Ring-shaped semiconductor sintering kiln furniture capable of being repeatedly used

Abstract

The utility model discloses an annular semiconductor sintering kiln furniture capable of being repeatedly used, which belongs to the field of annular semiconductor sintering kiln furniture and comprises a fixed base, an air hole, a limiting groove, a customized height block and a product body. When in use, the product body is flatly placed on the customized height block and is sintered at a high temperature by the high-temperature sintering furnace, and high temperature can penetrate through the air holes to be in contact with the product body, so that the product body can be more comprehensively sintered at the high temperature, and meanwhile, the product body can contract and move in the high-temperature sintering process; the product body shrinks and moves to drive the customized height block to move in the limiting groove, the shrinkage amount is provided for the product body, and the shrinkage amount of the product body is 22.3056%. Compared with the prior art, the planeness is more precise, the quality of produced product bodies is better, the fixed base can be repeatedly used and can be rapidly applied to product bodies of different sizes, the production cost is saved, and the production period is shortened.

Description

Technical Field

[0001] This utility model relates to the field of ring semiconductor sintering kiln furniture, and in particular to a reusable ring semiconductor sintering kiln furniture. Background Technology

[0002] Because the materials and parts used in the manufacturing processes of semiconductors, chips, and equipment are mostly ring-shaped or round, kiln furniture is widely used in high-temperature sintering of ceramics. Due to the shrinkage inherent in high-temperature ceramic sintering, a new green kiln furniture is required for each product, resulting in extremely high costs. Semiconductor equipment manufacturing places very high demands on the density, corrosion resistance, material consistency, and wear resistance of ceramic and precious metal parts. High-temperature sintering in the forming of ceramic and precious metal blanks determines the finished product's performance, yield, and production cycle. Therefore, the early manufacturing of ceramic and precious metal parts requires well-prepared sintering kiln furniture to improve the stability of the forming process. For example, the plasma etching chamber of semiconductor etching equipment is located in a high-density, highly corrosive, and highly reactive plasma environment. The chamber and its components are highly susceptible to plasma corrosion. To extend the service life of these components, it is often necessary to achieve good density and stability during the processing of aluminum-based materials (aluminum and aluminum alloys). Further surface treatments such as anodizing and ceramic spraying are then used to effectively reduce the corrosion of the chamber and other aluminum-based materials by the plasma.

[0003] As semiconductor manufacturing requirements continue to increase, the processing requirements before and after part forming become more stringent. For special cavity parts, the integrity and consistency of product materials are crucial. Each existing ring semiconductor product requires a disposable ceramic kiln furniture with the same shape and size as the product. The production of the kiln furniture requires processes such as pressing, isostatic pressing, and molding. Usually, the production cycle of a large kiln furniture is longer than that of a single product, which affects production efficiency and cost. Furthermore, since newly made disposable kiln furniture is formed from powder, it cannot be finely ground, which has a certain impact on product quality. Utility Model Content

[0004] The purpose of this invention is to solve the problems mentioned in the background art by designing a reusable ring semiconductor sintering kiln tool.

[0005] To achieve the above objectives, the technical solution of this utility model is as follows: a reusable sintering kiln for ring semiconductors, comprising a fixed base, a vent hole, a limiting groove, a customized height block, and a product body. The fixed base is circular in shape and has a vent hole at its center. The vent hole is circular in shape and has the same axis as the fixed base. The fixed base has multiple limiting grooves, which are equidistantly distributed on the upper side of the fixed base. The limiting grooves are isosceles trapezoids in shape, with their short sides facing the center of the fixed base and their long sides facing the circumference of the fixed base. The customized height blocks are isosceles trapezoids in shape, and each customized height block is placed in one limiting groove. The product body is placed on the multiple customized height blocks.

[0006] Furthermore, the fixed base and the customized height block are made of high-purity alumina high-temperature resistant material.

[0007] Furthermore, both the customized height block and the limiting groove are isosceles trapezoids, and the size of the customized height block is smaller than the size of the limiting groove. The longer side of the isosceles trapezoid of the customized height block is larger than the shorter side of the isosceles trapezoid of the limiting groove.

[0008] Furthermore, the thickness of the customized height block is greater than the depth of the limiting groove.

[0009] Furthermore, the outermost diameter of the fixed base is larger than the maximum diameter of the product body.

[0010] Beneficial effects:

[0011] This invention provides a reusable sintering kiln furniture for ring semiconductors, which has the following advantages: In this invention, the fixed base and the customized height block are precision ground to a flatness of 0.005. The level of the product body is crucial in the sintering process; therefore, the product body produced by this invention has superior quality. In use, the fixed base is first placed in the high-temperature sintering furnace. Then, a suitable customized height block is selected according to the size of the product body. The optimal fit is one that allows sufficient space for the high temperature to penetrate the product surface. The customized height blocks are then placed sequentially in the limiting grooves, and the processed product body is placed flat on the customized height blocks for high-temperature sintering in the high-temperature sintering furnace. During high-temperature sintering, the high temperature can penetrate the vent hole in the center of the fixed base and contact the product body, allowing for more comprehensive high-temperature sintering. Simultaneously, the product body will shrink and move during high-temperature sintering, which will cause the customized height block to move within the limiting groove, providing the shrinkage amount for the product body. The shrinkage amount of the product body is 22.3056%. Compared with the existing technology, the flatness of this utility model is more precise, the quality of the produced product body is better, and the fixed base can be repeatedly used in high-temperature sintering furnace as a fixed sintering base for ceramic products. It can also be quickly applied to product bodies of different sizes, saving production costs and reducing the production cycle. Attached Figure Description

[0012] Figure 1 This is a schematic diagram of the structure of a reusable annular semiconductor sintering kiln tool according to the present invention;

[0013] Figure 2 This is an exploded structural diagram of a reusable annular semiconductor sintering kiln tool according to the present invention;

[0014] Figure 3 This is a top view schematic diagram of the reusable ring semiconductor sintering kiln furniture described in this utility model;

[0015] Figure 4 This is a side view of the reusable ring semiconductor sintering kiln furniture described in this utility model.

[0016] In the diagram, 1. Fixed base; 2. Ventilation hole; 3. Limiting groove; 4. Custom height block; 5. Product body. Detailed Implementation

[0017] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0018] In the description of this utility model, it should be noted that the terms "upper / lower end," "inner," "outer," "front end," "rear end," "both ends," "one end," and "the other end," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this utility model and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0019] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "set / set up," "sleeve," "connection," etc., should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0020] Please see Figure 1-4 This utility model provides a technical solution: a reusable sintering kiln for annular semiconductors, including a fixed base 1, a vent 2, a limiting groove 3, a customized height block 4, and a product body 5. The fixed base 1 is circular in shape and has a vent 2 at its center. The vent 2 is circular in shape and has the same axis as the fixed base 1. The fixed base 1 has multiple limiting grooves 3, which are equidistantly distributed on the upper side of the fixed base 1. The limiting grooves 3 are isosceles trapezoids in shape, with the short side facing the center of the fixed base 1 and the long side facing the circumference of the fixed base 1. The customized height block 4 is isosceles trapezoidal in shape, and each customized height block 4 is placed in a limiting groove 3. The product body 5 is placed on multiple customized height blocks 4.

[0021] In this utility model, the fixed base 1 and the customized height block 4 are made of high-purity alumina high-temperature resistant material. High-purity alumina high-temperature resistant material has excellent heat resistance, low thermal conductivity and good chemical stability, and can be better used as sintering kiln furniture for repeated use.

[0022] In this utility model, both the customized height block 4 and the limiting groove 3 are isosceles trapezoids, and the size of the customized height block 4 is smaller than the size of the limiting groove 3. The long side of the isosceles trapezoid of the customized height block 4 is larger than the short side of the isosceles trapezoid of the limiting groove 3, so as to prevent the product body 5 from shrinking and moving during high-temperature sintering, causing the customized height block 4 to detach from the limiting groove 3.

[0023] In this invention, the thickness of the customized height block 4 is greater than the depth of the limiting groove 3, so that there is enough space to allow the high temperature to penetrate into the bottom surface of the product body 5 during the high-temperature sintering process.

[0024] In this invention, the outermost diameter of the fixed base 1 is larger than the maximum diameter of the product body 5, to prevent the product body 5 from being unable to be placed on the fixed base 1.

[0025] In this embodiment: the fixed base 1 and the customized height block 4 are machined by a precision grinding machine, and the flatness can reach 0.005. In the sintering process, the level of the product body 5 is very important. Therefore, the product body produced by this utility model has better quality. The fixed base 1 and the customized height block 4 are made of high-purity alumina high-temperature resistant material. High-purity alumina high-temperature resistant material has excellent heat resistance, low thermal conductivity and good chemical stability, and can be better reused as sintering kiln furniture.

[0026] In use, first place the fixed base 1 in the high-temperature sintering furnace. The outermost diameter of the fixed base 1 needs to be larger than the maximum diameter of the product body 5 to prevent the product body 5 from being unable to be placed on the fixed base 1. Then, select a suitable custom height block 4 according to the size of the product body 5. The fit should be such that there is enough space for the high temperature to penetrate into the bottom surface of the product body 5 (the larger the product body 5 is, the greater the thickness of the custom height block 4 should be than the depth of the limiting groove 3). Then, place the custom height blocks 4 in the limiting groove 3 one by one, and then place the processed product body 5 flat on the custom height blocks 4 for high-temperature sintering in the high-temperature sintering furnace. During the high-temperature sintering process, the high temperature can pass through the vent hole 2 in the center of the fixed base 1 and come into contact with the product body 5, so that the product body 5 can be sintered more comprehensively. At the same time, the product body 5 will shrink and move during the high-temperature sintering. The shrinkage and movement of the product body 5 will drive the custom height block 4 to move in the limiting groove 3, providing shrinkage for the product body 5. The shrinkage of the product body 5 is 22.3056%.

[0027] After the high-temperature sintering process is completed, the product body 5 can be removed from the customized height block 4 and the above steps can be repeated for multiple uses.

[0028] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, the phrase "comprising an element defined as..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0029] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A reusable sintering kiln furniture for ring-shaped semiconductors, comprising a fixed base (1), vent holes (2), a limiting groove (3), a customized height block (4), and a product body (5), characterized in that, The fixed base (1) is circular in shape and has a vent hole (2) at its center. The vent hole (2) is circular in shape and has the same axis as the fixed base (1). The fixed base (1) has multiple limiting grooves (3). The multiple limiting grooves (3) are equidistantly distributed on the upper side of the fixed base (1). The limiting grooves (3) are isosceles trapezoids in shape, with the short side facing the center of the fixed base (1) and the long side facing the circumference of the fixed base (1). The customized height block (4) is isosceles trapezoid in shape. Each customized height block (4) is placed in a limiting groove (3). The product body (5) is placed on the multiple customized height blocks (4).

2. The reusable sintering kiln furniture for ring semiconductors according to claim 1, characterized in that, The fixed base (1) and the customized height block (4) are made of high-purity alumina high-temperature resistant material.

3. The reusable sintering kiln furniture for ring semiconductors according to claim 1, characterized in that, The custom height block (4) and the limiting groove (3) are both isosceles trapezoids, and the size of the custom height block (4) is smaller than the size of the limiting groove (3). The long side of the isosceles trapezoid of the custom height block (4) is larger than the short side of the isosceles trapezoid of the limiting groove (3).

4. The reusable sintering kiln furniture for ring semiconductors according to claim 1, characterized in that, The thickness of the customized height block (4) is greater than the depth of the limiting groove (3).

5. The reusable sintering kiln furniture for ring semiconductors according to claim 1, characterized in that, The outermost diameter of the fixed base (1) is greater than the maximum diameter of the product body (5).

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