Mask tension device for nanoimprint

Abstract

The utility model relates to the field of nanoimprint, and particularly discloses a nanoimprint mask tension device which comprises an operation table, a tension mechanism is arranged at the top of the operation table, the tension mechanism comprises a sealing plate, a first clamping plate is fixedly arranged on one side of the sealing plate, and a traveling rail set is fixedly arranged on the other side of the sealing plate. A second clamping plate is movably connected to the traveling rail set, a plurality of elastic pieces are evenly arranged on the side wall of the second clamping plate, and one end of each elastic piece is fixedly connected to the side wall of the fixing plate; by means of the tension mechanism, the tension of the mask can be changed in the rolling process, force is evenly distributed on the second clamping plate through elastic stretching of the elastic piece, it can be guaranteed that the mask is kept flat and stable in the imprinting process, and therefore the imprinting precision and consistency are improved, and an imprinting product with higher quality is obtained; the improved mask tension device can reduce the adjustment and operation time and improve the speed of the imprinting process, so that the production efficiency is increased and the production cost is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to the field of nanoimprint, especially to a mask tension device for nanoimprint. BACKGROUND

[0002] Imprinting is essentially a printing duplication technology, which is a technology for mass copying of templates. Imprinting technology processing technology can be divided into nanoimprint technology and mold pressing technology according to the size of the pattern. The initially proposed nanoimprint technology is thermal nanoimprint technology and room temperature nanoimprint technology.

[0003] In nanoimprint, the mask tension device is an important technology for ensuring the stability and accuracy of the mask during the imprinting process. This device usually includes a mechanical structure for controlling the mask tension and a sensor, which functions to maintain the flatness and stability of the mask during the imprinting process, thereby ensuring that the resulting imprinting result has high quality and accuracy. Some devices cannot maintain stable tension during long-term use or the imprinting process, which may cause changes in the position or shape of the mask, affecting the consistency of the imprinting result. Some control devices are only suitable for specific sizes or types of masks, limiting their flexibility and applicability in different imprinting applications. Some devices are too complex to operate and require special training, increasing the workload of the operators.

[0004] Therefore, there is an urgent need for a mask tension device for nanoimprint to solve the above problems. SUMMARY

[0005] The utility model aims at solving the shortcomings in the prior art and proposes a mask tension device for nanoimprint.

[0006] To achieve the above-mentioned purpose, the utility model adopts the following technical scheme:

[0007] A mask tension device for nanoimprint, comprising an operation table, a tension mechanism is arranged on the top of the operation table, the tension mechanism comprises a sealing plate, a first clamping plate is fixedly arranged on one side of the sealing plate, a row rail group is fixedly arranged on the other side of the sealing plate, a second clamping plate is movably connected to the row rail group, a plurality of elastic elements are uniformly arranged on the side wall of the second clamping plate, one end of the plurality of elastic elements is fixedly connected to the side wall of the fixed plate, and the side wall of the fixed plate is fixedly connected with the sealing plate.

[0008] A lifting mechanism is arranged at the bottom of the tension mechanism.

[0009] Preferably, recesses are formed in the top of the first clamping plate and the second clamping plate, a plurality of packaging holes are uniformly arranged in the recesses, a cover plate is arranged in the recess formed in the first clamping plate and the second clamping plate, and a plurality of through holes corresponding one-to-one to the packaging holes are formed in the cover plate.

[0010] Preferably, the row rail set is used to define that the second clamping plate displacement direction is unchanged, and the row rail set is used to define that the displacement amount of the two ends of the second clamping plate remains consistent.

[0011] Preferably, the lifting mechanism comprises a first hydraulic rod, the first hydraulic rod is arranged on the bottom wall of one side of the sealing plate, the output end of the first hydraulic rod is fixedly connected with a linkage plate, the top of the linkage plate is provided with L-shaped blocks on opposite sides, the two L-shaped blocks are rotatably connected to the side wall of the sealing plate through bolts, and the bottom wall of the sealing plate is rotatably connected with the second hydraulic rod.

[0012] Preferably, the bottom wall of the linkage plate is rotatably connected with a first limiting rod set, and the bottom wall of the sealing plate is rotatably connected with a second limiting rod set.

[0013] Preferably, the mask forms an inclination angle through the lifting mechanism when being pressed, and the mask is pressed through the roller.

[0014] The beneficial effects of the utility model are as follows:

[0015] 1. Through the tension mechanism, the tension of the mask changes during the pressing process, the elastic stretching of the elastic member 26 uniformly distributes the force to the second clamping plate 24, which can ensure that the mask remains flat and stable during the pressing process, thereby improving the precision and consistency of the pressing, and obtaining higher quality of the pressed product.

[0016] 2. The improved mask tension device can reduce the adjustment and operation time, improve the speed of the pressing process, thereby increasing the production efficiency and reducing the production cost.

[0017] 3. The simplified operation interface and more intuitive control method can reduce the training cost and operation difficulty of the operator, make the pressing equipment easier to operate and maintain, the improved mask tension device can have higher stability and reliability, reduce equipment failure and downtime, and improve the stability and continuity of the production line. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 The utility model provides a kind of overall structure schematic view of mask tension device for nano imprinting;

[0019] Figure 2 The utility model provides a kind of lifting mechanism structure schematic view of mask tension device for nano imprinting;

[0020] Figure 3 The utility model provides a kind of tension mechanism structure schematic view of mask tension device for nano imprinting;

[0021] Figure 4Part structure schematic diagram of mask tension device for nanoimprint is provided in the utility model.

[0022] In the drawing: 1, operation platform; 2, tension mechanism; 21, sealing plate; 22, first clamping plate; 23, line rail group; 24, second clamping plate; 25, fixed plate; 26, elastic piece; 3, lifting mechanism; 31, first hydraulic rod; 32, linkage plate; 33, L-shaped block; 34, second hydraulic rod. DETAILED DESCRIPTION

[0023] The technical scheme in the utility model embodiment will be clearly and completely described below with reference to the drawings in the utility model embodiment. Obviously, the described embodiments are only part of the embodiments of the utility model, not all the embodiments.

[0024] In the description of the utility model, it needs to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the utility model and simplifying the description, and do not indicate or imply that the indicated device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the utility model.

[0025] Reference Figures 1-4 A mask tension device for nanoimprint, operation platform 1, the operation platform 1 top is provided with tension mechanism 2, the tension mechanism 2 includes sealing plate 21, one side of the sealing plate 21 is fixedly provided with first clamping plate 22, the other side of the sealing plate 21 is fixedly provided with the line rail group 23, the second clamping plate 24 is movably connected on the line rail group 23, a plurality of elastic pieces 26 are uniformly arranged on the side wall of the second clamping plate 24, one end of a plurality of the elastic pieces 26 is fixedly connected on the side wall of fixed plate 25, and the side wall of the fixed plate 25 is fixedly connected with the sealing plate 21.

[0026] Lifting mechanism 3, the lifting mechanism 3 is arranged at the bottom of the tension mechanism 2.

[0027] Specifically, recesses are formed in the top of the first clamping plate 22 and the second clamping plate 24, a plurality of packaging holes are uniformly arranged in the recesses, and the recesses formed in the first clamping plate 22 and the second clamping plate 24 are provided with cover plates, and the cover plates are provided with a plurality of through holes corresponding to the packaging holes one by one.

[0028] Specifically, the line rail group 23 is used to limit the displacement direction of the second clamping plate 24 unchanged, and the line rail group 23 is used to limit the displacement amount of the two ends of the second clamping plate 24 consistent.

[0029] Specific, the lifting mechanism 3 includes a first hydraulic rod 31, the first hydraulic rod 31 is arranged on the bottom wall of the sealing plate 21 side, the output end of the first hydraulic rod 31 is fixedly connected with the linkage plate 32, the top of the linkage plate 32 is provided with L-shaped block 33 on opposite sides, two L-shaped block 33 is rotatably connected to the side wall of the sealing plate 21 by bolts, the bottom wall of the sealing plate 21 side is rotatably connected with the second hydraulic rod 34.

[0030] Specific, the linkage plate 32 bottom wall rotatably connected with the first limiting rod group, the bottom wall of the sealing plate 21 side is rotatably connected with the second limiting rod group.

[0031] Specific, the mask in the embossing, through the lifting mechanism 3 forms an angle, and through the roller roller mask.

[0032] 1, operation platform; 2, tension mechanism; 21, sealing plate; 22, first clamping plate; 23, track group; 24, second clamping plate; 25, fixed plate; 26, elastic element; 3, lifting mechanism; 31, first hydraulic rod; 32, linkage plate; 33, L-shaped block; 34, second hydraulic rod

[0033] Working principle: the utility model uses, the operator is calibrated and fixed after through the first clamping plate 22 and the second clamping plate 24 fixed two ends of the mask, in the embossing through the lifting mechanism 3 first hydraulic rod 31 and the lifting movement of second hydraulic rod 34, form an angle, angle is, in the process of roller mask tension will change, through the elastic element 26 elastic stretching will force evenly distributed in the second clamping plate 24, prevent in the process of roller mask from uneven stress and tear.

[0034] The above, only for the preferred specific embodiment of the utility model, but the protection scope of the utility model is not limited to this, any skilled in the art of the technical personnel in the utility model disclosed in the technical range, according to the utility model technical scheme and its utility idea are equivalent to replace or change, should be covered in the protection scope of the utility model.

Claims

1. A mask tension device for nanoimprint, characterized by, Include: The operating platform (1), the top of the operating platform (1) is provided with a tension mechanism (2), the tension mechanism (2) comprises a sealing plate (21), one side of the sealing plate (21) is fixedly provided with a first clamping plate (22), the other side of the sealing plate (21) is fixedly provided with a row rail group (23), the second clamping plate (24) is movably connected on the row rail group (23), a plurality of elastic elements (26) are uniformly arranged on the side wall of the second clamping plate (24), one end of the plurality of elastic elements (26) is fixedly connected to the side wall of the fixed plate (25), and the side wall of the fixed plate (25) is fixedly connected with the sealing plate (21); The lifting mechanism (3) is arranged at the bottom of the tension mechanism (2).

2. The mask tension device for nanoimprint according to claim 1, characterized in that: The top of the first clamping plate (22) and the second clamping plate (24) is provided with a groove, a plurality of sealing holes are uniformly arranged on the groove, and the groove of the first clamping plate (22) and the second clamping plate (24) is provided with a cover plate, the cover plate is provided with a plurality of through holes corresponding to the sealing holes.

3. The mask tension device for nanoimprint according to claim 1, wherein: The row rail group (23) is used for limiting the displacement direction of the second clamping plate (24) unchanged, and the row rail group (23) is used for limiting the displacement amount of the two ends of the second clamping plate (24) consistent.

4. The mask tension device for nanoimprint according to claim 1, wherein: The lifting mechanism (3) comprises a first hydraulic rod (31), the first hydraulic rod (31) is arranged on the bottom wall of one side of the sealing plate (21), the output end of the first hydraulic rod (31) is fixedly connected with a linkage plate (32), the top of the linkage plate (32) is provided with L-shaped blocks (33) on opposite sides, and the two L-shaped blocks (33) are rotatably connected to the side wall of the sealing plate (21) through bolts, and the bottom wall of the sealing plate (21) is rotatably connected with a second hydraulic rod (34).

5. The mask tension device for nanoimprint according to claim 4, characterized in that: The bottom wall of the linkage plate (32) is rotatably connected with a first limiting rod group, and the bottom wall of the sealing plate (21) is rotatably connected with a second limiting rod group.

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