Stock liquid ground pool and cutting liquid circulating system applied to wire cutting machine
By incorporating a raw liquid pool with a filtration device and a cutting fluid circulation system into the in-line cutting machine, the problems of pipeline blockage and cutting lines caused by resin residue were solved, achieving efficient cutting fluid filtration, reducing production costs, and improving silicon wafer quality.
Patent Information
- Application Number
- CN202520110933.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-17
- Publication Date
- 2026-01-27
- Estimated Expiration
- 2035-01-17
AI Technical Summary
In wire cutting machines, resin residue or resin board residue can form flocculent material, causing pipe blockage and cutting line problems, which affect cutting efficiency and production costs.
Design a raw fluid pool including a pool body and a filtration device. By setting up a filtration system with filter plates and filters, the cutting fluid can be automatically filtered to reduce impurities and improve the purity of the cutting fluid.
An automatic filtration system effectively removes impurities from the cutting fluid, improving cutting efficiency, reducing production costs, ensuring stable operation of the cutting line, and enhancing silicon wafer quality and production efficiency.
Smart Images
Figure CN223834820U_ABST
Abstract
Description
Technical Field
[0001] This application relates to liquid filtration technology, and more particularly to a raw liquid pool and cutting fluid circulation system for use in wire cutting machines. Background Technology
[0002] Solar power generation technology is one of the fastest-growing and most dynamic research fields in recent years. Crystalline silicon cells are one of the important components of solar panels, and their quality is crucial. Typically, a slicing machine is used to slice a square rod to obtain silicon wafers, which are then diced into smaller wafers using a dicing machine to manufacture crystalline silicon cells.
[0003] During the slicing process, the slicing machine uses a cutting line for cutting and sprays cutting fluid onto the cutting area for cooling and also washes away the silicon powder adhering to the cutting line, thereby reducing the amount of silicon powder adhering to the silicon surface and improving the silicon surface quality.
[0004] Taking a slicing machine as an example, a square rod is bonded to a resin plate, and the feeding mechanism is connected to the resin plate, driving the resin plate to move and causing the square rod to move along the feeding direction for slicing. After slicing, the silicon wafer needs to be debonded and cleaned to remove the resin glue or resin plate adhering to the surface of the silicon wafer. However, in actual production, some resin glue or resin plate remains and cannot be completely cleaned. A small amount of resin residue is generated from each cut, and the resin residue generated from multiple cuts adsorbs together to form flocculent matter, which can easily cause pipeline blockage, resulting in obstructed flow of cutting fluid and thus affecting cutting cooling. Moreover, if the clumps of flocculent matter flow with the cutting fluid, they can easily adhere to the cutting wire, causing the cutting wire to skip, get stuck, or even break, which can easily cause major production problems, not only increasing production costs but also affecting production cycle time and reducing production efficiency. Summary of the Invention
[0005] To address one of the aforementioned technical deficiencies, this application provides a raw fluid pool and cutting fluid circulation system for use in wire cutting machines.
[0006] According to a first aspect of the embodiments of this application, a raw material pool for a wire cutting machine is provided, comprising: a pool body and a filtration device disposed within the pool body; the filtration device includes:
[0007] There are at least two filter plates, with a water passage formed between each filter plate and the filter plate adjacent to it on one side, and a filter channel formed between each filter plate and the filter plate adjacent to it on the other side. The filter channel is connected to the water passage; a filter layer is provided inside the filter channel.
[0008] According to a second aspect of the embodiments of this application, a cutting fluid circulation system is provided, comprising: a raw fluid tank, a filter press system, and a finished product tank. The raw fluid tank is used to receive the cutting fluid discharged from the wire cutting machine, the finished product tank is used to supply cutting fluid to the wire cutting machine, and the filter press system is located between the raw fluid tank and the finished product tank. The raw fluid tank is the raw fluid tank applied to the wire cutting machine as described above.
[0009] The technical solution provided in this application embodiment includes a filtration device installed in the pool body. The filtration device includes at least two filter plates, with a water passage formed between the filter plates and the filter plates adjacent to each other on one side, and a filtration channel formed between the filter plates and the filter plates adjacent to each other on the other side. The filtration channel is connected to the water passage. A filter layer is provided inside the filtration channel. The pool water is automatically drawn into the water passage and then filtered through the filter layer in the filtration channel to remove impurities from the pool water. This reduces the impurity content of the liquid circulating into the wire cutting machine, which is beneficial for improving cutting efficiency and reducing production costs. Attached Figure Description
[0010] The accompanying drawings, which are included to provide a further understanding of this application and form part of this application, illustrate exemplary embodiments and are used to explain this application, but do not constitute an undue limitation of this application. In the drawings:
[0011] Figure 1 This is a schematic diagram of the raw solution tank for a wire EDM machine provided in an embodiment of this application;
[0012] Figure 2 This is a schematic diagram of the cutting fluid circulation system provided in an embodiment of this application.
[0013] Figure label:
[0014] 1-Pool body;
[0015] 2-Filter device; 21-Filter plate; 22-Water passage; 23-Filter channel; 24-Filter layer. Detailed Implementation
[0016] To make the technical solutions and advantages of the embodiments of this application clearer, the exemplary embodiments of this application will be described in further detail below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not an exhaustive list of all embodiments. It should be noted that, unless otherwise specified, the embodiments and features in the embodiments of this application can be combined with each other.
[0017] This embodiment provides a raw material tank for a wire EDM machine, which can receive the cutting fluid discharged from the machine, process it, and then supply it to the machine for recycling, thereby cooling the cutting area during the operation of the wire EDM machine. The wire EDM machine can be a squaring machine or a slicing machine; this embodiment only uses a slicing machine as an example.
[0018] like Figure 1 As shown, this embodiment provides a raw material pool for a wire EDM machine, including: a pool body 1 and a filter device 2. The cutting fluid discharged from the wire EDM machine enters the pool body 1.
[0019] A filter device 2 is installed inside the pool body 1 and includes at least two filter plates 21. There are multiple filter plates 21, employing methods such as... Figure 1 The combination shown is as follows: a filter plate 21 is close to the filter plate 21 on one side to form a water passage 22, and a filter channel 23 is formed between the filter plate 21 on the other side. The filter channel 23 is connected to the water passage 22, and a filter layer 24 is provided in the filter channel 23.
[0020] The water level in the raw solution tank is high, creating a pressure difference on both sides of the filter plate. The tank water is automatically drawn into the water passage 22 and then into the filter channel 23, where it is filtered through the filter layer 24. Afterward, the tank water is discharged from the other side of the filter device 2 into the tank body 1, thus achieving the filtration of the tank water.
[0021] One solution involves dividing the internal space of pool 1 into two parts using a filtration device 2. One part of the pool water enters the filtration device 2, while the water discharged from the filtration device 2 enters the other part of pool 1, thus separating the unfiltered pool water from the filtered pool water. This solution enables automatic filtration and consumes almost no energy.
[0022] Alternatively, a liquid pump can be installed at the liquid outlet of the filter device 2 to immediately pump the water discharged from the pool into the storage tank at the rear.
[0023] The technical solution provided in this embodiment includes a filtration device installed in the pool. The filtration device includes at least two filter plates, with a water passage formed between each filter plate and an adjacent filter plate on one side, and a filtration channel formed between each filter plate and an adjacent filter plate on the other side. The filtration channel is connected to the water passage. A filter layer is provided inside the filtration channel. The pool water is automatically drawn into the water passage and then filtered through the filter layer in the filtration channel to remove impurities from the pool water. This reduces the impurity content of the liquid circulating into the wire cutting machine, which helps to improve cutting efficiency and reduce production costs.
[0024] One specific scheme: Of the two filter plates 21 forming the water passage 22, the filter plate 21 located at the front end in the liquid flow direction is the first filter plate 21a, and a gap is left between the bottom of the first filter plate 21a and the bottom wall of the pool body 1. The filter plate 21 located at the rear end in the liquid flow direction is the second filter plate 21b, and the pool water enters the water passage through the gap at the bottom of the first filter plate 21a. Furthermore, a pressure difference is formed between the water passage and the pool water in the original liquid pool, causing the pool water to continuously enter the water passage.
[0025] The bottom of the second filter plate 21b is sealed to the bottom wall of the pool body 1, and the top of the second filter plate 21b is lower than the top of the first filter plate 21a, so that the pool water passes over the top of the second filter plate 21b and enters the filter channel 23.
[0026] The two filter plates 21 are arranged in parallel and at a certain distance to achieve capillary water absorption.
[0027] The two filter plates 21 that form the filtration channel can also be set in parallel to ensure that the water in the pool flows at a uniform speed in the filtration channel and improve the filtration quality.
[0028] This embodiment provides a specific solution: each filter plate 21 is vertically arranged, and at least two water passages 22 and / or at least two filtration channels 23 can be formed between each filter plate 21 according to the above solution.
[0029] The liquid inlet and liquid outlet of the filter device 2 can be located at the top or bottom of the filter device 2. For example, a gap is left between the bottom end of the outermost filter plate 21 of the filter device 2 and the bottom wall of the pool body 1 so that the pool water enters the filter device 2 from the bottom end of the outermost filter plate 21 and is discharged from the bottom of the other side of the filter device 2.
[0030] In the two filter plates 21 forming the filter channel 23, the filter layer 24 is disposed between the middle of the two filter plates 21. Specifically, along the liquid flow direction, the filter layer 24 is located between the preceding second filter plate 21b and the following first filter plate 21a.
[0031] Figure 1 The diagram shows two water passages 22 and two filter channels 23, which consist of five filter plates 21. Figure 1 For illustrative purposes only, the number of water passages 22 is not limited to two; it can be one, three, or more than three. The number of filter channels 23 is not limited to two; it can be one, three, or more than three.
[0032] The aforementioned impurities can be amorphous adhesives and crystalline precipitates remaining on the surface of the silicon wafer, such as resin adhesives or resin board residues, or silicon powder particles and other substances.
[0033] The above solution achieves a water treatment rate of (10-50) t / h. The number of filter plates can be adjusted according to water quality and the type of impurities. Water from the underground tank passes sequentially through the water passage and the filtration passage, with impurities remaining on the filter plates or filter layers. The filtered water is then pumped directly into the raw material tank. Both the filter plates and filter layers can be disassembled for cleaning to improve filtration efficiency.
[0034] Based on the above technical solutions, this embodiment also provides a cutting fluid circulation system, including: a raw fluid pool, a filter press system, and a finished product tank. The raw fluid pool is used to receive the cutting fluid discharged from the wire cutting machine, the finished product tank is used to supply cutting fluid to the wire cutting machine, and the filter press system is located between the raw fluid pool and the finished product tank. The raw fluid pool is any of the raw fluid pools provided above.
[0035] The cutting fluid circulation system supplies cutting fluid to the wire EDM machine for cooling and rinsing. The cutting fluid discharged from the wire EDM machine enters the raw fluid tank for preliminary filtration and sedimentation. The filtered cutting fluid in the raw fluid tank then enters the pressure filter system for further filtration to remove impurities. The filtered liquid enters the finished product tank, and the liquid in the finished product tank is then supplied to the wire EDM machine for reuse.
[0036] The cutting fluid circulation system can supply cutting fluid to multiple wire EDM machines simultaneously, achieving large-scale fluid circulation.
[0037] Based on the above technical solution, the cutting fluid circulation system also includes: a mixing tank, and the cutting fluid discharged from the mixing tank enters the finished product tank.
[0038] Furthermore, a raw liquid tank is used, which is located between the raw liquid pool and the filter press system.
[0039] like Figure 2 As shown, assuming the wire EDM machine is a slicing machine, one implementation of the cutting fluid circulation system includes a raw fluid pool, a raw fluid tank, a filter press system, a mixing tank, a finished product tank, and a sedimentation filter tank. The cutting waste fluid from the slicing machine enters the raw fluid pool for preliminary filtration. If the liquid discharged from the raw fluid pool still contains a significant amount of impurities, it first enters the raw fluid tank for filtration, then enters the filter press system for further filtration before entering the mixing tank, or it can directly enter the mixing tank. If the liquid discharged from the raw fluid pool contains fewer impurities, it directly enters the mixing tank. The liquid in the mixing tank enters the finished product tank, then passes through the sedimentation filter tank before returning to the slicing machine, achieving liquid circulation outside the slicing machine. This scheme can simultaneously supply cutting fluid to multiple slicing machines.
[0040] The liquid in the raw material tank can be directly fed into the mixing tank, or the liquid in the raw material tank can be directly fed into the mixing tank. This can reduce the frequency of use of the filter press system, thereby reducing the frequency of replacement of the filter elements in the filter press system and reducing production costs.
[0041] The above solution can reduce the impurity content in the cutting fluid entering the wire EDM machine, improve production efficiency, reduce production costs, improve the quality of silicon wafers cut by the slicing machine, enhance product competitiveness, and also achieve automated control, thereby improving production stability.
[0042] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.
[0043] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.
[0044] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a connection that allows communication between them; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication between two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.
[0045] Although preferred embodiments of this application have been described, those skilled in the art, upon learning the basic inventive concept, can make other changes and modifications to these embodiments. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments as well as all changes and modifications falling within the scope of this application.
[0046] Obviously, those skilled in the art can make various modifications and variations to this application without departing from the spirit and scope of this application. Therefore, if such modifications and variations fall within the scope of the claims of this application and their equivalents, this application also intends to include such modifications and variations.
Claims
1. A raw material pool for use in wire cutting machines, characterized in that, include: The pool body and the filtration device installed inside the pool body; The filtration device includes: There are at least two filter plates, with a water passage formed between each filter plate and the filter plate adjacent to it on one side, and a filter channel formed between each filter plate and the filter plate adjacent to it on the other side. The filter channel is connected to the water passage; a filter layer is provided inside the filter channel.
2. The raw material pool according to claim 1, characterized in that, Of the two filter plates that form the water passage, the filter plate located at the front end in the direction of liquid flow is the first filter plate, and there is a gap between the bottom of the first filter plate and the bottom wall of the pool; the filter plate located at the rear end in the direction of liquid flow is the second filter plate, and a water passage is formed between the second filter plate and the first filter plate.
3. The raw material pool according to claim 2, characterized in that, The top of the second filter plate is lower than the top of the first filter plate.
4. The raw material pool according to any one of claims 1-3, characterized in that, The filter plates are arranged in parallel.
5. The raw material pool according to claim 4, characterized in that, Each filter plate is installed vertically.
6. The raw material pool according to claim 5, characterized in that, There is a gap between the bottom of the filter plate located on the outermost side of the filtration device and the bottom wall of the pool.
7. The raw material pool according to claim 1, characterized in that, In the two filter plates that form the filter channel, the filter layer is located between the middle of the two filter plates.
8. The raw material pool according to claim 1, characterized in that, Also includes: A liquid pump is installed at the liquid outlet end of the filtration device.
9. A cutting fluid circulation system, characterized in that, include: The system comprises a raw fluid tank, a filter press system, and a finished product tank. The raw fluid tank is used to receive the cutting fluid discharged from the wire EDM machine, the finished product tank is used to supply cutting fluid to the wire EDM machine, and the filter press system is located between the raw fluid tank and the finished product tank. The raw fluid tank is the raw fluid tank applied to the wire EDM machine as described in any one of claims 1-8.
10. The cutting fluid circulation system according to claim 9, characterized in that, Also includes: The cutting fluid discharged from the mixing tank enters the finished product tank.