Exposure system
By designing an exposure system that includes a conveying mechanism and multiple exposure devices, a highly efficient and precise multi-step exposure process was achieved, solving the problem of high manufacturing costs in high-generation FMMs, improving production efficiency and product diversity, and reducing costs.
Patent Information
- Application Number
- CN202520063332.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-10
- Publication Date
- 2026-01-27
- Estimated Expiration
- 2035-01-10
AI Technical Summary
The lack of domestic production capacity for high-generation exposure machines and large-size photomasks leads to high manufacturing costs for high-generation FMMs, and existing low-generation exposure machines are not compatible, increasing the cost of OLED screens.
Design an exposure system including a conveying mechanism and multiple exposure devices. The conveying mechanism drives the foil material to pass through the multiple exposure devices in sequence for segmented exposure. The first exposure device is used for large-area preliminary exposure, and the second exposure device is used for fine alignment and pattern refinement, so as to achieve multi-step precise exposure.
It has improved production efficiency, reduced manual intervention and operational errors, lowered material waste and production costs, broadened the product size range, met diverse application needs, and promoted market penetration.
Smart Images
Figure CN223842310U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of fine metal photomask technology, specifically to an exposure system. Background Technology
[0002] To increase the production capacity of large-size OLED screens, several domestic fine metal mask (FMM) manufacturers are conducting research and development and production of high-generation FMMs.
[0003] Currently, high-generation parallel exposure machines are commonly used for overall exposure of FMMs. However, China does not currently have the production capacity for high-generation exposure machines and their large-size photomasks, and usually relies on imports from abroad, which are expensive. Furthermore, because the size of high-generation photomasks, exposure areas, and exposure machines is larger, they are not compatible with existing low-generation small-size exposure machines. Low-generation small-size exposure machines and photomasks cannot be improved to achieve high-generation, which significantly increases the manufacturing cost of high-generation FMMs, thus hindering the cost reduction and market penetration of medium-sized OLED screens in end products.
[0004] Therefore, finding and developing an alternative to high-generation exposure technology that enables existing low-generation, small-size exposure machines to process and produce large-size FMMs, improve the efficiency of exposure machines, reduce economic costs, and decrease dependence on imports is an urgent problem to be solved in this field. Utility Model Content
[0005] This invention aims to address one of the technical problems in related technologies to a certain extent. Therefore, this invention provides an exposure system.
[0006] To achieve the above objectives, this utility model discloses an exposure system, which includes a conveying mechanism and multiple exposure devices. The multiple exposure devices are respectively set at different positions. The conveying mechanism is used to drive the foil to be exposed through the multiple exposure devices in sequence, so as to expose different areas of the foil using the multiple exposure devices.
[0007] Furthermore, the plurality of exposure devices include a first exposure device and a second exposure device arranged sequentially along the conveying direction. The first exposure device includes a first light source and a photomask. The photomask includes a functional pattern area and a marking pattern area. The marking pattern area includes a plurality of marking patterns arranged along the length and width of the foil. The first light source is used to perform a first exposure process on the foil to be exposed through the photomask to form a first exposure area. The first exposure area includes a plurality of corresponding markings and a plurality of functional patterns.
[0008] The second exposure device includes a detection component and a second light source. The detection component is used to acquire information about multiple marks on the foil exposed by the first exposure device to achieve alignment between the second light source and the foil. The second light source is used to perform a second exposure process on the foil to form a second exposure area, which includes a mesh pattern.
[0009] Furthermore, the conveying mechanism includes a first unwinding device, a first winding device, a second unwinding device, and a second winding device arranged sequentially along the conveying direction. The second unwinding device is used to convey the foil material wound by the first winding device to the second winding device. The first exposure device is disposed between the first unwinding device and the first winding device, and the second exposure device is disposed between the second unwinding device and the second winding device.
[0010] Furthermore, the length of the exposure area of the first exposure device along the conveying direction is greater than the length of the exposure area of the second exposure device along the conveying direction.
[0011] Furthermore, the length of the exposure area of the first exposure device along the conveying direction is between 500mm and 1300mm, and the length of the exposure area of the second exposure device along the conveying direction is between 10mm and 600mm.
[0012] Furthermore, the exposure resolution of the first exposure device is greater than that of the second exposure device, and the alignment accuracy of the first exposure device is less than that of the second exposure device.
[0013] Furthermore, the first exposure apparatus includes a roll-to-roll double-sided vertical parallel exposure machine, and the second exposure apparatus includes a roll-to-roll laser direct writing exposure machine.
[0014] Furthermore, multiple of the marked graphics are arranged around the functional graphic area and distributed in multiple rows and columns on at least one side of the functional graphic area.
[0015] Furthermore, the mesh pattern includes at least one elongated opening disposed along the width direction of the foil.
[0016] Furthermore, each of the plurality of exposure devices includes a light source group arranged opposite to each other with respect to the transport direction, so that the plurality of exposure devices have the function of double-sided exposure.
[0017] The beneficial effects of this utility model are:
[0018] The exposure system of this application achieves continuous conveying and processing of foil materials through the orderly arrangement of the conveying mechanism. This design not only improves production efficiency but also effectively reduces manual intervention, thereby reducing operational complexity and human error. This method can reduce the number of material handling operations, reduce the possibility of human error, and ensure seamless connection of foil materials between different processes.
[0019] Multiple exposure devices are positioned at different locations, and a conveying mechanism carries the foil to be exposed sequentially through these devices. This allows for the exposure of different areas of the foil using multiple devices, achieving a spliced exposure effect. This enables large-sized exposed patterns to be segmented and exposed on different devices before being combined. This exposure system implements a highly efficient and precise multi-step exposure process. The combined action of multiple exposure devices allows for multi-layered pattern formation during production, increasing product complexity and diversity, better meeting the specifications of different products, significantly expanding the product size range, and allowing for more flexible adjustment of pattern details to meet diverse application needs. The overall system design reduces reliance on expensive large-sized photomasks, reduces material waste through precise alignment and multi-step exposure processes, and optimizes production costs. Furthermore, the system's high degree of automation improves production efficiency and consistency, and in the long run, contributes to the widespread adoption and application of related technologies in the market.
[0020] These features and advantages of this utility model will be disclosed in detail in the following specific embodiments and accompanying drawings. The preferred embodiments or means of this utility model will be shown in detail in conjunction with the accompanying drawings, but are not intended to limit the technical solutions of this utility model. In addition, each of these features, elements and components appearing in the following text and drawings is multiple and is labeled with different symbols or numbers for convenience, but all represent parts with the same or similar structure or function. Attached Figure Description
[0021] The present invention will be further described below with reference to the accompanying drawings:
[0022] Figure 1 A schematic diagram illustrating one embodiment of the exposure system provided by this utility model;
[0023] Figure 2 A schematic diagram of one embodiment of the foil material exposed in one exposure cycle of the exposure system provided by this utility model;
[0024] Figure 3 This is a schematic diagram of one embodiment of the exposure system provided by this utility model, in which foil is exposed over multiple exposure cycles.
[0025] Explanation of reference numerals in the attached figures
[0026] 1: Exposure system; 10a: First unwinding device; 10b: First winding device;
[0027] 10a1: Second unwinding device; 10b1: Second winding device;
[0028] 11: First exposure device; 12: Second exposure device;
[0029] 11a: Photomask; 110: Functional graphic area; 111: Marking graphic area;
[0030] 12a: Detection component; 12b: Second light source;
[0031] 21: First exposure area; 211: Functional graphic; 212: Marker;
[0032] 22: First net area; 221: First transition opening; 23: Second net area; 231: Second transition opening; Detailed Implementation
[0033] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described are intended to explain this utility model and should not be construed as limiting it.
[0034] The terms "an embodiment," "example," or "example" used in this specification refer to a particular feature, structure, or characteristic described in connection with the embodiment itself that may be included in at least one embodiment disclosed in this application. The phrase "in an embodiment" appearing in various places throughout the specification does not necessarily refer to the same embodiment.
[0035] To address the related problems, this application discloses an exposure system 1, which includes a conveying mechanism and multiple exposure devices. The multiple exposure devices are respectively positioned at different locations. The conveying mechanism carries the foil to be exposed sequentially through the multiple exposure devices, allowing different areas of the foil to be exposed using the multiple exposure devices. The multiple exposure devices, positioned at different locations and carried sequentially through the multiple exposure devices, achieve a spliced exposure effect, enabling large-size exposure patterns to be segmented and exposed by different devices before being combined for use.
[0036] In some embodiments, such as Figure 1As shown, the multiple exposure devices in the exposure system 1 include a first exposure device 11 and a second exposure device 12 arranged sequentially along the conveying direction. The first exposure device 11 includes a first light source and a photomask 11a. The photomask 11a includes a functional pattern area 110 and a marking pattern area 111. The marking pattern area 111 includes multiple marking patterns arranged along the length and width of the foil. The first light source is used through the photomask 11a to perform a first exposure process on the foil to be exposed in order to form a corresponding multiple markings 212 and multiple functional patterns 211.
[0037] The second exposure device 12 includes a detection component 12a and a second light source 12b. The detection component 12a is used to acquire information about multiple marks on the foil exposed by the first exposure device 11 to achieve alignment between the second light source 12b and the foil. The second light source 12b is used to perform a second exposure process on the foil to form a mesh pattern.
[0038] As an alternative implementation method, such as Figure 1As shown, the conveying mechanism includes a first unwinding device 10a, a first winding device 10b, a second unwinding device 10a1, and a second winding device 10b1 arranged sequentially along the conveying direction. The second unwinding device 10a1 is used to convey the foil wound by the first winding device 10b to the second winding device 10b1. A first exposure device 11 is disposed between the first unwinding device 10a and the first winding device 10b, and a second exposure device 12 is disposed between the second unwinding device 10a1 and the second winding device 10b1. The conveying mechanism in the exposure system 1 of this application achieves continuous conveying and processing of foil through the orderly arrangement of the first unwinding device 10a, the first winding device 10b, the second unwinding device 10a1, and the second winding device 10b1. This design not only improves production efficiency but also effectively reduces manual intervention, thereby reducing operational complexity and human error. The second unwinding device 10a1 is used to receive the foil wound by the first winding device 10b and convey it to the second winding device 10b1. This method reduces the number of material handling operations, lowers the possibility of human error, and ensures seamless connection of foil materials between different processes. The design of the first exposure device 11, using a first light source and photomask 11a, allows for the accurate formation of multiple marks 212 and functional patterns 211 on the foil material. The photomask 11a is equipped with a functional pattern area 110 and a marking area, ensuring the accuracy and consistency of exposure. The marking area has multiple marking patterns arranged along the length and width directions, providing precise alignment marks in both directions and further improving the alignment accuracy in the length and width directions of subsequent production steps, thus improving the quality of the final product. The detection component 12a in the second exposure device 12 can acquire the marking information after the first exposure, achieving precise alignment between the second light source 12b and the foil material. This step greatly improves the accuracy of pattern exposure and alignment, reduces the scrap rate caused by positional deviation, and ensures the accurate formation of the screen pattern, thereby improving production reliability and yield. This exposure system 1 implements a highly efficient and precise multi-step exposure process. The combined action of the first exposure device 11 and the second exposure device 12 enables multi-layered pattern formation during production. This not only increases the complexity and diversity of products but also better meets the specification requirements of different products, greatly expanding the product size window and allowing for more flexible adjustment of pattern details to meet diverse application needs. The overall system design reduces reliance on expensive, large-size photomasks 11a, and reduces material waste and optimizes production costs through precise alignment and multi-step exposure processes. Furthermore, the system's high degree of automation helps improve production efficiency and consistency, and in the long run, it will contribute to the widespread adoption and application of related technologies in the market.
[0039] The multi-step exposure system 1 used in this application can stitch together the patterns after each exposure step into a complete exposed pattern and present it on the product. To ensure a reasonable layout of the stitched exposed patterns, maximize the exposure area, and improve the utilization rate of the exposure area, preferably, the exposure area length of the first exposure device 11 along the conveying direction is greater than that of the second exposure device 12 along the conveying direction. Because the first exposure device 11 has a longer exposure area, it can cover a larger area of foil and complete more preliminary pattern exposures in one operation, thereby accelerating the overall production speed. Furthermore, precise alignment is not required during the first exposure process. Even if slight positional deviations or speed fluctuations occur during transport, pattern alignment is not necessary. The larger exposure area provides sufficient redundancy to accommodate these errors, ensuring the integrity of the mark 212 and the functional pattern 211. The longer exposure area provides greater design space, especially for patterns containing numerous details or complex structures. A longer exposure distance means that more content can be exposed in one step without worrying about space limitations. To improve the exposure details of the first exposure device 11, the first exposure device 11 preferably includes a roll-to-roll double-sided vertical parallel exposure machine. Using the above-mentioned exposure machine can obtain higher exposure accuracy, more stable resist morphology, and more consistent exposure linewidth. Therefore, it can be used to expose the pattern of the functional pattern area 110, which is more conducive to the stability and consistency of the subsequent vapor deposition of the functional pattern 211.
[0040] The second exposure unit 12 can focus on finer alignment and pattern refinement. This clearly defined division of labor optimizes the process flow, thereby improving the overall accuracy and stability of production. In the second exposure step, since the foil has already undergone preliminary full exposure, the area requiring alignment is relatively small, which helps reduce alignment errors. The shorter exposure area length allows the second exposure unit 12 to perform alignment adjustments more precisely, ensuring the accuracy of the final pattern. By rationally configuring the exposure area length, this design maximizes resource utilization. Processing a large area in the first step and refining it in the second step makes the use of resources such as the light source and photomask 11a more efficient, thereby reducing overall production costs.
[0041] The second exposure device 12 has high alignment accuracy and relatively low exposure resolution, making it suitable for fine alignment and large linewidth exposure patterns. Utilizing its higher alignment accuracy, the second exposure device 12 can perform second exposure processing at precise positions, ensuring the perfect presentation of the mesh pattern structure without affecting the already formed functional pattern 211. This avoids exposure errors caused by positional misalignment, reduces defective products, and thus lowers material waste and rework costs. Preferably, in the second exposure device 12, the second light source 12b includes a laser. The second exposure device 12 employs a laser direct-write exposure machine. Laser direct-write is a method of photolithography exposure using a laser beam with controllable exposure intensity. The exposure position and intensity of the laser can be digitally controlled by a computer, achieving variable dose exposure of the photoresist, thus providing high manufacturing flexibility. Furthermore, when exposing mesh patterns, it has strong area selection characteristics, higher light energy, and is more suitable for exposing large-size mesh patterns. Simultaneously, the overall area of the mesh pattern is smaller, making it more suitable for laser exposure of small areas, resulting in higher utilization.
[0042] To further improve exposure efficiency and enable existing exposure machines to produce large-size products from high-generation exposure machines, the exposure pattern obtained by splicing the exposure area and exposure zone length of the first exposure device 11 and the second exposure device 12 is designed to have the same size as the high-generation exposure pattern. Preferably, the exposure zone length of the first exposure device 11 along the conveying direction is between 500mm and 1300mm, and the exposure zone length of the second exposure device 12 along the conveying direction is between 10mm and 600mm.
[0043] As an optional implementation, the exposure resolution of the first exposure device 11 is greater than that of the second exposure device 12, while the alignment accuracy of the first exposure device 11 is less than that of the second exposure device 12. The first exposure device 11 has a higher exposure resolution, enabling rapid formation of basic patterns and markings over a larger area. This initial high-resolution exposure step allows for rapid coverage of large areas, improving production efficiency, and enabling the formation of very fine markings 212 and functional patterns 211 on the foil. This is crucial for ensuring accurate positioning in subsequent processing steps, as high-quality markings provide a reliable reference point for subsequent operations. Furthermore, the high resolution allows for the creation of complex patterns or details in the initial exposure, even if these patterns may require further refinement. This not only increases design flexibility but also provides more possibilities for the diversity of the final product. By completing the detailed exposure of the foil through the first exposure process, the second exposure device 12 can be used for exposure in specific areas without requiring precise exposure equipment, thus reducing costs. On the other hand, the primary task of the first exposure process is to generate markings 212 and functional patterns, without needing to achieve extremely high positional accuracy. Therefore, relatively low alignment accuracy is sufficient to meet the needs of this stage, and simplifies system design and operational complexity. Lower alignment requirements mean faster initialization speed and shorter preparation time, thereby improving overall production efficiency. Especially in large-scale production environments, this can directly translate into cost savings.
[0044] In addition, such as Figure 2 As shown, the linewidth of a typical mesh pattern is much larger than that of the functional pattern 211. Preferably, the mesh pattern includes at least one elongated opening along the width direction of the foil. This results in a significant difference in transmittance between the two patterns. If the functional pattern 211 and the mesh pattern are exposed in the same photomask 11a, the difference in transmittance will cause local overexposure or underexposure. Therefore, this step-by-step splicing exposure method can perfectly solve this problem, significantly improving the quality of the final product and widening the exposure window. By applying high resolution and high alignment accuracy to different exposure devices, each device can focus on its most critical task, achieving optimal resource allocation. This strategy not only improves production efficiency but also effectively reduces equipment costs.
[0045] As an optional implementation, both the first light source and the second light source 12b include light source groups arranged opposite to each other with respect to the transport direction, and the photomask 11a includes photomask groups arranged opposite to each other with respect to the transport direction, so that the first exposure device 11 and the second exposure device 12 have the function of double-sided exposure.
[0046] For ease of understanding, a schematic diagram of the surface structure of the FMM foil exposed using the exposure system 1 of this application is shown below. Figure 2 and Figure 3As shown, Figure 2 The diagram shows the surface structure of the FMM foil within one exposure cycle. It can be seen that the first exposure area 21 contains functional patterns 211 and multiple marks 212. To improve the alignment accuracy of the marks in terms of length and width and to correct the exposure pattern, preferably, the multiple mark patterns are arranged around the functional pattern area 110 and distributed in multiple rows and columns on at least one side of the functional pattern area 110. Figure 2 As can be seen, the first halftone area 22 and the second halftone area 23 are respectively set on both sides of the first exposure area 21. Therefore, marking patterns need to be set on both sides of the first exposure area 21. This application does not impose special limitations on the shape of the marking patterns, as long as they are symmetrical patterns that can be aligned. Preferably, the marking patterns include at least one of circles, squares and crosses.
[0047] The second exposure areas are respectively set on both sides of the first exposure area 21, serving as the first halftone area 22 and the second halftone area 23. The first halftone area 22 has multiple first transition openings 221 through the second exposure process, and the second halftone area 23 has multiple second transition openings 231 through the second exposure process.
[0048] like Figure 3 The diagram shows the surface structure of an FMM foil during multiple exposure cycles. The foil undergoes a first exposure process by the first exposure device 11, sequentially forming regions A1, B1, and C1. It is then conveyed by a transport mechanism to the second exposure device 12 for a second exposure process. The detection component 12a of the second exposure device 12 first detects and aligns information from multiple marker patterns in region A1, then forms regions A2 and A3 on either side of region A1. Next, it detects and aligns information from multiple marker patterns in region B1, then forms regions B2 and B3 on either side of region B1. Finally, it detects and aligns information from multiple marker patterns in region C1, then forms regions C2 and C3 on either side of region C1.
[0049] The above are merely specific embodiments of this utility model, but the scope of protection of this utility model is not limited thereto. Those skilled in the art should understand that this utility model includes, but is not limited to, the contents described in the accompanying drawings and the specific embodiments above. Any modifications that do not depart from the functional and structural principles of this utility model will be included within the scope of the claims.
Claims
1. An exposure system, characterized in that, The exposure system includes a conveying mechanism and multiple exposure devices, which are respectively set at different positions. The conveying mechanism is used to drive the foil to be exposed through the multiple exposure devices in sequence, so as to expose different areas of the foil using the multiple exposure devices.
2. The exposure system according to claim 1, characterized in that, The plurality of exposure devices include a first exposure device (11) and a second exposure device (12) arranged sequentially along the conveying direction. The first exposure device includes a first light source and a photomask (11a). The photomask includes a functional graphic area and a marking graphic area. The marking graphic area includes a plurality of marking graphics arranged along the length and width of the foil. The first light source is used to perform a first exposure process on the foil to be exposed through the photomask to form a first exposure area. The first exposure area includes a plurality of corresponding markings and a plurality of functional graphics. The second exposure device includes a detection component (12a) and a second light source (12b). The detection component is used to acquire information about a plurality of marks on the foil exposed by the first exposure device to achieve alignment between the second light source and the foil. The second light source is used to perform a second exposure process on the foil to form a second exposure area, which includes a mesh pattern.
3. The exposure system according to claim 2, characterized in that, The conveying mechanism includes a first unwinding device (10a), a first winding device (10b), a second unwinding device (10a1), and a second winding device (10b1) arranged sequentially along the conveying direction. The second unwinding device is used to convey the foil wound by the first winding device to the second winding device. The first exposure device (11) is disposed between the first unwinding device and the first winding device. The second exposure device (12) is disposed between the second unwinding device and the second winding device.
4. The exposure system according to claim 2, characterized in that, The length of the exposure area of the first exposure device along the conveying direction is greater than the length of the exposure area of the second exposure device along the conveying direction.
5. The exposure system according to claim 4, characterized in that, The first exposure device has an exposure area length of 500mm to 1300mm along the conveying direction, and the second exposure device has an exposure area length of 10mm to 600mm along the conveying direction.
6. The exposure system according to claim 2, characterized in that, The exposure resolution of the first exposure device is greater than that of the second exposure device, and the alignment accuracy of the first exposure device is less than that of the second exposure device.
7. The exposure system according to claim 6, characterized in that, The first exposure device includes a roll-to-roll double-sided vertical parallel exposure machine, and the second exposure device includes a roll-to-roll laser direct writing exposure machine.
8. The exposure system according to claim 2, characterized in that, Multiple of the marked graphics are arranged around the functional graphics area and distributed in multiple rows and columns on at least one side of the functional graphics area.
9. The exposure system according to claim 2, characterized in that, The mesh pattern includes at least one elongated opening along the width direction of the foil.
10. The exposure system according to any one of claims 1 to 9, characterized in that, Each of the aforementioned exposure devices includes a light source group arranged opposite to each other with respect to the transport direction, so that the multiple exposure devices have the function of double-sided exposure.