Light path correction device
By designing a movable displacement platform and an angle adjustment component in the photolithography equipment, the problems of optical path instability and inaccuracy were solved, the accurate propagation of the beam was achieved, and the stability and precision of photolithography were improved.
Patent Information
- Application Number
- CN202520114112.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-17
- Publication Date
- 2026-01-13
- Estimated Expiration
- 2035-01-17
AI Technical Summary
In existing maskless lithography equipment, production and assembly errors of components such as light sources, mirrors, digital micromirrors, and objective lenses lead to unstable and inaccurate optical paths, affecting the lithography processing effect.
Design an optical path correction device that uses a movable displacement platform and an angle adjustment component in a photolithography device, in conjunction with an aperture, to correct and adjust the optical path and ensure accurate beam propagation.
Effective correction of optical path errors ensures accurate propagation of the light beam in the lithography equipment, thereby improving the stability and precision of the lithography process.
Smart Images
Figure CN223796821U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of photolithography equipment, and more specifically, to an optical path correction device. Background Technology
[0002] Maskless lithography is widely used in the process of printed circuit board manufacturing. The light beam emitted from the light source is reflected by a mirror and a digital micromirror (DMD) in sequence, and then passes vertically through the objective lens to reach the substrate below the objective lens, where it performs photolithography on the printed circuit board placed on the substrate.
[0003] Patent CN213750654U discloses a maskless lithography equipment that employs the aforementioned technology. However, the components in this lithography equipment, such as the light source, reflector, digital micromirror, and objective lens, have certain errors during production and assembly, which affect the stability and accuracy of the optical path. In view of this, it is necessary to provide an optical path correction device to detect the aforementioned errors and make adaptive adjustments and corrections so that the lithography equipment can meet the usage requirements. Utility Model Content
[0004] The purpose of this invention is to overcome the shortcomings of the prior art and provide an optical path correction device.
[0005] The embodiments of this utility model are achieved through the following technical solutions:
[0006] An optical path correction device includes a frame, on which are provided:
[0007] The first mounting position is where the light source and the reflector are located. The light beam emitted by the light source is reflected by the reflector into a first reflected light beam that is tilted upward.
[0008] The second mounting position is located above the first mounting position. The second mounting position is provided with a first displacement platform that can move laterally and longitudinally in the horizontal plane. The digital micro-reflector is disposed on the first displacement platform so that the first reflected beam is reflected by the digital micro-reflector into a vertically downward second reflected beam.
[0009] A third mounting position is located directly below the second mounting position. The second mounting position has a second displacement platform that can move laterally and longitudinally within a horizontal plane. The objective lens is positioned on the second mounting platform so that the second reflected light beam can pass through the objective lens.
[0010] Several aperture stops are provided, with a set of aperture stops at each end of the light source and the objective lens.
[0011] Furthermore, both the first displacement platform and the second displacement platform include a fixed frame, an outer frame, and an inner frame; wherein, the fixed frame is fixed on the frame, and the digital micromirror / objective lens is disposed on the inner frame;
[0012] The outer frame can be longitudinally slidably mounted on the fixed frame in the horizontal plane, and the inner frame can be laterally slidably mounted on the outer frame in the horizontal plane.
[0013] Furthermore, the outer frame is rotatably provided with a first screw in the lateral direction, and the inner frame is provided with a threaded seat that is threadedly connected to the first screw, so that the inner frame can be moved laterally by the first screw being screwed in / out.
[0014] Furthermore, the outer frame is slidably disposed within the fixing frame in the horizontal plane; the fixing frame is threadedly connected to a second screw that abuts against the outer frame on one side in the longitudinal direction, and is provided with several springs that abut against the outer frame and are in a compressed state on the other side.
[0015] Furthermore, it also includes an angle adjustment component disposed on the first displacement platform and the second displacement platform;
[0016] The deflection adjustment assembly includes multiple screw groups and an upper ring and a lower ring arranged coaxially. The lower ring is disposed on the first displacement platform / second displacement platform, and the digital micro-reflector / objective lens is disposed on the upper ring. The multiple screw groups are evenly spaced around the upper ring / lower ring. Each screw group includes two sets of screws, one set of screws connecting the upper ring and the lower ring simultaneously, and the other set of screws having threads that penetrate the upper ring and abut against the lower ring.
[0017] Furthermore, in the second displacement platform, a mounting base for placing the objective lens is coaxially arranged on the upper ring, and the bottom of the mounting base is provided with a light-transmitting hole that allows the second reflected light beam to pass through.
[0018] Furthermore, the mounting base includes a cylindrical portion and claws disposed on the upper ends of a plurality of cylindrical portions, the cylindrical portion matching the outer diameter of the objective lens, and the plurality of claws being evenly arranged around the axis of the cylindrical portion;
[0019] A nut is threaded onto the outer wall of the cylindrical part, and the upper end of the nut has a constricted opening that is fitted onto the plurality of jaws so that the plurality of jaws can be brought together to lock the objective lens.
[0020] Furthermore, the outer wall composed of the plurality of claws has a tapered structure that is narrow at the top and wide at the bottom.
[0021] The technical solution of this utility model embodiment has at least the following advantages and beneficial effects:
[0022] In the optical path correction device of this utility model, the mounting positions and adjustment structures of each component are designed according to the optical paths of each component in the lithography equipment. Among them, the first displacement platform located on the second mounting position and the second positioning platform located on the third mounting position can slide in space. Therefore, for optical path errors caused by production and assembly problems of each component in the lithography equipment, the optical path can be corrected by adaptive adjustment through digital micro-reflectors and objective lenses. In addition, by using apertures set at both ends of the light source and objective lens, the correction can be detected by whether the optical path passes through the apertures. Attached Figure Description
[0023] Figure 1 This is a formal drawing of the optical path correction device according to an embodiment of the present invention;
[0024] Figure 2 This is a perspective view of the first displacement platform according to an embodiment of the present utility model;
[0025] Figure 3 This is a perspective view of the second displacement platform according to an embodiment of the present utility model;
[0026] Figure 4 This is a schematic diagram showing the assembly relationship between the objective lens and the second displacement platform in an embodiment of this utility model;
[0027] Icons: 1-Frame, 10-First mounting position, 11-Second mounting position, 12-Third mounting position, 20-Light source, 21-Reflector, 22-Digital micromirror, 23-Objective lens, 24-Aperture, 25-Base, 30-First displacement platform, 31-Second displacement platform, 300-Fixed frame, 301-Outer frame, 302-Inner frame, 3020-Threaded seat, 303-First screw, 304-Second screw, 305-Spring, 32-Angle adjustment assembly, 320-Upper ring, 321-Lower ring, 322-Screw assembly, 3220-Screw, 33-Mounting base, 330-Cylindrical part, 3301-Light passage, 331-Claw, 332-Nut, 3320-Narrowing, a-Outgoing beam, b-First reflected beam, c-Second reflected beam. Detailed Implementation
[0028] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. The components of the embodiments of this utility model described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.
[0029] Reference Figure 1In existing photolithography equipment, an ideal optical path typically consists of a horizontal outgoing beam a emitted by a light source 20, which is reflected by a mirror 21 into an upwardly tilted first reflected beam b. The first reflected beam b is then reflected by a digital micro-mirror 22 into a downwardly tilted second reflected beam c. The second reflected beam c passes through an objective lens 23 and reaches the substrate 25 below, where it performs photolithography on the printed circuit board.
[0030] In practice, due to manufacturing and assembly errors of components such as the light source 20, reflector 21, digital micro-reflector 22, and objective lens 23, there is a deviation between the optical path formed by the assembled photolithography equipment and the ideal optical path, which requires correction.
[0031] For the reasons mentioned above, this utility model provides an optical path correction device.
[0032] Reference Figures 1 to 4 The optical path correction device of this utility model includes a frame 1, on which a first mounting position 10, a second mounting position 11 and a third mounting position 12 are provided.
[0033] The light source 20 and the reflector 21 are located on the first mounting position 10. Here, the assembly error between the light source 20 and the reflector 21 is small or large, so that the emitted light beam a from the light source 20 is reflected by the reflector 21 to form a first reflected light beam b tilted upward.
[0034] The second mounting position 11 is used to mount the digital micromirror 22, based on the propagation of the ideal optical path, referring to... Figure 1 The second mounting position 11 is located above and to the side of the first mounting position 10 so that the first reflected beam b can be irradiated onto the digital micro-reflector 22 as much as possible. In addition, the second mounting position 11 is provided with a first displacement platform 30 that can move laterally and longitudinally in the horizontal plane. The digital micro-reflector 22 is located on the first displacement platform 30. It can be moved laterally and longitudinally through the first displacement platform 30 so that the first reflected beam b can be accurately irradiated onto the digital micro-reflector 22 and reflect the second reflected beam c.
[0035] According to the ideal optical path propagation, the third mounting position 12 is located directly below the second mounting position 11. The second mounting position 11 is provided with a second displacement platform 31 that can move laterally and longitudinally in the horizontal plane. The objective lens is located on the second mounting platform so that the second reflected beam c can pass through the objective lens 23.
[0036] During the actual assembly process, after the movement operation of the first displacement platform 30, the first reflected beam b can always illuminate the digital micromirror 22 and form the second reflected beam c; after the adjustment of the second displacement platform 30, the second reflected beam c can always illuminate the entrance aperture of the objective lens 23; however, sometimes due to the production and assembly errors of the digital micromirror 22 and the objective lens 23, such as the tilt angle deviation of the digital micromirror 22 and / or the tilt of the objective lens 23, which cannot be kept vertical, the second reflected beam c cannot be vertically downward and / or the second reflected beam c is vertically downward but cannot pass through the upper and lower ends of the objective lens 23.
[0037] For the reasons mentioned above, both the first displacement platform 30 and the second displacement platform 31 are equipped with an angle adjustment component 32, referring to... Figure 2 and Figure 3 The tilt adjustment assembly 32 includes multiple screw groups 322, an upper ring 320 and a lower ring 321 arranged coaxially. Each screw group 322 has two sets of screws 3220. The lower ring 321 is located on the first displacement platform 30 / second displacement platform 31, while the digital micro-reflector 22 / objective lens 23 is located on the upper ring 320. The multiple screw groups 322 are evenly arranged around the upper ring 320 / lower ring 321. The two sets of screws 3220 in each screw group 322 are arranged adjacent to each other. One set of screws 3220 is threadedly connected to both the upper ring 320 and the lower ring 321, while the other set of screws 3220 is threaded through the upper ring 320 and abuts against the lower ring 321.
[0038] Specifically, refer to Figure 2 Four sets of screw groups 320 are provided on the first displacement platform 30. One set of screws 3220 in each set of screw groups 320 passes through the lower ring 321 and the upper ring 320 from bottom to top, so that the upper ring 320 and the lower ring 321 are connected by the four sets of screws 3220. In addition, the other four sets of screws 3220 pass through the upper ring 320 from top to bottom and abut against the upper end face of the lower ring 321. That is, in each set of screw groups 322, one set of screws 3220 is used to connect the upper ring 320 and the lower ring 321, and the other set of screws 3220 creates a gap between the upper ring 320 and the lower ring 321. By adjusting the size of the gap between the upper ring 320 and the lower ring 321 at different positions of the screw groups 320, the digital micro-reflector 22 installed on the upper ring 320 can be deflected to compensate for and correct the deviation of the second reflected beam c, so that the second reflected beam c is vertically downward.
[0039] Similarly, refer to Figure 3Three sets of screw groups 320 are set on the second displacement platform 31. By turning the screws 3220 in the screw group 320, the objective lens 23 can be tilted to compensate for and correct the production and assembly errors of the objective lens 23, so that the second reflected beam c can pass vertically through the upper and lower ends of the objective lens 23 and accurately illuminate the substrate 25.
[0040] Reference Figure 1 An aperture 24 is provided at each end of the light source 20 and the objective lens 23 to limit the size of the beam. The beam is narrowed by the aperture 24. When the beam generated by the light source 20 passes through the first aperture 24, the reflector 21, the digital micro-reflector 22, the second aperture 24, the objective lens 23 and the third aperture 24 in sequence, and can still illuminate the substrate 25, the correction is completed.
[0041] Regarding the specific structures of the first displacement platform 30 and the second displacement platform 31, as one possible implementation method, refer to... Figure 2 and Figure 3 Both the first displacement platform 30 and the second displacement platform 31 include a fixed frame 300, an outer frame 301, and an inner frame 302. The fixed frame 300 is fixed on the frame 1, and the digital micromirror 22 / objective lens 23 is mounted on the inner frame 302 through the angle adjustment component 32. The outer frame 301 can be longitudinally slidably mounted on the fixed frame 300 in the horizontal plane, while the inner frame 302 can be laterally slidably mounted on the outer frame 301 in the horizontal plane.
[0042] Specifically, refer to Figure 2 The outer frame 301 can be slidably mounted in the fixed frame 300 in the horizontal plane. The fixed frame 300 is threadedly connected to a second screw 304 on one side in the longitudinal direction. The second screw 304 abuts against the outer frame 301. On the other side in the longitudinal direction, the fixed frame 300 and the outer frame 301 are abutted by a number of compressed springs 305. That is, the second screw 304 is screwed in to compress the springs 305, and the second screw 304 is unscrewed to extend the springs 305. The force of the second screw 304 and the springs 305 balances the position of the outer frame 301 so that the outer frame 301 can be adjusted to a suitable longitudinal position and then locked.
[0043] Reference Figure 3 The outer frame 301 is rotatably provided with a first screw 303 in the horizontal direction, that is, a connecting seat is provided at both ends of the outer frame 301 in the horizontal direction, and each end of the first screw 303 is rotatably connected to a set of connecting seats; the inner frame 302 is provided with a threaded seat 3020 that is threadedly connected to the first screw 303, and the inner frame 302 is moved laterally by the first screw 303 being screwed in / out.
[0044] The first displacement platform 30 and the second displacement platform 31 can be adjusted in the horizontal and vertical directions by means of the aforementioned fixed frame 300, outer frame 301 and inner frame 302.
[0045] In addition, refer to Figure 4 In one embodiment, to facilitate fixing the objective lens 23 onto the second displacement platform 31, a mounting base 33 for placing the objective lens is coaxially provided on the upper ring 320 located on the second displacement platform 31. The bottom of the mounting base 33 is provided with a light-transmitting hole 3301 that allows the second reflected light beam c to pass through. The mounting base 33 includes a cylindrical portion 330 and several claws 331 located at the upper ends of the cylindrical portions 330. The cylindrical portions 330 match the outer diameter of the objective lens, and the objective lens 23 is inserted into the cylindrical portion 330. The several claws 331 are arranged around the objective lens. The components are evenly arranged around the axis of the cylindrical part 330; a nut 332 is threadedly connected to the outer wall of the cylindrical part 330, and the upper end of the nut 332 has a constricted opening 3320 with a reduced inner diameter. The constricted opening 3320 is fitted onto the outer wall of several claws 331; and the outer wall composed of several claws 331 has a tapered structure that is narrow at the top and wide at the bottom. As the nut 332 is screwed downward, the constricted opening 3320 continuously compresses and gathers the several claws 331, eventually locking the several claws 331 onto the outer wall of the objective lens 23, thereby achieving the effect of fixing the objective lens 23.
[0046] The above are merely preferred embodiments of this utility model and are not intended to limit the scope of this utility model. Various modifications and variations can be made to this utility model by those skilled in the art. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of this utility model should be included within the protection scope of this utility model.
Claims
1. An optical path correction device, characterized by comprising: The machine frame is provided with: a first mounting position, a light source and a mirror are arranged on the first mounting position, and an outgoing light beam of the light source is reflected by the mirror into a first reflected light beam that is obliquely upward; a second mounting position that is above the first mounting position, the second mounting position is provided with a first displacement platform that can move horizontally and longitudinally, and a digital micro-mirror is arranged on the first displacement platform, so that the first reflected light beam is reflected by the digital micro-mirror into a second reflected light beam that is vertically downward; a third mounting position that is directly below the second mounting position, the second mounting position is provided with a second displacement platform that can move horizontally and longitudinally, and an objective lens is arranged on the second displacement platform, so that the second reflected light beam can pass through the objective lens; and a plurality of diaphragms, one set of diaphragms is arranged at both ends of the light source and the objective lens. The first displacement platform and the second displacement platform each include a fixed frame, an outer frame and an inner frame; the digital micro-mirror / objective lens is arranged on the inner frame; the outer frame is longitudinally slidably arranged on the fixed frame; and the inner frame is transversely slidably arranged on the outer frame.
2. The optical path correcting device according to claim 1, characterized in that The outer frame is rotationally arranged with a first screw rod in the transverse direction, the inner frame is provided with a threaded seat that is threadedly connected with the first screw rod, so as to drive the inner frame to move transversely by screwing in / screwing out of the first screw rod. The outer frame is longitudinally slidably arranged in the fixed frame; a second screw rod that abuts against the outer frame is threadedly connected to one side of the fixed frame in the longitudinal direction, and a plurality of springs that abut against the outer frame in a compressed manner are arranged on the other side of the fixed frame.
3. The optical path correcting device according to claim 2, characterized in that The machine frame is further provided with an angle adjustment assembly arranged on the first displacement platform and the second displacement platform.
4. The optical path correcting device according to claim 2, characterized in that The angle adjustment assembly includes a plurality of screw groups, an upper ring and a lower ring that are coaxially arranged, the lower ring is arranged on the first displacement platform / second displacement platform, the digital micro-mirror / objective lens is arranged on the upper ring, the plurality of screw groups are uniformly arranged around the upper ring / lower ring, each screw group includes two groups of screws, one group of screws simultaneously connects the upper ring and the lower ring, and the other group of screws is threadedly penetrated through the upper ring and abuts against the lower ring.
5. The optical path correcting device according to claim 1 or 2, characterized by In the second displacement platform, an installation seat for placing the objective lens is coaxially arranged on the upper ring, and the installation seat is provided with a light passing hole at the bottom that can pass the second reflected light beam. The installation seat includes a cylindrical portion and a plurality of clamping jaws arranged on the upper end of the cylindrical portion, the cylindrical portion matches the outer diameter of the objective lens, and the plurality of clamping jaws are uniformly arranged around the axis of the cylindrical portion; 6. The optical path correcting device according to claim 5, characterized in that a nut is threadedly connected to the outer wall of the cylindrical portion, the upper end of the nut has a neck that is sleeved on the plurality of clamping jaws, so that the plurality of clamping jaws are gathered to lock the objective lens.
7. The optical path correcting device according to claim 6, characterized in that The outer sidewall formed by the plurality of clamping jaws is a tapered structure that is narrow at the top and wide at the bottom. 8. The optical path correcting device according to claim 7, characterized in that