Chip taking and placing structure of multi-chip epitaxial furnace

Abstract

The utility model discloses a wafer taking and placing structure of a multi-wafer epitaxial furnace. The wafer taking and placing structure comprises a process cavity, a carrying manipulator, a manipulator cavity, a transmission cavity, a tray base, a rotary lifting mechanism and a tray horizontal conveying mechanism. The graphite tray conveying device is reasonable in structural design, a plurality of graphite trays with substrates are placed on the tray base one by one through the carrying manipulator, the rotary lifting mechanism descends to place the tray base on the tray horizontal conveying mechanism, and the tray base is conveyed into a process cavity through the tray horizontal conveying mechanism; during discharging, the tray horizontal conveying mechanism takes out the tray base in the process cavity and moves the tray base to the position above the rotary lifting platform, the rotary lifting platform ascends to jack the tray base up to the working area of the carrying mechanical arm, and then the carrying mechanical arm takes away all graphite trays on the tray base one by one. The purpose of simultaneously carrying out process growth on a plurality of substrates at one time is achieved, and the production efficiency is remarkably improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor wafer manufacturing, and particularly to a multi-piece epitaxial furnace pick-and-place structure. BACKGROUND

[0002] In a high-temperature vapor phase method silicon carbide epitaxial furnace, an operator first places a silicon carbide substrate in a graphite tray in a sample inlet cavity, and then a mechanical hand transfers the graphite tray and the substrate to a process cavity for process growth. After growth is complete, the mechanical hand takes the graphite tray and the substrate out of the process cavity and transfers them to the sample inlet cavity. This scheme can achieve the purpose of automated production, but only one epitaxial wafer can be grown at a time, and the production efficiency is low. SUMMARY

[0003] To address the above problems, the utility model discloses a multi-piece epitaxial furnace pick-and-place structure that has a reasonable structure and high work efficiency.

[0004] To achieve the above object, the utility model provides a technical scheme of a multi-piece epitaxial furnace pick-and-place structure, which comprises a process cavity, a carrying mechanical hand, a mechanical hand cavity, a transmission cavity, a tray base, a rotary lifting mechanism, and a tray horizontal conveying mechanism. The process cavity, the transmission cavity, and the mechanical hand cavity are arranged in sequence. An upper opening is provided on one side of the upper part of the transmission cavity and is in communication with the hand cavity opening of the mechanical hand cavity. A lower opening is provided on the other side of the lower part of the transmission cavity and is in communication with the process cavity opening of the process cavity. The rotary lifting mechanism is arranged in the transmission cavity. The tray base is located on the rotary lifting mechanism. The tray horizontal conveying mechanism is arranged on one side of the tray base and can reciprocally transport the tray base between the process cavity and the transmission cavity. A plurality of tray positions are provided on the tray base.

[0005] As a preferred scheme of the utility model, the rotary lifting mechanism comprises a rotary platform, a mounting frame, a platform rotary driving device, a lifting driving device, a vertical slide rail, and a vertical slide block. The vertical slide rail is vertically arranged on the bottom surface of the transmission cavity. The mounting frame is movably arranged on the vertical slide rail through the vertical slide block and is driven by the lifting driving device to perform lifting action. The rotary shaft of the rotary platform is arranged on the mounting frame through a bearing seat. The platform rotary driving device is arranged on the mounting frame and can drive the rotary platform to perform rotary action. Through the driving of the platform rotary driving device and the lifting driving device, the rotary platform can perform rotary and lifting action.

[0006] As a preferred scheme of the utility model, the lifting driving device is a pneumatic cylinder or an electric cylinder, which has the advantages of simple structure, convenient control, and smooth operation.

[0007] As a preferred scheme of the utility model, the tray horizontal conveying mechanism includes linear drive device and large fork matched with the tray base, the shell of linear drive device is arranged on the bottom surface of the mechanical hand cavity through up-down drive device, the large fork is located in the transmission cavity, the driving element of linear drive device extends into the transmission cavity and is fixed with the large fork. Through the cooperation of linear drive device and large fork, the reciprocating transportation of tray base between process cavity and transmission cavity can be efficiently realized.

[0008] As a preferred scheme of the utility model, the linear drive device is air cylinder or oil cylinder, which can quickly and accurately push the large fork to move, thereby realizing the stable transportation of tray base.

[0009] As a preferred scheme of the utility model, the process cavity includes quartz cover, electromagnetic coil, lower heat source graphite piece, upper heat source graphite piece, side plate, circular graphite carbon felt and ring-shaped graphite carbon felt, the electromagnetic coil is sleeved on the quartz cover, the lower heat source graphite piece and the upper heat source graphite piece are fixed in the quartz cover through the side plate, and a process space is formed between the lower heat source graphite piece and the upper heat source graphite piece, the ring-shaped graphite carbon felt is arranged on the inner wall of the quartz cover corresponding to the positions of the lower heat source graphite piece and the upper heat source graphite piece, and the circular graphite carbon felt is closed at both ends of the process space and is provided with an inlet and outlet.

[0010] As a preferred scheme of the utility model, the carrying mechanical hand includes installation main body, first arm, second arm, connecting seat, connecting rod and small fork, one end of the first arm is rotatably arranged on the installation main body, one end of the second arm is rotatably arranged on the other end of the first arm, the connecting seat is rotatably arranged on the other end of the second arm, one end of the connecting rod is fixed on the connecting seat, and the other end is connected with the small fork.

[0011] As a preferred scheme of the utility model, the mechanical hand cavity is provided with an inlet and outlet on the other side wall opposite the hand cavity, so that the carrying mechanical hand can conveniently enter and exit, thereby performing the pick-and-place operation.

[0012] As a preferred scheme of the utility model, the tray positions are arranged on the upper surface of the tray base in a circle center symmetrically, which is beneficial to cooperate the tray base to rotate to pick and place the graphite tray. Moreover, each tray position can be uniformly heated, thereby ensuring that each silicon carbide substrate can obtain the same growth condition, and improving the consistency of growth quality.

[0013] The utility model discloses beneficial effect is: the utility model discloses reasonable structure design, through the carrying manipulator with multiple substrate -placed graphite tray is placed one by one on the tray base, and the tray base is placed in the tray horizontal conveying mechanism by the rotation elevating system descending, and the tray base is sent into the process cavity by the tray horizontal conveying mechanism;When discharging, the tray horizontal conveying mechanism takes out the tray base in the process cavity and removes to the above position of the rotation elevating platform, and the tray base is lifted up the working area of carrying manipulator on the rotation elevating platform, and all graphite trays on the tray base are taken away one by one by carrying manipulator again, realize the purpose of the process growth to multiple substrates simultaneously once, and the production efficiency is improved significantly.

[0014] The utility model is further illustrated below in connection with the drawings and examples. DRAWINGS

[0015] Figure 1 It is the three-dimensional structure schematic diagram of the utility model.

[0016] Figure 2 It is the full cut structure schematic diagram of the utility model.

[0017] Figure 3 It is the structure schematic diagram of process cavity in the utility model.

[0018] Figure 4 It is the structure schematic diagram of carrying manipulator in the utility model.

[0019] Figure 5 It is the structure schematic diagram of rotation elevating mechanism and tray horizontal conveying mechanism in the utility model. SPECIFIC EMBODIMENT

[0020] Example, see Figures 1 to 5 The utility model provides a kind of multiple wafer epitaxial furnace pick-and-place structure, it includes process cavity 1, carrying manipulator 2, manipulator cavity 3, transmission cavity 4, tray base 5, rotation elevating mechanism 6 and tray horizontal conveying mechanism 7.

[0021] The process cavity 1, transmission cavity 4 and manipulator cavity 3 are sequentially arranged, one side upper portion of the transmission cavity 4 is equipped with the upper opening being connected with the hand cavity mouth of the manipulator cavity 3, and the other side lower portion of the transmission cavity 4 is equipped with the lower opening being connected with the work cavity mouth of the process cavity 1.

[0022] The rotating lifting mechanism 6 is arranged in the transmission cavity 4. Specifically, the rotating lifting mechanism 6 comprises a rotating platform 61, a mounting frame 62, a platform rotating driving device 63, a lifting driving device, a vertical slide rail 64 and a vertical slide block 65. The vertical slide rail 64 is vertically arranged on the bottom surface of the transmission cavity 4. The mounting frame 62 is movably arranged on the vertical slide rail 64 through the vertical slide block 65 and is driven to perform lifting action by the lifting driving device. In the embodiment, the lifting driving device is preferably a pneumatic cylinder, which has the advantages of simple structure, convenient control and stable operation. In other embodiments, the lifting driving device can also be an electric cylinder. The rotating shaft 66 of the rotating platform 61 is arranged on the mounting frame 62 through a bearing seat 67. The platform rotating driving device 63 is arranged on the mounting frame 62 and can drive the rotating platform 61 to perform rotating action. The platform rotating driving device 63 comprises a motor and a belt pulley assembly. The motor drives the rotating shaft 66 of the rotating platform 61 to rotate through the belt pulley assembly. Through the driving of the platform rotating driving device 63 and the lifting driving device, the rotating platform 61 can perform rotating and lifting action. The tray base 5 is placed on the rotating platform 61. The tray base 5 is provided with a plurality of tray positions. Preferably, the tray positions are arranged on the upper surface of the tray base 5 in a concentric manner, which facilitates the cooperation of the tray base 5 in the rotating action to take and place graphite trays. Moreover, each tray position can be uniformly heated, thereby ensuring that each silicon carbide substrate can obtain the same growth conditions and improving the consistency of growth quality.

[0023] The tray horizontal conveying mechanism 7 is arranged corresponding to one side position of the tray base 5 and can reciprocally convey the tray base 5 between the process cavity 1 and the transmission cavity 4. Specifically, the tray horizontal conveying mechanism 7 comprises a linear driving device 71 and a large fork 72 matched with the tray base 5. The housing of the linear driving device 71 is arranged on the bottom surface of the mechanical hand cavity 3 through an up-down driving device 73. The large fork 72 is located in the transmission cavity 4. The driving element of the linear driving device 71 extends into the transmission cavity 4 and is fixed with the large fork 72. Through the cooperation of the linear driving device 71 and the large fork 72, the tray base 5 can be efficiently reciprocally conveyed between the process cavity 1 and the transmission cavity 4. In the embodiment, the linear driving device 71 is preferably a pneumatic cylinder, which can quickly and accurately push the large fork 72 to move, thereby realizing stable conveying of the tray base 5. In other embodiments, the linear driving device 71 can also be an oil cylinder.

[0024] The process cavity 1 comprises a quartz cover 11, an electromagnetic coil 12, a lower heat source graphite piece 13, an upper heat source graphite piece 14, a side plate 15, a circular graphite carbon felt 16 and a ring-shaped graphite carbon felt 17, the electromagnetic coil 12 is sleeved on the quartz cover 11 for medium frequency induction heating; the lower heat source graphite piece 13 and the upper heat source graphite piece 14 are fixed in the quartz cover 11 through the side plate 15, and a process space 18 is formed between the lower heat source graphite piece 13 and the upper heat source graphite piece 14, the lower heat source graphite piece 13 and the upper heat source graphite piece 14 serve as heat generating bodies, wherein the lower heat source graphite piece 13 also serves as a carrier of the tray base 5. The ring-shaped graphite carbon felt 17 is arranged on the inner wall of the quartz cover 11 corresponding to the positions of the lower heat source graphite piece 13 and the upper heat source graphite piece 14, and the circular graphite carbon felt 16 is closed at both ends of the process space 18 and is provided with an inlet and outlet, thereby improving the heat insulation effect of the circular graphite carbon felt 16 and the ring-shaped graphite carbon felt 17.

[0025] The carrying manipulator 2 comprises a mounting body 21, a first arm 22, a second arm 23, a connecting seat 24, a connecting rod 25 and a small fork 26, one end of the first arm 22 is rotationally arranged on the mounting body 21, one end of the second arm 23 is rotationally arranged on the other end of the first arm 22, the connecting seat 24 is rotationally arranged on the other end of the second arm 23, one end of the connecting rod 25 is fixed on the connecting seat 24, and the other end is connected with the small fork 26. An inlet and outlet are arranged on the other side wall of the manipulator cavity 3 relative to the hand cavity, so that the carrying manipulator 2 can conveniently enter and exit, thereby performing the pick-and-place operation.

[0026] During operation, the carrying manipulator 2 grasps a graphite tray 8 with a substrate placed thereon and places it on the tray position of the tray base 5, the rotating lifting mechanism 6 drives the tray base 5 to rotate by a certain angle, so that the other empty tray position is displaced to the upper tray position; the carrying manipulator 2 repeats the grasping action and places another graphite tray 8 with a substrate placed thereon on the empty tray position of the tray base 5, and repeats the foregoing steps to fill the tray positions on the graphite tray 8.

[0027] Then the rotating lifting mechanism 6 is lowered to place the tray base 5 on the tray horizontal conveying mechanism 7, the tray base 5 is sent into the process cavity 1 by the tray horizontal conveying mechanism 7, the upper and lower driving devices 73 are lowered to place the tray base 5 in the process cavity 1, the linear driving device 71 drives the large fork 72 to retreat to the initial position, and then the growth process is performed in the process cavity 1.

[0028] When the material is discharged, the linear driving device 71 drives the large fork 72 to extend into the process cavity 1, the up-down driving device 73 drives the linear driving device 71 to rise, the large fork 72 lifts the tray base 5, then the linear driving device 71 retracts to drive the tray base 5 to move out of the process cavity 1 and shift to the position above the rotary lifting platform, the rotary lifting platform rises to lift the tray base 5 to the working area of the carrying manipulator 2, all the graphite trays 8 on the tray base 5 are taken away one by one by the carrying manipulator 2, the purpose of simultaneously processing multiple substrates at one time is realized, and the working efficiency is high.

[0029] According to the disclosure and teaching of the above description, the skilled in the art of the utility model can also change and modify the above-mentioned embodiments. Therefore, the utility model is not limited to the specific embodiments disclosed and described above, and some modifications and changes of the utility model should fall within the protection scope of the claims of the utility model. In addition, although some specific terms are used in the specification, these terms are only for convenience of description and do not constitute any limitation on the utility model, and the structure same as or similar to the same is within the protection scope of the utility model.

Claims

1. A multi-wafer epitaxial furnace wafer handling structure, comprising a process chamber and a handling robot, characterized in that, It also includes a robotic arm cavity, a transfer cavity, a pallet base, a rotary lifting mechanism, and a pallet horizontal conveying mechanism. The process cavity, transfer cavity, and robotic arm cavity are arranged in sequence. The upper part of one side of the transfer cavity has an upper opening that communicates with the hand cavity opening of the robotic arm cavity, and the lower part of the other side of the transfer cavity has a lower opening that communicates with the process cavity opening of the process cavity. The rotary lifting mechanism is disposed in the transfer cavity, and the pallet base is located on the rotary lifting mechanism. The pallet horizontal conveying mechanism is disposed on one side of the pallet base and can reciprocate between the process cavity and the transfer cavity. The pallet base is provided with several pallet positions.

2. The multi-wafer epitaxial furnace wafer loading and unloading structure according to claim 1, characterized in that: The rotating and lifting mechanism includes a rotating platform, a mounting frame, a platform rotation drive device, a lifting drive device, a vertical slide rail, and a vertical slider. The vertical slide rail is vertically disposed on the bottom surface of the transmission cavity. The mounting frame is movably disposed on the vertical slide rail via the vertical slider and is driven by the lifting drive device to perform lifting and lowering actions. The rotating shaft of the rotating platform is disposed on the mounting frame via a bearing seat. The platform rotation drive device is disposed on the mounting frame and can drive the rotating platform to perform rotational actions.

3. The multi-wafer epitaxial furnace wafer loading and unloading structure according to claim 2, characterized in that: The lifting drive device is a pneumatic cylinder or an electric cylinder.

4. The multi-wafer epitaxial furnace wafer loading and unloading structure according to claim 1, characterized in that: The pallet horizontal conveying mechanism includes a linear drive device and a large fork adapted to the pallet base. The housing of the linear drive device is disposed on the bottom surface of the manipulator cavity via an upper and lower drive device. The large fork is located inside the transmission cavity. The drive element of the linear drive device extends into the transmission cavity and is fixed to the large fork.

5. The multi-wafer epitaxial furnace wafer loading and unloading structure according to claim 4, characterized in that: The linear drive device is a pneumatic cylinder or a hydraulic cylinder.

6. The multi-wafer epitaxial furnace wafer loading and unloading structure according to claim 1, characterized in that: The process chamber includes a quartz cover, an electromagnetic coil, a lower heat source graphite component, an upper heat source graphite component, a side plate, a circular graphite carbon felt, and an annular graphite carbon felt. The electromagnetic coil is sleeved on the quartz cover. The lower and upper heat source graphite components are fixed inside the quartz cover by the side plate, and a process space is formed between the lower and upper heat source graphite components. The annular graphite carbon felt is positioned on the inner wall of the quartz cover corresponding to the positions of the lower and upper heat source graphite components. The circular graphite carbon felt is closed at both ends of the process space and has an inlet and outlet.

7. The multi-wafer epitaxial furnace wafer loading and unloading structure according to claim 1, characterized in that: The handling robot includes a mounting body, a first arm, a second arm, a connecting seat, a connecting rod, and a small fork. One end of the first arm is rotatably mounted on the mounting body, one end of the second arm is rotatably mounted on the other end of the first arm, the connecting seat is rotatably mounted on the other end of the second arm, one end of the connecting rod is fixed on the connecting seat, and the other end is connected to the small fork.

8. The multi-wafer epitaxial furnace wafer loading and unloading structure according to claim 7, characterized in that: The robotic arm cavity has an inlet and outlet on the opposite side wall of the cavity opening.

9. The multi-wafer epitaxial furnace wafer loading and unloading structure according to any one of claims 1-8, characterized in that: The tray positions are arranged symmetrically in a circle on the upper surface of the tray base.

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