Annular liftable electroplating production line

By installing triggers and cover plates on the cross arm of the circular liftable electroplating production line, and using detectors to control the movement of the cover plates, the safety hazards and poor contact problems caused by the exposure of conductive plates are solved, achieving higher safety and electroplating quality.

CN223852817UActive Publication Date: 2026-01-30NANTONG CHUJIE ELECTRONIC EQUIP CO LTD
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Patent Information

Application Number
CN202423023185.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-09
Publication Date
2026-01-30
Estimated Expiration
2034-12-09

AI Technical Summary

Technical Problem

The conductive plates of existing ring-shaped liftable electroplating production lines are exposed, which can easily increase safety hazards when electroplating liquid splashes, and may also lead to poor conductive contact.

Method used

A trigger and a cover plate are installed on the cross arm. The position of the trigger is detected by a detector to control the movement of the cover plate. The cover plate is covered to prevent electroplating liquid from splashing and exposed when the power is applied to reduce dust accumulation.

Benefits of technology

It improves the safety performance of the electroplating production line, reduces the risk of poor contact between conductive contacts and conductive plates, and enhances electroplating quality.

✦ Generated by Eureka AI based on patent content.

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    Figure CN223852817U_ABST
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Abstract

The utility model provides an annular liftable electroplating production line, comprising: a lifting arm mechanism comprising a liftable cross arm, the cross arm being provided with a conductive contact member and a trigger member which are arranged at an interval along the axial direction; the electroplating bath is arranged below the cross arm, and one side of the electroplating bath is provided with a conductive plate located below the conductive contact piece; and the covering device comprises a covering plate, a driving mechanism, a detector and a controller, the covering plate is movably arranged above the conductive plate in the axial direction of the cross arm, the detector is used for detecting whether the trigger piece moves downwards to a set position or not, and the controller is used for controlling the driving mechanism to drive the covering plate to move according to a detection result of the detector. According to the annular liftable electroplating production line, electroplating liquid and other liquid are prevented from splashing to the current-conducting plate, the safety performance of the electroplating production line is improved, meanwhile, the covering plate can reduce the accumulation amount of dust on the current-conducting plate, the risk of poor contact between the current-conducting contact piece and the current-conducting plate is reduced, and the electroplating quality is improved.
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Description

TECHNICAL FIELD

[0001] The utility model relates to electroplating equipment technical field generally, especially ring-shaped liftable electroplating production line. BACKGROUND

[0002] The ring-shaped liftable electroplating production line is favored by more and more users due to its advantages of high stability and small size. For example, a vertical electroplating production line is disclosed in Chinese patent (CN221398114U), which comprises a ring-shaped conveying chain, multiple lifting frames and multiple electroplating tanks. The multiple lifting frames are installed along the outer circumferential direction of the ring-shaped conveying chain, and the multiple electroplating tanks are arranged around the ring-shaped conveying chain. The working process is as follows: the workpiece is clamped and fixed on the hanger, and then moved to the electroplating tank through the ring-shaped conveying chain and the lifting frame. When the horizontal arm is driven to move downward by the lifting frame, the support rod and the clamping rod at the end of the horizontal arm will respectively drive the hanger and the horizontal plate to slide downward into the electroplating tank, and then electroplating is completed in the electroplating tank. After electroplating is completed, the hanger is moved upward by the lifting frame to leave the electroplating tank, and is conveyed to the next station by the ring-shaped conveying chain. Among them, the ring-shaped liftable electroplating production line is provided with a conductive plate on one side of each electroplating tank close to the ring-shaped conveying chain, and the horizontal arm on the lifting frame is provided with a conductive brush. When the lifting frame moves the hanger downward into the corresponding electroplating tank, the conductive brush contacts the conductive plate to supply power to the hanger.

[0003] The above-mentioned existing conductive plate is exposed for the convenience of contacting the conductive brush. However, when foreign matter falls into the electroplating tank, the electroplating liquid will splash onto the conductive plate, increasing the safety hazard of the ring-shaped liftable electroplating production line. UTILITY MODEL CONTENT

[0004] In view of the above-mentioned defects or deficiencies in the prior art, it is desirable to provide a ring-shaped liftable electroplating production line.

[0005] The present application provides a ring-shaped liftable electroplating production line, which comprises:

[0006] The lifting arm mechanism comprises a vertical column and a horizontal arm. The horizontal arm is arranged in the vertical column in a liftable manner. The horizontal arm is provided with a conductive contact piece and a trigger piece arranged in an axial direction.

[0007] The electroplating tank is arranged below the horizontal arm. One side of the electroplating tank is provided with a conductive plate located below the conductive contact piece.

[0008] The covering device comprises a covering plate, a driving mechanism, a detector and a controller. The covering plate is movably arranged above the conductive plate in the axial direction of the horizontal arm. The driving mechanism is drivingly connected with the covering plate. The detector is arranged above the covering plate to detect whether the trigger piece moves downward to a set position. The controller is connected with the driving mechanism and the detector, respectively. The controller is used to control the driving mechanism to drive the covering plate to move according to the detection result of the detector.

[0009] Further, the trigger is a trigger rod, a bottom end of the trigger rod is lower than the conductive contact, the cover plate is provided with an avoiding slot through which the trigger rod passes, and the avoiding slot extends along an axial direction of the cross arm.

[0010] Further, in the vertical direction, the avoiding slot and the conductive contact are staggered.

[0011] Further, a bottom of the cover plate is provided with a cleaning brush, the cleaning brush cleans the conductive plate when the cover plate moves.

[0012] Further, the covering device further comprises a mounting seat, the mounting seat is arranged in the electroplating tank, the cover plate is slidingly arranged in the mounting seat, and the driving mechanism is arranged in the mounting seat.

[0013] Further, the detector is an infrared detection module.

[0014] Further, an outer end of the cross arm is provided with a hanger carrier, and the trigger is located on a side of the conductive contact close to the hanger carrier.

[0015] The annular liftable electroplating production line provided by the embodiment of the application can realize covering and protection of the conductive plate, prevent the electroplating liquid and other liquids from splashing onto the conductive plate, improve the safety performance of the electroplating production line, and reduce the accumulation of dust on the conductive plate, reduce the risk of poor contact between the conductive contact and the conductive plate, and improve the electroplating quality. BRIEF DESCRIPTION OF DRAWINGS

[0016] Other features, objects and advantages of the application will become more apparent from the following detailed description of non-limiting embodiments, made with reference to the accompanying drawings:

[0017] Figure 1 Part of the schematic diagram of the annular liftable electroplating production line provided by the embodiment of the application;

[0018] Figure 2 For Figure 1 The local enlarged view of the structure shown in the figure. DETAILED DESCRIPTION

[0019] The application will be further described in detail below with reference to the accompanying drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the related utility model, and are not a limitation on the utility model. In addition, it should be noted that, in order to facilitate the description, only the parts related to the utility model are shown in the drawings.

[0020] It should be noted that the embodiments in the present application and the features in the embodiments can be combined with each other in the case of no conflict. The present application will be described in detail below with reference to the drawings and in combination with the embodiments.

[0021] Please refer to the accompanying Figures 1-2 The embodiment of the present application provides a kind of annular liftable electroplating production line, annular liftable electroplating production line includes rack, annular chain type conveying mechanism, multiple lifting arm mechanisms 300 and multiple electroplating tanks 100, annular chain type conveying mechanism is arranged in rack, multiple lifting arm mechanisms 300 are arranged in the annular chain type conveying mechanism and are spaced along the circumferential direction of annular chain type conveying mechanism, multiple electroplating tanks 100 are arranged in the outer periphery of the rack.Hanger can be hung on lifting arm mechanism 300, lifting arm mechanism 300 carries out annular motion under the conveying of annular chain type conveying mechanism to sequentially transport hanger into each electroplating tank 100.Lifting arm mechanism 300 includes column 320 and cross arm 310, column 320 is vertically installed on annular chain type conveying mechanism, the outer end of cross arm 310 is equipped with hanger seat and hanger seat is used to hang up carrier, and cross arm 310 is liftablely arranged in column 320 to drive hanger to move up and down.Cross arm 310 is equipped with electrically conductive contact piece 340 and trigger piece 330 spaced along the axial direction.Electroplating tank 100 is located below cross arm 310, and each electroplating tank 100 is equipped with electrically conductive plate 200 below electrically conductive contact piece 340 close to the side of rack, electrically conductive plate 200 is electrically connected with hanger seat, and the electrically conductive connection of electrically conductive contact piece 340 and electrically conductive plate 200 is realized when they contact, to realize the power-on of hanger.Every electrically conductive plate 200 is correspondingly equipped with covering device 400, covering device 400 includes covering plate 410, drive mechanism, detector 500 and controller, covering plate 410 is movably arranged above electrically conductive plate 200 along the axial direction of cross arm 310, drive mechanism is drivingly connected with covering plate 410, detector 500 is arranged above covering plate 410 to detect whether trigger piece 330 moves down to set position, controller is connected with drive mechanism and detector 500 respectively, and controller is used to control drive mechanism to drive covering plate 410 to move according to the detection result of detector 500.Specifically, covering plate 410 has covering position and avoiding position and can be switched between covering position and avoiding position, and controller is used to control drive mechanism to drive covering plate 410 to move between covering position and avoiding position.

[0022] The lifting arm mechanism 300 can be sequentially moved to the upper side of the plurality of electroplating tanks 100 under the conveying of the ring chain conveying mechanism, and the cross arm 310 is lowered to immerse the hanger into the electroplating solution of the electroplating tank 100 when being moved to the upper side of the corresponding electroplating tank 100. During the lowering of the cross arm 310, the trigger piece 330 is lowered to the set position so as to be detected by the detector 500, and the controller controls the cover plate 410 to switch from the covering position to the avoiding position to expose the conductive plate 200 when the detector 500 detects the trigger piece 330, and then the conductive contact piece 340 is in contact with the conductive plate 200 to realize the electrification of the hanger. After the electroplating work of the current electroplating tank 100 is completed, the cross arm 310 is raised to reset, and then is moved to the upper side of the next electroplating tank 100. During the raising of the cross arm 310 to reset, the conductive contact piece 340 and the conductive plate 200 are separated, the trigger piece 330 is away from the set position so that the detector 500 does not detect the trigger piece 330, and the controller controls the cover plate 410 to switch from the avoiding position to the covering position to cover the conductive plate 200 when the detector 500 does not detect the trigger piece 330.

[0023] In the embodiment, the cover plate 410 can cover the conductive plate 200 in the non-electrification period and expose the conductive plate 200 in the electrification period, so as to realize the covering protection of the conductive plate 200, prevent the liquid such as the electroplating solution from splashing to the conductive plate 200, and improve the safety performance of the electroplating production line. Meanwhile, the cover plate 410 can also reduce the accumulation amount of dust on the conductive plate 200, reduce the risk of poor contact between the conductive contact piece 340 and the conductive plate 200, and improve the electroplating quality.

[0024] Preferably, the set position is located above the cover plate 410, and the height difference between the set position and the cover plate 410 is preferably between 10-30 cm. The detector 500 is preferably an infrared detection module, which has high detection accuracy and low cost.

[0025] Preferably, the trigger piece 330 is located on the side of the conductive contact piece 340 close to the hanger seat.

[0026] Preferably, the driving mechanism is a pneumatic cylinder or an electric push rod. The controller is preferably a single-chip microcomputer or other controller.

[0027] Preferably, the inner end of the cross arm 310 is provided with a sleeve and is arranged on the outer periphery of the vertical column 320 through the sleeve, and the shape of the sleeve is matched with the shape of the vertical column 320.

[0028] It should be understood that the ring chain conveying mechanism is a general structure in the art, and will not be described herein.

[0029] In some embodiments of the present application, the trigger 330 is a trigger rod, the bottom end of the trigger rod is lower than the conductive contact 340, the cover plate 410 is provided with an avoiding slot 412 through which the trigger rod passes, and the avoiding slot 412 extends along the axial direction of the cross arm 310. In this way, when the trigger rod reaches the set position, there is still a distance between the conductive contact 340 and the conductive plate 200, and when the cross arm 310 continues to move downward, the trigger rod passes through the cover plate 410 through the avoiding slot 412, avoiding the interference of the trigger rod with the position switching of the cover plate 410.

[0030] Preferably, in the vertical direction, the avoiding slot 412 and the conductive contact 340 are staggered to avoid the liquid falling on the top surface of the conductive plate 200 through the avoiding slot 412 from being staggered with the contact position of the conductive contact 340 on the conductive plate 200.

[0031] In some embodiments of the present application, the bottom of the cover plate 410 is provided with a cleaning brush, which cleans the conductive plate 200 when the cover plate 410 moves, so as to improve the cleanliness of the top surface of the conductive plate 200 and improve the conductive contact performance between the conductive plate 200 and the conductive contact 340.

[0032] In some embodiments of the present application, the covering device 400 further comprises a mounting seat, the mounting seat is arranged in the electroplating tank 100, the cover plate 410 is slidingly arranged in the mounting seat, and the driving mechanism is arranged in the mounting seat.

[0033] Preferably, the mounting seat comprises a first mounting side plate 420, a second mounting side plate 430 arranged in parallel, and a third mounting side plate 440 connected between the first mounting side plate 420 and the second mounting side plate 430, and the conductive plate 200 is located between the first mounting side plate 420 and the second mounting side plate 430. A sliding groove 450 extending along the axial direction of the cross arm 310 is arranged between the first mounting side plate 420 and the second mounting side plate 430, and the cover plate 410 is provided with two sliding blocks 411, the two sliding blocks 411 are respectively inserted into the two sliding grooves 450, the sliding blocks 411 and the sliding grooves 450 are in sliding fit, the driving mechanism is two and is respectively located outside the first mounting side plate 420 and the second mounting side plate 430, and the two driving mechanisms are drivingly connected with the two sliding blocks 411 respectively. The infrared detection module comprises an infrared emitter and an infrared receiver, and the infrared emitter and the infrared receiver are arranged at the top end of the first mounting side plate 420 and the second mounting side plate 430 respectively.

[0034] It should be understood that the above-mentioned terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application; the orientation terms "inner" and "outer" refer to the inner and outer of the contour of each component itself. In addition, the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features limited by "first" and "second" can explicitly or implicitly include one or more of the features.

[0035] For the convenience of description, spatial relative terms such as "over", "above", "upper surface", "upper", etc. can be used to describe the spatial positional relationship of one device or feature with other devices or features as shown in the drawings. It should be understood that the spatial relative terms are intended to include different orientations in use or operation in addition to the orientation of the devices described in the drawings. For example, if the devices in the drawings are inverted, the device described as "above" or "over" other devices or structures will be positioned "below" or "under" other devices or structures. Thus, the exemplary term "above" can include both "above" and "below" orientations. The device can also be positioned 90 degrees or in other orientations in other different ways, and the spatial relative descriptions used herein are interpreted accordingly.

[0036] The above description is only the preferred embodiment of the present application and the explanation of the technical principles applied. Those skilled in the art should understand that the scope of the utility model involved in the present application is not limited to the technical solutions formed by the specific combination of the above technical features, and should also cover other technical solutions formed by any combination of the above technical features or their equivalent features without departing from the utility model concept. For example, the technical solutions formed by mutually replacing the above features with the technical features disclosed in the present application (but not limited to) having similar functions.

Claims

1. A ring-shaped, vertically movable electroplating production line, characterized in that, The application relates to a vertical electroplating device. The vertical electroplating device comprises a lifting arm mechanism, an electroplating tank and a covering device. The lifting arm mechanism comprises a vertical column and a horizontal arm, the horizontal arm is arranged on the vertical column in a lifting manner, the horizontal arm is provided with electrically-conductive contact pieces and a trigger piece arranged in an axial direction; The electroplating tank is arranged below the horizontal arm, one side of the electroplating tank is provided with an electrically-conductive plate below the electrically-conductive contact pieces; 2. The ring-shaped, vertically movable electroplating line according to claim 1, characterized in that The covering device comprises a covering plate, a driving mechanism, a detector and a controller, the covering plate is arranged above the electrically-conductive plate in an axial direction of the horizontal arm, the driving mechanism is in driving connection with the covering plate, the detector is arranged above the covering plate to detect whether the trigger piece is lowered to a set position, the controller is connected with the driving mechanism and the detector respectively, and the controller is used for controlling the driving mechanism to drive the covering plate to move according to the detection result of the detector.

3. The ring-shaped, vertically movable electroplating line according to claim 2, characterized in that The trigger piece is a trigger rod, the bottom end of the trigger rod is lower than the electrically-conductive contact pieces, the covering plate is provided with an avoiding slot for the trigger rod to pass through, and the avoiding slot is arranged in an axial direction of the horizontal arm.

4. The ring-shaped, vertically movable electroplating line according to claim 1, characterized in that In a vertical direction, the avoiding slot and the electrically-conductive contact pieces are arranged in a staggered mode.

5. The ring-shaped, vertically movable electroplating line according to claim 1, characterized in that The bottom of the covering plate is provided with a cleaning brush, the cleaning brush is used for cleaning the electrically-conductive plate when the covering plate moves.

6. The ring-shaped, vertically movable electroplating line according to claim 1, characterized in that The covering device further comprises a mounting base, the mounting base is arranged on the electroplating tank, the covering plate is arranged on the mounting base in a sliding mode, and the driving mechanism is arranged on the mounting base.

7. The ring-shaped, vertically movable electroplating line according to claim 1, characterized in that The detector is an infrared detection module. The outer end of the horizontal arm is provided with a hanger carrier, and the trigger piece is arranged on the side of the electrically-conductive contact pieces close to the hanger carrier.

Citation Information

Patent Citations

  • Vertical electroplating production line

    CN221398114U