Cleaning device for thin film production line

Abstract

The utility model relates to the technical field of film cleaning devices, and discloses a cleaning device for a film production line, which comprises two fixing plates, an upper limiting table is fixedly connected between the two fixing plates, a first duct and a third duct are arranged on the upper limiting table, the first duct is communicated with the third duct, one end of the third duct is provided with a dust removal filtering mechanism, and the other end of the third duct is provided with a dust removal filtering mechanism. A third duct is formed in the lower side of the interior of the first duct, a turning cover dust discharging mechanism is arranged at the lower end of the second duct, and a wind tunnel dust removing mechanism is arranged between the two fixing plates. Dust or particles on a film are blown to the third duct through a dust removing wind tunnel, and the dust is filtered and blocked by a filtering assembly; and the dust can be conveniently discharged by opening the upper turning cover assembly, so that convenience is brought to later operation and use of a user.

Description

Technical Field

[0001] This utility model relates to the field of film cleaning device technology, and in particular to a cleaning device for film production lines. Background Technology

[0002] As a widely used material, the quality of film directly affects the performance and service life of products. However, during the production process, some impurities inevitably get mixed into the film. These impurities may come from various aspects such as raw materials, production equipment, and production environment. The presence of impurities will have an adverse effect on the performance of the film, such as reducing the transparency of the film, increasing the surface roughness, and affecting the mechanical properties of the film. These changes in properties may directly lead to problems in the use of the film, such as poor light transmittance and easy breakage. Therefore, before the film is rolled, it is necessary to clean the dust and other particles attached to the film surface.

[0003] Existing cleaning devices for film production lines, such as electrostatic dust collectors, often leave dust adhering to the collection or dust removal plates when cleaning the film surface. This makes cleaning these components difficult. If the dust removal plates are not cleaned promptly or the dust is not removed from the device during prolonged operation, secondary pollution or reduced dust removal performance may occur. Therefore, a new cleaning device for film production lines is proposed. Utility Model Content

[0004] To solve the technical problems of film cleaning and dust removal, this utility model provides a cleaning device for film production lines.

[0005] This utility model is achieved using the following technical solution: a cleaning device for a film production line, comprising two fixed plates, an upper limit platform fixedly connected between the two fixed plates, a first duct and a third duct provided on the upper limit platform, the first duct and the third duct being connected, a dust removal and filtration mechanism provided at one end of the third duct, a second duct provided on the lower side inside the third duct, a flip-top dust removal mechanism provided at the lower end of the second duct, and a wind tunnel dust removal mechanism provided between the two fixed plates.

[0006] As a further improvement to the above solution, the dust removal and filtration mechanism includes a filter assembly fixedly connected to one side of the upper limit platform, and the filter assembly is connected to the third duct.

[0007] As a further improvement to the above solution, the flip-top dust removal mechanism includes an upper flip-top assembly rotatably connected to one side of the upper limit platform. A card plate is fixedly connected to the lower side of the upper flip-top assembly, and a card rod is rotatably connected to the side of the upper limit platform near the card plate. The card rod is configured to cooperate with the card plate.

[0008] As a further improvement to the above solution, the wind tunnel dust removal mechanism includes a lower limiting platform fixedly connected to the two fixed plates. The lower limiting platform is located below the upper limiting platform, and a thin film channel is formed between the lower limiting platform and the upper limiting platform. The thin film channel is used for the passage of thin film, and a blower mechanism is provided on the lower limiting platform and the upper limiting platform.

[0009] As a further improvement to the above solution, the blower mechanism includes a dust removal duct that is simultaneously opened on the upper limit platform and the lower limit platform. The dust removal duct extends outward through two fixed plates on both sides. The membrane channel passes through the dust removal duct. A fan is fixedly connected to one side of one of the fixed plates, and the exhaust port of the fan is connected to the dust removal duct. A diversion duct is connected to the side of the other fixed plate. One end of the diversion duct is connected to the dust removal duct, and the other end of the diversion duct is connected to the first duct.

[0010] As a further improvement to the above solution, the two fixed plates are rotatably connected to a first positioning roller on the side near the filter assembly, and the other side of the two fixed plates is rotatably connected to a second positioning roller.

[0011] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0012] 1. This utility model blows dust or particles on the membrane to the third duct through a dust removal wind tunnel. The dust is filtered and blocked by the filter component and falls down to the upper flip cover component along the second duct. The dust can be easily discharged by opening the upper flip cover component, which is convenient for users to operate later.

[0013] 2. This utility model sets up a film channel and a dust removal duct between the upper limit platform and the lower limit platform. When the film passes through the dust removal duct in the form of a strip, it can be fully stretched, and the dust removal is more thorough. At the same time, under the special first-rise and then-falling movement of the film channel, it can play a shaping role on the film, making the winding more neat. Attached Figure Description

[0014] Figure 1 A schematic diagram of the overall structure of a cleaning device for a thin film production line provided by this utility model;

[0015] Figure 2 for Figure 1 Side view;

[0016] Figure 3 for Figure 1 A schematic diagram of the first explosion structure;

[0017] Figure 4 for Figure 1 The first sectional view;

[0018] Figure 5 for Figure 1 The second sectional view;

[0019] Figure 6 for Figure 1 A schematic diagram of the second explosion structure.

[0020] Explanation of key symbols:

[0021] 1. Fixed plate; 2. Upper limit stage; 3. Fan; 4. Filter assembly; 5. Upper flip cover assembly; 6. First positioning roller; 7. Air duct; 8. Clamping rod; 9. Second positioning roller; 10. First duct; 11. Lower limit stage; 12. Membrane channel; 13. Dust removal air tunnel; 14. Second duct; 15. Third duct. Detailed Implementation

[0022] The present invention will be further described below with reference to the accompanying drawings and specific embodiments. It should be noted that, without conflict, the various embodiments or technical features described below can be arbitrarily combined to form new embodiments.

[0023] Example:

[0024] Please combine Figures 1-6 This embodiment of a cleaning device for a film production line includes two fixed plates 1, which serve to install and fix the device. An upper limit platform 2 is fixedly connected between the two fixed plates 1. A first duct 10 and a third duct 15 are provided on the upper limit platform 2. The first duct 10 and the third duct 15 are connected and serve to guide the flow. The device adopts a curved trajectory design to prevent dust from returning and causing secondary pollution. A dust removal and filtration mechanism is provided at one end of the third duct 15. A second duct 14 is provided on the lower side of the interior of the third duct 15. A flip-top dust removal mechanism is provided at the lower end of the second duct 14. A wind tunnel dust removal mechanism is provided between the two fixed plates 1.

[0025] Please combine Figure 1 As shown, the dust removal and filtration mechanism includes a filter assembly 4 fixedly connected to one side of the upper limit platform 2. The filter assembly 4 is connected to the third duct 15. In this embodiment, the filter assembly 4 consists of a filter screen mounting platform and a filter screen design, which is a detachable design. A small amount of dust may adhere to the surface of the filter screen in the short term, but it will not block the airflow. The dust particles after being filtered and screened can fall along the second duct 14. Under the action of the curved second duct 14, the dust particles can gradually accumulate near the upper flip-top assembly 5, playing a collection role.

[0026] Please combine Figure 1As shown, the flip-top dust removal mechanism includes an upper flip-top assembly 5 rotatably connected to one side of the upper limit platform 2. A clamping plate is fixedly connected to the lower side of the upper flip-top assembly 5. A clamping rod 8 is rotatably connected to the side of the upper limit platform 2 near the clamping plate. The clamping rod 8 is configured to cooperate with the clamping plate. When the clamping rod 8 is rotated, the clamping plate can be located inside the clamping rod 8, which forms a fixed limiting effect on the clamping plate and can resist the air pressure from the internal second duct 14 to maintain balance.

[0027] Please combine Figure 3 and Figure 4 As shown, the wind tunnel dust removal mechanism includes a lower limiting platform 11 fixedly connected to two fixed plates 1. The lower limiting platform 11 is located below the upper limiting platform 2. The lower limiting platform 11 and the upper limiting platform 2 enclose a membrane channel 12. The membrane channel 12 is slightly larger than the actual thickness of the membrane. Under the sealing effect of the fixed plates 1 on both sides, the membrane channel 12 can prevent air leakage to the outside. The membrane channel 12 is used for the membrane to pass through. Blowering mechanisms are provided on the lower limiting platform 11 and the upper limiting platform 2.

[0028] Please combine Figure 4 As shown, the blower mechanism includes a dust removal duct 13 opened simultaneously on the upper limit platform 2 and the lower limit platform 11. The dust removal duct 13 extends outward through the fixed plates 1 on both sides. The membrane channel 12 passes through the dust removal duct 13. A fan 3 is fixedly connected to one side of one of the fixed plates 1. The exhaust port of the fan 3 is connected to the dust removal duct 13. A diversion duct 7 is connected to the side of the other fixed plate 1. One end of the diversion duct 7 is connected to the dust removal duct 13, and the other end of the diversion duct 7 is connected to the first duct 10.

[0029] Please combine Figure 1 and Figure 2 As shown, the two fixed plates 1 are rotatably connected to the first positioning roller 6 on the side near the filter assembly 4, and the two fixed plates 1 are rotatably connected to the second positioning roller 9 on the other side.

[0030] The implementation principle of a cleaning device for a film production line in this embodiment is as follows: The film belt enters the film channel 12 from the first positioning roller 6 and flows out from the film channel 12 from the second positioning roller 9. The fan 3 is started to introduce the external airflow into the dust removal duct 13. When the high-speed airflow passes through the dust removal duct 13, the dust on the upper and lower sides of the film belt can be carried away by the high-speed airflow and enter the first duct 10 along the guide air duct 7. It then enters the third duct 15 through the first duct 10. At the end of the third duct 15, it encounters the filter component 4. The filter screen in the filter component 4 filters and screens the dust particles carried by the film in the air. The screened particles and dust enter the upper flip-top component 5 along the second duct 14 and accumulate. When the dust accumulates to a certain amount, the operator can open the lever 8 to lift the upper flip-top component 5 and discharge the accumulated dust.

[0031] The above embodiments are merely preferred embodiments of this utility model and should not be construed as limiting the scope of protection of this utility model. Any non-substantial changes and substitutions made by those skilled in the art based on this utility model shall fall within the scope of protection claimed by this utility model.

Claims

1. A cleaning device for a film production line, comprising two fixed plates (1), characterized in that, An upper limit platform (2) is fixedly connected between the two fixed plates (1). A first duct (10) and a third duct (15) are provided on the upper limit platform (2). The first duct (10) and the third duct (15) are connected. A dust removal and filtration mechanism is provided at one end of the third duct (15). A second duct (14) is provided on the lower side of the interior of the third duct (15). A flip-top dust removal mechanism is provided at the lower end of the second duct (14). A wind tunnel dust removal mechanism is provided between the two fixed plates (1).

2. The cleaning device for a thin film production line as described in claim 1, characterized in that, The dust removal and filtration mechanism includes a filter assembly (4) fixedly connected to one side of the upper limit platform (2), and the filter assembly (4) is connected to the third duct (15).

3. The cleaning device for a thin film production line as described in claim 1, characterized in that, The flip-top dust removal mechanism includes an upper flip-top assembly (5) rotatably connected to one side of the upper limit platform (2). A card plate is fixedly connected to the lower side of the upper flip-top assembly (5). A card rod (8) is rotatably connected to the side of the upper limit platform (2) near the card plate. The card rod (8) is configured to cooperate with the card plate.

4. The cleaning device for a thin film production line as described in claim 1, characterized in that, The wind tunnel dust removal mechanism includes a lower limiting platform (11) fixedly connected between the two fixed plates (1). The lower limiting platform (11) is located below the upper limiting platform (2). The lower limiting platform (11) and the upper limiting platform (2) enclose a thin film channel (12) for thin film to pass through. The lower limiting platform (11) and the upper limiting platform (2) are provided with a blower mechanism.

5. A cleaning device for a thin film production line as described in claim 4, characterized in that, The blower mechanism includes a dust removal duct (13) simultaneously opened on the upper limit platform (2) and the lower limit platform (11). The dust removal duct (13) extends outward through the fixed plates (1) on both sides. The membrane channel (12) passes through the dust removal duct (13). A fan (3) is fixedly connected to one side of one of the fixed plates (1). The exhaust port of the fan (3) is connected to the dust removal duct (13). A diversion duct (7) is connected to the side of the other fixed plate (1). One end of the diversion duct (7) is connected to the dust removal duct (13), and the other end of the diversion duct (7) is connected to the first duct (10).

6. A cleaning device for a thin film production line as described in claim 2, characterized in that, The two fixed plates (1) are rotatably connected to a first positioning roller (6) on one side near the filter assembly (4), and the two fixed plates (1) are rotatably connected to a second positioning roller (9) on the other side.

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