, and turn on the power of the vacuum pump 1011;

[0063] (2) Open the fourth valve 604 and adjust the output pressure to 0.3 MPa;

[0064] (3) Open the second valve 602, vacuum the sample inlet pipeline at the front end for 1 min, close the second valve 602, open the fifth valve 605, and introduce the purge gas (nitrogen) to purge and replace the sample inlet pipeline for 10 s, close the fifth valve 605, and repeat the above operation 3-5 times;

[0065] (4) Open the sixth valve 606 and the seventh valve 607 to ensure that the Venturi vacuum generator 303 is normally started;

[0066] (5) Open the fifth valve 605, the third valve 603, the eighth valve 608, and the ninth valve 609, and introduce the purge gas (nitrogen) for 30 min to continuously purge the sample gas inlet pipeline to the tail gas pipeline at the rear end;

[0067] (6) Run the instrument to perform blank analysis and detection to confirm that the sample inlet pipeline has been purged and replaced with clean gas;

[0068] (7) Close the fifth valve 605 and the third valve 603 to stop the purge gas (nitrogen) purge;

[0069] (8) Open the second valve 602, vacuum for 1 min, and then close the second valve 602;

[0070] (9) Open the first valve 601 and the third valve 603, introduce the sample gas for 1 min, and then run the instrument to perform continuous analysis and detection, and read the results after the readings are stable to complete the detection;

[0071] (10) Close the first valve 601 and the third valve 603 to stop the sample introduction;

[0072] (11) Open the second valve 602, vacuum for 1 min, and then close the second valve 602;

[0073] (12) Open the fifth valve 605 and the third valve 603, introduce the purge gas (nitrogen) for 30 min to continuously purge the sample gas inlet pipeline to the tail gas treatment unit pipeline at the rear end;

[0074] (13) Close all open valves and turn off the power to vacuum pump 1011;

[0075] (14) Open the tenth valve 610 to drain the absorbent and add new absorbent.

[0076] The present application is further illustrated below through specific embodiments.

[0077] Example 1

[0078] like Figure 1 As shown, a system for detecting particulate matter in silane gases includes a purge gas source 5 connected by pipelines, a sample injection purge unit, a detection unit, a residual gas purge unit, and a tail gas treatment unit; wherein,

[0079] The sample injection purging unit includes a vacuum pumping unit and an inert gas replacement unit connected in parallel; the vacuum pumping unit includes a vacuum pump 1011, the inlet of which is connected to the sample injection line for evacuating the sample injection line; the inert gas replacement unit includes a first filter 1021, the inlet of which is connected to the outlet of the purge gas source 5 and the outlet of which is connected to the sample injection line for filtering out particulate matter in the purge gas and then replacing the sample injection line with inert gas.

[0080] The detection unit includes a high-pressure gas diffuser 201 and a particle counter 202 connected in sequence by pipelines. The inlet of the high-pressure gas diffuser 201 is connected to the sample inlet pipeline for sequentially depressurizing the sample gas and detecting particulate matter. The high-pressure gas diffuser 201 is also provided with a residual gas outlet for outputting excess sample gas.

[0081] The residual gas purging unit includes a first one-way valve 301, a second filter 302, and a Venturi vacuum generator 303 connected in sequence by pipelines; the inlet of the first one-way valve 301 is connected to the outlet of the purging gas source 5; the Venturi vacuum generator 303 is also provided with a residual gas inlet, and the residual gas inlet is connected to the residual gas outlet of the high-pressure gas diffuser 201 for introducing excess sample gas from the high-pressure gas diffuser 201;

[0082] The exhaust gas treatment unit includes an anti-backflow tank 401 and an exhaust gas absorption tank 402 connected in sequence by pipelines. The inlet of the anti-backflow tank 401 is connected to the outlet of the particle counter 202, and the outlet pipeline of the anti-backflow tank 401 is inserted into the absorbent liquid in the exhaust gas absorption tank 402 for sending the exhaust gas from the particle counter 202 into the exhaust gas absorption tank 402 for absorption.

[0083] The outlet pipeline of the Venturi vacuum generator 303 is inserted into the absorption liquid in the tail gas absorption tank 402;

[0084] The outlet of the vacuum pump 1011 is connected with a second one-way valve 1012, and the outlet pipeline of the second one-way valve 1012 is inserted into the absorption liquid in the tail gas absorption tank 402; wherein,

[0085] The ratio of the terminal height of the outlet pipeline of the anti-suck-back tank 401, the outlet pipeline of the Venturi vacuum generator 303 and the outlet pipeline of the second one-way valve 1012 to the height of the tail gas absorption tank 402 is 1 / 5;

[0086] The bottom of the anti-suck-back tank 401 is higher than the top of the tail gas absorption tank 402;

[0087] The volume ratio of the anti-suck-back tank 401 to the tail gas absorption tank 402 is 1:2;

[0088] The absorption liquid (20% concentration of sodium hydroxide solution) is added to the tail gas absorption tank 402 to 80% of the volume thereof;

[0089] The inlet end of the sample pipeline is provided with a first valve 601, and the connection position of the inlet of the vacuum pump 1011 on the sample pipeline is located at the outlet end of the first valve 601; the first valve 601 is a diaphragm valve;

[0090] A second valve 602 is arranged on the inlet pipeline of the vacuum pump 1011; the second valve 602 is a diaphragm valve;

[0091] A third valve 603 is further arranged on the sample pipeline, and the third valve 603 is located at the inlet end of the high-pressure gas diffuser 201; the third valve 603 is a diaphragm valve;

[0092] The outlet end of the purge gas source 5 is provided with a fourth valve 604, and the outlet end of the fourth valve 604 is connected with the inlets of the inert gas replacement unit and the residual gas purge unit respectively; the fourth valve 604 is a pressure reducing valve;

[0093] The inlet of the first filter 1021 is provided with a fifth valve 605; the fifth valve 605 is a diaphragm valve;

[0094] A sixth valve 606 is arranged on the pipeline from the first one-way valve 301 to the second filter 302; the sixth valve 606 is a diaphragm valve;

[0095] The outlet end of the Venturi vacuum generator 303 is provided with a seventh valve 607; the seventh valve 607 is a ball valve;

[0096] An eighth valve 608 is arranged on the pipeline from the particle counter 202 to the anti-suckback tank 401; the eighth valve 608 is a ball valve;

[0097] A ninth valve 609 is arranged on the pipeline from the anti-suckback tank 401 to the tail gas absorption tank 402; the ninth valve 609 is a ball valve;

[0098] The tail gas absorption tank 402 is provided with a liquid outlet at the bottom, and a liquid discharge pipeline is connected to the liquid outlet, and a tenth valve 610 is arranged on the liquid discharge pipeline; the tenth valve 610 is a ball valve.

[0099] Taking a silane sample gas as an example, using the system as shown in Figure 1 , the silane sample gas analysis is carried out according to the following steps (wherein Figure 1 all valves are initially closed):

[0100] (1) Add an absorption liquid (20% sodium hydroxide solution) to the tail gas absorption tank 402 to 80% of its volume, and turn on the power of the vacuum pump 1011;

[0101] (2) Open the fourth valve 604, and adjust the output pressure to 0.3 MPa;

[0102] (3) Open the second valve 602, and vacuum the front end of the sample pipeline for 1 min, close the second valve 602, open the fifth valve 605, and introduce a purge gas (nitrogen) to purge and replace the sample pipeline for 10 s, close the fifth valve 605, and repeat the above operation 4 times;

[0103] (4) Open the sixth valve 606 and the seventh valve 607 to ensure that the Venturi vacuum generator 303 is normally started;

[0104] (5) Open the fifth valve 605, the third valve 603, the eighth valve 608, and the ninth valve 609, and introduce a purge gas (nitrogen) for 30 min to continuously purge the sample gas pipeline to the rear end of the tail gas pipeline;

[0105] (6) Run the instrument to detect the blank analysis, and confirm that the sample pipeline has been purged and replaced clean;

[0106] (7) Close the fifth valve 605 and the third valve 603, and stop the purge gas (nitrogen) purge;

[0107] (8) Open the second valve 602, and vacuum for 1 min, then close the second valve 602;

[0108] (9) open the first valve 601, the third valve 603, after 1 min of sample gas, run the instrument for continuous analysis and detection, read the results after the stable number to complete the detection;

[0109] (10) close the first valve 601, the third valve 603, stop sampling;

[0110] (11) open the second valve 602, vacuum 1 min, close the second valve 602;

[0111] (12) open the fifth valve 605, the third valve 603, pass in the purge gas (nitrogen) 30 min, continuously purge the sample gas sample line to the tail gas treatment unit pipeline;

[0112] (13) close all the opened valves, close the vacuum pump 1011 power;

[0113] (14) open the tenth valve 610, discharge the absorbent and add new absorbent.

[0114] The system for detecting particulate matters in silane gas has the advantages of simple structure, convenient operation, clean front-end sampling, small sampling pressure fluctuation, high detection precision, tail gas discharge after treatment, and avoidance of blockage and pollution caused by direct discharge of tail gas.

Claims

1. A system for particulate matter detection in silane-based gases, characterized by, The system comprises a purge gas source (5), a sample injection and purge unit, a detection unit, a residual gas purge unit and a tail gas treatment unit connected in sequence through pipelines. The sample injection and purge unit comprises a vacuumizing unit and an inert gas replacing unit connected in parallel; the vacuumizing unit comprises a vacuum pump (1011) connected to the sample injection pipeline at the inlet for vacuumizing the sample injection pipeline; the inert gas replacing unit comprises a first filter (1021) connected to the outlet of the purge gas source (5) at the inlet and to the sample injection pipeline at the outlet for replacing the sample injection pipeline with inert gas after filtering out particulate matters in the purge gas. The detection unit comprises a high-pressure gas diffuser (201) and a particle counter (202) connected in sequence through pipelines, and the high-pressure gas diffuser (201) is connected to the sample injection pipeline at the inlet for sequentially decompressing and detecting particulate matters in the sample gas; the high-pressure gas diffuser (201) is further provided with a residual gas outlet for outputting excess sample gas; the sample gas comprises silane gas. The residual gas purge unit comprises a first one-way valve (301), a second filter (302) and a Venturi vacuum generator (303) connected in sequence through pipelines; the first one-way valve (301) is connected to the outlet of the purge gas source (5) at the inlet; the Venturi vacuum generator (303) is further provided with a residual gas inlet connected to the residual gas outlet of the high-pressure gas diffuser (201) for inputting excess sample gas from the high-pressure gas diffuser (201). The tail gas treatment unit comprises an anti-suckback tank (401) and a tail gas absorption tank (402) connected in sequence through pipelines, and the inlet of the anti-suckback tank (401) is connected to the outlet of the particle counter (202), and the outlet pipeline of the anti-suckback tank (401) is inserted into the absorption liquid in the tail gas absorption tank (402) for sending tail gas from the particle counter (202) to the tail gas absorption tank (402) for absorption. The outlet pipeline of the Venturi vacuum generator (303) is inserted into the absorption liquid in the tail gas absorption tank (402). The outlet of the vacuum pump (1011) is connected with a second one-way valve (1012), and the outlet pipeline of the second one-way valve (1012) is inserted into the absorption liquid in the tail gas absorption tank (402).

2. The system of claim 1, wherein, The ratio of the end height of the outlet pipeline of the anti-suckback tank (401) inserted into the tail gas absorption tank (402) to the height of the tail gas absorption tank (402) is (1-2) / 6.

3. The system of claim 1, wherein, The ratio of the end height of the outlet pipeline of the Venturi vacuum generator (303) inserted into the tail gas absorption tank (402) to the height of the tail gas absorption tank (402) is (1-2) / 6.

4. The system of claim 1, wherein, The ratio of the end height of the outlet pipeline of the second one-way valve (1012) inserted into the tail gas absorption tank (402) to the height of the tail gas absorption tank (402) is (1-2) / 6.

5. The system of any one of claims 1-4, wherein, The outlet pipeline of the anti-suck-back tank (401) is provided with a gas distributor at the end located in the tail gas absorption tank (402).

6. The system of claim 5, wherein, The outlet pipeline of the Venturi vacuum generator (303) is provided with a gas distributor at the end located in the tail gas absorption tank (402).

7. The system of any of claims 1-4 and 6, wherein, The outlet pipeline of the second one-way valve (1012) is provided with a gas distributor at the end located in the tail gas absorption tank (402).

8. The system of claim 1, wherein, The bottom of the anti-suck-back tank (401) is higher than the top of the tail gas absorption tank (402), for preventing the absorption liquid in the tail gas absorption tank (402) from being sucked back.

9. The system of any of claims 1-4, 6, and 8, wherein, The volume ratio of the anti-suck-back tank (401) to the tail gas absorption tank (402) is 1: (1.5-3).

10. The system of any one of claims 1-4, 6, and 8, wherein, The tail gas absorption tank (402) is further provided with a liquid level gauge for testing the liquid level of the absorption liquid in the tail gas absorption tank.

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