Heat insulation glass, awning structure and automobile
By designing multiple layers of thermal insulation functional layers and dielectric passivation layers, combined with ultraviolet isolation and optical control layers, the problem of poor thermal insulation effect and reduced light transmittance caused by insufficient or excessive number of thermal insulation layers in existing technologies is solved, achieving high light transmittance while improving thermal insulation performance.
Patent Information
- Application Number
- CN202423288178.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-30
- Publication Date
- 2026-01-13
- Estimated Expiration
- 2034-12-30
AI Technical Summary
In existing technologies, when the number of heat insulation layers on the glass is small, the heat insulation effect is not ideal; when the number is large, it affects the visible light transmittance, leading to problems such as increased internal temperature of the vehicle and obstructed vision.
The glass employs a multi-layer thermal insulation structure, with each layer being thinner. Through a gradient design of the oxygen content in the dielectric passivation layer, combined with an ultraviolet isolation layer, an optical control layer, and a dielectric barrier layer, the thermal insulation and light transmission performance of the glass are optimized.
While ensuring high light transmittance, it significantly improves heat insulation performance, reduces the transmission of infrared light and the damage of ultraviolet light, and improves the comfort of the vehicle interior.
Smart Images

Figure CN223793220U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of glass technology, specifically to a heat-insulating glass, a canopy structure, and an automobile. Background Technology
[0002] Glass is typically installed in vehicles such as cars, high-speed trains, and cruise ships to provide users with better visibility. However, the installation of glass allows sunlight and heat to transfer into the interior of the vehicle, leading to an increase in the internal temperature.
[0003] In existing technologies, heat insulation is typically achieved by placing a silver heat insulation layer on a glass substrate. However, if the number of silver heat insulation layers is small, the heat insulation effect is not ideal; while if the number of silver heat insulation layers is large, it affects the transmittance of visible light and will obstruct the user's field of vision. Utility Model Content
[0004] This application provides a heat-insulating glass, a skylight structure, and an automobile to improve the performance of the glass.
[0005] This application provides a heat-insulating glass, comprising,
[0006] Substrate,
[0007] A functional layer is disposed on the substrate, the functional layer including at least one set of thermal insulation functional layers, the thermal insulation functional layer including a thermal insulation layer and a dielectric passivation layer.
[0008] In some embodiments, in each group of the thermal insulation functional layers, the thermal insulation layer and the dielectric passivation layer are stacked sequentially, with the thermal insulation layer located on the side of the dielectric passivation layer closer to the substrate.
[0009] In some embodiments, the dielectric passivation layer includes a bottom passivation layer, a middle passivation layer, and a top passivation layer stacked sequentially, wherein the number of middle passivation layers is at least one, and the oxygen content of the material of the bottom passivation layer is higher than the oxygen content of the material of the middle passivation layer.
[0010] In some embodiments, the oxygen content of the material of the top passivation layer is higher than the oxygen content of the material of the middle passivation layer.
[0011] In some embodiments, the dielectric passivation layer includes a bottom passivation layer, a middle passivation layer, and a top passivation layer, wherein the number of the middle passivation layers is set to at least one, and the middle passivation layer is provided with a porous structure.
[0012] In some embodiments, the mesoporous passivation layer is made of one or more of silicon nitride and silicon oxynitride.
[0013] In some embodiments, the thickness of the heat insulation layer is 1 nm-50 nm.
[0014] In some embodiments, an ultraviolet shielding layer is provided on the side of the functional layer closest to the substrate; and / or,
[0015] An optical control layer is disposed on the side of the functional layer away from the substrate. The material of the optical control layer is selected from one or more of tungsten and tungsten oxides, tungsten nitrides, zinc aluminum oxide, zinc tin oxide, zinc oxide, titanium oxide, and silicon oxide; and / or,
[0016] A dielectric barrier layer is provided on the side of the functional layer away from the substrate. The material of the dielectric barrier layer is selected from one or more of silicon nitride, silicon oxynitride, nickel-chromium alloy, nickel-chromium oxide, nickel-chromium oxynitride, nickel-tungsten alloy, nickel-tungsten oxide, nickel-tungsten oxynitride, zirconium oxide, titanium oxide, and titanium oxynitride.
[0017] In some embodiments, the substrate is a curved substrate.
[0018] This application also provides a canopy structure, including a canopy frame; and the heat-insulating glass provided in any of the foregoing embodiments, disposed on the canopy frame.
[0019] This application also provides an automobile, including an automobile body; and the heat-insulating glass provided in any of the foregoing embodiments, disposed on the automobile body.
[0020] The present application has the following beneficial effects: The embodiments of the present application provide a heat-insulating glass, a skylight structure and an automobile. The heat-insulating glass includes a substrate and a functional layer disposed on the substrate. The functional layer includes at least one set of heat-insulating functional layers. The heat-insulating functional layer includes a heat-insulating layer and a dielectric passivation layer. By setting at least one set of heat-insulating functional layers, heat insulation performance can be improved while achieving high light transmittance. The heat-insulating glass is particularly suitable for automobiles or other transportation equipment. Attached Figure Description
[0021] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0022] Figure 1 An exemplary schematic diagram of a heat-insulating glass is shown.
[0023] Figure 2 An exemplary schematic diagram of another type of heat-insulating glass is shown.
[0024] Figure 3An exemplary schematic diagram of another type of heat-insulating glass is shown.
[0025] The components in the attached figure are labeled as follows: 100-substrate, 200-dielectric layer, 300-ultraviolet isolation layer, 400-thermal insulation functional layer, 410-thermal insulation layer, 420-dielectric passivation layer, 500-optical control layer, 600-dielectric barrier layer, 700-hardening layer. Detailed Implementation
[0026] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application. In addition, it should be understood that the specific embodiments described herein are only for illustration and explanation of this application and are not intended to limit this application. In this application, unless otherwise stated, directional terms such as "up," "down," "left," and "right" generally refer to up, down, left, and right in the actual use or working state of the device, specifically the drawing directions in the accompanying drawings.
[0027] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature.
[0028] This application provides a heat-insulating glass, a panoramic sunroof structure, and an automobile, which are described in detail below. It should be noted that the order of description of the following embodiments is not intended to limit the preferred order of the embodiments of this application. Furthermore, in the following embodiments, the descriptions of each embodiment have their own emphasis; parts not described in detail in a certain embodiment can be referred to in the relevant descriptions of other embodiments.
[0029] An embodiment of this application provides a heat-insulating glass, which includes a substrate 100 and a functional layer disposed on the substrate 100.
[0030] The substrate 100 can be a planar substrate 100 or a curved substrate 100, and typically, the substrate 100 is made of a transparent material. The substrate 100 can be made of materials such as glass, plexiglass, PET, PC, PMMA, or PI.
[0031] The substrate 100 can be a planar substrate 100 or a curved substrate 100, and the example in this embodiment does not constitute an undue limitation on it.
[0032] The functional layer includes at least two sets of thermal insulation functional layers 400. For example, the functional layer may include three sets (see [reference]) sequentially stacked on the substrate 100. Figure 3 ), four, five or other numbers of thermal insulation functional layers 400.
[0033] Each set of thermal insulation functional layers 400 includes a thermal insulation layer 410 and a dielectric passivation layer 420.
[0034] For example, in each set of thermal insulation functional layers 400, the thermal insulation layer 410 and the dielectric passivation layer 420 are stacked in sequence, and the thermal insulation layer 410 is located on the side of the dielectric passivation layer 420 close to the substrate 100.
[0035] Here, if the heat insulation layer 400 is set too thin, the heat insulation function will be weak; but if the heat insulation layer 400 is set too thick, the transmittance of visible light will be poor, which will not meet the requirements of automotive glass and other fields with certain transmittance requirements.
[0036] Therefore, in this embodiment, unlike the prior art which uses a single, thick heat insulation layer 410, the thick heat insulation layer 410 is divided into at least two groups of heat insulation functional layers 400, thereby reducing the thickness of each group of heat insulation layers 410. Multiple heat insulation layers 410 stacked together achieve a heat insulation effect. Simultaneously, because the heat insulation layer 410 is divided into discontinuous multi-layered structures, its impact on visible light transmittance is reduced. That is, while ensuring a certain level of visible light transmittance, the at least two heat insulation layers 410 reflect infrared light layer by layer to achieve the heat insulation function. The dielectric passivation layer 420 is used to improve the adhesion between adjacent film layers.
[0037] For example, the thickness of the heat insulation layer 410 can be in the nanometer range, such as 1nm-50nm, and more preferably, the thickness of the heat insulation layer 410 is 1nm-10nm. Of course, the example in this embodiment does not constitute an undue limitation. Furthermore, by means of the configuration of this application, a single heat insulation layer 410 with a thickness of 1000nm can be changed to at least two heat insulation layers 410, each with a reduced thickness. The thickness and number of heat insulation layers 410 can be selected according to the required transmittance.
[0038] In some embodiments, the dielectric passivation layer 420 is made of one or more of silicon nitride and silicon oxynitride. It is understood that the use of multiple materials in this specification (and the same applies to the materials of subsequent layers) refers to a layer structure comprising stacked layers of various materials. For example, in an embodiment where the mesoporous passivation layer is made of both silicon nitride and silicon oxynitride, the mesoporous passivation layer comprises stacked silicon nitride and silicon oxynitride layers, the order of which can be selected as needed, and this embodiment does not impose undue restrictions on this.
[0039] In some embodiments, the dielectric passivation layer 420 has a multilayer structure, with the oxygen content of the material being higher the closer it is to the heat insulation layer 410. For example, the dielectric passivation layer 420 has a three-layer structure, including a bottom passivation layer, a middle passivation layer, and a top passivation layer stacked sequentially. The bottom passivation layer is closer to the heat insulation layer 410 of the heat insulation functional layer 400, therefore the oxygen content of the material in the bottom passivation layer is higher than that in the middle passivation layer. If another heat insulation functional layer 400 is provided outside the dielectric passivation layer 420, the oxygen content of the material in the top passivation layer is also higher than that in the middle passivation layer. Again, for example, the middle passivation layer can be multiple layers. Still for example, the dielectric passivation layer 420 has three or more layers, with the oxygen content of the materials in the passivation layers at both ends being higher than that in the middle passivation layer; of course, the oxygen content of the materials in the passivation layers at both ends can be different.
[0040] It is understood that the materials of each layer in the dielectric passivation layer 420 of this application can be existing materials. The embodiments of this application only limit the oxygen content of the selected materials. For example, the oxygen content of silicon oxynitride is greater than that of silicon nitride.
[0041] The closer to the insulation layer 410, the higher the oxygen content of the passivation layer 420's structure, making its structure closer to a metallic state and achieving stronger adhesion to the insulation layer 410. Simultaneously, the central passivation layer uses a material with lower oxygen content, resulting in higher transparency and transmittance, without obstructing visible light transmission. This ensures good adhesion between the insulation layers 400 while minimizing the impact on transmittance.
[0042] In some embodiments, the dielectric passivation layer 420 includes a bottom passivation layer, a middle passivation layer, and a top passivation layer. The middle passivation layer may be configured as at least one layer and has a porous structure to improve transmittance. For example, the porous structure can be formed by increasing the oxygen content of the middle passivation layer, or by other means such as controlling the deposition sputtering pressure.
[0043] In some embodiments, the dielectric passivation layer 420 includes the aforementioned bottom passivation layer, middle passivation layer and top passivation layer. The thickness of the bottom and top passivation layers can be 2-3 nm, and the thickness of the middle passivation layer can be about 1 nm. The total thickness is low, and its visible light transmittance is high.
[0044] In some embodiments, the heat insulation layer 410 is made of one or more of silver, tungsten, and gold.
[0045] In some embodiments, localized plasma can also be used to deposit the thermal insulation layer 410 and / or the dielectric passivation layer 420. Exemplarily, during the deposition of the thermal insulation layer 410, the target is fixed by N magnets and S magnets, and an Ar / O2 mixture, a gas extraction channel, and a shield are sequentially arranged around the target from the inside to the outside, thereby depositing the thermal insulation layer 410.
[0046] This embodiment generates a localized oxidation plasma field by setting up an Ar / O2 mixed gas, an exhaust channel, and a shield, ensuring that the oxidation reaction only occurs within the shield and the plasma is confined to the sputtering area. There is no plasma outside the shield, thus avoiding secondary oxidation of the deposited film outside the sputtering area.
[0047] Similarly, in some embodiments, the dielectric passivation layer 420 may also be formed by localized plasma deposition as described above. Of course, in other embodiments, the dielectric passivation layer 420 and / or the thermal insulation layer 410 may also be made in other ways. The examples in this embodiment do not constitute an undue limitation.
[0048] In some embodiments, a dielectric layer 200 is further disposed on the side of the substrate 100 near the functional layer, which helps to increase the adhesion between the substrate 100 and other film layers.
[0049] For example, the material of the dielectric layer 200 may be selected from one or more of silicon oxide / silicon nitride / silicon oxynitride (SiNOx), indium tin oxide (ITO), aluminum zinc oxide (AZO), boron zinc oxide (BZO), gallium zinc oxide (GZO), indium gallium zinc oxide (IGZO), fluorine-doped tin oxide (FTO), niobium oxide (NbOx), zinc tin oxide (ZnSnOx), zinc oxide (ZnOx), tin oxide (SnOx), tungsten oxide (WOx), and titanium oxide (TiOx).
[0050] In some embodiments, please refer to Figure 2 and Figure 3 An ultraviolet (UV) isolation layer 300 is provided on the side of the functional layer closest to the substrate 100, for example, between the dielectric layer 200 and the functional layer, or between the substrate 100 and the functional layer. Since the UV isolation layer 300 is provided on the side of the functional layer closest to the substrate 100, infrared light has been weakened to prevent damage to the UV isolation layer 300.
[0051] In some embodiments, please refer to Figure 2 and Figure 3An optical control layer 500 may also be provided on the side of the functional layer away from the substrate 100. The optical control layer 500 is used to reduce the visible light reflectivity of the heat insulation layer 410 and improve the visible light transmittance. The optical control layer 500 is located on the side of the functional layer away from the substrate 100, which helps to reduce the reflectivity of the heat insulation layer 410 and increase the transmittance.
[0052] For example, the material of the optical control layer 500 is selected from one or more of the following materials: tungsten and tungsten oxide (W&WOx), tungsten nitride oxide (W&WNOx), aluminum zinc oxide (AZO), zinc tin oxide (ZnSnOx), zinc oxide (ZnOx), titanium oxide (TiOx), and silicon oxide (SiOx).
[0053] In some embodiments, please refer to Figure 2 and Figure 3 A dielectric barrier layer 600 may also be provided on the side of the functional layer away from the substrate 100. In embodiments where an optical control layer 500 is also provided, the dielectric barrier layer 600 is located on the side of the optical control layer 500 away from the substrate 100. The dielectric barrier layer 600 can be used to protect the functional layer from oxidation and to enhance its oxidation resistance during high-temperature molding processes.
[0054] For example, the material of the dielectric barrier layer 600 is selected from one or more of silicon nitride (SiNx), silicon oxynitride (SiNOx), nickel-chromium alloy (NiCr), nickel-chromium oxide (NiCrOx), nickel-chromium oxynitride (NiCrNOx), nickel-tungsten alloy (NiW), nickel-tungsten oxide (NiWOx), nickel-tungsten oxynitride (NiWNOx), zirconium oxide (CrOx), titanium oxide (TiOx), and titanium oxynitride (TiNOx).
[0055] In some embodiments, please refer to Figure 2 and Figure 3 A hardening layer 700 is provided on the end face of the heat-insulating glass furthest from the substrate 100. The hardening layer 700 is used to improve the hardness and scratch resistance of the heat-insulating glass.
[0056] For example, the material of the hardening layer 700 may be selected from one or more of zirconia (ZrOx), tungsten oxide (WOx), nickel chromium (NiCr), silicon nitride (SiNx), and aluminum oxide (AlOx).
[0057] Accordingly, embodiments of this application also provide a canopy structure that can be applied to transportation equipment such as automobiles, trains, and ships. Of course, the canopy structure can also be installed on fixed facilities.
[0058] The canopy structure includes a canopy frame and coated glass as provided in the embodiments of this application, with the coated glass disposed on the canopy frame. The canopy frame can be used for installation on transportation equipment or fixed facilities, or it can be integrally formed with the transportation equipment or fixed facilities.
[0059] Accordingly, embodiments of this application also provide a vehicle, which includes a vehicle body and the coated glass provided in any of the foregoing embodiments of this application, the coated glass being disposed on the vehicle body. For example, the coated glass can be used as a windshield on the vehicle body, or as a panoramic sunroof on the top of the vehicle body, etc.
[0060] In some embodiments, the vehicle body is provided with a windshield, a rear windshield, and window glass, and any of the glass on the vehicle body, such as the windshield, rear windshield, and window glass, may be the aforementioned heat-insulating glass.
[0061] Accordingly, embodiments of this application also provide a method for preparing the aforementioned heat-insulating glass. In preparing the dielectric passivation layer 420, a bottom passivation layer, a middle passivation layer, and a top passivation layer are deposited and sputtered in sequence. The oxygen content of the bottom passivation layer is higher than that of the middle passivation layer.
[0062] In some embodiments, the oxygen content of the material of the top passivation layer is higher than the oxygen content of the material of the middle passivation layer.
[0063] In some embodiments, the method further includes sequentially forming a dielectric layer 200, an ultraviolet isolation layer 300, at least two sets of thermal insulation functional layers 400, an optical control layer 500, and a dielectric barrier layer 600 on the substrate 100. Furthermore, a hardening layer 700 may be formed on the side of the dielectric barrier layer 600 away from the substrate 100.
[0064] In some embodiments, each film layer may be formed by deposition using the aforementioned localized plasma.
[0065] Example 1
[0066] In this embodiment, please refer to Figure 1 The heat-insulating glass includes a substrate 100 and a functional layer disposed on the substrate 100. The functional layer includes three sets of heat-insulating functional layers 400 disposed sequentially. Each set of heat-insulating functional layers 400 includes a heat-insulating layer 410 and a dielectric passivation layer 420 disposed sequentially.
[0067] Example 2
[0068] In this embodiment, based on Example 1, a dielectric layer 200 and an ultraviolet isolation layer 300 are sequentially disposed on the substrate 100, and the aforementioned functional layer is disposed on the ultraviolet isolation layer 300. Of course, in other embodiments, either the dielectric layer 200 or the ultraviolet isolation layer 300 may not be disposed.
[0069] Example 3
[0070] In this embodiment, based on Example 2, an optical control layer 500 is also provided on the side of the functional layer away from the substrate 100.
[0071] Example 4
[0072] In this embodiment, based on Example 3, a dielectric barrier layer 600 is also provided on the side of the optical control layer 500 away from the substrate 100.
[0073] Example 5
[0074] In this embodiment, a hardening layer 700 is also provided. The hardening layer 700 may be provided on the side of the functional layer away from the substrate 100, based on embodiment 1 or 2; or it may be provided on the side of the optical control layer 500 away from the substrate 100, based on embodiment 3; or it may be provided on the side of the dielectric barrier layer 600 away from the substrate 100, based on embodiment 4. In short, the hardening layer 700 is the film layer that is furthest away from the substrate 100.
[0075] It is understood that the terms used in the embodiments of this application have the same meaning. For any content not described in detail in a certain embodiment, the specific implementation details can be referred to the descriptions in other embodiments. The examples and technical effects shown in the foregoing embodiments can be implemented accordingly. For repeated parts, this embodiment will not elaborate further.
[0076] The above provides a detailed description of the heat-insulating glass, sunroof structure, and automobile provided in this application. Specific examples have been used to illustrate the principles and implementation methods of this application. The descriptions of the above embodiments are only for the purpose of helping to understand the methods and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.
Claims
1. Heat-insulated glass, characterized in that, The insulating glass comprises, a substrate, a functional layer disposed on the substrate, the functional layer comprising at least two groups of heat-insulating functional layers, the heat-insulating functional layer comprising a heat-insulating layer and a dielectric passivation layer; in each group of the heat-insulating functional layers, the heat-insulating layer and the dielectric passivation layer are sequentially stacked, and the heat-insulating layer is located on the side of the dielectric passivation layer close to the substrate.
2. The thermally insulated glass according to claim 1, characterized in that The dielectric passivation layer comprises a bottom passivation layer, a middle passivation layer and a top passivation layer which are sequentially stacked, the number of the middle passivation layer is at least one layer, and the oxygen content of the material of the bottom passivation layer is higher than that of the material of the middle passivation layer.
3. The thermally insulated glass according to claim 2, characterized in that The oxygen content of the material of the top passivation layer is higher than that of the material of the middle passivation layer.
4. Insulating glass according to claim 1 or 2, characterized in that The dielectric passivation layer comprises a bottom passivation layer, a middle passivation layer and a top passivation layer, the number of the middle passivation layer is set to at least one layer, and the middle passivation layer is provided with a hole structure.
5. The insulated glass of claim 1, wherein, The material of the dielectric passivation layer is silicon nitride or silicon oxynitride.
6. The insulated glass of claim 1, wherein, The thickness of the heat-insulating layer is 1 nm-50 nm.
7. The insulating glass according to claim 1, wherein, an ultraviolet isolation layer is disposed on the side of the functional layer close to the substrate; and / or, an optical control layer is disposed on the side of the functional layer away from the substrate, the material of the optical control layer is selected from one of tungsten, oxide of tungsten, oxynitride of tungsten, zinc aluminum oxide, zinc tin oxide, zinc oxide, titanium oxide and silicon oxide; and / or, a dielectric barrier layer is disposed on the side of the functional layer away from the substrate, the material of the dielectric barrier layer is selected from one of silicon nitride, silicon oxynitride, nickel-chromium alloy, nickel-chromium oxide, nickel-chromium oxynitride, nickel-tungsten alloy, nickel-tungsten oxide, nickel-tungsten oxynitride, zirconium oxide, titanium oxide and titanium oxynitride.
8. The insulated glass of claim 1, wherein, The substrate is a curved substrate.
9. A canopy structure, characterized by The insulating glass comprises, a curtain frame; the insulating glass according to any one of claims 1 to 8 is disposed on the curtain frame.
10. An automobile characterized by comprising: The insulating glass comprises, a car body; the insulating glass according to any one of claims 1 to 8 is disposed on the car body.