Etching device suitable for glass strengthening

Abstract

The utility model belongs to the technical field of glass strengthening, and particularly relates to an etching device suitable for glass strengthening. The utility model discloses an etching device suitable for glass strengthening. The etching device comprises an etching protection mechanism and a spacing mechanism connected with the etching protection mechanism, the first spacing plates are arranged in a stacked mode, gaps are reserved between the first spacing plates and used for containing glass, the second spacing plates are arranged in a stacked mode, gaps are reserved between the second spacing plates and used for containing glass, and etching liquid can flow in and flow out through the first through holes and the second through holes, so that it is ensured that the etching liquid can circularly flow in the space; therefore, a uniform etching effect is realized.

Description

Technical Field

[0001] This utility model belongs to the field of glass strengthening technology. Specifically, this utility model relates to an etching device suitable for glass strengthening. Background Technology

[0002] Flexible glass is an indispensable material for foldable screen phones today. Its characteristics include thinness, high flexibility, high hardness, scratch resistance, no creases when bent, and a good tactile feel. Compared to the first-generation foldable screens that used CPI as the cover material, ultra-thin flexible glass has been upgraded in every aspect and can withstand hundreds of thousands of folds without damage, resulting in a longer lifespan.

[0003] Foldable screens need to meet strong bending requirements to ensure stability and prevent breakage during use. However, due to the inherent micro-cracks on the edges of the ultra-thin glass after cutting, the glass will extend inward along the broken edge during bending, causing it to crack, meaning the glass's strength cannot be guaranteed. Currently, etching solutions are used to treat the glass edges, eliminating these micro-cracks, which greatly improves the glass's bending performance and meets the requirements. In traditional tempered glass manufacturing, tempered glass is immersed in an etching solution after cutting, typically hydrofluoric acid. Because hydrofluoric acid is highly corrosive, it requires careful handling and has low safety. Furthermore, when multiple pieces of tempered glass are placed in the etching bath together, they are prone to collisions, causing edge breakage. Therefore, only one piece can be etched at a time, resulting in low etching efficiency.

[0004] Chinese patent (publication number: 221797311U) discloses a flexible glass strengthening loading fixture. This fixture uses a bracket in conjunction with a bottom support assembly and a top support assembly to position and fix the flexible glass, ensuring that it is not obstructed during chemical strengthening of the flexible glass and preventing secondary strengthening. However, collisions may occur between the glass pieces, affecting the glass etching effect. Utility Model Content

[0005] This utility model is designed to solve the aforementioned problems. Its purpose is to provide a glass strengthening etching device that is simple and compact in structure, occupies little space, is easy and flexible to operate, avoids collisions between glass panes, and improves etching efficiency. To achieve the above objective, the technical solution adopted by this utility model is as follows:

[0006] This invention provides an etching apparatus suitable for glass strengthening, including an etching protection mechanism and a spacer mechanism connected to the etching protection mechanism.

[0007] The etching protection mechanism includes a base plate, a first protection plate connected to one side of the base plate, a second protection plate connected to the other side of the base plate, a third protection plate connected to one end of the base plate, the third protection plate being connected to the first and second protection plates, and a fourth protection plate connected to the other end of the base plate, the fourth protection plate being connected to the first and second protection plates.

[0008] The spacing mechanism includes a first spacing plate and a second spacing plate. One end of the first spacing plate is connected to a first protective plate, and the other end of the first spacing plate is connected to a connecting plate. The connecting plate is connected to a base plate. One end of the second spacing plate is connected to the connecting plate, and the other end of the second spacing plate is connected to a second protective plate. The first spacing plates are stacked, and the second spacing plates are stacked.

[0009] The first spacer plate is arranged symmetrically with respect to the central axis of the connecting plate, and the second spacer plate is arranged symmetrically with respect to the central axis of the connecting plate.

[0010] Silicone plugs are provided on the first spacer and the second spacer.

[0011] The first and second partitions are right-angled stepped structures.

[0012] The third protective plate has a first through hole, and the fourth protective plate has a second through hole.

[0013] A first support rod is provided between the first protective plate and the connecting plate, and the first partition plate abuts against the first support rod. A second support rod is provided between the second protective plate and the connecting plate, and the second support rod abuts against the second partition plate.

[0014] The first support rod is circumferentially arranged, and the second support rod is circumferentially arranged.

[0015] The third protective plate is connected to the first baffle and the second baffle at both ends, and the fourth protective plate is connected to the third baffle and the fourth baffle at both ends.

[0016] The technical advantages of this invention are as follows: The base plate, made of corrosion-resistant material, is the fundamental component of the etching protection mechanism. It provides support for the entire device, and its design ensures the stability of the entire device while withstanding pressure from all directions during the etching process. The first and second protective plates are fixed to both sides of the base plate, forming right angles with it. The main function of these two protective plates is to limit the lateral diffusion of the etching solution, ensuring that it only acts on the target area. The third and fourth protective plates are fixed to both ends of the base plate, connecting to the first and second protective plates to firmly secure them. The third and fourth protective plates each have a first through hole and a second through hole. These through holes allow the etching solution to flow in and out, ensuring that it circulates within the space, thus achieving a uniform etching effect. The first spacers are stacked, with gaps between them, for placing glass. The second spacers are also stacked, with gaps between them, for placing glass. The symmetrical arrangement of the first and second spacers provides more space for placing glass. Attached Figure Description

[0017] This manual includes the following figures, which illustrate the following:

[0018] Figure 1 This is a schematic diagram of the overall structure of an etching device suitable for glass strengthening according to this utility model;

[0019] Figure 2 This is a schematic cross-sectional view of the first spacer plate of an etching device suitable for glass strengthening according to this utility model;

[0020] Figure 3 This is a schematic cross-sectional view of the second spacer plate of an etching device for glass strengthening according to this utility model.

[0021] The markings in the diagram are as follows: 1. Protection mechanism; 101. Base plate; 102. First protection plate; 103. Second protection plate; 104. Third protection plate; 105. Fourth protection plate; 106. First through hole; 107. Second through hole; 2. Etching protection mechanism; 201. First spacer plate; 202. Second spacer plate; 203. Connecting plate; 3. Silicone plug; 4. First support rod; 5. Second support rod; 6. First partition plate; 7. Second partition plate; 8. Third partition plate; 9. Fourth partition plate. Detailed Implementation

[0022] The specific embodiments of the present invention will be further described in detail below with reference to the accompanying drawings, in order to help those skilled in the art to have a more complete, accurate and in-depth understanding of the inventive concept and technical solution of the present invention, and to facilitate its implementation.

[0023] like Figures 1-3 As shown, an etching apparatus suitable for glass strengthening includes an etching protection mechanism 1 and a spacer mechanism 2 connected to the etching protection mechanism 1. The etching protection mechanism 1 is the core component of the entire apparatus, and its main function is to provide a safe etching environment for the glass, preventing the etching solution from damaging areas outside the glass. It also protects the operator from injury.

[0024] The etching protection mechanism 1 includes a base plate 101. A first protective plate 102 is connected to one side of the base plate 101, a second protective plate 103 is connected to the other side, a third protective plate 104 is connected to one end of the base plate 101, and the third protective plate 104 is connected to the first protective plate 102 and the second protective plate 103. A fourth protective plate 105 is connected to the other end of the base plate 101, and the fourth protective plate 105 is connected to the first protective plate 102 and the second protective plate 103. The base plate 101 is the fundamental component of the etching protection mechanism 1 and is made of corrosion-resistant material. It provides support for the entire device, and its design ensures the stability of the entire device and withstands pressure from all directions during the etching process. The first protective plate 102 and the second protective plate 103 are fixed to both sides of the base plate 101, forming right angles with the base plate 101. The main function of these two protective plates is to limit the lateral diffusion of the etching solution, ensuring that the etching solution only acts on the target area. The third protective plate 104 and the fourth protective plate 105 are fixed to both ends of the base plate 101, respectively, and connected to the first protective plate 102 and the second protective plate 103, firmly fixing the first protective plate 102 and the second protective plate 103. The third protective plate 104 and the fourth protective plate 105 are respectively provided with a first through hole 106 and a second through hole 107. The function of these through holes is to allow the etching solution to flow in and out, ensuring that the etching solution can circulate in the space, thereby achieving a uniform etching effect.

[0025] The spacer mechanism 2 includes a first spacer plate 201 and a second spacer plate 202. One end of the first spacer plate 201 is connected to the first protective plate 102, and the other end of the first spacer plate 201 is connected to a connecting plate 203. The first spacer plates 201 are stacked together, with gaps between them for placing glass. The connecting plate 203 is connected to the base plate 101. One end of the second spacer plate 202 is connected to the connecting plate 203, and the other end of the second spacer plate 202 is connected to the second protective plate 103. The second spacer plates 202 are stacked together, with gaps between them for placing glass.

[0026] The first partition 201 is symmetrically arranged with respect to the central axis of the connecting plate 203, and the second partition 202 is also symmetrically arranged with respect to the central axis of the connecting plate 203. The symmetrical arrangement of the first partition 201 provides more space for placing glass; the symmetrical arrangement of the second partition 202 also provides more space for placing glass.

[0027] Silicone sealant 3 is provided on the first spacer 201 and the second spacer 202. The silicone sealant 3 itself is corrosion resistant, and at the same time, the silicone sealant 3 can prevent the glass from being scratched by the first spacer 201 and the second spacer 202.

[0028] The first partition 201 and the second partition 202 are right-angled stepped structures. Setting the first partition 201 as a right-angled stepped structure makes the gap between the first partitions 201 smoother and allows for a better match with the glass shape. Similarly, setting the second partition 202 as a right-angled stepped structure makes the gap between the second partitions 202 smoother and allows for a better match with the glass shape.

[0029] The third protective plate 104 has a first through hole 106, and the fourth protective plate 105 has a second through hole 107. The first through hole 106 and the second through hole 107 allow the etching solution to flow in and out, ensuring that the etching solution can circulate within the space, thereby achieving a uniform etching effect.

[0030] A first support rod 4 is provided between the first protective plate 102 and the connecting plate 203. The first partition plate 201 abuts against the first support rod 4. The first support rod 4 is used for limiting the space between different first partition plates 201, ensuring that the glass can be placed within the gap. A second support rod 5 is provided between the second protective plate 103 and the connecting plate 203. The second support rod 5 abuts against the second partition plate 202. The second support rod 5 is used for limiting the space between different second partition plates 202, ensuring that the glass can be placed within the gap.

[0031] The first support rod 4 is arranged in a circle. Since the first partition plate 201 is symmetrically arranged, multiple first support rods 4 are required for limiting. Since the second partition plate 202 is symmetrically arranged, multiple second support rods 5 are required for limiting.

[0032] The third protective plate 104 has a first baffle plate 6 and a second baffle plate 7 connected to its two ends, respectively. The first baffle plate 6 is located on one side of one end of the third protective plate 104, and the second baffle plate 7 is located on the other side of the other end of the third protective plate 104. The fourth protective plate 105 has a third baffle plate 8 and a fourth baffle plate 9 connected to its two ends, respectively. The third baffle plate 8 is located on one side of one end of the fourth protective plate 105, and the fourth baffle plate 9 is located on the other side of the other end of the fourth protective plate 105. In this glass strengthening etching apparatus, when stacked, the first baffle plate 6 and the second baffle plate 7 are mutually fixed and mutually restrained, as are the third baffle plate 8 and the fourth baffle plate 9.

[0033] The role and effect of the embodiments

[0034] The base plate 101 is the fundamental component of the etching protection mechanism 1 and is made of corrosion-resistant material. It provides support for the entire device, and its design ensures the stability of the entire device while withstanding pressure from all directions during the etching process. The first protective plate 102 and the second protective plate 103 are fixed to both sides of the base plate 101, forming right angles with it. The main function of these two protective plates is to limit the lateral diffusion of the etching solution, ensuring that the etching solution only acts on the target area. The third protective plate 104 and the fourth protective plate 105 are fixed to both ends of the base plate 101, connecting to the first protective plate 102 and the second protective plate 103, firmly securing them. The third protective plate 104 and the fourth protective plate 105 each have a first through hole 106 and a second through hole 107. These through-holes allow the etching solution to flow in and out, ensuring its circulation within the space and achieving a uniform etching effect. First spacer plates 201 are stacked with gaps between them for placing glass. Second spacer plates 202 are also stacked with gaps between them for placing glass. Symmetrically arranging the first spacer plates 201 and second spacer plates 202 provides more space for placing glass.

[0035] The present invention has been described above by way of example with reference to the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-described manner. Any non-substantial improvements made using the inventive concept and technical solution of the present invention; or the direct application of the inventive concept and technical solution to other situations without modification, are all within the protection scope of the present invention.

Claims

1. An etching apparatus suitable for glass strengthening, characterized in that, It includes an etching protection mechanism (1) and a spacer mechanism (2) connected to the etching protection mechanism (1).

2. The etching apparatus for glass strengthening according to claim 1, characterized in that: The etching protection mechanism (1) includes a base plate (101), a first protection plate (102) is connected to one side of the base plate (101), a second protection plate (103) is connected to the other side of the base plate (101), a third protection plate (104) is connected to one end of the base plate (101), the third protection plate (104) is connected to the first protection plate (102) and the second protection plate (103), and a fourth protection plate (105) is connected to the other end of the base plate (101), the fourth protection plate (105) is connected to the first protection plate (102) and the second protection plate (103).

3. The etching apparatus for glass strengthening according to claim 1, characterized in that: The spacing mechanism (2) includes a first spacing plate (201) and a second spacing plate (202). One end of the first spacing plate (201) is connected to the first protective plate (102), and the other end of the first spacing plate (201) is connected to a connecting plate (203). The connecting plate (203) is connected to the bottom plate (101). One end of the second spacing plate (202) is connected to the connecting plate (203), and the other end of the second spacing plate (202) is connected to the second protective plate (103). The first spacing plates (201) are stacked, and the second spacing plates (202) are stacked.

4. An etching apparatus suitable for glass strengthening according to claim 3, characterized in that: The first partition plate (201) is symmetrically arranged with respect to the central axis of the connecting plate (203), and the second partition plate (202) is symmetrically arranged with respect to the central axis of the connecting plate (203).

5. An etching apparatus suitable for glass strengthening according to claim 3, characterized in that: Silicone plugs (3) are provided on the first spacer (201) and the second spacer (202).

6. An etching apparatus suitable for glass strengthening according to claim 3, characterized in that: The first partition (201) and the second partition (202) are right-angled stepped structures.

7. An etching apparatus suitable for glass strengthening according to claim 2, characterized in that: The third protective plate (104) has a first through hole (106), and the fourth protective plate (105) has a second through hole (107).

8. An etching apparatus suitable for glass strengthening according to claim 3, characterized in that: A first support rod (4) is provided between the first protective plate (102) and the connecting plate (203), and the first partition plate (201) abuts against the first support rod (4). A second support rod (5) is provided between the second protective plate (103) and the connecting plate (203), and the second support rod (5) abuts against the second partition plate (202).

9. An etching apparatus suitable for glass strengthening according to claim 8, characterized in that: The first support rod (4) is arranged in a circle, and the second support rod (5) is arranged in a circle.

10. An etching apparatus suitable for glass strengthening according to claim 2, characterized in that: The third protective plate (104) is connected to the first baffle (6) and the second baffle (7) at both ends, and the fourth protective plate (105) is connected to the third baffle (8) and the fourth baffle (9) at both ends.

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