Display substrate and display device

Abstract

The utility model discloses a display substrate and a display device. The display substrate comprises a first display area (110) and a second display area (120), the light transmittance of the second display area (120) is larger than that of the first display area (110), the display substrate comprises a first organic medium structure located in the first display area (110), the first organic medium structure is provided with a first medium opening exposing at least part of a first anode (111), and the first organic medium structure is provided with a second medium opening exposing at least part of a second anode (111). The first medium opening has a first medium slope angle; the second organic medium structure is located in the second display area (120), the second organic medium structure is provided with a second medium opening which exposes at least part of the second anode (112), and the second medium opening has a second medium slope angle; the second media slope angle is larger than the first media slope angle.

Description

Technical Field

[0001] This utility model relates to the field of display technology, and more specifically, to a display substrate and a display device. Background Technology

[0002] Organic light-emitting diodes (OLEDs) and quantum dot light-emitting diodes (QLEDs) are active-matrix display devices with advantages such as self-illumination, wide viewing angle, high contrast, low power consumption, extremely high response speed, thinness, flexibility, and low cost. With the continuous development of display technology, flexible displays using OLEDs or QLEDs as light-emitting devices and controlled by thin-film transistors (TFTs) have become the mainstream products in the display field.

[0003] Currently, full-screen display panels are increasingly popular with consumers, and full-screen displays have become the primary display method for mobile phones and other devices. To achieve full-screen displays, compressing the design space of components such as cameras, infrared sensors, and earpieces, and placing these components under the display screen, has become the main approach to solving the full-screen problem. To achieve the most comprehensive full-screen display possible, the area of ​​the display screen corresponding to components such as cameras and infrared sensors must also be used for display. Utility Model Content

[0004] The following is an overview of the subject matter described in detail herein. This overview is not intended to limit the scope of the claims.

[0005] On one hand, this disclosure provides a display substrate, including a first display area and a second display area, wherein the light transmittance of the second display area is greater than that of the first display area, and the second display area is located on at least one side of the first display area;

[0006] The display substrate includes:

[0007] Base;

[0008] A light-emitting structure layer is disposed on the substrate. The light-emitting structure layer includes a first light-emitting device and a second light-emitting device. The first light-emitting device is located in the first display area and includes a first anode. The second light-emitting device is located in the second display area and includes a second anode.

[0009] A first organic dielectric structure is located in the first display area. The first organic dielectric structure is provided with a first dielectric opening that exposes at least a portion of the first anode. The first dielectric opening has a first dielectric slope angle.

[0010] A second organic dielectric structure is located in the second display area. The second organic dielectric structure is provided with a second dielectric opening that exposes at least a portion of the second anode. The second dielectric opening has a second dielectric slope angle, which is greater than the first dielectric slope angle.

[0011] In an exemplary embodiment, the slope angle of the second medium is greater than or equal to 15° and less than or equal to 90°.

[0012] In an exemplary embodiment, the second organic dielectric structure includes a second pixel defining portion and a second septum portion arranged sequentially along a direction away from the substrate. The second pixel defining portion is provided with a second pixel opening that exposes at least a portion of the second anode. The second pixel opening has a second defining side that is connected to the exposed second anode. The second septum portion is configured to support a mask. At least a portion of the second septum portion covers the second defining side. The second dielectric slope angle is a third slope angle formed between the plane of the surface of the second septum portion away from the second defining side and the plane of the substrate.

[0013] In an exemplary embodiment, a second slope angle is formed between the plane where the second defined side is located and the plane where the base is located, and the third slope angle is greater than the second slope angle.

[0014] In an exemplary embodiment, the distance between the outer contour of the orthographic projection of the first medium opening on the substrate and the outer contour of the orthographic projection of the first anode on the substrate is a, and the distance between the outer contour of the orthographic projection of the second pixel opening on the substrate and the outer contour of the orthographic projection of the second anode on the substrate is b, wherein a and b satisfy the relationship: a > b.

[0015] In an exemplary embodiment, the distance between the outer contour of the orthographic projection of the first medium opening on the substrate and the outer contour of the orthographic projection of the first anode on the substrate is a; the distance between the outer contour of the orthographic projection of the second pixel opening on the substrate and the outer contour of the orthographic projection of the second anode on the substrate is b; and the distance between the outer contour of the orthographic projection of the second medium opening on the substrate and the outer contour of the orthographic projection of the second pixel opening on the substrate is c. The distances a, b, and c satisfy the relationship: a = b + c.

[0016] In an exemplary embodiment, the second spacer portion is in the shape of a grid or a block.

[0017] In an exemplary embodiment, the second septum portion includes a sloped portion and a second flat portion. The sloped portion covers the second defined side surface. The side surface of the second medium opening is the surface of the sloped portion away from the second defined side surface of the second pixel opening. The second medium slope angle is a third slope angle formed between the plane of the surface of the sloped portion away from the second defined side surface and the plane of the substrate. The second flat portion is disposed on the surface of the second pixel definition portion away from the substrate and extends along a direction parallel to the substrate. The sloped portion is connected to the second anode exposed by the second pixel opening at one end perpendicular to the substrate direction, and connected to the second flat portion at the other end perpendicular to the substrate direction. The second flat portion is configured to support the mask. Alternatively, the second septum portion includes a sloped portion, a second flat portion, and a second protrusion. The second defined side is covered, the side of the second medium opening is the surface of the inclined portion away from the second defined side of the second pixel opening, the second medium slope angle is the third slope angle formed between the plane of the inclined portion away from the second defined side and the plane of the substrate, the second flat portion is disposed on the surface of the second pixel definition portion away from the substrate, the second flat portion extends along a direction parallel to the substrate, the inclined portion is connected to the second anode exposed by the second pixel opening at one end perpendicular to the substrate direction, the inclined portion is connected to the second flat portion at the other end perpendicular to the substrate direction, the second protrusion is disposed on the surface of the second flat portion away from the substrate, the orthographic projection of the second protrusion on the substrate is located within the orthographic projection of the second flat portion on the substrate, and the second protrusion is configured as a support mask.

[0018] In an exemplary embodiment, the second organic dielectric structure includes a second pixel defining portion and a second septum portion arranged sequentially along a direction away from the substrate. The second pixel defining portion is provided with a second pixel opening that exposes at least a portion of the second anode. The second pixel opening has a second defining side surface connected to the exposed second anode. The second septum portion is configured to support a mask. The orthographic projection of the second septum portion on the substrate is located in the orthographic projection of the surface of the second pixel defining portion away from the substrate on the substrate. The second dielectric slope angle is a second slope angle formed between the plane containing the second defining side surface of the second pixel opening and the plane containing the substrate.

[0019] In an exemplary embodiment, the distance between the outer contour of the orthographic projection of the first medium opening on the substrate and the outer contour of the orthographic projection of the first anode on the substrate is a, and the range of a is: 0.5um≤a≤6um.

[0020] In an exemplary embodiment, the second light-emitting device further includes a cathode disposed on the side of the second organic dielectric structure away from the substrate. The cathode has a cathode light-transmitting aperture, and the second organic dielectric structure has a dielectric light-transmitting aperture. The orthogonal projection of the cathode light-transmitting aperture on the substrate covers the orthogonal projection of the dielectric light-transmitting aperture on the substrate near the substrate. The distance between the outer contour of the orthogonal projection of the cathode light-transmitting aperture on the substrate and the outer contour of the orthogonal projection of the dielectric light-transmitting aperture on the substrate near the substrate is e1, and the range of e1 is: 0um < e1 ≤ 20um; or, the orthogonal projection of the cathode light-transmitting aperture on the substrate is located within the orthogonal projection of the dielectric light-transmitting aperture on the substrate near the substrate, and the distance between the outer contour of the orthogonal projection of the cathode light-transmitting aperture on the substrate and the outer contour of the orthogonal projection of the dielectric light-transmitting aperture on the substrate near the substrate is e1, and the range of e1 is: 0um < e1 ≤ 20um; or, the orthogonal projection of the cathode light-transmitting aperture on the substrate and the orthogonal projection of the dielectric light-transmitting aperture on the substrate near the substrate completely overlap.

[0021] In an exemplary embodiment, a color filter structure layer is further included. The color filter structure layer is disposed on the side of the light-emitting structure layer away from the substrate. The color filter structure layer includes a light-blocking layer located in both the first display area and the second display area. A color filter light-transmitting hole is disposed in the light-blocking layer located in the second display area. The second light-emitting device further includes a cathode, disposed on the side of the second organic dielectric structure away from the substrate. The cathode has a cathode light-transmitting hole. The orthographic projection of the color filter light-transmitting hole on the substrate near the substrate overlaps the orthographic projection of the cathode light-transmitting hole on the substrate. The outer contour of the orthographic projection of the color filter light-transmitting hole on the substrate near the substrate is also included. The distance between the outer contour of the orthogonal projection of the cathode light-transmitting hole on the substrate is e2, and the range of e2 is: 0um < e2 ≤ 20um; or, the orthogonal projection of the side of the color filter light-transmitting hole near the substrate on the substrate is located in the orthogonal projection of the cathode light-transmitting hole on the substrate, and the distance between the outer contour of the orthogonal projection of the side of the color filter light-transmitting hole near the substrate on the substrate and the outer contour of the orthogonal projection of the cathode light-transmitting hole on the substrate is e2, and the range of e2 is: 0um < e1 ≤ 20um; or, the orthogonal projection of the side of the color filter light-transmitting hole near the substrate on the substrate completely overlaps with the orthogonal projection of the cathode light-transmitting hole on the substrate.

[0022] In an exemplary embodiment, a color filter structure layer is further included. This color filter structure layer is disposed on the side of the light-emitting structure layer away from the substrate. The color filter structure layer includes a light-blocking layer located in both the first display area and the second display area. A color filter light-transmitting hole is disposed in the light-blocking layer located in the second display area. A second organic dielectric structure is provided with a dielectric light-transmitting hole. The orthographic projection of the side of the color filter light-transmitting hole near the substrate onto the substrate overlaps with the orthographic projection of the side of the dielectric light-transmitting hole near the substrate onto the substrate. The outer contour of the orthographic projection of the side of the color filter light-transmitting hole near the substrate onto the substrate is parallel to the orthographic projection of the side of the dielectric light-transmitting hole near the substrate onto the substrate. The distance between the outer contours is f, where f is in the range of 0um < f ≤ 10um; or, the orthographic projection of the color filter aperture near the substrate on the substrate is located within the orthographic projection of the medium aperture near the substrate on the substrate, and the distance between the outer contour of the orthographic projection of the color filter aperture near the substrate on the substrate and the outer contour of the orthographic projection of the medium aperture near the substrate on the substrate is f, where f is in the range of 0um < f ≤ 10um; or, the orthographic projection of the color filter aperture near the substrate on the substrate and the orthographic projection of the medium aperture near the substrate on the substrate completely overlap.

[0023] In an exemplary embodiment, the second organic dielectric structure is provided with a dielectric light-transmitting hole, and the second light-emitting device further includes a cathode, which is disposed on the side of the second organic dielectric structure away from the substrate, and the orthogonal projection of the cathode on the substrate covers the orthogonal projection of the dielectric light-transmitting hole on the substrate.

[0024] In an exemplary embodiment, a color filter structure layer is further included. The color filter structure layer is disposed on the side of the light-emitting structure layer away from the substrate. The color filter structure layer includes a light-blocking layer located in the first display area and the second display area. A plurality of color filter light-transmitting holes are disposed in the light-blocking layer located in the second display area. The second display area includes a first sub-display area and a second sub-display area. The first sub-display area is block-shaped, and the second sub-display area is annular. The second sub-display area is disposed around the perimeter of the first sub-display area. The area ratio of the sum of the areas of the orthogonal projections of the color filter light-transmitting holes in the first sub-display area onto the substrate is greater than the area ratio of the sum of the areas of the orthogonal projections of the color filter light-transmitting holes in the second sub-display area onto the substrate.

[0025] In an exemplary embodiment, the area of ​​the orthographic projection of the color filter light-transmitting hole in the first sub-display area onto the substrate is greater than the area of ​​the orthographic projection of the color filter light-transmitting hole in the second sub-display area onto the substrate; and / or, the density of the color filter light-transmitting hole in the first sub-display area is greater than the density of the color filter light-transmitting hole in the second sub-display area.

[0026] In an exemplary embodiment, the second sub-display area includes a plurality of annular regions arranged sequentially along a direction away from the first sub-display area, and the sum of the areas of the orthogonal projections of the color filter light-transmitting holes in the plurality of annular regions is proportional to the area of ​​the annular region where the color filter light-transmitting holes are located, decreasing sequentially along a direction away from the first sub-display area.

[0027] In an exemplary embodiment, the area of ​​the orthogonal projection of the color filter light-transmitting holes in the plurality of annular regions onto the substrate decreases sequentially along the direction away from the first sub-display area; and / or, the density of the color filter light-transmitting holes in the plurality of annular regions decreases sequentially along the direction away from the first sub-display area.

[0028] In an exemplary embodiment, a touch structure layer is further included. The touch structure layer is disposed on the side of the light-emitting structure layer away from the substrate. The touch structure layer is located in the first display area and the second display area. The touch structure layer located in the second display area is provided with a touch light-transmitting hole. The second organic medium structure is provided with a medium light-transmitting hole. At least a portion of the orthographic projection of the touch light-transmitting hole on the substrate overlaps with the orthographic projection of the medium light-transmitting hole on the substrate.

[0029] In an exemplary embodiment, the first organic dielectric structure includes a first pixel defining portion and a first septum portion sequentially disposed along a direction away from the substrate. The first pixel defining portion is provided with a first pixel opening that exposes at least a portion of the first anode. The first pixel opening has a first defining side surface connected to the exposed first anode. The first septum portion is configured to support a mask. The orthographic projection of the first septum portion on the substrate is located in the orthographic projection of the surface of the first pixel defining portion away from the substrate on the substrate. The first dielectric opening is the first pixel opening. The first dielectric slope angle is a first slope angle formed between the plane containing the first defining side surface and the plane containing the substrate.

[0030] On the other hand, this disclosure also provides a display substrate, including a first display area and a second display area, wherein the light transmittance of the second display area is greater than that of the first display area, and the second display area is located on at least one side of the first display area;

[0031] The display substrate includes:

[0032] Base;

[0033] A light-emitting structure layer is disposed on the substrate. The light-emitting structure layer includes a first light-emitting device and a second light-emitting device. The first light-emitting device is located in the first display area, and the second light-emitting device is located in the second display area. The second light-emitting device includes a second anode.

[0034] A second organic dielectric structure is located in the second display area, and the second organic dielectric structure is provided with a second dielectric opening that exposes at least a portion of the second anode.

[0035] The second light-emitting device further includes a cathode disposed on the side of the second organic dielectric structure away from the substrate. The cathode is provided with a cathode light-transmitting hole, and the second organic dielectric structure is provided with a dielectric light-transmitting hole. At least a portion of the orthographic projection of the cathode light-transmitting hole on the substrate overlaps with the orthographic projection of the dielectric light-transmitting hole on the substrate.

[0036] In an exemplary embodiment, the orthographic projection of the cathode light-transmitting aperture on the substrate overlaps the orthographic projection of the dielectric light-transmitting aperture on the substrate near the substrate side. The distance between the outer contour of the orthographic projection of the cathode light-transmitting aperture on the substrate and the outer contour of the orthographic projection of the dielectric light-transmitting aperture on the substrate near the substrate side is e1, where e1 ranges from 0µm to 20µm. Alternatively, the orthographic projection of the cathode light-transmitting aperture on the substrate is located within the orthographic projection of the dielectric light-transmitting aperture on the substrate near the substrate side. The distance between the outer contour of the orthographic projection of the cathode light-transmitting aperture on the substrate and the outer contour of the orthographic projection of the dielectric light-transmitting aperture on the substrate near the substrate side is e1, where e1 ranges from 0µm to 20µm. Alternatively, the orthographic projection of the cathode light-transmitting aperture on the substrate and the orthographic projection of the dielectric light-transmitting aperture on the substrate near the substrate side completely overlap.

[0037] In an exemplary embodiment, a color filter structure layer is further included. The color filter structure layer is disposed on the side of the light-emitting structure layer away from the substrate. The color filter structure layer includes a light-blocking layer located in the second display area. A color filter light-transmitting hole is disposed in the light-blocking layer of the second display area. The orthographic projection of the color filter light-transmitting hole on the substrate overlaps with at least a portion of the orthographic projections of the dielectric light-transmitting hole and the cathode light-transmitting hole on the substrate.

[0038] In an exemplary embodiment, the orthographic projection of the color filter aperture near the substrate on the substrate covers the orthographic projection of the cathode aperture on the substrate, and the distance between the outer contour of the orthographic projection of the color filter aperture near the substrate and the outer contour of the orthographic projection of the cathode aperture on the substrate is e2, where e2 ranges from 0µm to 20µm; or, the orthographic projection of the color filter aperture near the substrate on the substrate is located within the orthographic projection of the cathode aperture on the substrate, and the distance between the outer contour of the orthographic projection of the color filter aperture near the substrate and the outer contour of the orthographic projection of the cathode aperture on the substrate is e2, where e2 ranges from 0µm to 20µm; or, the orthographic projection of the color filter aperture near the substrate on the substrate and the orthographic projection of the cathode aperture on the substrate completely overlap.

[0039] In an exemplary embodiment, the orthographic projection of the color filter aperture near the substrate on the substrate covers the orthographic projection of the medium aperture near the substrate on the substrate. The distance between the outer contour of the orthographic projection of the color filter aperture near the substrate on the substrate and the outer contour of the orthographic projection of the medium aperture near the substrate on the substrate is f, where f ranges from 0µm to 10µm. Alternatively, the orthographic projection of the color filter aperture near the substrate on the substrate is located within the orthographic projection of the medium aperture near the substrate on the substrate. The distance between the outer contour of the orthographic projection of the color filter aperture near the substrate on the substrate and the outer contour of the orthographic projection of the medium aperture near the substrate on the substrate is f, where f ranges from 0µm to 10µm. Alternatively, the orthographic projection of the color filter aperture near the substrate on the substrate and the orthographic projection of the medium aperture near the substrate on the substrate completely overlap.

[0040] In another aspect, this disclosure also provides a display substrate, including a first display area and a second display area, wherein the light transmittance of the second display area is greater than that of the first display area, and the second display area is located on at least one side of the first display area;

[0041] The display substrate includes:

[0042] Base;

[0043] A light-emitting structure layer is disposed on the substrate. The light-emitting structure layer includes a first light-emitting device and a second light-emitting device. The first light-emitting device is located in the first display area, and the second light-emitting device is located in the second display area. The second light-emitting device includes a second anode.

[0044] A second organic dielectric structure is located in the second display area. The second organic dielectric structure is provided with a second dielectric opening that exposes at least a portion of the second anode, and the second organic dielectric structure is provided with a dielectric light-transmitting hole.

[0045] A color filter structure layer is disposed on the side of the light-emitting structure layer away from the substrate. The color filter structure layer includes a light-blocking layer located in the second display area. A color filter light-transmitting hole is disposed in the light-blocking layer of the second display area. At least a portion of the orthographic projection of the color filter light-transmitting hole on the substrate overlaps with the orthographic projection of the dielectric light-transmitting hole on the substrate.

[0046] The second display area includes multiple sub-display areas, and the sum of the areas of the orthographic projections of the color filter light-transmitting holes on the substrate in adjacent sub-display areas has different proportions in the area of ​​the sub-display area where the color filter light-transmitting holes are located.

[0047] In an exemplary embodiment, the second display area includes a first sub-display area and a second sub-display area. The first sub-display area is block-shaped, and the second sub-display area is ring-shaped. The second sub-display area is arranged around the perimeter of the first sub-display area. The area ratio of the sum of the areas of the orthogonal projections of the color filter light-transmitting holes in the first sub-display area onto the substrate is greater than the area ratio of the sum of the areas of the orthogonal projections of the color filter light-transmitting holes in the second sub-display area onto the substrate.

[0048] In an exemplary embodiment, the area of ​​the orthographic projection of the color filter light-transmitting hole in the first sub-display area onto the substrate is greater than the area of ​​the orthographic projection of the color filter light-transmitting hole in the second sub-display area onto the substrate; and / or, the density of the color filter light-transmitting hole in the first sub-display area is greater than the density of the color filter light-transmitting hole in the second sub-display area.

[0049] In an exemplary embodiment, the second sub-display area includes a plurality of annular regions arranged sequentially along a direction away from the first sub-display area, wherein the area of ​​the orthogonal projection of the color filter light-transmitting hole in the plurality of annular regions onto the substrate decreases sequentially along a direction away from the first sub-display area; and / or, the density of the color filter light-transmitting hole in the plurality of annular regions decreases sequentially along a direction away from the first sub-display area.

[0050] In another aspect, this disclosure also provides a display device including the aforementioned display substrate.

[0051] After reading and understanding the accompanying diagrams and detailed descriptions, the other aspects can be understood. Attached Figure Description

[0052] The accompanying drawings are used to provide an understanding of the technical solutions of this disclosure and form part of the specification. They are used together with the embodiments of this disclosure to explain the technical solutions of this disclosure and do not constitute a limitation on the technical solutions of this disclosure.

[0053] Figure 1 This is a schematic diagram of a planar structure of a display substrate;

[0054] Figure 2 This is a schematic diagram of the planar structure of a display area in a display substrate;

[0055] Figure 3 This is a schematic cross-sectional view of a display area in a display substrate according to an embodiment of the present disclosure;

[0056] Figure 4 This is a schematic diagram of a display substrate after the circuit structure layer has been formed.

[0057] Figure 5 This is a schematic diagram of a display substrate after the anode layer has been formed;

[0058] Figure 6A This is a schematic diagram of a display substrate after a pixel definition layer has been formed.

[0059] Figure 6B This is a schematic diagram of a first pixel definition section in a display substrate disclosed herein;

[0060] Figure 6C This is a schematic diagram of a second pixel definition section in a display substrate disclosed herein;

[0061] Figure 7A This is a schematic diagram of a display substrate after the spacer layer has been formed.

[0062] Figure 7B This is a schematic cross-sectional view of the first spacer portion in a display substrate disclosed herein;

[0063] Figure 7C This is a schematic diagram of a second spacer portion in a display substrate disclosed herein;

[0064] Figure 7D This is a schematic diagram of the first light-transmitting hole in the second spacer portion of a display substrate disclosed herein;

[0065] Figure 8 This is a schematic diagram of a display substrate after the formation of a light-emitting functional layer according to the present disclosure;

[0066] Figure 9 This is a schematic diagram of a display substrate after the cathode layer has been formed.

[0067] Figure 10 This is a schematic diagram of a display substrate after forming an encapsulation structure layer according to the present disclosure;

[0068] Figure 11 This is a schematic diagram of a display substrate after a touch structure layer has been formed.

[0069] Figure 12 This is a schematic diagram of a first light-transmitting hole and a third light-transmitting hole in a display substrate disclosed herein;

[0070] Figure 13A This is a schematic cross-sectional view of a first organic dielectric structure of a display substrate according to an exemplary embodiment of the present disclosure;

[0071] Figure 13B This is a schematic cross-sectional view of a second organic dielectric structure of a display substrate according to an exemplary embodiment of the present disclosure;

[0072] Figure 14A This is a schematic cross-sectional view of a first organic dielectric structure of another display substrate, as an exemplary embodiment of the present disclosure.

[0073] Figure 14B This is a schematic cross-sectional view of a second organic dielectric structure of another display substrate, as an exemplary embodiment of the present disclosure.

[0074] Figure 15 This is a schematic cross-sectional view of another display substrate according to an exemplary embodiment of the present disclosure;

[0075] Figure 16 This is a schematic cross-sectional view of another display substrate according to an exemplary embodiment of the present disclosure;

[0076] Figure 17 This is a plan view of another display substrate as an exemplary embodiment of the present disclosure;

[0077] Figure 18 This is a plan view of a first sub-display area and a second sub-display area in another display substrate, which is an exemplary embodiment of the present disclosure. Detailed Implementation

[0078] To make the objectives, technical solutions, and advantages of this disclosure clearer, embodiments of this disclosure will be described in detail below with reference to the accompanying drawings. Note that the implementation methods can be carried out in many different forms. Those skilled in the art will readily understand that the methods and content can be varied in various forms without departing from the spirit and scope of this disclosure. Therefore, this disclosure should not be construed as limited to the content described in the following embodiments. Without conflict, the embodiments and features in the embodiments of this disclosure can be arbitrarily combined with each other.

[0079] The scale of the figures in this disclosure can be used as a reference in actual manufacturing processes, but is not limited thereto. For example, the aspect ratio of the channel, the thickness and spacing of each film layer, and the width and spacing of each signal line can be adjusted according to actual needs. The number of pixels in the display substrate and the number of sub-pixels in each pixel are not limited to the quantities shown in the figures. The figures described in this disclosure are only schematic diagrams of the structure, and one aspect of this disclosure is not limited to the shapes or values ​​shown in the figures.

[0080] The ordinal numbers “first,” “second,” and “third” used in this specification are used to avoid confusion among the constituent elements, not to limit their quantity.

[0081] In this specification, for convenience, terms such as "middle," "upper," "lower," "front," "rear," "vertical," "horizontal," "top," "bottom," "inner," and "outer" are used to indicate orientation or positional relationships in conjunction with the accompanying drawings. This is solely for the purpose of facilitating the description and simplification, and does not imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation of this disclosure. The positional relationships of the constituent elements may be appropriately varied depending on the orientation of each constituent element being described. Therefore, the use of terms not limited to those described in the specification may be appropriately replaced as needed.

[0082] In this specification, unless otherwise expressly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they may refer to a fixed connection, a detachable connection, or an integral connection; a mechanical connection or an electrical connection; a direct connection, an indirect connection via an intermediate component, or a connection within two components. Those skilled in the art will understand the specific meaning of these terms in this disclosure based on the specific circumstances.

[0083] In this specification, a transistor is a device that includes at least three terminals: a gate electrode, a drain electrode, and a source electrode. A transistor has a channel region between the drain electrode (drain electrode terminal, drain region, or drain electrode) and the source electrode (source electrode terminal, source region, or source electrode), and current can flow through the drain electrode, the channel region, and the source electrode. Note that in this specification, the channel region refers to the region through which current primarily flows.

[0084] In this specification, the first electrode can be the drain electrode and the second electrode can be the source electrode, or vice versa. In cases where transistors with opposite polarities are used or the current direction changes during circuit operation, the functions of the "source electrode" and "drain electrode" may sometimes be interchanged. Therefore, in this specification, the "source electrode" and "drain electrode" can be interchanged, and the "source terminal" and "drain terminal" can be interchanged.

[0085] In this specification, "electrical connection" includes the situation where components are connected together by elements that have a certain electrical function. There are no particular limitations on what constitutes an "electrical function," as long as it allows for the transmission and reception of electrical signals between the connected components. Examples of "electrical functions" include not only electrodes and wiring, but also switching elements such as transistors, resistors, inductors, capacitors, and other elements with various functions.

[0086] In this specification, "parallel" refers to the state where the angle formed by two straight lines is greater than or equal to -10° and less than 10°, and therefore also includes the state where the angle is greater than or equal to -5° and less than 5°. Similarly, "perpendicular" refers to the state where the angle formed by two straight lines is greater than or equal to 80° and less than 100°, and therefore also includes the state where the angle is greater than or equal to 85° and less than 95°.

[0087] In this specification, the terms "film" and "layer" may be interchanged. For example, "conductive layer" may sometimes be replaced with "conductive film." Similarly, "insulating film" may sometimes be replaced with "insulating layer."

[0088] In this specification, triangles, rectangles, trapezoids, pentagons, or hexagons are not strictly defined; they can be approximate triangles, rectangles, trapezoids, pentagons, or hexagons. Small deformations due to tolerances are possible, as are chamfers, curved edges, and other variations.

[0089] In this disclosure, “about” means a value that is not strictly limited and allows for process and measurement errors.

[0090] The inventors of this application discovered that in display substrates where the color filter (CF) structure layer is integrated into the color on encapsulation (COE) structure layer, the low transmittance of the light-transmitting display area reduces the transmittance of the light-transmitting display area due to the low transmittance of the light-blocking layer (e.g., black matrix) and pixel definition layer of the CF structure layer. Therefore, multiple light-transmitting holes need to be formed in the light-blocking layer and pixel definition layer of the CF structure layer in the light-transmitting display area (e.g., the area of ​​an under-display camera or light sensor) to create an opening area, thereby improving the transmittance of the light-transmitting display area. However, because the opening area results in a higher reflectivity in the light-transmitting display area compared to the normal display area, the light-transmitting display area becomes visible on the display substrate, affecting the display effect.

[0091] When the slope angle of the pixel definition layer in the light-transmitting display area was designed to be between 18° and 20°, the reflectivity of the light-transmitting display area was measured to be 54.61%, and the simulated light reflectivity of the light-transmitting display area after display substrate integration was 6.2%. When the slope angle of the pixel definition layer in the light-transmitting display area was designed to be between 35° and 40°, the reflectivity of the light-transmitting display area was measured to be 53.99%, and the light reflectivity of the light-transmitting display area after display substrate integration was reduced to 6%. The simulated light reflectivity of the light-transmitting display area was 6.0%, a decrease of 0.2%. Therefore, it can be seen that increasing the slope angle of the pixel definition layer in the light-transmitting display area can reduce the light reflectivity of the light-transmitting display area.

[0092] This disclosure provides a display substrate, including a first display area and a second display area, wherein the light transmittance of the second display area is greater than that of the first display area, and the second display area is located on at least one side of the first display area;

[0093] The display substrate includes:

[0094] Base;

[0095] A light-emitting structure layer is disposed on the substrate. The light-emitting structure layer includes a first light-emitting device and a second light-emitting device. The first light-emitting device is located in the first display area and includes a first anode. The second light-emitting device is located in the second display area and includes a second anode.

[0096] A first organic dielectric structure is located in the first display area. The first organic dielectric structure is provided with a first dielectric opening that exposes at least a portion of the first anode. The first dielectric opening has a first dielectric slope angle.

[0097] A second organic dielectric structure is located in the second display area. The second organic dielectric structure is provided with a second dielectric opening that exposes at least a portion of the second anode. The second dielectric opening has a second dielectric slope angle, which is greater than the first dielectric slope angle.

[0098] In an exemplary embodiment, the slope angle of the second medium is greater than or equal to 15° and less than or equal to 90°.

[0099] In an exemplary embodiment, the second organic dielectric structure includes a second pixel defining portion and a second septum portion arranged sequentially along a direction away from the substrate. The second pixel defining portion is provided with a second pixel opening that exposes at least a portion of the second anode. The second pixel opening has a second defining side that is connected to the exposed second anode. The second septum portion is configured to support a mask. At least a portion of the second septum portion covers the second defining side. The second dielectric slope angle is a third slope angle formed between the plane of the surface of the second septum portion away from the second defining side and the plane of the substrate.

[0100] In an exemplary embodiment, a second slope angle is formed between the plane where the second defined side is located and the plane where the base is located, and the third slope angle is greater than the second slope angle.

[0101] The following examples illustrate the solution of this embodiment.

[0102] Figure 1 This is a schematic diagram of a planar structure of a display substrate. Figure 1 As shown, the display substrate includes a display area 100 and a border area 200 surrounding the display area 100. The display area 100 may include a first display area 110 and a second display area 120, wherein the light transmittance of the first display area 110 is greater than that of the second display area 120. The second display area 120 may be located on at least one side of the first display area 110, for example, the second display area 120 may be disposed around the perimeter of the first display area 110. The first display area 110 may also be referred to as a normal display area. The second display area 120 may also be referred to as a light-transmitting display area, which may also be referred to as an under-display camera (FDC) area. Both the light-transmitting display area and the normal display area include multiple sub-pixels, and each sub-pixel includes a light-emitting device, enabling both the normal display area and the light-transmitting display area to display images. However, this embodiment is not limited in this respect.

[0103] In an exemplary embodiment, a photosensor (e.g., a camera) can be disposed on the backlight side of the display substrate. The orthographic projection of the photosensitive surface of the photosensor onto the display area 100 can be located within the light-transmitting display area. Ambient light can be incident on the photosensitive surface of the photosensor through the light-transmitting display area, thereby improving the screen-to-body ratio of the display device. Here, the backlight side of the display substrate refers to the side away from the light emitted from the display substrate.

[0104] In an exemplary embodiment, the second display area 120 may be located at the top center of the display substrate. However, this embodiment is not limited to this. For example, the second display area 120 may be located at other positions such as the upper left or upper right corner of the display substrate.

[0105] In an exemplary embodiment, the display area 100 can be a rectangle, for example, a rounded rectangle. The second display area 120 can be a rectangle or a rounded rectangle. However, this embodiment is not limited in this respect. For example, the second display area can be a circle or an ellipse, or other polygons such as a rhombus or pentagon.

[0106] Figure 2 This is a schematic diagram of a planar structure of a display area in a display substrate. For example... Figure 2 As shown, on a plane parallel to the display substrate, the display area may include multiple pixel units P arranged in a matrix. At least one pixel unit P may include a first sub-pixel P1, a second sub-pixel P2, a third sub-pixel P3, and a fourth sub-pixel P4. Each sub-pixel may include a light-emitting device and a pixel driving circuit connected thereto. The pixel driving circuit is configured to output a corresponding current to the light-emitting device connected thereto, and the light-emitting device is configured to emit light of a corresponding brightness in response to the current output by the pixel driving circuit connected thereto.

[0107] In an exemplary embodiment, the first sub-pixel P1 can be a red sub-pixel (R) that emits red light, the third sub-pixel P3 can be a blue sub-pixel (B) that emits blue light, and the second sub-pixel P2 and the fourth sub-pixel P4 can be green sub-pixels (G) that emit green light. The four sub-pixels can be arranged in an RGBG pattern.

[0108] In an exemplary embodiment, the shape of the sub-pixel can be circular. However, this embodiment is not limited to this. For example, the shape of the sub-pixel can also be other polygonal shapes such as rectangle, rhombus, pentagon, or hexagon.

[0109] In an exemplary embodiment, the arrangement of sub-pixels in the first display area 110 is substantially the same as that in the second display area 120. However, this embodiment is not limited in this respect.

[0110] In an exemplary embodiment, at least one pixel unit P of the second display area 120 may be provided with an aperture region 130. At least a portion of a low-transmittance film layer (e.g., a pixel definition layer) within the aperture region 130 is etched away to form a via. A high-transmittance film layer (e.g., an organic encapsulation layer in an encapsulation structure layer) is disposed within the via, making the via of the aperture region 130 a blind via. The aperture region 130 is configured to improve the transmittance of the second display area 120.

[0111] In an exemplary embodiment, the aperture region 130 may be located in the central region of the pixel unit P. The first sub-pixel P1 of the pixel unit P is disposed on one side of the aperture region 130 in the second direction Y, the third sub-pixel P3 of the pixel unit P is disposed on the other side of the aperture region 130 in the second direction Y, the second sub-pixel P2 of the pixel unit P is disposed on one side of the aperture region 130 in the first direction X, and the fourth sub-pixel P4 of the pixel unit P is disposed on the other side of the aperture region 130 in the first direction X. The first sub-pixel P1, the second sub-pixel P2, the third sub-pixel P3, and the fourth sub-pixel P4 of the pixel unit P are arranged around the aperture region 130 of the pixel unit P.

[0112] In some implementations, a pixel unit may include three sub-pixels, which may be arranged in a horizontal or vertical manner, and this disclosure does not limit the arrangement.

[0113] Figure 3 This is a cross-sectional structural diagram of a display area in a display substrate according to an embodiment of the present disclosure, illustrating the structure of four sub-pixels and one aperture area in the display area. Figure 3 It can be Figure 2 A cross-sectional view along the A-A' direction. In an exemplary embodiment, such as... Figure 3 As shown, on a plane perpendicular to the display substrate, the first display area 110 may include: a substrate 101, and a circuit structure layer 102, a light-emitting structure layer, an encapsulation structure layer 103, a touch structure layer, and a color filter structure layer 107 sequentially disposed on the substrate 101. The second display area 120 may include: a substrate 101, and a circuit structure layer 102, a light-emitting structure layer, an encapsulation structure layer 103, a touch structure layer, and a color filter structure layer 107 sequentially disposed on the substrate 101. However, this embodiment is not limited thereto.

[0114] In an exemplary embodiment, the light-emitting structure layer of the first display area 110 includes a first light-emitting device, and the light-emitting structure layer of the second display area 120 includes a second light-emitting device. The first light-emitting device of the first display area 110 includes a first anode 111, a light-emitting functional layer 14, and a cathode 15 arranged sequentially along the direction away from the substrate 101. The second light-emitting device of the second display area 120 includes a second anode 112, a light-emitting functional layer 14, and a cathode 15 arranged sequentially along the direction away from the substrate 101.

[0115] In an exemplary embodiment, the display substrate of this disclosure may further include a pixel definition layer, which may include a first pixel definition portion 121 located in the first display area 110 and a second pixel definition portion 122 located in the second display area 120. The first pixel definition portion 121 has a plurality of first pixel openings, which expose at least a portion of the surface of the first anode 111. Each first pixel opening has a first defining side surface, which is connected to the surface of the first anode 111 exposed by the first pixel opening at one end in the third direction Z, and connected to the surface of the first pixel definition portion 121 on the side away from the substrate at the other end in the third direction Z. A first slope angle n1 is formed between the plane containing the first defining side surface and the plane containing the substrate, and the range of the first slope angle n1 is: 90° ≥ n1 ≥ 15°. The second pixel definition portion 122 has a plurality of second pixel openings, which expose at least a portion of the surface of the second anode 112. The second pixel opening has a second defined side surface. At one end of the second defined side surface in the third direction Z, it is connected to the surface of the second anode 112 exposed by the second pixel opening. At the other end of the second defined side surface in the third direction Z, it is connected to the surface of the second pixel defining portion 122 on the side away from the substrate. A second slope angle n2 is formed between the plane containing the second defined side surface 321 and the plane containing the substrate. The range of the second slope angle n2 is: 90° ≥ n2 ≥ 15°.

[0116] In an exemplary embodiment, the display substrate of this disclosure may further include a spacer layer configured to support a mask for depositing a light-emitting functional layer material in a subsequent process. The spacer layer may include a first spacer portion 131 and a second spacer portion 132. The first spacer portion 131 is located in the first display area 110 and is disposed on the surface of the first pixel defining portion 121 away from the substrate 101. The orthographic projection of the first spacer portion 131 onto the substrate 101 lies within the orthographic projection of the surface of the first pixel defining portion 121 away from the substrate 101 onto the substrate 101. The orthographic projection of the first spacer portion 131 onto the substrate 101 does not overlap with the orthographic projection of the first defining side of the first pixel opening onto the substrate 101. The first pixel defining portion 121 and the first spacer portion 131, stacked on top of each other, form a first organic dielectric structure located in the first display area 110. The first organic dielectric structure has a first dielectric opening exposing the surface of the first anode 111, and the first dielectric opening has a first dielectric slope angle. Since the orthographic projection of the first septum portion 131 on the substrate is located within the orthographic projection of the surface of the first pixel definition portion 121 on the substrate away from the substrate, the first septum portion 131 does not cover the first definition side of the first pixel opening. The first medium opening of the first organic medium structure is the first pixel opening, and the first medium slope angle of the first medium opening is the first slope angle n1 formed between the plane where the first definition side is located and the plane where the substrate is located.

[0117] In an exemplary embodiment, a second spacer portion 132 is located on the second display area 120. The second spacer portion 132 is disposed on the surface of the second pixel definition portion 122 away from the substrate 101 and on the second definition side of the second pixel opening. At least a portion of the second spacer portion 132 covers the second definition side of the second pixel opening and is connected to the surface of the second anode 112 exposed by the second pixel opening. The second pixel definition portion 122 and the second spacer portion 132, which are stacked on top of each other, form a second organic dielectric structure located in the second display area 120. The second organic dielectric structure has a second dielectric opening that exposes the surface of the second anode 112 and has a second dielectric slope angle. Since at least a portion of the second septum portion 132 covers the second defined side of the second pixel opening, the side of the second medium opening of the second organic medium structure is the surface of the second septum portion 132 away from the second defined side of the second pixel opening. The second medium slope angle of the second medium opening is the third slope angle n3 formed between the plane of the surface of the second septum portion 132 away from the second defined side of the second pixel opening and the plane of the substrate. The range of the third slope angle n3 is: 90° ≥ n3 ≥ 15°. The third slope angle n3 and the first slope angle n1 satisfy the relationship: n3 > n1, that is, the second medium slope angle is greater than the first medium slope angle.

[0118] In this embodiment of the present disclosure, the display substrate reduces the reflectivity of light in the second display area 120 by making the second dielectric slope angle (third slope angle n3) of the second display area 120 greater than the first dielectric slope angle (first slope angle n1) of the first display area 110, thereby making the ambient light reflectivity of the second display area 120 approximately the same as that of the second display area 120, and reducing the visibility of the second display area 120.

[0119] The following description uses the fabrication process of a display substrate as an example. The "patterning process" described in this disclosure includes, for metallic, inorganic, or transparent conductive materials, processes such as depositing a film, coating with photoresist, mask exposure, development, etching, and photoresist stripping; for organic materials, it includes processes such as coating with organic materials, mask exposure, and development. Deposition can be performed using any one or more of sputtering, evaporation, and chemical vapor deposition; coating can be performed using any one or more of spraying, spin coating, and inkjet printing; etching can be performed using any one or more of dry etching and wet etching. This disclosure does not limit the methods used. A "thin film" refers to a thin film made of a certain material on a substrate using deposition, coating, or other processes. If the "thin film" does not require a patterning process during the entire fabrication process, it can also be called a "layer." If the "thin film" requires a patterning process during the entire fabrication process, it is called a "thin film" before the patterning process and a "layer" after the patterning process. The "layer" after the patterning process contains at least one "pattern." The phrase "A and B are arranged in the same layer" in this disclosure means that A and B are formed simultaneously through the same patterning process, and the "thickness" of the film layer is the dimension of the film layer in the direction perpendicular to the display substrate. In the exemplary embodiments of this disclosure, "the orthographic projection of B is within the range of the orthographic projection of A" or "the orthographic projection of A includes the orthographic projection of B" means that the boundary of the orthographic projection of B falls within the boundary range of the orthographic projection of A, or the boundary of the orthographic projection of A overlaps with the boundary of the orthographic projection of B.

[0120] In an exemplary embodiment, taking three light-emitting devices (one light-emitting device located in the first display area 110, two light-emitting devices located in the second display area 120, and one opening area) as an example, the fabrication process of the display substrate in this embodiment may include the following operations.

[0121] (101) Forming a circuit structure layer. In an exemplary embodiment, forming a circuit structure layer may include: first providing a substrate 101, the substrate 101 including a first display area 110 and a second display area 120; subsequently forming a circuit structure layer 102 on the substrate 101, the circuit structure layer 102 being located on the first display area 110 and the second display area 120, such as... Figure 4 As shown.

[0122] In an exemplary embodiment, the circuit structure layer of the first display area 110 may include a first pixel driving circuit connected to the light-emitting device of the first display area 110. The first pixel driving circuit may be a 3T1C, 4T1C, 5T1C, 5T2C, 6T1C, 7T1C, or 8T1C structure, and may include multiple transistors and capacitors. The circuit structure layer of the second display area 120 may include a second pixel driving circuit connected to the light-emitting device of the second display area 120. The second pixel driving circuit may be a 3T1C, 4T1C, 5T1C, 5T2C, 6T1C, 7T1C, or 8T1C structure, and may include multiple transistors and capacitors. In some embodiments, the second pixel driving circuit of the second display area 120 may be disposed in the circuit structure layer of the first display area 110, and the circuit structure layer of the second display area 120 may not contain the second pixel driving circuit, thereby improving the light transmittance of the second display area 120.

[0123] In an exemplary embodiment, the substrate can be a flexible substrate or a rigid substrate. The rigid substrate can be, but is not limited to, one or more of glass and quartz. The flexible substrate can be, but is not limited to, polyethylene terephthalate, polyethylene terephthalate, polyetheretherketone, polystyrene, polycarbonate, polyarylate, polyarylate, polyimide, polyvinyl chloride, polyethylene, and textile fibers. In an exemplary embodiment, the flexible substrate can include a first flexible material layer, a first inorganic material layer, a semiconductor layer, a second flexible material layer, and a second inorganic material layer stacked on a glass substrate. The materials of the first and second flexible material layers can be polyimide (PI), polyethylene terephthalate (PET), or surface-treated polymer films, etc. The materials of the first and second inorganic material layers can be silicon nitride (SiNx) or silicon oxide (SiOx), etc., to improve the substrate's resistance to water and oxygen. The first and second inorganic material layers are also called barrier layers. The material of the semiconductor layer can be amorphous silicon (a-Si).

[0124] (102) Forming an anode layer. In an exemplary embodiment, forming the anode layer may include: depositing a first conductive film on a substrate on which the aforementioned pattern is formed, and patterning the first conductive film using a patterning process (e.g., magnetron sputtering, exposure and development, etching, etc.) to form an anode layer disposed on the circuit structure layer 102, such as... Figure 5 As shown.

[0125] In an exemplary embodiment, the anode layer includes a plurality of first anodes 111 and a plurality of second anodes 112. The first anodes 111 are located on the first display area 110 and can be configured as the anode of a light-emitting device located on the first display area 110. The second anodes 112 are located on the second display area 120 and can be configured as the anode of a light-emitting device located on the second display area 120.

[0126] In an exemplary embodiment, the orthographic projections of the first anode 111 and the second anode 112 onto the substrate can be circular or elliptical, or other polygons such as rectangles, rhombuses, or pentagons.

[0127] In an exemplary embodiment, the thickness of both the first anode 111 and the second anode 112 can be greater than or equal to 10 nanometers and less than or equal to 1000 nanometers. At least one of the first anode 111 and the second anode 112 can be a single-layer structure. The material of at least one of the first anode 111 and the second anode 112 can be a conductive material with high light reflectivity, such as a metal or alloy, for example, at least one of silver, gold, palladium, and platinum, or an alloy of at least one of silver, gold, palladium, and platinum. Alternatively, at least one of the first anode 111 and the second anode 112 can be a multilayer structure. The multilayer structure can include a light-transmitting layer and a reflective layer stacked together. The material of the light-transmitting layer can be a conductive material with high light transmittance, such as inert tin oxide. The material of the reflective layer can be a conductive material with high light reflectivity, such as a metal or alloy, for example, at least one of silver, gold, palladium, and platinum, or an alloy of at least one of silver, gold, palladium, and platinum.

[0128] (103) Forming a pixel definition layer. In an exemplary embodiment, forming a pixel definition layer may include: depositing a first organic thin film on a substrate on which the aforementioned pattern is formed, and patterning the first organic thin film using a patterning process to form a pixel definition layer located in the first display area 110 and the second display area 120, such as... Figure 6A As shown.

[0129] Figure 6B This is a schematic diagram of a first pixel definition section in a display substrate disclosed herein, wherein, Figure 6B It can be Figure 6A A magnified view of point a. In an exemplary embodiment, such as Figure 6A and Figure 6B As shown, the pixel definition layer may include a first pixel definition portion 121 located in the first display area 110. The first pixel definition portion 121 is provided with a plurality of first pixel openings 31, and the first pixel openings 31 expose at least a portion of the surface of the first anode 111. The first pixel definition portion 121 covers the edge region of the surface of the first anode 111 away from the substrate and the side surface of the first anode 111.

[0130] In an exemplary embodiment, the shape of the orthographic projection of the first pixel opening 31 onto the substrate can be a circle or an ellipse, or other polygons such as a rectangle, rhombus, or pentagon.

[0131] In an exemplary embodiment, the first pixel opening 31 has a first defining side surface 311. The first defining side surface 311 is connected to the surface of the first anode 111 exposed by the first pixel opening 31 at one end in the third direction Z, and to the surface of the first pixel defining portion 121 on the side away from the substrate at the other end in the third direction Z. A first slope angle n1 is formed between the plane containing the first defining side surface 311 and the plane containing the substrate. The range of the first slope angle n1 is: 90° ≥ n1 ≥ 15°. Wherein, when the first defining side surface 311 is planar, the plane containing the first defining side surface 311 coincides with the first defining side surface 311; when the first defining side surface 311 is curved, the plane containing the first defining side surface 311 refers to the plane containing the tangent of the first defining side surface 311. The third direction Z is a direction perpendicular to the substrate.

[0132] In an exemplary embodiment, the distance between the outer contour of the orthographic projection of the first pixel opening 31 on the substrate and the outer contour of the orthographic projection of the first anode 111 on the substrate is 'a'. The distance 'a' ranges from 0.5µm to 6µm.

[0133] In an exemplary embodiment, the orthographic projection of the first pixel definition portion 121 on the substrate overlaps with the edge region of the orthographic projection of the first anode 111 on the substrate. The overlapping region of the first pixel definition portion 121 and the orthographic projection of the first anode 111 on the substrate is annular, and the ring width of the overlapping region is the spacing a.

[0134] In an exemplary embodiment, the thickness of the first pixel defining portion 121 can be greater than or equal to 0.5 micrometers and less than or equal to 1.5 micrometers. The first pixel defining portion 121 can be a photoresist with a transmittance of less than 10%, for example, black photoresist. However, this embodiment is not limited to this; for example, the first pixel defining portion can be a photoresist with a transmittance greater than or equal to 90%.

[0135] Figure 6C This is a schematic diagram of a second pixel definition portion in a display substrate disclosed herein, wherein, Figure 6C It can be Figure 6A A magnified view of point b. In an exemplary embodiment, as shown... Figure 6A and Figure 6CAs shown, the pixel definition layer also includes a second pixel definition portion 122 located in the second display area 120. The second pixel definition portion 122 has a plurality of second pixel openings 32, which expose at least a portion of the surface of the second anode 112. The second pixel definition portion 122 covers the edge region of the surface of the second anode 112 away from the substrate and the side surface of the second anode 112.

[0136] In an exemplary embodiment, the shape of the orthographic projection of the second pixel opening 32 onto the substrate can be a circle or an ellipse, or other polygons such as a rectangle, rhombus, or pentagon.

[0137] In an exemplary embodiment, the second pixel opening 32 has a second defining side surface 321. The second defining side surface 321 is connected to the surface of the second anode 112 exposed by the second pixel opening 32 at one end in the third direction Z, and to the surface of the second pixel defining portion 122 on the side away from the substrate at the other end in the third direction Z. A second slope angle n2 is formed between the plane containing the second defining side surface 321 and the plane containing the substrate. The range of the second slope angle n2 is: 90° ≥ n2 ≥ 15°. Specifically, when the second defining side surface 321 is planar, the plane containing the second defining side surface 321 coincides with the second defining side surface 321; when the second defining side surface 321 is curved, the plane containing the second defining side surface 321 refers to the plane containing the tangent of the second defining side surface 321.

[0138] In an exemplary embodiment, the second slope angle n2 may be the same as or different from the first slope angle n1.

[0139] In an exemplary embodiment, the distance between the outer contour of the orthographic projection of the second pixel opening 32 on the substrate and the outer contour of the orthographic projection of the second anode 112 on the substrate is b. Wherein, b < a.

[0140] In an exemplary embodiment, the edge region of the orthographic projection of the second pixel definition portion 122 on the substrate overlaps with the edge region of the orthographic projection of the second anode 112 on the substrate. The overlapping region of the second pixel definition portion 122 and the orthographic projection of the second anode 112 on the substrate is annular, and the ring width of the overlapping region is the spacing b.

[0141] In an exemplary embodiment, the thickness of the second pixel defining portion 122 can be greater than or equal to 0.5 micrometers and less than or equal to 1.5 micrometers. The second pixel defining portion 122 can be a photoresist with a transmittance of less than 10%, for example, black photoresist. However, this embodiment is not limited to this; for example, the second pixel defining portion can be a photoresist with a transmittance greater than or equal to 90%.

[0142] In an exemplary embodiment, the second pixel defining portion can be made of the same material and fabricated using the same process as the first pixel defining portion. However, this embodiment is not limited to this. For example, the first pixel defining portion and the second pixel defining portion can be formed sequentially using the same or different materials through different steps.

[0143] (104) Forming a spacer layer. In an exemplary embodiment, forming the spacer layer may include: depositing a second organic thin film on a substrate on which the aforementioned pattern is formed, patterning the second organic thin film using a patterning process to form a spacer layer located in the first display area 110 and the second display area 120, the spacer layer being configured to support a mask for evaporating a light-emitting functional layer material in a subsequent process, such as... Figure 7A As shown.

[0144] Figure 7B This is a schematic cross-sectional view of the first spacer portion in a display substrate disclosed herein, wherein... Figure 7B It can be Figure 7A A magnified view of point c. In an exemplary embodiment, such as... Figure 7A and Figure 7B As shown, the spacer layer may include a first spacer portion 131, which is located in the first display area 110. The first spacer portion 131 is disposed on the surface of the first pixel definition portion 121 away from the substrate 101. The orthographic projection of the first spacer portion 131 on the substrate 101 is located within the orthographic projection of the surface of the first pixel definition portion 121 away from the substrate 101 on the substrate 101. The orthographic projection of the first spacer portion 131 on the substrate 101 does not overlap with the orthographic projection of the first defining side surface 311 of the first pixel opening 31 on the substrate 101.

[0145] In an exemplary embodiment, in a direction parallel to the substrate, the first spacer portions 131 of at least two sub-pixels in the first display area 110 can be an interconnected integral structure. The integral structure can be mesh-shaped, with the mesh in the first spacer portions 131 exposing the surface of the first anode 111. For example, the first spacer portions of all sub-pixels in the first display area can be an interconnected integral structure.

[0146] In some embodiments, the first spacer portions of at least some adjacent sub-pixels in the first display area can be independent block structures, and the shape of the first spacer portions can be circular, elliptical, or polygonal such as quadrilateral or pentagonal. For example, the first spacer portions of each sub-pixel in the first display area are all independent block structures.

[0147] In an exemplary embodiment, in the direction perpendicular to the substrate, the first spacer portion 131 may include a first flat portion 131-1 and a first protrusion portion 131-2 stacked sequentially along the direction away from the substrate. The first flat portion 131-1 is disposed on the surface of the first pixel definition portion 121 away from the substrate 101. The orthographic projection of the first flat portion 131-1 on the substrate 101 is located within the orthographic projection of the surface of the first pixel definition portion 121 away from the substrate 101 on the substrate 101. The orthographic projection of the first flat portion 131-1 and the first defining side surface 311 of the first pixel opening 31 on the substrate 101 do not overlap. The first protrusion 131-2 is disposed on the surface of the first flat portion 131-1 on the side away from the substrate 101. The orthographic projection of the first protrusion 131-2 on the substrate 101 lies within the orthographic projection of the surface of the first flat portion 131-1 on the side away from the substrate 101 on the substrate 101. The first protrusion 131-2 exposes the edge region of the surface of the first flat portion 131-1 on the side away from the substrate. The first protrusion 131-2 and the first flat portion 131-1 combine to form a boss-like structure. The first protrusion 131-2 is configured to support a mask for evaporating the luminescent functional layer material in subsequent processes.

[0148] In an exemplary embodiment, the first spacer portion 131 can be fabricated using a halftone mask process. The first spacer portion 131 can be a photoresist with a transmittance of less than 10%, such as black photoresist. However, this embodiment is not limited to this; for example, the first spacer portion can be a photoresist with a transmittance greater than or equal to 90%.

[0149] In an exemplary embodiment, the thickness of the first spacer portion 131 may be greater than or equal to 0.5 micrometers and less than or equal to 1.5 micrometers.

[0150] In an exemplary embodiment, the first flat portion 131-1 and the first protruding portion 131-2 may be an integral structure that is interconnected.

[0151] In an exemplary embodiment, a first pixel defining portion 121 and a first spacer portion 131, stacked on top of each other, form a first organic dielectric structure located in the first display area 110. The first organic dielectric structure has a first dielectric opening that exposes the surface of the first anode 111, and the first dielectric opening has a first dielectric slope angle. Since the orthographic projection of the first spacer portion 131 on the substrate is located within the orthographic projection of the surface of the first pixel defining portion 121 away from the substrate on the substrate, the first spacer portion 131 does not cover the first defining side 311 of the first pixel opening 31. The first dielectric opening of the first organic dielectric structure is the first pixel opening 31, and the first dielectric slope angle of the first dielectric opening is the first slope angle n1 formed between the plane where the first defining side 311 is located and the plane where the substrate is located.

[0152] Figure 7C This is a schematic diagram of a second spacer portion in a display substrate disclosed herein, wherein, Figure 7C It can be Figure 7A A magnified view of point d in the middle. In an exemplary embodiment, such as... Figure 7A and Figure 7C As shown, the spacer layer also includes a second spacer portion 132, which is located on the second display area 120. The second spacer portion 132 is disposed on the surface of the second pixel definition portion 122 away from the substrate 101 and on the second definition side 321 of the second pixel opening 32.

[0153] In an exemplary embodiment, in a direction parallel to the substrate, the second spacer portions 132 of at least two sub-pixels in the second display area 120 can be an integral structure that is interconnected. The integral structure can be in the shape of a grid, and the grid in the second spacer portions 132 exposes the surface of the second anode 112.

[0154] In some embodiments, the second spacer portions of at least some adjacent sub-pixels in the second display area can be independent block structures. The shape of the second spacer portions can be a circular ring, an elliptical ring, or a polygonal ring such as a quadrilateral or pentagon. Each of the second spacer portions is provided with an opening that exposes the surface of the second anode 112.

[0155] In an exemplary embodiment, the second spacer portion 132 may include an inclined portion 132-1, a second flat portion 132-2, and a second protrusion 132-3 in a direction perpendicular to the substrate. The inclined portion 132-1 covers the second defining side 321 of the second pixel opening 32. At one end of the inclined portion 132-1 in the third direction Z, it is connected to the surface of the second anode 112 exposed by the second pixel opening 32. At the other end of the inclined portion 132-1 in the third direction Z, it is connected to the second flat portion 132-3. The inclined portion 132-1 exposes at least a portion of the surface of the second anode 112. The second flat portion 132-2 is disposed on the surface of the second pixel defining portion 122 on the side away from the substrate. The second flat portion 132-3 extends in a direction parallel to the substrate and is connected to the end of the inclined portion 132-1 away from the substrate. The second protrusion 132-3 is disposed on the surface of the second flat portion 132-3 away from the substrate 101. The orthographic projection of the second protrusion 132-3 on the substrate 101 is located within the orthographic projection of the second flat portion 132-2 on the substrate 101. The second protrusion 132-3 is configured to support a mask for evaporating the luminescent functional layer material in a subsequent process.

[0156] In an exemplary embodiment, both the second defining side 321 and the inclined portion 132-1 of the second pixel opening 32 are annular, and the orthographic projection of the inclined portion 132-1 onto the substrate 101 covers the orthographic projection of the second defining side 321 onto the substrate 101. In some embodiments, the inclined portion is fan-shaped, and the inclined portion covers a portion of the second defining side.

[0157] In an exemplary embodiment, the inclined portion 132-1, the second flat portion 132-2, and the second protrusion 132-3 can be an integral structure that is interconnected.

[0158] In an exemplary embodiment, the second pixel defining portion 122 and the second spacer portion 132, which are stacked on top of each other, form a second organic dielectric structure located in the second display area 120. The second organic dielectric structure has a second dielectric opening that exposes the surface of the second anode 112, and the second dielectric opening has a second dielectric slope angle. Since the inclined portion 132-1 of the second spacer portion 132 covers the second defining side 321 of the second pixel opening 32, the side of the second dielectric opening of the second organic dielectric structure is the surface of the inclined portion 132-1 away from the second defining side 321 of the second pixel opening 32. The second dielectric slope angle of the second dielectric opening is a third slope angle n3 formed between the plane of the inclined portion 132-1 away from the second defining side 321 and the plane of the substrate. The third slope angle n3 and the second slope angle n2 satisfy the relationship: n3 > n2; the third slope angle n3 and the first slope angle n1 satisfy the relationship: n3 > n1. Specifically, when the surface of the inclined portion 132-1 away from the second defined side 321 is a plane, the plane containing the surface of the inclined portion 132-1 away from the second defined side 321 coincides with the surface of the inclined portion 132-1 away from the second defined side 321; when the surface of the inclined portion 132-1 away from the second defined side 321 is an arc surface, the plane containing the surface of the inclined portion 132-1 away from the second defined side 321 refers to the plane containing the tangent of the surface of the inclined portion 132-1 away from the second defined side 321.

[0159] In an exemplary embodiment, the range of the third slope angle n3 between the plane where the inclined part 132-1 is located and the plane where the base is located is: 90°≥n3≥15°.

[0160] In this embodiment, the display substrate reduces the reflectivity of light in the second display area 120 by making the second dielectric slope angle (third slope angle n3) of the second display area 120 greater than the first dielectric slope angle (first slope angle n1) of the first display area 110. This makes the ambient light reflectivity of the second display area 120 approximately the same as that of the first display area 110, thereby reducing the visibility of the second display area 120.

[0161] In an exemplary embodiment, the distance between the outer contour of the orthographic projection of the second dielectric opening of the second organic dielectric structure on the substrate side and the outer contour of the orthographic projection of the second pixel opening 32 on the substrate side is c. The distances a, b, and c satisfy the relationship: a = b + c.

[0162] In this embodiment, the display substrate ensures that the sum of pitch b and pitch c equals pitch c, making the opening area of ​​the first dielectric opening in the first display area 110 approximately equal to the opening area of ​​the second dielectric opening in the second display area 120. This guarantees that the display effect of the first display area 110 is approximately the same as that of the second display area 120, and that the lifespan of the light-emitting devices in the first display area 110 is approximately the same as that in the second display area 120. When the sum of pitch b and pitch c is greater than pitch c, the opening area of ​​the second dielectric opening in the second display area 120 is smaller than that of the first dielectric opening in the first display area 110, resulting in a difference in the display effect between the second and first display areas and reducing the lifespan of the light-emitting devices in the second display area 120. When the sum of pitch b and pitch c is less than pitch c, the opening area of ​​the second dielectric opening in the second display area 120 is larger than that of the first dielectric opening in the first display area 110, reducing the area of ​​the overlap region between the light-emitting functional layer and the second anode projected onto the substrate, thus reducing the process yield.

[0163] In an exemplary embodiment, the second spacer portion 132 can be fabricated using a halftone mask process. The thickness of the second spacer portion 132 can be greater than or equal to 0.5 micrometers and less than or equal to 1.5 micrometers. The second spacer portion 132 can be a photoresist with a transmittance of less than 10%, for example, a black photoresist. However, this embodiment is not limited to this; for example, the second spacer portion can be a photoresist with a transmittance greater than or equal to 90%.

[0164] In an exemplary embodiment, the first septum portion 131 and the second septum portion 132 can be made of the same material and fabricated using the same manufacturing process. For example, the first septum portion 131 and the second septum portion 132 can be made of black photoresist material using a halftone mask process. However, this embodiment is not limited to this. For example, the first septum portion and the second septum portion can be formed sequentially using the same or different materials through different steps.

[0165] Figure 7D This is a schematic diagram of the first light-transmitting hole in the second spacer portion of a display substrate disclosed herein, wherein... Figure 7D It can be Figure 7A A magnified view of point e. In an exemplary embodiment, as shown... Figure 7A and Figure 7DAs shown, a plurality of first light-transmitting holes 21 are provided in the second display area 120. The orthographic projection of the first light-transmitting hole 21 on the substrate is located in the orthographic projection of the second protrusion 132-3 of the second spacer portion 132 on the substrate. The second protrusion 132-3 and the second flat portion 132-2 of the second spacer portion 132, as well as the second pixel definition portion 122, within the first light-transmitting hole 21 are all etched away, exposing the circuit structure layer 102. The first light-transmitting hole 21 is filled by the encapsulation structure layer in subsequent processes. The first light-transmitting hole 21 is configured to improve the light transmittance of the second display area 120. The first light-transmitting hole 21 can also be referred to as a dielectric light-transmitting hole.

[0166] In an exemplary embodiment, the shape of the orthographic projection of the first light-transmitting hole 21 onto the substrate can be a circle or an ellipse, or other polygons such as a rectangle, rhombus, or pentagon.

[0167] In some embodiments, when the materials of the second pixel definition portion and the second spacer portion in the second display area 120 are both light-transmitting materials, for example, the light transmittance of the materials of the second pixel definition portion and the second spacer portion is greater than 90%, the first light-transmitting hole may not be provided in the second display area 120. This embodiment will not elaborate further on this.

[0168] (105) Forming a light-emitting functional layer. In an exemplary embodiment, forming the light-emitting functional layer may include: placing a mask on the first spacer portion 131 of the first display area 110 and the second spacer portion 132 of the second display area 120 on the substrate on which the aforementioned pattern is formed, and forming the light-emitting functional layer 14 within the first medium opening of the first display area 110 and the second medium opening of the second display area 120 using processes such as vacuum high-temperature evaporation, inkjet printing, or transfer printing, as shown below. Figure 8 As shown.

[0169] In an exemplary embodiment, in the first display area 110, the light-emitting functional layer 14 covers the first anode 111 exposed by the first dielectric opening. In the second display area 120, the light-emitting functional layer 14 covers the second anode 112 exposed by the second dielectric opening.

[0170] In an exemplary embodiment, the light-emitting functional layer 14 may include a light-emitting layer (EML) and any one or more of the following: a hole injection layer (HIL), a hole transport layer (HTL), an electron blocking layer (EBL), a hole blocking layer (HBL), an electron transport layer (ETL), and an electron injection layer (EIL). In some examples, one or more of the hole injection layer, hole transport layer, electron blocking layer, hole blocking layer, electron transport layer, and electron injection layer of the light-emitting device in the first display area 110 and the light-emitting device in the second display area 120 may be common layers that are interconnected.

[0171] (106) Forming a cathode layer. In an exemplary embodiment, forming a cathode layer may include: depositing a second conductive film on a substrate on which the aforementioned pattern is formed, covering the light-emitting functional layer 14 of the first display area 110 and the second display area 120; patterning the second conductive film using a patterning process to form a cathode layer, such as... Figure 9 As shown.

[0172] In an exemplary embodiment, the cathode layer includes a cathode 15, which is located in the first display area 110 and the second display area 120, and is connected to the light-emitting functional layer 14 located in the first display area 110 and the light-emitting functional layer 14 located in the second display area 120, respectively. The cathode 15 of the first display area 110 can be a common layer connected together, and the cathode 15 of the second display area 120 can be a common layer connected together. The cathode 15 of the first display area 110 and the cathode 15 of the second display area 120 can be an integral structure connected to each other. The cathode 15, the light-emitting functional layer 14, and the first anode 111 of the first display area 110 form a first light-emitting device of the first display area 110, and the cathode 15, the light-emitting functional layer 14, and the second anode 112 of the second display area 120 form a second light-emitting device of the second display area 120.

[0173] In an exemplary embodiment, in the second display area 120, the cathode 15 covers the side surface of the first light-transmitting hole 21 and the surface of the circuit structure layer 102 exposed by the first light-transmitting hole 21. The side surface of the first light-transmitting hole 21 comprises the second pixel definition portion 122 and the second spacer portion 132 exposed by the first light-transmitting hole 21.

[0174] In an exemplary embodiment, the cathode 15 can be made of a metal or a metal oxide. For example, the cathode 15 can be made of metals such as silver, magnesium, or aluminum. The thickness of the cathode 15 can be greater than or equal to 1 nanometer and less than or equal to 30 nanometers.

[0175] (107) Forming an encapsulation structure layer. In an exemplary embodiment, forming the encapsulation structure layer may include: sequentially depositing a first inorganic encapsulation film, an organic encapsulation film, and a second inorganic encapsulation film on a substrate with the aforementioned pattern; patterning the first inorganic encapsulation film, the organic encapsulation film, and the second inorganic encapsulation film using a patterning process, so that the first inorganic encapsulation film forms a first inorganic encapsulation layer 161, the organic encapsulation film forms an organic encapsulation layer 163, and the second inorganic encapsulation film forms a second inorganic encapsulation layer 162; the first inorganic encapsulation layer 161, the organic encapsulation layer 163, and the second inorganic encapsulation layer 162 form the encapsulation structure layer 103, such as... Figure 10 As shown.

[0176] In an exemplary embodiment, the first inorganic encapsulation layer 161 is located in the first display area 110 and the second display area 120, and covers the cathodes 15 located in the first display area 110 and the second display area 120, respectively. In the second display area 120, the first inorganic encapsulation layer 161 covers the cathode 15 on the side of the first light-transmitting hole 21 and the cathode 15 on the circuit structure layer 102 exposed by the first light-transmitting hole 21.

[0177] In an exemplary embodiment, an organic encapsulation layer 163 is located in the first display area 110 and the second display area 120, and respectively covers the first inorganic encapsulation layer 161 located in the first display area 110 and the second display area 120. In the second display area 120, the organic encapsulation layer 163 covers and fills the first light-transmitting hole 21 with the first inorganic encapsulation layer 161. The organic encapsulation layer 163 is configured to relieve stress on the first inorganic encapsulation layer 161 and the second inorganic encapsulation layer 162, and to provide a flat surface for film layers (e.g., color filter structure layers) formed in subsequent processes.

[0178] In an exemplary embodiment, the thickness of the organic encapsulation layer 163 can be greater than or equal to 0.1 micrometers and less than or equal to 50 micrometers. The organic encapsulation layer 163 can be an organic material with high light transmittance (e.g., light transmittance greater than 90%). For example, the material of the organic encapsulation layer 163 can be an acrylate or epoxy resin, etc.

[0179] In an exemplary embodiment, an organic thin film can be deposited using processes such as blade coating or inkjet printing; subsequently, a thermosetting or photocuring process is used to cure the organic thin film.

[0180] In an exemplary embodiment, the second inorganic encapsulation layer 162 is located in the first display area 110 and the second display area 120, and respectively covers the organic encapsulation layer 163 located in the first display area 110 and the second display area 120.

[0181] In an exemplary embodiment, the thickness of the first inorganic encapsulation layer 161 and the second inorganic encapsulation layer 162 can be greater than or equal to 0.1 micrometers and less than or equal to 5 micrometers. The first inorganic encapsulation layer 161 and the second inorganic encapsulation layer 162 can be at least one of inorganic materials and metal oxides. For example, the first inorganic encapsulation layer 161 and the second inorganic encapsulation layer 162 can be at least one of silicon nitride, silicon oxide, silicon oxynitride, and aluminum oxide.

[0182] In an exemplary embodiment, the first inorganic encapsulation layer 161 and the second inorganic encapsulation layer 162 can be formed by processes such as plasma enhanced chemical vapor deposition (PECVD), chemical vapor deposition (CVD), or atomic layer deposition (ALD).

[0183] In an exemplary embodiment, the first inorganic encapsulation layer 161, the organic encapsulation layer 163, and the second inorganic encapsulation layer 162 of the first display area 110 and the second display area 120 are all integral structures that are interconnected.

[0184] In some embodiments, the encapsulation structure layer may include a number of encapsulation layers other than the three encapsulation layers, such as one, two, four, or five encapsulation layers, which will not be described in detail herein.

[0185] (108) Forming a touch structure layer. In an exemplary embodiment, forming a touch structure layer may include: first forming a buffer layer 104 on the encapsulation structure layer 103 of the first display area 110 and the second display area 120 on the substrate on which the aforementioned pattern is formed; then depositing a third conductive film on the buffer layer 104, and patterning the third conductive film through a patterning process to form a connection electrode layer located in the first display area 110 and the second display area 120, the connection electrode layer including a plurality of connection electrodes 171; then depositing an insulating film on the connection electrode layer to form an insulating film covering the plurality of connection electrodes. A touch insulating layer 105 is formed in the touch insulating layer 171, located in the first display area 110 and the second display area 120. Subsequently, a plurality of touch connection holes and a second light-transmitting hole 22 are formed in the touch insulating layer 105. The orthographic projection of the touch connection holes onto the substrate lies within the orthographic projection of the connection electrode 171 onto the substrate. The touch insulating layer 105 in the touch connection holes is etched away, exposing at least a portion of the surface of the connection electrode 171. The touch connection holes are configured to allow touch electrodes formed in subsequent processes to connect to the exposed connection electrode 171 through these holes. The second light-transmitting hole 22 is located in the second display area 120. The buffer layer 104 and the touch insulating layer 105 in the light-transmitting hole 22 are etched away to expose the encapsulation structure layer 103. The orthographic projection of the second light-transmitting hole 22 on the substrate at least partially overlaps with the orthographic projection of the first light-transmitting hole 21 on the substrate. For example, the orthographic projection of the second light-transmitting hole 22 on the substrate covers the orthographic projection of the first light-transmitting hole 21 on the substrate. The second light-transmitting hole 22 is configured to increase the light transmittance of the second display area 120. Subsequently, a fourth conductive film is deposited on the touch insulating layer 105. The fourth conductive film is patterned by a patterning process to form a fourth conductive film disposed on the touch insulating layer 105. The touch electrode layer on the 05 is located in the first display area 110 and the second display area 120. The touch electrode layer includes multiple touch electrodes 172, and adjacent touch electrodes 172 are connected to the same connection electrode 171 through different touch connection holes. Subsequently, a first protective layer 106 covering the multiple touch electrodes 172 is deposited on the touch insulating layer 105. The first protective layer 106 is located in the first display area 110 and the second display area 120. The first protective layer 106 in the second display area 120 fills the second light-transmitting hole 22 and contacts the encapsulation structure layer 103 exposed by the second light-transmitting hole 22. Figure 11 As shown. The touch electrode 172, the touch insulating layer 105, and the connecting electrode 171 form a touch structure layer. The second light-transmitting hole 22 can also be referred to as a touch light-transmitting hole.

[0186] In an exemplary embodiment, the thickness of the buffer layer 104 can be greater than or equal to 0.1 micrometers and less than or equal to 5 micrometers. The buffer layer 104 can be at least one of inorganic materials, organic materials, and metal oxides. For example, the buffer layer 104 can be at least one of silicon nitride, silicon oxide, silicon oxynitride, alumina, acrylic resin, and epoxy resin. The buffer layer 104 can be prepared by processes such as plasma-enhanced chemical vapor deposition (PECVD), chemical vapor deposition (CVD), or atomic layer deposition (ALD).

[0187] In an exemplary embodiment, the buffer layer 104 may be made of the same material as the second inorganic encapsulation layer 162 of the encapsulation structure layer 103 and be connected to each other to form an integral structure. That is, the part of the second inorganic encapsulation layer 162 away from the substrate may serve as the buffer layer 104, thereby simplifying the process and reducing costs.

[0188] In some embodiments, the buffer layer and the second inorganic encapsulation layer may be formed using the same or different materials through different fabrication processes.

[0189] In an exemplary embodiment, in the first display area 110, the orthographic projections of the connecting electrode 171 and the touch electrode 172 on the substrate are both located within the orthographic projection of the first pixel definition portion 121 on the substrate. The orthographic projections of the connecting electrode 171 and the touch electrode 172 on the substrate do not overlap with the orthographic projection of the first pixel opening 31 on the substrate, thereby preventing the connecting electrode 171 and the touch electrode 172 from obscuring the first pixel opening 31 and reducing the aperture ratio. In the second display area 120, the orthographic projections of the connecting electrode 171 and the touch electrode 172 on the substrate are both located within the orthographic projection of the second pixel definition portion 122 on the substrate. The orthographic projections of the connecting electrode 171 and the touch electrode 172 on the substrate do not overlap with the orthographic projection of the second pixel opening 32 on the substrate, thereby preventing the connecting electrode 171 and the touch electrode 172 from obscuring the second pixel opening 32 and reducing the aperture ratio.

[0190] In an exemplary embodiment, the thickness of the connecting electrode 171 can be greater than or equal to 10 nanometers and less than or equal to 50 nanometers, and the thickness of the touch electrode 172 can be greater than or equal to 10 nanometers and less than or equal to 500 nanometers. The connecting electrode 171 and the touch electrode 172 can be made of metal or metal oxide, such as silver, gold, palladium, platinum, inert tin oxide, etc., and can be a single-layer structure or a multi-layer structure. The connecting electrode 171 and the touch electrode 172 can be fabricated using a magnetron sputtering process.

[0191] In an exemplary embodiment, the thickness of the touch insulating layer 105 can be greater than or equal to 0.1 micrometers and less than or equal to 5 micrometers. The touch insulating layer 105 can be prepared by processes such as plasma-enhanced chemical vapor deposition (PECVD), chemical vapor deposition (CVD), or atomic layer deposition (ALD).

[0192] In an exemplary embodiment, the thickness of the first protective layer 106 can be greater than or equal to 0.1 micrometers and less than or equal to 50 micrometers. The material of the first protective layer 106 can be an organic material, such as acrylates, epoxy resins, etc. The first protective layer 106 can be cured and formed by thermosetting or photocuring processes. The light transmittance of the first protective layer 106 is greater than 90%. In some embodiments, the first protective layer may not be provided, and the color filter structure layer may be formed directly on the touch structure layer. This will not be described in detail here.

[0193] (109) Forming a color filter structure layer. In an exemplary embodiment, forming a color filter structure layer may include: firstly forming a light-blocking layer 181 on a first protective layer 106 on a substrate on which the aforementioned pattern is formed, the light-blocking layer 181 being located in the first display area 110 and the second display area 120, the light-blocking layer 181 having a plurality of color filter openings, the orthographic projection of the color filter openings on the substrate overlapping at least partially with the orthographic projection of the light-emitting layer of the light-emitting device on the substrate, the light-blocking layer 181 being configured to block light transmission and prevent light from adjacent sub-pixels from interfering with each other; subsequently, forming a light-filtering layer 182 in the color filter openings, the light-filtering layer 182 being located in the first display area 110 and the second display area 120. The orthographic projection of the filter layer 182 onto the substrate at least partially overlaps with the orthographic projection of the light-emitting layer of the light-emitting device onto the substrate. The filter layer 182 is configured to transmit light of a specific color; for example, the filter layer 182 of the red sub-pixel is configured to transmit red light, the filter layer 182 of the green sub-pixel is configured to transmit green light, and the filter layer 182 of the blue sub-pixel is configured to transmit blue light. The filter layer 182 and the light-blocking layer 181 form a color filter structure layer 107. Subsequently, a second protective layer 108 is formed on the color filter structure layer 107. The second protective layer 108 is located in the first display area 110 and the second display area 120, such as... Figure 3 As shown.

[0194] In an exemplary embodiment, in the second display area 120, at least a portion of the light-blocking layer 181 has a third light-transmitting hole 23. The light-blocking layer 181 in the third light-transmitting hole 23 is etched away, exposing the surface of the first protective layer 106 away from the substrate. A portion of the second protective layer 108 fills the third light-transmitting hole 23 and contacts the first protective layer 106 exposed by the third light-transmitting hole 23. The orthographic projection of the third light-transmitting hole 23 on the substrate overlaps at least partially with the orthographic projections of the second light-transmitting hole 22 and the first light-transmitting hole 21 on the substrate. The third light-transmitting hole 23 is configured to improve the light transmittance of the second display area 120. The third light-transmitting hole 23 can also be referred to as a color filter light-transmitting hole.

[0195] In an exemplary embodiment, the shape of the orthographic projection of the third light-transmitting hole 23 onto the substrate can be a circle or an ellipse, or other polygons such as a rectangle, rhombus, or pentagon.

[0196] In an exemplary embodiment, a first light-transmitting hole 21, a second light-transmitting hole 22, and a third light-transmitting hole 23 arranged sequentially in a direction perpendicular to the substrate form an opening area in the second display area, and the opening area is configured to improve the light transmittance of the second display area.

[0197] In an exemplary embodiment, the light-blocking layer 181 can be made of black matrix (BM) and prepared using negative photoresist through processes such as coating, exposure, and development. In some embodiments, the light-blocking layer can be made of an organic resin material containing a thermosetting agent or a photocuring agent, prepared by inkjet printing or transfer printing.

[0198] In some embodiments, the light-blocking layer may include at least two stacked filter material layers that transmit light of different colors. For example, the light-blocking layer may include at least two of a stacked red filter material layer, a green filter material layer, and a blue filter material layer. The thickness of the light-blocking layer may be greater than or equal to 1 micrometer and less than or equal to 5 micrometers.

[0199] In an exemplary embodiment, the thickness of the light-blocking layer 181 can be greater than or equal to 1 micrometer and less than or equal to 1.5 micrometers.

[0200] In an exemplary embodiment, the filter layer 182 can be made using negative photoresist through processes such as coating, exposure, and development. The filter layer 182 may include a red filter pattern, a green filter pattern, and a blue filter pattern. The orthogonal projection of the red filter pattern onto the substrate overlaps at least partially with the orthogonal projection of the light-emitting layer of the red sub-pixel onto the substrate. The orthogonal projection of the green filter pattern onto the substrate overlaps at least partially with the orthogonal projection of the light-emitting layer of the green sub-pixel onto the substrate. The orthogonal projection of the blue filter pattern onto the substrate overlaps at least partially with the orthogonal projection of the light-emitting layer of the blue sub-pixel onto the substrate.

[0201] In an exemplary embodiment, the thickness of the filter layer 182 may be greater than or equal to 1 micrometer and less than or equal to 5 micrometers.

[0202] In an exemplary embodiment, the thickness of the second protective layer 108 can be greater than or equal to 0.1 micrometers and less than or equal to 50 micrometers. The material of the second protective layer 108 can be an organic material, such as acrylates, epoxy resins, etc. The second protective layer 108 can be cured by thermosetting or photocuring processes to solidify the first protective layer 106. The light transmittance of the second protective layer 108 is greater than 90%. In some embodiments, the second protective layer may not be provided, which will not be described in detail here.

[0203] Figure 12 This is a schematic diagram of a first light-transmitting hole and a third light-transmitting hole in a display substrate disclosed herein, wherein, Figure 12 It can be Figure 3 Enlarged view of the first and third light-transmitting holes at point f. In an exemplary embodiment, such as... Figure 3 and Figure 12 As shown, in the second display area 120, the cathodes 15 are interconnected as a single structure. The orthographic projection of the cathodes 15 onto the substrate covers the orthographic projection of the first light-transmitting hole 21 onto the substrate. The cathodes 15 cover the side of the first light-transmitting hole 21 and the surface of the circuit structure layer 102 exposed by the first light-transmitting hole 21. The orthographic projection of the third light-transmitting hole 23 near the substrate covers the orthographic projection of the first light-transmitting hole 21 near the substrate. The distance between the outline of the orthographic projection of the third light-transmitting hole 23 near the substrate and the outline of the orthographic projection of the first light-transmitting hole 21 near the substrate is f. The range of the distance f is: 0um < f ≤ 10um, for example, 0um < f ≤ 5um.

[0204] In some embodiments, the orthographic projection of the third light-transmitting hole near the substrate onto the substrate completely overlaps with the orthographic projection of the first light-transmitting hole near the substrate onto the substrate. The distance between the outline of the orthographic projection of the third light-transmitting hole near the substrate onto the substrate and the outline of the orthographic projection of the first light-transmitting hole near the substrate onto the substrate is f. Wherein, the range of the distance f is: f = 0 μm.

[0205] In some embodiments, the orthographic projection of the third light-transmitting aperture on the substrate near the substrate side is located within the orthographic projection of the first light-transmitting aperture on the substrate near the substrate side. The distance between the outline of the orthographic projection of the third light-transmitting aperture 23 on the substrate near the substrate side and the outline of the orthographic projection of the first light-transmitting aperture on the substrate near the substrate side is f. The distance f ranges from 0µm < f ≤ 10µm, for example, 0µm < f ≤ 5µm.

[0206] In an exemplary embodiment, the orthographic projection of the surface of the filter layer 182 near the substrate onto the substrate covers the orthographic projection of the second pixel opening 32 near the substrate onto the substrate. The distance between the outline of the orthographic projection of the surface of the filter layer 182 near the substrate and the outline of the orthographic projection of the second pixel opening 32 near the substrate is g. The distance g ranges from 0µm < g ≤ 10µm, for example, 0µm < g ≤ 5µm.

[0207] In some embodiments, the orthographic projection of the filter layer's surface near the substrate onto the substrate completely overlaps with the orthographic projection of the second pixel opening's surface near the substrate onto the substrate. The distance between the outline of the orthographic projection of the filter layer's surface near the substrate onto the substrate and the outline of the orthographic projection of the second pixel opening's surface near the substrate onto the substrate is g. The distance g is in the range of: g = 0 μm.

[0208] In some embodiments, the orthographic projection of the filter layer's surface near the substrate onto the substrate lies within the orthographic projection of the second pixel opening's surface near the substrate onto the substrate. The distance between the outline of the orthographic projection of the filter layer's surface near the substrate onto the substrate and the outline of the orthographic projection of the second pixel opening's surface near the substrate onto the substrate is g. The distance g ranges from 0µm < g ≤ 10µm, for example, 0µm < g ≤ 5µm.

[0209] Figure 13A This is a schematic cross-sectional view of a first organic dielectric structure of a display substrate according to an exemplary embodiment of the present disclosure; Figure 13B This is a schematic cross-sectional view of a second organic dielectric structure of a display substrate, which is an exemplary embodiment of this disclosure. Figure 13A and Figure 13B As shown, this embodiment displays the substrate structure and Figure 3 The structures shown are basically the same, except that the first organic medium structure of the first display area and the second organic medium structure of the second display area are different.

[0210] In an exemplary embodiment, a first pixel defining portion 121 and a first spacer portion 131, sequentially stacked along a direction away from the substrate, form a first organic dielectric structure located in the first display area. The first pixel defining portion 121 has a plurality of first pixel openings 31, each exposing at least a portion of the surface of the first anode 111. Each first pixel opening 31 has a first defining side surface 311, which is connected to the surface of the first anode 111 exposed at one end in a third direction Z, and to the surface of the first pixel defining portion 121 on the side away from the substrate at the other end in the third direction Z. The first spacer portion 131 includes a first protrusion 131-2, which is disposed on the surface of the first pixel defining portion 121 on the side away from the substrate 101. The orthographic projection of the first protrusion 131-2 on the substrate 101 lies within the orthographic projection of the surface of the first pixel defining portion 121 on the side away from the substrate 101 on the substrate 101. The orthographic projection of the first protrusion 131-2 on the substrate 101 does not overlap with the orthographic projection of the first defining side surface 311 on the substrate 101. The first protrusion 131-2 is configured to support a mask for evaporating the light-emitting functional layer material in a subsequent process.

[0211] In an exemplary embodiment, the first organic dielectric structure is provided with a first dielectric opening exposing the surface of the first anode 111, and the first dielectric opening has a first dielectric slope angle. Since the orthographic projection of the first septum portion 131 on the substrate is located within the orthographic projection of the surface of the first pixel defining portion 121 away from the substrate on the substrate, the first septum portion 131 does not cover the first defining side 311 of the first pixel opening 31. The first dielectric opening of the first organic dielectric structure is the first pixel opening 31, and the first dielectric slope angle of the first dielectric opening is the first slope angle n1 formed between the plane where the first defining side 311 is located and the plane where the substrate is located.

[0212] In an exemplary embodiment, a second pixel defining portion 122 and a second spacer portion 132, sequentially stacked along a direction away from the substrate, form a second organic dielectric structure located in the second display area. The second pixel defining portion 122 has a plurality of second pixel openings 32, each exposing at least a portion of the surface of the second anode 112. Each second pixel opening 32 has a second defining side surface 321, which is connected to the exposed surface of the second anode 112 at one end in a third direction Z, and to the surface of the second pixel defining portion 122 on the side away from the substrate at the other end in the third direction Z. The second septum portion 132 may include a tilted portion 132-1 and a flat portion 132-2. The tilted portion 132-1 covers the second defining side 321 of the second pixel opening 32. At one end of the tilted portion 132-1 in the third direction Z, it is connected to the surface of the second anode 112 exposed by the second pixel opening 32. At the other end of the tilted portion 132-1 in the third direction Z, it is connected to the second flat portion 132-3. The tilted portion 132-1 exposes at least a portion of the surface of the second anode 112. The second flat portion 132-2 is disposed on the surface of the second pixel defining portion 122 on the side away from the substrate. The second flat portion 132-3 extends in a direction parallel to the substrate and is connected to the end of the tilted portion 132-1 away from the substrate. The second flat portion 132-3 is configured to support a mask for depositing the luminescent functional layer material in a subsequent process.

[0213] In an exemplary embodiment, the second organic dielectric structure is provided with a second dielectric opening exposing the second anode 112, and the second dielectric opening has a second dielectric slope angle. Since the inclined portion 132-1 of the second septum portion 132 covers the second defined side surface 321 of the second pixel opening 32, the side surface of the second dielectric opening of the second organic dielectric structure is the surface of the inclined portion 132-1 away from the second defined side surface 321 of the second pixel opening 32. The second dielectric slope angle of the second dielectric opening is a third slope angle n3 formed between the plane containing the surface of the inclined portion 132-1 away from the second defined side surface 321 and the plane containing the substrate. The third slope angle n3 and the first slope angle n1 satisfy the relationship: n3 > n1.

[0214] In this embodiment, the display substrate reduces the reflectivity of light in the second display area 120 by making the second dielectric slope angle (third slope angle n3) of the second display area 120 greater than the first dielectric slope angle (first slope angle n1) of the first display area 110. This makes the ambient light reflectivity of the second display area 120 approximately the same as that of the first display area 110, thereby reducing the visibility of the second display area 120.

[0215] Figure 14A This is a schematic cross-sectional view of a first organic dielectric structure of another display substrate, as an exemplary embodiment of the present disclosure. Figure 14B This is a schematic cross-sectional view of a second organic dielectric structure for a display substrate, as described in an exemplary embodiment of this disclosure. Figure 14A and Figure 14B As shown, this embodiment displays the substrate structure and Figure 3 The structures shown are basically the same, except that the first organic medium structure of the first display area and the second organic medium structure of the second display area are different.

[0216] In an exemplary embodiment, a first pixel defining portion 121 and a first spacer portion 131, sequentially stacked along a direction away from the substrate, form a first organic dielectric structure located in the first display area. The first pixel defining portion 121 has a plurality of first pixel openings 31, each exposing at least a portion of the surface of the first anode 111. Each first pixel opening 31 has a first defining side surface 311, which is connected to the surface of the first anode 111 exposed at one end in a third direction Z, and to the surface of the first pixel defining portion 121 on the side away from the substrate at the other end in the third direction Z. The first spacer portion 131 includes a first protrusion 131-2, which is disposed on the surface of the first pixel defining portion 121 on the side away from the substrate 101. The orthographic projection of the first protrusion 131-2 on the substrate 101 lies within the orthographic projection of the surface of the first pixel defining portion 121 on the side away from the substrate 101 on the substrate 101. The orthographic projection of the first protrusion 131-2 on the substrate 101 does not overlap with the orthographic projection of the first defining side surface 311 on the substrate 101. The first protrusion 131-2 is configured to support a mask for evaporating the light-emitting functional layer material in a subsequent process.

[0217] In an exemplary embodiment, the first organic dielectric structure is provided with a first dielectric opening exposing the surface of the first anode 111, and the first dielectric opening has a first dielectric slope angle. Since the orthographic projection of the first septum portion 131 on the substrate is located within the orthographic projection of the surface of the first pixel defining portion 121 away from the substrate on the substrate, the first septum portion 131 does not cover the first defining side 311 of the first pixel opening 31. The first dielectric opening of the first organic dielectric structure is the first pixel opening 31, and the first dielectric slope angle of the first dielectric opening is the first slope angle n1 formed between the plane where the first defining side 311 is located and the plane where the substrate is located.

[0218] In an exemplary embodiment, a second pixel defining portion 122 and a second spacer portion 132, sequentially stacked along a direction away from the substrate, form a second organic dielectric structure located in the second display area. The second pixel defining portion 122 has a plurality of second pixel openings 32, each exposing at least a portion of the surface of the second anode 112. Each second pixel opening 32 has a second defining side surface 321, which is connected to the exposed surface of the second anode 112 at one end in a third direction Z, and to the surface of the second pixel defining portion 122 on the side away from the substrate at the other end in the third direction Z. The second spacer portion 132 includes a second protrusion 132-3, which is disposed on the surface of the second pixel definition portion 122 on the side away from the substrate 101. The orthographic projection of the second protrusion 132-3 on the substrate 101 lies within the orthographic projection of the surface of the second pixel definition portion 122 on the side away from the substrate 101 on the substrate 101. The orthographic projection of the second protrusion 132-3 on the substrate 101 does not overlap with the orthographic projection of the second defining side surface 321 on the substrate 101. The second protrusion 132-3 is configured to support a mask for evaporating the light-emitting functional layer material in a subsequent process.

[0219] In an exemplary embodiment, the second organic dielectric structure is provided with a second dielectric opening exposing the second anode 112, and the second dielectric opening has a second dielectric slope angle. Since the orthographic projection of the second septum portion 132 on the substrate is located within the orthographic projection of the surface of the second pixel defining portion 122 away from the substrate on the substrate, the second septum portion 132 does not cover the second defining side 321 of the second pixel opening 32. The second dielectric opening is the second pixel opening 32, and the second dielectric slope angle of the second dielectric opening is the second slope angle n2 formed between the plane containing the second defining side 321 of the second pixel opening 32 and the plane containing the substrate. The second slope angle n2 and the first slope angle n1 satisfy the relationship: n2 > n1.

[0220] In this embodiment of the present disclosure, the display substrate reduces the reflectivity of light in the second display area 120 by making the second dielectric slope angle (second slope angle n2) of the second display area 120 greater than the first dielectric slope angle (first slope angle n1) of the first display area 110, thereby making the reflectivity of the second display area 120 approximately the same as that of the first display area 110, and reducing the visibility of the second display area 120.

[0221] Figure 15This is a cross-sectional schematic diagram of another display substrate according to an exemplary embodiment of the present disclosure. An exemplary embodiment of the present disclosure provides another display substrate, which includes a display area and a border area surrounding the display area on a plane parallel to the display substrate. The display area may include a first display area and a second display area. The second display area may be located on at least one side of the first display area, and the first display area 110 may also be referred to as a normal display area. The second display area 120 may also be referred to as a light-transmitting display area, which may also be referred to as an under-display camera (FDC) area. Both the light-transmitting display area and the normal display area include multiple sub-pixels, and each sub-pixel includes a light-emitting device, enabling both the normal display area and the light-transmitting display area to display an image. However, this embodiment is not limited in this respect.

[0222] In an exemplary implementation, such as Figure 15 As shown, in a plane perpendicular to the display substrate, the second display area of ​​the display substrate in this embodiment includes a substrate, and a circuit structure layer, a light-emitting structure layer, an encapsulation structure layer, a touch structure layer, and a color filter structure layer sequentially disposed on the substrate. The light-emitting structure layer of the second display area includes a second light-emitting device, which includes a second anode 112, a light-emitting functional layer 14, and a cathode 15 disposed on the circuit structure layer. The color filter structure layer includes a filter layer 182 and a light-blocking layer 181. The light-blocking layer 181 is located between adjacent filter layers 182. The orthographic projection of the filter layer 182 on the substrate overlaps at least partially with the orthographic projection of the light-emitting layer of the second light-emitting device on the substrate. The filter layer 182 is configured to transmit light of a specific color, and the light-blocking layer 181 is configured to block light transmission, preventing crosstalk between adjacent sub-pixels.

[0223] In an exemplary embodiment, the second display area of ​​the display substrate further includes a second organic dielectric structure, in which a second dielectric opening is provided to expose the surface of the second anode 112. The second organic dielectric structure includes a second pixel defining portion 122 and a second spacer portion 132 sequentially stacked along a direction away from the substrate. The second pixel defining portion 122 has a plurality of second pixel openings 32, each exposing at least a portion of the surface of the second anode 112. The second spacer portion 132 is disposed on the surface of the second pixel defining portion 122 on the side away from the substrate 101, and the orthographic projection of the second spacer portion 132 onto the substrate 101 lies within the orthographic projection of the surface of the second pixel defining portion 122 on the side away from the substrate onto the substrate 101. The second pixel opening 32 serves as the second dielectric opening of the second organic dielectric structure.

[0224] In some embodiments, the second pixel defining portion has a second defining side surface, which is connected at one end in the third direction Z to the surface of the second anode exposed by the second pixel opening, and at the other end in the third direction Z to the surface of the second pixel defining portion on the side away from the substrate. The second septum portion at least partially covers the second defining side surface of the second pixel defining portion. Further details are omitted here.

[0225] In an exemplary embodiment, a plurality of first light-transmitting holes 21 are provided in the second organic dielectric structure. The second pixel definition portion 122 within the first light-transmitting hole 21 is etched away, exposing the circuit structure layer. The first light-transmitting holes 21 are filled by the encapsulation structure layer in subsequent processes. The first light-transmitting holes 21 are configured to improve the light transmittance of the second display area 120. The first light-transmitting holes 21 can also be referred to as dielectric light-transmitting holes. The orthographic projection of the second spacer portion 132 on the substrate does not overlap with the orthographic projection of the first light-transmitting hole 21 on the substrate.

[0226] In some embodiments of this disclosure, the structure of the second spacer portion and the second pixel definition portion of the display substrate can be the same as... Figure 3 The structures of the second spacer portion and the second pixel definition portion of the display substrate shown are substantially the same, and will not be described in detail here.

[0227] In an exemplary embodiment, the cathode 15 is provided with a plurality of cathode light-transmitting holes 24. The orthogonal projection of the cathode light-transmitting hole 24 on the substrate covers the orthogonal projection of the first light-transmitting hole 21 on the substrate near the substrate. The distance between the outer contour of the orthogonal projection of the cathode light-transmitting hole 24 on the substrate and the outer contour of the orthogonal projection of the first light-transmitting hole 21 on the substrate near the substrate is e1. The range of e1 is: 0um < e1 ≤ 20um.

[0228] In some embodiments, the orthographic projection of the cathode light-transmitting aperture on the substrate is located within the orthographic projection of the dielectric light-transmitting aperture on the substrate near the substrate side, and the distance between the outer contour of the orthographic projection of the cathode light-transmitting aperture on the substrate and the outer contour of the orthographic projection of the dielectric light-transmitting aperture on the substrate near the substrate side is e1, wherein e1 ranges from 0um to e1 ≤ 20um; or, the orthographic projection of the cathode light-transmitting aperture on the substrate and the orthographic projection of the dielectric light-transmitting aperture on the substrate near the substrate side completely overlap.

[0229] In an exemplary embodiment, a plurality of third light-transmitting holes 23 are provided in the light-blocking layer 181 of the second display area, and the light-blocking layer 181 in the third light-transmitting holes 23 is etched away. The orthogonal projection of the third light-transmitting hole 23 on the substrate overlaps at least partially with the orthogonal projections of the first light-transmitting hole 21 and the cathode light-transmitting hole 24 on the substrate, and the third light-transmitting hole 23 is configured to improve the light transmittance of the second display area 120. The third light-transmitting hole 23 may also be referred to as a color filter light-transmitting hole.

[0230] In an exemplary embodiment, the orthogonal projection of the third light-transmitting hole 23 on the substrate near the substrate is located in the orthogonal projection of the cathode light-transmitting hole 24 on the substrate. The distance between the outer contour of the orthogonal projection of the third light-transmitting hole 23 on the substrate near the substrate and the outer contour of the orthogonal projection of the cathode light-transmitting hole 24 on the substrate is e2, and the range of e2 is: 0um < e1 ≤ 20um.

[0231] In some embodiments, the orthographic projection of the third light-transmitting hole on the substrate near the substrate covers the orthographic projection of the cathode light-transmitting hole on the substrate, and the distance between the outer contour of the orthographic projection of the color filter light-transmitting hole on the substrate near the substrate and the outer contour of the orthographic projection of the cathode light-transmitting hole on the substrate is e2, wherein e2 is in the range of 0um < e2 ≤ 20um; or, the orthographic projection of the color filter light-transmitting hole on the substrate near the substrate and the orthographic projection of the cathode light-transmitting hole on the substrate completely overlap.

[0232] In an exemplary embodiment, the orthographic projection of the third light-transmitting hole 23 on the substrate near the substrate covers the orthographic projection of the first light-transmitting hole 21 on the substrate near the substrate. The distance between the outer contour of the orthographic projection of the third light-transmitting hole 23 on the substrate near the substrate and the outer contour of the orthographic projection of the first light-transmitting hole 21 on the substrate near the substrate is f, and the range of f is: 0um < f ≤ 10um.

[0233] In an exemplary embodiment, the orthographic projection of the third light-transmitting hole near the substrate on the substrate is located within the orthographic projection of the first light-transmitting hole near the substrate on the substrate. The distance between the outer contour of the orthographic projection of the third light-transmitting hole near the substrate on the substrate and the outer contour of the orthographic projection of the first light-transmitting hole near the substrate on the substrate is f, where f is in the range of 0um < f ≤ 20um; or, the orthographic projection of the third light-transmitting hole near the substrate on the substrate completely overlaps with the orthographic projection of the first light-transmitting hole near the substrate on the substrate.

[0234] In this embodiment of the display substrate, the cathode light-transmitting hole 24 and the first light-transmitting hole 21 overlap on the substrate to avoid the cathode blocking the light and improve the light transmittance of the second display area.

[0235] Figure 16 This is a cross-sectional schematic diagram of another display substrate according to an exemplary embodiment of the present disclosure. An exemplary embodiment of the present disclosure provides another display substrate. On a plane parallel to the display substrate, the display substrate includes a display area and a border area surrounding the display area. The display area may include a first display area and a second display area. The second display area may be located on at least one side of the first display area, and the first display area 110 may also be referred to as a normal display area. The second display area 120 may also be referred to as a light-transmitting display area, which may also be referred to as an under-display camera (FDC) area. Both the light-transmitting display area and the normal display area include multiple sub-pixels, and each sub-pixel includes a light-emitting device, enabling both the normal display area and the light-transmitting display area to display an image. However, this embodiment is not limited in this respect.

[0236] In an exemplary implementation, such as Figure 16 As shown, in a plane perpendicular to the display substrate, the second display area of ​​the display substrate in this embodiment includes a substrate 101, and a circuit structure layer, a light-emitting structure layer, an encapsulation structure layer, a touch structure layer, and a color filter structure layer sequentially disposed on the substrate 101. The light-emitting structure layer of the second display area includes a light-emitting device, which includes a second anode 112, a light-emitting functional layer 14, and a cathode 15 disposed on the circuit structure layer. The color filter structure layer includes a filter layer 182 and a light-blocking layer 181. The light-blocking layer 181 is located between adjacent filter layers 182. The orthographic projection of the filter layer 182 on the substrate overlaps at least partially with the orthographic projection of the light-emitting layer of the light-emitting device on the substrate. The filter layer 182 is configured to transmit light of a specific color, and the light-blocking layer 181 is configured to block light transmission, preventing crosstalk between adjacent sub-pixels.

[0237] In an exemplary embodiment, the second display area of ​​the display substrate further includes a second organic dielectric structure, in which a second dielectric opening is provided to expose the surface of the second anode 112. The second organic dielectric structure includes a second pixel defining portion 122 and a second spacer portion 132 sequentially stacked along a direction away from the substrate. The second pixel defining portion 122 has a plurality of second pixel openings 32, each exposing at least a portion of the surface of the second anode 112. The second spacer portion 132 is disposed on the surface of the second pixel defining portion 122 on the side away from the substrate 101, and the orthographic projection of the second spacer portion 132 onto the substrate 101 lies within the orthographic projection of the surface of the second pixel defining portion 122 on the side away from the substrate onto the substrate 101. The second pixel opening 32 serves as the second dielectric opening of the second organic dielectric structure.

[0238] In some embodiments, the second pixel defining portion has a second defining side surface, which is connected at one end in the third direction Z to the surface of the second anode exposed by the second pixel opening, and at the other end in the third direction Z to the surface of the second pixel defining portion on the side away from the substrate. The second septum portion at least partially covers the second defining side surface of the second pixel defining portion. Further details are omitted here.

[0239] In an exemplary embodiment, the second pixel defining portion 122 is provided with a plurality of first light-transmitting holes 21. The second pixel defining portion 122 within the first light-transmitting holes 21 is etched away, exposing the circuit structure layer. The first light-transmitting holes 21 are filled by the encapsulation structure layer in subsequent processes. The first light-transmitting holes 21 are configured to improve the light transmittance of the second display area 120. The first light-transmitting holes 21 can also be referred to as dielectric light-transmitting holes. The orthographic projection of the second spacer portion 132 on the substrate does not overlap with the orthographic projection of the first light-transmitting holes 21 on the substrate.

[0240] In an exemplary embodiment, the cathode 15 is an integral structure that is interconnected, and the cathode 15 covers the side of the first light-transmitting hole 21 and the surface of the circuit structure layer 102 exposed by the first light-transmitting hole 21.

[0241] In an exemplary embodiment, a plurality of third light-transmitting holes 23 are provided in the light-blocking layer 181 of the second display area, and the light-blocking layer 181 in the third light-transmitting holes 23 is etched away. The orthogonal projection of the third light-transmitting hole 23 on the substrate overlaps at least partially with the orthogonal projections of the first light-transmitting hole 21 and the cathode light-transmitting hole 24 on the substrate, and the third light-transmitting hole 23 is configured to improve the light transmittance of the second display area 120. The third light-transmitting hole 23 may also be referred to as a color filter light-transmitting hole.

[0242] In an exemplary embodiment, the distance between the outer contour of the orthographic projection of the third light-transmitting hole 23 of the second display area near the substrate and the outer contour of the orthographic projection of the first light-transmitting hole 21 near the substrate is f, where f ranges from 0µm to 10µm. For example, the orthographic projection of at least one third light-transmitting hole 23 of the second display area near the substrate covers the orthographic projection of the first light-transmitting hole 21 near the substrate, where f ranges from 0µm to 10µm; and / or, the orthographic projection of at least one third light-transmitting hole 23 of the second display area near the substrate is located within the orthographic projection of the first light-transmitting hole 21 near the substrate, where f ranges from 0µm to 10µm; and / or, the orthographic projection of at least one third light-transmitting hole 23 of the second display area near the substrate completely overlaps with the orthographic projection of the first light-transmitting hole 21 near the substrate, where the distance f ranges from f to 0µm.

[0243] Figure 17 This is a planar schematic diagram of another display substrate according to an exemplary embodiment of the present disclosure. In an exemplary embodiment, such as Figure 17 As shown, on a plane parallel to the display substrate, the second display area 120 includes a first sub-display area 41 and a second sub-display area 42. The first sub-display area 41 is rectangular and located in the middle of the second display area 120. The second sub-display area 42 is rectangular and surrounds the first sub-display area 41. Both the first sub-display area 41 and the second sub-display area 42 are provided with a plurality of third light-transmitting holes 23. The sum of the areas of the orthographic projections of all the third light-transmitting holes 23 in the first sub-display area 41 onto the substrate accounts for a larger percentage of the area of ​​the first sub-display area 41 than the sum of the areas of the orthographic projections of all the third light-transmitting holes 23 in the second sub-display area 42 onto the substrate accounts for a larger percentage of the area of ​​the second display area 120. For example, the area of ​​the orthographic projection of the third light-transmitting hole 23 in the first sub-display area 41 onto the substrate is greater than the area of ​​the orthographic projection of the third light-transmitting hole 23 in the second sub-display area 42 onto the substrate; and / or, the density of the third light-transmitting hole 23 in the first sub-display area 41 is greater than the density of the third light-transmitting hole 23 in the second sub-display area 42.

[0244] In some embodiments, the area of ​​the sum of the orthographic projections of all the third light-transmitting holes in the first sub-display area onto the substrate is less than the area of ​​the sum of the orthographic projections of all the third light-transmitting holes in the second sub-display area onto the substrate. Further details are omitted here.

[0245] In this embodiment of the present disclosure, the display substrate has a different area ratio of the third light-transmitting hole 23 in the first sub-display area 41 and the third light-transmitting hole 23 in the second sub-display area 42, so that the light transmittance of the part of the second display area 120 adjacent to the first display area 110 gradually decreases, thereby reducing the visibility of the second display area 120.

[0246] Figure 18 This is a plan view of a first sub-display area and a second sub-display area in another display substrate, as an exemplary embodiment of the present disclosure. In an exemplary embodiment, as... Figure 18 As shown, on a plane parallel to the display substrate, the first sub-display area 41 includes multiple pixel units arranged in a matrix. Each pixel unit may include a first sub-pixel P1, a second sub-pixel P2, a third sub-pixel P3, and a fourth sub-pixel P4. The first sub-pixel P1 may be a red sub-pixel (R) emitting red light, the third sub-pixel P3 may be a blue sub-pixel (B) emitting blue light, and the second and fourth sub-pixels P2 and P4 may be green sub-pixels (G) emitting green light. The four sub-pixels can be arranged in an RGBG pattern. The third light-transmitting aperture 23 is located between some adjacent sub-pixels. The area of ​​the orthographic projection of the third light-transmitting aperture 23 on the substrate in the first sub-display area 41 is the same as the area of ​​the orthographic projection of the third light-transmitting aperture 23 on the substrate in the second sub-display area 42. The density of the third light-transmitting aperture 23 in the first sub-display area 41 is greater than the density of the third light-transmitting aperture 23 in the second sub-display area 42.

[0247] In this embodiment of the present disclosure, the display substrate controls the area ratio of the third light-transmitting holes 23 in the first sub-display area 41 and the second sub-display area 42 to be different by controlling the different densities of the third light-transmitting holes 23 in the first sub-display area 41 and the second sub-display area 42.

[0248] In some embodiments, the density of the third light-transmitting holes in the first sub-display area is the same as the density of the third light-transmitting holes in the second sub-display area, and the area of ​​the orthographic projection of the third light-transmitting holes in the first sub-display area onto the substrate is larger than the area of ​​the orthographic projection of the third light-transmitting holes in the second sub-display area onto the substrate. Alternatively, the density of the third light-transmitting holes in the first sub-display area is greater than the density of the third light-transmitting holes in the second sub-display area, and the area of ​​the orthographic projection of the third light-transmitting holes in the first sub-display area onto the substrate is larger than the area of ​​the orthographic projection of the third light-transmitting holes in the second sub-display area onto the substrate.

[0249] In an exemplary implementation, such as Figure 17As shown, on a plane parallel to the display substrate, the second sub-display area 42 includes a plurality of annular regions arranged sequentially along a direction away from the first sub-display area 41. The plurality of annular regions may include a first annular region 42-1, a second annular region 42-2, and a third annular region 42-3 arranged sequentially along a direction away from the first sub-display area 41. The first annular region 42-1, the second annular region 42-2, and the third annular region 42-3 are all rectangular annular in shape. The first annular region 42-1 is arranged around the first sub-display area 41, the second annular region 42-2 is arranged around the first annular region 42-1, and the third annular region 42-3 is arranged around the second annular region 42-2. Each of the first annular region 42-1, the second annular region 42-2, and the third annular region 42-3 is provided with a plurality of third light-transmitting holes 23. The sum of the areas of the orthographic projections of the third light-transmitting holes 23 on the substrate in the first annular region 42-1 is greater than the sum of the areas of the orthographic projections of the third light-transmitting holes 23 on the substrate in the second annular region 42-2 in the first annular region 42-1; greater than the sum of the areas of the orthographic projections of the third light-transmitting holes 23 on the substrate in the second annular region 42-2 in the first annular region 42-1 in the first annular region 42-1 in the third annular region 42-2 in the first annular region 42-1 in the third annular region 42-3 ...3 in the first annular region 42-1 in the third annular region 42-3 in the third annular region 42-3 in the first annular region 42-1 in the third annular region 42-3 in the first annular region 42-1 in the third annular region 42-1 in the third annular region 42-3 in the first annular region 42-1 in the third annular region 42-1 in the third annular region 42-3 in the first annular region 42-1 in the third annular region 42-1 in the third annular region 42-1 in the third annular region 42-3 in the first annular region 4 For example, the area of ​​the orthographic projection of the third light-transmitting hole 23 in the first annular region 42-1 onto the substrate is greater than the area of ​​the orthographic projection of the third light-transmitting hole 23 in the second annular region 42-2 onto the substrate; the area of ​​the orthographic projection of the third light-transmitting hole 23 in the second annular region 42-2 onto the substrate is greater than the area of ​​the orthographic projection of the third light-transmitting hole 23 in the third annular region 42-3 onto the substrate; and / or, the density of the third light-transmitting holes 23 in the first annular region 42-1 is greater than the density of the third light-transmitting holes 23 in the second annular region 42-2; the density of the third light-transmitting holes 23 in the second annular region 42-2 is greater than the density of the third light-transmitting holes 23 in the third annular region 42-3.

[0250] In exemplary embodiments, the display substrate of this disclosure can be applied to display devices with pixel driving circuits, such as OLED, quantum dot display (QLED), light-emitting diode display (Micro LED or Mini LED) or quantum dot light-emitting diode display (QDLED), etc., and this disclosure does not limit it.

[0251] This disclosure also provides a display device, including any of the display substrates described above. The display device can be any product or component with display functionality, such as a mobile phone, tablet computer, television, monitor, laptop computer, digital photo frame, or navigator; the embodiments of this invention are not limited thereto.

[0252] While the embodiments disclosed herein are as described above, it should be noted that these embodiments are merely exemplary and not restrictive. Therefore, this disclosure is not limited to the specific content shown and described herein. Various modifications, substitutions, or omissions can be made to the form and details of the embodiments without departing from the scope of this disclosure.

Claims

1. A display substrate, characterized in that, It includes a first display area and a second display area, wherein the light transmittance of the second display area is greater than that of the first display area, and the second display area is located on at least one side of the first display area; The display substrate includes: Base; A light-emitting structure layer is disposed on the substrate. The light-emitting structure layer includes a first light-emitting device and a second light-emitting device. The first light-emitting device is located in the first display area and includes a first anode. The second light-emitting device is located in the second display area and includes a second anode. A first organic dielectric structure is located in the first display area. The first organic dielectric structure is provided with a first dielectric opening that exposes at least a portion of the first anode. The first dielectric opening has a first dielectric slope angle. A second organic dielectric structure is located in the second display area. The second organic dielectric structure is provided with a second dielectric opening that exposes at least a portion of the second anode. The second dielectric opening has a second dielectric slope angle, which is greater than the first dielectric slope angle.

2. The display substrate according to claim 1, characterized in that, The slope angle of the second medium is greater than or equal to 15° and less than or equal to 90°.

3. The display substrate according to claim 1, characterized in that, The second organic dielectric structure includes a second pixel defining portion and a second septum portion arranged sequentially along a direction away from the substrate. The second pixel defining portion has a second pixel opening that exposes at least a portion of the second anode, and the second pixel opening has a second defining side that connects to the exposed second anode. The second septum portion is configured to support a mask, and at least a portion of the second septum portion covers the second defining side. The second dielectric slope angle is a third slope angle formed between the plane of the surface of the second septum portion away from the second defining side and the plane of the substrate.

4. The display substrate according to claim 3, characterized in that, A second slope angle is formed between the plane containing the second defined side and the plane containing the base, and the third slope angle is greater than the second slope angle.

5. The display substrate according to claim 3, characterized in that, The distance between the outer contour of the orthographic projection of the first medium opening on the substrate and the outer contour of the orthographic projection of the first anode on the substrate is a, and the distance between the outer contour of the orthographic projection of the second pixel opening on the substrate and the outer contour of the orthographic projection of the second anode on the substrate is b, wherein a and b satisfy the relationship: a > b.

6. The display substrate according to claim 3, characterized in that, The distance between the outer contour of the orthographic projection of the first medium opening on the substrate and the outer contour of the orthographic projection of the first anode on the substrate is a; the distance between the outer contour of the orthographic projection of the second pixel opening on the substrate and the outer contour of the orthographic projection of the second anode on the substrate is b; the distance between the outer contour of the orthographic projection of the second medium opening on the substrate and the outer contour of the orthographic projection of the second pixel opening on the substrate is c; and a, b, and c satisfy the relationship: a = b + c.

7. The display substrate according to claim 3, characterized in that, The second septum portion is in the shape of a grid or a block.

8. The display substrate according to claim 3, characterized in that, The second septum portion includes an inclined portion and a second flat portion. The inclined portion covers the second defined side surface. The side surface of the second medium opening is the surface of the inclined portion away from the second defined side surface of the second pixel opening. The second medium slope angle is a third slope angle formed between the plane of the inclined portion away from the second defined side surface and the plane of the substrate. The second flat portion is disposed on the surface of the second pixel definition portion away from the substrate. The second flat portion extends in a direction parallel to the substrate. The inclined portion is connected to the second anode exposed by the second pixel opening at one end perpendicular to the substrate direction, and the inclined portion is connected to the second flat portion at the other end perpendicular to the substrate direction. The second flat portion is configured to support the mask. Alternatively, the second septum portion includes an inclined portion, a second flat portion, and a second protrusion. The inclined portion covers the second defined side surface. The side surface of the second medium opening is the surface of the inclined portion away from the second defined side surface of the second pixel opening. The second medium slope angle is a third slope angle formed between the plane of the inclined portion away from the second defined side surface and the plane of the substrate. The second flat portion is disposed on the surface of the second pixel definition portion away from the substrate and extends in a direction parallel to the substrate. The inclined portion is connected to the second anode exposed by the second pixel opening at one end perpendicular to the substrate direction and to the second flat portion at the other end perpendicular to the substrate direction. The second protrusion is disposed on the surface of the second flat portion away from the substrate. The orthographic projection of the second protrusion on the substrate is located within the orthographic projection of the second flat portion on the substrate. The second protrusion is configured to support the mask.

9. The display substrate according to claim 1, characterized in that, The second organic dielectric structure includes a second pixel defining portion and a second septum portion arranged sequentially along a direction away from the substrate. The second pixel defining portion has a second pixel opening that exposes at least a portion of the second anode. The second pixel opening has a second defining side surface connected to the exposed second anode. The second septum portion is configured to support a mask. The orthographic projection of the second septum portion on the substrate is located in the orthographic projection of the surface of the second pixel defining portion away from the substrate on the substrate. The second dielectric slope angle is a second slope angle formed between the plane containing the second defining side surface and the plane containing the substrate.

10. The display substrate according to any one of claims 1 to 9, characterized in that, The second light-emitting device further includes a cathode, which is disposed on the side of the second organic dielectric structure away from the substrate. The cathode has a cathode light-transmitting hole, and the second organic dielectric structure has a dielectric light-transmitting hole. The orthographic projection of the cathode light-transmitting hole on the substrate covers the orthographic projection of the dielectric light-transmitting hole on the substrate near the substrate. The distance between the outer contour of the orthographic projection of the cathode light-transmitting hole on the substrate and the outer contour of the orthographic projection of the dielectric light-transmitting hole on the substrate near the substrate is e1, and the range of e1 is: 0um < e1 ≤ 20um. Alternatively, the orthographic projection of the cathode light-transmitting hole on the substrate is located in the orthographic projection of the dielectric light-transmitting hole on the substrate near the substrate side, and the distance between the outer contour of the orthographic projection of the cathode light-transmitting hole on the substrate and the outer contour of the orthographic projection of the dielectric light-transmitting hole on the substrate near the substrate side is e1, and the range of e1 is: 0um < e1 ≤ 20um. Alternatively, the orthographic projection of the cathode light-transmitting hole on the substrate completely overlaps with the orthographic projection of the dielectric light-transmitting hole on the substrate from the side closest to the substrate.

11. The display substrate according to any one of claims 1 to 9, characterized in that, It also includes a color filter structure layer, which is disposed on the side of the light-emitting structure layer away from the substrate. The color filter structure layer includes a light-blocking layer located in the first display area and the second display area. A color filter light-transmitting hole is disposed in the light-blocking layer located in the second display area. The second light-emitting device also includes a cathode, which is disposed on the side of the second organic dielectric structure away from the substrate. The cathode is provided with a cathode light-transmitting hole. The orthographic projection of the color filter light-transmitting hole on the substrate near the substrate covers the orthographic projection of the cathode light-transmitting hole on the substrate. The distance between the outer contour of the orthographic projection of the color filter light-transmitting hole on the substrate near the substrate and the outer contour of the orthographic projection of the cathode light-transmitting hole on the substrate is e2, and the range of e2 is: 0um < e2 ≤ 20um. Alternatively, the orthographic projection of the color filter aperture on the substrate near the substrate is located in the orthographic projection of the cathode aperture on the substrate, and the distance between the outer contour of the orthographic projection of the color filter aperture on the substrate near the substrate and the outer contour of the orthographic projection of the cathode aperture on the substrate is e2, wherein the range of e2 is: 0um < e1 ≤ 20um; Alternatively, the orthographic projection of the color filter aperture on the substrate near the substrate completely overlaps with the orthographic projection of the cathode aperture on the substrate.

12. The display substrate according to any one of claims 1 to 9, characterized in that, It also includes a color filter structure layer, which is disposed on the side of the light-emitting structure layer away from the substrate. The color filter structure layer includes a light-blocking layer located in the first display area and the second display area. A color filter light-transmitting hole is disposed in the light-blocking layer located in the second display area. A second organic dielectric structure is disposed in a dielectric light-transmitting hole. The orthographic projection of the side of the color filter light-transmitting hole near the substrate on the substrate overlaps the orthographic projection of the side of the dielectric light-transmitting hole near the substrate on the substrate. The outer contour of the orthographic projection of the side of the color filter light-transmitting hole near the substrate on the substrate and the outer contour of the orthographic projection of the side of the dielectric light-transmitting hole near the substrate on the substrate are within a certain range. The spacing is f, where f is in the range of 0um < f ≤ 10um; or, the orthographic projection of the color filter aperture near the substrate on the substrate is located within the orthographic projection of the medium aperture near the substrate on the substrate, and the spacing between the outer contour of the orthographic projection of the color filter aperture near the substrate on the substrate and the outer contour of the orthographic projection of the medium aperture near the substrate on the substrate is f, where f is in the range of 0um < f ≤ 10um; or, the orthographic projection of the color filter aperture near the substrate on the substrate and the orthographic projection of the medium aperture near the substrate on the substrate completely overlap.

13. The display substrate according to any one of claims 1 to 9, characterized in that, The second organic dielectric structure is provided with a dielectric light-transmitting hole, and the second light-emitting device further includes a cathode. The cathode is disposed on the side of the second organic dielectric structure away from the substrate, and the orthogonal projection of the cathode on the substrate covers the orthogonal projection of the dielectric light-transmitting hole on the substrate.

14. The display substrate according to any one of claims 1 to 9, characterized in that, It also includes a color filter structure layer, which is disposed on the side of the light-emitting structure layer away from the substrate. The color filter structure layer includes a light-blocking layer located in the first display area and the second display area. The light-blocking layer in the second display area has a plurality of color filter light-transmitting holes. The second display area includes a first sub-display area and a second sub-display area. The first sub-display area is block-shaped, and the second sub-display area is ring-shaped. The second sub-display area is disposed around the perimeter of the first sub-display area. The area ratio of the sum of the areas of the orthogonal projections of the color filter light-transmitting holes in the first sub-display area onto the substrate is greater than the area ratio of the sum of the areas of the orthogonal projections of the color filter light-transmitting holes in the second sub-display area onto the substrate.

15. The display substrate according to claim 14, characterized in that, The area of ​​the orthographic projection of the light-transmitting hole of the color filter in the first sub-display area onto the substrate is greater than the area of ​​the orthographic projection of the light-transmitting hole of the color filter in the second sub-display area onto the substrate; and / or, the density of the light-transmitting holes of the color filter in the first sub-display area is greater than the density of the light-transmitting holes of the color filter in the second sub-display area.

16. The display substrate according to claim 14, characterized in that, The second sub-display area includes a plurality of annular regions arranged sequentially along a direction away from the first sub-display area. The sum of the areas of the orthographic projections of the color filter light-transmitting holes in the plurality of annular regions is a percentage of the area of ​​the annular region where the color filter light-transmitting holes are located, decreasing sequentially along a direction away from the first sub-display area.

17. The display substrate according to claim 16, characterized in that, The area of ​​the light-transmitting holes of the color filter in the plurality of annular regions projected onto the substrate decreases sequentially along the direction away from the first sub-display area; and / or, the density of the light-transmitting holes of the color filter in the plurality of annular regions decreases sequentially along the direction away from the first sub-display area.

18. The display substrate according to any one of claims 1 to 9, characterized in that, It also includes a touch structure layer, which is disposed on the side of the light-emitting structure layer away from the substrate. The touch structure layer is located in the first display area and the second display area. The touch structure layer located in the second display area is provided with a touch light-transmitting hole. The second organic medium structure is provided with a medium light-transmitting hole. The orthographic projection of the touch light-transmitting hole on the substrate overlaps at least partially with the orthographic projection of the medium light-transmitting hole on the substrate.

19. The display substrate according to any one of claims 1 to 9, characterized in that, The first organic dielectric structure includes a first pixel defining portion and a first septum portion arranged sequentially along a direction away from the substrate. The first pixel defining portion is provided with a first pixel opening that exposes at least a portion of the first anode. The first pixel opening has a first defining side surface connected to the exposed first anode. The first septum portion is configured to support a mask. The orthographic projection of the first septum portion on the substrate is located in the orthographic projection of the surface of the first pixel defining portion away from the substrate on the substrate. The first dielectric opening is the first pixel opening. The first dielectric slope angle is a first slope angle formed between the plane containing the first defining side surface and the plane containing the substrate.

20. The display substrate according to any one of claims 1 to 9, characterized in that, The distance between the outer contour of the orthographic projection of the first medium opening on the substrate and the outer contour of the orthographic projection of the first anode on the substrate is 'a', and the range of 'a' is: 0.5um ≤ a ≤ 6um.

21. A display substrate, characterized in that, It includes a first display area and a second display area, wherein the light transmittance of the second display area is greater than that of the first display area, and the second display area is located on at least one side of the first display area; The display substrate includes: Base; A light-emitting structure layer is disposed on the substrate. The light-emitting structure layer includes a first light-emitting device and a second light-emitting device. The first light-emitting device is located in the first display area, and the second light-emitting device is located in the second display area. The second light-emitting device includes a second anode. A second organic dielectric structure is located in the second display area, and the second organic dielectric structure is provided with a second dielectric opening that exposes at least a portion of the second anode. The second light-emitting device further includes a cathode disposed on the side of the second organic dielectric structure away from the substrate. The cathode is provided with a cathode light-transmitting hole, and the second organic dielectric structure is provided with a dielectric light-transmitting hole. At least a portion of the orthographic projection of the cathode light-transmitting hole on the substrate overlaps with the orthographic projection of the dielectric light-transmitting hole on the substrate.

22. The display substrate according to claim 21, characterized in that, The orthographic projection of the cathode light-transmitting hole on the substrate covers the orthographic projection of the dielectric light-transmitting hole on the substrate near the substrate side. The distance between the outer contour of the orthographic projection of the cathode light-transmitting hole on the substrate and the outer contour of the orthographic projection of the dielectric light-transmitting hole on the substrate near the substrate side is e1, and the range of e1 is: 0um < e1 ≤ 20um. Alternatively, the orthographic projection of the cathode light-transmitting hole on the substrate is located in the orthographic projection of the dielectric light-transmitting hole on the substrate near the substrate side, and the distance between the outer contour of the orthographic projection of the cathode light-transmitting hole on the substrate and the outer contour of the orthographic projection of the dielectric light-transmitting hole on the substrate near the substrate side is e1, and the range of e1 is: 0um < e1 ≤ 20um. Alternatively, the orthographic projection of the cathode light-transmitting hole on the substrate completely overlaps with the orthographic projection of the dielectric light-transmitting hole on the substrate from the side closest to the substrate.

23. The display substrate according to claim 21, characterized in that, It also includes a color filter structure layer, which is disposed on the side of the light-emitting structure layer away from the substrate. The color filter structure layer includes a light-blocking layer located in the second display area. A color filter light-transmitting hole is disposed in the light-blocking layer of the second display area. The orthographic projection of the color filter light-transmitting hole on the substrate overlaps with at least a portion of the orthographic projections of the dielectric light-transmitting hole and the cathode light-transmitting hole on the substrate.

24. The display substrate according to claim 23, characterized in that, The orthographic projection of the color filter aperture on the substrate near the substrate covers the orthographic projection of the cathode aperture on the substrate. The distance between the outer contour of the orthographic projection of the color filter aperture on the substrate near the substrate and the outer contour of the orthographic projection of the cathode aperture on the substrate is e2, and the range of e2 is: 0um < e2 ≤ 20um. Alternatively, the orthographic projection of the color filter aperture on the substrate near the substrate is located in the orthographic projection of the cathode aperture on the substrate, and the distance between the outer contour of the orthographic projection of the color filter aperture on the substrate near the substrate and the outer contour of the orthographic projection of the cathode aperture on the substrate is e2, wherein the range of e2 is: 0um < e1 ≤ 20um; Alternatively, the orthographic projection of the color filter aperture on the substrate near the substrate completely overlaps with the orthographic projection of the cathode aperture on the substrate.

25. The display substrate according to claim 23, characterized in that, The orthographic projection of the color filter's light-transmitting aperture near the substrate on the substrate covers the orthographic projection of the medium's light-transmitting aperture near the substrate on the substrate. The distance between the outer contour of the orthographic projection of the color filter's light-transmitting aperture near the substrate on the substrate and the outer contour of the orthographic projection of the medium's light-transmitting aperture near the substrate on the substrate is f, where f ranges from 0µm to 10µm. Alternatively, the orthographic projection of the color filter's light-transmitting aperture near the substrate on the substrate is located within the orthographic projection of the medium's light-transmitting aperture near the substrate on the substrate. The distance between the outer contour of the orthographic projection of the color filter's light-transmitting aperture near the substrate on the substrate and the outer contour of the orthographic projection of the medium's light-transmitting aperture near the substrate on the substrate is f, where f ranges from 0µm to 10µm. Alternatively, the orthographic projection of the color filter's light-transmitting aperture near the substrate on the substrate and the orthographic projection of the medium's light-transmitting aperture near the substrate on the substrate completely overlap.

26. A display substrate, characterized in that, It includes a first display area and a second display area, wherein the light transmittance of the second display area is greater than that of the first display area, and the second display area is located on at least one side of the first display area; The display substrate includes: Base; A light-emitting structure layer is disposed on the substrate. The light-emitting structure layer includes a first light-emitting device and a second light-emitting device. The first light-emitting device is located in the first display area, and the second light-emitting device is located in the second display area. The second light-emitting device includes a second anode. A second organic dielectric structure is located in the second display area. The second organic dielectric structure is provided with a second dielectric opening that exposes at least a portion of the second anode, and the second organic dielectric structure is provided with a dielectric light-transmitting hole. A color filter structure layer is disposed on the side of the light-emitting structure layer away from the substrate. The color filter structure layer includes a light-blocking layer located in the second display area. A color filter light-transmitting hole is disposed in the light-blocking layer of the second display area. At least a portion of the orthographic projection of the color filter light-transmitting hole on the substrate overlaps with the orthographic projection of the dielectric light-transmitting hole on the substrate. The second display area includes multiple sub-display areas, and the sum of the areas of the orthographic projections of the color filter light-transmitting holes on the substrate in adjacent sub-display areas has different proportions in the area of ​​the sub-display area where the color filter light-transmitting holes are located.

27. The display substrate according to claim 26, characterized in that, The second display area includes a first sub-display area and a second sub-display area. The first sub-display area is block-shaped, and the second sub-display area is ring-shaped. The second sub-display area is arranged around the first sub-display area. The area ratio of the sum of the areas of the orthogonal projections of the color filter light-transmitting holes in the first sub-display area onto the substrate is greater than the area ratio of the sum of the areas of the orthogonal projections of the color filter light-transmitting holes in the second sub-display area onto the substrate.

28. The display substrate according to claim 27, characterized in that, The area of ​​the orthographic projection of the light-transmitting hole of the color filter in the first sub-display area onto the substrate is greater than the area of ​​the orthographic projection of the light-transmitting hole of the color filter in the second sub-display area onto the substrate; and / or, the density of the light-transmitting holes of the color filter in the first sub-display area is greater than the density of the light-transmitting holes of the color filter in the second sub-display area.

29. The display substrate according to claim 27, characterized in that, The second sub-display area includes a plurality of annular regions arranged sequentially along a direction away from the first sub-display area, wherein the area of ​​the orthogonal projection of the color filter light-transmitting hole on the substrate in the plurality of annular regions decreases sequentially along a direction away from the first sub-display area; and / or, the density of the color filter light-transmitting hole in the plurality of annular regions decreases sequentially along a direction away from the first sub-display area.

30. A display device, characterized in that, Includes the display substrate as described in any one of claims 1 to 29.

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