Filter device applied to water circulation system of wire cutting machine and cutting fluid circulation system
By using a filter element consisting of a tank, filter layer, and backwashing pipeline in the water circulation system of the online cutting machine, the problem of poor mesh filtration effect was solved, achieving efficient impurity removal and filter layer restoration, thereby improving production efficiency and silicon wafer quality.
Patent Information
- Application Number
- CN202520108760.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-17
- Publication Date
- 2026-01-27
- Estimated Expiration
- 2035-01-17
AI Technical Summary
In the existing water circulation system of wire EDM machines, the mesh filtration effect is not good. Flocculent and gel-like substances easily adhere to the cutting wire, causing the cutting wire to skip grooves or get stuck, affecting production efficiency and safety, and requiring frequent replacement, which increases costs.
The filter element consists of a tank, a filter layer, and a backwashing pipeline. The filter layer is composed of activated carbon, filter balls, and filter sponges. Combined with the backwashing pipeline, it can effectively remove impurities and restore the filter layer, reducing energy consumption and simplifying operation.
It improved filtration efficiency, reduced production costs, increased production efficiency and silicon wafer quality, ensured production stability and safety, reduced equipment failures, and enhanced product competitiveness.
Smart Images

Figure CN223831864U_ABST
Abstract
Description
Technical Field
[0001] This application relates to liquid filtration technology, and more particularly to a filter device and a cutting fluid circulation system applied to the water circulation system of a wire EDM machine. Background Technology
[0002] Solar power generation technology is one of the fastest-growing and most dynamic research fields in recent years. Crystalline silicon cells are one of the important components of solar panels, and their quality is crucial. Typically, a slicing machine is used to slice a square rod to obtain silicon wafers, which are then diced into smaller wafers using a dicing machine to manufacture crystalline silicon cells.
[0003] During the slicing process, the slicing machine uses a cutting line for cutting and sprays cutting fluid onto the cutting area for cooling and also washes away the silicon powder adhering to the cutting line, thereby reducing the amount of silicon powder adhering to the silicon surface and improving the silicon surface quality.
[0004] Taking a slicing machine as an example, the square rod is bonded to the plastic plate with adhesive. During the cutting process, diamond fragments, adhesive powder, and plastic powder on the cutting line enter the cutting fluid and then the circulation system. Furthermore, the sawn silicon powder has a small particle size and high surface energy, which reacts with water in a weakly acidic environment to produce silicic acid and polysilicic acid colloids. These substances adsorb in large quantities, forming flocculent and gel-like substances, which are usually filtered using a mesh screen. However, in actual operation, it has been found that the filtration effect is poor, and the mesh screen needs to be replaced very frequently, seriously affecting the production cycle and reducing production efficiency.
[0005] Moreover, trace amounts of flocculent and gelatinous substances are not easily detected in liquids. By the time they are detected, they have already formed clumps of flocculent substances suspended in the liquid. When these flocculent substances enter the circulation system, they can easily adhere to the cutting line, causing the cutting line to skip grooves, or even causing the cutting line to jam or break, resulting in major production accidents. This not only increases production costs but also reduces production efficiency. Summary of the Invention
[0006] To address one of the aforementioned technical deficiencies, this application provides a filter element and a cutting fluid circulation system for use in the water circulation system of a wire EDM machine.
[0007] According to a first aspect of the embodiments of this application, a filter device for use in a water circulation system of a wire cutting machine is provided, comprising: a tank and a filter layer for filtering out impurities, the filter layer being disposed in the lower space of the tank;
[0008] The tank has a liquid inlet at the top and a liquid outlet at the bottom.
[0009] The tank is also equipped with a backwashing pipeline that extends to the bottom of the filter layer.
[0010] According to a second aspect of the embodiments of this application, a cutting fluid circulation system is provided, including: a waste liquid pool, a raw liquid tank, a filtrate tank, a mixing tank, a finished product tank, and a filter device as described above; the liquid inlet of the waste liquid pool is connected to a slicer, and the waste liquid discharged from the slicer sequentially enters the waste liquid pool, the raw liquid tank, the filtrate tank, the mixing tank, the finished product tank, and the filter device for processing before returning to the slicer.
[0011] The technical solution provided in this application embodiment has a liquid inlet at the top of the tank and a liquid outlet at the bottom. A filter layer for removing impurities is located inside the tank, in the lower space. A backwashing pipeline extends below the filter layer, effectively removing precipitates / flocculations. This solution offers advantages such as low energy consumption, environmental friendliness, and ease of operation. Furthermore, backwashing can remove impurities from the filter layer, restoring its filtration capacity. Attached Figure Description
[0012] The accompanying drawings, which are included to provide a further understanding of this application and form part of this application, illustrate exemplary embodiments and are used to explain this application, but do not constitute an undue limitation of this application. In the drawings:
[0013] Figure 1 This is a schematic diagram of the filter device in the filtering state provided in the embodiments of this application;
[0014] Figure 2 A schematic diagram of the filter device provided in the embodiments of this application in the backwashing state;
[0015] Figure 3 This is a cross-sectional view of the filter layer in the filter device provided in the embodiments of this application;
[0016] Figure 4 This is a schematic diagram of the cutting fluid circulation system provided in an embodiment of this application.
[0017] Figure label:
[0018] 1-Tank body; 11-Liquid inlet; 12-Liquid outlet; 13-Water inlet pipe; 14-Water outlet pipe; 15-Water inlet baffle;
[0019] 2-Filter layer; 21-Biochemical sponge; 22-Filter cotton; 23-Filter ball; 24-Activated carbon;
[0020] 3-Backwashing pipeline; 31-Main flushing pipe; 32-Branch flushing pipe; 33-Valve; 34-Backwashing outlet pipe; 4-Clear water tank. Detailed Implementation
[0021] To make the technical solutions and advantages of the embodiments of this application clearer, the exemplary embodiments of this application will be described in further detail below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not an exhaustive list of all embodiments. It should be noted that, unless otherwise specified, the embodiments and features in the embodiments of this application can be combined with each other.
[0022] This embodiment provides a filter device for the water circulation system of a wire EDM machine. It can contain and filter the cutting fluid, which is supplied to the wire EDM machine through a liquid pipeline to cool the cutting area during operation. The wire EDM machine can be a squaring machine or a slicing machine; this embodiment uses a slicing machine as an example.
[0023] like Figure 1 As shown, the filter device provided in this embodiment includes: a tank body 1 and a filter layer 2 for filtering out impurities. The filter layer 2 is disposed in the lower space inside the tank body 1. A liquid inlet 11 is provided at the upper part of the tank body 1, and a liquid outlet 12 is provided at the bottom of the tank body 1. Liquid enters the tank body 1 through the liquid inlet 11, is filtered by the filter layer 2, and is discharged as clear liquid from the liquid outlet 12 at the bottom. Impurities such as flocculent matter cannot pass through the filter layer 2 and remain above or inside the filter layer 2. The filtered liquid flows downward to the lower part of the tank body 1.
[0024] The tank body 1 is also equipped with a backwash pipe 3, which extends to the bottom of the filter layer 2. After the filter element has been working for a period of time, clean water is flushed into the tank body 1 through the backwash pipe 3. The clean water flows upward from the bottom of the filter layer 2, peeling off the impurities adhering to the surface of the filter layer and carrying them away by the backwash water flow. This helps to remove sediment, suspended solids, etc. from the filter layer 2, allowing it to fully restore its interception capacity and achieve the purpose of cleaning.
[0025] The technical solution provided in this embodiment has a liquid inlet at the top of the tank and a liquid outlet at the bottom. A filter layer for removing impurities is located inside the tank, in the lower space. A backwashing pipeline extends below the filter layer, effectively removing precipitates / flocculations. This solution offers advantages such as low energy consumption, environmental friendliness, and ease of operation. Furthermore, backwashing can remove impurities from the filter layer, restoring its filtration capacity.
[0026] The aforementioned impurities can be amorphous adhesives and crystalline precipitates remaining on the silicon wafer surface, such as resin adhesive or resin board residues, or silicon powder particles. Large amounts of these residues adsorb together to form flocculent matter.
[0027] Based on the above technical solution, the backwashing pipeline 3 includes: a main flushing pipe 31 and a branch flushing pipe 32; one end of the main flushing pipe 31 is fixed to the upper part of the tank body 1, and the other end extends downward through the filter layer 2 to the bottom of the filter layer 2; the branch flushing pipe 32 is located at the bottom of the filter layer 2 and is connected to the main flushing pipe 31.
[0028] Specifically, the main flushing pipe 31 includes an inlet section and a vertical section that are perpendicular to each other. The inlet section enters the tank 1 from the upper part of the side wall of the tank 1 and reaches the middle of the internal space of the tank 1. The top of the vertical section is connected to the inlet section, and the vertical section passes downward through the filter layer 2 and extends to the bottom of the filter layer 2. There are at least two branch flushing pipes 32, both located below the filter layer 2 and connected to the main flushing pipe 31.
[0029] Furthermore, a valve 33 is provided on the branch flushing pipe 32. When in backwashing mode, the valve 33 is opened, and clean water is injected into the tank 1 through the backwashing pipe 3 for backwashing.
[0030] Furthermore, a backwash outlet is provided on the upper side wall of tank 1, which communicates with the internal space of the tank. The backwash outlet is connected to the backwash outlet pipe 34. In the backwash mode, water enters tank 1 from below filter layer 2 and flows upward to rinse filter layer 2. The rinsed water is discharged from the backwash outlet at the top, which can remove impurities that fall off filter layer 2. Figure 1 The arrow shown indicates that the liquid is flowing downwards during filtration. Figure 2 The image shows the backwashing state, with the backwash liquid flowing upwards.
[0031] This embodiment provides a specific implementation method: the tank 1 is made of stainless steel, and the inner surface is provided with a vulcanized rubber layer, which has a corrosion-resistant function and makes it difficult for suspended solids to adhere to the tank wall. The tank volume provided in this embodiment is approximately 38 cubic meters, and the water treatment capacity is (2-10) T / H.
[0032] A liquid inlet 11 is located at the top of the tank body 1 and connected to a water inlet pipe 13. A water inlet baffle 15 is also provided on the inner surface of the top wall of the tank body 1, and the water inlet baffle 15 is inclined to form a water inlet space. Along the top-to-bottom direction, the cross-section of the water inlet space gradually increases, and the top of the water inlet space communicates with the liquid inlet 11. In this embodiment, the water inlet baffle 15 is funnel-shaped, and the liquid entering from the liquid inlet 11 flows downwards along the water inlet baffle 15, reducing the flow of liquid with high impurity content into the upper part of the tank top wall or side wall, thus preventing impurities from remaining on the tank surface.
[0033] Liquid outlet 12 is located at the bottom of tank 1, specifically on the bottom wall of tank 1. Liquid outlet 12 is connected to one end of water outlet pipe 14, and the other end of water outlet pipe 14 is connected to clear water tank 4. Filtered liquid enters clear water tank 4 from water outlet pipe 14. A valve is provided on water outlet pipe 14 to control the discharge of clear water.
[0034] The aforementioned filter layer 2 may include: stacked activated carbon, filter balls, and filter sponges, used to intercept large particles, small particles, and flocculent matter layer by layer. One embodiment is as follows: Figure 3 As shown, the filter sponge includes a biochemical sponge 21 and a filter cotton 22, with the biochemical sponge 21 located on top of the multi-layered filter cotton 22. The filter cotton 22 is placed on top of the filter balls 23, which can be biochemical balls or ceramic balls. The filter balls 23 are placed on top of the activated carbon 24.
[0035] Based on the above technical solutions, this embodiment also provides a cutting fluid circulation system, such as... Figure 4 As shown, the cutting fluid circulation system includes: a waste fluid pool, a raw fluid tank, a filter fluid tank, a mixing tank, a finished product tank, and a filter element provided by any of the above (i.e., Figure 4 The waste liquid tank is connected to the slicer via a sedimentation and filtration tank. Waste liquid discharged from the slicer sequentially enters the waste liquid tank, raw material tank, filtrate tank, mixing tank, finished product tank, and filter components for treatment before being returned to the slicer. The filter components are used to filter the liquid discharged from the finished product tank before it is fed back to the slicer.
[0036] Furthermore, a bag filter is used, installed between the waste liquid tank and the raw liquid tank, to filter the liquid discharged from the waste liquid tank. The bag filter can also be installed between the filter liquid tank and the mixing tank to filter the liquid discharged from the filter liquid tank.
[0037] In addition, a filter press is installed between the raw liquid tank and the filtered liquid tank to filter the liquid discharged from the raw liquid tank.
[0038] The above solution employs multi-stage filtration to improve filtration efficiency, remove as much flocculent material as possible from the liquid discharged from the slicer, improve the cleanliness of the liquid, and then return it to the slicer, which can improve cutting quality and reduce water costs.
[0039] The above solution can improve production efficiency, reduce production costs, improve the quality of silicon wafers cut by the slicing machine, enhance product competitiveness, and also achieve automated control, thereby improving production stability.
[0040] The overflow filtration structure employed in this application enables continuous filtration and purification, improving filtration efficiency. Furthermore, this application utilizes a control device to manage the system's operation, making it more stable and reliable. This improves production efficiency, reduces production costs, ensures silicon wafer quality, enhances product competitiveness, and achieves automated control, thereby increasing production stability.
[0041] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.
[0042] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.
[0043] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a connection that allows communication between them; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication between two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.
[0044] Although preferred embodiments of this application have been described, those skilled in the art, upon learning the basic inventive concept, can make other changes and modifications to these embodiments. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments as well as all changes and modifications falling within the scope of this application.
[0045] Obviously, those skilled in the art can make various modifications and variations to this application without departing from the spirit and scope of this application. Therefore, if such modifications and variations fall within the scope of the claims of this application and their equivalents, this application also intends to include such modifications and variations.
Claims
1. A filter element used in the water circulation system of a wire cutting machine, characterized in that, include: The tank body and the filter layer for removing impurities are located in the lower space of the tank body; The tank has a liquid inlet at the top and a liquid outlet at the bottom; the liquid inlet is located at the top of the tank and is connected to a water inlet pipe. The tank is also equipped with a backwashing pipeline that extends to the bottom of the filter layer. The backwashing pipeline includes a main flushing pipe and a branch flushing pipe. One end of the main flushing pipe is fixed to the upper part of the tank, and the other end extends downward through the filter layer to the bottom of the filter layer. The branch flushing pipe is located at the bottom of the filter layer and is connected to the main flushing pipe.
2. The filter element according to claim 1, characterized in that, A valve is installed on the branch flushing pipe.
3. The filter element according to claim 1, characterized in that, The tank is also equipped with a backwash outlet pipe on its side wall. The backwash outlet pipe is located above the filter layer and is connected to the internal space of the tank.
4. The filter element according to claim 1, characterized in that, The inner surface of the top wall of the tank is also provided with a water inlet baffle, which forms a water inlet space. Along the direction from top to bottom, the cross-section of the water inlet space gradually increases, and the top of the water inlet space is connected to the liquid inlet.
5. The filter element according to claim 1, characterized in that, The liquid outlet is located on the bottom wall of the tank, and the liquid outlet is connected to the clear water tank through a water outlet pipe.
6. The filter element according to claim 1, characterized in that, The filter layer comprises: layered activated carbon, filter balls, and filter sponge.
7. The filter element according to claim 6, characterized in that, The filter sponge includes a biochemical sponge and a filter cotton, with the biochemical sponge located on top of the multi-layer filter cotton; the filter cotton is placed on top of the filter balls, and the filter balls are placed on top of the activated carbon.
8. A cutting fluid circulation system, characterized in that, include: The waste liquid pool, the raw liquid tank, the filtrate tank, the mixing tank, the finished product tank, and the filter element as described in any one of claims 1-7; the liquid inlet of the waste liquid pool is connected to the slicer, and the waste liquid discharged from the slicer sequentially enters the waste liquid pool, the raw liquid tank, the filtrate tank, the mixing tank, the finished product tank and the filter element for treatment before returning to the slicer.
9. The cutting fluid circulation system according to claim 8, characterized in that, Also includes: Bag filters are installed between the waste liquid pool and the raw liquid tank, as well as between the filtered liquid tank and the mixing tank; A filter press is installed between the raw liquid tank and the filtered liquid tank.